WO2008032813A1 - Filtre d'affichage plasma - Google Patents
Filtre d'affichage plasma Download PDFInfo
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- WO2008032813A1 WO2008032813A1 PCT/JP2007/067907 JP2007067907W WO2008032813A1 WO 2008032813 A1 WO2008032813 A1 WO 2008032813A1 JP 2007067907 W JP2007067907 W JP 2007067907W WO 2008032813 A1 WO2008032813 A1 WO 2008032813A1
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- 239000010410 layer Substances 0.000 claims description 359
- 229920005989 resin Polymers 0.000 claims description 81
- 239000011347 resin Substances 0.000 claims description 81
- 239000000203 mixture Substances 0.000 claims description 39
- 229920006267 polyester film Polymers 0.000 claims description 15
- 239000002346 layers by function Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000001603 reducing effect Effects 0.000 abstract description 6
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 96
- 238000000034 method Methods 0.000 description 60
- 238000000576 coating method Methods 0.000 description 57
- -1 polyethylene terephthalate Polymers 0.000 description 53
- 238000012937 correction Methods 0.000 description 49
- 239000011248 coating agent Substances 0.000 description 46
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 44
- 239000000975 dye Substances 0.000 description 36
- 239000002245 particle Substances 0.000 description 27
- 239000003973 paint Substances 0.000 description 24
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 23
- 238000002834 transmittance Methods 0.000 description 23
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 20
- 238000001723 curing Methods 0.000 description 20
- 230000000694 effects Effects 0.000 description 20
- 238000011156 evaluation Methods 0.000 description 20
- 239000010419 fine particle Substances 0.000 description 20
- 239000000377 silicon dioxide Substances 0.000 description 20
- 239000003795 chemical substances by application Substances 0.000 description 19
- 239000000758 substrate Substances 0.000 description 19
- 239000002904 solvent Substances 0.000 description 18
- 229920000877 Melamine resin Polymers 0.000 description 17
- 239000011521 glass Substances 0.000 description 16
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 16
- 239000002184 metal Substances 0.000 description 16
- 230000003746 surface roughness Effects 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 15
- 239000003431 cross linking reagent Substances 0.000 description 14
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 229920000139 polyethylene terephthalate Polymers 0.000 description 12
- 239000005020 polyethylene terephthalate Substances 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 11
- 239000012790 adhesive layer Substances 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- 229910000077 silane Inorganic materials 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- 239000000049 pigment Substances 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 229920000728 polyester Polymers 0.000 description 9
- 230000009467 reduction Effects 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 8
- 239000004925 Acrylic resin Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000008199 coating composition Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 8
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 8
- 229920000178 Acrylic resin Polymers 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 229940059574 pentaerithrityl Drugs 0.000 description 7
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 7
- 230000002829 reductive effect Effects 0.000 description 7
- 238000012719 thermal polymerization Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000009835 boiling Methods 0.000 description 6
- 239000013522 chelant Substances 0.000 description 6
- 239000000470 constituent Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 150000004756 silanes Chemical class 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000006096 absorbing agent Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 230000001678 irradiating effect Effects 0.000 description 5
- 239000011817 metal compound particle Substances 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 229920002050 silicone resin Polymers 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000003377 acid catalyst Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 238000004049 embossing Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 150000007974 melamines Chemical class 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- 230000001629 suppression Effects 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 229920001807 Urea-formaldehyde Polymers 0.000 description 3
- 229920000180 alkyd Polymers 0.000 description 3
- 229910000410 antimony oxide Inorganic materials 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000007607 die coating method Methods 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000010954 inorganic particle Substances 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 208000016339 iris pattern Diseases 0.000 description 3
- 239000011146 organic particle Substances 0.000 description 3
- 239000012860 organic pigment Substances 0.000 description 3
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- HQQTZCPKNZVLFF-UHFFFAOYSA-N 4h-1,2-benzoxazin-3-one Chemical class C1=CC=C2ONC(=O)CC2=C1 HQQTZCPKNZVLFF-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 239000005995 Aluminium silicate Substances 0.000 description 2
- DEVXQDKRGJCZMV-UHFFFAOYSA-K Aluminum acetoacetate Chemical compound [Al+3].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O DEVXQDKRGJCZMV-UHFFFAOYSA-K 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 241000872198 Serjania polyphylla Species 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 235000012211 aluminium silicate Nutrition 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- UHHXUPJJDHEMGX-UHFFFAOYSA-K azanium;manganese(3+);phosphonato phosphate Chemical compound [NH4+].[Mn+3].[O-]P([O-])(=O)OP([O-])([O-])=O UHHXUPJJDHEMGX-UHFFFAOYSA-K 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000001023 inorganic pigment Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000002667 nucleating agent Substances 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 238000001782 photodegradation Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229940070721 polyacrylate Drugs 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000008279 sol Substances 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- JWDFQMWEFLOOED-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 3-(pyridin-2-yldisulfanyl)propanoate Chemical compound O=C1CCC(=O)N1OC(=O)CCSSC1=CC=CC=N1 JWDFQMWEFLOOED-UHFFFAOYSA-N 0.000 description 1
- TVGMOUGXQYQZOL-UHFFFAOYSA-N 1-(2-ethoxyphenyl)ethanone Chemical compound CCOC1=CC=CC=C1C(C)=O TVGMOUGXQYQZOL-UHFFFAOYSA-N 0.000 description 1
- ONCICIKBSHQJTB-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]propan-1-one Chemical compound CCC(=O)C1=CC=C(N(C)C)C=C1 ONCICIKBSHQJTB-UHFFFAOYSA-N 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- UOBYKYZJUGYBDK-UHFFFAOYSA-N 2-naphthoic acid Chemical compound C1=CC=CC2=CC(C(=O)O)=CC=C21 UOBYKYZJUGYBDK-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- HXUIDZOMTRMIOE-UHFFFAOYSA-M 3-oxo-3-phenylpropionate Chemical compound [O-]C(=O)CC(=O)C1=CC=CC=C1 HXUIDZOMTRMIOE-UHFFFAOYSA-M 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 238000004438 BET method Methods 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 108091005944 Cerulean Proteins 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920003270 Cymel® Polymers 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 101000583150 Homo sapiens Membrane-associated phosphatidylinositol transfer protein 3 Proteins 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 102100030351 Membrane-associated phosphatidylinositol transfer protein 3 Human genes 0.000 description 1
- DZSYJVXGONVNKA-UHFFFAOYSA-L NIR-1 dye Chemical compound [K+].[K+].C1=CC2=C(S([O-])(=O)=O)C=C(S([O-])(=O)=O)C=C2C(C2(C)C)=C1[N+](CC)=C2C=CC=CC=CC=C1C(C)(C)C2=CC(C(O)=O)=CC=C2N1CCCCS([O-])(=O)=O DZSYJVXGONVNKA-UHFFFAOYSA-L 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 238000001237 Raman spectrum Methods 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- HSSJULAPNNGXFW-UHFFFAOYSA-N [Co].[Zn] Chemical compound [Co].[Zn] HSSJULAPNNGXFW-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- UGAPHEBNTGUMBB-UHFFFAOYSA-N acetic acid;ethyl acetate Chemical compound CC(O)=O.CCOC(C)=O UGAPHEBNTGUMBB-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000008064 anhydrides Chemical group 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 150000001541 aziridines Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000152 cobalt phosphate Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- NLCKLZIHJQEMCU-UHFFFAOYSA-N cyano prop-2-enoate Chemical class C=CC(=O)OC#N NLCKLZIHJQEMCU-UHFFFAOYSA-N 0.000 description 1
- YPHMISFOHDHNIV-FSZOTQKASA-N cycloheximide Chemical compound C1[C@@H](C)C[C@H](C)C(=O)[C@@H]1[C@H](O)CC1CC(=O)NC(=O)C1 YPHMISFOHDHNIV-FSZOTQKASA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- JSJFLHPWPFCJTN-UHFFFAOYSA-N dimethyl phosphono phosphate Chemical compound COP(=O)(OC)OP(O)(O)=O JSJFLHPWPFCJTN-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000006266 etherification reaction Methods 0.000 description 1
- QPMJENKZJUFOON-PLNGDYQASA-N ethyl (z)-3-chloro-2-cyano-4,4,4-trifluorobut-2-enoate Chemical compound CCOC(=O)C(\C#N)=C(/Cl)C(F)(F)F QPMJENKZJUFOON-PLNGDYQASA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 210000003746 feather Anatomy 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Natural products OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000005487 naphthalate group Chemical group 0.000 description 1
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical compound N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical class OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 229920001909 styrene-acrylic polymer Polymers 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 229920006352 transparent thermoplastic Polymers 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- BOVWGKNFLVZRDU-UHFFFAOYSA-N triethoxy(trifluoromethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)F BOVWGKNFLVZRDU-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- ORVBHOQTQDOUIW-UHFFFAOYSA-N trimethoxy(trifluoromethyl)silane Chemical compound CO[Si](OC)(OC)C(F)(F)F ORVBHOQTQDOUIW-UHFFFAOYSA-N 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- 238000004736 wide-angle X-ray diffraction Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0226—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures having particles on the surface
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/44—Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
- H01J2211/20—Constructional details
- H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
- H01J2211/44—Optical arrangements or shielding arrangements, e.g. filters or lenses
- H01J2211/442—Light reflecting means; Anti-reflection means
Definitions
- the present invention relates to a filter for a plasma display. More particularly, the present invention relates to a filter for a plasma display having excellent transmitted image sharpness and excellent antireflection effect.
- An optical filter is attached to the front surface of a plasma display panel (hereinafter abbreviated as "PDP") to improve the function of the PDP.
- the functions required for such a PDP filter are: (1) mechanical strength imparted to the PDP body (panel) made of thin film glass, (2) shielding of electromagnetic waves emitted from the PDP, and (3) emission from the PDP. (4) anti-reflection of external light, (5) color tone correction, and the like.
- the PDP filter installed in the PDP currently on the market is formed by laminating a plurality of layers each having the functions (1) to (5) above.
