WO2007037446A1 - Composition de résine polyacétalique et article moulé - Google Patents

Composition de résine polyacétalique et article moulé Download PDF

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Publication number
WO2007037446A1
WO2007037446A1 PCT/JP2006/319610 JP2006319610W WO2007037446A1 WO 2007037446 A1 WO2007037446 A1 WO 2007037446A1 JP 2006319610 W JP2006319610 W JP 2006319610W WO 2007037446 A1 WO2007037446 A1 WO 2007037446A1
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Prior art keywords
acid
resin composition
weight
resin
compound
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PCT/JP2006/319610
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English (en)
Japanese (ja)
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WO2007037446A9 (fr
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Kuniaki Kawaguchi
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Polyplastics Co., Ltd.
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Publication of WO2007037446A1 publication Critical patent/WO2007037446A1/fr
Publication of WO2007037446A9 publication Critical patent/WO2007037446A9/fr

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L59/00—Compositions of polyacetals; Compositions of derivatives of polyacetals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/24—Derivatives of hydrazine
    • C08K5/25—Carboxylic acid hydrazides

Definitions

  • the present invention relates to a molded product formed from a stable resin composition of holacetal resin which suppresses the amount of formartite generated to an extremely low level and does not adversely affect other resin molded products.
  • Background technique l
  • Holiacetal resin is excellent in mechanical properties, fatigue resistance, friction resistance, wear resistance, and molding, so it is widely used in fields such as automobile parts, electrical equipment parts, daily life, cosmetic parts, and medical parts. As a result of advanced sophistication, it becomes more stable High quality holacetal resin with very little generation of mualthite.
  • the present invention provides a settal resin composition that suppresses the amount of formaldehyde that is generated to an extremely low level and does not adversely affect other resin molded products that coexist even in a sealed space, and a molded product formed from the resin composition.
  • the present inventor conducted a search for a series of hydrocarbon compounds with respect to stabilizers for holacetal resin. As a result, formaldehyde obtained from a molded product of a specific benzoic acid hydrogenant acetal resin composition can be extremely suppressed and sealed.
  • the present invention has been completed by finding that other resin molded products are adversely affected in space.
  • the present invention comprises: (A) 100 parts by weight of a holacetal resin and 100 to 50 parts by weight of a sulfonic acid hydrogenant compound, and the carnot compound (B) is 200.
  • This is related to the Horia ancestral compound, characterized in that the amount of hetolanone produced by heating for 10 minutes is less than lOppm.
  • the form produced from the molded article of the polyacetal resin composition can be suppressed to a very low level by adding a specific hydrate of carboxylic acid to the polyacetal resin.
  • the molded product of the polyaceter has an adverse effect on other resin molded products that coexist even in a sealed space, and can improve stability and reliability.
  • the additive of the present invention weather resistance (light) stabilizer impact resistance improver slidability improver gloss control colorant etc.
  • the polyacetal resin composition of the present invention comprises a phosphonate hydranoto compound (B) of a horiacetal resin (A), and is obtained by molding the holacetal resin composition. Give an explanation.
  • the horiacetal resin (A) used in the present invention is a polymer compound having okinomethyle as a constituent unit, and includes polyacetals containing other constituent units in addition to the horiaceter quinomethyleno group.
