WO2007072851A1 - 水溶性アゾールプロドラッグの製造方法 - Google Patents
水溶性アゾールプロドラッグの製造方法 Download PDFInfo
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- WO2007072851A1 WO2007072851A1 PCT/JP2006/325352 JP2006325352W WO2007072851A1 WO 2007072851 A1 WO2007072851 A1 WO 2007072851A1 JP 2006325352 W JP2006325352 W JP 2006325352W WO 2007072851 A1 WO2007072851 A1 WO 2007072851A1
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 22
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 title abstract description 28
- 229940002612 prodrug Drugs 0.000 title abstract description 23
- 239000000651 prodrug Substances 0.000 title abstract description 23
- 150000001875 compounds Chemical class 0.000 claims abstract description 82
- 238000010511 deprotection reaction Methods 0.000 claims abstract description 62
- 239000002904 solvent Substances 0.000 claims abstract description 35
- 150000003839 salts Chemical class 0.000 claims abstract description 30
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 17
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 137
- -1 nitrile compound Chemical class 0.000 claims description 67
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 57
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 48
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 39
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 30
- 239000000126 substance Substances 0.000 claims description 30
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical group CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 27
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 claims description 27
- 239000004472 Lysine Substances 0.000 claims description 27
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 26
- 150000007524 organic acids Chemical class 0.000 claims description 25
- 239000003960 organic solvent Substances 0.000 claims description 22
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 21
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 20
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 17
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 16
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims description 15
- 125000001424 substituent group Chemical group 0.000 claims description 14
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 12
- 150000007522 mineralic acids Chemical class 0.000 claims description 12
- 239000012046 mixed solvent Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 11
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 10
- 239000012453 solvate Substances 0.000 claims description 10
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 claims description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- 150000005224 alkoxybenzenes Chemical group 0.000 claims description 8
- 229940044613 1-propanol Drugs 0.000 claims description 7
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 6
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 claims description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 5
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 claims description 5
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 claims description 4
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 4
- 229940071870 hydroiodic acid Drugs 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims description 3
- 229940092714 benzenesulfonic acid Drugs 0.000 claims description 3
- 238000002425 crystallisation Methods 0.000 claims description 3
- 230000008025 crystallization Effects 0.000 claims description 3
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 3
- 235000019260 propionic acid Nutrition 0.000 claims description 3
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 claims description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims 1
- 239000002516 radical scavenger Substances 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 43
- 239000010410 layer Substances 0.000 description 31
- 239000007864 aqueous solution Substances 0.000 description 26
- 238000006243 chemical reaction Methods 0.000 description 24
- 239000000243 solution Substances 0.000 description 13
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 12
- 239000011780 sodium chloride Substances 0.000 description 12
- 238000000605 extraction Methods 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 238000001914 filtration Methods 0.000 description 10
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 10
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 9
- 238000005481 NMR spectroscopy Methods 0.000 description 9
- 239000006187 pill Substances 0.000 description 9
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 9
- 125000004801 4-cyanophenyl group Chemical group [H]C1=C([H])C(C#N)=C([H])C([H])=C1* 0.000 description 8
- NVGBPTNZLWRQSY-UWVGGRQHSA-N Lys-Lys Chemical class NCCCC[C@H](N)C(=O)N[C@H](C(O)=O)CCCCN NVGBPTNZLWRQSY-UWVGGRQHSA-N 0.000 description 8
- PEZBJHXXIFFJBI-UHFFFAOYSA-N ethanol;phosphoric acid Chemical compound CCO.OP(O)(O)=O PEZBJHXXIFFJBI-UHFFFAOYSA-N 0.000 description 8
- 239000012044 organic layer Substances 0.000 description 8
- 229940079593 drug Drugs 0.000 description 7
- 239000003814 drug Substances 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 229910052700 potassium Inorganic materials 0.000 description 7