- a transparent substrate such as glass for imparting mechanical strength to the PDP panel, a conductive film for shielding electromagnetic waves, an infrared absorbing film for shielding infrared rays, an external light
- An antireflection film is used for preventing reflection, and a layer containing a dye that absorbs in the visible light region is used to correct the color tone.
- Patent Document 1 a technique is disclosed in which antireflection layers are installed on both sides of a front optical filter in order to reduce reflection.
- Patent Documents 2 and 3 a technique has been proposed in which a light diffusion layer having a concavo-convex structure is provided on the filter surface to blur the outline of the reflected image in order to reduce the reflection and simultaneously suppress the occurrence of interference fringes. Furthermore, by applying the filter directly to the PDP panel, reflection from the panel surface and reflection from the back surface of the filter are suppressed to reduce reflections. Techniques for achieving this are also disclosed (Patent Documents 4 and 5).
- Patent Document 1 Japanese Unexamined Patent Publication No. 2000-156182
- Patent Document 2 JP 2001-281411 A
- Patent Document 3 Japanese Patent Laid-Open No. 2004_126495
- Patent Document 4 Japanese Patent Laid-Open No. 2005-242227
- Patent Document 5 Japanese Unexamined Patent Application Publication No. 2005-243509
- Patent Documents 4 and 5 are not sufficient in reducing the effect of reflection.
- the present invention is excellent in transmitted image sharpness, and further has an extremely excellent effect of reducing reflection (hereinafter referred to as anti-reflection effect). Is to provide a filter.
- a filter for plasma display of the present invention has the following configuration. That is, the filter for plasma display of the present invention has an average roughness Ra on the outermost surface of the viewing side of 15 to 1 OOnm and an average roughness of 10 points on the outermost surface of the viewing side Rz force of 50 to; Surface waviness width;! To 100 ⁇ m, surface waviness length;! To 500 m, and surface waviness occupancy 60 to 100%; 100% surface waviness structure formed on the outermost surface on the viewing side is there.
- the above-mentioned filter for plasma display has a structure in which a plurality of functional layers are laminated, and a waviness width;! To 100 ⁇ m, a waviness length; ⁇ 500 ⁇ m, wave height 0 ⁇ 05—3.0 m, wave occupancy 60 ⁇ ; 100% wave structure force S formation It is preferred that it be!
- a plasma display of the present invention has the above plasma display filter attached to the display surface of a plasma display panel.
- the present invention it is possible to provide a PDP filter that has excellent transmitted image clarity and also has anti-reflection properties. Further, according to a preferred aspect of the present invention, it is possible to provide a PDP filter that also has interference fringe prevention properties.
- Figure 3 Diagram showing the arrangement of molds used to create a surface waviness structure by the saddle molding method ( Figure (b) is a cross-sectional view taken along line ⁇ in Figure (a))
- the present invention has found a PDP filter capable of obtaining excellent image quality in which reflection reduction and transmitted image clarity are compatible.
- the filter-viewing-side surface means the surface on the observer side when the filter is set on the PDP panel.
- the PDP filter of the present invention has a very gentle uneven structure (hereinafter referred to as a surface wavy structure) formed on the outermost surface on the viewing side with a high occupation ratio.
- a surface wavy structure formed on the outermost surface on the viewing side with a high occupation ratio.
- the center line average roughness Ra of the outermost surface on the viewing side is 15 to 1 OOnm
- the average roughness 10 points on the outermost surface of the viewing side Rz is 50 to 1000
- the surface waviness width is! To 100 ⁇ m, surface waviness length;! ⁇ 500 ⁇ m, and surface waviness occupancy 60 ⁇ ; 100% surface waviness structure is formed on the outermost surface of the viewing side (see Fig. 1).
- the center line average roughness Ra of the outermost surface on the viewing side is preferably 20 to 80 nm, more preferably 25 to 60 nm, and further preferably 30 to 50 nm.
- the 10-point average roughness Rz is preferably 70 to 250 nm, more preferably 90 nm to 200 nm.
- the surface waviness width is preferably 10 to 60 ⁇ 111, more preferably 10 to 40 ⁇ 111.
- the surface waviness length is preferably 10 to 100; M, more preferably 10 to 60 111.
- the surface waviness occupancy is preferably 70 to 90%, more preferably 75 to 85%.
- the length of the short axis side is "surface waviness width" and the length of the long axis side is "surface”
- the swell length is specified. If it is close to a circle, the diameter is used. If it is close to an ellipse, the minor axis is the surface waviness. Details of the measurement method will be described later.
- the surface waviness structure may be a convex structure or a concave structure. A method for forming a surface waviness structure having such a shape will be described following a method for forming an interface waviness structure to be described later.
- Ra is less than 15 nm
- the outline of the reflected image tends to be clear and the reflected image tends to be easy to see
- the transmitted image tends to deteriorate.
- Rz is less than 50 nm
- the outline of the reflected image becomes clear and the reflected image tends to be easy to see
- the transmitted image tends to deteriorate.
- the surface waviness width exceeds 100 ⁇ m
- the transmitted image tends to glaring, and when it is less than 100 ⁇ m, the transmitted image tends to deteriorate.
- the transmission image tends to glaring, and when it is less than 1 am, the transmission image tends to deteriorate.
- the surface waviness occupancy is less than 60%, the outline of the reflected image becomes clear and the reflected image tends to be easy to see.
- the reflected image is composed of light reflected from the PDP filter and light reflected from the panel. Since the reflected light from the panel is absorbed by the PDP filter, the reflection prevention property can be improved by lowering the transmittance of the PDP filter. However, if the transmittance is lowered too much, the brightness of the transmitted image also decreases and the image becomes darker. In this case, in order to maintain the brightness, it is necessary to brighten the image displayed on the PDP panel, and as a result, power consumption increases, which is not a preferable mode.
- the total light transmittance of the PDP filter of the present invention is preferably 20 to 60%, more preferably 25 to 50%, still more preferably 30 to 45%. By setting such a transmittance, it is possible to optimize the balance between the reduction in reflection and the luminance of the transmitted image.
- the PDP filter of the present invention is preferably a laminate in which a plurality of layers are laminated.
- Each of these layers is a functional layer having a specific function.
- the functional layer include an antireflection layer, a hard coat layer, a transparent resin layer, an ultraviolet cut layer, an infrared cut layer, an electromagnetic shielding layer, a color correction layer, a transparent substrate layer, and an interlayer adhesive layer.
- the order of these functional layers is not particularly limited, but an antireflection layer is preferably disposed on the outermost layer.
- a hard coat layer is disposed below the antireflection layer
- a color correction layer is disposed below
- an electromagnetic wave shielding layer is further disposed below.
- an ultraviolet ray prevention layer above this layer in order to prevent deterioration due to ultraviolet rays.
- the preferred stacking order is: antireflection layer / hard coat layer / transparent resin layer / ultraviolet ray cut layer / color correction layer / infrared ray cut layer / electromagnetic wave shield layer / transparent substrate layer, antireflection layer / hard coat layer / transparent Resin layer / UV cut layer / color correction layer / infrared cut layer / transparent substrate layer / electromagnetic shielding layer, antireflection layer / hard coat layer / transparent resin layer / ultraviolet cut layer / color correction layer / transparent substrate layer / Examples thereof include an infrared cut layer / electromagnetic wave shield layer, antireflection layer / hard coat layer / transparent resin layer / ultraviolet ray cut layer / color correction layer / transparent substrate layer / electromagnetic wave shield layer / infrared ray cut layer.
- the PDP filter of the present invention can be used by being attached to the display surface of a PDP panel.
- a PDP filter may be directly attached to the display surface, or a space may be provided between the display surface and the display surface of the panel ( When the distance d from the outermost surface) to the outermost surface on the filter one viewing side is set to 2 to 20 mm, it is possible to maintain the clearest transmitted image and to improve the antireflection effect.
- the PDP filter according to the present invention has a multilayer structure in which a plurality of layers are laminated, and fine irregularities with controlled width, length, height and density at the interface between at least one of them.
- Providing a structure with a structure (hereinafter referred to as an interface waviness structure) provides a PDP filter that is superior in anti-reflection and transmitted image sharpness, and further in interference fringe suppression performance. This is preferable.
- the interface waviness structure preferably has a shape described below.
- Interface ridge The width is preferably;! To 100 ⁇ m, more preferably 10 to 60 ⁇ m, and even more preferably 10 to 30 ⁇ m.
- the interfacial waviness length is preferably;! To 500 ⁇ m, more preferably 10 to; 100 ⁇ m, still more preferably 10 to 60 111, and particularly preferably 10 to 30 111.
- the interfacial undulation height is preferably 0.05 to 3 ⁇ 111, more preferably 0.5 ⁇ , ⁇ — ⁇ 5 ⁇ m, more preferably 0.1 to 1111, and particularly preferably (or 0.1 to 0).
- Interface swell occupancy preferably (preferably 60 to; 100%, more preferably 70 to 90%, and even more preferably 75 to 85%.
- the swell structure of such an interface is convex). It can be a structure or a concave structure (see Figure 1)
- the length on the short axis side is "interface waviness width" and the length on the long axis side is “interface waviness length” in the photograph of the interface structure taken with an optical microscope. It is prescribed. When it is close to a circle, the diameter is used. When it is close to an ellipse, the minor axis is the interface waviness.
- the interface waviness height is less than 0.05 m, or when the interface waviness occupancy is less than 60%, the effect of suppressing reflection tends to decrease.
- the interfacial waviness width exceeds 100 am, or when the interfacial waviness length exceeds 500 m, screen glare tends to occur due to the lens effect of the interfacial waviness structure.
- the interface waviness width or interface waviness length is less than 1 m, or when the interface waviness height is 3 m or more, the transmitted image sharpness tends to deteriorate.
- the difference in refractive index between the two layers sandwiching the surface on which the interface undulation structure is formed is 0.05 to 0.3.
- the difference in refractive index is more preferably from 0.;! To 0.2.
- the difference in refractive index exceeds 0.3, the light diffusibility increases and the image sharpness tends to deteriorate. If the difference in refractive index is less than 0.05, the light diffusibility becomes weak and the effect of reducing the reflection tends to be reduced.
