WO2006129385A1 - Substrate carrying device - Google Patents

Substrate carrying device Download PDF

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Publication number
WO2006129385A1
WO2006129385A1 PCT/JP2005/019021 JP2005019021W WO2006129385A1 WO 2006129385 A1 WO2006129385 A1 WO 2006129385A1 JP 2005019021 W JP2005019021 W JP 2005019021W WO 2006129385 A1 WO2006129385 A1 WO 2006129385A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
cassette
transfer
node
side transfer
Prior art date
Application number
PCT/JP2005/019021
Other languages
French (fr)
Japanese (ja)
Inventor
Kensuke Hirata
Susumu Murayama
Original Assignee
Ishikawajima-Harima Heavy Industries Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ishikawajima-Harima Heavy Industries Co., Ltd. filed Critical Ishikawajima-Harima Heavy Industries Co., Ltd.
Priority to KR1020077005442A priority Critical patent/KR101226733B1/en
Priority to CN2005800338407A priority patent/CN101035725B/en
Publication of WO2006129385A1 publication Critical patent/WO2006129385A1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/068Stacking or destacking devices; Means for preventing damage to stacked sheets, e.g. spaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G1/00Storing articles, individually or in orderly arrangement, in warehouses or magazines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • B65G49/064Transporting devices for sheet glass in a horizontal position
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02Articles
    • B65G2201/0294Vehicle bodies
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04Arrangements of vacuum systems or suction cups
    • B65G2249/045Details of suction cups suction cups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

Definitions

  • the present invention relates to a substrate transfer device, and in particular, a substrate is placed between a cassette that can be stacked and stored using a competitor and a transfer node, and a process device that processes the substrate. It relates to what is transported.
  • a cassette in which glass substrates used for a plasma display panel or the like are stacked and stored, and is loaded at a predetermined position of a loading station using a transfer node ( Insert the transfer node into the cassette) and take out the glass substrates present at any position of the force set one by one, and place the removed glass substrates on the roller conveyor to place them on the glass substrate.
  • a substrate transport apparatus configured to be loaded into a process apparatus that performs processing such as printing (see, for example, JP-A-2002-167039).
  • the transfer node is inserted between the glass substrates, and the transfer hand is inserted after the insertion.
  • the glass substrate (cassette) is raised relative to the glass substrate to be transported slightly to support the glass substrate, and the supporting force of the cassette is also separated from the glass substrate.
  • the substrate is placed on the transfer node, and after the placement, the transfer node is moved out of the cassette, and the glass substrate is taken out of the cassette.
  • the force process apparatus side that uses a roller competitor to carry the glass substrate into the process apparatus often requires transfer using a transfer node. That is, for example, a part of a process apparatus for processing a substrate is partitioned from the outside by a cover, and when the substrate is loaded, a part of the cover that can be opened and closed is opened, Since it is necessary to carry in the substrate, the roller competitor has a drawback that it may be difficult to carry the glass substrate into the process apparatus.
  • the present invention has been made in view of the above problems, and is a substrate transport apparatus that transports a substrate between a cassette that can store a substrate and a process device that performs processing on the substrate. It is an object of the present invention to provide a substrate transfer apparatus that can increase the storage efficiency of the apparatus, has a simple configuration, and can reduce the installation area. Disclosure of the invention
  • the invention according to the first aspect of the present invention can be carried out by moving the substrate in a horizontal direction from a cassette that can be stored in multiple stages with the substrate horizontal, or by moving the substrate in the horizontal direction.
  • the cassette-side compressor that can be loaded into the cassette and the substrate can be supplied to a process device that moves the substrate in the horizontal direction and processes the substrate, or the substrate moves from the process device in the horizontal direction.
  • the side transfer hand and the substrate transfer means only move the substrate in parallel.
  • a substrate transfer apparatus configured to move.
  • the substrate is carried out from the cassette using the cassette-side competitor or the substrate is carried into the cassette, it is not necessary to move the substrate up and down during this loading / unloading.
  • the interval between the substrates stacked in the wire cassette (the vertical interval) can be reduced. The substrate storage efficiency can be increased.
  • the substrate is loaded into the process apparatus using the process side transfer node or the substrate of the process apparatus is also unloaded, it is possible to meet the requirements of the process apparatus side, and the process apparatus has many additional processes. Since it is not necessary to provide a joint robot or the like, the configuration of the substrate transfer apparatus can be simplified and the installation area can be reduced.
  • the movement of the substrate by the cassette-side competitor, the process-side transfer hand, and the substrate delivery means is only a parallel movement that does not involve a rotational movement that changes the posture of the substrate, Space for rotating (turning) the substrate is not required, and the installation area of the substrate transfer device can be reduced.
  • the invention according to the second aspect of the present invention can carry out the substrate by moving the substrate in the horizontal direction while holding the end surface or the vicinity of the end surface of the substrate from a cassette that can store the substrate horizontally and in multiple stages.
  • a cassette-side transfer node that holds the end face of the substrate or the vicinity of the end surface, moves the substrate in the horizontal direction and can be loaded into the cassette, and moves the substrate in the horizontal direction to the substrate.
  • a process-side transfer hand that can be supplied to a process apparatus that performs processing, or that can move the substrate horizontally and carry it out of the process apparatus; and the cassette-side transfer hand and the process-side transfer hand.
  • Substrate transfer means capable of transferring the substrate between them, and the cassette side transfer node, the process side transfer hand, and the substrate transfer means only perform parallel movement. It allows a Configured Ru substrate transport apparatus to move the substrate.
  • the substrate is carried out from the cassette or the substrate is carried into the cassette using the cassette-side transfer node, the substrate is moved upward and downward during the loading and unloading. Since the substrate side is held by the cassette side transfer node that does not need to be moved, the substrate is carried in and out, so that it is not necessary to move the substrate up and down during this loading and unloading. It is not necessary to insert the transfer side transfer node deeply between the substrates. Therefore, the distance between the substrates stacked in the wire cassette (interval in the vertical direction) can be reduced, and the efficiency of storing the substrates in the force set can be increased.
  • the loading and unloading is performed while holding the end portion of the substrate. Therefore, there is a possibility that the substrate may be damaged or the substrate may be contaminated. Further avoidance is possible.
  • the substrate since the substrate is loaded into the process apparatus using the process side transfer node or the substrate is unloaded from the process apparatus, it is possible to meet the requirements of the process apparatus side. Therefore, it is possible to simplify the configuration of the substrate transport apparatus and reduce the installation area.