- NVWVWEWVLBKPSM-UHFFFAOYSA-N 2,4-difluorophenol Chemical compound OC1=CC=C(F)C=C1F NVWVWEWVLBKPSM-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- CAAULPUQFIIOTL-UHFFFAOYSA-N methyl dihydrogen phosphate Chemical compound COP(O)(O)=O CAAULPUQFIIOTL-UHFFFAOYSA-N 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 5
- 238000009776 industrial production Methods 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000002401 inhibitory effect Effects 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 3
- QLKXXDJVUWMMDH-UHFFFAOYSA-N furan tetrahydrate Chemical compound O.O.O.O.O1C=CC=C1 QLKXXDJVUWMMDH-UHFFFAOYSA-N 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- IRDFFAPCSABAGK-UHFFFAOYSA-N tert-butyl dihydrogen phosphate Chemical class CC(C)(C)OP(O)(O)=O IRDFFAPCSABAGK-UHFFFAOYSA-N 0.000 description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 230000000843 anti-fungal effect Effects 0.000 description 2
- 229940121375 antifungal agent Drugs 0.000 description 2
- 239000012267 brine Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000013058 crude material Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 2
- 125000006606 n-butoxy group Chemical group 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004708 n-butylthio group Chemical group C(CCC)S* 0.000 description 2
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004706 n-propylthio group Chemical group C(CC)S* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 2
- 125000005920 sec-butoxy group Chemical group 0.000 description 2
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910000104 sodium hydride Inorganic materials 0.000 description 2
- 239000012312 sodium hydride Substances 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- FFSJPOPLSWBGQY-UHFFFAOYSA-N triazol-4-one Chemical compound O=C1C=NN=N1 FFSJPOPLSWBGQY-UHFFFAOYSA-N 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- 238000000825 ultraviolet detection Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 125000006700 (C1-C6) alkylthio group Chemical group 0.000 description 1
- 125000004733 1,1,2-trimethylpropylthio group Chemical group CC(C(C)C)(S*)C 0.000 description 1
- 125000004725 1,1-dimethylbutylthio group Chemical group CC(CCC)(S*)C 0.000 description 1
- 125000004719 1,1-dimethylpropylthio group Chemical group CC(CC)(S*)C 0.000 description 1
- 125000004734 1,2,2-trimethylpropylthio group Chemical group CC(C(C)(C)C)S* 0.000 description 1
- 125000005918 1,2-dimethylbutyl group Chemical group 0.000 description 1
- 125000005923 1,2-dimethylpropyloxy group Chemical group 0.000 description 1
- 125000004720 1,2-dimethylpropylthio group Chemical group CC(C(C)C)S* 0.000 description 1
- RRPVGIGFBIAVJW-UHFFFAOYSA-N 1,3,5-tris(ethylsulfanyl)benzene Chemical compound CCSC1=CC(SCC)=CC(SCC)=C1 RRPVGIGFBIAVJW-UHFFFAOYSA-N 0.000 description 1
- SPXSBLGQTGUAQM-UHFFFAOYSA-N 1,3,5-tris(methylsulfanyl)benzene Chemical compound CSC1=CC(SC)=CC(SC)=C1 SPXSBLGQTGUAQM-UHFFFAOYSA-N 0.000 description 1
- DPZNOMCNRMUKPS-UHFFFAOYSA-N 1,3-Dimethoxybenzene Chemical compound COC1=CC=CC(OC)=C1 DPZNOMCNRMUKPS-UHFFFAOYSA-N 0.000 description 1
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- 125000006218 1-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004731 1-ethylbutylthio group Chemical group C(C)C(CCC)S* 0.000 description 1
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- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 1
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- 125000004729 2,3-dimethylbutylthio group Chemical group CC(CS*)C(C)C 0.000 description 1
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- XZXYQEHISUMZAT-UHFFFAOYSA-N 2-[(2-hydroxy-5-methylphenyl)methyl]-4-methylphenol Chemical compound CC1=CC=C(O)C(CC=2C(=CC=C(C)C=2)O)=C1 XZXYQEHISUMZAT-UHFFFAOYSA-N 0.000 description 1
- 125000003858 2-ethylbutoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])(C([H])([H])O*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006176 2-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004732 2-ethylbutylthio group Chemical group C(C)C(CS*)CC 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- 125000004714 2-methylbutylthio group Chemical group CC(CS*)CC 0.000 description 1
- 125000005916 2-methylpentyl group Chemical group 0.000 description 1
- 125000004722 2-methylpentylthio group Chemical group CC(CS*)CCC 0.000 description 1
- 125000004730 3,3-dimethylbutylthio group Chemical group CC(CCS*)(C)C 0.000 description 1
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005917 3-methylpentyl group Chemical group 0.000 description 1
- 125000004723 3-methylpentylthio group Chemical group CC(CCS*)CC 0.000 description 1
- UZFMOKQJFYMBGY-UHFFFAOYSA-N 4-hydroxy-TEMPO Chemical compound CC1(C)CC(O)CC(C)(C)N1[O] UZFMOKQJFYMBGY-UHFFFAOYSA-N 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 206010017533 Fungal infection Diseases 0.000 description 1
- 208000031888 Mycoses Diseases 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- SKZKKFZAGNVIMN-UHFFFAOYSA-N Salicilamide Chemical compound NC(=O)C1=CC=CC=C1O SKZKKFZAGNVIMN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 229940107816 ammonium iodide Drugs 0.000 description 1
