WO2007102298A1

WO2007102298A1 - Rotary drive apparatus and electron beam irradiation apparatus

Info

Publication number: WO2007102298A1
Application number: PCT/JP2007/052576
Authority: WO
Inventors: Yasumitsu Wada
Original assignee: Pioneer Corporation
Priority date: 2006-03-09
Filing date: 2007-02-14
Publication date: 2007-09-13
Also published as: JP2009134775A

Abstract

[PROBLEMS] To improve durability by supplying power in a non-contact manner from a fixed side to a rotating side, by using a transformer mechanism through electromagnetic induction. [MEANS FOR SOLVING PROBLEMS] A clamp electrode, which is arranged in a turntable and rotates with a spindle shaft is supplied with a clamp voltage from a housing side through a rotary transformer, and a substrate placed on a turntable is clamped by static electricity of the clamp electrode. Thus, power can be supplied in the non-contact manner by supplying power through the transformer mechanism through electromagnetic induction, abrasion is not caused, and durability is improved.

Description

Specification

Rotation drive device and electron beam irradiation device

Technical field

TECHNICAL FIELD [0001] The present invention relates to a rotation drive device used when a disk master is manufactured by irradiating a substrate with an electron beam, and an electron beam irradiation device including the same.

Background art

In recent years, various recording media capable of recording large-capacity image / audio data and digital data have been developed. For example, high-density discs such as CD (Compact Disk) and DVD (Digital Versatile Disk) are manufactured by irradiating a substrate with a laser beam using a disc master production device. As it progresses, it is thought that it will shift to electron beam irradiation.

[0003] For example, Patent Document 1 discloses an electron beam injection unit (electron beam injection unit) that emits an electron beam and a rotation drive unit that rotationally drives a substrate irradiated with the electron beam of the electron beam emission unit force. An apparatus for manufacturing a master disk having a (rotation drive unit) and a moving means (translation drive unit) for moving the rotation drive unit relative to the electron beam emitting unit is disclosed. The rotation driving means includes a housing (spindle nosing) that rotatably supports a rotating shaft (spindle shaft), an insulating turntable that rotates together with the rotating shaft and mounts a base, and the inside of the turntable. The provided clamp electrode (chucking electrode), a rotary connector for supplying a clamp voltage to the clamp electrode while allowing relative rotation between the clamp electrode and the casing as the rotary shaft rotates, and the rotary shaft being driven to rotate Motor.

[0004] Patent Document 1: Japanese Patent Application Laid-Open No. 2003-36569

Disclosure of the invention

Problems to be solved by the invention

[0005] In the above-described prior art, a rotation driving means having a rotary connector is used. This rotary connector uses a rolling bearing, and mercury is used for the connecting part (contact point) of the rotating part and the fixed part. When using a rotary connector having such a configuration, Friction is generated between the fixed part and the rotating part by the rolling bearing and the contact. As a result, there is a possibility that wear may occur in the portion where friction occurs, and there is room for improvement in terms of durability.

[0006] The problems to be solved by the present invention include the above-described problems as an example.

Means for solving the problem

[0007] In order to solve the above-described problem, the invention according to claim 1 is a housing that rotatably supports a rotating shaft, and an insulating property that is provided so as to rotate together with the rotating shaft and mounts a substrate. A turntable, a clamp electrode provided in the turntable, and a power supply for supplying a clamp voltage to the clamp electrode while allowing relative rotation of the clamp electrode and the casing with the rotation of the rotating shaft. And a rotary transformer.

In order to solve the above-mentioned problem, the invention described in claim is an electron beam irradiation apparatus for irradiating a substrate with an electron beam, the electron beam emitting means for emitting the electron beam, and the electron beam emitting means from the electron beam emitting means A vacuum chamber that introduces an electron beam into the interior, a housing that rotatably supports a rotating shaft, an insulating turntable that is installed in the vacuum chamber so as to rotate together with the rotating shaft, and on which a substrate is placed. A clamp electrode provided in a turntable, a rotary transformer for supplying a clamp voltage to the clamp electrode while allowing relative rotation between the clamp electrode and the casing accompanying rotation of the rotary shaft; and the rotation Rotation drive means including a motor for rotating the shaft, and movement means for moving the rotation drive means relative to the electron beam emission means.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

FIG. 1 is a block diagram showing an overall configuration of a master disk manufacturing apparatus 1 according to the present embodiment.