  • the movement of the substrate by the cassette-side competitor, the process-side transfer hand and the substrate transfer means is only a parallel movement that does not involve a rotational movement that changes the posture of the substrate. Space for rotating (turning) the substrate is not required, and the installation area of the substrate transfer device can be reduced.
  • the invention according to the third aspect of the present invention is the substrate transfer apparatus according to the second aspect, wherein the cassette-side transfer node includes a slide base that extends long in the loading / unloading direction of the substrate; A movable member movable in the loading / unloading direction of the substrate relative to the slide base; and a holding member capable of holding the substrate and movable in the loading / unloading direction of the substrate relative to the moving member; And the holding member is configured to be movable and positionable relative to the slide base.
  • the holding member force of the cassette-side transfer node is provided so as to be movable with respect to the moving member that is movable with respect to the base member. It is possible to avoid as much as possible the increase in the installation area of the substrate transfer device due to the increased stroke (substrate transfer stroke).
  • An invention based on the fourth aspect of the present invention is the substrate transport apparatus according to any one of the first aspect to the third aspect, wherein the cassette side comparer or the cassette side transfer node is a substrate by the end.
  • the loading / unloading direction of the substrate and the loading / unloading direction of the substrate by the process-side transfer hand coincide with each other, and the cassette-side compressor or The substrate transferred from the cassette at the cassette side transfer node or the substrate transferred from the cassette at the process side transfer node, or the substrate transferred also from the process equipment by the process side transfer node.
  • This is a substrate transfer device having substrate movement positioning means that can be moved and positioned in a horizontal direction intersecting with the loading / unloading direction of the substrate by the process side transfer node.
  • the loading / unloading direction (X-axis direction) of the substrate by the cassette side conveyor or the cassette side transfer node and the substrate by the process side transfer node Since the loading / unloading direction (X-axis direction) coincides with each other, and the substrate movement positioning means that can move and position the substrate in the Y-axis direction is provided, the configuration of the entire substrate transfer device is further simplified. In addition, the substrate can be transferred between the cassette and the process apparatus even if the cassette and the process apparatus are located at positions shifted in the Y-axis direction.
  • the substrate can be transferred between multiple process devices.
  • the invention based on the fifth aspect of the present invention is any one of the first aspect to the fourth aspect.
  • the force setting side compressor or the The substrate is transferred between the cassette-side transfer node and the process-side transfer node, or the substrate transfer means is the cassette-side compressor or the cassette A transfer air float means or a transfer ultrasonic float means that is movable in the vertical direction relative to the side transfer hand and the process side transfer node, and the process side transfer hand.
  • Each notch or each through-hole provided in the mounting node is connected to the air flow means for the transfer or the ultrasonic wave for the transfer.
  • Placing the substrate in over preparative means The substrate is configured to be able to pass the substrate between the cassette-side compressor or the cassette-side transfer node and the process-side transfer node by passing a portion to be transferred! It is a transport device.
  • each of the substrate transfer means includes a transfer competitor that is movable in the vertical direction, and is provided in each process-side transfer node.
  • the substrate can be delivered between the cassette-side competitor and the process-side loading node by passing the notch or each through hole through the portion of the delivery competitor where the substrate is placed.
  • the substrate can be delivered with a simple configuration and only by moving in the vertical direction, and the possibility of scratching the substrate can be avoided.
  • the delivery means is composed of delivery air float means and delivery ultrasonic float means, the construction is simple and vertically.
  • the substrate can be delivered only by moving, and the substrate can be further prevented from being damaged or contaminated when the substrate is transferred.
  • An invention based on a sixth aspect of the present invention provides a substrate transfer apparatus according to any one of the first aspect to the fifth aspect, and a base end side of the process side transfer node.
  • a substrate transfer apparatus according to any one of the first aspect to the fifth aspect, and a base end side of the process side transfer node.
  • an intermediate converter for supporting the weight of the substrate moving in a horizontal direction between the cassette-side conveyor or the cassette-side transfer node and the process-side transfer node, or the cassette
  • An intermediate air float means or an intermediate ultrasonic float means is provided for supporting the weight of the substrate moving horizontally between the side conveyor or the cassette side transfer hand and the process side transfer node. It is a substrate transfer device.
  • the intermediate compressor since the intermediate compressor is provided, the cassette-side compressor and the transfer-use conveyor are supported while the substrate is supported using the intermediate competitor. It is possible to deliver the substrate between the two, and it is possible to reliably deliver the substrate.
  • the invention based on the seventh aspect of the present invention is any one of the first aspect to the sixth aspect.
  • the substrate is unloaded from the process apparatus and the substrate is loaded into the process apparatus. Can be performed in a short time.
  • FIG. 1 is a plan view showing a schematic configuration of a substrate transfer apparatus according to a first embodiment of the present invention.
  • FIG. 2 is a side view showing a schematic configuration of the substrate transfer apparatus.
  • FIG. 3 is a side view showing the operation of the substrate transfer apparatus.
  • FIG. 4 is a side view showing the operation of the substrate transfer apparatus.
  • FIG. 5 is a side view showing the operation of the substrate transfer apparatus.
  • FIG. 6 is a side view showing the operation of the substrate transfer apparatus.
  • FIG. 7 is a side view showing the operation of the substrate transfer apparatus.
  • FIG. 8 is a view showing a state in which a plurality of substrate transport hands are provided.
  • FIG. 9 is a plan view showing a modified example of the substrate transfer apparatus.
  • FIG. 10 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
  • FIG. 11 is a diagram showing an XI arrow in FIG.
  • FIG. 12 is a view showing the arrow in FIG.
  • FIG. 13 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
  • FIG. 14 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
  • FIG. 15 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
  • FIG. 16 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
  • FIG. 1 is a plan view showing a schematic configuration of the substrate transfer apparatus 1 according to the first embodiment of the present invention
  • FIG. 2 is a side view showing the schematic configuration of the substrate transfer apparatus 1.
  • one horizontal direction is defined as an X-axis direction
  • another horizontal direction that is perpendicular to the X-axis direction is defined as a Y-axis direction.
  • the direction is the Z-axis direction.
  • the substrate transfer apparatus 1 includes a cassette CS that can store a glass substrate (for example, a rectangular and plate-like glass substrate used for a plasma display panel, a liquid crystal display panel, etc.) W, and the glass substrate (hereinafter simply referred to as a glass substrate) Sometimes referred to as “substrate”.)
  • a glass substrate for example, a rectangular and plate-like glass substrate used for a plasma display panel, a liquid crystal display panel, etc.
