WO2008062657A1 - Procédé pour produire un substrat de verre pour un support d'enregistrement d'informations, substrat de verre pour un support d'enregistrement d'informations et support d'enregistrement d'informations - Google Patents

Procédé pour produire un substrat de verre pour un support d'enregistrement d'informations, substrat de verre pour un support d'enregistrement d'informations et support d'enregistrement d'informations Download PDF

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Publication number
WO2008062657A1
WO2008062657A1 PCT/JP2007/071486 JP2007071486W WO2008062657A1 WO 2008062657 A1 WO2008062657 A1 WO 2008062657A1 JP 2007071486 W JP2007071486 W JP 2007071486W WO 2008062657 A1 WO2008062657 A1 WO 2008062657A1
Authority
WO
WIPO (PCT)
Prior art keywords
glass substrate
information recording
recording medium
polishing
chemical strengthening
Prior art date
Application number
PCT/JP2007/071486
Other languages
English (en)
Japanese (ja)
Inventor
Futoshi Ishida
Yukitoshi Nakatsuji
Hiroaki Sawada
Shinichi Saeki
Original Assignee
Konica Minolta Opto, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Opto, Inc. filed Critical Konica Minolta Opto, Inc.
Priority to JP2008545354A priority Critical patent/JPWO2008062657A1/ja
Publication of WO2008062657A1 publication Critical patent/WO2008062657A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Definitions

  • the present invention relates to a method for producing a glass substrate for an information recording medium used for an information recording medium having a recording layer utilizing properties such as magnetism, light, and magnetomagnetism, and a glass substrate for an information recording medium produced by the production method. And an information recording medium using the glass substrate for information recording medium.
  • the impact resistance of a glass substrate is improved for the purpose of improving the vibration resistance and preventing the substrate from being damaged by impact or vibration.
  • the surface of a glass substrate is chemically strengthened to reinforce the substrate.
  • alkali metal ions such as lithium ions and sodium ions contained in the glass substrate are alkali metals such as potassium ions having a larger ion radius than these ions. It is formed by ion exchange, in which a compressive stress layer is formed on the surface of the glass substrate by ion exchange with ions.
  • Patent Document 1 Japanese Patent Laid-Open No. 8-124153
  • the surface roughness Ra of the glass substrate for information recording media has a very high level of 0.3 nm or less.
  • the force S has come to require smoothness, and it has been very difficult to efficiently produce such a glass substrate having high smoothness.
  • the present invention has been made in view of the technical problems as described above, and an object of the present invention is to combine information with high strength by chemical strengthening and high smoothness, and can be efficiently manufactured. It is intended to provide a method for producing a glass substrate for media, a glass substrate for information recording medium produced by the production method, and an information recording medium using the glass substrate for information recording medium.
  • a method for manufacturing a glass substrate for an information recording medium wherein the steps are performed in this order.
  • the surface roughness Ra of the surface is the same.
  • a glass substrate for information recording medium which is produced by the method for producing a glass substrate for information recording medium as described in 1 above, in any one of 1. to 3.
  • An information recording medium wherein at least a recording layer for recording information is formed on the glass substrate for information recording medium described in 4.
  • the surface of the chemically strengthened glass substrate is uniformly roughened, and the surface roughness Ra of the surface is increased.
  • a glass substrate having high smoothness can be efficiently obtained by polishing the substrate surface again after the entire surface of the substrate is made uniform. Therefore, a method for producing a glass substrate for information recording medium that has both high strength and high smoothness by chemical strengthening and can be produced efficiently, a glass substrate for information recording medium produced by the production method, and the information recording An information recording medium using the glass substrate for medium can be provided.
  • FIG. 1 A flow chart showing an example of a manufacturing process of a glass substrate for an information recording medium in the present invention is used.
  • FIG. 2 is a view showing an example of a glass substrate for an information recording medium of the present invention.
