Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
  • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Definitions

• the present invention relates to novel antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating.
• Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques, especially those requiring exposure with deep ultraviolet radiation.
• Photoresist compositions are used in microlithography processes for making miniaturized electronic components such as in the fabrication of computer chips and integrated circuits.
• a thin coating of a film of a photoresist composition is first applied to a substrate material, such as silicon wafers used for making integrated circuits.
• the coated substrate is then baked to evaporate any solvent in the photoresist composition and to fix the coating onto the substrate.
• the baked and coated surface of the substrate is next subjected to an image-wise exposure to radiation.
• This radiation exposure causes a chemical transformation in the exposed areas of the coated surface.
• Visible light, ultraviolet (UV) light, electron beam and X-ray radiant energy are radiation types commonly used today in microlithographic processes.
• the coated substrate is treated with a developer solution to dissolve and remove either the radiation-exposed or the unexposed areas of the photoresist.
• a developer solution e.g. a rearrangement reaction occurs
• the unexposed areas of the photoresist coating remain relatively insoluble to such a solution.
• treatment of an exposed positive-working photoresist with a developer causes removal of the exposed areas of the photoresist coating and the formation of a positive image in the coating, thereby uncovering a desired portion of the underlying substrate surface on which the photoresist composition was deposited.
• the developer removes the portions that are not exposed.
• High resolution, chemically amplified, deep ultraviolet (100-300 nm) positive and negative tone photoresists are available for patterning images with less than quarter micron geometries.
• Photoresists for 248 nm have typically been based on substituted polyhydroxystyrene and its copolymers.
• photoresists for 193 nm exposure require non-aromatic polymers, since aromatics are opaque at this wavelength.
• aromatics are opaque at this wavelength.
• alicyclic hydrocarbons are incorporated into the polymer to replace the etch resistance lost by eliminating the aromatic functionality.
• the reflection from the substrate becomes increasingly detrimental to the lithographic performance of the photoresist. Therefore, at these wavelengths antireflective coatings become critical.
• bottom antireflective coatings provides the best solution for the elimination of reflectivity.
• the bottom antireflective coating is applied on the substrate and then a layer of photoresist is applied on top of the antireflective coating.
• the photoresist is exposed imagewise and developed.
• the antireflective coating in the exposed area is then typically etched and the photoresist pattern is thus transferred to the substrate.
• the present invention relates to an antireflective coating composition
• an antireflective coating composition comprising (a) a polymer comprising one or more functional groups capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and (b) a thermal acid generator which upon heating disassociates into constituent parts that are capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding.
• the constituent parts of the thermal acid generator become bound to the functional groups of the polymer through the interactions, reducing outgassing from the antireflective coating film.
• the present invention also relates to a method for reducing outgassing from an antireflective coating film comprising applying to a substrate a antireflective coating composition comprising (a) a polymer comprising one or more functional groups capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and (b) a thermal acid generator which upon heating disassociates into constituent parts that are capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and heating the antireflective coating composition to form an antireflective coating film on the substrate, the constituent parts of the thermal acid generator becoming bound to the functional groups of the polymer through the interactions, reducing outgassing from the antireflective coating film.
• a antireflective coating composition comprising (a) a polymer comprising one or more functional groups capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and (b)
• the present invention also relates to a coated substrate comprising: a substrate having thereon: an antireflective coating film of the antireflective coating composition comprising (a) a polymer comprising one or more functional groups capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and (b) a thermal acid generator which upon heating disassociates into constituent parts that are capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding.
• the present invention relates to an antireflective coating composition
• an antireflective coating composition comprising (a) a polymer comprising one or more functional groups capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and (b) a thermal acid generator which upon heating disassociates into constituent parts that are capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding, preferably covalent or ionic bonding.
• the constituent parts of the thermal acid generator become bound to the functional groups of the polymer through the interactions, reducing outgassing from the antireflective coating film.
