JP5250779B2 - 反射防止膜組成物 - Google Patents

反射防止膜組成物 Download PDF

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Publication number
JP5250779B2
JP5250779B2 JP2009518999A JP2009518999A JP5250779B2 JP 5250779 B2 JP5250779 B2 JP 5250779B2 JP 2009518999 A JP2009518999 A JP 2009518999A JP 2009518999 A JP2009518999 A JP 2009518999A JP 5250779 B2 JP5250779 B2 JP 5250779B2
Authority
JP
Japan
Prior art keywords
optionally substituted
acid
antireflection film
polymer
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009518999A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009543149A5 (enExample
JP2009543149A (ja
Inventor
オーバーレンダー・ジョゼフ・イー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck Performance Materials IP (Japan) GK
Original Assignee
AZ Electronic Materials IP Japan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AZ Electronic Materials IP Japan Co Ltd filed Critical AZ Electronic Materials IP Japan Co Ltd
Publication of JP2009543149A publication Critical patent/JP2009543149A/ja
Publication of JP2009543149A5 publication Critical patent/JP2009543149A5/ja
Application granted granted Critical
Publication of JP5250779B2 publication Critical patent/JP5250779B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2009518999A 2006-07-12 2007-07-11 反射防止膜組成物 Expired - Fee Related JP5250779B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/456,868 US7754414B2 (en) 2006-07-12 2006-07-12 Antireflective coating compositions
US11/456,868 2006-07-12
PCT/IB2007/002067 WO2008010079A1 (en) 2006-07-12 2007-07-11 Antireflective coating compositions

Publications (3)

Publication Number Publication Date
JP2009543149A JP2009543149A (ja) 2009-12-03
JP2009543149A5 JP2009543149A5 (enExample) 2011-09-01
JP5250779B2 true JP5250779B2 (ja) 2013-07-31

Family

ID=38649922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009518999A Expired - Fee Related JP5250779B2 (ja) 2006-07-12 2007-07-11 反射防止膜組成物

Country Status (8)

Country Link
US (1) US7754414B2 (enExample)
EP (1) EP2044486A1 (enExample)
JP (1) JP5250779B2 (enExample)
KR (1) KR20090032045A (enExample)
CN (1) CN101490622B (enExample)
MY (1) MY145010A (enExample)
TW (1) TW200809416A (enExample)
WO (1) WO2008010079A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8518926B2 (en) * 2006-04-10 2013-08-27 Knopp Neurosciences, Inc. Compositions and methods of using (R)-pramipexole
US9482951B2 (en) 2007-07-30 2016-11-01 Brewer Science Inc. Non-covalently crosslinkable materials for photolithography processes
US8906590B2 (en) * 2011-03-30 2014-12-09 Az Electronic Materials Usa Corp. Antireflective coating composition and process thereof
US8623589B2 (en) * 2011-06-06 2014-01-07 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions and processes thereof
US8906592B2 (en) 2012-08-01 2014-12-09 Az Electronic Materials (Luxembourg) S.A.R.L. Antireflective coating composition and process thereof
US9152051B2 (en) 2013-06-13 2015-10-06 Az Electronics Materials (Luxembourg) S.A.R.L. Antireflective coating composition and process thereof
CN105646293A (zh) * 2015-12-19 2016-06-08 浙江新化化工股份有限公司 一种烷基苯磺酸有机胺盐的制备方法
US11448964B2 (en) * 2016-05-23 2022-09-20 Rohm And Haas Electronic Materials Korea Ltd. Coating compositions for use with an overcoated photoresist
CN112680052B (zh) * 2020-12-23 2022-06-28 上海飞凯材料科技股份有限公司 一种抗反射涂料组合物及其应用
CN115403976B (zh) * 2022-08-19 2023-04-18 嘉庚创新实验室 一种抗反射涂层组合物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US6114085A (en) * 1998-11-18 2000-09-05 Clariant Finance (Bvi) Limited Antireflective composition for a deep ultraviolet photoresist
TW576859B (en) * 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
JP3771206B2 (ja) 2002-09-25 2006-04-26 松下電器産業株式会社 水溶性材料及びパターン形成方法
US6876017B2 (en) * 2003-02-08 2005-04-05 Intel Corporation Polymer sacrificial light absorbing structure and method
US7030201B2 (en) 2003-11-26 2006-04-18 Az Electronic Materials Usa Corp. Bottom antireflective coatings
JP4612672B2 (ja) * 2004-03-12 2011-01-12 フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッド リソグラフィ用途のための熱硬化性アンダーコート
US20050214674A1 (en) * 2004-03-25 2005-09-29 Yu Sui Positive-working photoimageable bottom antireflective coating
US7691556B2 (en) * 2004-09-15 2010-04-06 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
JP4597655B2 (ja) 2004-12-20 2010-12-15 東京応化工業株式会社 レジストパターン形成方法
US7553905B2 (en) * 2005-10-31 2009-06-30 Az Electronic Materials Usa Corp. Anti-reflective coatings
JP4548616B2 (ja) * 2006-05-15 2010-09-22 信越化学工業株式会社 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法

Also Published As

Publication number Publication date
WO2008010079A1 (en) 2008-01-24
EP2044486A1 (en) 2009-04-08
US7754414B2 (en) 2010-07-13
MY145010A (en) 2011-12-15
CN101490622B (zh) 2012-09-05
TW200809416A (en) 2008-02-16
KR20090032045A (ko) 2009-03-31
US20080014529A1 (en) 2008-01-17
CN101490622A (zh) 2009-07-22
JP2009543149A (ja) 2009-12-03

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KR101486841B1 (ko) 가교결합성 중합체에 기초한 기층 코팅 조성물
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