- YVYHNMSJGKOVSY-UHFFFAOYSA-N azanium ditert-butyl phosphate Chemical compound [NH4+].CC(C)(C)OP([O-])(=O)OC(C)(C)C YVYHNMSJGKOVSY-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229940047583 cetamide Drugs 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- PJBIHXWYDMFGCV-UHFFFAOYSA-N chloro(chlorosulfonyloxy)methane Chemical compound ClCOS(Cl)(=O)=O PJBIHXWYDMFGCV-UHFFFAOYSA-N 0.000 description 1
- PJGJQVRXEUVAFT-UHFFFAOYSA-N chloroiodomethane Chemical compound ClCI PJGJQVRXEUVAFT-UHFFFAOYSA-N 0.000 description 1
- JIKSKOXEWAHMRJ-UHFFFAOYSA-N chloromethyl dihydrogen phosphate Chemical class OP(O)(=O)OCCl JIKSKOXEWAHMRJ-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000004683 dihydrates Chemical class 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- LNJAJHJFSKUCIR-UHFFFAOYSA-N ditert-butyl chloromethyl phosphate Chemical compound CC(C)(C)OP(=O)(OCCl)OC(C)(C)C LNJAJHJFSKUCIR-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000005921 isopentoxy group Chemical group 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003588 lysine group Chemical group [H]N([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(N([H])[H])C(*)=O 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000001298 n-hexoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004712 n-pentylthio group Chemical group C(CCCC)S* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- VXAPDXVBDZRZKP-UHFFFAOYSA-N nitric acid phosphoric acid Chemical compound O[N+]([O-])=O.OP(O)(O)=O VXAPDXVBDZRZKP-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- IUBQJLUDMLPAGT-UHFFFAOYSA-N potassium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([K])[Si](C)(C)C IUBQJLUDMLPAGT-UHFFFAOYSA-N 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- WRIKHQLVHPKCJU-UHFFFAOYSA-N sodium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([Na])[Si](C)(C)C WRIKHQLVHPKCJU-UHFFFAOYSA-N 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000004441 surface measurement Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000009885 systemic effect Effects 0.000 description 1
- SFJSJTJXNJJDEE-UHFFFAOYSA-N tert-butyl chloromethyl hydrogen phosphate Chemical compound CC(C)(C)OP(O)(=O)OCCl SFJSJTJXNJJDEE-UHFFFAOYSA-N 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6558—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom containing at least two different or differently substituted hetero rings neither condensed among themselves nor condensed with a common carbocyclic ring or ring system
- C07F9/65583—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom containing at least two different or differently substituted hetero rings neither condensed among themselves nor condensed with a common carbocyclic ring or ring system each of the hetero rings containing nitrogen as ring hetero atom
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
- A61K31/425—Thiazoles
- A61K31/427—Thiazoles not condensed and containing further heterocyclic rings
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
- A61P31/10—Antimycotics
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P43/00—Drugs for specific purposes, not provided for in groups A61P1/00-A61P41/00
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/26—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having more than one amino group bound to the carbon skeleton, e.g. lysine
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/02—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
- C07D249/08—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
- C07D249/10—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
Definitions
- the present invention relates to an improvement in a method for producing a water-soluble prodrug, and more particularly, the present invention relates to a method for producing a water-soluble azole prodrug having a phosphate group.
- a water-soluble prodrug As an example of a water-soluble prodrug, a compound represented by the following formula is known (for example, see Patent Document 1 and Patent Document 2). This compound is a water-soluble azole prodrug useful for the treatment of severe systemic fungal infection.
- t-Bu represents tert-butyl
- THF represents tetrahydrofuran
- TFA represents trifluoroacetic acid.
- introducing a phosphonoxymethyl moiety into a hydroxyl group-containing drug is known as a method for producing a water-soluble prodrug of a hydroxyl group-containing drug.
- prodrug is a derivative of a drug, and is in vivo. This refers to what goes back to the original drug (hereinafter sometimes referred to as the “parent compound”), and water-soluble prodrugs of certain active drugs are often the subject of research and development.
- reaction yield in the case of deprotection reaction and then sodium salt is 12%
- this reaction yield is an efficient reaction from the viewpoint of industrial production.
- it is not suitable for mass synthesis on an industrial scale. Therefore, further improvement is required for the deprotection reaction of intermediate Z described above from the viewpoint of industrial production.
- Patent Document 1 discloses a pharmacologically acceptable salt of a strong prodrug as a preferred embodiment of the water-soluble azole prodrug.
- Patent Document 1 it is reported that water solubility is improved over the parent compound by converting the prodrug into a salt.