First, an outline of a manufacturing process of an optical disc master will be described below. The electron beam is used in a vacuum atmosphere because it has a characteristic of being significantly attenuated in the air atmosphere. Accordingly, a turntable or the like on which a substrate for producing an electron gun or an optical disc master is placed in a vacuum atmosphere. For example, a silicon (Si) substrate is used for manufacturing an optical disc master. The silicon substrate is coated with an electron beam resist on its main surface. The substrate coated with the electron beam resist is rotated in the disc master production equipment. An electron beam that is driven to rotate and modulated by an information data signal is irradiated, and a latent image of fine uneven patterns such as pits and groups is formed in a spiral shape.

[0011] After the electron beam exposure is completed, the substrate is removed from the master disk manufacturing apparatus.

Development processing is performed. Next, patterning and resist removal are performed to form a fine uneven pattern on the substrate. A conductive film is formed on the main surface of the substrate on which the pattern has been formed, and is subjected to an electroplating process to produce an optical disc master (stamper).

As shown in FIG. 1, a disk master manufacturing apparatus 1 includes a vacuum chamber 2, a rotary drive device 3 that drives a disk substrate disposed in the vacuum chamber 2, and an electron beam attached to the vacuum chamber 2. It has an electron column 4 containing an optical system. An optical disk substrate (hereinafter simply referred to as a disk substrate) 5 for an optical disk master is placed on a turntable 6. The turntable 6 is rotationally driven with respect to the vertical axis of the main surface of the disk substrate by a spindle nosing 11 that rotatably supports a spindle shaft 7 connected thereto. The rotary drive device 3 is installed on a feed stage (hereinafter simply referred to as a stage) 8. The stage 8 is coupled to a feed motor 9 which is a translational drive device via a ball screw 10, and the rotary drive device 3 including the spindle nosing 11 and the turntable 6 is connected in a plane parallel to the main surface of the disk substrate 5. It is possible to translate in a predetermined direction. The turntable 6 is made of an insulating material such as ceramic, and the disk substrate 5 is clamped on the turntable 6 by an electrostatic clamp mechanism described later.

In the vacuum chamber 2 (or outside thereof), a laser length measuring device 15 for detecting the translational position of the main surface of the disk substrate 5 is provided. This laser length measuring device 15 has a light emitting device, a light receiving device, and a detection unit (not shown), and the power of the light emitting device is also emitted, and the laser beam reflected by the reflecting mirror 19 provided on the stage 8 is received by the light receiving device. The light is received, and the position of the main surface of the disk substrate 5 in the translational movement direction is detected by interference of light waves. Then, the detection result is output to the feed motor control circuit 20. The feed motor control circuit 20 calculates an error in the position of the stage 8 based on the input result, and controls the drive of the feed motor 9 so as to correct the error. Further, the calculated stage position error is output to an irradiation position adjustment circuit 33 described later.

[0014] The vacuum chamber 2 is installed via a vibration isolator (not shown) such as an air damper. Therefore, the transmission of vibration due to external force is suppressed. A vacuum pump 22 is connected to the vacuum chamber 2, and the chamber is evacuated by the vacuum pump 22 so that the inside of the chamber becomes a vacuum atmosphere at a predetermined pressure.

[0015] In an electron column 4 for emitting an electron beam, an electron beam source 25, a converging lens 26, a beam modulator 27, an aperture 28, a beam deflector 29, and an objective lens 30 are arranged in this order in the beam upstream. It is arranged from the side toward the downstream side. The electron column 4 is attached to the ceiling surface of the vacuum chamber 2 so that an electron beam outlet 31 provided at the tip of the electron column 4 is located in the vacuum chamber 2. At this time, the electron beam emission port 31 is arranged to face a position close to the main surface of the disk substrate 5 on the turntable 6.

[0016] The electron beam source 25 emits an electron beam accelerated to, for example, several lOKeV by a cathode (not shown) to which a high voltage to which a power source power (not shown) is supplied is applied. The converging lens 26 converges the emitted electron beam and guides it to the aperture 28. The beam modulator 27 operates based on the signal from the recording signal generator 32, and performs on / off control of the electron beam. That is, for example, when the beam is turned off, a voltage is applied between the electrodes of the beam modulator 27 to greatly deflect the passing electron beam. As a result, the electron beam is not converged in the aperture hole of the aperture 28 and is prevented from passing through the aperture 28. As a result, the beam can be turned off.

The beam deflector 29 applies a voltage to the electrode and deflects the passing electron beam in response to a control signal from the irradiation position adjusting circuit 33. Thereby, the position of the electron beam spot with respect to the disk substrate 5 is controlled. As described above, the irradiation position adjustment circuit 33 controls the voltage applied to the electrode of the beam deflector 29 based on the position error of the stage 8 input from the feed motor control circuit 20.

FIG. 2 is a cross-sectional view schematically showing the internal structure of the spindle saw and the winging 11 of the disk master production apparatus 1 shown in FIG. 1 in order to explain the overall structure of the rotary drive device 3.