  • the branched structure, the structure having a skeleton structure, the one having the furonoc structure, and all the conventionally known holiacetal resins are generally compared with the generalized holiacetal homopolymer, which is a water-filled formartite or a formaldehyde cyclic trimer.
  • the polymerization of some trioxano is usually stabilized against cocoon degradation by terminal canov.
  • the horiacetal co-polymer generally has a terminal labile portion by hydrolysis by copolymerizing form ore alartite with cyclic olicoma as a king monomer and a compound selected from cyclic ether or ruthene as a comonomer.
  • the main monomer is generally trioxy, which is a cyclic trimer of formartite.
  • Trioxano is generally obtained by refining the aqueous solution of water in the presence of an acidic catalyst and then purifying by distillation. Trioxano is substantially preferred for impurities such as water, methanol and formic acid.
  • cyclic ether and cyclic formal as a comonomer component capable of forming a branched structure or a crosslinked structure, an linoleno eno eno linole eno linole eno linole eno linole eno linole eno linole eno linole no naphthyl clinino nor ether Cornolenc Nonnore Chilenogli Cornolenocri Nonolete nore Alcoleno or Polyalkylene Cricol Nocrino Nore These comonomers are used singly or in combination of two or more.
  • the formation of formartite is preferably used from the viewpoint of a lower level of rehabilitation.
  • the above-mentioned holacetal copolymers are generally obtained by carrying out cationopolymerization using an appropriate amount of cationopolymerization catalyst.
  • Molecular weight regulator used cationopolymerization catalyst Polymerization method Polymerization equipment Deactivation treatment of the polymer
  • the obtained crude holiacetal coholomerization treatment / undone is known from many literatures, and basically they can be obtained.
  • the citrate phosphono acid compound (B) used in the present invention is a strong lponoate citrate compound that has been released from histolone by a GC / MS method using a hetosose GC between two.
  • Carboxylic acid histanoto compound (B) used in the present invention is an amount of hydranono generated by decomposition of caranoto compound by heating at 200 ° C for 10 minutes, which is a general processing condition of a holoa composition, or less than lOppm.
  • the amount is higher than the amount of hydrano produced by decomposition of the hydranoto compound of the benzoic acid, it has a negative influence on the hydranone and / or its anti-component in the holiasta product to which the hydranoto carboxylic acid compound is added. I have something to do.
  • (B) it is particularly preferred that it does not substantially generate hydranono. Also, it is possible to obtain a sulfonic acid hydranoto compound used in the present invention.
  • a sulfonic acid hydranoto compound having the following chemical formula (1) is preferable.
  • R 1 represents a hydrocarbon group having 1 to 30 carbon atoms, an elementary atom or an alkyl group or an ananol group having 1 to 30 carbon atoms, an integer of 4 and b represents 0 to Indicates an integer of 4.
  • the aromatic ring represented by X includes a hezeneno ring, an anthraceno ring, an aromatic ring such as a phenanotreno ring, and the like [Hifeninore, Hysarrelealkano (Nofeninoremethane 2, Rufrohan ]) Something is mentioned.
  • the aromatic ring X is preferably a no-ring naphthalene ring.
  • R 1 represents a hydrocarbon group having 1 to 30 carbon atoms and is a substituent bonded to the carbon atom constituting the above.
  • Carbonization represented by R 1 is an alkynole group (a methyl group, an ethyl group, an inofuroyl group, a butyl group, an s —a butyl group, a linear or branched alkyl group such as a t-butyl group)
  • An integer of 0 to 3 especially an integer of 0 to 2 is preferred.
  • a is preferably an integer of 0 to 4, particularly an integer of 0 to 2.
  • R 1 may be the same or different.
