JP2003036569A - Apparatus for manufacturing master disk and rotary driving device for substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a high-accuracy rotary driving device and an apparatus for manufacturing a master disk, which can manufacture a high-density disk. SOLUTION: An electrostatic chucking part is provided, which consists of a chucking electrode provided in a turntable, a power supply cable for supplying a chucking voltage to the chucking electrode through a spindle shaft, and a rotary connector for supplying the chucking voltage to the power supply cable.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing apparatus for manufacturing a disk master by irradiating a substrate with an electron beam.

[0002]

2. Description of the Related Art In recent years, various recording media capable of recording large-capacity image / voice data and digital data have been developed. For example, there are optical discs such as DVDs (Digital Versatile Discs), and research and development are underway to increase the storage capacity of optical discs with a diameter of 12 cm to 30 GB (Giga-Byte).

However, in conventional cutting of an optical disk master using a laser beam in the visible or ultraviolet range, the recording resolution is limited by the spot diameter of the recording laser beam. Therefore, in order to increase the density of the optical disc described above, the optical disc master is manufactured by an optical disc master manufacturing apparatus using an electron beam that has a smaller spot diameter than the laser light in the visible range and the ultraviolet range and can improve the recording resolution. It is considered to manufacture the so-called, so-called cutting.

The optical disk master is manufactured by applying an electron beam resist on a substrate and then irradiating it with an electron beam in a vacuum atmosphere. A latent image of a fine pattern is formed on the electron beam resist by electron beam irradiation (electron beam exposure). Such a substrate is subjected to development processing, patterning and resist removal processing,
A fine uneven pattern is formed on the substrate.

Further, also in the production of a disk substrate such as a magnetic recording hard disk, a process of forming a fine pattern using an electron beam is executed.

[0006]

DISCLOSURE OF THE INVENTION In a disk master manufacturing apparatus using an electron beam, in order to manufacture a high density disk, it is necessary to rotate the disk substrate with high accuracy. Further, when the substrate is fixed by mechanical chucking, a center shift is likely to occur during the fixing, which causes a decrease in accuracy. Further, in order to obtain high recording resolution, the electron beam must be converged finely, but in this case, the electron beam speed becomes high. on the other hand,
Since a high-speed electron beam passes through the resist layer for electron beams without being absorbed, there is a problem that the exposure amount decreases and the resolution decreases.

The present invention has been made in view of the above-mentioned points, and an object of the present invention is to provide a highly accurate rotation drive device and a disk master manufacturing device which enable the manufacture of high density disks. It is in.

[0008]

A rotary drive device according to the present invention includes an insulating turntable on which a substrate is placed, a spindle housing, and a turntable which is rotatably supported by a spindle housing via a gas bearing. A rotary drive device comprising a spindle shaft having one end fixed, a motor for rotationally driving the spindle shaft, and an electrostatic chuck unit for adsorbing a substrate on a turntable, wherein the electrostatic chuck unit is a turntable. A chucking electrode provided in the table, a power supply cable that penetrates the spindle shaft to supply a chucking voltage to the chucking electrode, and a rotary connector that supplies the chucking voltage to the power supply cable. There is.

A disk master manufacturing apparatus according to the present invention is an apparatus for manufacturing a disk master by irradiating an electron beam on a substrate, and has an electron beam emitting section for emitting an electron beam and a through hole. An insulating turntable that supports the substrate on the support surface, a spindle housing, a spindle shaft that is rotatably supported by the spindle housing via gas bearings, and has one end fixed to the turntable, and a motor that drives the spindle shaft to rotate. An electrostatic chuck part for adsorbing the substrate to the turntable, and a rotary drive part including a rotary drive part, a translation drive part for relatively translationally moving the rotary drive part with respect to the electron beam emitting part, Is a chucking electrode provided in the turntable and a chucking electrode housed in the spindle shaft. A feeding cable for feeding the chucking voltage, and characterized in that it comprises a rotary connector supplying a chucking voltage to the power supply cable.