- the PDP filter is preferably arranged in the order of the antireflection layer / hard coat layer / transparent resin layer in order from the outermost layer. This is because such a configuration can reduce the reflection and reduce the reflection, and can increase the surface hardness.
- a problem with this configuration is that interference fringes (Newton rings) occur when the hard coat layer has uneven thickness.
- interference fringes Newton rings
- the generation of interference fringes can be suppressed. Where the interface swell height The higher the interface waviness occupancy is, the better the reduction of interference fringes is.
- the haze of the filter increases and the transmitted image becomes clear. May adversely affect image quality characteristics, such as image quality.
- image quality characteristics such as image quality.
- One method for controlling the shape of the interface waviness structure is to transfer a bowl-shaped surface shape such as an embossing tool having an uneven structure.
- a mold On one side of the transparent resin layer, a mold is pressed to form a concavo-convex structure on the surface, and a coating agent (hereinafter referred to as a hard coat composition) for forming a hard coat layer on the obtained concavo-convex structure is applied.
- a coating agent hereinafter referred to as a hard coat composition
- it is effective to perform heat treatment for about 10 to 40 seconds at a high temperature of 220 to 245 ° C.
- the transferred shape after pressing can be changed, and the width, height, and occupation ratio of the concavo-convex formed as a result can be changed. Can be controlled. It can also be controlled by the pressing pressure at the time of transfer and the pressing temperature.
- a concave / convex structure is formed between the hard coat layer and the transparent resin layer, the concave / convex structure is transferred to a transparent resin layer such as a transparent thermoplastic film, and then the hard coat layer is formed on the surface on which the concave / convex structure is formed. By laminating, it is possible to obtain the desired structure.
- the concavo-convex structure can be appropriately selected and applied from fine rugged to rough.
- a pattern in which irregularities such as a pattern, a mat, a lenticular lens, and a sphere are regularly or randomly arranged can be used. Examples include, but are not limited to, a convex portion or a concave portion formed of a part of a sphere having a diameter of a convex portion or a concave portion of 1 to 100 ⁇ m and a height of 0.01 to 0.5. .
- the transfer method using an embossing roll is one of the powerful methods for forming an interfacial waviness structure, but in order to uniformly form a concavo-convex structure having a relatively low height, the in-line coating described below is used. It is better to use the law.
- the in-line coating method uses a thermoplastic resin film as a transparent resin layer, This is a method of coating the hard coat composition in the middle of the process of forming a plastic resin film.
- a thermoplastic resin film As a transparent resin layer, a controlled interface undulation structure can be formed between the transparent resin layer and the hard coat layer by selecting the film forming conditions and the hard coat composition.
- the hard coat composition By applying the hard coat composition to the appropriately crystallized polyester film, the hard coat composition partially penetrates into the polyester film. Thereafter, the polyester film in a state where the uncured hard coat composition is laminated is stretched in the width direction, whereby a concavo-convex structure is formed due to the difference in stretchability between the permeation portion and the non-penetration portion.
- the uneven structure can be controlled by adjusting the composition of the hard coat composition.
- the film stretched in the width direction is continuously guided to a heat treatment step and is heat-treated at about 220 ° C to 245 ° C, whereby the hard coat layer is cured and adhered to the base film. Improves. A longer heat treatment time is preferable, but it is desirable that the heat treatment time be about 10 to 40 seconds depending on the temperature. In addition, when the film is formed at high speed and the amount of heat is insufficient, a method of curing by irradiating active rays such as ultraviolet rays after heat treatment is effective.
- PET polyethylene terephthalate
- PET pellets (extrinsic viscosity 0.62 dl / g) containing 0.2% by weight of silica particles with an average particle size of 0.3 and 1 m are vacuum-dried at 180 ° C for about 2 hours to obtain sufficient moisture. Then, it is supplied to an extruder, melt extruded at a temperature of 260 to 300 ° C, and formed into a sheet from a T-shaped die. The sheet-like material thus obtained is cooled and solidified on a mirror-like cooling drum to obtain an unstretched sheet. At this time, it is preferable to use an electrostatic application method for the purpose of improving the adhesion to the cast drum.
- the obtained unstretched sheet is stretched by 2.5 to 3.5 times in the longitudinal direction with a roll group heated to 70 to 120 ° C.
- the hard coat composition is applied to the surface of the film stretched uniaxially in this way, and then guided to a tenter while gripping both ends of the film with a clip.
- the laminated film stretched in the width direction is further subjected to a heat treatment to complete the crystal orientation of the PET film and the coating film curing while performing a relaxation treatment of 3 to 10% in an atmosphere of 220 to 245 ° C.
- the in-line coating method described above a wavy structure is formed at the interface between the hard coat layer and the transparent resin layer, and at the same time, a concavo-convex structure is also formed on the surface of the hard coat layer. Therefore, in the case of an antireflection layer / hard coat layer / transparent resin layer configuration, an antireflection layer is formed on such a hard coat layer, so that the antireflection layer as the outermost layer has the desired undulation.
- a structure can be formed.
- the undulation structure of the hard coat layer surface can be adjusted by controlling the leveling conditions after in-line coating, and a concavo-convex structure with a low height can be uniformly formed on the surface.
- leveling means smoothing the surface of the hard coat layer by applying a hard coat composition on the transparent resin layer and then heat-treating it at a temperature at which the hard coat composition is not completely cured. It is a process to make. The longer the temperature during the leveling process, the smoother the surface of the hard coat layer. Conversely, the shorter the time during which the temperature of the leveling process is lowered, the steeper concavo-convex structure on the surface of the hard coat layer.
- the temperature of the leveling step is preferably in the range of 160 to 200 ° C.
- the time for the leveling step is preferably 5 to 60 seconds.
- the hard coat layer is leveled and smoothed according to the leveling conditions. Thereafter, the hard coat layer is completely cured and fixed in structure by further heat treatment at a temperature of 220 to 245 ° C. for about 10 to 40 seconds.
- the hard coat film thus obtained has a controlled surface undulation structure and an interface undulation structure, and even if an antireflection layer having a thickness of 100 to 300 nm is provided thereon, the surface undulation structure is maintained. The In this way, a film in which the undulation structure on the surface of the antireflection layer and the undulation structure on the interface are controlled can be produced.
- the transparent resin layer in the present invention is usually used as a substrate for laminating an antireflection layer, a hard coat layer, an infrared cut layer, an electromagnetic wave shielding layer, and the like. Moreover, the role as an ultraviolet-ray cut layer can also be played by adding an ultraviolet-absorbing component.
- the transparent resin layer is preferably a film that can be formed into a melt or a solution. Its ingredients Examples of the body include films made of polyester, polyolefin, polyamide, polyphenylene sulfide, cellulose ester, polycarbonate, acrylate, and the like. These films are suitably used as a base material for each functional layer in the present invention.
- a resin excellent in transparency, mechanical strength, dimensional stability, etc. is required.
- Specific examples include polyester, cellulose ester, acrylic (poly acrylate) and the like.
- cellulose ester triacetyl cellulose can be exemplified as a suitable material.
- a resin having a cyclic structure in the molecule is a suitable material having excellent optical isotropy.
- the resin having a cyclic structure in the molecule include an acrylic resin containing 10 to 50% by weight of a dartaric anhydride unit.
- polyester is particularly preferable as a material that has a balanced performance in all of the various characteristics and can be applied to all the functional layer substrates in the present invention.
- polyesters examples include polyethylene terephthalate, polyethylene 2, 6-naphthalate, polypropylene terephthalate, polybutylene terephthalate, and polypropylene naphthalate.
- polyethylene terephthalate which is preferably polyethylene terephthalate or polyethylene 2,6 naphthalate
- two or more kinds of polyesters may be mixed.
- polyesters obtained by copolymerizing these and other dicarboxylic acid components or diol components may be used, but in this case, the degree of crystallinity is preferably 25% or more, more preferably in a film in which crystal orientation is completed. Is preferably 30% or more, more preferably 35% or more. When the degree of crystallinity is less than 25%, dimensional stability and mechanical strength tend to be insufficient. The degree of crystallinity can be measured by a Raman spectrum analysis method.
- its intrinsic viscosity (measured in 25 ° C o-open mouth phenol in accordance with JIS K7367) is preferably 0.4 ⁇ ;! ⁇ 2dl / g More preferably, it is 0.5-0. 8 dl / g.
- the transparent resin layer may be a composite film having a laminate structure of two or more layers.
- the inner layer portion substantially does not contain particles, and the surface layer portion contains particles.
- the composite film may be a chemically different polymer or an identical polymer in the inner layer portion and the surface layer portion. However, when applying particles, etc., it is necessary to stop to such an extent that transparency is not affected.
- the film is crystal-oriented by biaxial stretching.
- the crystal orientation by biaxial stretching means that the thermoplastic resin film which has not been stretched, that is, before the completion of crystal orientation, is preferably stretched about 2.5 to 5 times in the longitudinal direction and the width direction, respectively. After that, the crystal orientation is completed by heat treatment, and it shows a biaxial orientation pattern by wide-angle X-ray diffraction.
- the thickness of the transparent resin layer is appropriately selected depending on the intended use, but is preferably 10 to 500 ⁇ m, more preferably 20 to 300 ⁇ m from the viewpoint of mechanical strength and handling properties. It is.
- the transparent resin layer may contain various additives, resin compositions, cross-linking agents, and the like within a range that does not impair the effects of the present invention, particularly the optical properties.
- antioxidants heat stabilizers, UV absorbers, organic particles, inorganic particles (for example, silica, colloidal silica, alumina, alumina sol, kaolin, talc, my strength, calcium carbonate, barium sulfate, carbon black, zeolite, (Titanium oxide, fine metal powder, etc.), pigment, dye, antistatic agent, nucleating agent, acrylic resin, polyester resin, urethane resin, polyolefin resin, polycarbonate resin, alkyd resin, epoxy resin, urea resin, phenol resin, silicone Resins, rubber resins, wax compositions, melamine crosslinking agents, oxazoline crosslinking agents, methylolated, alkylolized urea crosslinking agents, acrylamides, polyamides, epoxy resins
- the transparent resin layer preferably has a total light transmittance of 90% or more and a haze of 1.5% or less. By applying such a material, the visibility and sharpness of the image can be improved. it can.