  • the group 1 OR 2 is a carbon substituent constituting the ring of the aromatic ring X.
  • the group OR 2 is a derivative of a hydrogenoquinoloxy group that is R 2 or hydrogen (alcohol having 1 to 30 carbon atoms, such as a methoxy group, ie R 2 is an alkyl group, such as a methyl group) acetyl group And the silicon group.
  • the number b of the group OR 2 bonded to the aromatic ring X is an integer of 0 to 4, preferably an integer of 0 to 3, preferably an integer of 0 to 2.
  • an integer of 3 particularly an integer of 0 to 2 is preferred.
  • b is preferably an integer of 0 to 4, particularly preferably an integer of 0 to 2.
  • the base OR 2 may be the same or different.
  • Examples of the carboxylic acid and its derivative used in the carboxylic acid hydranoto compound (B) used in the present invention include benzoic acid m-toluic acid p-toluic acid 2-ethyl benzoic acid 3-acid 4 1-ethyl benzoic acid 4 1 ⁇ f Noprohill benzoic acid 4 1 n-Phic acid 2 3 4 5—Tetramethylbenzoic acid Hentamethyl benzoic acid Nomethyl benzoic acid 2, 4-Nomethyl benzoic acid 2 5— Nomethy 6-nomethylbenzoic acid 3 4-N-methylbenzoic acid 3, 5--no 2, 3 4 Trimethylbenzoic acid 2 3 5-Trimethylbenzoic acid 6-Trimethylbenzoic acid 2 4 5-Trimethylbenzoic acid Perfume acid 2 Benzoic acid 2,4,5-trichitoquinobenzoic acid 2,4 6-benzoic acid 3-methylsalicylic acid 4-methylsalicylic acid 5-hydroxylic acid 3-hydroxyquinoic acid 2-methylbenzoic acid 2—Hy
  • the characteristic structure of the carboxylic acid hydranoto compound (B) used in the present invention is as follows.
  • an aromatic ring X or a naphthalene ring is a linear or branched alkyl group, and a is an integer of 0-2.
  • Yes b Lists a number of compounds.
  • the sulfonate sulfonate compounds of the present invention may be used alone or in combination of two or more.
  • the ratio of these forceful ruponoacid hydranoto compounds (B) is from 0 to 1 to 50 parts by weight, preferably from 0 to 30 parts by weight, more preferably from 0 to 20 parts by weight If the amount of the sulfanoic acid hydranoto compound (B) is too small, it is difficult to effectively reduce the amount of formaldehyde. If it is too much, moldability and mechanical properties.
  • the use of a specific hydrocarbon compound such as this significantly reduces the amount of resin generated from the resin composition and its molded product, and the molded product has no adverse effect even in a sealed space. Stability of things ["It comes to make it live.”
  • the holiacetal resin composition according to the present invention further includes (C) an anti-oxidation anti-fatigue stabilizer (E) a processability improver (F) a weather resistance (light) stabilizer, an improver, a sliding improver, a gloss control agent, and a filler.
  • E anti-oxidation anti-fatigue stabilizer
  • F processability improver
  • weather resistance (light) stabilizer an improver
  • sliding improver a gloss control agent
  • a filler a filler.
  • antioxidant in order to keep the short-term and long-term characteristics and to suppress the formate that accompanies decomposition.
  • Antioxidants include hinotate phenolic compounds hinotartolino compounds iow compounds nitroquino compounds quinolinos. These antioxidants may be used alone or in combination of two or more. Of these, hinotatofu: ⁇ nor compounds and hinotates are preferred, particularly preferably hinotatophenol compounds. As hinotatophenol compounds, monocyclic hinotatofus are, for example, 2,6-no-t-butyl- ⁇ -clenol.
  • Example 2 methylene hiss (4-methinole 6—t-futino lefenol) tyrenohis (2,6-t-no tyfino lephenol) 1 1 3—Methyl-4-Hydroxyquinone 5—t-Futylphenyl) Phthano 4, Tenhis (3_Methyl-1-t-Futinorephenol) 1 3 5-2 4 6—Tris (3 5-N t-Futinore 4—Hytroquino Noseno 4, 4 ′ —Thihos (3-Methinore 6-t-Futinorephenol A hinotatophenol compound having an ester group or an amino group Examples Kutadenonore 3— (4 '— Hitroquino 3' 5 '— No t—Futino flochnate n—Octatenor 1 2— (4 ′ — Hetroquino 3 ′ — t-Futinorephenyl