[0010]

Embodiments of the present invention will be described in detail with reference to the drawings. Note that, in the drawings used in the following description, the same components are designated by the same reference numerals. FIG. 1 is a block diagram showing the configuration of a disk master manufacturing apparatus 10 using an electron beam, which is an embodiment of the present invention.

First, an outline of the manufacturing process of an optical disk master will be described below. The electron beam is used in a vacuum atmosphere because it has a characteristic of being significantly attenuated in the air atmosphere. Therefore, the electron gun and a turntable on which a substrate for producing an optical disk master is placed are arranged in a vacuum atmosphere. A silicon (Si) substrate, for example, is used for manufacturing the optical disc master.
An electron beam resist is applied to the main surface of the silicon substrate. The substrate coated with the electron beam resist is rotationally driven and irradiated with the electron beam modulated by the information data signal in the disc master manufacturing apparatus, and the latent image of the fine concavo-convex pattern such as pits and grooves is spiraled. Is formed.

After the electron beam exposure is completed, the substrate is taken out from the disk master manufacturing apparatus and subjected to a developing process. Next, patterning and resist removal processes are performed to form a fine uneven pattern on the substrate.
A conductive film is formed on the main surface of the patterned substrate,
An optical disk master (stamper) is manufactured by performing electroforming.

As shown in FIG. 1, a disk master manufacturing apparatus 10 includes a vacuum chamber 11, a drive device for driving a disk substrate arranged in the vacuum chamber 11, and an electron beam optical system attached to the vacuum chamber 11. An electron beam emitting head unit 40 including the above is provided. An optical disk substrate (hereinafter, simply referred to as a disk substrate) 15 for an optical disk master is placed on a turntable 16. The turntable 16 is an air spindle motor 17 that is a rotation driving device that rotationally drives the disk substrate 15.
Is driven to rotate about the vertical axis of the main surface of the disk substrate. The air spindle motor 17 is housed in a feed stage (hereinafter, simply referred to as a stage) 18.
The stage 18 is coupled to a feed motor 19 which is a translation drive device, and is capable of translating the air spindle motor 17 and the turntable 16 in a predetermined direction in a plane parallel to the main surface of the disk substrate 15. There is. The turntable 16 is made of a material such as a dielectric material such as ceramic, and the disk substrate 15 is held on the turntable 16 by an electrostatic chucking mechanism described later.

Further, the vacuum chamber 11 is provided with a light source 22, a photodetector 23, and a height detector 24 for detecting the height of the main surface of the disk substrate 15. The photodetector 23 is, for example, a position sensor or a CCD (Charge C
Including emitted from the light source 22,
The light beam reflected by the surface of the disk substrate 15 is received, and a light reception signal is supplied to the height detector 24. The height detector 24 detects the height of the main surface of the disk substrate 15 based on the received light signal.

The vacuum chamber 11 is installed via an anti-vibration table (not shown) such as an air damper to suppress the transmission of vibrations from the outside. Further, a vacuum pump 28 is connected to the vacuum chamber 11, and the interior of the chamber is set to a vacuum atmosphere of a predetermined pressure by exhausting the inside of the chamber by this. Further, a drive control unit 30 for controlling the air spindle motor 17 and the feed motor 19 is provided. Drive controller 3
0 is a CP that controls the entire disc master manufacturing apparatus 10.
It operates under the control of U25.

An electron gun 41, a converging lens 42, a blanking electrode 43, an aperture 44, a beam deflecting electrode 45, a focus adjusting lens 46, and an objective lens 47 are provided in an electron beam emitting head portion 40 for emitting an electron beam.
Are arranged in this order in the electron beam emitting head portion 40. The electron beam emission head unit 40 is attached to the ceiling surface of the vacuum chamber 11 with an electron beam emission port 49 provided at the tip of the electron gun barrel 48 facing the space inside the vacuum chamber 11. Further, the electron beam emitting port 49 is arranged facing the main surface of the disk substrate 15 on the turntable 16 so as to face it.