  • substrate hereinafter simply referred to as a glass substrate
  • a device that transports the substrate W to and from a process device (not shown in FIGS. 1 and 2) for processing (processing) W. 3 and process transfer node 5 are provided.
  • the cassette CS can store the substrates W in multiple stages by stacking the substrates W in the vertical direction slightly apart from each other.
  • the cassette-side compressor 3 moves linearly in the horizontal direction (only in the X-axis direction) with the substrate W stored in the cassette CS in the lowermost position! And can be taken out one by one. Further, the cassette-side compressor 3 moves the substrate W linearly (only in the X-axis direction) in a straight line so that the substrates W can be loaded one by one into the cassette CS. It is summer. In the cassette CS, the substrates W are arranged from top to bottom in order from the first loaded.
  • the process-side transfer hand 5 can move the substrate W one by one in the horizontal direction (only in the X-axis direction) linearly and supply it to the process apparatus. Move horizontally (only in the X-axis direction) and move it out of the process equipment Has become possible.
  • the transport direction of the substrate W by the cassette-side conveyor 3 and the transport direction of the substrate W by the process-side transfer node 5 coincide with each other.
  • the substrate W is transferred to the substrate transfer device 1 by moving the substrate W only in the Z-axis direction between the cassette side conveyor 3 and the process side transfer hand 5.
  • a substrate transfer means 7 is provided.
  • the cassette-side competitor 3, the process-side transfer hand 5, and the substrate transfer means 7 only translate the substrate W, in other words, the substrate without changing the posture of the substrate W. By moving W only in parallel, the substrate W is moved.
  • the cassette-side compressor 3 has a force described later in detail.
  • the cassette W is moved from the vertical direction at a position that does not interfere with the cassette CS and the substrate transfer means 7. It is comprised so that it may pinch and move.
  • the substrate transfer means 7 includes a transfer comparator 9 that is movable in the vertical direction relative to the cassette-side competitor 3 and the process-side transfer hand 5, and the process.
  • a transfer comparator 9 that is movable in the vertical direction relative to the cassette-side competitor 3 and the process-side transfer hand 5, and the process.
  • the space between the cassette side conveyor 3 and the process side transfer hand 5 is set horizontally.
  • An intermediate compressor 19 is provided for supporting the weight of the moving substrate W and the lower force of the substrate W.
  • the substrate transfer means 7 is provided between the cassette-side conveyor 3 and the transfer-use conveyor 9 in the process-side transfer node 5 (more specifically, a transfer hand support member 39 to be described later). And a portion 15 on which the substrate W is placed is a substrate placement portion 17 of the process side transfer node 5 (pass line; the substrate on the process side transfer hand 5).
  • the substrate W is transferred between the cassette side compressor 3 and the transfer competitor 9 by using an intermediate compressor 19 provided higher than the lower surface of the substrate w when transporting w. It is configured to be possible.
  • the substrate placement portion of the delivery competitor 9 (the lower surface of the substrate W when the substrate W is placed on the delivery competitor 9; the nose line of the delivery competitor 9) 13 At least the pass line of the cassette side competitor 3 (the lower surface of the substrate W when the substrate W is placed on the cassette side competitor 3) 21 and the process side transfer It is possible to move up and down between the position below the pass line 17 of the node 5.
  • each roller 23 force of the delivery competitor 9 constituted by a roller competitor can move up and down the range through the notch 11! /.
  • the cassette-side competitor 3 has the substrate W placed thereon, the pass line 17 of the process-side transfer hand 5 is present at a position lower than the pass line 21 of the cassette-side competitor 3, and
  • the workpiece placement part of the intermediate competitor 19 (the lower surface of the substrate W when the substrate W is placed on the intermediate competitor 19; the pass line of the intermediate competitor 19) 15 is a path of the cassette-side competitor 3
  • the substrate mounting portion 13 of the transfer competitor 9 is set to the same height as the pass line 21 of the cassette-side competitor 3, and the intermediate
  • the substrate W is transferred from the cassette side conveyor 3 to the delivery competitor 9, and after this transfer, the pass line 13 of the delivery competitor 9 is moved to the pass of the process side transfer hand 5.
  • the consist cassette side Konpeya 3 to be able to pass the substrate W to the process side transfer Nono command 5, Ru.
  • the process side transfer node 5 has the substrate W placed thereon, and the pass line 17 of the process side transfer node 5 is located at a position lower than the pass line 21 of the cassette side conveyor 3. And when the pass line 15 of the intermediate competitor 19 is at the same height as the pass line 21 of the cassette side compressor 3, the position is lower than the pass line 17 of the process side transfer node 5
  • the transfer conveyor 9 existing in the cassette side is raised until it reaches the same height as the pass line 21 of the cassette side competitor 3, and the process side transfer node 5 is placed thereon.
  • the substrate W that has been placed is placed on the delivery conveyor 9, and the substrate W on which the delivery competitor 9 is placed is relayed by the intermediate competitor 19 and transferred to the cassette-side conveyor 3.
  • the substrate W can be transferred from the process side transfer node 5 to the cassette side competitor 3.
  • the substrate transfer apparatus 1 will be described in more detail.
  • the cassette CS is configured in a rectangular parallelepiped shape, and includes side members CS1 at both ends in the Y-axis direction. Between each side member CS1, a linear member (for example, a wire; not shown) is stretched to place and store a plurality of substrates W in the cassette CS.
  • a linear member for example, a wire; not shown
  • a plurality of the wires are provided at the same position (at the same height) in the Z-axis direction, extending in the Y-axis direction with a predetermined interval in the X-axis direction, thereby providing one substrate
  • One wire group that can support (place) W is formed.
  • the cassette CS can be stored in multiple stages with the substrates W horizontal.
  • the cassette CS thus configured may be referred to as a wire cassette.
  • an opening is provided on one side surface of the cassette CS in the X-axis direction (the surface on the side where the process side transfer hand 5 is provided) so that the substrate W can freely enter and exit. ing.
  • a normal cassette (a cassette configured to support the substrate W with support members provided at both ends in the Y-axis direction) may be employed.
  • the wire cassette CS is placed on a cassette placing device (not shown) using a stagger crane or overhead crane (not shown), and is moved and positioned in the Z-axis direction.
  • the cassette-side compressor 3 is constituted by, for example, a roller competitor, and is provided at the upper end of a plurality of roller support members 25 provided on a base member 24 provided on the floor so as to rotate freely. A plurality of rollers 27 are provided.