  • Examples of the hinotamino compounds include ester group-containing helicopters such as 4-acetoquinone 2 2 6 6-tetramethylhihelino iroloquino 1 2 2 6 6-tetramethylhihelinone 4-oxoquino 1 2 2 6 6-te tramethinoleheli Non 4 Ihenono 2 6 6-Tetramethylhihelinono hiss (2 2 6 6-Te 4-Helinor) Oxalate His (2 2 6 6-Tetrame (2, 2 6, 6-Tetramethyl-4-hyhelinol) Henosenotricarloquinolate and ether group-containing hihelino derivatives Examples Tokino 1 2 2 6 6-Tetramethylhihelinone 4-nochrome-2, 2, 6 6—Tetramethylhihelinone 4—Phenenoquino 2 —Tetramethylhihelinone 4—Henonorkino 2, 2 6 6 Ruhihelino 1 2—His (2 2 6 6—Tetramethyl 1 4 oquino) Cont
  • antioxidants (C) are used alone or in combination of two or more, and the blending ratio when blending the antioxidant (C) is preferably 0 to 1 to 50 parts by weight with respect to the holiacetal tree. 0 parts by weight Particularly preferably, the amount is 0 0 3 to 20 parts by weight.
  • the Holacetal resin composition of the present invention is blended with a weathering stabilizer in order to maintain the various properties of the resin by suppressing the decomposition of the extrusion process and the molding process, and to suppress the generation of the minute component of the resin.
  • Stabilizers include organic carboxylic acid metal salts, basic nitrogen-containing compounds, alkaline earth metal compounds, high-mouth talcite, zeolites, and the like.
  • L i N a K is the metal that forms the organic carbonate metal salt It may have a nitroquinol group.
  • the organic carboxylic acid that forms the organic carbonic acid may be a copolymer with a polymerizable unsaturated carboxylic acid (such as (meth) acinoic acid fumaric acid hydrolyzed maleic acid monoethyl maleate).
  • Organic carboxylic acids and lithium quinoate potassium quenoate sodium quinoate lithium 12-alkali phonate with lithium humanloquinostearate acne macneum acetic acid carnoum acetic acid macnoic acid carnoum stearino acid carnoum stearino acid matanentro Alkaline earth metal organic carbonates such as quinostearino acid, noum 12-hytroquinostearino, etc.
  • organic carbonate metal salts such as ionomer resins
  • Preferred is a metal salt such as McInnoum stearino acid carnoum 12 2-hytronoic acid mac or nitroum 12-hytroquinostearino acid carnoum.
  • Examples of the basic nitrogen-containing compound include amino trianinated non-compounds, urea compounds, amino acid compounds, amino alcohol compounds, amino compounds, and hyranone compounds.
  • Amino trianone compounds include melamino or its derivatives, quaana derivatives, amino trianone resins and the like. Examples include melamino derivatives and melems, and examples of quaamino derivatives include alkyl quanamino alkyl substituted quamino amino guanhon guanamino reno-hysqua amino amino acid hexano calqua guanamino and fatty acid heno quanoamino phenyl Nonoguanamino HI Torokino Examples include Mualthite resin.
  • the melamino derivative qua has a hydrogen or methylol group or an alkoxyquinomethyl group of the amino group (for example, mono-hexamethylol melamino mono-hexa melamino mono-tetramethylquinomethyl henoquaminoamino) is also converted to a guanino compound.
  • urea compound is a non-cyclic urea compound [N-substituted urea substituted with a non-urea alkyl group a non-cyclic urea condensate ( Hiureno to Hurea Urea Cyclic nitrogen compound [alkylene urea urea nocarphonic acid ureate] 3—arteic acid ureate ⁇ uret (Hitanotino 5-methinolehitantoino
  • amino acid compounds include amino acids, amino acids and amino acids.
  • Amino acid compound is D-body L 1,3-Flohanoneol tris (Hytroquinomethyl) Amino memino aliphatic mono- or horiool.
  • aromatic polyhydric carboxylic acid and phthalic acid, trimellinotic acid, and imitation acid are used.
  • the aliphatic compounds include aliphatic carboxylic acid cyclic carboxylic acids aromatic carboxylic acid amides and oliato resins (for example, HOLIAMITO 3 4 6 HOLIAMITO 6 HOLIAMITE 6 6 HOLIAMITO 1 1 MXD 6 Horiamit 6— 1 0 Horiamit 6— 1 1 Hoolito 6 Holyamito 6— 6 6— 6 1 0 Holyamito 9 T Nato] Holy Tomi Tori Toriuri Tano Hori (Meth) Acrylic Acid Mix Holi (Hynyl lactam) Homo (N-Hinamito) N-Hinyl carboxylic acid and other hinyl monomers.