The electron gun 41 emits an electron beam accelerated to, for example, several tens KeV by a cathode (not shown) to which a high voltage supplied from the electron gun power source 51 is applied. The converging lens 42 converges the emitted electron beam and guides it to the aperture 44. Blanking driver 54
Operates on the basis of a signal from the recording control unit 52 to control the blanking electrode 43 to perform on / off control of the electron beam. That is, a voltage is applied between the blanking electrodes 43 to largely deflect the electron beam passing therethrough. As a result, the electron beam is not converged in the aperture hole of the aperture 44, the electron beam is prevented from passing through the aperture 44, and the electron beam can be turned off.

The beam deflection driver 55 applies a voltage to the beam deflection electrode 45 to deflect the passing electron beam in response to a control signal from the CPU 25. This allows
The position of the electron beam spot on the disk substrate 15 is controlled. The focus lens drive unit 56 performs focus adjustment of the electron beam spot with which the main surface of the disk substrate 15 is irradiated, based on the detection signal from the height detection unit 24.

As described above, when cutting (electron beam exposure) the disk substrate 15,
When the electron beam is incident on the resist layer formed above at a high speed, the electron beam passes through the resist layer, the exposure amount is reduced, and the resolution is lowered. Therefore, in the present invention, the deceleration voltage (-V), which is a negative voltage of a magnitude that decelerates the electron beam of the electron beam, is applied to the disk substrate 15.
_R ) (hereinafter referred to as a retarding voltage) is applied (hereinafter referred to as a retarding method). A voltage source 60 is provided for applying the retarding voltage and the chucking voltage. Specifically, for example, when the acceleration voltage of the electron beam is 50 kV,
The retarding voltage is -40 kV. The magnitude of the retarding voltage depends on the acceleration voltage of the electron beam,
It may be appropriately determined according to the sensitivity characteristics of the resist layer and the resolution required for the disc master.

Next, the mechanism for applying the retarding voltage to the disk substrate 15 and the electrostatic chucking mechanism for the disk substrate 15 will be described in detail with reference to FIGS. FIG. 2 shows the disk master manufacturing apparatus 10 shown in FIG.
FIG. 7 is a cross-sectional view schematically showing an internal configuration of a spindle housing 17A including the air spindle motor 17 and the high voltage supply section 37 of FIG.

Inside the spindle housing 17A of the air spindle motor 17, the spindle shaft 12
And an electromagnetic motor 13 that drives the spindle shaft to rotate.
Is housed. The spindle shaft 12 is rotatably supported by a spindle housing 17A via a gas bearing 14 and has one end fixed to a turntable 16. In this example, in the vicinity of the end of the spindle shaft 12, a pressure seal (magnetic fluid seal) 35 is formed between the opening of the spindle housing 17A and the spindle shaft 12
The spindle shaft 12 is provided so as to surround the spindle shaft 12 so as to be interposed in a radial gap with the. Magnetic fluid seal 35
As a result, the airtightness inside the spindle housing 17A is maintained. The spindle housing 17A and the spindle shaft 12 are grounded to the apparatus main body, that is, the vacuum chamber 11 by a magnetic fluid seal 35.

A motor (main body) 13A for rotationally driving the spindle shaft 12 is attached to the spindle shaft 12 in the spindle housing 17A. The spindle shaft 12 can be rotated by utilizing the electromagnetic force generated by passing a current through the coil 13B provided in the housing 17B. As a result, the spindle shaft 1 outside the spindle housing 17A
It is possible to rotate the turntable 16 or the like fixed to the end portion of 2.

A coaxial cable 31 for supplying a high voltage to the disk substrate 15 and / or the turntable 16 is provided in the spindle housing 17A. More specifically, the coaxial cable 31 is an internal conductor (core wire).
31A and an outer conductor 31B are provided in a through hole formed at the center of the spindle shaft 12. A supply voltage from the voltage source 60 is supplied to the coaxial cable 31 via a power cable connector 38, which is a coaxial connector, and a high voltage supply unit 37.