• the present invention also relates to a method for reducing outgassing from an antireflective coating film comprising applying to a substrate a antireflective coating composition comprising (a) a polymer comprising one or more functional groups capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and (b) a thermal acid generator which upon heating disassociates into constituent parts that are capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and heating the antireflective coating composition to form an antireflective coating film on the substrate, the constituent parts of the thermal acid generator becoming bound to the functional groups of the polymer through the interactions, reducing outgassing from the antireflective coating film.
• a antireflective coating composition comprising (a) a polymer comprising one or more functional groups capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and (b)
• the present invention also relates to a coated substrate comprising: a substrate having thereon: an antireflective coating film of the antireflective coating composition comprising (a) a polymer comprising one or more functional groups capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding; and (b) a thermal acid generator which upon heating disassociates into constituent parts that are capable of one or more interactions selected from the group consisting of covalent bonding, ionic bonding, and hydrogen bonding.
• the polymers that are used in the antireflective coating composition can be those which are known to those skilled in the art. Examples of such polymers can be found in, for example, U.S. Pat. No. 5,294,680, U.S. Pat.
• the polymers will contain at least one monomer is selected from optionally substituted acrylic esters, optionally substituted acrylic acids, optionally substituted methacrylic esters, optionally substituted methacrylic acids, optionally substituted acrylamides, optionally substituted methacrylamides, optionally substituted allyl compounds, optionally substituted styrenes, optionally substituted hydroxystyrene, optionally substituted hydroxyisopropylstyrene, optionally substituted methylstyrene, optionally substituted hydroxymethylstyrene, optionally substituted hydroxyl-.alpha.-methylstyrene, optionally substituted vinyl ethers, optionally substituted vinyl esters, optionally substituted crotonic acids, optionally substituted crotonic acid esters, optionally substituted maleic anhydride, optionally substituted dialkyl itaconates, optionally substituted monoalkyl or dialkyl esters of maleic acid or fumaric acid, and mixtures thereof,
• the polymers will sometimes contain additional units that are chromophores at different wavelengths.
• chromophores are monocyclice or polycyclic hydrocarbon or heterocyclic units, such as, for example, include optionally substituted phenyl, optionally substituted phenanthryl, optionally substituted anthracyl, optionally substituted acridine, optionally substituted naphthyl, optionally substituted quinolinyl and ring- substituted quinolinyls such as hydroxyquinolinyl groups, contain a resin that has phenyl chromophore units.
• Polymers typically used in antireflective compositions of the invention will have a weight average molecular weight (Mw) of about 1 ,000 to about
• crosslinker component Also part of the anti reflective coating composition is a crosslinker component.
• crosslinking agents include aminoplasts such as, for example, glyGoluril-formaldehyde resins, melamine-formaldehyde resins, benzoguanamine-formaldehyde resins, and urea-formaldehyde resins.
• aminoplasts such as, for example, glyGoluril-formaldehyde resins, melamine-formaldehyde resins, benzoguanamine-formaldehyde resins, and urea-formaldehyde resins.
• methylated and/or butylated forms of these resins is highly preferred for obtaining long storage life (3-12 months) in catalyzed form. Highly methylated melamine-formaldehyde resins having degrees of polymerization less than two are useful.
• Monomeric, methylated glycoluril-formaldehyde resins are useful for preparing thermosetting polyester anti-reflective coatings which can be used in conjunction with acid-sensitive photoresists.
• One example is N 1 N 1 N 1 N- tetra(alkoxymethyl)glycoluril.
• N,N,N,N-tetra(alkoxymethyl)glycoluril may include, e.g., N,N,N,N-tetra(methoxymethyl)glycoluril, N, N 1 N, N- tetra(ethoxymethyl)glycoluril, N,N,N,N-tetra(n-propoxymethyl)glycoluril, N 1 N 1 N 1 N- tetra(i-propo ⁇ ymethyl)glycoluril, N,N,N ) N-tetra(n-butoxymethyl)glycoluril and N,N,N,N-tetra(t-butoxymethyl)glycoluril.
• N,N,N,N-tetra(methoxymethyl)glycoluril is available under the trademark POWDERLINK from Cytec Industries (e.g.,
• POWDERLINK 1174 Other examples include methylpropyltetramethoxymethyl glycoluril, and methylphenyltetramethoxymethyl glycoluril.
• aminoplast crosslinking agents are commercially available from Cytec Industries under the trademark CYMEL and from Monsanto Chemical Co. under the trademark RESIMENE.
• Condensation products of other amines and amides can also be employed, for example, aldehyde condensates of triazines, diazines, diazoles, guanidines, guanimines and alky!- and aryl-substituted derivatives of such compounds, including alkyl- and aryl-substituted melamines.
• Some examples of such compounds are N,N'-dimethyl urea, benzourea, dicyandiamide, formaguanamine, acetoguanamine, ammeline, 2-chloro-4,6- diamino-1 ,3,5-triazine, 6-methyl-2,4-diamino,1 ,3,5-traizine, 3,5-diaminotriazole, triaminopyrimidine,2-mercapto-4,6-diamino-pyrimidine, 3,4,6-tris(ethylamino)- 1 ,3,5-triazine, tris(alkoxycarbonylamino)triazine, N, N, N 1 , N 1 - tetramethoxymethylurea and the like.
• crosslinking agents include: 2,6-bis(hydroxymethyl)-p- cresol and compounds having the following structures:
• etherified amino resins for example methylated or butylated melamine resins (N- methoxymethyl- or N-butoxymethyl-melamine respectively) or methylated/butylated glycolurils, for example as can be found in Canadian Patent No. 1 204547 to Ciba Specialty Chemicals.
• lsocyanates can also be used as crosslinking agent and their use, structure and synthesis are well known to those of ordinary skill in the art.