  • the hydranono compounds include aliphatic or cycloaliphatic carboxylic acid hydranoto hydranoto stearino acid hydranoto anonoic acid turkey thranoto tecanodioic acid nitro acid tranoto norhino acid hydranoic unsaturated fatty acid hydranoto quinoline Aromatic fatty acid hydranoto and aromatic benzoic acid hydrano nitro thionotino
  • Alkali or alkaline earth metal compounds include metal oxides (C a O and) metal hydroxides (L i ⁇ HC a (OH) 2 Mg (OH) 2 acid salts (L i 2 C0 3 N a 2 C0 3 K 2 C0 3 C a C0 3 M g C 0 3 (M 2 + is wherein Mg 2+ Mn 2+ F e 2+ C o 2 + Do and 2 Ataikin M 3 + is A l 3+ F e 3+ C r 3 + Do and trivalent metal ions A n OH—HP ⁇ 4 2 — S ⁇ 4 2 —N valence (especially monovalent or divalent) X is 0 ⁇ x 0 5 and m is 0 ⁇ m ⁇ l )
  • Theite is the smallest unit cell, or Z or Al force crystalline aluminosilicate, for example, A type X or ZSM type zeolite, moorite zeolite, honyaite celite, etc.
  • Z or Al force crystalline aluminosilicate for example, A type X or ZSM type zeolite, moorite zeolite, honyaite celite, etc.
  • Phosphino compounds include alkyl phosphines (triethylphos flohinolephosphine trifinorephosphino and nocroanorequinos) and arylphosphines norephosphino p-trinolenofenorephosphino no p-trinolefin Aminophenylphosphinotori (2 4—Norole) Phosphinotori (2 4 6—Trimethinolevenore) Phosph
  • the blending ratio in the case of blending an anti-fog stabilizer is preferably 0 01 to 50 parts by weight or more preferably 0 with respect to 1 holacetal resin.
  • a processability improver is recommended.
  • Such processing improvers include long-chain fatty acids or derivatives thereof, holanol, noricone compounds, and various sonox.
  • Such long-chain fatty acids include monovalent saturated acids or acids having a silicon number of 10 or more (for example, lauric acid, myristino acid, halmitino acid, stearic acid, monotanoic acid, oleino acid, linoleic acid, erucic acid, etc.) silicon, divalent saturation Or an unsaturated fatty acid (for example, sehanonic acid totecanodiic acid nonic acid totesenonic acid).
  • Long-chain fatty acids also include fatty acids that are partially substituted with a substituent such as a hydroxy group (such as 12-hydroxy acid).
  • the fatty acid ester and fatty acid amino acid and the alcohol constituting the long-chain fatty acid ester may be either a -valent alcohol or a polyhydric alcohol.
  • An example of an ester of a long fatty acid and a monohydric alcohol is stearate stearylhalmitate.
  • esters of long-chain fatty acids and polyhydric alcohols include: Cole mono or Noharmitino acid ester Ethylene glycol mono Phosphoric acid estero retinocricornole mono or Nohenoic acid esterolic mono or nomonotanoic acid ester Chryselino mono to tri Esters Criselinomono to tristearino acid esters Crises Trihenoic acid estenoles Criselino mono to trimonotanoic acid esters Lisli Tonomono to tetrahalmitinoic acid esters Mono- or nolaurate mono- or mono-mono or no stearate mono- or mono-hetenoate mono- or mono-nolate mono- or nolinoleate.
  • fatty acid amines capryno acid, laurino acid, amino acid, halmitino acid acid, stearic acid amino acid, henoic acid amino acid amino acid, and saturated fatty acid primary acid acid.
  • Torayino acid Amino acid Fatty acid primary acid amino acid Stearyl stearate amino acid Stearate amino acid Saturated and Z or unsaturated fatty acid amino acid secondary mono tyrenone amino amino halmitino acid amino acid Ethylenenoamino mononosomito (ethylene histearylamito) Hexamethylenonoamino acid Amino ethyleneaminoamino Henoic acid Amino ethylene acid Amino acid Ethylenenoamino mononoreino acid Amine Ethylene erucic acid Something such as amito is listed.
  • hysteresis having a structure bonded to the amino moiety of alkylenenoamino such as ethylenenone amino (smit) oleino acid.
  • alkylenenoamino such as ethylenenone amino (smit) oleino acid.
  • hysamine compounds are particularly preferred.
  • Organopolyolcananols have a modified product such as ethanoquinone, hydroxyquino group, carboquinol group, amino group or substituted amino group (noah group), ether group, hinyl group (meth) acryloyl group at the molecular terminal or royal chain. Is also included.