Air for bearing is supplied to the gas bearing 14 from the outside through a valve (not shown),
It circulates in the gas bearing 14. This circulating air is exhausted from the spindle housing 17A to the outside of the vacuum chamber 11 via a pipe (not shown). FIG. 3 shows FIG.
It is sectional drawing which shows typically the detail of the high voltage supply part 37 shown in FIG. Since a high voltage of several tens of kV is supplied to the coaxial cable 31, it is insulated from the spindle shaft 12 having a ground potential by a pipe 62 made of an insulating material (for example, acrylic or the like). The coaxial cable 31 rotates together with the spindle shaft 12. A high voltage is supplied to the coaxial cable 31 via the rotary connector 61. More specifically, the inner conductor 61A and the outer conductor 61B of the rotary portion of the rotary connector 61
Are connected to the inner conductor 31A and the outer conductor 31B of the coaxial cable 31, respectively. In addition, the rotary connector 6
1 non-rotating part (fixed part) inner conductor 61C, outer conductor 6
1D is connected to the inner conductor 38A and the outer conductor 38B of the power cable connector 38, respectively. The supporting portion 37B for supporting the rotary connector 61 and the power cable connector 38 are insulated by the insulating member 37A. An insulating flange 36 is provided at the end of the coaxial cable 31 inside the spindle housing 17A.
As shown in FIG. 3, the insulating flange 36 and the insulating member 37.
A is formed in a shape that allows a creeping distance.

Therefore, the rotary connector 61 is electrically insulated from the spindle housing 17A and the spindle shaft 12, and is thus also electrically insulated from the vacuum chamber 11. That is, it is not necessary to use a connector that can withstand a high voltage of several tens of kV, and it is possible to use a small-sized rotary connector with low torque loss.

A rolling bearing is used for the rotary connector 61, and mercury is used for the connecting portion between the rotating portion and the fixed portion. A slip ring that connects the rotating part and the fixed part with a brush can also be used. Also,
As the insulating material for the insulating flange 36 and the insulating member 37A described above, epoxy resin or ceramic can be used.

[0027] Thus, through the power cable connector 38 and the rotary connector 61, the retarding voltage from the voltage source 60 (-V _R, for example, -40 kV) is supplied to the inner conductor 31A of the coaxial cable 31. Also this chucking voltage (-V _C, for example, -500 V) the voltage obtained by adding (-V _R -V _C) an external conductor 3 of the coaxial cable 31
1B is supplied.

As described above, the rotary connector 61 is used to supply the high voltage, but the rotary connector 61 is connected so that the rotation accuracy of the air spindle motor 17 is not deteriorated. . 4A and 4B are cross-sectional views in the directions orthogonal to each other, showing details of the support structure and electrical connection of the rotary connector. FIG. 5 is a plan view when viewed from the rotating portions 61A and 61B side. A floating ring 61F is attached to the rotary connector body 61E, which is a non-rotating portion of the rotary connector 61. Through hole 6 for inserting guide pin 61G in floating ring 61F
1H is opened. Floating ring 61F
Are guided by guide pins 61G fixed to the rotary connector support portion 37B. The diameter of the through hole 61H is larger than the diameter of the guide pin 61G. That is, a gap is provided between the through hole 61H and the guide pin 61G. The length of the guide pin 61G is longer than the thickness of the floating ring 61F. That is, the floating ring 61F can move freely within the length of the guide pin 61G. The size of these gaps is, for example, 0.2 to 0.3 mm, but may be appropriately determined depending on the type and performance of the air spindle motor or rotary connector used, the accuracy required for the apparatus, and the like. Therefore, the rotary connector 61 can freely move within the range of these gaps along the central axis (rotational axis) of the spindle shaft 12 and in the plane perpendicular to the central axis. In other words, the rotary connector 61 is floatingly supported. The floating ring 61F does not necessarily have to be used. For example, instead of the floating ring 61F, a protrusion may be provided on the rotary connector body 61E so that the rotary connector body 61E does not rotate more than a certain angle.