- Patent Document 1 discloses a water-soluble azole prodrug dilysine salt and tert-ptylamine salt. In addition to the solubility in water, improvements in the physical properties of the salt itself are required. .
- Patent Document 1 Special Table 2003-520235 (International Publication WO01 / 52852)
- Patent Document 2 Special Table 2004-518640 (International Publication WO02 / 42283) Disclosure of the invention
- An object of the present invention is to provide a method suitable for the industrial use of the above-described deprotection reaction in the intermediate Z without using a toxic solvent, and to efficiently provide a high-quality water-soluble alcohol.
- An object is to provide a method for producing luprodrug and the like. Means for solving the problem
- the present inventors have intensively studied the deprotection reaction of the tert-butyl phosphate derivative that is the intermediate Z. As a result, the deprotection reaction was performed in the presence of a carbocations force venger. By performing the above, it is possible to suppress the by-product formation of the amide in the deprotection process, and to achieve a deprotection reaction yield of about 85% or more, and the knowledge that the deprotection reaction is suitable for industrial production methods. As a result, the present invention has been completed.
- X is a fluorine atom bonded to the 4-position or 5-position of the phenyl group.
- X is a fluorine atom bonded to the 4-position or 5-position of the phenyl group, and t Bu represents tert-butyl.
- the first organic acid is selected from the group consisting of trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, and toluenesulfonic acid.
- step (a) when using the first organic acid and carbocation strength bender, an ester solvent, an ether solvent, an alcohol solvent, and a solvent in which the group strength including these mixed solvents is selected are used.
- an ester solvent, an ether solvent, an alcohol solvent, and a solvent in which the group strength including these mixed solvents is selected are used.
- ester solvent power is selected from the group consisting of ethyl acetate, butyl acetate, and a mixed solvent thereof.
- ether solvent power is selected from the group power consisting of jetyl ether, dimethoxyethane, methyl tert-butyl ether, tetrahydrofuran and mixed solvent power thereof,
- the alcohol solvent power Methanol, ethanol, 1 propanol, 2-propanol and a mixed solvent power thereof are selected.
- the method further includes the step of crystallization in an organic solvent miscible with water so as to produce a solvate of the salt represented by the formula (I).
- the production method according to any one of
- the solvate is a solvate represented by formula (IV),
- carbocations force jar used in the present invention refers to the removal of the tert-butoxy group.
- Specific examples of the carbocations force jar used in the present invention include inorganic acids, optionally substituted C1-C6 alkoxybenzenes, optionally substituted C1-C6 alkylthiobenzenes, and nitrile compounds. Thing etc. are mentioned. These carbocations force jars can be used alone or in combination.
- the “1-C6 alkyl group” is a monovalent group derived by removing any one hydrogen atom from an aliphatic hydrocarbon having 1 to 6 carbon atoms, a straight chain having 1 to 6 carbon atoms Or, it means a branched alkyl group.
- Examples include 2-trimethylpropyl group, 1-ethyl-1-methylpropyl group, 1-ethyl-2-methylpropyl group, etc., preferably methyl group, ethyl group, n-propyl group, isopyl pill group, n-butyl group, isobutyl group, sec Examples thereof include a butyl group and a tert butyl group.
- substituents include (1) halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom, etc.); (2) hydroxyl group; (3) cyano group; (4) nitro group; Carboxyl group; (6) amino group and the like.
- C1 in the term “optionally substituted C1-C6 alkoxybenzene” used in the present invention “—C6 alkoxy” means a group in which an oxygen atom is bonded to the terminal of the above-defined “C1-C6 alkyl group”.
- the “optionally substituted C1-C6 alkoxybenzene” used in the present invention include a-sol, and the like.
- One, m -, p-Metokishia - Saul, o-, m-, p-Etokishia two Nord, 1, 3, 5-dimethoxybenzene include a 1, 3, 5 Etoki Shibenzen like, preferably, ⁇ - sole, o-, m-, and p-methoxyl-sol, more preferably, arsol and m-methoxyl-sol.
- C1-C6 alkylthio in the term “having a substituent, C1-C6 alkylthiobenzene” used in the present invention means that a sulfur atom is bonded to the terminal of the above-defined “C1-C6 alkyl group”.
- C1-C6 alkylthiobenzene used in the present invention has the same definition as above.
- Specific examples of the “optionally substituted C1-C6 alkylthiosilane” used in the present invention include thioanol, o-mp-methylthioanol, ompethylthioanisole, 1, 3 , 5 trimethylthiobenzene, 1,3,5 triethylthiobenzene, and the like, preferably thioanol, o-mp-methylthioanol, and more preferably thioanol.