- the transparent resin layer preferably has a transmission b value of 1.5 or less. If the transmission b value exceeds 1.5, the transparent resin layer itself appears slightly yellow, which may impair the image clarity.
- the b value is a color specification method defined by the International Commission on Illumination (CIE).
- CIE International Commission on Illumination
- the b value represents the saturation. If the sign is positive, the hue is yellow. If the sign is negative, the hue is blue.
- the larger the absolute value the greater the saturation of the color, and the brighter the color. The smaller the absolute value, the smaller the saturation. If it is 0, it indicates an achromatic color.
- Color adjustment can be achieved by using, for example, colored inorganic pigments, organic pigments, dyes, and the like as the dyes that can be realized by containing the dyes. Excellent weather resistance.
- Organic pigments such as milorib nore, cobalt blue, cerulean blue, cobalt silica blue, cobalt zinc blue, manganese violet, mineral violet, and cobalt violet are preferably used.
- the hard coat layer is preferably laminated on at least one side of the transparent resin layer.
- the hard coat layer include acrylic resins, silicone resins, melamine resins, urethane resins, alkyd resins, thermosetting resins such as fluorine resins, and photocurable resins. Considering the balance of performance, cost, and productivity, attalylate resins are preferably applied.
- the acrylate resin is preferably a resin mainly composed of polyfunctional acrylate.
- the polyfunctional acrylate is a monomer or oligomer or prepolymer having 3 or more, more preferably 4 or more, and still more preferably 5 or more (meth) attayloxy groups per molecule.
- ⁇ (meta) atari ⁇ ' is an abbreviation of“ ⁇ atari ⁇ or • ⁇ meta atari ⁇ ”. is there.
- Specific examples include pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol.
- Penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, trimethylol propane tri (meth) acrylate, trimethylol propane EO modified tri (meth) acrylate, penta erythritol triatalyre Use one-hexamethylene diisocyanate urethane prepolymer, pentaerythritol retriate related tolylene diisocyanate urethane prepolymer, pentaerythritol retriate talirele one-isophorone diisocyanate urethane prepolymer, etc. Can do. These can be
- the content of these polyfunctional acrylates is 50% of the total amount of the hard coat layer components.
- ⁇ 90% by weight is preferred, more preferably 50 ⁇ 80% by weight.
- a monofunctional or difunctional acrylate in combination for the purpose of relaxing the rigidity of the hard coat layer or reducing the shrinkage during curing.
- the monomer having 2 to 2 ethylenically unsaturated double bonds in one molecule any ordinary monomer having radical polymerization can be used without particular limitation.
- the content of the monomer having 1 to 2 ethylenically unsaturated double bonds in one molecule is preferably 10 to 40% by weight based on the total amount of the constituent components of the hard coat layer. Preferably, it is 20 to 40% by weight.
- a reactive diluent can be used in the hard coat composition.
- a reactive diluent serves as a solvent for the coating process as a coating medium, and also has a group that itself reacts with a monofunctional or polyfunctional acrylic oligomer.
- a coating property improver As a modifier of the hard coat layer, a coating property improver, an antifoaming agent, a thickener, an antistatic agent, an inorganic particle, an organic particle, an organic material, and the like within a range that does not impair the curing reaction.
- a lubricant S organic polymer compounds, ultraviolet absorbers, light stabilizers, dyes, pigments or stabilizers.
- a method of curing the hard coat composition for example, a method of irradiating ultraviolet rays as active rays, a high temperature heating method, or the like can be used. When using these methods, it is desirable to add a photopolymerization initiator or a thermal polymerization initiator to the hard coat composition.
- the photopolymerization initiator examples include acetophenone, 2,2-ethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, and benzophenone. Sulfur compounds such as Noreuid, Chi-Xanthone, 2-Black Thioxanthone and 2-Methylthioxanthone can be used. These photopolymerization initiators may be used alone or in combination of two or more. Further, as the thermal polymerization initiator, it is possible to use a peroxide compound such as benzoyl peroxide or diethyl butyl peroxide with a force S.
- a peroxide compound such as benzoyl peroxide or diethyl butyl peroxide with a force S.
- the amount of the photopolymerization initiator or thermal polymerization initiator used is suitably 0.01 to 10 parts by weight with respect to 100 parts by weight of the hard coat composition.
- an electron beam or gamma ray is used as a curing means, it is not always necessary to add a polymerization initiator.
- Addition of a thermal polymerization initiator is not always necessary when thermosetting at a high temperature of 200 ° C or higher.
- a thermal polymerization inhibitor such as hydroquinone, hydroquinone monomethyl ether, 2,5-t-butyl hydroquinone or the like may be added to the hard coat composition in order to prevent thermal polymerization during production and soot reaction during storage. desirable.
- the addition amount of the thermal polymerization inhibitor is preferably 0.005-0.05% by weight based on the total weight of the hard coat composition.
- a hard coat layer when a hard coat layer is formed on a transparent resin layer by using an in-line coating method, it is preferable to contain a melamine-based crosslinking agent in the hard coat composition.
- a melamine-based crosslinking agent in the hard coat composition, the adhesion between the hard coat layer and the transparent resin layer is increased.
- the melamine-based cross-linking agent has the effect of controlling the concavo-convex structure by penetrating into the transparent resin layer when the hard coat composition is applied in the in-line coating method, so the interference fringe reduction effect is also enhanced.
- the type of melamine-based crosslinking agent is not particularly limited, but is partially obtained by reacting melamine, a melamine derivative obtained by condensing melamine and formaldehyde, or a lower alcohol to methylolated melamine! /, May be a completely etherified compound or a mixture thereof.
- a monomer, a condensate composed of a dimer or higher polymer, or a mixture thereof can be used.
- As the lower alcohol used for etherification methyl alcohol, ethyl alcohol, isopropyl alcohol, n-propyl alcohol, n butanol, isobutanol, etc. can be used.
- the functional group preferably has an imino group, a methylol group, or an alkoxymethyl group such as a methoxymethyl group or a butoxymethyl group in one molecule.
- methylolated melamine and fully alkylated melamine are preferred in terms of adhesiveness and interference fringe-free! /.
- the amount of the melamine-based cross-linking agent is 2 to 40% by weight, more preferably 5 to 35% by weight, more preferably 10 to 30% by weight in the solid content of the hard coat composition. Preferred in terms of balance between hardness and interference fringes.
- the acid catalyst P-toluenesulfonic acid, dodecylbenzenesulfonic acid, dimethyl pyrophosphoric acid, styrenesulfonic acid, and derivatives thereof can be suitably used.
- the addition amount of the acid catalyst is 0.05 to 10% by weight, more preferably 1 to 5% by weight with respect to the melamine crosslinking agent.
- a melamine-based crosslinking agent it is particularly preferable from the viewpoint of improving adhesiveness to use a polyfunctional acrylate having at least one hydroxyl group.
- a leveling agent is preferably used to smooth the surface of the hard coat layer.
- Typical leveling agents include silicone leveling agents, acrylic leveling agents, and fluorine leveling agents. When only smoothness is required, a silicone leveling agent is preferable even if a small amount is added.
- the silicone leveling agent those having polydimethylsiloxane as a basic skeleton and having a polyoxyalkylene group added thereto (for example, SH190 manufactured by Toray Dow Cowing Silicone Co., Ltd.) are suitable.
- a laminated film is further provided on the hard coat layer, it is necessary not to impair the applicability and adhesion of the laminated film.
- an acrylic leveling agent it is preferable to use “ARUFON (registered trademark) UP 1000 series, U H2000 series, UC3000 series: manufactured by Toagosei Co., Ltd.”.
- the leveling agent is preferably contained in the hard coat composition in an amount of 0.0;! To 5% by weight.
- the hard coat layer is directly laminated on the transparent resin layer without interposing an adhesive layer between the transparent resin layer and the hard coat layer.
- the adhesive layer is present, interference fringes are caused by the difference in refractive index between the adhesive layer and the transparent resin layer or the hard coat layer. May occur, the adhesive layer may deteriorate due to ultraviolet rays, and the durability of adhesion in a hot and humid state may be poor.
- various application methods such as reverse coating, gravure coating, rod coating, bar coating, die coating or spray coating can be used.
- the thickness of the hard coat layer may be determined depending on the use, but usually 0 ⁇ 111 to 111 to 30 m is preferred, more preferably l ⁇ m to 15 ⁇ m, more preferably 2 to 8 ⁇ m. If the thickness of the hard coat layer is less than 0.1 m, the surface is sufficiently thin even if it is sufficiently cured, and there is a tendency that the surface hardness is sufficient and scratches are likely to occur. On the other hand, when the thickness exceeds SO ⁇ m, it is in the # 1 direction, where curling during curing and cracks in the cured film easily occur due to stress such as bending.
- the transparent substrate layer in the present invention imparts mechanical strength to the PDP body, and an inorganic compound molded product or a transparent organic polymer molded product is used.
- Preferred examples of the inorganic compound molded article include glass, tempered or semi-tempered glass, and the like.
- the preferred thickness in this case is in the range of 0.;! To 10 mm, more preferably 1 to 4 mm.
- the polymer molded product is not particularly limited as long as it is transparent in the visible wavelength region.
- PET polyethylene terephthalate
- polyethersulfone polystyrene
- polyethylene naphthalate polyarylate
- polyetheretherketone examples include polycarbonate, polypropylene, polyimide, triacetyl cellulose and the like.
- These transparent polymer molded products may be in the form of a plate (sheet) or a film as long as the main surface is smooth.
- the base material is excellent in dimensional stability and mechanical strength, so that a transparent laminate excellent in dimensional stability and mechanical strength can be obtained. When it is required, it can be suitably used.
- the transparent polymer film has flexibility, and the functional layer can be continuously formed by a roll-to-roll method.