On the other hand, as shown in FIGS. 4A and 4B, the inner conductor 38A of the power cable connector 38 is connected to the inner conductor 61 of the rotary connector 61 by the first connecting member 39A.
It is electrically connected to C. The outer conductor 38B of the power cable connector 38 is electrically connected to the outer conductor 61D of the rotary connector 61 by the second connecting member 39B. These first and second connecting members 39
A and 39B are formed of metal pieces or the like that do not hinder the movement of the rotary connector 61, but have a small elastic constant that moderately suppresses the vibration of the rotary connector 61. Further, the connecting members 39A and 39B have elastic constants and contact resistances that do not deteriorate the performance as contacts. For example, the first and second connecting members 39A, 39
B is formed of gold-plated phosphor bronze for springs.

FIG. 6 is a sectional view schematically showing the details of the central portion of the turntable 16 of the disk master manufacturing apparatus 10 shown in FIG. As described above, the at the time of electron beam exposure, the retarding voltage (-V _R) is applied to the disc substrate 15 supported on the turntable 16, to decelerate the electron beam of the electron beam incident on the disk substrate 15 It is configured to be able to. More specifically,
Retarding voltage supplied from the inner conductor 31A of the coaxial cable 31 (-V _R) is applied to the disc substrate 15 through the conductive member 26A formed of a conductive material. The conductive member 26A is urged so as to be retractable from the support surface through a through hole provided in the turntable 16 via 26C. For example, the conductive member 26A is an elastic member 26 such as a spring.
The conductive member 26A is urged by B and is pressed onto the disk substrate 15 placed on the turntable 16, so that a retarding voltage is applied to the disk substrate 15. The tip of the conductive member 26A is formed in a smooth convex shape, and is configured to be in constant contact with the disk substrate 15 and to be applied with a retarding voltage.

The disk substrate 15 is adsorbed and held on the turntable 16 by an electrostatic chucking mechanism.
More specifically, the voltage supplied from the outer conductor 31B of the coaxial cable 31 (-V _R -V _C) are applied to the chucking electrode 21 via chucking voltage conductive portion 27A, the 27B. That is, when a predetermined negative chucking voltage (-V _C ) with respect to the potential of the disk substrate 15 is applied to the chucking electrode 21, electrostatic polarization occurs on the turntable 16 made of ceramic or the like, which causes adsorption. It is the one that shows its power.

As described in detail above, according to the present invention, the rotary connector 61 is used in the high voltage connection between the rotating portion and the fixed portion, and the rotary connector 61 is not grounded. Therefore, it is not necessary to use a high withstand voltage connector, and a small-sized rotary connector with low torque loss can be used. As a result, the air spindle motor 1
A high voltage can be supplied without impairing the rotation accuracy of 7. Further, by floating-supporting the rotary connector 61, a high voltage can be supplied without adversely affecting the rotation accuracy of the air spindle motor 17.

By adopting such a configuration, a retarding voltage is applied to decelerate the electron beam to prevent the exposure amount and the resolution of the electron beam with respect to the resist layer from being lowered, and without deteriorating the rotation accuracy of the substrate. Electron beam exposure can be performed. Therefore, the high-density disk can be executed in a short time with high accuracy.

Further, by using the electrostatic chucking mechanism for holding the disk substrate 15 by chucking, the disk substrate 15 can be securely held on the turntable 16 even during rotation, and high-density exposure can be performed. It can be performed with high accuracy and stability. Further, even a warped disk substrate can be held flat on the turntable 16 over the entire surface by electrostatic attraction.
High-density exposure can be performed with high accuracy, and focus stability of the electron beam can be improved.

Although the optical disk master manufacturing apparatus has been described as an example, the present invention is not limited to this and can be applied to an apparatus for manufacturing a magnetic disk or the like using an electron beam. Further, the present invention can be applied to a disk manufacturing apparatus for forming a fine shape by electron beam direct writing without using a resist.

As is apparent from the above, according to the present invention, it is possible to realize a highly accurate rotation drive device and a disc master manufacturing device that enable the manufacture of high density discs.

[Brief description of drawings]

FIG. 1 is a block diagram showing a configuration of a disk master manufacturing apparatus using an electron beam according to a first embodiment of the present invention.

FIG. 2 is a cross-sectional view schematically showing an internal configuration of a spindle housing including an air spindle motor and a high voltage supply section of the disk master manufacturing apparatus shown in FIG.