  • sonox examples include low molecular weight polyolefins (for example, low molecular weight copolymers of reethylene ethylene and iorefino) ethylene soot.
  • the proportion in the case of incorporating these processing improvers is preferably from 0 to 1 to 50 parts by weight, more preferably from 30 to 30 parts by weight, particularly preferably from 0 to 30 to 20 parts by weight, based on the amount of holacetal.
  • F Weather resistance (light) stabilizer
  • the horiacetal resin composition of the present invention may be blended with a weather resistance (light) stabilizer in order to impart weather resistance (light) resistance.
  • the weather resistance (light) stabilizer is still a formal formed by a specific hydranoto derivative ( ⁇ ). There is no damage to the occurrence of tea.
  • Weather resistance (light) Stabilizers include henotrianol compounds, heno compounds, aromatic henoate compounds, anoanoacrylate compounds, anilate compounds, nitroquinolyl _ 1 3 5 _ trianononotamino compounds.
  • Henno Trianol compounds are 2— (2 '— Hitroquino / Lefeninore) Henono Trianole 2 — (2' — Hitrokino 1 3 ' Something like an hanol.
  • non-compounds having a plurality of nitroquinol groups such as 2 4-nitro quinoquinoeno 2-eno troquino non enoquino phenonono
  • phenokines (2- troquino 4—Metokinenohenoeno 2— 4—Oktokinenohenoeno 2—Hi Torokino 4 1 Totenoreno Eno 2 2 '—Nhi Trokino 4 —Metokino Henophenone Hi Trokino 4 4 “ 1-5—Sulfohenonophenone).
  • Aromatic henoate compounds such as p-t-phthylphenol and p-octyl vinylsalinolate are alkylarylsalinos.
  • Noanoacrylate-based compounds include 2-ethyl quinolool, 3-nophenyl acrylate, 2-noanol, 3-nofuryl and other noanoyl group-containing noaryl acrylates.
  • Noami Nouroites with 1 or 3 nitroquinols 1 3 5—Trianone compounds are 6- (2-hytroquinophenyl) 1 1 3,5, -trianophenyl _ 6— (2,4-notro troquinophenyl) ) 1 3 2 4—Nofenior 6— (2—Hirokino 4—Metokino 1) 1, 3, 5—Trianono 2 4—Nofeniol 1—— (2—4—Octylquinophen
  • the hinotate amino compound is exemplified in the section of antioxidants and is used as an amino compound.
  • weather resistance (light) stabilizers may be used alone or in combination of two or more of the same weather (light) stabilizers.
  • the blending ratio is 0 01 to 50 parts by weight, preferably 0 05 to 30 parts by weight, particularly preferably 0 1 to 2 parts per 100 parts by weight of the resin.
  • olefinino-based polymer polyethylene-no-ethylene and ⁇ -olefino-copolymer, these acid and water
  • ⁇ -nox Hori-Chileno ⁇ -no-kun
  • a benzoic acid trafluoroetileno a fatty acid ester.
  • the property improvers may be used alone or in combination of two or more.
  • the ratio in the case of slidability is preferably 0 parts by weight or more preferably 100 to 10 parts by weight, and even more preferably 0 to 5 parts by weight with respect to 100 parts by weight of the horiacetal resin.
  • Gloss control agents include acrylic corenoel polymers, plastics, plastic polyester elastomers, elastomers, elastomers homopolymers or copolymers (polymethyl methacrylates, carbonate resins, styrene resins (with cholestero AS resins) Olefino-based lunar effect (Polyfloureno is a cyclic fluoreino.
  • the blending ratio when the gloss control agent is blended is preferably 0 to 30 parts by weight, more preferably 0 parts by weight, more preferably 0 parts by weight with respect to parts by weight of holaceter. 5 to 10 parts by weight.
  • crow fiber As the filler, crow fiber, carbon fiber, holono fiber, titanium metal fiber, aluminum fiber, or organic fiber-like filler, crow More preferably, it is 1 to 80 parts by weight.
  • dyes various dyes are used.
  • an anthraquinono dye, a lid mouth anano dye, and a naphthoquino dye are used.
  • pigments either machine pigments or organic facial pigments have been used.