- a laminate of functional layers can be produced in a long and large area.
- the film thickness is 10-250 ⁇ m is preferably used. If the thickness of the film is less than 10 m, the mechanical strength as a substrate is insufficient, and if the thickness exceeds 250 m, the flexibility is insufficient, so that the film is not suitable for winding with a roll.
- the color correction layer is a layer containing a dye having a color correction capability, and performs color tone correction of transmitted visible light to improve the image characteristics of the PDP, more specifically, to achieve high contrast and high color clarity. It is.
- the color correction layer also allows the transmittance of the entire PDP filter to be adjusted, and plays a role in adjusting the reflection performance.
- Color tone correction is achieved by selectively absorbing visible light having a specific wavelength out of visible light transmitted through the PDP filter.
- the dye contained in the color correction layer selectively absorbs visible light having a specific wavelength.
- the dye can be either a dye or a pigment. “Selectively absorb visible light having a specific wavelength” means specifically absorbing light in a specific wavelength region in the visible light wavelength region (wavelength 380 to 780 nm).
- the wavelength region specifically absorbed by the dye may be a single wavelength region or a plurality of wavelength regions.
- pigments examples include known organic pigments, organic dyes, and inorganic pigments. Of these, phthalocyanine dyes or anthraquinone dyes are particularly preferred because of their good weather resistance. Two or more kinds of pigments may be contained.
- the color correction layer can take various forms as long as it contains a dye having color tone correction ability.
- the color correction layer may be formed by a suitable method depending on the mode. For example, in the case of a mode in which a colorant having a color tone correcting ability is contained in the pressure-sensitive adhesive, a colorant having a desired thickness is applied by adding the colorant having a color tone correcting capacity as a dye or pigment in the pressure-sensitive adhesive. A positive layer may be formed.
- the pressure-sensitive adhesive a commercially available pressure-sensitive adhesive can be used.
- Preferable specific examples include acrylic ester copolymer, polychlorinated butyl, epoxy resin, polyurethane, butyl acetate copolymer, styrene acrylic Mention may be made of adhesives such as copolymers, polyesters, polyamides, polyolefins, styrene-butadiene copolymer rubbers, butyl rubbers, or silicone resins.
- the color tone correction layer is a transparent resin layer containing a dye having a color tone correction capability Then, dissolve the thermoplastic resin used as the raw material of the transparent resin layer in a desired solvent, apply a solution to which a dye having color tone correction ability is added, and dry it to form a color tone correction layer! /.
- a method of applying a solution containing a dye having color tone correction ability for example, a dip coating method, a roll coating method, a spray coating method, a gravure coating method, a comma coating method, a die coating method and the like can be selected. These coating methods can be processed continuously and are more productive than batch-type deposition methods! Alternatively, a spin coating method that can form a thin and uniform coating film can also be employed.
- the thickness of the color correction layer is preferably 0.5 111 or more in order to obtain a sufficient color tone correction capability. Also, it is preferably 40 in or less because of its excellent light transmittance, more specifically visible light transmittance; it is particularly preferably from 25 to 25 m.
- the thickness force of the color correction layer is 0 m or more, when the color correction layer is formed by applying a solution containing the desired dye, pigment, and transparent resin, the solvent remains and the color correction layer is formed immediately. It is not preferable because operability is deteriorated.
- the color correction layer is a pressure-sensitive adhesive layer or a transparent resin layer containing a dye having color tone correction ability
- the dye may be contained in an amount of 0.1% by mass or more based on the pressure-sensitive adhesive or resin. 1% by mass or more is particularly preferable. Further, in order to maintain the physical properties of the pressure-sensitive adhesive layer or the transparent resin layer, it is preferable to suppress the amount of the dye having color tone correction ability to 10% by mass or less.
- the near-infrared light generated from the PDP acts on peripheral electronic devices such as remote controllers and cordless phones, causing malfunctions. Therefore, light in the near-infrared region is cut to a level that is practically problematic. There is a need.
- the wavelength range in question is 800 to; OOOnm, and the transmittance in the wavelength range is preferably 20% or less, preferably 10% or less.
- the maximum absorption wavelength is usually 750 ⁇ ; dyes with near-infrared absorption ability of UOOnm, specifically, metal complex, aminium, phthalocyanine, naphthalocyanine, Zymonium dyes are preferably used. Two or more dyes may be contained.
- the structure, formation method, thickness, and the like of the near-infrared absorbing layer are the same as those of the color correction layer described above.
- the near-infrared absorbing layer is the same layer as the color correction layer, that is, the color correction layer has a color correction capability.
- a dye having a near-infrared absorbing ability, or a color correction layer and another infrared cut layer may be provided.
- the amount of the near-infrared absorbing dye is preferably 0.1% by mass or more with respect to the binder resin, and particularly preferably 2% by mass or more.
- the pressure-sensitive adhesive layer or transparent resin containing the infrared absorber is preferable. In order to maintain the physical properties of the layer, it is preferable to keep the total amount of the dye having a color tone correcting ability and the near-infrared absorber to 10% by mass or less.
- the discharge gas enclosed in the PDP panel for example, the two component gas of neon and xenon, power, etc., the extra emission color (mainly wavelength range from 560 to 610 nm)
- the extra emission color mainly wavelength range from 560 to 610 nm
- the display color of the visible light emitted from the PDP panel is displayed.
- the display color can be brought close to and natural colors can be displayed.
- the ultraviolet cut layer has a role of preventing photodegradation of the dye contained in the color correction layer, the infrared cut layer, and the like located on the panel side of this layer.
- a transparent resin layer containing an ultraviolet absorber, an adhesive layer, and the like are used for the ultraviolet cut layer.
- an ultraviolet absorber is contained in the transparent resin layer from the outermost surface on the viewer side, in a configuration that continues from the antireflection layer / hard coat layer / transparent resin layer. Les.
- Preferred examples of the ultraviolet absorber include salicylic acid compounds, benzophenone compounds, benzotriazole compounds, cyanoacrylate compounds, benzoxazinone compounds, and cyclic imino ester compounds. It can.
- a benzoxazinone-based compound is most preferable from the viewpoints of ultraviolet cut ability and color tone at 380 nm to 390 nm. These compounds may be used alone or in combination of two or more. The use of stabilizers such as H ALS (hindered amine light stabilizers) and antioxidants is more preferred.
- the transmittance at a wavelength of 380 nm is preferably 5% or less.
- the base material can protect the dye pigment from ultraviolet rays.
- the content of the ultraviolet absorber in the ultraviolet cut layer is from 0.;! To 5 mass%, which is excellent in the effect of preventing photodegradation of the dye contained in the color correction layer, and is a transparent resin. It is more preferably 0.2 to 3% by mass because it does not impair the strength of the layer or the adhesive layer.
- the UV-cut layer preferably has a thickness force in the range of 3 ⁇ 4 to 250111, more preferably 50 to 200 ⁇ 111, and still more preferably 80 to 200 ⁇ 111.
- the thickness force of the ultraviolet and soot absorbing layer is in the range of 5 to 250 m, it is excellent in the effect of absorbing the ultraviolet rays incident from the observer side of the PDP filter, and more specifically, the light transmittance. Excellent visible light transmission.
- the antireflection layer preferably has a configuration in which a low refractive index layer and a high refractive index layer are laminated from the outermost layer side as a configuration in which performance and cost are balanced. This antireflection layer is preferably laminated on the hard coat layer.
- the method for forming the antireflection layer is not particularly limited, but considering the balance between cost and performance, a method of applying a paint by wet coating is preferable.
- a method of applying a paint by wet coating is preferable.
- the wet coating microgravure coating, spin coating, dip coating, force ten-flow coating, roll coating, spray coating, flow coating, etc. can be preferably used. From the point of uniformity of coating thickness, microgravure coating is preferably used.
- the applied paint is heated, dried, and cured with active rays such as heat or ultraviolet rays to form a film.
- the antireflection layer is not particularly limited as long as it has antireflection performance, but the following are particularly preferred embodiments of the antireflection layer.
- the refractive index (nL) of the low refractive index layer is 1.23-1.42 force S, more preferably 1.34 to
- the refractive index (nH) of the high refractive index layer is preferably from 1.55 to 1.80, more preferably from 1.60 to 1.75. Also, the refractive index difference between the low refractive index layer and the high refractive index layer is 0.
- the refractive index (nG) of the hard coat layer is in the range of 1.45 to 1.55, and the refractive index of the low refractive index layer (nU and the refractive index of the high refractive index layer (nH).
- the following formula (1) and formula (2) Satisfaction is preferable because the minimum reflectance can be lowered.
- the wavelength of visible light ( ⁇ ) to be prevented from being reflected is arbitrarily selected as long as it is in the visible light range, and is usually in the range of 450 to 650 nm.
- the thickness (dH) of the high refractive index layer is 100 to 300 nm.
- Range force S is preferred, more preferably in the range of 100-200 nm.
- the thickness of the low refractive index layer (dU) is preferably in the range of 70-160 nm, more preferably 80-; 140 nm, even more preferably 85-; 105 nm.
- the constituent of the high refractive index layer is preferably a resin composition in which metal compound particles are dispersed in order to increase the refractive index and to impart antistatic properties to the antireflection layer surface. Yes.
- a (meth) acrylate compound is preferably used as the resin component.
- the (meth) acrylate compound is preferably radically polymerized by irradiation with actinic rays, and is preferably used to improve the solvent resistance and hardness of the formed film. Furthermore, two or more (meth) attalyloyl groups are present in the molecule.
- the polyfunctional (meth) acrylate compound is particularly preferable because it improves solvent resistance and the like.
- pentaerythritol retri (meth) acrylate trimethylol propane tri (meth) acrylate, glycerol tri (meth) acrylate, ethylene modified trimethylol propane tri (meth) acrylate, tris (2-hydroxy) Ethyl) isocyanuric acid ester tri (meth) acrylate, trifunctional (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipenta erythritol penta (meth) acrylate, dipenta erythritol hex (meth) acrylate And tetrafunctional or higher functional (meth) acrylate.
