WO2008090666A1 - 積層型光電変換装置及びその製造方法 - Google Patents
積層型光電変換装置及びその製造方法 Download PDFInfo
- Publication number
- WO2008090666A1 WO2008090666A1 PCT/JP2007/072207 JP2007072207W WO2008090666A1 WO 2008090666 A1 WO2008090666 A1 WO 2008090666A1 JP 2007072207 W JP2007072207 W JP 2007072207W WO 2008090666 A1 WO2008090666 A1 WO 2008090666A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- photoelectric conversion
- intermediate layer
- laminate type
- conversion layers
- photoelectric converter
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 1
- 238000005215 recombination Methods 0.000 abstract 1
- 230000006798 recombination Effects 0.000 abstract 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02366—Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
- H01L31/076—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
Abstract
光電変換層の間に中間層を設けて上記入射光量制御効果を得るとともに、中間層と半導体層の界面におけるキャリア再結合を低減し、光電変換効率を向上させた積層型光電変換装置及びその製造方法を提供する。 本発明の積層型光電変換装置は、pin構造を有する複数のシリコン系光電変換層を重ねて備え、隣接する少なくとも一対の前記光電変換層は、窒化シリコンからなる中間層を挟持し、前記一対の前記光電変換層は、互いに電気的に接続されており、前記光電変換層の一部であり前記中間層と接するp型シリコン系半導体層は窒素原子を含有する。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/523,633 US8258596B2 (en) | 2007-01-23 | 2007-11-15 | Stacked photoelectric conversion device and method for producing the same |
EP07831937.3A EP2110859B1 (en) | 2007-01-23 | 2007-11-15 | Laminate type photoelectric converter and method for fabricating the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007012851A JP2008181965A (ja) | 2007-01-23 | 2007-01-23 | 積層型光電変換装置及びその製造方法 |
JP2007-012851 | 2007-01-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008090666A1 true WO2008090666A1 (ja) | 2008-07-31 |
Family
ID=39644244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/072207 WO2008090666A1 (ja) | 2007-01-23 | 2007-11-15 | 積層型光電変換装置及びその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8258596B2 (ja) |
EP (1) | EP2110859B1 (ja) |
JP (1) | JP2008181965A (ja) |
WO (1) | WO2008090666A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110120536A1 (en) * | 2009-11-20 | 2011-05-26 | Dapeng Wang | Roughness control of a wavelength selective reflector layer for thin film solar applications |
EP2356696A2 (en) * | 2009-05-06 | 2011-08-17 | Thinsilicon Corporation | Photovoltaic cells and methods to enhance light trapping in semiconductor layer stacks |
US20120042934A1 (en) * | 2009-03-03 | 2012-02-23 | Yoshiyuki Nasuno | Laminated body having semiconductor layer and layer thickness measurement portion, and thin-film photoelectric conversion device and integrated thin-film solar cell having the same |
EP2293347A3 (en) * | 2009-09-02 | 2012-07-25 | Kisco | Photovoltaic device and method for manufacturing the same |
Families Citing this family (25)
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US7655542B2 (en) | 2006-06-23 | 2010-02-02 | Applied Materials, Inc. | Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device |
US7875486B2 (en) | 2007-07-10 | 2011-01-25 | Applied Materials, Inc. | Solar cells and methods and apparatuses for forming the same including I-layer and N-layer chamber cleaning |