  • Each roller support member 25 is erected with a predetermined interval in the X-axis direction. Then, when the wire cassette CS is placed on the cassette placing device and the wire cassette CS is moved up and down, the substrate of the wire cassette CS is stored in a state where the substrate W is not stored.
  • the rollers 27 and the roller support members 25 can be inserted between the wires. In other words, the rollers 27 and the roller support members 25 enter the wire cassette CS without interfering with the wire cassette CS or the cassette transfer device.
  • Each roller 27 of the cassette side compressor 3 is rotated by an actuator such as a motor via a power transmission member such as a belt or a chain with a central axis extending in the Y-axis direction as a rotation center, and the substrate W is rotated. It comes to carry.
  • the upper end portion of each roller 27 forms the pass line 21 of the cassette side conveyor 3.
  • roller 27A which is located on the most side (on the intermediate compressor 19 side) among the rollers 27, is provided at a position where it does not enter the cassette CS.
  • a roller 26 is provided above the front roller 27A.
  • the roller 26 can be rotated by an actuator such as a V, a motor (not shown), and is also moved toward and away from the roller 27A (Z axis) by an actuator such as a fluid pressure cylinder (not shown).
  • an actuator such as a V, a motor (not shown)
  • a fluid pressure cylinder not shown
  • the substrate W When the substrate W is unloaded or loaded, the substrate W can be moved with the vertical force sandwiched between the roller 27A and the roller 26. Remove the actuator for rotating the roller 26, and configure the roller 26 to rotate freely.
  • a process-side transfer node 5 is provided on one side of the cassette-side compressor 3 in the X-axis direction.
  • This process-side transfer node 5 is formed in a thin plate shape with a rectangular appearance, and the thickness direction is provided in the Z-axis direction.
  • Y A plurality of rectangular cutouts 11 are formed at predetermined intervals in the axial direction.
  • the substrate transport apparatus 1 receives the substrate W unloaded from the cassette CS by the cassette-side comparer 3 or the substrate W unloaded by the process-side transfer node 5 by the process apparatus force.
  • Substrate unloading by the cassette-side compressor 3 and the process-side transfer node 5 Substrate movement positioning means 30 that can move and position in a horizontal direction (for example, the orthogonal Y-axis direction) intersecting the input direction (X-axis direction) is provided.
  • a base member 29 is provided on the floor surface adjacent to the base member 24 (on one side in the X-axis direction), and the guide rail 31 provided on the base member 29 is provided with a base rail 29.
  • the base 33 is movable in the Y-axis direction.
  • the base 33 is freely positionable in the ⁇ -axis direction by an actuator such as a motor (not shown) through a power transmission means such as a ball screw (not shown).
  • Each side member 35 is erected on both ends of the base 33 in the Y-axis direction.
  • a transfer node support member 39 is provided so as to be movable in the Z-axis direction via a guide rail 37 provided integrally with each side member 35.
  • the transfer node support member 39 can be positioned in the Z-axis direction by an actuator such as a motor (not shown) via a power transmission means such as a ball screw (not shown).
  • An intermediate member 41 is provided on the inner side of the transfer support member 39 so as to be movable in the X-axis direction. Further, the process-side transfer hand 5 is provided inside the intermediate member 41 so as to be movable in the X-axis direction. Further, the process-side transfer hand 5 is not shown via a power transmission means such as a ball screw, but is not shown in the figure, with an actuator such as a motor in the X-axis direction (the direction opposite to the cassette-side compressor 3). The movement position can be freely determined by projecting from the transfer hand support member 39 to the position indicated by the two-dot chain line in FIGS.
  • a delivery competitor 9 is provided on one side of the cassette-side competitor 3 in the X-axis direction.
  • the delivery competitor 9 is constituted by, for example, a roller competitor, and the pass line 13 of the roller competitor can freely move in the Z-axis direction.
  • a transfer competitor base member 43 is provided via a rod 37 so as to be movable in the Z-axis direction.
  • the delivery competitor base member 43 is not shown through a force transmission means such as a ball screw (not shown), and is an actuator such as a motor (the transfer hand support portion).
  • the actuator that is different from the actuator that drives the material 39) is self-positioning in the Z-axis direction.
  • a plurality of roller support members 45 are provided on the delivery competitor base member 43 at predetermined intervals in the Y-axis direction, and a plurality of rollers are provided at the upper end of the roller support member 45. 23 is rotatably provided.
  • the pass line 13 of the delivery competitor 9 moves at least between a predetermined position separated downward from the process side transfer node 5 and the pass line 21 of the cassette side competitor 3. It is like that.
  • Each roller 23 of the delivery competitor 9 is rotated by an actuator such as a motor via a power transmission member such as a belt or a chain with the central axis extending in the Y-axis direction as the rotation center. Then, the substrate W is transported.
  • an actuator such as a motor
  • a power transmission member such as a belt or a chain with the central axis extending in the Y-axis direction as the rotation center. Then, the substrate W is transported.
  • the above-described intermediate compressor for example, roller compressor 19 is provided on the other end side of the process side transfer hand 5 (base end side; between the cassette side conveyor 3 and the notches 11). Is provided on the other end side of the process side transfer hand 5 (base end side; between the cassette side conveyor 3 and the notches 11).
  • Each roller 47 of the intermediate compressor 19 is rotatable with respect to a rectangular plate-like roller support member 48 installed so that the thickness direction is in the vertical direction, and the roller support member 48 Is provided integrally with the transfer node support member 39. Accordingly, the rollers 47 of the intermediate compressor 19 are rotatable with respect to the transfer support and the support member 39.
  • Each roller 47 of the intermediate compressor 19 is rotated by an actuator such as a motor via a power transmission member such as a belt or a chain with the central axis extending in the Y-axis direction as a rotation center, and conveys the substrate W. It is like that. It should be noted that a device for rotating the rollers 47 of the intermediate compressor 19 (such as the belt actuator) may be omitted.
  • the process side transfer node 5 is supported by the roller below the roller support member 48. It is provided away from member 48. Further, a notch 11 of the process side transfer node 5 is formed, and the state (the state shown in FIG. 2) is such that the process side transfer node 5 extends to the process apparatus side. ) Is located below the roller support member 48.
  • the intermediate compressor 19 is provided to support the weight of the W that moves between the cassette-side competitor 3 and the process-side transfer node 5 (the delivery competitor 9). Now that I can do it!
  • FIG. 3 to 7 are side views showing the operation of the substrate transport apparatus 1.
  • FIG. 6 is a plan view under the state shown in FIG.