The spindle housing 11 houses a spindle shaft 7 that is rotatably supported, a spindle motor 35 for rotating the spindle shaft 7, a rotary transformer 42, a rectifier circuit 43, and the like. . The spindle shaft 7 is rotatably supported by a spindle housing 11 via a gas bearing 36. This gas bearing 36 has a bar Bearing air is supplied from the outside via a rub (not shown), and the air is ejected from the gas bearing 36 into the gap to rotatably support the spindle shaft 7. The air is exhausted out of the vacuum chamber 2 from the spindle housing 11 via a pipe (not shown). Further, one end side (the upper side in FIG. 2) of the spindle shaft 7 passes through the opening 11a of the spindle nosing 11 and the turntable 6 is fixed to the tip thereof. The radial gap between the opening 11a and the spindle shaft 7 is sealed by a vacuum seal portion 37, whereby the airtightness inside the spindle housing 11 is maintained. Note that a differential exhaust seal can be used instead of the vacuum seal.

[0020] A magnetic member 35A for rotationally driving the spindle shaft 7 is attached to the lower portion of the gas bearing 36 in the spindle shaft 7! /. The spindle motor 35 is composed of the magnetic member 35A and a coil 35B provided around the magnetic member 35A, and rotates the spindle shaft 7 using an electromagnetic force generated by passing a current through the coil 35B. Let As a result, the turntable 6 fixed to one end side of the spindle shaft 7 is rotated. The spindle motor 35 is driven and controlled by the spindle motor control circuit 21 (see FIG. 1).

A rotary encoder 39 is provided below the spindle motor 35 on the spindle shaft 7. The rotary encoder 39 includes a light emitting portion and a light receiving portion (not shown), and the spindle shaft 7 is driven by a pulse of light (for example, infrared rays) passing through a slit (not shown) formed in a disk 39a provided on the spindle shaft 7. Detects the rotation angle of. The rotation angle of the spindle shaft 7 detected by the rotary encoder 39 is output to a control device (not shown).

On the other hand, a coaxial cable 38 for supplying a high voltage to the disk substrate 5 and the turntable 6 is provided in the spindle shaft 7. The coaxial cable 38 has an inner conductor (core wire) 38A and an outer conductor 38B, and is provided in a through hole 7a formed at the center of the spindle shaft 7. One end side (upper side in FIG. 2) of the inner conductor 38A is connected to an electrostatic clamp electrode 50 provided in the turntable 6, and the other end side (lower side in FIG. 2) is connected to the rectifier circuit 43. Also, one end side of the outer conductor 38B is interposed via the contact member 51. The other end is connected to the rectifier circuit 43. The coaxial cable 38 is supplied via a terminal 41 provided on the spindle housing 11, a rotary transformer 42, and a rectifier circuit 43.

[0023] The rotary transformer 42 is fixed to the tip of the other end side (lower side in FIG. 2) of the spindle shaft 7 and rotates with a shaft 42A, and a fixed portion 42B fixed to the spindle shaft and the winging 11 side. Have The rotating part 42A and the fixed part 42B are provided so as to face each other in a non-contact manner. A through hole 42a is provided at a substantially central portion of the rotary transformer 42 so as to be substantially along the shaft axial direction, and the tip end force on the other end side of the spindle shaft 7 is also provided so as to project in the through hole 42a. Earth shaft 7A is inserted. On the other hand, the rectifying circuit 43 is installed on the other end side of the spindle shaft 7 and is connected to the rotating portion 42A of the rotary transformer 42, and is supplied from the AC power supply 40 via the terminal 41 and the rotary transformer 42. Converts AC voltage to DC voltage.

Note that an electromagnetic shield member 44 is provided in a portion where an alternating current flows in the spindle motor and the bossing 11, that is, around the rotary transformer 42 and the rectifier circuit 43. As a result, the magnetic field generated by the rotary transformer 42 and the rectifier circuit 43 through which an alternating current flows is attenuated, and the magnetic field affects the trajectory of the electron beam irradiated from the electron column 4 to the disk substrate 5 to deteriorate the recording accuracy. It is now possible to prevent the inconvenience.

[0025] The tip of the earth shaft 7a is in contact with a contact member 52 provided on the spindle knowing 11 side, and slides at the contact portion when the spindle shaft 7 rotates. Yes. The sliding portion 54 is positioned on a substantially axis X of the spindle shaft 7. The contact member 52 is grounded via a terminal 53, whereby the potential of the spindle shaft 7 is grounded. Note that, as described above, the force for supplying a voltage between the disk substrate 5 and the electrostatic clamp electrode 50 from the AC power source 40 via the rectifier circuit 43 and the coaxial cable 38 is because the external conductor 38B and the spindle shaft 7 are electrically connected. The output on the outer conductor 38B side of the rectifier circuit 43 is connected to the disk substrate 5 and grounded.