  • Titanium pigments Zinc pigments Carhonofuranoc Iron-based facials; H facial strength Tomi-based facial pigments Lead-based pigments Kohalt facial facial materials and alumini Organic facials include anano-based pigments, anthraquinono-based, non-anino-based facial wisteria, quinacritino-based pigments, helylene-based facial moths, helino-ininotrino-based pigments, oxanono-based pigments, and threno-based facials.
  • Carhonofuranoc acid, which is a high colorant Taronoanino-based face
  • the weather resistance (light) is also good.
  • the blending ratio is preferably holacetal resin 1 ⁇ 0 weight 0 0 1-5 parts by weight Preferably, it is 0 2 to 3 parts by weight, preferably 0 3 to 2 parts by weight.
  • ⁇ may include a release agent, a nucleating agent, an antistatic agent, a hardener, a foaming agent, a surfactant, a caustic agent, an aromatic agent, and a fragrance.
  • the production method of the holacetal resin composition according to the present invention is not particularly limited. (1) All components constituting the composition are combined / combined with each other. (2) Components constituting the ancestral composition Residual components are fed from the site feet through the site feet. In the preparation of a composition using an extruder, it is preferable to use one or more devolatilization extruders. Further, water or low-boiling alcohols are added to the location of the oleacetal resin from the king foot opening to the devolatilization f. 1 0 0 weight 0 1 to 10 parts by weight Formarte generated by extrusion process Preference is given to removing volatiles from low pressure distilling alcohols together with low boiling alcohols. It is possible to further reduce the amount of hot water generated from water. In addition, it is preferable to use feet after devolatilization when supporting a thiolanone compound.
  • the present invention also includes a molded product formed from the resin composition.
  • the amount of formartite produced is greatly suppressed by the addition of a specific sulfonate sulfonate compound. Specifically, the amount of formartite produced or less than 2 ⁇ g or 1 ⁇ g Z g per unit weight of the molded product. Also, the amount of hol generated under dry conditions or 2 ⁇ g, or less, preferably 1 ⁇ g per table weight of the molded product.
  • the holacetal resin molded product of the present invention is held in a severe condition (for example, a high-temperature / highly sealed space) with a molded product made of a resin other than a holica cetal resin such as a holicon phonate steal resin.
  • a resin composition of the present invention is not restricted in the field of use as a molded product. Use for reducing or strengthening the amount of generated artifacts * For example, automotive parts, parts, precision machine parts, building materials, piping parts, daily necessities, parts for chemicals, medical equipment, etc. Suitable for use.
  • 0 1 shows a GC chart of the benzoic acid hit b-3 used for the resin composition of Comparative Example 2 10.
  • 0 2 represents the GC chart of the phosphonic acid hit b-6 used in the resin composition of Comparative Example 5 13.
  • Henotos made from Anolenotne ⁇ ⁇ One Susano Fuller 7694 Mass Selector 5973 is used and 20 ml of hydrated carboxylic acid hydranoto compound is knob-linked to prevent inhalation of the baked quartz wool and 200 sample of the sample in the bottle. C for 10 minutes, and the generated fossil component is kept at GC / MS outlet side for 4 minutes.After holding for 4 minutes, the temperature rise rate is 10 ° C / min. Quantification was performed. In addition
  • a specific test piece is injection molded using the above-mentioned formartite generation amount Polycarbonate resin molded product corrosion test or the above-mentioned Hetosose GC / MS measurement / decomposition The amount of hydranone generated was measured.
  • melt intenox is a value obtained under the condition of 2 16 kg in accordance with AS TM-D 1 2 3 8. (b— 3) Anohino acid tranoto
  • the amount of formaldehyde resin produced in the examples is very low, and the molded product is in a sealed space or is a non-contact polycarbonate resin molded product in the sealed space. High quality and reliable.