- nitrile compound used in the present invention means a compound having a —CN group.
- first organic acid used in the present invention means an acid used in the deprotection reaction, and means an organic compound exhibiting acidity.
- second organic acid used in the present invention means an acid that is used when forming a salt after the phosphate group deprotection reaction, and indicates an acidic organic compound.
- the deprotection reaction according to the present invention an ester solvent without using a halogen-based solvent, an ether solvent, an alcohol solvent, or a force rubocations force venger that does not contain a halogen atom is used.
- the deprotection reaction according to the present invention can be applied as an industrial production method because the waste liquid treatment is less complicated and less burdensome on the environment.
- the method for producing a water-soluble azole prodrug according to the present invention includes the introduction of a tert-butoxyphosphonoxymethyl moiety into a hydroxyl group-containing drug in step (A) and the step (B). Deprotection reaction and salt formation.
- a compound represented by the formula ( ⁇ ) is produced using a compound represented by the formula (V) as a parent compound and a black methyl phosphate compound represented by the formula (VI). It is a process to do.
- the compound represented by formula (V) is simply referred to as compound (V)
- the compound represented by formula (VI) is represented as compound (VI), etc. This is also true).
- Specific examples of the compound (V) to which the deprotection reaction according to the present invention can be applied are not limited to the following compounds, but include triazole-based antifungal compounds having a hydroxyl group. Examples include compounds having the following structural formula.
- compound (Va) is disclosed in US Pat. No. 5,648,372, and can be produced according to the disclosure of the patent.
- compound (Vb) is disclosed in US Pat. No. 6,300,353 and can be produced according to the disclosure of the patent.
- di-tert-butylchloromethyl phosphate can be used as it is, or can be produced from the commercially available product according to the reaction scheme shown below.
- compound (VI) is produced from a commercially available product of tetraptyl ammonium di tert butyl phosphate and chloroiodomethane, or a commercially available product of potassium di tert butyl. It can be produced by a production method from phosphate and chloromethyl chlorosulfonate.
- Step (A) will be described in detail.
- compound (V) which is an antifungal parent compound having a hydroxyl group
- compound (VI) is subjected to O alkylation using compound (VI) in the presence of a base. It is a process of converting to phosphate ( ⁇ ) by performing.
- the base used in this step are not limited to the following, but include sodium hydride, potassium hydride, sodium amide, sodium tert-butoxide, sodium bis (trimethylsilyl) amide, potassium bis (trimethylsilyl) amide. Or a combination of these.
- iodine ion source used in this step include, but are not limited to, iodine and sodium hydride, lithium iodide, sodium iodide, tetraptyl ammonium iodide, and the like.
- Compound (VI) is used in an amount of at least 1 equivalent to 1.5 equivalents relative to compound), the iodine ion source is used in an amount of 0.1 equivalents to 3 equivalents relative to compound (V), and the base is used in compound (V). 1 to 4 equivalents are used.
- solvent used in this step are not particularly limited as long as the starting material is dissolved to some extent without inhibiting the reaction, but dimethoxyethane, tetrahydrofuran, methyl tert butyl ether, jetyl ether and dimethyl ether.
- examples include cetamide.
- the reaction temperature in this step (A) is not particularly limited, but is usually 5 to 50 ° C, preferably 0 to 40 ° C, more preferably 10 to 35 ° C, and the reaction time is particularly limited. Although it is not, it is usually 1 to 36 hours, preferably 2 to 24 hours, more preferably 3 to 20 hours.
- the compound (ii) thus obtained may be used as it is in the next step (B), but after completion of the reaction, it is extracted with an ether solvent, and if necessary, the compound ( Tertiary amines can be added for the stability of ii).
- Specific examples of the ether solvent used for extraction include tetrahydrofuran, methyl tert-butyl ether, and jetyl ether.
- tertiary amines used for stability include, but are not limited to, trialkylamine or N-alkylmorpholine, and preferably triethylamine, N, N-diisopropylethyl.
- N-methylmorpholine more preferably N-methylmorpholine.
- Step (B) is a step of subjecting compound (II) to a deprotection reaction and producing a salt of a water-soluble azole prodrug, for example, compound (IV). More specifically, this step (B) includes, as described above, a step of performing a deprotection reaction performed in the presence of a carbocations force jar, and a compound that is a reaction product after the deprotection reaction ( Ii) It comprises a step of performing a predetermined post-treatment without removing itself, a step of forming a desired salt, and a step of crystallizing a solvate containing the salt.
- the step of carrying out the deprotection reaction according to the present invention is carried out in the presence of the first organic acid used for the deprotection reaction and a carbocations force jar (hereinafter simply referred to as “deprotection according to the present invention”).