  • FIG. 3 is a view showing another example of the glass substrate for information recording medium of the present invention.
  • FIG. 4 is an image diagram of the roughness curve of the surface of the glass substrate before and after the chemical strengthening process.
  • FIG. 5 is an image diagram of the roughness curve of the surface of the glass substrate after the homogenization step.
  • FIG. 6 is an image diagram of the roughness curve of the surface of the glass substrate after the second polishing step.
  • FIG. 2 is a view showing an example of a glass substrate for an information recording medium of the present invention.
  • Fig. 2 (a) is a perspective view
  • Fig. 2 (b) is a cross-sectional view.
  • the glass substrate 10 is a disk-shaped glass substrate having a center hole 13 and has a surface 11 on which a recording layer is formed.
  • the outer peripheral end surface 14 and the inner peripheral end surface 15 are provided with chamfered portions 16 and 17, respectively.
  • the glass substrate 10 has a chemically strengthened region 18 and a region 19 that is not chemically strengthened.
  • the chemically strengthened region 18 is obtained by immersing a glass substrate in a heated chemical strengthening treatment solution so that alkali metal ions such as lithium ions and sodium ions contained in the glass substrate have potassium ions having a larger ion radius.
  • the glass substrate is strengthened by compressive stress generated in the chemically strengthened region 18 due to the strain caused by the difference in ion radius.
  • FIG. 3 is a view showing another example of the glass substrate for information recording medium of the present invention.
  • FIG. 3 (a) is a cross-sectional view showing the glass substrate 10a when the amount of polishing in the second polishing step (polishing step after chemical strengthening treatment) is increased
  • FIG. 3 (b) is the second polishing step. Further polishing amount in It is sectional drawing which shows the glass substrate 10b at the time of enlarging.
  • the glass substrate 10a in FIG. 3 (a) has a depth force of the chemically strengthened region remaining on the surface 11a by polishing the surface 11a, and the depth of the chemically strengthened region remaining on the outer peripheral end surface 14 and the inner peripheral end surface 15. It is shallower than that.
  • the polishing amount of the surface l ib since the polishing amount of the surface l ib is larger, the region 19 which is not chemically strengthened is directly exposed on the surface 11b, and the chemically strengthened region 18 is It exists only on the outer peripheral end face 14 and the inner peripheral end face 15.
  • the strengthened region remains on the surface, or the thickness of the strengthened region, etc.!
  • the outer peripheral end face 14 and the inner peripheral end face 15 have a reinforced region 18.
  • the material of the glass substrate 10 is not particularly limited as long as it can be chemically strengthened by ion exchange.
  • soda lime glass mainly composed of SiO, Na 0, CaO
  • aluminosilicate glass and porosilicate glass are particularly preferred because they are excellent in impact resistance and vibration resistance.
  • SiO content is more preferably in the range of 45 to 85% by mass.
  • the size of the glass substrate 10 There is no limitation on the size of the glass substrate 10.
  • glass substrates of various sizes such as 2.5 inches, 1.8 inches, 1 inch, and 0.8 inches can be used.
  • the thickness of the glass substrate 10 is not limited.
  • glass substrates 10 having various thicknesses such as 2 mm, lmm, and 0.63 mm can be used.
  • FIG. 1 is a flowchart showing an example of a manufacturing process of a glass substrate for an information recording medium according to the present invention.
  • the glass substrate for an information recording medium of the present invention includes a blank material manufacturing step of S1, an inner and outer periphery of S2. Manufactured by performing the first process of S4, the chemical strengthening process of S5, the homogenizing process of S6, and the second polishing process of S7 in order, after the pre-process such as the processing process, the lapping process of S3, etc. .
  • the manufacturing method of the glass substrate for information recording media of the present invention is characterized mainly by the homogenization step of S6 and the second polishing step of S7 among these steps.