• isocyanate crosslinking agents can be found in United States Patent No. 5,733,714, the contents of which are hereby incorporated by reference.
• crosslinking agents include a compound of the formula
• Ri 0 and Rn are each independently optionally substituted C 1- I 0 alkoxy; and Ri 2 is hydrogen or alkyl. This compound is described in United States Patent No. 6,489,432, the contents of which are hereby incorporated herein by reference.
• Yet another crosslinking agent includes compounds found in United States
• Ri and R 2 individually represent straight or branched Ci_io alkyl, straight or branched Ci -10 ester, straight or branched C1-10 ketone, straight or branched C 1 - 10 carboxylic acid, straight or branched CM 0 acetal, straight or branched Ci -10 alkyl including at least one hydroxyl group, straight or branched C 1-I0 ester including at least one hydroxyl group, straight or branched CMO ketone including at least one hydroxyl group, straight or branched CM O carboxylic acid including at least one hydroxyl group, and straight or branched CM O acetal including at least one hydroxyl group; and R 3 represents hydrogen or methyl; R 4 represents hydrogen or methyl; and a and b individually represent the relative amounts of each comonomer and each is a positive integer greater than 0.
• R 5 , R 6 and R individually represent straight or branched C-M O alkyl, straight or branched CM O ester, straight or branched CM O ketone, straight or branched CM O carboxylic acid, straight or branched CM O acetal, straight or branched CM O a 'M including at least one hydroxyl group, straight or branched CM O ester including at least one hydroxyl group, straight or branched CMO ketone including at least one hydroxyl group, straight or branched CM 0 carboxylic acid including at least one hydroxyl group, and straight or branched CM O acetal including at least one hydroxyl group;
• R 7 represents hydrogen or methyl;
• m represents 0 or 1 ;
• a is a positive integer greater than 0; and
• n represents a number of 1 to 5.
• the crosslinkers can be used individually or in mixtures with each other.
• the crosslinking agent is added to the composition in a proportion which provides from about 0.10 to about 2.00 equivalents, preferably from about 0.50 to about 1.50, of crosslinking function per reactive group on the polymer.
• the polymers useful in this invention may be prepared by any of the standard polymerization methods known in the art, examples of such methods are free radical, anionic or cationic copolymerization techniques.
• the polymer may be synthesized using solution, emulsion, bulk, suspension polymerization, or the like.
• the polymer may have various structures, such as random, block, graft, etc.
• the weight average molecular weight of the polymer may range from 1500 to about 50,000, preferably 4,000 to about 30,000 and more preferably 5,000 to about 20,000. When the weight average molecular weight is below 1 ,500, then good film forming properties are not obtained for the antireflective coating and when the weight average molecular weight is too high, then properties such as solubility, storage stability and the like may be compromised.
• thermal acid generators include, but are not limited to, nitrobenzyl esters, benzoin tosylate, 2-nitrobenzyl tosylate, tris(2,3- dibromopropyl)-1 ,3,5-triazine-2,4,6-trione, the alkyl esters of organic sulfonic acids, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, oxalic acid, phthalic acid, phosphoric acid, camphorsulfonic acid, 2,4,6-trimethylbenzene sulfonic acid, triisopropylnaphthalene sulfonic acid, 5-nitro-o-toluehe sulfonic acid, 5- sulfosalicylic acid, 2,5-dimethylbenzene sulfonic acid, 2-nitrobenzene sulfonic acid, 3-chlorobenzene sulfonic acid, 3-bromobenzene sulf
• thermal acid generators include dodecylbenzenesulfonic acid triethylamine salt, dodecylbenzenedisulfonic acid triethylamine salt, sulfonate salts, such as carbocyclic aryl (e.g. phenyl, napthyl, anthracenyl, etc.), heteroaryl (e.g. thienyl) or aliphatic sulfonate salts, preferably carbocyclic aryl sulfonate salts, optionally substituted benzenesulfonate salts, etc.
• carbocyclic aryl e.g. phenyl, napthyl, anthracenyl, etc.
• heteroaryl e.g. thienyl
• aliphatic sulfonate salts preferably carbocyclic aryl sulfonate salts, optionally substituted benzenesulfonate salts, etc.
• the carbocyclic aryl sulfonate salts can be unsubstituted or substituted by, for example, one or more of hydroxy; optionally substituted alkyl; optionally substituted alkenyl; optionally substituted alkoxy; optionally substituted carbocyclic aryl e.g. optionally substituted phenyl, optionally substituted naphthyl, optionally substituted anthracene and the like; optionally substituted aralkyl such as aralkyl e.g.
• heteroaromatic or heteroalicyclic groups preferably having 1 to 3 rings, 3 to 8 ring members in each ring and from 1 to 3 heteroatoms such as coumarinyl, quinolinyl, pyridyl, pyrazinyl, pyrimidyl,
• Examples of cations which can be used to form the thermal acid generator salts from the above acids include 1 ,8-diazabicyclo[5.4.0]undec-7-ene (DBU), 1 ,5-diazabicyclo[4.3.0]non-5-ene (DBN), 1 ,4-diazabicyclo[2.2.2]octane (DABCO), tetramethylguanidine (TMG), N-dimethylaminopropyl ethyl ether, bis(N- dimethylaminoethyl)methylamine, N-dimethylbenzylamine, N-methyl-N- dimethylaminoethylpiperazine, N-methylmorpholine, compounds having the formula [(Ri)(R 2 )(Ra)NH] + , where Ri, R 2 , and R 3 are independently hydrogen or an optionally substituted alkyl, aryl, heteroalkyl, alkoxy, etc groups.
• interaction includes the formation of covalent bonds, as well as attractive ionic bonds between the functional polymer groups and the constituents of the thermal acid generator.