- the first embodiment of the protection reaction ”) and the case where the reaction is carried out in the presence of only a carbocations force jar (hereinafter referred to simply as“ the second embodiment of the deprotection reaction according to the present invention ”).
- the case where the deprotection reaction is performed in the presence of only the carbocations force jar that is, the case of the second embodiment of the deprotection reaction according to the present invention is a case where an inorganic acid is used.
- other acids such as the first organic acid are unnecessary in order to play the role of carbo force and thions force beneficiary in that inorganic itself is only used for the deprotection reaction. The cost can be reduced.
- the reaction is carried out in the presence of a first organic acid and a carbocation force venger.
- the first organic acid used in the first embodiment of the deprotection reaction according to the present invention is an acid used for the deprotection reaction.
- Specific examples of the first organic acid used in the present invention include trifluoroacetic acid, methanesulfonic acid, and trifluoromethanesulfone. Examples include acid, benzenesulfonic acid, toluenesulfonic acid, and the like. Preferred are trifluoroacetic acid, trifluoromethanesulfonic acid, and toluenesulfonic acid, and more preferred is trifluoroacetic acid.
- Specific examples of the carbocations force bunger used in the first embodiment of the deprotection reaction according to the present invention include C1-C6 alkoxybenzene, which may have a substituent, and C1, which may have a substituent.
- C6 alkylthiobenzenes, nitrile compounds and combinations thereof may be mentioned, and preferred are a-sol, m-methoxy-anol, thio-anol, acetonitrile, propiono-tolyl, benz-tolyl and combinations thereof.
- the first organic acid is preferably used in an amount of at least about 30 equivalents relative to the compound ( ⁇ )
- the carbocation force ranger is preferably used in an amount of at least 5 equivalents relative to the compound ( ⁇ ).
- Specific examples of the solvent used in the first embodiment of the deprotection reaction according to the present invention are not particularly limited as long as the starting material is dissolved to some extent without inhibiting the reaction.
- Solvent, alcohol solvent and the like preferably ethyl acetate, butyl acetate, jetyl ether, dimethoxymethane, methyl tert butyl ether, tetrahydrofuran, methanol, ethanol, 1 propanol and 2-propanol, and more preferably.
- the carbocation force venger used when the carbocation force venger used is a solution, the carbocation force venger itself can also be used as a solvent.
- the deprotection reaction is carried out in the presence of only a carbocations force jar.
- the carbocation force benger is an inorganic acid.
- the “inorganic acid” as a carbocation force venger used in the present invention refers to an acid containing nonmetals such as fluorine, chlorine, bromine, iodine, sulfur, nitrogen and phosphorus.
- Specific examples of the inorganic acid used in the present invention include hydrochloric acid, perchloric acid, hypochlorous acid, nitric acid, sulfuric acid, phosphoric acid, hydrofluoric acid, hydrobromic acid, hydroiodic acid, and the like.
- hydrochloric acid hydrofluoric acid, hydrobromic acid, hydroiodic acid, nitric acid, sulfuric acid and phosphoric acid, more preferably hydrochloric acid.
- Specific examples of the solvent used in the second embodiment of the deprotection reaction according to the present invention are not particularly limited as long as the starting material is dissolved to some extent without inhibiting the reaction, but ether solvents, alcohol solvents, etc.
- Preferred examples include jetyl ether, dimethoxymethane, methyl tert butyl ether, tetrahydrofuran, methanol, ethanol, 1 propanol and 2-propanol, and more preferred are dimethoxymethane and ethanol.
- the reaction temperature of the deprotection reaction in the first and second embodiments of the present invention is not particularly limited, but is usually-20 to 10 ° C, preferably-10 to 8 ° C, more preferably-
- the reaction time is 5 to 5 ° C., and the reaction time is 0.1 to 10 hours, preferably 0.2 to 8 hours, and more preferably 0.5 to 6 hours.
- the used acid is moved to the aqueous layer and a post-treatment by neutralization using a base is performed.
- a base include dipotassium hydrogen phosphate and nitric acid hydrogen phosphate.
- the salt represented by the formula (I) is produced without taking out the compound ( ⁇ ).
- the salt may be formed after the compound ( ⁇ ) is taken out.
- a solvate of a salt as represented by the formula (IV) can also be produced.
- X is a fluorine atom bonded to the 4-position or 5-position of the full group.
- the salt is formed by reacting compound (in) with lysine in the presence of water, an organic solvent and an acid, and a monolysine salt of compound ( ⁇ ) (a salt represented by formula (I)). ) Is generated.
- the organic solvent is preferably an organic solvent miscible with water.