  • Pre-processes such as a blank material manufacturing process, an inner and outer peripheral processing process, and a lapping process can be performed by a method that is generally used as a method for manufacturing a glass substrate for an information recording medium.
  • the blank material production process is a process for producing a blank material that is the basis of a glass substrate for an information recording medium.
  • Known methods include producing a molten glass by press molding and cutting a sheet-like glass. ing.
  • the inner / outer peripheral machining step is a step of drilling the center hole, grinding to ensure the shape and dimensional accuracy of the outer peripheral end surface and inner peripheral end surface, and polishing the inner / outer peripheral end surface.
  • the lapping step is a step of lapping for satisfying the flatness, thickness, parallelism, etc. of the surface on which the recording layer is formed.
  • the order of each of the preceding steps is not limited to that shown in Fig. 1, and can be appropriately changed according to the situation.
  • the inner and outer peripheral processing steps may be performed after the blank material manufacturing step and the lapping step.
  • the lapping process can be divided into two processes, the first half and the second half, and the inner and outer peripheral machining processes can be performed after the first half of the lapping process and then the second half of the lapping process.
  • the method for producing a glass substrate for an information recording medium of the present invention may include various processes other than those described above. For example, an annealing process for relaxing internal distortion of the glass substrate 10, a heat shock process for confirming the reliability of the strength of the glass substrate 10, an abrasive or a chemical strengthening treatment liquid remaining on the surface of the glass substrate 10, etc.
  • the cleaning process for removing foreign matter may have various inspection / evaluation processes.
  • the first polishing step is a step of polishing the surface of the glass substrate 10 before the chemical strengthening step, and is a step of removing scratches and irregularities on the surface of the glass substrate 10 and improving smoothness.
  • a polishing method it is possible to use a known method as it is for manufacturing a glass substrate for an information recording medium. For example, a pad is affixed to the opposing surfaces of two rotatable surface plates placed opposite to each other, a glass substrate 10 is placed between the two pads, and a pad is placed on the surface of the glass substrate 10. At the same time as rotating in contact with the glass substrate 10, the polishing agent is supplied to the surface of the glass substrate 10.
  • Examples of the abrasive include cerium oxide, zirconium oxide, aluminum oxide, manganese oxide, colloidal silica, and diamond. Among these, it is preferable to use cerium oxide, which has a high reactivity with glass and can obtain a smooth polished surface in a short time.
  • the node can be a force S that can be divided into a hard pad and a soft pad, and a force S that is appropriately selected and used as necessary.
  • hard pads include pads made of hard bellows, urethane foam, pitch-containing suede, etc.
  • soft pads include pads made of suede velor etc.
  • polishing in a plurality of steps, such as a rough polishing step and a precision polishing step, by changing the particle size of the abrasive and the type of pad. Further, it is preferable to perform a cleaning process for removing the abrasive remaining on the surface of the glass substrate 10 after the first polishing process.
  • the surface roughness Ra of the surface of the glass substrate 10 after the first polishing step is not particularly limited, but in order to finally obtain the glass substrate 10 having high smoothness, the first polishing is performed.
  • the surface roughness Ra of the surface of the glass substrate 10 after the process is preferably in the range of 0.3 to 0.5 nm.
  • a phenomenon occurs in which the smoothness of the surface of the glass substrate 10 deteriorates unevenly.
  • Ra after the first polishing process exceeds 0.5 nm, the degree of deterioration is significantly large. Come on. Therefore, in order to finally obtain a glass substrate 10 having high smoothness, the amount of increase in Ra in the homogenization process must be increased, and the second polishing process requires more time and effort than necessary. Come. Further, even if Ra is less than 0.3 nm, there is no influence on the effect of the present invention to finally obtain a glass substrate 10 having high smoothness, but it takes more time and effort than necessary for the first polishing step. It will end.
  • the surface roughness Ra refers to the arithmetic average height Ra defined in JIS B0601: 2001.
  • the surface roughness Ra can be measured with an atomic force microscope (AFM) or the like.