  • the cassette CS containing the substrate W is positioned above the cassette-side competitor 3, and the pass line 21 of the cassette-side competitor 3 and the pass line 15 of the intermediate competitor 19 are Are located at the same height, and the pass line 13 of the delivery competitor 9 is located below the pass line 17 of the process-side transfer node 5.
  • the cassette CS is placed until the lowermost substrate W of the substrates W on which the cassette CS is placed contacts the roller 27 of the cassette-side compressor 3. While moving downward, the delivery competitor base member 43 ascends until the nose line 15 of the intermediate competitor 19 and the pass line 13 of the delivery competitor 9 coincide with each other (see FIG. 3).
  • the respective substrates 3, 19, 9 are driven to move the substrate W until the lowermost substrate W is placed on the delivery competitor 9 (see FIG. 4). ).
  • the substrate W is moved in this way, the substrate W is sandwiched between the roller 27A and the roller 26.
  • the delivery competitor base member 43 is lowered, and the delivery conveyor 9 is placed! /, And the substrate W is placed on the process side transfer node 5 (see FIG. 5).
  • the rotatable intermediate compressor 19 does not move.
  • the intermediate transfer unit 19 may be moved at the same time when the process side transfer node 5 and the intermediate member 41 are provided on the side transfer node 5 and extend.
  • the process-side transfer node 5 After the loading, the process-side transfer node 5, the intermediate member 41 and the intermediate member 41 are retracted, and the next substrate on which the roller 27 of the cassette-side compressor 3 is mounted on the cassette CS (the cassette CS The cassette CS is lowered and the next substrate W is unloaded until it comes into contact with the substrate W which is present on the lowermost side of the substrates W placed on the substrate.
  • the substrate W is transferred from the process apparatus to the cassette CS, the substrate W is transferred by an operation substantially opposite to the above operation.
  • the substrate W is unloaded from the cassette CS or loaded into the cassette CS using the cassette-side comparer 3, so that the substrate W is moved up and down during loading / unloading.
  • it is not necessary to insert a transfer node between the substrates so that the interval between the substrates W stacked in the wire cassette CS (interval in the vertical direction) is reduced.
  • the efficiency of storing the substrate in the cassette CS can be increased.
  • the process apparatus side request can be answered.
  • the movement (conveyance) of the substrate W by the cassette-side competitor 3, the process-side transfer node 5 and the substrate transfer means 7 can be performed only by a parallel movement that does not involve a rotational movement that changes the posture of the substrate W.
  • a space for rotating (turning) the substrate W becomes unnecessary, and the installation area of the substrate transfer apparatus 1 can be reduced.
  • the space required for the swirling is at least the diagonal line of the substrate W. Is required for the circle whose diameter is. Furthermore, whether the turning center is the center of the substrate W If shifted, the space required for turning becomes even larger, and the position of the substrate W may shift due to angular acceleration (tangential acceleration) and centripetal acceleration (normal acceleration) generated by turning.
  • the space required for turning the substrate W becomes unnecessary, and therefore the installation area of the substrate transfer apparatus 1 can be reduced. Can do. Further, it is possible to avoid the possibility that the substrate W is displaced due to the turning.
  • the mechanism for rotating the large substrate W generally rotates the mounting table on which the substrate is mounted by means of an actuator such as a motor via a speed reducer composed of a gear or the like. It is configured. In this configuration, there is a gear knock, so that a positioning mechanism using positioning pins or the like is required for accurately positioning the mounting table as described above, and the configuration of the substrate transfer apparatus becomes complicated. Further, in order to prevent the displacement of the substrate W due to the rotation of the substrate W and the displacement of the substrate W due to the shock generated when the mounting table is positioned by the positioning pin, the mounting table and the positioning pin are operated slowly. This necessitates a reduction in substrate W transfer efficiency.
  • the substrate transfer apparatus 1 does not require a turning mechanism for the substrate W, so that the configuration is simple. Further, since the substrate W is not turned, the displacement of the substrate W during the turning of the substrate is reduced. Therefore, the transfer speed of the substrate W can be increased and the transfer efficiency of the substrate W can be improved.
  • the substrate transfer apparatus 1 when the substrate W is carried out or carried in, the substrate W is sandwiched and moved by the roller 26 and the mouth roller 27A. Suppresses the possibility of slippage between the substrate W and the cassette side compressor 3 even if a large force is applied to the substrate W to carry it (even if the acceleration (including negative acceleration) applied to the substrate W is large). The substrate W can be transported quickly.
  • the substrate transfer means 7 includes the transfer competitor 9 that is movable in the vertical direction, and is provided in the process-side transfer node 5.
  • the substrate W can be transferred between the cassette-side competitor 3 and the process-side transfer node 5 by passing through each notch 11 by a portion on the transfer-use competitor 9 where the substrate W is placed. Since it is configured to be possible, the substrate W can be delivered simply by moving the force upward and downward with a simple configuration, and the possibility of the substrate W being damaged can be avoided.
  • the substrate transport apparatus 1 since the intermediate competitor 19 is provided, the cassette-side competitor 3 and the delivery competitor 9 are supported while the substrate W is supported using the intermediate competitor 19. The substrate W can be delivered between the two, so that the substrate W can be reliably delivered.
  • notches 11 in the process side transfer node 5 are provided, and the not-not-formed portions are provided at intervals from each other. It is indispensable to connect the place (the part where the notch 11 is provided) together
  • the substrate w can be supported by the downward force even in the not-cut portion, and the substrate due to gravity during substrate transfer is supported. W stagnation can be avoided and the substrate W can be transported smoothly.
  • the loading / unloading direction of the substrate W by the cassette side compressor 3 ( The X-axis direction) and the loading / unloading direction (X-axis direction) of the substrate W by the process-side transfer node 5 coincide with each other, and the substrate W can be moved and positioned in the Y-axis direction. Since the means 30 is provided, the overall structure of the substrate transfer apparatus 1 is further simplified, and even if the cassette CS and the process apparatus are located at positions shifted in the Y-axis direction, the cassette CS and the process apparatus The substrate can be transferred between the two.
  • the substrate W can be transferred between a plurality of process apparatuses.
  • FIG. 8 a diagram showing a state in which a plurality of process-side transfer nodes 5 are provided
  • a plurality of process-side transfer nodes 5 are arranged in the vertical direction (for example, 2 Tsu) It ’s set up.
  • the substrate transport apparatus configured as described above, it is possible to carry out the substrate W with the process apparatus power and the substrate W into the process apparatus in a short time.