• Suitable solvents for such photoresists may include for example ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, isophorone, methyl isoamyl ketone, 2-heptanone 4-hydroxy, and 4-methyl 2- pentanone; Ci to Ci 0 aliphatic alcohols such as methanol, ethanol, and propanol; aromatic group containing-alcohols such as benzyl alcohol; cyclic carbonates such as ethylene carbonate and propylene carbonate; aliphatic or aromatic hydrocarbons (for example, hexane, toluene, xylene, etc and the like); cyclic ethers, such as dioxane and tetrahydrofuran; ethylene glycol; propylene glycol; hexylene glycol; ethylene glycol monoalkylethers such as ethylene glycol monomethylether, ethylene glycol monoethyl
• the composition is coated on top of the substrate and is further subjected to dry etching, it is envisioned that the composition is of sufficiently low metal ion level and purity that the properties of the semiconductor device are not adversely affected. Treatments such as passing a solution anti reflective coating composition through an ion exchange column, filtration, and extraction processes can be used to reduce the concentration of metal ions and to reduce particles.
• the coating composition can be coated on the substrate using techniques well known to those skilled in the art, such as dipping, spincoating or spraying.
• the film thickness of the anti-reflective coating ranges from about 0.01 ⁇ m to about 1 ⁇ m.
• the coating can be heated on a hot plate or convection oven or other well known heating methods to remove any residual solvent and induce crosslinking if desired, and insolubilizing the anti-reflective coatings to prevent intermixing between the anti-reflective coating and the photoresist.
• photoresist compositions there are two types, negative-working and positive-working.
• negative-working photoresist compositions When negative-working photoresist compositions are exposed image-wise to radiation, the areas of the resist composition exposed to the radiation become less soluble to a developer solution (e.g. a cross-linking reaction occurs) while the unexposed areas of the photoresist coating remain relatively soluble to such a solution.
• a developer solution e.g. a cross-linking reaction occurs
• treatment of an exposed negative- working resist with a developer causes removal of the non-exposed areas of the photoresist coating and the creation of a negative image in the coating, thereby uncovering a desired portion of the underlying substrate surface on which the photoresist composition was deposited.
• a process of the instant invention comprises coating a substrate with a coating composition of the present invention and heating the substrate on a hotplate or convection oven or other well known heating methods at a sufficient temperature for sufficient length of time to remove the coating solvent, and crosslink the polymer if necessary, to a sufficient extent so that the coating is not soluble in the coating solution of a photoresist or in a aqueous alkaline developer.
• An edge bead remover may be applied to clean the edges of the substrate using processes well known in the art.
• the heating ranges in temperature from about 70 0 C to about 250 0 C.
• a film of a photoresist composition is then coated on top of the anti- reflective coating and baked to substantially remove the photoresist solvent.
• the photoresist is image-wise exposed and developed in an aqueous developer to remove the treated resist.
• An optional heating step can be incorporated into the process prior to development and after exposure.
• the process of coating and imaging photoresists is well known to those skilled in the art and is optimized for the specific type of resist used.
• the patterned substrate can then be dry etched in a suitable etch chamber to remove the exposed portions of the anti-reflective film, with the remaining photoresist acting as an etch mask.
• Example A Triethyl ammonium dodecylbenzene sulfonate
• dodecylbenzenesulfonic acid 6.52 g, .020 moles
• triethyl amine 2.2 g, 0.022 moles
• ether 40 mL
• the ether was stripped off using a Rotovap and the remaining solids were vacuum dried. Structure was confirmed by NMR.
• N,N,N,N-tetramethyl- diaminomethane 5 g, .049 moles
• para-toluene sulfonic acid monohydrate (19 g, 0.1 moles)
• ether 30 mL
• the solution was mixed for 1 hour and then allowed to stand overnight at room temperature.
• the ether solvent was then stripped off using a Rotovap and the remaining solid was vacuum dried overnight at 50 0 C. Structure was confirmed by NMR.
• Example E Bis triethylammonium 1 ,5-dinaphthalenesulfonate
• triethyl amine 5, 0.05 moles
• 1 ,5-dinaphthalenesulfonic acid tetrahydrate 9.0 g, 0.025 moles
• THF 100 ml_
• TGA Perkin Elmer thermogravimetric analyzer
• TAG B As these thermal acid generators are heated, some of the thermal acid generator decomposes into acid and some is left as an amine. The potentially free liberated amine can bond ionically with functional groups on the polymer, making the thermal acid generator even less volatile.
• An additional benefit is seen in the comparison of TAG B with TAGs C and D. The difference between TAGs is the amine used. TAGs C and D uses a very strong base versus a weaker base used in TAG B. This suggests a benefit of using strong bases in the TAGs.
• An anti reflective coating composition containing poly(hydroxystyrene/methyl methacrylate), glycoluril crosslinker, and solvent was prepared and to aliquots of the composition were added the TAGs (10% of a ten percent solution of TAG in solvent, based on the solid weight of poly(hydroxystyrene/methyl methacrylate) as shown in Table Il below.
• Samples of the TAG containing aliquots were spin coated on a silicon wafer, baked for 60 seconds at either 130 0 C or 200 0 C, and then soaked in PGMEA for 60 seconds. Wafers were rated pass or fail, depending on whether coating was removed after PGMEA soaking. Table Il - Crosslinking Studies of Various TAGs at 130 0 C and 200 0 C
• TAGs F and G not only crosslink well at 200 0 C but also crosslink as low as 120 0 C. In comparison, a classical TAG A will not crosslink the resin until 200 0 C.