  • a known chemical strengthening treatment liquid can be used without any particular limitation on the chemical strengthening treatment liquid.
  • a molten salt containing potassium ions or a molten salt containing potassium ions and sodium ions is generally used.
  • the molten salt containing potassium ions and sodium ions include potassium and sodium nitrates, carbonates, sulfates, and mixed molten salts thereof.
  • nitrate is preferably used from the viewpoint of preventing deformation of the glass substrate 10 having a low melting point.
  • the heating temperature of the chemical strengthening treatment liquid is lower than the glass transition point (Tg) of the glass substrate 10, and the glass transition point is preferably lower than 50 ° C, which is the preferred temperature! Is even better.
  • the smoothness of the glass substrate 10 is deteriorated by performing the chemical strengthening treatment.
  • the present inventor has found that the deterioration of smoothness due to the chemical strengthening treatment is caused by the occurrence of relatively large unevenness, particularly unevenness, which is not caused by the surface of the glass substrate 10 being uniformly roughened. It was. Such irregularities are thought to be caused by the crystal such as nitrate, which is a chemical strengthening treatment liquid, being firmly attached or by erosion by the chemical strengthening treatment liquid.
  • FIG. 4 is an image diagram of the roughness curve of the surface of the glass substrate 10 before and after the chemical strengthening step.
  • the horizontal axis in FIG. 4 is the distance L m) of the surface 11 of the glass substrate 10, and the vertical axis is the height H (nm) of the surface 11.
  • Figure 4 (a) shows the state before the chemical strengthening process
  • Figure 4 (b) shows the state after the chemical strengthening process.
  • the first polishing process is uniformly polished, the roughness curve is uniform, and no major abnormality is observed.
  • the chemical strengthening process there is no significant change in average roughness, but it can be seen that relatively large irregularities exist unevenly.
  • a preheating tank is provided prior to immersion in the chemical strengthening treatment liquid. It has a preheating process to heat the glass substrate 10 to a predetermined temperature!
  • the homogenizing step is a step of increasing the surface roughness Ra by roughening the surface of the chemically strengthened glass substrate 10.
  • the surface of the glass substrate 10 is once uniformly roughened, and then the polishing is performed after the uniformizing step to increase the surface roughness Ra, so that the non-uniformity generated in the chemical strengthening step.
  • the entire surface of the glass substrate 10 can be efficiently finished with high smoothness without being affected by unevenness. That is, after removing the protruding portion on the surface of the glass substrate 10 as shown in FIG. 4 (b), a uniform unevenness as shown in FIG. 5 is formed on the surface of the glass substrate 10.
  • the homogenization step is not particularly limited as long as the surface of the chemically strengthened glass substrate 10 can be roughened to increase the surface roughness Ra.
  • a method of polishing using a polishing agent having a particle size larger than that of the polishing agent used in the second polishing step a method of etching with a solution, a method of sandblasting, and the like can be mentioned.
  • a method of performing etching with a solution is preferable.
  • the solution used for etching is hydrofluoric acid, caefluoric acid, ammonium fluoride, and an acidic aqueous solution containing at least one of them, or a strong alkaline aqueous solution mainly containing NaOH or KOH. It can be appropriately selected and used.
  • an acidic aqueous solution When using an acidic aqueous solution, it is necessary to consider the dissolution rate, homogeneity, and stability. If necessary, adjust the properties of the solution by adding acid chemicals such as hydrochloric acid, nitric acid, sulfuric acid, acetic acid, oxalic acid, and succinic acid, and surfactants. Also in the case of using a strong alkaline aqueous solution, it is preferable to adjust the properties of the solution by adding a surfactant or the like to adjust the properties of the solution. By adjusting the properties of the solution in this manner, the etching reactivity with respect to the glass containing SiO as a main component can be enhanced.