  • the process side transfer nodes 5A and 5B are moved to the process equipment. After the substrate W processed by the process apparatus is placed on the process side transfer node 5A existing above, the substrate on which the process side transfer node 5B is placed is placed on the substrate. If the process side transfer nodes 5A and 5B are separated from the process equipment force after carrying in the process equipment, the substrate W is unloaded from the process equipment and the substrate W is carried into the process equipment. Can be performed in a short time.
  • FIG. 9 plane view showing a modified example of the substrate transport apparatus
  • the transport direction (X-axis) of the substrate W by each of the competitors 3, 9, 19 is shown.
  • the transfer direction (Y-axis direction) of the substrate W by the process side transfer node 5 may be changed.
  • FIGS. 10 and 11 to 16 are perspective views showing a schematic configuration of the substrate transfer apparatus 101 according to the second embodiment of the present invention
  • FIG. 11 is a view showing an arrow XI in FIG.
  • FIG. 12 is a diagram showing the arrow in FIG. [0109]
  • the substrate transfer apparatus 101 according to the second embodiment uses a transfer node instead of a competitor to carry out a substrate from a cassette or carry a substrate into a cassette. Except for the point that the competitor is composed of an air float, it is configured in substantially the same manner as the substrate transfer apparatus 1 according to the first embodiment and has substantially the same effect, and the substrate does not touch the competitor. The degree of cleanliness can be further increased.
  • the substrate transfer apparatus 101 includes a cassette side transfer node 102.
  • the cassette-side transfer node 102 holds the substrate W from the cassette that can accommodate the substrates W in a multilevel manner and holds the substrate W (position shown in FIG. 14; first position). It is configured so that it can be carried out to a predetermined position PS 1).
  • the cassette-side transfer node 102 can carry the substrate W present at the position PS1 shown in FIG. 14 while holding the end face or the vicinity of the end face of the substrate W into the cassette. It is configured as follows.
  • the cassette-side transfer node 102 includes an L-shaped moving member 106.
  • the moving member 106 extends in the loading / unloading direction (X-axis direction) of the substrate W, and is movable and positioned in the loading / unloading direction of the substrate W with respect to the slide base (base member) 107.
  • the slide base 107 extends long in the loading / unloading direction (X-axis direction) of the substrate W and is provided integrally with the base member 104.
  • the base member 104 is movable and positionable in the X-axis direction and the Y-axis direction, like the delivery competitor base member 43.
  • the moving member 106 is provided with a holding member 108 for holding the substrate W.
  • the holding member 108 is movable and positioned in the X-axis direction with respect to the moving member 106.
  • the holding member 108 includes, for example, a suction cup 110, and can hold the substrate W by adsorbing the lower surface near the end face of the substrate W as shown in FIG. It ’s a sea urchin.
  • a suction cup 110 instead of the suction cup 110, the vicinity of the end face of the substrate W may be sandwiched to hold the substrate w.
  • a plurality (for example, two) of the moving member 106, the holding member 108, and the like are provided apart from each other in the Y-axis direction.
  • cassette side air float means (not shown) for supporting the weight of the substrate W carried out or carried in the cassette side transfer node 102 on the lower side of the cassette. Yes.
  • the cassette-side air float means includes, for example, a support member made of ceramic having air permeability, and the compressed air supplied by the compressed air supply means is ejected from the support member, The weight of the substrate W can be supported in a non-contact state with the substrate W! /.
  • the support member may be made of a breathable sintered metal or the like instead of the breathable ceramics. Further, using a member such as a metal that is not air permeable and filled with a material, a plurality of holes are provided in the member such as a metal, and compressed air is ejected from these holes to support the substrate W. Even so, ⁇ ⁇ .
  • the substrate transfer apparatus 101 transfers the substrate W present at the second predetermined position (position PS3 shown in FIG. 15) located below the first predetermined position.
  • a process-side transfer hand 112 that can be supplied to a process device that processes the substrate W, or can carry the substrate W out of the process device to the second predetermined position (the process-side transfer hand 5). It is constructed in the same manner as the above, and is equipped with a transfer hand).
  • the process-side transfer node, 112 is similar to the process-side transfer node, 5, and the transfer hand support member 114 (the transfer hand) via the intermediate member 115 (see FIG. 16). Similarly to the support member 39, the process-side transfer node 112 is provided for the transfer node support member 114 with respect to the transfer node support member 114. It can be moved by protruding in the axial direction.
  • the substrate transfer apparatus 101 includes a substrate transfer means 116 capable of transferring the substrate W between the first predetermined position and the second predetermined position.
  • the delivery means 116 includes the cassette side transfer node 102, the process side transfer node 102, and the process side transfer node.
  • a transfer air float means 118 that is movable in the vertical direction relative to the terminal 112, and each notch provided on the process side transfer node 112 is connected to the transfer air. By passing the portion on which the substrate W of the float means 118 is placed, the substrate W can be delivered between the first predetermined position and the second predetermined position. Become.
  • the delivery air float means 118 includes a support member 120, which extends in the X-axis direction above the base member 104 and is spaced in the Y-axis direction.
  • a plurality of the base members 104 are integrally provided.
  • the support member 120 is configured in the same manner as the support member of the cassette-side air float means, and can support the substrate W by ejecting air.
  • intermediate air float means 122 for supporting the substrate W transported by the cassette-side transfer node 102 is provided between the first predetermined position and the cassette. It has been.
  • the intermediate air float means 122 includes a support member 124.
  • the support member 124 is spaced from the cassette side and inside the transfer hand support member 114 in the Y-axis direction.
  • a plurality of the base members 104 are integrally provided.
  • the moving member 106 has the process side transfer hand 112 and the support member 124 in the Y-axis direction. It is provided between.
  • FIG. 10 shows an initial state.
  • the lower surface of the substrate W located at the lowest position of the cassette, the upper end of the suction cup 110, the upper surface of the support member 124, and the upper surface of the support member 120 are substantially the same height.
  • the upper surface of the process-side transfer hand 112 is positioned below the upper surfaces of the support members 120 and 124.
  • the moving member 106 does not protrude toward the cassette side, but is accommodated inside the base member 104 in a plan view.
  • the moving member 106 extends toward the cassette side, and the holding member 108 also moves toward the cassette side, and the end surface of the lowermost substrate W is moved by the suction cup 110. Adsorb the lower part in the vicinity and hold the substrate W (see Fig. 11 and Fig. 13)
  • the air float in each of the support members 120 and 124 is turned on, and the air is moved in the support members 120 and 124 by moving the moving member 106 and the holding member 108 away from the cassette.