Next, the electrostatic clamping mechanism of the disk substrate 5 will be described with reference to FIG. Figure 3 shows the portion of the electrical circuit of the master disc manufacturing device 1 that is related to the electrostatic clamping function. FIG.

As shown in this figure, the AC power supply 40 is connected to a primary coil 55 provided in the fixed portion 42 B of the rotary transformer 42. On the other hand, the secondary coil 56 provided in the rotating part 42 A of the rotary transformer 42 is connected to the rectifier circuit 43. With such a configuration, when the switch 57 of the AC power supply 40 is turned on, the secondary coil 56 is excited by the primary current flowing through the primary coil 55, and an induced current is generated by the electromagnetic induction. This induced current is rectified by the rectifier circuit 43, and a DC voltage generated thereby is applied between the electrostatic clamp electrode 50 and the disk substrate 5. As a result, an electrostatic force is generated between the electrostatic clamp electrode 50 and the disk substrate 5, and the disk substrate 5 is attracted to the turntable 6 by this electrostatic force and can be clamped. If the switch 57 of the AC power supply 40 is turned OFF, the charged charge between the electrostatic clamp electrode 50 and the disk substrate 5 flows as a current through the parallel resistor 58 of the rectifier circuit 43, and therefore after a certain time has elapsed. The electrostatic clamp electrode 50 and the disk substrate 5 are at the same potential, and the attractive force disappears. In FIG. 3, a typical circuit is shown as an example of the rectifier circuit 43. However, the present invention is not limited to this, and other types of rectifier circuits may be used.

[0028] As described above, the rotation drive device 3 according to the present embodiment includes the housing (spindle knowing in this example) 11 that rotatably supports the rotating shaft (spindle shaft in this example) 7 and the rotation. An insulating turntable 6 that is provided so as to rotate together with the shaft 7 and on which a substrate (disk substrate in this example) 5 is placed, and a clamp electrode (electrostatic clamp electrode in this example) provided in the turntable 6 50 and a single transformer 42 for supplying a clamp voltage to the clamp electrode 50 while allowing relative rotation between the clamp electrode 50 and the casing 11 as the rotary shaft 7 rotates. .

In the rotary drive device 3 of the present embodiment, the substrate 5 placed on the turntable 6 is gripped (clamped) by the electrostatic force of the clamp electrode 50 provided in the turntable 6. Then, a clamp voltage is supplied via the rotary transformer 42 from the casing 11, that is, the fixed side, to the clamp electrode 50 on the rotating body rotating with the rotating shaft 7. In this way, power can be supplied in a non-contact manner while allowing relative rotation between the clamp electrode 50 and the housing 11 by supplying power with a transformer mechanism via electromagnetic induction. As a result, the clamp electrode 5 It is possible to improve the durability that does not wear as in the case where power is supplied while allowing relative rotation between 0 and the casing 11 at the contact portion.

[0030] An electron beam irradiation apparatus (disc original disk manufacturing apparatus in this example) 1 according to the present embodiment is an electron beam irradiation apparatus 1 that irradiates a substrate 5 with an electron beam, and an electron beam injection unit (1) that emits an electron beam. In this example, an electron column) 4, a vacuum chamber 2 (in this example, a vacuum chamber) 2 for introducing an electron beam from the electron beam emitting means 4, and a casing 11 that rotatably supports a rotating shaft 7, Insulating turntable 6 that is provided in vacuum chamber 2 so as to rotate together with rotating shaft 7 and on which substrate 5 is placed, clamp electrode 50 provided in turntable 6, and rotating shaft 7 are rotated. The rotary transformer 42 for supplying a clamp voltage to the clamp electrode 50 while allowing relative rotation between the clamp electrode 50 and the casing 11 and a motor for rotating the rotary shaft 7 (in this example, a spindle motor) ) Characterized in that it includes a rotary drive means (in this example, a rotary drive device) 3 including 35 and a moving means (in this example, a stage) 8 for moving the rotary drive means 3 relative to the electron beam emitting means 4 To

In the electron beam irradiation apparatus 1 of the present embodiment, the electron beam emitted from the electron beam emitting means 4 is introduced into the vacuum chamber 2 and placed on the turntable 6 of the rotation driving means 3. Is incident on. At this time, the rotation driving means 3 is moved relative to the electron beam injection means 4 by the moving means 8, and the turntable 6 is rotated by driving the rotating shaft 7 by the motor 35 in the rotation driving means 3. Thus, predetermined drawing is performed on the substrate 5.