  • acid chemicals such as hydrochloric acid, nitric acid, sulfuric acid, acetic acid, oxalic acid, and succinic acid, and surfactants.
  • a surfactant or the like By adjusting the properties of the solution in this manner, the etching reactivity with respect to the glass
  • the etching reactivity with respect to the glass containing SiO as a main component can be greatly increased, and the surface roughness can be increased. This can be easily controlled. It is also preferable to heat the solution for efficient etching!
  • FIG. 5 is an image diagram of the surface roughness curve of the glass substrate 10 after the homogenization step.
  • the horizontal axis in FIG. 5 is the distance L m) of the surface 11 of the glass substrate 10, and the vertical axis is the height H (nm) of the surface 11.
  • the surface roughness Ra of the surface of the glass substrate 10 after the homogenization process is not particularly limited, but in order to efficiently obtain the glass substrate 10 having high smoothness finally, the glass substrate after the homogenization process
  • the surface roughness Ra of the surface of 10 is preferably in the range of 0.6 to 2 nm. When the surface roughness Ra is less than 0.6 nm, the unevenness generated in the chemical strengthening process cannot be sufficiently removed, and it may be difficult to finally obtain the glass substrate 10 having high smoothness. If the surface roughness Ra exceeds 2 nm, the second polishing process will take more time and effort than necessary.
  • the second polishing step is a step of polishing the surface of the glass substrate 10 whose surface has been uniformly roughened by the homogenizing step.
  • a polishing method a known method can be used as it is as a method for manufacturing the glass substrate 10 for information recording medium. For example, polishing can be performed in the same manner as in the first polishing step using the same polishing agent or pad as in the first polishing step.
  • Texture processing is a diamond This is a tape polishing method using a fine polishing slurry such as a glass, and is a general method for manufacturing a glass substrate for an information recording medium.
  • the second polishing step reduces the chemically strengthened region of the surface of the glass substrate 10.
  • FIG. 6 is an image diagram of the surface roughness curve of the glass substrate 10 after the second polishing step.
  • the horizontal axis 6 is the distance L m) of the surface 11 of the glass substrate 10, and the vertical axis is the height H (nm) of the surface 11.
  • the surface 11 of the glass substrate 10 after the second polishing step is uniform and has high smoothness.
  • the surface roughness Ra of the surface of the glass substrate 10 after the second polishing step is not particularly limited, but from the viewpoint of reducing the flying height of the magnetic head to improve the recording density, the surface roughness Ra after the second polishing step is not limited.
  • the surface roughness Ra of the surface of the glass substrate 10 is preferably 0.3 nm or less.
  • An information recording medium can be obtained by forming at least a recording layer on the glass substrate 10 for information recording medium of the present invention.
  • the recording layer is not particularly limited, and is capable of using various recording layers utilizing properties such as magnetism, light, and magnetomagnetism. Particularly suitable for manufacturing an information recording medium (magnetic disk) using the magnetic layer as a recording layer. It is.
  • the magnetic material used in the magnetic layer is not particularly limited, and a known material can be appropriately selected and used.
  • a force S such as CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, CoNiPt, CoNiCrPt, CoNiCrTa, CoCrPtTa, CoCrPtSiO containing Co as a main component can be cited.
  • the magnetic layer can be divided into non-magnetic films (for example, Cr, CrMo, CrV, etc.) to reduce noise.
  • the magnetic layer in addition to the above Co-based materials, ferrite-based and iron-rare earth-based materials, SiO
  • a durailleur having a structure in which magnetic particles such as Fe, Co, CoFe, and CoNiPt are dispersed in a nonmagnetic film made of BN or the like.
  • the magnetic layer may be either an in-plane type or a vertical type.
  • a known method can be used. For example, spatterin And the like, the electroless plating method, and the spin coating method.
  • the magnetic disk may further be provided with an underlayer, a protective layer, a lubricating layer, and the like as necessary. Any of these layers can be used by appropriately selecting a known material.