  • the substrate W is transported to the first predetermined position PS1 while floating and supporting the weight of the substrate W (see FIG. 14).
  • the process side transfer node 112 is extended to the process apparatus side, and the substrate W is loaded into the process apparatus (see FIG. 16). After the loading, the process side transfer hand 112 is loaded. The height of the base member 104 and the transfer hand support member 114 is adjusted as appropriate, and the initial state is restored.
  • the process apparatus force when the substrate is transferred to the cassette, the process apparatus force also performs an operation opposite to the operation described above.
  • the transfer directions of the substrates W by the respective transfer hands 102 and 112 coincide with each other as in the first embodiment.
  • the substrate W is unloaded from the cassette using the cassette side transfer node 102, or the substrate W is loaded into the cassette. It is not necessary to move the substrate W up and down at the time of loading / unloading, since the end of the substrate W is held by the cassette-side transfer node 102 which does not need to move to / from the substrate. There is no need to insert the cassette side transfer node 102 between the substrates W deeply. Therefore, the interval between the substrates W stacked in the cassette (interval in the vertical direction) can be reduced, and the storage efficiency of the substrates in the cassette can be increased.
  • the end portion of the substrate W is held and loaded and unloaded, so that the central portion of the substrate W may be damaged.
  • the possibility that the substrate W is contaminated can be further avoided.
  • the process side transfer node No. 112 is used to carry the substrate W into the process apparatus or the process apparatus force also unloads the substrate W, it is possible to answer the request from the process apparatus side, Since it is not necessary to provide a separate articulated robot or the like, the configuration of the substrate transfer apparatus 101 can be simplified and the installation area can be reduced.
  • the movement of the substrate W by the cassette-side competitor, the process-side transfer hand, and the substrate transfer means can be performed only by parallel movement without accompanying rotational movement that changes the posture of the substrate W. Therefore, a space for rotating (turning) the substrate W becomes unnecessary, and the installation area of the substrate transfer apparatus 101 can be reduced.
  • a plurality of the process-side transfer hands 112 may be arranged in an upward and downward direction!
  • an ultrasonic float means that floats the substrate W using ultrasonic waves may be employed.
  • the ultrasonic float means supports the weight of the substrate W by a thin air film formed between the substrate W and the substrate support member by vibrating the substrate support member with an ultrasonic vibrator.
  • the ultrasonic float means includes an ultrasonic wave generation element (for example, a piezo element).
  • a horn for amplifying the vibration generated by the ultrasonic wave generating element is provided above the ultrasonic wave generating element.
  • the substrate support member is provided on the upper portion of the horn via a connecting member.
  • the vibration generated by the ultrasonic wave generating element is transmitted to the substrate support member, and the substrate support member vibrates mainly in the thickness direction of the substrate W, whereby the substrate W and the substrate support described above are supported.
  • a radiation pressure using air as a medium (radiation pressure due to air density waves) is generated between the members, and a thin air film is generated between the substrate W and the substrate support member by the radiation pressure, The weight of the substrate W can be supported by the substrate support member. It has become.

Abstract

A substrate carrying device, comprising a cassette side conveyor (3) capable of carrying out substrates (W) from a cassette (CS), a process side transfer hand (5) capable of feeding the substrates (W) to a process device for processing the substrates (W), and a substrate delivery means (7) capable of delivering the substrates (W) between the cassette side conveyor (3) and the process side transfer hand (5).

Description

明 細 書  Specification
基板搬送装置  Substrate transfer device
技術分野  Technical field
[0001] 本発明は、基板搬送装置に係り、特に、コンペャと移載ノヽンドとを用い、基板を積 層して収納自在なカセットと、基板に処理を施すプロセス装置との間で基板を搬送す るものに関する。  TECHNICAL FIELD [0001] The present invention relates to a substrate transfer device, and in particular, a substrate is placed between a cassette that can be stacked and stored using a competitor and a transfer node, and a process device that processes the substrate. It relates to what is transported.
背景技術  Background art
[0002] 従来、プラズマディスプレイパネル等に使用されるガラス基板が積層されて収納さ れているカセットであってローデイングステーションの所定の位置にローデイングされ たカセットから、移載ノヽンドを用いて (前記カセット内に移載ノヽンドを挿入して)前記力 セットの任意の位置に存在しているガラス基板を 1枚ずつ取り出し、この取り出したガ ラス基板をローラコンペャに載せ替えて、前記ガラス基板に印刷等の処理を施すプ ロセス装置に投入する構成の基板搬送装置が知られている(たとえば、特開 2002— 167039号公報参照)。  Conventionally, a cassette in which glass substrates used for a plasma display panel or the like are stacked and stored, and is loaded at a predetermined position of a loading station using a transfer node ( Insert the transfer node into the cassette) and take out the glass substrates present at any position of the force set one by one, and place the removed glass substrates on the roller conveyor to place them on the glass substrate. There has been known a substrate transport apparatus configured to be loaded into a process apparatus that performs processing such as printing (see, for example, JP-A-2002-167039).
[0003] ところで、前記従来の基板搬送装置では、移載ノヽンドを用いてカセットからガラス基 板を取り出す際、ガラス基板の間に移載ノヽンドを挿入し、この挿入後前記移載ハンド を前記ガラス基板 (カセット)に対して相対的に上昇させて搬送対象であるガラス基板 を僅かに持ち上げ、前記ガラス基板を支持して 、る前記カセットの支持部力も前記ガ ラス基板を離反せしめて前記移載ノ、ンドに前記基板を載置し、この載置後、前記移 載ノ、ンドを前記カセットの外に移動し、前記カセットからガラス基板を取り出して 、る。  By the way, in the conventional substrate transfer apparatus, when a glass substrate is taken out from a cassette using a transfer node, a transfer node is inserted between the glass substrates, and the transfer hand is inserted after the insertion. The glass substrate (cassette) is raised relative to the glass substrate to be transported slightly to support the glass substrate, and the supporting force of the cassette is also separated from the glass substrate. The substrate is placed on the transfer node, and after the placement, the transfer node is moved out of the cassette, and the glass substrate is taken out of the cassette.