[0032] At this time, the substrate 5 is rotated by the electrostatic force of the clamp electrode 50 provided in the turntable 6 and the force that is gripped (clamped) in a state of being placed on the turntable 6. The body side clamp electrode 50 is supplied via the casing 11, that is, the fixed side force, the clamp voltage force, and the single transformer 42. In this way, power can be supplied in a non-contact manner while allowing relative rotation between the clamp electrode 50 and the housing 11 by supplying power through a transformer mechanism via electromagnetic induction. As a result, it is possible to improve durability without causing wear as in the case of supplying power while allowing relative rotation between the clamp electrode 50 and the housing 11 at the contact portion. [0033] In the rotary drive device 3 in the above-described embodiment, the rotary transformer 42 is provided with a primary side fixing portion (in this example, a fixing portion) 42B provided on the casing 11 side and supplied with an AC power supply voltage. The secondary side rotating part (in this example, the rotating part) 42A is provided on the rotary shaft 7 side so as to face the side fixing part 42B in a non-contact manner and is excited by electromagnetic induction from the primary side fixing part 42B. It is characterized by providing.

[0034] Based on the AC power supply voltage supplied to the primary side fixing part 42B on the case 11 side, electromagnetic induction is performed in a non-contact manner on the secondary side rotating part 42A arranged on the rotary shaft 7 side opposite thereto. By inducing the electromotive force, the electric power can be supplied to the clamp electrode 50 in a non-contact manner while allowing the relative rotation between the clamp electrode 50 and the housing 11.

[0035] In the electron beam irradiation apparatus 1 in the above embodiment, the rotary transformer 42 provided in the rotation driving means 3 is provided on the housing 11 side and supplied with an AC power supply voltage. A primary side fixed part 42B provided on the rotary shaft 7 side so as to be opposed to the non-contact, and a secondary side rotary part 42A that is excited by electromagnetic induction of the primary side fixed part 42B. Features.

[0036] Based on the AC power supply voltage supplied to the primary-side fixing part 42B on the case 11 side, electromagnetic induction is performed in a non-contact manner on the secondary-side rotating part 42A disposed on the rotating shaft 7 side opposite to the AC power supply voltage. By inducing the electromotive force, the electric power can be supplied to the clamp electrode 50 in a non-contact manner while allowing the relative rotation between the clamp electrode 50 and the housing 11.

[0037] In the rotation drive device 3 in the above-described embodiment, a rectification unit is provided so as to rotate together with the rotation shaft 7, and rectifies the AC voltage excited by the secondary side rotation unit 42A and supplies a clamp voltage ( In this example, a rectifier circuit) 43 is provided.

[0038] Thereby, the AC voltage induced in the secondary side rotating unit 42A can be rectified and converted into a direct current based on the AC power supply voltage of the primary side fixing unit 42B, and supplied to the clamp electrode as a clamp voltage.

[0039] In the electron beam irradiation apparatus 1 in the above embodiment, the rotation driving means 3 is provided so as to rotate together with the rotation shaft 7, and rectifies the AC voltage excited by the secondary side rotation unit 42A and clamps it. It is characterized by having rectifying means 43 for supplying.

[0040] This induces the secondary side rotating part 42A based on the AC power supply voltage of the primary side fixing part 42B. The AC voltage thus generated can be rectified and converted into a DC voltage and supplied to the clamp electrode 50 as a clamp voltage.

In the rotary drive device 3 in the above embodiment, the sliding portion 54 for grounding the potential of the rotary shaft 7 while allowing the relative rotation between the rotary shaft 7 and the housing 11 is provided on the rotary shaft 7. It is provided on a substantially axial line X.

[0042] By allowing the rotating shaft 7 to be grounded while allowing the relative rotation between the rotating shaft 7 and the housing 11 through the sliding portion 54, incident electrons are not emitted when used in, for example, an electron beam irradiation apparatus. It is possible to prevent the substrate 5 from being charged. In addition, the ground resistance can be reduced as compared with the case of conductive connection using a conductive fluid.

In the electron beam irradiation apparatus 1 in the above embodiment, the rotation driving means 3 is a sliding portion for grounding the potential of the rotating shaft 7 while allowing the rotating shaft 7 and the housing 11 to rotate relative to each other. 54 on the axis X of the rotary shaft 7.

[0044] By allowing the rotating shaft 7 to be grounded while allowing the relative rotation between the rotating shaft 7 and the housing 11 via the sliding portion 54, electrons incident from the electron beam emitting means 4 are applied to the substrate 5. It is possible to prevent charging. Further, the ground resistance can be reduced as compared with the case of conducting conductive connection using a conductive fluid.