EP2215652A4 (en) | 2007-11-02 | 2011-10-05 | Applied Materials Inc | PLASMA TREATMENT BETWEEN DECISION PROCESSES |
US8895842B2 (en) | 2008-08-29 | 2014-11-25 | Applied Materials, Inc. | High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells |
TW201030998A (en) | 2008-10-23 | 2010-08-16 | Alta Devices Inc | Photovoltaic device |
WO2010080446A2 (en) * | 2008-12-19 | 2010-07-15 | Applied Materials, Inc. | Microcrystalline silicon alloys for thin film and wafer based solar applications |
JP5283588B2 (ja) * | 2008-12-26 | 2013-09-04 | 京セラ株式会社 | 太陽電池 |
CN102356474A (zh) * | 2009-04-06 | 2012-02-15 | 应用材料公司 | 高效能薄膜硅太阳能电池的高品质透明导电氧化物-硅界面接触结构 |
US9691921B2 (en) | 2009-10-14 | 2017-06-27 | Alta Devices, Inc. | Textured metallic back reflector |
US9136422B1 (en) | 2012-01-19 | 2015-09-15 | Alta Devices, Inc. | Texturing a layer in an optoelectronic device for improved angle randomization of light |
US11271128B2 (en) | 2009-10-23 | 2022-03-08 | Utica Leaseco, Llc | Multi-junction optoelectronic device |
US20170141256A1 (en) | 2009-10-23 | 2017-05-18 | Alta Devices, Inc. | Multi-junction optoelectronic device with group iv semiconductor as a bottom junction |
US9502594B2 (en) | 2012-01-19 | 2016-11-22 | Alta Devices, Inc. | Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from template layer and etching |
US9768329B1 (en) | 2009-10-23 | 2017-09-19 | Alta Devices, Inc. | Multi-junction optoelectronic device |
US20150380576A1 (en) | 2010-10-13 | 2015-12-31 | Alta Devices, Inc. | Optoelectronic device with dielectric layer and method of manufacture |
TW201123481A (en) * | 2009-12-29 | 2011-07-01 | Auria Solar Co Ltd | Solar cell and manufacturing method thereof |
JP2011159858A (ja) * | 2010-02-02 | 2011-08-18 | Sony Corp | 固体撮像装置およびその製造方法、電子機器 |
JP5525298B2 (ja) * | 2010-03-18 | 2014-06-18 | シャープ株式会社 | 導電性窒化シリコン膜の製造方法 |
WO2012102368A1 (ja) * | 2011-01-27 | 2012-08-02 | 京セラ株式会社 | 太陽電池素子の製造方法、太陽電池素子、および太陽電池モジュール |
US11038080B2 (en) | 2012-01-19 | 2021-06-15 | Utica Leaseco, Llc | Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from etching |
JP2014055111A (ja) * | 2013-12-11 | 2014-03-27 | Sharp Corp | 導電性窒化シリコン膜、導電性窒化シリコン膜積層体、および光電変換装置 |
US10593818B2 (en) * | 2016-12-09 | 2020-03-17 | The Boeing Company | Multijunction solar cell having patterned emitter and method of making the solar cell |
KR101901068B1 (ko) * | 2017-08-09 | 2018-09-20 | 고려대학교 산학협력단 | 탠덤태양전지소자 |
KR102322176B1 (ko) * | 2018-08-23 | 2021-11-04 | 고려대학교 산학협력단 | 탠덤태양전지소자 |
KR102229748B1 (ko) * | 2018-08-23 | 2021-03-18 | 고려대학교 산학협력단 | 탠덤태양전지소자 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003124481A (ja) | 2001-10-11 | 2003-04-25 | Mitsubishi Heavy Ind Ltd | 太陽電池 |
JP2003347572A (ja) * | 2002-01-28 | 2003-12-05 | Kanegafuchi Chem Ind Co Ltd | タンデム型薄膜光電変換装置とその製造方法 |
JP2004128083A (ja) * | 2002-09-30 | 2004-04-22 | Mitsubishi Heavy Ind Ltd | タンデム型太陽電池 |
JP2004363580A (ja) * | 2003-05-13 | 2004-12-24 | Kyocera Corp | 光電変換装置および光発電装置 |
Family Cites Families (9)
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CA1321660C (en) * | 1985-11-05 | 1993-08-24 | Hideo Yamagishi | Amorphous-containing semiconductor device with high resistivity interlayer or with highly doped interlayer |
