MY145010A - Antireflective coating compositions - Google Patents

Antireflective coating compositions

Info

Publication number
MY145010A
MY145010A MYPI20090114A MYPI20090114A MY145010A MY 145010 A MY145010 A MY 145010A MY PI20090114 A MYPI20090114 A MY PI20090114A MY PI20090114 A MYPI20090114 A MY PI20090114A MY 145010 A MY145010 A MY 145010A
Authority
MY
Malaysia
Prior art keywords
bonding
coating compositions
antireflective coating
group
ionic
Prior art date
Application number
MYPI20090114A
Other languages
English (en)
Inventor
Joseph E Oberlander
Original Assignee
Az Electronic Materials Usa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials Usa filed Critical Az Electronic Materials Usa
Publication of MY145010A publication Critical patent/MY145010A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
MYPI20090114A 2006-07-12 2007-07-11 Antireflective coating compositions MY145010A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/456,868 US7754414B2 (en) 2006-07-12 2006-07-12 Antireflective coating compositions

Publications (1)

Publication Number Publication Date
MY145010A true MY145010A (en) 2011-12-15

Family

ID=38649922

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20090114A MY145010A (en) 2006-07-12 2007-07-11 Antireflective coating compositions

Country Status (8)

Country Link
US (1) US7754414B2 (enExample)
EP (1) EP2044486A1 (enExample)
JP (1) JP5250779B2 (enExample)
KR (1) KR20090032045A (enExample)
CN (1) CN101490622B (enExample)
MY (1) MY145010A (enExample)
TW (1) TW200809416A (enExample)
WO (1) WO2008010079A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8518926B2 (en) * 2006-04-10 2013-08-27 Knopp Neurosciences, Inc. Compositions and methods of using (R)-pramipexole
CN101802711B (zh) * 2007-07-30 2014-12-03 布鲁尔科技公司 用于光刻法的可非共价交联的材料
US8906590B2 (en) * 2011-03-30 2014-12-09 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
US8623589B2 (en) * 2011-06-06 2014-01-07 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions and processes thereof
US8906592B2 (en) 2012-08-01 2014-12-09 Az Electronic Materials (Luxembourg) S.A.R.L. Antireflective coating composition and process thereof
US9152051B2 (en) 2013-06-13 2015-10-06 Az Electronics Materials (Luxembourg) S.A.R.L. Antireflective coating composition and process thereof
CN105646293A (zh) * 2015-12-19 2016-06-08 浙江新化化工股份有限公司 一种烷基苯磺酸有机胺盐的制备方法
US11448964B2 (en) * 2016-05-23 2022-09-20 Rohm And Haas Electronic Materials Korea Ltd. Coating compositions for use with an overcoated photoresist
CN112680052B (zh) * 2020-12-23 2022-06-28 上海飞凯材料科技股份有限公司 一种抗反射涂料组合物及其应用
CN115403976B (zh) * 2022-08-19 2023-04-18 嘉庚创新实验室 一种抗反射涂层组合物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5886102A (en) 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US6114085A (en) * 1998-11-18 2000-09-05 Clariant Finance (Bvi) Limited Antireflective composition for a deep ultraviolet photoresist
TW576859B (en) * 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
JP3771206B2 (ja) 2002-09-25 2006-04-26 松下電器産業株式会社 水溶性材料及びパターン形成方法
US6876017B2 (en) * 2003-02-08 2005-04-05 Intel Corporation Polymer sacrificial light absorbing structure and method
US7030201B2 (en) 2003-11-26 2006-04-18 Az Electronic Materials Usa Corp. Bottom antireflective coatings
KR20070029157A (ko) * 2004-03-12 2007-03-13 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. 리소그래피 적용을 위한 열경화된 언더코트
US20050214674A1 (en) * 2004-03-25 2005-09-29 Yu Sui Positive-working photoimageable bottom antireflective coating
US7691556B2 (en) * 2004-09-15 2010-04-06 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
JP4597655B2 (ja) 2004-12-20 2010-12-15 東京応化工業株式会社 レジストパターン形成方法
US7553905B2 (en) * 2005-10-31 2009-06-30 Az Electronic Materials Usa Corp. Anti-reflective coatings
JP4548616B2 (ja) * 2006-05-15 2010-09-22 信越化学工業株式会社 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法

Also Published As

Publication number Publication date
JP2009543149A (ja) 2009-12-03
CN101490622B (zh) 2012-09-05
KR20090032045A (ko) 2009-03-31
EP2044486A1 (en) 2009-04-08
CN101490622A (zh) 2009-07-22
US7754414B2 (en) 2010-07-13
WO2008010079A1 (en) 2008-01-24
JP5250779B2 (ja) 2013-07-31
US20080014529A1 (en) 2008-01-17
TW200809416A (en) 2008-02-16

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