In the electron beam irradiation apparatus 1 according to the above-described embodiment, the rotation driving unit 3 is an electromagnetic shielding unit that attenuates a magnetic field that also generates at least one force of the rotary transformer 42 and the rectifying unit 43 (in this example, an electromagnetic shielding unit). Member) 44.

This attenuates the magnetic field generated from the rotary transformer 42 and the rectifying means 43 through which an alternating current flows, and the magnetic field affects the trajectory of the electron beam irradiated onto the substrate 5 from the electron beam emitting means 4. Thus, it is possible to prevent the recording accuracy from being deteriorated.

Note that the present embodiment is not limited to the above, and various modifications are possible. Hereinafter, such modifications will be described step by step.

[0048] (1) In the case where the earth shaft and the housing are electrically connected by a conductive magnetic fluid

In the above embodiment, the force is such that the potential of the spindle shaft 7 is grounded by sliding the earth shaft 7A and the contact member 52, but the present invention is not limited to this, and the earth shaft 7A and the spindle housing 11 are connected to the conductive magnetic fluid. Also good as a structure to make it conductive. [0049] Fig. 4 is a cross-sectional view schematically showing the internal structure of the spindleno / housing 11 in this modification, and corresponds to Fig. 2 described above. The same parts as those in FIG.

[0050] As shown in this figure, the earth shaft 7A on which the force at the other end of the spindle shaft 7 also protrudes is connected to a connection member 60 provided on the spindle nosing 11 via a conductive magnetic fluid 61. Yes. As a result, the potential of the spindle shaft 7 is designed to be grounded via the earth shaft 7A, the conductive magnetic fluid 61, the connecting member 60, and the spindle housing 11.

[0051] In the rotational drive device 3 in the present modification, a conductive fluid connection portion (in this example, conductive material) for grounding the potential of the rotary shaft 7 while allowing the relative rotation between the rotary shaft 7 and the casing 11 is allowed. (Magnetic fluid) 61 is provided.

[0052] By allowing the rotating shaft 7 to be grounded while allowing the relative rotation between the rotating shaft 7 and the housing 11 via the conductive fluid connecting portion 61, it is incident when used in an electron beam irradiation apparatus, for example. It is possible to prevent the electrons from being charged on the substrate 5. In addition, the contact resistance is small and wear can be suppressed as compared with the case where the conductive connection is made through the sliding portion.

[0053] In the electron beam irradiation apparatus 1 according to the present modification, the rotation driving means 3 is a conductive fluid connection for grounding the potential of the rotating shaft 7 while allowing relative rotation between the rotating shaft 7 and the housing 11. It has the part 61.

[0054] By allowing the rotating shaft 7 to be grounded while allowing the relative rotation between the rotating shaft 7 and the housing 11 via the conductive fluid connecting portion 61, the electrons incident from the electron beam emitting means 4 are made to the substrate. 5 can be prevented from being charged. In addition, the contact resistance is small and wear can be suppressed compared to the case of conducting conductive connection through a sliding portion.

[0055] (2) When using a conductive magnetic fluid instead of the vacuum seal

In the above embodiment, the force that seals the radial gap between the opening 11a of the spindle housing 11 and the spindle shaft 7 with the vacuum seal portion 37 is not limited to this, and the conductive magnetic fluid is used instead of the vacuum seal portion. It is also possible to have a structure that allows the spindle shaft and the spindle housing 11 to be electrically connected while performing the seal using!

[0056] FIG. 5 is a cross-sectional view schematically showing the internal structure of the spindle nose / housing 11 in this modification. FIG. 3 is a plan view corresponding to FIG. 2 described above. The same parts as those in FIG.

As shown in this figure, in this modification, a conductive magnetic fluid 62 is provided in the radial gap between the opening 11 a of the spindle housing 11 and the spindle shaft 7. As a result, the gap between the opening 1 la and the spindle shaft 7 can be sealed with the conductive magnetic fluid 62, and the airtightness inside the spindle nosing 11 can be maintained. Further, the electric potential of the spindle shaft 7 is grounded via the spindle housing 11 via the conductive magnetic fluid 62.

[0058] In the rotary drive device 3 in this modification, a conductive fluid connection portion (in this example, conductive material) for grounding the potential of the rotary shaft 7 while allowing the relative rotation between the rotary shaft 7 and the casing 11 is allowed. (Magnetic fluid) 62 is provided.

[0059] By allowing the rotation shaft 7 to be grounded while allowing the relative rotation between the rotation shaft 7 and the housing 11 via the conductive fluid connection portion 62, for example, when used in an electron beam irradiation apparatus. It is possible to prevent the electrons from being charged on the substrate 5. In addition, the contact resistance is small and wear can be suppressed as compared with the case where the conductive connection is made through the sliding portion.