- the organic solvent are not particularly limited as long as the starting material is dissolved to some extent without inhibiting the reaction, but examples thereof include methanol, ethanol, 1 propanol, and 2-propanol, and preferably methanol. And ethanol, more preferably ethanol.
- the acid is a second organic acid different from the first organic acid used in the deprotection reaction. Specific examples include acetic acid, propionic acid and butyric acid, and acetic acid is preferable.
- the lysine used is preferably at least 1 to 3 equivalents relative to the compound ( ⁇ ), and an aqueous solution of lysine salt is preferably used.
- the temperature at the time of conversion to the salt is not particularly limited, but is room temperature to 40 ° C, preferably room temperature to 35 ° C.
- the following operation is preferably performed. First, the compound (III) is extracted using an aqueous solution containing an alkali metal salt.
- the alkali metal salt in this case is not limited to the following, but examples include potassium phosphate and sodium phosphate.
- the aqueous solution containing the alkali metal salt-containing compound ( ⁇ ) is neutralized with acid and, if necessary, the pH of the aqueous solution is further 3 or less, preferably 2.5 or less, more preferably 2.
- the compound (III) is adjusted to 2 or less, extracted with an organic solvent such as butyl acetate, and then treated with an aqueous solution containing lysine to contain the compound (III) that is lysine salted.
- An aqueous solution can be obtained.
- the above-mentioned second organic acid is added to the aqueous solution containing the lysine salted compound (ii), and the pH of the aqueous solution is 6 or less, preferably 5.5 or less, more preferably After adjusting to 5.0 or less and mixing with water as described above, when an organic solvent is added, a monolysine salt solvated by the organic solvent is efficiently formed.
- Acetic acid is particularly preferred as the second organic acid.
- the aforementioned organic solvent produces a compound represented by the formula (IV) as a solvate in which ethanol is preferred. Seed crystals may be added to crystallize as a solvate. Specifically, after adding ethanol, the temperature of the reaction solution is raised to 35 to 60 ° C.
- the temperature of the reaction solution is cooled to 5 to 30 ° C., preferably 22 to 28 ° C., and stirred for at least 17 hours or more, preferably 17 to 65 hours, and then the resulting crystals are collected by filtration.
- the compound (IV) is produced and isolated from the starting material compound (IV) through the highly efficient deprotection reaction according to the present invention.
- Example 2 Using the compound of Example 1 obtained in this manner, the deprotection reaction in the presence of a carbocation force venger was examined. Specifically, 30 equivalents of trifluoroacetic acid was added to the compound of Example 1, and the deprotection reaction was performed in the presence of various carbocations strength bangers. The deprotection reaction was followed by high performance liquid chromatography under the following conditions:
- UV detection wavelength 282nm flow rate 1.0mL / min
- FIG. 1 shows the results according to the first embodiment of the deprotection reaction according to the present invention.
- the deprotected form shown in FIG. 1 refers to a compound represented by the following formula (VII (a)), and the amide form represents the following formula (VIII (a)
- FIG. 1 also shows the result of the second embodiment of the deprotection reaction according to the present invention.
- the carbocations force bunger itself is an acid, specifically a kind of inorganic acid.
- hydrochloric acid (30 equivalents to the compound of Example 1)
- the deprotection reaction in a system using methanol as a solvent was examined. From the results shown in FIG. 1, when hydrochloric acid is used as the carboxylic cation force ranger and methanol, which is a non-halogen solvent, is used as the reaction solvent, the deprotection reaction can be carried out without forming an amide. It was.
- the lower 5N HC1 aqueous solution 210mL was dripped. At this time, the pH of the aqueous layer became 2.8. Subsequently, the organic layer was washed with 570 mL of 5% saline. 89 mL of an aqueous solution in which 30.82 g of lysine was dissolved was added, and the lower layer was separated. In the lysine aqueous extraction layer, 11 mL of ethanol was added and 41 mL of acetic acid was added. Further, 337 mL of ethanol, 38 mL of water and 14 mL of acetic acid were transferred to a 3 L flask.
- Lysine “(1R, 2R)-2- (4 Cyanophenyl) — 1. 3 Thiazole-2-yl ⁇ —1-(2, 4 Difluorophenol) 1 1- (1H— 1, 2, 4 Triazole 1-ylmethyl) propyl ⁇ oxy ⁇ methyl dihydrophosphate phosphate ethanol (1Z1Z1) Weigh out 78 g of solution A obtained in Example 6, add l mL of acetic acid, 8.6 mL of water, and 301 mL of ethanol, and add seed crystals. After stirring at 40 ° C. for 40 minutes and at 25 ° C.