  • the material for the underlayer include Cr, Mo, Ta, Ti, W, V, B, Al, and Ni.
  • the material for the protective layer include Cr, Cr alloy, C, ZrO, and SiO ⁇ .
  • PFPE perfluoropolyether
  • Aluminosilicate glass was used as the glass material, and a blank was produced by press molding the molten glass.
  • a first polishing step was performed to obtain a glass substrate 10 having an outer diameter of 65 mm, an inner diameter of 20 mm, and a thickness of 0.635 mm.
  • cerium oxide was used as a polishing agent.
  • the surface roughness Ra of the surface of the glass substrate 10 after the first polishing step was 0.4 nm. The surface roughness Ra was measured using an atomic force microscope (AFM).
  • a chemical strengthening step was performed by immersing the glass substrate 10 in a chemical strengthening treatment solution.
  • the chemical strengthening solution used was a mixed molten salt of potassium nitrate (KNO) and sodium nitrate (NaNO).
  • the mixing ratio was 1: 1 by mass ratio.
  • the temperature of the chemical strengthening solution was 400 ° C and the immersion time was 40 minutes.
  • the glass substrate 10 was immersed in a solution to perform a homogenization step.
  • Example 4 Hydrofluoric acid was used for the solution.
  • the temperature of the solution was 25 ° C.
  • the glass substrate 10 having a surface roughness Ra of 0.6 nm (Example 1), lnm (Example 2), 2 nm (Example 3), and 3 nm (Example 4) was obtained by varying the immersion time. Ten sheets were prepared for each.
  • Example 1 The results are shown in Table 1.
  • Surface roughness Ra after the second polishing step is in the range of 0.6 to 2 nm. Examples 1, 2, and 3 all have a surface roughness Ra of 0.3 nm or less under a polishing time of 5 minutes. It was very good.
  • Example 4 in which the surface roughness Ra after the second polishing step was 3 nm, the surface roughness Ra was 0.3 nm or less under the condition of the polishing time of 15 minutes, and a glass substrate 10 having good smoothness was obtained. I was able to.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
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  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

L'invention concerne un procédé pour produire un substrat de verre pour un support d'enregistrement d'informations, qui permet de produire de manière efficace un substrat de verre ayant à la fois une résistance élevée due à un renforcement chimique et un caractère lisse élevé. L'invention concerne également un substrat de verre pour un support d'enregistrement d'informations qui est produit par un tel procédé de fabrication, et un support d'enregistrement d'informations utilisant un tel substrat de verre.
PCT/JP2007/071486 2006-11-22 2007-11-05 Procédé pour produire un substrat de verre pour un support d'enregistrement d'informations, substrat de verre pour un support d'enregistrement d'informations et support d'enregistrement d'informations WO2008062657A1 (fr)

Priority Applications (1)

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JP2008545354A JPWO2008062657A1 (ja) 2006-11-22 2007-11-05 情報記録媒体用ガラス基板の製造方法、情報記録媒体用ガラス基板及び情報記録媒体

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JP2006-315394 2006-11-22
JP2006315394 2006-11-22