- Various conductive metal oxide particles are preferably used as the metal compound particles.
- tin-containing antimony oxide particles ATO
- zinc-containing antimony oxide particles ITO
- tin-containing indium oxide particles ITO
- zinc oxide / aluminum oxide particles ITO
- antimony oxide particles More preferably, tin-containing indium oxide particles (ITO) are used.
- the metal compound particles have an average primary particle diameter (sphere equivalent diameter measured by BET method) of 0.5 ⁇ m. Particles of m or less are preferably used from the viewpoint of transparency of the high refractive index layer. More preferably, particles having a particle size of 0.001 ⁇ 0.3 ⁇ m, and more preferably 0.005 ⁇ 0.2 m are used.
- the blending ratio of the constituent components of the high refractive index layer is a mass ratio of the resin component and the metal compound particles. Force is preferably 0/90 to 30/70 S, more preferably 15/85 to 25/75 It is. Metal compound particle strength S If the preferred range, the resulting film has high transparency and good electrical conductivity, and the physical and chemical strength of the resulting film does not deteriorate.
- the high refractive index layer can be formed by preparing a coating liquid preferably dispersed with a solvent, applying the coating liquid on the hard coat layer, and then drying and curing.
- the low refractive index layer can be obtained by coating a coating composition comprising fine silica particles having cavities therein, a siloxane compound, a curing agent, and a solvent, so that the refractive index is lowered and the surface reflectance is increased. This is preferable because it can be lowered.
- the siloxane compound which is a matrix material, and the silica fine particles are firmly bonded to improve surface hardness and excellent scratch resistance.
- the siloxane compound is previously reacted with the surface of the silica fine particles and bonded at the stage of the coating composition before coating.
- a coating composition for this purpose is obtained by hydrolyzing a silane compound in a solvent with an acid catalyst in the presence of silica fine particles to form a silanol compound and then subjecting the silanol compound to a condensation reaction. You can get the power S.
- the silica fine particles preferably have a silanol group on the surface.
- the obtained paint contains a siloxane compound which is a condensed product of these silane compounds. Also, these silane compounds are hydrolyzed and can be condensed to contain les, nales and silanol compounds.
- the content of the siloxane compound is preferably 20% by mass to 70% by mass, and particularly preferably 30% by mass to 60% by mass, based on the total amount of the film. It is preferable to contain the siloxane compound within this range because it can reduce the refractive index of the coating and increase the hardness of the coating. Therefore, the content of the siloxane compound in the paint is preferably in the above range for all components except the solvent. [0115] Among these, for lowering the refractive index, trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, trifluoropropyltrimethoxysilane, and trifluoropropyltriethoxysilane are selected.
- the amount of the silane compound is preferably 20% by mass to 80% by mass, and particularly preferably 30% by mass to 60% by mass with respect to the total amount of silane compounds. If the amount of the silane compound is less than 20% by mass, the lowering of the refractive index may be insufficient. On the other hand, if the amount of the silane compound exceeds 80 mass%, when force s hardness of the coating is reduced.
- Examples of preferable silane compounds other than the above-mentioned silane compounds include butyltrian, methyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, dimethinoresinoleoxysilane, tetramethoxysilane. And tetraethoxysilane.
- the number average particle diameter of the silica fine particles used in the low refractive index layer is preferably from 1 nm to 200 nm, particularly preferably from 1 nm to 70 nm.
- the number average particle diameter is less than 1 nm, the bond with the matrix material becomes insufficient, and the hardness of the coating film may be lowered.
- the number average particle diameter exceeds 200 nm, the effect of lowering the refractive index may not be sufficiently exhibited.
- the number average particle diameter of the silica fine particles is preferably measured using various particle counters before the silica fine particles are added to the paint.
- the method of measuring the particle diameter of the silica fine particle in a film using an electron scanning microscope or a transmission electron microscope is preferable.
- the silica fine particles having cavities inside used in the low refractive index layer are the refractive index of the particles themselves.
- silica fine particles having cavities therein include silica fine particles having a hollow portion surrounded by an outer shell, and porous silica fine particles having a large number of hollow portions. Silica fine particles having cavities inside are generally available on the market.
- the content of silica fine particles used in the low refractive index layer is preferably 30% by mass to 80% by mass, particularly preferably 40% by mass to 70%, based on the total amount of the film when the film is formed. quality %. Therefore, the content of the silica fine particles in the coating is preferably in the above range with respect to the total components excluding the solvent.
- silica fine particles are included in the coating within this range, the refractive index can be lowered and the hardness of the coating can be increased.
- the content of the silica fine particles is less than 30% by mass, the effect of decreasing the refractive index due to the voids between the particles is reduced.
- the content of the silica fine particles exceeds 80% by mass, many island phenomena occur in the coating film, the hardness of the coating film decreases, and the refractive index becomes uneven depending on the location, which is not preferable.
- curing agents or three-dimensional crosslinking agents that accelerate the curing of the coating composition or facilitate the curing.
- the curing agent include nitrogen-containing organic substances, silicone resin curing agents, various metal alcoholates, various metal chelate compounds, isocyanate compounds and polymers thereof, melamine resins, polyfunctional acrylic resins, and urea resins. One kind or two or more kinds of these may be added.
- metal chelate compounds are preferably used in view of the stability of the hardener and the processability of the obtained film.
- aluminum chelate compounds and / or magnesium chelate compounds with low refractive index are preferred for the purpose of lowering the refractive index.
- metal chelate compounds can be easily obtained by reacting a metal alkoxide with a chelating agent.
- chelating agents include ⁇ -diketones such as acetylacetone, benzoylacetone, and dibenzolmethane; ⁇ -keto esters such as acetoacetate and benzoylacetate.
- aluminum tris (acetyl acetate) and aluminum tris (ethyl acetate acetate) strength are particularly preferred.
- the amount of the curing agent added is preferably from 0.1% by mass to 10% by mass, particularly preferably from 1% by mass to 6% by mass, based on the total amount of silane compounds in the coating composition. is there.
- the total amount of the silane compound means an amount including all of the silane compound, its hydrolyzate and its condensate.
- the content is less than 0.1% by mass, the hardness of the resulting coating is lowered.
- the content exceeds 10% by mass, the hardness of the resulting film is improved, and the power refractive index is increased, which is not preferable.
- a mixture of a solvent having a boiling point of 100 to 180 ° C under atmospheric pressure and a solvent having a boiling point of less than 100 under atmospheric pressure in the coating composition Contains a solvent with a boiling point of 100-180 ° C under atmospheric pressure
- the coating property of the coating liquid is improved, and a film having a flat surface can be obtained.
- the solvent is effectively volatilized during film formation, and a film having high hardness can be obtained. In other words, it is the power to obtain a film having a flat surface and high hardness.
- Solvents having a boiling point of 100 to 180 ° C under atmospheric pressure include propylene glycol monomethyl etherol, propylene glycol monomethino enoate, propylene glycol monopropinore ter, diacetone alcohol and the like. I like it!
- Examples of the solvent having a boiling point of less than 100 ° C under atmospheric pressure include methanol, ethanol, isopropanol, t-butanol, and methyl ethyl ketone. These may be used alone or in combination.
- the total solvent content in the coating composition is preferably in the range of 1300 mass% to 9900 mass%, particularly preferably in the range of 1500 mass% to 6000 mass%, based on the total silane compound content. It is.
- the total amount of the silane compound means an amount including all of the silane compound, its hydrolyzate and its condensate.
- PDP generates strong leakage electromagnetic waves from the panel due to its structure and operating principle.
- the influence of electromagnetic waves leaking from electronic devices on the human body and other devices has been studied, and in Japan, standards based on voluntary control council for interference by prose ssing equipment electronic office machine (V) ⁇
- V prose ssing equipment electronic office machine
- the conductivity of the electromagnetic wave shielding layer is preferably 3 ⁇ / port or less, more preferably 1 ⁇ / port or less, more preferably 0.5 ⁇ / port or less, more preferably in terms of surface resistance. is there.
- Examples of the electromagnetic wave shielding layer include a conductive mesh film and a metal transparent conductive film.
- Examples of the metal transparent conductive film include a transparent resin layer laminated with a transparent metal thin film. Specifically, a metal thin film such as IT0, AZO, AgPd, etc. is laminated on a transparent resin film by sputtering or vapor deposition. Considering the conductivity required for electromagnetic wave shielding, the thickness of the metal thin film is preferably 100 to 500 nm, and the thickness of the transparent resin layer is preferably 80 to 300 ⁇ m.
- the mesh shape is not particularly limited, and may be a lattice shape or a honeycomb shape.
- the method for forming the conductive mesh layer on the transparent resin layer or the like can be performed using a known method.
- 1) Printing methods such as screen printing and gravure printing of conductive ink on the transparent resin layer 2)
- a method of bonding a knitted fabric made of conductive fibers with an adhesive or a pressure-sensitive adhesive 3) A metal foil made of copper, aluminum, nickel, or the like with an adhesive or a pressure-sensitive adhesive
- a method of patterning after forming a metal thin film made of copper, aluminum, or Uckel by various known thin film forming methods such as vapor deposition, sputtering, electroless plating, etc.
- the thickness of the mesh layer in the conductive mesh film is about 0.5 to 20 111, and the thickness is determined by the conductivity, the aperture ratio, and the method of forming the conductive mesh layer.
- the thickness is preferably 5 to 5 m.
- the mesh layer pattern is more suitable as the line width is narrower and the pitch is wider as the aperture ratio and transmittance increase, and moreover, it is less likely to cause modulation caused by interaction with display pixels. .
- the aperture ratio is increased too much, the conductivity becomes insufficient, so that the line width of 5 to 20 ⁇ m and the pitch of 150 to 400 ⁇ m can be suitably employed.
- the mesh pattern is a lattice pattern, for example, the mesh pattern line is at a certain angle (with a certain angle (with respect to the line where the pixels are arranged) so as not to cause a movement due to the interaction with the display pixels arranged vertically and horizontally. Bias angle)! /, Preferably!