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

Cette invention concerne une composition de résine polyacétalique stable dans laquelle la quantité de formaldéhyde à générer s’avère extrêmement faible et qui, même en cas de placement dans un espace fermé, n’agit pas de manière négative sur des moulages coexistants d’autres résines. La composition de résine polyacétalique se caractérise en ce qu’elle comprend (A) 100 parts en masse d’une résine polyacétalique et (B) entre 0,01 et 5,0 parts en masse d’un composé hydrazide d’acide carboxylique, et en ce que ledit composé (B), après 10 minutes de chauffage à 200 °C, génère une quantité d’hydrazine égale ou inférieure à 10 ppm dans une analyse par le procédé de phase gazeuse CG-SM.
PCT/JP2006/319610 2005-09-30 2006-09-25 Composition de résine polyacétalique et article moulé WO2007037446A1 (fr)

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JP2005-286138 2005-09-30
JP2005286138A JP2007091973A (ja) 2005-09-30 2005-09-30 ポリアセタール樹脂組成物及び成形品

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WO2007037446A1 true WO2007037446A1 (fr) 2007-04-05
WO2007037446A9 WO2007037446A9 (fr) 2007-05-24

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Families Citing this family (3)

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JP4904191B2 (ja) * 2007-04-13 2012-03-28 旭化成ケミカルズ株式会社 ポリアセタール樹脂組成物
EP2267075B1 (fr) 2008-10-28 2014-01-22 Asahi Kasei Chemicals Corporation Composition de résine polyacétal et son procédé de production
JP5401253B2 (ja) * 2009-10-09 2014-01-29 旭化成ケミカルズ株式会社 ポリアセタール樹脂組成物及びそれを含有する成形体

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04345648A (ja) * 1991-05-15 1992-12-01 Du Pont Japan Ltd ポリアセタール樹脂組成物
JPH1036681A (ja) * 1996-04-26 1998-02-10 Otsuka Chem Co Ltd 消臭性樹脂組成物
WO2001005888A1 (fr) * 1999-07-16 2001-01-25 Polyplastics Co., Ltd. Composition de resine polyacetal et procede de production correspondant
WO2001039808A1 (fr) * 1999-11-30 2001-06-07 Oshika Corporation Compositions de desodorisation des aldehydes
WO2001062309A1 (fr) * 2000-02-23 2001-08-30 Otsuka Kagaku Kabushiki Kaisha Compositions de desodorisant
JP2002035098A (ja) * 2000-07-26 2002-02-05 Otsuka Chem Co Ltd 消臭剤組成物、及び消臭性接着剤
WO2005044916A1 (fr) * 2003-11-10 2005-05-19 Polyplastics Co., Ltd. Composition inhibitrice d'aldehyde et composition de resine en polyacetale

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070123617A1 (en) * 2003-10-01 2007-05-31 Hatsuhiko Harashina Polyacetal resin composition

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04345648A (ja) * 1991-05-15 1992-12-01 Du Pont Japan Ltd ポリアセタール樹脂組成物
JPH1036681A (ja) * 1996-04-26 1998-02-10 Otsuka Chem Co Ltd 消臭性樹脂組成物
WO2001005888A1 (fr) * 1999-07-16 2001-01-25 Polyplastics Co., Ltd. Composition de resine polyacetal et procede de production correspondant
WO2001039808A1 (fr) * 1999-11-30 2001-06-07 Oshika Corporation Compositions de desodorisation des aldehydes
WO2001062309A1 (fr) * 2000-02-23 2001-08-30 Otsuka Kagaku Kabushiki Kaisha Compositions de desodorisant
JP2002035098A (ja) * 2000-07-26 2002-02-05 Otsuka Chem Co Ltd 消臭剤組成物、及び消臭性接着剤
WO2005044916A1 (fr) * 2003-11-10 2005-05-19 Polyplastics Co., Ltd. Composition inhibitrice d'aldehyde et composition de resine en polyacetale

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