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009289370A (ja) * 2008-05-30 2009-12-10 Furukawa Electric Co Ltd:The 磁気ディスク用ガラス基板
WO2010041623A1 (fr) * 2008-10-07 2010-04-15 Hoya株式会社 Procédé de production d’un substrat de verre pour un disque magnétique
WO2010041537A1 (fr) * 2008-10-08 2010-04-15 コニカミノルタオプト株式会社 Procédé pour produire un substrat de verre, et procédé pour produire un support d'enregistrement magnétique
WO2012042735A1 (fr) * 2010-09-30 2012-04-05 コニカミノルタオプト株式会社 Procédé de fabrication d'un substrat en verre pour un support d'enregistrement d'informations
KR20120112762A (ko) * 2010-01-07 2012-10-11 코닝 인코포레이티드 내충격성-내손상성 유리 시트
WO2014050495A1 (fr) * 2012-09-27 2014-04-03 Hoya株式会社 Procédé de fabrication de substrat en verre pour support d'enregistrement d'informations
WO2014050507A1 (fr) * 2012-09-27 2014-04-03 Hoya株式会社 Procédé de fabrication de substrat en verre pour support d'enregistrement d'informations
WO2014050496A1 (fr) * 2012-09-27 2014-04-03 Hoya株式会社 Procédé de fabrication de substrat en verre pour support d'enregistrement d'informations

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Publication number Priority date Publication date Assignee Title
JP2003036528A (ja) * 2001-07-25 2003-02-07 Nippon Sheet Glass Co Ltd 情報記録媒体用基板及びその製造方法、並びに情報記録媒体
JP2003277102A (ja) * 2002-01-18 2003-10-02 Nippon Sheet Glass Co Ltd 情報記録媒体用ガラス基板の製造方法及び情報記録媒体用ガラス基板

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Publication number Priority date Publication date Assignee Title
JP2003036528A (ja) * 2001-07-25 2003-02-07 Nippon Sheet Glass Co Ltd 情報記録媒体用基板及びその製造方法、並びに情報記録媒体
JP2003277102A (ja) * 2002-01-18 2003-10-02 Nippon Sheet Glass Co Ltd 情報記録媒体用ガラス基板の製造方法及び情報記録媒体用ガラス基板

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009289370A (ja) * 2008-05-30 2009-12-10 Furukawa Electric Co Ltd:The 磁気ディスク用ガラス基板
WO2010041623A1 (fr) * 2008-10-07 2010-04-15 Hoya株式会社 Procédé de production d’un substrat de verre pour un disque magnétique
JP2010205382A (ja) * 2008-10-07 2010-09-16 Hoya Corp 磁気ディスク用ガラス基板の製造方法
US8821747B2 (en) 2008-10-07 2014-09-02 Hoya Corporation Method of manufacturing a glass substrate for a magnetic disk
WO2010041537A1 (fr) * 2008-10-08 2010-04-15 コニカミノルタオプト株式会社 Procédé pour produire un substrat de verre, et procédé pour produire un support d'enregistrement magnétique
JPWO2010041537A1 (ja) * 2008-10-08 2012-03-08 コニカミノルタオプト株式会社 ガラス基板の製造方法、および磁気記録媒体の製造方法
KR20120112762A (ko) * 2010-01-07 2012-10-11 코닝 인코포레이티드 내충격성-내손상성 유리 시트
JP2013516387A (ja) * 2010-01-07 2013-05-13 コーニング インコーポレイテッド 耐衝撃損傷性ガラス板
KR101872536B1 (ko) * 2010-01-07 2018-06-28 코닝 인코포레이티드 내충격성-내손상성 유리 시트
JPWO2012042735A1 (ja) * 2010-09-30 2014-02-03 コニカミノルタ株式会社 情報記録媒体用ガラス基板の製造方法
WO2012042735A1 (fr) * 2010-09-30 2012-04-05 コニカミノルタオプト株式会社 Procédé de fabrication d'un substrat en verre pour un support d'enregistrement d'informations
WO2014050495A1 (fr) * 2012-09-27 2014-04-03 Hoya株式会社 Procédé de fabrication de substrat en verre pour support d'enregistrement d'informations
WO2014050507A1 (fr) * 2012-09-27 2014-04-03 Hoya株式会社 Procédé de fabrication de substrat en verre pour support d'enregistrement d'informations
WO2014050496A1 (fr) * 2012-09-27 2014-04-03 Hoya株式会社 Procédé de fabrication de substrat en verre pour support d'enregistrement d'informations
CN104603876A (zh) * 2012-09-27 2015-05-06 Hoya株式会社 信息记录介质用玻璃基板的制造方法

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