- acetic acid 14.5 mL, water 11. 29 mL, ethanol 47 OmL was added, and 130 mg of seed crystals were added. After stirring at 40 ° C for 40 minutes and then at 25 ° C for 48 hours, the resulting crystals were collected by filtration.
- the compound (IV) produced according to the present invention is demonstrated to have excellent hygroscopicity in comparison with the force dilysine salt which is a monolysine salt.
- the dilysine salt can be produced by the method disclosed in Japanese translation of PCT publication No. 20 03-520235.
- Fig. 2 (A) shows the hygroscopic results of the monolysine salt by the microbalance method
- Fig. 2 (B) shows the hygroscopic results of the dilysine salt by the microbalance method. From the results shown in Fig. 2, moisture absorption was observed at 50% RH for the dilysine salt, whereas moisture absorption was observed at 70% RH for the monolysine salt. From this result, it was found that the compound (IV), which is a monolysine salt, has improved hygroscopicity in comparison with the dilysine salt.
- the measurement equipment used in the microbalance method was as follows:
- Fig. 1 shows the results of the first and second embodiments of the deprotection reaction according to the present invention.
- FIG. 2 (A) shows the hygroscopic result of the monolysine salt by the microbalance method
- FIG. 2 (B) shows the hygroscopic result of the dilysine salt by the microbalance method.
- the hygroscopic measurement of monolysine salt is performed at a temperature of 25.1 ° C
- the hygroscopicity of dilysine salt is measured at 24.9 ° C.
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KR1020087014826A KR101337127B1 (ko) | 2005-12-20 | 2006-12-20 | 수용성 아졸 프로드러그의 제조 방법 |
CN2006800480479A CN101341160B (zh) | 2005-12-20 | 2006-12-20 | 水溶性唑前药的制造方法 |
CA2632842A CA2632842C (en) | 2005-12-20 | 2006-12-20 | Process for preparation of water-soluble azole prodrugs |
AU2006328455A AU2006328455B2 (en) | 2005-12-20 | 2006-12-20 | Process for production of water-soluble azole prodrug |
JP2007551114A JP5046959B2 (ja) | 2005-12-20 | 2006-12-20 | 水溶性アゾールプロドラッグの製造方法 |
EP06842906.7A EP1964843B1 (en) | 2005-12-20 | 2006-12-20 | Process for production of water-soluble azole prodrug |
US12/097,244 US7803949B2 (en) | 2005-12-20 | 2006-12-20 | Process for preparation of water-soluble azole prodrugs |
ES06842906T ES2432360T3 (es) | 2005-12-20 | 2006-12-20 | Procedimiento para la producción de profármaco de azol soluble en agua |
IL191894A IL191894A (en) | 2005-12-20 | 2008-06-02 | Process for preparation of water-soluble azole prodrugs |
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US8207352B2 (en) * | 2009-10-08 | 2012-06-26 | Drug Process Licensing Associates LLC | Process for the manufacture of enantiomerically pure antifungal azoles as ravuconazole and isavuconazole |
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JP2003520235A (ja) * | 2000-01-20 | 2003-07-02 | ブリストルーマイヤーズ スクイブ カンパニー | アゾール化合物の水溶性プロドラッグ |
JP2004518640A (ja) * | 2000-11-20 | 2004-06-24 | ブリストル−マイヤーズ スクイブ カンパニー | 水溶性アゾール化合物の改良された方法 |
WO2006118351A1 (en) * | 2005-05-03 | 2006-11-09 | Eisai R&D Management Co., Ltd. | Mono-lysine salts of azole compounds |
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JP2004518640A (ja) * | 2000-11-20 | 2004-06-24 | ブリストル−マイヤーズ スクイブ カンパニー | 水溶性アゾール化合物の改良された方法 |
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US20090192316A1 (en) | 2009-07-30 |
CA2632842C (en) | 2013-06-25 |
JPWO2007072851A1 (ja) | 2009-05-28 |
KR20080077211A (ko) | 2008-08-21 |
AU2006328455A1 (en) | 2007-06-28 |
EP1964843B1 (en) | 2013-08-28 |
CN101341160A (zh) | 2009-01-07 |
IL191894A0 (en) | 2008-12-29 |
JP5046959B2 (ja) | 2012-10-10 |
US7803949B2 (en) | 2010-09-28 |
ES2432360T3 (es) | 2013-12-03 |
IL191894A (en) | 2012-06-28 |
AU2006328455B2 (en) | 2012-02-09 |
EP1964843A1 (en) | 2008-09-03 |
KR101337127B1 (ko) | 2013-12-05 |
EP1964843A4 (en) | 2009-02-18 |
CA2632842A1 (en) | 2007-06-28 |
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