- the mesh layer is made of a metal such as copper, aluminum, or nickel, its surface and / or Alternatively, it is preferable to have a black pigment or black dye-containing layer or a black layer made of chromium or the like at the interface with the transparent resin layer, so that reflection by metal can be prevented and contrast can be prevented. And a PDP filter with excellent visibility.
- the electromagnetic wave shielding layer may be formed closer to the panel side of the PDP filter or closer to the observer side. However, since the electromagnetic wave shielding layer often has high reflectivity, the electromagnetic wave shielding layer is closer to the panel side. It is preferable to form. In addition, the arrangement of a color correction layer or a near-infrared cut layer that lowers the transmittance of the filter closer to the viewer than the electromagnetic wave shielding layer is a preferable embodiment because reflected light from the electromagnetic wave shielding layer can be reduced.
- a light diffusion layer in which a component having a refractive index difference with respect to the binder component is dispersed may be further provided.
- the light diffusion layer may be a layer having only a light diffusion function, an antireflection layer, a hard coat layer, a transparent resin layer, an ultraviolet cut layer, an infrared cut layer, an electromagnetic wave shielding layer, a color correction layer, a transparent base material layer.
- a component having a refractive index difference may be dispersed in an interlayer adhesive layer or the like to impart a light diffusion function.
- a component having a refractive index difference is dispersed in the transparent resin layer or the interlayer adhesive layer from the viewpoint of not impairing the original function of the layer and impairing the productivity. preferable.
- inorganic particles such as silica, colloidal silica, alumina, alumina sol, kaolin, talc, my strength, calcium carbonate, barium sulfate, carbon black, zeolite, titanium oxide, metal fine powder, acrylic resin, polyester resin List organic particles such as urethane resin, polyolefin resin, polycarbonate resin, alkyd resin, epoxy resin, urea resin, phenol resin, silicone resin, rubber resin.
- an indirect adhesive layer having adhesiveness may be used to bond the various functional layers described above.
- the pressure-sensitive adhesive used at this time is not particularly limited as long as it is a pressure-sensitive adhesive that adheres two objects by its pressure-sensitive action, and is rubber-based, acrylic-based, or silicone-based.
- an adhesive made of a polybule ether or the like can be used.
- polyfunctional acrylic UV curable paints include Hitachi Chemical Polymer Co., Ltd. (trade name XY series, etc.), Toho Kasei Kogyo Co., Ltd. (trade name No, Ilock series, etc.), ThreeBond Co., Ltd. Use products such as (ThreeBond (registered trademark) series, etc.), Toa Synthetic Chemical Industry Co., Ltd. (Arontite (registered trademark) series, etc.), Cemedine Co., Ltd. (Cemeroc (registered trademark) super series, etc.) However, it is not limited to these.
- the surface roughness of the PDP filter sample was measured using a surface roughness measuring instrument SE-3400 (manufactured by Kosaka Laboratory Ltd.).
- Filter sample for PDP 0.5m 2 is divided into 5 equal parts, and the center of each sample is evaluated by the following method. The measurement at each measurement point is performed in the long side direction and short side direction of the filter, and the average value is obtained. Furthermore, the average value of 5 samples is obtained and used as the Ra and Rz values of this PDP filter sample.
- the layer on which the wavy structure is formed may be peeled off and used for evaluation.
- Ra Surface roughness measuring instrument SE-3400 (manufactured by Kosaka Laboratory) is defined as Ra Parameters. Based on the method of JISB0601—1982!
- Rz A parameter defined as RzD on the surface roughness measuring instrument SE-3400 (manufactured by Kosaka Laboratory). ISB0601—Measured according to the method of 1982!
- Filter sample for PDP 0.5m is divided into 5 equal parts, and the center of each sample is evaluated by the following method.
- An aluminum thin film is deposited on the surface of the PDP filter sample (swell formation surface), and the resulting sample is subjected to an optical microscope (measuring instrument: inspection / research microscope, manufactured by DMLB HC / Leica Microsystems; condition: differential interference filter installed) 1300 X 1030pixels using a digital camera Capture digital images.
- the obtained photographic image is printed in A4 size, and the boundary of the undulation structure is identified from the shade of the image for all the undulation structures in the area of 200 im x 20 C ⁇ m (actual size of the undulation structure). Measure the length of the short axis.
- the average value of the major and minor axes of all waviness structures in the evaluation area is obtained and used as the value of the surface waviness length and surface waviness width of this PDP filter sample. If the wavy structure is difficult to observe because the filter has a multilayer structure, or if it is stuck to glass and is difficult to cut, the layer on which the wavy structure is formed may be peeled off and used for evaluation.
- the major axis is defined as the undulation length
- the minor axis is defined as the undulation width.
- the undulation structure is difficult to observe because the filter has a multilayer structure, or if a film with a undulation structure is bonded to the glass and it is difficult to cut, the layer with the undulation structure is peeled off for evaluation. It may be used.
- Filter sample for PDP 0.5m 2 is divided into 5 equal parts, and the center of each sample is evaluated by the following method.
- Sample optical microscope (measuring machine: inspection ⁇ research microscope DMLB HC
- the average value of the five samples is obtained and used as the value of the interface waviness length and interface waviness width of this PDP filter sample.
- the layer in which the undulation structure is formed may be peeled off and used for evaluation.
- the major axis is defined as the interface waviness length, and the minor axis is defined as the interface waviness width.
- the area ratio is the interface waviness occupancy. Specifically, the waviness part in the target area of the photograph taken of the waviness structure is painted black with magic, and the obtained photo is captured by a scanner to binarize the waviness and non-waviness parts, The area ratio is calculated by Pseudo—Color Areas (pseudo-color area ratio) processing, and the area ratio occupied by the waviness is defined as the interface waviness occupation ratio.
- the average value of 5 samples is obtained and used as the value of the interface waviness occupancy rate of this PDP filter sample. If the filter has a multilayer structure and it is difficult to observe the undulation structure, or if a film with a undulation structure is stuck to the glass and it is difficult to cut, peel off the layer where the undulation structure is formed. It may be used for evaluation.
- Filter sample for PDP 0.5m is divided into 5 equal parts, and the center of each sample is evaluated by the following method. Place the sample on a smooth metal plate, and use a feather shaving blade S single blade to incline the cutting edge at 30 degrees in the direction of travel. If there is a wavy structure between the hard coat layer and the transparent resin layer, insert the blade from the top of the hard coat surface. When a film having a wavy structure is bonded to glass, the film may be peeled off and evaluated. Next, the cut surface was observed with an optical microscope (measuring instrument: inspection / research microscope DMLB HC / manufactured by Leica Microsystems; condition: reflection mode; differential interference filter installed; optical magnification 1000 times) and using a digital camera.
- an optical microscope measuring instrument: inspection / research microscope DMLB HC / manufactured by Leica Microsystems; condition: reflection mode; differential interference filter installed; optical magnification 1000 times
- Capture 1300 X 1030pixels digital images.
- the resulting photographic image is magnified 5 times in the cross-sectional thickness direction and printed in A4 size.
- Swell structure shape Swell from the shortest distance (see Figure 2) between the maximum point and the straight line connecting adjacent local minimum points Calculate the height of. This is measured for all protrusions observed in the region, the average value is obtained, and the protrusion height is obtained by converting the magnification to the actual size.
- the shape line of the interface waviness structure is identified from the difference in color density of the cross section.
- the average value of the five samples is obtained and used as the value of the interface waviness height of this PDP filter sample. If the undulation structure is difficult to observe because the filter has a multi-layer structure, if a glass film with a undulation structure is stuck to the glass and it is difficult to cut, the layer with the undulation structure is peeled off and evaluated. Good for use in.
- a spin coater Using a spin coater, apply the raw material coating material for the layer to be measured so that the dry film thickness is 0.1 m on the silicon wafer. Then, using Inert Oven INH-21CD (manufactured by Koyo Thermo System Co., Ltd.), heat curing at 130 ° C for 1 minute (curing conditions for the low refractive index layer) gives a coating. About the formed film, the refractive index at 633 nm is measured with a phase difference measuring apparatus (manufactured by Nikon Corporation: NPDM-1000).
- the transmittance for incident light from the observer side is measured in the wavelength range of 300 to 1300 nm, and the visible light wavelength range (380 to 780 nm). ) Is obtained.
- the reflectance single-sided reflection
- the luminous reflectance is calculated in the wavelength range of 380 to 780 nm at an incident angle of 5 degrees from the measurement surface as described below, and the luminous reflectance (the reflection reflectance specified in JIS Z8701-1999) is calculated. Find the stimulus value Y).
- ⁇ ⁇ j S (l) -y (l)-R (l) ⁇ (however, the integration interval is 380 to 780 nm)
- a sample prepared by coloring the back surface of the measurement surface (hard coat layer surface side) with black paint in the dark room is the same as in the case of luminous reflectance measurement in 9). Evaluate whether or not the iris pattern can be seen when the sample is viewed while changing the viewpoint, placed 30 cm directly under the fluorescent lamp (National Parruk 3 wavelength daylight white (F. L 15EX-N 15W)) did.
- Evaluation is performed by 5 people at each level! /, And one filter is evaluated, and the most frequently used / judgment result is adopted. If there is the most frequent judgment result, the worse evaluation result is adopted (the most frequent judgment is “B”, “B” if there are two judgment results “A” and “B”). “C” is judged as “C”, and “A” and “C” are judged as “C”.
- Filter sample for PDP on PDP TV (TH-42PX500, manufactured by Matsushita Electric Industrial Co., Ltd., but with genuine filter removed) force on back (surface opposite to viewing side) force on SPDP panel Install so that the panel surface and the filter viewing surface are parallel to each other at a position where the distance from the PDP panel surface to the filter viewing surface is 20 mm.
- Display the pattern image shown in Fig. 4 on the PDP panel of the PDP TV black pattern on a white background: 5 x 100 mm in size).