EP0607435B1 (en) * | 1992-08-07 | 1999-11-03 | Asahi Kasei Kogyo Kabushiki Kaisha | Nitride based semiconductor device and manufacture thereof |
JP2002270879A (ja) * | 2001-03-14 | 2002-09-20 | Mitsubishi Electric Corp | 半導体装置 |
WO2005011001A1 (ja) * | 2003-07-24 | 2005-02-03 | Kaneka Corporation | 積層型光電変換装置 |
DE102005013537A1 (de) * | 2004-03-24 | 2005-10-20 | Sharp Kk | Fotoelektrischer Wandler und Herstellverfahren für einen solchen |
JP4017648B2 (ja) * | 2006-01-23 | 2007-12-05 | シャープ株式会社 | プラズマ処理装置および同装置により製造された半導体素子 |
JP2007201009A (ja) * | 2006-01-24 | 2007-08-09 | Fujifilm Corp | 固体撮像素子 |
JP5305622B2 (ja) * | 2006-08-31 | 2013-10-02 | キヤノン株式会社 | 光電変換装置の製造方法 |
US8207010B2 (en) * | 2007-06-05 | 2012-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing photoelectric conversion device |
-
2007
- 2007-01-23 JP JP2007012851A patent/JP2008181965A/ja active Pending
- 2007-11-15 EP EP07831937.3A patent/EP2110859B1/en not_active Not-in-force
- 2007-11-15 WO PCT/JP2007/072207 patent/WO2008090666A1/ja active Application Filing
- 2007-11-15 US US12/523,633 patent/US8258596B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003124481A (ja) | 2001-10-11 | 2003-04-25 | Mitsubishi Heavy Ind Ltd | 太陽電池 |
JP2003347572A (ja) * | 2002-01-28 | 2003-12-05 | Kanegafuchi Chem Ind Co Ltd | タンデム型薄膜光電変換装置とその製造方法 |
JP2004128083A (ja) * | 2002-09-30 | 2004-04-22 | Mitsubishi Heavy Ind Ltd | タンデム型太陽電池 |
JP2004363580A (ja) * | 2003-05-13 | 2004-12-24 | Kyocera Corp | 光電変換装置および光発電装置 |
Non-Patent Citations (1)
Title |
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See also references of EP2110859A4 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120042934A1 (en) * | 2009-03-03 | 2012-02-23 | Yoshiyuki Nasuno | Laminated body having semiconductor layer and layer thickness measurement portion, and thin-film photoelectric conversion device and integrated thin-film solar cell having the same |
US8962983B2 (en) * | 2009-03-03 | 2015-02-24 | Sharp Kabushiki Kaisha | Laminated body having semiconductor layer and layer thickness measurement portion, and thin-film photoelectric conversion device and integrated thin-film solar cell having the same |
EP2356696A2 (en) * | 2009-05-06 | 2011-08-17 | Thinsilicon Corporation | Photovoltaic cells and methods to enhance light trapping in semiconductor layer stacks |
EP2356696A4 (en) * | 2009-05-06 | 2013-05-15 | Thinsilicon Corp | PHOTOVOLTAIC CELLS AND METHOD FOR REINFORCING LIGHT DETECTION IN SEMICONDUCTOR LAYERED TABLES |
EP2293347A3 (en) * | 2009-09-02 | 2012-07-25 | Kisco | Photovoltaic device and method for manufacturing the same |
US20110120536A1 (en) * | 2009-11-20 | 2011-05-26 | Dapeng Wang | Roughness control of a wavelength selective reflector layer for thin film solar applications |
Also Published As
Publication number | Publication date |
---|---|
EP2110859A1 (en) | 2009-10-21 |
US20100059847A1 (en) | 2010-03-11 |
JP2008181965A (ja) | 2008-08-07 |
US8258596B2 (en) | 2012-09-04 |
EP2110859A4 (en) | 2010-07-14 |
EP2110859B1 (en) | 2013-08-14 |
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