FIG. 3 is a cross-sectional view schematically showing details of a high voltage supply section and an insulating flange section shown in FIG.

FIG. 4 is a cross-sectional view in a direction orthogonal to each other, showing details of the support structure and electrical connection of the rotary connector.

FIG. 5 is a plan view of the rotary connector as viewed from the rotating portion side.

FIG. 6 is a sectional view schematically showing details of a central portion of a turntable.

[Explanation of symbols for main parts]

10 Disc master manufacturing equipment 11 vacuum chamber 12 spindle shaft 14 Gas bearing 15 disk substrate 16 turntable 17 Air spindle motor 17A spindle housing 18 stages 19 Feed motor 21 chucking electrode 25 CPU 26A, 27A conductive member 26B elastic member 30 Drive control unit 31 coaxial cable 35 Magnetic fluid seal 36 Insulation flange 37 High voltage supply unit 40 Electron beam injection head 60 voltage source 61 Rotary connector 61F floating ring 61G guide pin 61H through hole

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Kobayashi Regular             Pioneer, 465 Osato-cho, Kofu City, Yamanashi Prefecture             Within the corporation (72) Inventor Kenji Uemura             Pioneer, 465 Osato-cho, Kofu City, Yamanashi Prefecture             Within the corporation (72) Inventor Hiroki Kaneda             Pioneer, 465 Osato-cho, Kofu City, Yamanashi Prefecture             Within the corporation (72) Inventor Kazumi Kuriyama             Pioneer, 465 Osato-cho, Kofu City, Yamanashi Prefecture             Within the corporation F-term (reference) 4E066 BB02 CA14 CB16                 5D121 AA02 BB38

Claims (7)

[Claims] 1. An insulative turntable on which a substrate is placed, a spindle housing, and a spindle shaft rotatably supported by the spindle housing via a gas bearing and having one end fixed to the turntable.
A rotary drive device comprising: a motor that rotationally drives the spindle shaft; and an electrostatic chuck unit that attracts the substrate to the turntable, the electrostatic chuck unit being provided in the turntable. And a rotary connector that supplies the chucking voltage to the power supply cable, and a rotary connector that supplies the chucking voltage to the power supply cable. Drive. 2. The rotary drive device according to claim 1, wherein a rotary portion of the rotary connector is fixed to the power supply cable, and a fixed portion of the rotary connector is floatingly supported by a stationary insulating member. 3. An apparatus for manufacturing a disk master by irradiating a substrate with an electron beam, the electron beam emitting portion emitting the electron beam, and having a through hole for supporting the substrate on a supporting surface thereof. Rotational drive including an insulating turntable, a spindle housing, a spindle shaft rotatably supported by the spindle housing via a gas bearing and having one end fixed to the turntable, and a motor for rotationally driving the spindle shaft. An electrostatic chuck part for adsorbing the substrate to the turntable, and a translation drive part for relatively translationally moving the rotation drive part with respect to the electron beam emitting part. A chucking electrode provided in the turntable and the chucking electrode housed in the spindle shaft. Feeding cable for feeding the chucking voltage to the King electrode, and a device which comprises a rotary connector, supply the chucking voltage to the power supply cable. 4. The electron beam deceleration unit for applying a retarding voltage to the substrate to decelerate the electron beam of the electron beam, the power supply cable including an inner conductor and an outer conductor, and the chucking. The voltage is supplied through the rotary connector and the outer conductor, and the retarding voltage is supplied through the rotary connector and the inner conductor.
The described device. 5. The apparatus according to claim 3, wherein the rotary portion of the rotary connector is fixed to the power supply cable, and the fixed portion of the rotary connector is floatingly supported by a stationary insulating member. 6. The apparatus of claim 3, wherein the rotary connector is insulated from ground potential. 7. The spindle shaft is grounded through a conductive magnetic fluid seal interposed between the spindle housing and the spindle shaft, and the rotary connector is insulated from the spindle shaft and the spindle housing. The apparatus of claim 3 characterized.