[0060] In the electron beam irradiation apparatus 1 according to this modification, the rotation driving means 3 is a conductive fluid connection for grounding the potential of the rotating shaft 7 while allowing the relative rotation between the rotating shaft 7 and the casing 11. It has the part 62, It is characterized by the above-mentioned.

[0061] By allowing the rotating shaft 7 to be grounded while allowing the relative rotation between the rotating shaft 7 and the housing 11 via the conductive fluid connecting portion 62, the electrons incident from the electron beam emitting means 4 are made to the substrate. 5 can be prevented from being charged. In addition, the contact resistance is small and wear can be suppressed compared to the case of conducting conductive connection through a sliding portion.

The rotational drive device 3 in the above embodiment is provided with a spindle nosing 11 that rotatably supports the spindle shaft 7, and an insulating turn on which the disk substrate 5 is placed so as to rotate together with the spindle shaft 7. The electrostatic clamp electrode 50 provided in the table 6, the electrostatic clamp electrode 50 provided in the turntable 6, and the electrostatic clamp electrode 50 while allowing the relative rotation of the electrostatic clamp electrode 50 and the spindle nosing 11 accompanying the rotation of the spindle shaft 7 are allowed. And a rotary transformer 42 for supplying a clamp voltage to the motor. In the rotary drive device 3 of the present embodiment, the disk substrate 5 placed on the turntable 6 is gripped (clamped) by the electrostatic force of the electrostatic clamp electrode 50 provided in the turntable 6. . A clamp voltage is supplied via a rotary transformer 42 from the spindle housing 11, that is, the fixed side, to the electrostatic clamp electrode 50 on the rotating body rotating together with the spindle shaft 7. Thus, by supplying power by the transformer mechanism via electromagnetic induction, it is possible to supply electric power in a non-contact manner while permitting relative rotation between the electrostatic clamp electrode 50 and the spindle nosing 11. As a result, it is possible to improve durability without causing wear as in the case of supplying power while allowing relative rotation between the electrostatic clamp electrode 50 and the spindle housing 11 at the contact portion.

In addition, the disk master manufacturing apparatus 1 in the above embodiment is a disk master manufacturing apparatus 1 that irradiates a disk substrate 5 with an electron beam, and includes an electron column 4 that emits an electron beam, and the electron column 4. A vacuum chamber 2 for introducing the electron beam into the interior, a spindle housing 11 for rotatably supporting the spindle shaft 7, and the spindle shaft 7 are provided in the vacuum chamber 2 so as to rotate. Insulating turntable 6 to be placed, electrostatic clamp electrode 50 provided in this turntable 6, and electrostatic clamp electrode 50 associated with rotation of spindle shaft 7 and spindle nosing 11 while allowing relative rotation Rotary transformer 42 for supplying clamp voltage to electrostatic clamp electrode 50 and spindle shaft 7 are driven to rotate A rotary drive device 3 including a spindle motor 35 for rotating, and a stage 8 for moving the rotary drive device 3 relative to the electronic column 4.

In the disc master manufacturing apparatus 1 of the present embodiment, an electron beam emitted from the electron column 4 is introduced into the vacuum chamber 2 and placed on the turntable 6 of the rotary drive device 3. Is incident on. At this time, the rotary drive device 3 is moved relative to the electronic column 4 by the stage 8, and the spindle shaft 7 is driven by the spindle motor 35 in the rotary drive device 3 to rotate the turntable 6. A predetermined drawing is performed.

At this time, the disk substrate 5 is gripped (clamped) while being placed on the turntable 6 by the electrostatic force of the electrostatic clamp electrode 50 provided in the turntable 6 Spin A clamping voltage from the spindle nosing 11, that is, the fixed side clamp, is supplied to the electrostatic clamp electrode 50 on the rotating body rotating together with the dollar shaft 7 through the rotary transformer 42. In this way, power can be supplied in a non-contact manner while allowing relative rotation between the electrostatic clamp electrode 50 and the spindle housing 11 by supplying power with a transformer mechanism via electromagnetic induction. As a result, it is possible to improve durability without causing wear as in the case of supplying power while allowing relative rotation between the electrostatic clamp electrode 50 and the spindle nosing 11 at the contact portion.

Brief Description of Drawings

FIG. 1 is a block diagram showing an overall configuration of a master disc manufacturing apparatus according to an embodiment of the present invention.

2 is a cross-sectional view schematically showing the internal configuration of the spindle saw and ousting shown in FIG.

FIG. 3 is a circuit diagram in which a portion related to the electrostatic clamping function is extracted from the electric circuit of the master disk manufacturing apparatus.

FIG. 4 is a cross-sectional view schematically showing an internal configuration of a spindle housing in a modified example in which a ground shaft and a casing are electrically connected by a conductive magnetic fluid.