Landscapes

• Engineering & Computer Science (AREA)
• Architecture (AREA)
• Structural Engineering (AREA)
• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Materials For Photolithography (AREA)
• Paints Or Removers (AREA)
• Compositions Of Macromolecular Compounds (AREA)

Priority Applications (3)

Applications Claiming Priority (2)

Publications (1)

Family

ID=38649922

Family Applications (1)

Country Status (8)

Cited By (1)

Families Citing this family (9)

Citations (4)

Family Cites Families (8)

• 2006
  • 2006-07-12 US US11/456,868 patent/US7754414B2/en not_active Expired - Fee Related
• 2007
  • 2007-06-25 TW TW096122917A patent/TW200809416A/zh unknown
  • 2007-07-11 CN CN2007800259692A patent/CN101490622B/zh not_active Expired - Fee Related
  • 2007-07-11 JP JP2009518999A patent/JP5250779B2/ja not_active Expired - Fee Related
  • 2007-07-11 WO PCT/IB2007/002067 patent/WO2008010079A1/en not_active Ceased
  • 2007-07-11 MY MYPI20090114A patent/MY145010A/en unknown
  • 2007-07-11 EP EP07789510A patent/EP2044486A1/en not_active Withdrawn
  • 2007-07-11 KR KR1020087031470A patent/KR20090032045A/ko not_active Ceased

Patent Citations (4)

Also Published As

Similar Documents

Legal Events