- Evaluation is performed by five people, evaluating one filter for each level, and adopting the most frequent judgment result. If there is the most frequent judgment result, the worse evaluation result is adopted (the most frequent judgment is “B”, “B” if there are two judgment results “A” and “B”). If "C" is two,
- silica fine particle dispersion liquid having a cavity inside the outer shell having a number average particle diameter of 50 nm isopropanol dispersion type, solid content concentration 20.5%, manufactured by Catalyst Kasei Kogyo Co., Ltd.
- 299.9 parts by mass water 54 parts by mass And 1.8 parts by mass of formic acid were added dropwise with stirring so that the reaction temperature did not exceed 30 ° C.
- the resulting solution is heated at a bath temperature of 40 ° C for 2 hours, then the solution is heated at a bath temperature of 85 ° C for 2 hours, the internal temperature is raised to 80 ° C, and heated for 1.5 hours. Then, it was cooled to room temperature to obtain a polymer solution A.
- Aluminum tris (acetyl acetate) (trade name: Aluminum Chelate A (W), manufactured by Kawaken Fine Chemical Co., Ltd.) as an aluminum-based curing agent was added to the obtained polymer solution A as methanol. What was dissolved in 125 parts by mass was added, and further 1,500 parts by mass of isopropanol and 250 parts by mass of propylene glycol monomethyl ether were added, followed by stirring at room temperature for 2 hours to prepare paint A.
- a film of paint A was formed on a silicon wafer, and the refractive index determined by the method described above was 1.36.
- near-infrared absorbing dyes 14.5 parts by mass of KAYASORB (registered trademark) IRG-0 50 manufactured by Nippon Kayaku Co., Ltd., 8 parts by mass of IETAS Color (registered trademark) IR 10A manufactured by Nippon Shokubai Co., Ltd., and further to 593 nm
- KAYASORB registered trademark
- IETAS Color registered trademark
- IR 10A manufactured by Nippon Shokubai Co., Ltd.
- an organic dye having a main absorption peak 2.29 parts by mass of TAP-2 manufactured by Yamada Chemical Industry Co., Ltd. was stirred and mixed with 2000 parts by mass of methyl ethyl ketone and dissolved. Using this solution as a transparent polymer resin binder solution, stir and mix with 2000 parts by weight of Nippon Shokubai Co., Ltd. NO, RUSUNO, YBRIDD (registered trademark) IR-G205 (solid content concentration 29% solution).
- PET polyethylene terephthalate
- intrinsic viscosity 0 ⁇ 63 dl / g chip without filler was vacuum-dried at 180 ° C for 3 hours.
- the dried chips were supplied to an extruder, melted at 285 ° C, and then extruded into a sheet form from a T-shaped die.
- the extruded resin was wound around a mirror cast drum with a surface temperature of 25 ° C using an electrostatic application casting method, cooled and solidified to obtain an unstretched sheet.
- the unstretched sheet thus obtained was stretched 3.5 times in the longitudinal direction with a roll group heated to 95 ° C. to obtain a uniaxially stretched film.
- the above-described HC paint 1 was applied to one side of this uniaxially stretched film by a die coating method. While holding both ends of the film coated with HC paint 1 with clips, it is guided to the preheating zone of 80-100 ° C, and then stretched by 3.0-4.0 times in the width direction at the stretching zone of 90-100 ° C. After that, the surface roughness was adjusted (leveling) in a 160 to 200 ° C. leveling zone before the heat treatment.
- HC paint 1 was applied to the easy-adhesion surface using a wire bar to form a coating film having a thickness of 10 m.
- Sectional shape semi-ellipse (major axis: 30 m, semi-minor axis: 0.2 m)
- EMI1 electromagnetic shielding film
- hard coat layer forming surface of the hard coat film (HC1) commercially available high-refractive index antistatic paint (JSR Opster (registered trademark) TU4005) is diluted with isopropyl alcohol to a solid content concentration of 8%, It was coated by a gravure coater, dried for 1 minute at 120 ° C, ultraviolet 1. and then cured by irradiation with Oj / cm 2, the refractive index on the hard coat layer is 1.6
- a high refractive index layer having a thickness of 135 nm was formed.
- the above-described low refractive index paint A was applied to the high refractive index layer forming surface as a low refractive index layer with a microgravure coater. Next, it was dried and cured at 130 ° C for 1 minute to form a low refractive index layer having a refractive index of 1.36 and a thickness of 90 nm on the high refractive index layer, thereby producing an antireflective layer (this antireflective layer). Is AR1).
- an electromagnetic shielding film is used so that the substrate surface is on the glass side using an acrylic transparent adhesive.
- EMI1 autoclave treatment
- pressure: 0.5 MPa, temperature: 70 ° C, treatment time: 1 hour was carried out to produce a PDP filter having the structure shown in Table 3.
- the color correction layer 1 was adjusted so that the luminous transmittance of the prepared PDP filter was 40%.
- Table 4 shows the characteristics of the manufactured PDP filter.
- the luminous reflectance was 0.9, and the transmittance was 40%.
- the transmitted image with a high effect of suppressing reflection was very clear, and no interference fringes were observed.
- a PDP filter was produced in the same manner as in Example 1 except that each constituent layer used in the PDP filter was changed as shown in Table 3. As described above, the color correction layer 1 was adjusted so that the luminous transmittance of the prepared PDP filter was 40%.
- Table 4 shows the characteristics of the manufactured PDP filter.
- the luminous reflectance is 0.8 ⁇ ; 1.1, the transmittance is 40%, and the visual evaluation shows that the transmitted image with a high reflection suppression effect is very clear, and the interference fringes. Was also not seen.
- a PDP filter was produced in the same manner as in Example 1 except that each constituent layer used in the PDP filter was changed as shown in Table 3. As described above, the color correction layer 1 was adjusted so that the luminous transmittance of the prepared PDP filter was 40%.
- Table 5 shows the characteristics of the manufactured PDP filter. Since Comparative Examples 1 and 2 had a small surface roughness, the reflection could be observed relatively clearly. In Comparative Example 3, since the occupancy rate of the undulating structure was low, the light diffusion effect was small. Comparative Example 4 is on the surface. However, since there was no waviness structure at the interface, the reflection could be observed very clearly. On the other hand, in Comparative Example 5, the use of an antiglare film resulted in a very large surface roughness and poor transmitted image clarity. Also in Comparative Example 6, the clear image of the transmitted image having a large surface roughness was poor.
- a PDP filter was produced in the same manner as in Example 1 except that the constituent layers from the first layer to the sixth layer used for the PDP filter were changed as shown in Table 3.
- the HC1 was pasted on the 6th layer side of the obtained filter using an acrylic transparent adhesive so that the HC layer side would be the back side of the filter, autoclaving (pressure: 0.5 MPa, temperature: 70 ° C, Processing time: 1 hour).
- the color correction layer 1 was adjusted so that the luminous transmittance of the prepared PDP filter was 40%.
- Table 5 shows the characteristics of the fabricated PDP filter. The obtained filter had no waviness structure on the surface on the viewing side, so reflection was seen
- a PDP filter that has excellent transmitted image clarity and also has anti-reflection properties. Further, according to a preferred aspect of the present invention, it is possible to provide a PDP filter that also has interference fringe prevention properties.
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Abstract
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KR (1) | KR20090057219A (fr) |
TW (1) | TW200821618A (fr) |
WO (1) | WO2008032813A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2012144508A1 (fr) * | 2011-04-22 | 2012-10-26 | 日東電工株式会社 | Stratifié optique |
WO2012144509A1 (fr) * | 2011-04-22 | 2012-10-26 | 日東電工株式会社 | Stratifié optique |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10401539B2 (en) * | 2016-04-21 | 2019-09-03 | Corning Incorporated | Coated articles with light-altering features and methods for the production thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003334878A (ja) * | 2002-05-23 | 2003-11-25 | Toppan Printing Co Ltd | 積層体 |
JP2006091276A (ja) * | 2004-09-22 | 2006-04-06 | Fuji Photo Film Co Ltd | 反射防止フィルム、偏光板、画像表示装置、及び反射防止フィルムの製造方法 |
-
2007
- 2007-09-14 KR KR1020097003606A patent/KR20090057219A/ko not_active Application Discontinuation
- 2007-09-14 WO PCT/JP2007/067907 patent/WO2008032813A1/fr active Application Filing
- 2007-09-14 JP JP2008509847A patent/JPWO2008032813A1/ja active Pending
- 2007-09-14 TW TW096134344A patent/TW200821618A/zh unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003334878A (ja) * | 2002-05-23 | 2003-11-25 | Toppan Printing Co Ltd | 積層体 |
JP2006091276A (ja) * | 2004-09-22 | 2006-04-06 | Fuji Photo Film Co Ltd | 反射防止フィルム、偏光板、画像表示装置、及び反射防止フィルムの製造方法 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012144508A1 (fr) * | 2011-04-22 | 2012-10-26 | 日東電工株式会社 | Stratifié optique |
WO2012144509A1 (fr) * | 2011-04-22 | 2012-10-26 | 日東電工株式会社 | Stratifié optique |
CN103492913A (zh) * | 2011-04-22 | 2014-01-01 | 日东电工株式会社 | 光学层叠体 |
CN103492913B (zh) * | 2011-04-22 | 2017-03-15 | 日东电工株式会社 | 光学层叠体 |
US9720134B2 (en) | 2011-04-22 | 2017-08-01 | Nitto Denko Corporation | Optical laminate comprising hard coat layer comprised of cured product of composition comprising (meth)acrylic prepolymer having hydroxyl group |
US10139525B2 (en) | 2011-04-22 | 2018-11-27 | Nitto Denko Corporation | Optical laminate having hard coat layer composition with specified quantities of monofunctional monomer and varied (meth)acryloyl group containing compounds |
US10203430B2 (en) | 2011-04-22 | 2019-02-12 | Nitto Denko Corporation | Method of producing optical laminate comprising hard coat layer comprised of cured product of composition comprising (meth)acrylic prepolymer having hydroxyl group |
Also Published As
Publication number | Publication date |
---|---|
TW200821618A (en) | 2008-05-16 |
KR20090057219A (ko) | 2009-06-04 |
JPWO2008032813A1 (ja) | 2010-01-28 |
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