FIG. 5 is a cross-sectional view schematically showing an internal configuration of a spindle housing in a modification using a conductive magnetic fluid instead of a vacuum seal portion.

Explanation of symbols

1 Disc master production equipment (electron beam irradiation equipment)

2 Vacuum channel (vacuum chamber)

3 Rotation drive device (Rotation drive means)

4 Electron column (electron beam injection means)

5 Disc substrate (substrate)

6 Turntable

7 Spinner shaft (rotating shaft)

8 stages (moving means)

11 Spindle housing (housing) Spinner motor (motor)

Rotary transformer

A Rotating part (secondary rotating part)

B fixed part (primary side fixed part)

Rectifier circuit (rectifier means)

Electrostatic clamp electrode (clamp electrode) Conductive magnetic fluid (conductive fluid connection) Conductive magnetic fluid (conductive fluid connection)

Claims

The scope of the claims

[1] a housing that rotatably supports the rotating shaft;

An insulative turntable that is provided to rotate together with the rotating shaft and on which a substrate is placed;

A clamp electrode provided in the turntable;

A rotary transformer for supplying a clamp voltage to the clamp electrode while permitting relative rotation between the clamp electrode and the casing in accordance with rotation of the rotary shaft;

A rotary drive device comprising:

[2] In the rotary drive device according to claim 1,

The rotary transformer is

A primary side fixing portion provided on the housing side and supplied with an AC power supply voltage;

Provided on the rotary shaft side so as to be opposed to the primary side fixing portion in a non-contact manner,

Secondary side rotating part excited by electromagnetic induction from primary side fixed part

A rotary drive device comprising:

[3] In the rotary drive device according to claim 2,

A rotary drive device, comprising: a rectifier provided so as to rotate together with the rotary shaft, for rectifying an AC voltage excited by the secondary side rotary unit and supplying the clamp voltage.

[4] The rotary drive device according to any one of claims 1 to 3,

A rotary drive device characterized in that a sliding portion for grounding the potential of the rotary shaft while allowing relative rotation between the rotary shaft and the housing is provided on a substantially axial line of the rotary shaft.

[5] The rotary drive device according to any one of claims 1 to 3,

A rotation drive device comprising a conductive fluid connection portion for grounding a potential of the rotation shaft while allowing relative rotation between the rotation shaft and the casing.

[6] An electron beam irradiation apparatus for irradiating a substrate with an electron beam,

Electron beam emitting means for emitting the electron beam;

A vacuum chamber for introducing the electron beam from the electron beam emitting means into the interior; A housing that rotatably supports a rotating shaft, an insulating turntable that is provided in the vacuum chamber so as to rotate together with the rotating shaft, and on which a substrate is placed, a clamp electrode provided in the turntable, the rotating shaft Rotation drive means including a rotary transformer for supplying a clamp voltage to the clamp electrode while allowing relative rotation between the clamp electrode and the casing accompanying rotation of the housing, and a motor for driving the rotation shaft to rotate When,

An electron beam irradiation apparatus comprising: a moving unit that moves the rotation driving unit relative to the electron beam emitting unit.

[7] In the electron beam irradiation apparatus according to claim 6,

The rotary transformer provided in the rotation driving means is

A secondary side rotating part provided on the rotating shaft side so as to be opposed to the primary side fixing part in a non-contact manner, and excited by electromagnetic induction from the primary side fixing part;

An electron beam irradiation apparatus comprising:

[8] In the electron beam irradiation apparatus according to claim 7,

The rotation driving means includes

An electron beam irradiation apparatus comprising: a rectifying unit that is provided so as to rotate together with the rotating shaft, and that rectifies an AC voltage excited by the secondary rotating unit and supplies the clamp voltage.

[9] In the electron beam irradiation apparatus according to any one of claims 6 to 8,

The rotation driving means includes

An electron beam irradiation apparatus comprising: a sliding portion for grounding the electric potential of the rotating shaft while allowing relative rotation between the rotating shaft and the housing on a substantially axial line of the rotating shaft. .

[10] The electron beam irradiation apparatus according to claim 9,

The rotation driving means is

An electron beam irradiation apparatus comprising electromagnetic shielding means for attenuating a magnetic field that also generates at least one force of the rotary transformer and the rectifying means.

[11] The electron beam irradiation apparatus according to any one of claims 6 to 8, The rotation driving means includes

An electron beam irradiation apparatus comprising: a conductive fluid connecting portion for grounding the potential of the rotating shaft while allowing relative rotation between the rotating shaft and the casing.

[12] In the electron beam irradiation apparatus according to claim 11,!

The rotation driving means is

[13] The electron beam irradiation apparatus according to any one of claims 6 to 8,

The rotation driving means includes