[0004] したがって、前記移載ノヽンドをガラス基板の間に挿入すると共に搬送対象であるガ ラス基板を僅かに持ち上げるためのスペースが必要になり、カセット内に積層されて いる各ガラス基板の間の上下方向の間隔をある程度あけなければならず、カセット内 に積層する各ガラス基板の上下方向のピッチが大きくなる場合があり、ガラス基板の 収納枚数が減少し、カセットにおけるガラス基板の収納効率が低下するという問題が ある。  [0004] Therefore, a space for inserting the transfer node between the glass substrates and slightly lifting the glass substrate to be transported is required, and between the glass substrates stacked in the cassette is required. The vertical pitch of the glass substrates to be stacked in the cassette may increase, and the vertical pitch of the glass substrates stacked in the cassette may increase, reducing the number of glass substrates that can be stored and increasing the efficiency of storing the glass substrates in the cassette. There is a problem of decline.
[0005] なお、ガラス基板が大型化して移載ノ、ンドからオーバーハングする部分が大きくな ると、ガラス基板をカセットから搬出すべく僅かに持ち上げたときに前記ガラス基板の 橈み (前記移載ノヽンドからオーバーハングして 、ると共に前記カセットの支持部と接 触していた部位の橈み)が大きくなり、前記ガラス基板を前記カセットの前記支持部 力も離反させるため一層持ち上げる必要があるので、前記問題は一層顕著になる。 [0005] It should be noted that the size of the glass substrate is increased, and the portion overhanging from the transfer node is increased. Then, when the glass substrate is lifted slightly to carry it out of the cassette, the stagnation of the glass substrate (overhanging from the transfer node and at the same time the portion that was in contact with the support portion of the cassette). The problem becomes more prominent because the stagnation) becomes larger and the glass substrate needs to be lifted further to disengage the support force of the cassette.
[0006] 一方、前記従来の基板搬送装置では、ローラコンペャを用いてガラス基板をプロセ ス装置に搬入している力 プロセス装置側では移載ノヽンドによる移載を要求する場合 が多い。すなわち、たとえば、基板に処理を施すプロセス装置の部位は、外部とカバ 一で仕切られており、前記基板を搬入する場合、開閉自在になっている前記カバー の一部を開けておいて、前記基板を搬入する必要があるので、ローラコンペャでは、 プロセス装置へのガラス基板の搬入が困難な場合があるという欠点がある。  [0006] On the other hand, in the conventional substrate transfer apparatus, the force process apparatus side that uses a roller competitor to carry the glass substrate into the process apparatus often requires transfer using a transfer node. That is, for example, a part of a process apparatus for processing a substrate is partitioned from the outside by a cover, and when the substrate is loaded, a part of the cover that can be opened and closed is opened, Since it is necessary to carry in the substrate, the roller competitor has a drawback that it may be difficult to carry the glass substrate into the process apparatus.
[0007] 前記欠点を補うために、前記ローラコンペャと前記プロセス装置との間に、多関節 ロボット等を設置すると、基板搬送装置の構成が煩雑になると共に、基板搬送装置の 設置面積が広くなるという問題がある。  [0007] If a multi-joint robot or the like is installed between the roller competitor and the process device to compensate for the drawbacks, the configuration of the substrate transfer device becomes complicated, and the installation area of the substrate transfer device increases. There's a problem.
[0008] なお、前記問題は、ガラス以外の材質で構成された基板においても同様に発生す る問題である。  [0008] It should be noted that the above-mentioned problem also occurs in the same manner in a substrate made of a material other than glass.
[0009] 本発明は、前記問題点に鑑みてなされたものであり、基板を収納自在なカセットと 基板に処理を施すプロセス装置との間で基板を搬送する基板搬送装置において、 前記カセットにおける基板の収納効率を上げることができ、構成が簡素であると共に 、設置面積を小さくすることができる基板搬送装置を提供することを目的とする。 発明の開示  [0009] The present invention has been made in view of the above problems, and is a substrate transport apparatus that transports a substrate between a cassette that can store a substrate and a process device that performs processing on the substrate. It is an object of the present invention to provide a substrate transfer apparatus that can increase the storage efficiency of the apparatus, has a simple configuration, and can reduce the installation area. Disclosure of the invention
[0010] 本発明の第 1アスペクトに基づく発明は、基板を水平にして多段に収納できるカセ ットから前記基板を水平方向に移動して搬出可能な、または、前記基板を水平方向 に移動して前記カセットへ搬入可能なカセット側コンペャと、前記基板を水平方向に 移動して、前記基板に加工を施すプロセス装置へ供給可能な、または、前記基板を 水平方向に移動して前記プロセス装置から搬出可能なプロセス側移載ハンドと、前 記基板を前記カセット側コンペャと前記プロセス側移載ハンドとの間で受け渡すこと が可能な基板受け渡し手段とを有し、前記カセット側コンペャ、前記プロセス側移載 ハンドおよび前記基板受け渡し手段は、平行移動のみすることによって、前記基板を 移動するように構成されて ヽる基板搬送装置である。 [0010] The invention according to the first aspect of the present invention can be carried out by moving the substrate in a horizontal direction from a cassette that can be stored in multiple stages with the substrate horizontal, or by moving the substrate in the horizontal direction. The cassette-side compressor that can be loaded into the cassette and the substrate can be supplied to a process device that moves the substrate in the horizontal direction and processes the substrate, or the substrate moves from the process device in the horizontal direction. A process-side transfer hand that can be carried out, and substrate transfer means that can transfer the substrate between the cassette-side and the process-side transfer hand, and the cassette-side compressor and the process The side transfer hand and the substrate transfer means only move the substrate in parallel. A substrate transfer apparatus configured to move.
[0011] 第 1アスペクトに基づく発明によれば、カセット側コンペャを用いてカセットから基板 を搬出しもしくはカセットに基板を搬入するので、この搬出入の際に基板を上下方向 に移動する必要がなぐまた、移載ノ、ンドを基板の間に挿入する必要がなぐしたが つて、ワイヤカセット内に積層されて 、る各基板間の間隔(上下方向の間隔)を小さく することができ、前記カセットにおける基板の収納効率を上げることができる。  [0011] According to the invention based on the first aspect, since the substrate is carried out from the cassette using the cassette-side competitor or the substrate is carried into the cassette, it is not necessary to move the substrate up and down during this loading / unloading. In addition, since there is no need to insert the transfer node between the substrates, the interval between the substrates stacked in the wire cassette (the vertical interval) can be reduced. The substrate storage efficiency can be increased.
[0012] さらに、プロセス側移載ノヽンドを用いてプロセス装置に基板を搬入しもしくはプロセ ス装置力も基板を搬出するので、プロセス装置側の要求に答えることができ、前記プ ロセス装置に別途多関節ロボット等を設ける必要がないので、基板搬送装置の構成 を簡素化することができると共に、設置面積を小さくすることができる。  [0012] Further, since the substrate is loaded into the process apparatus using the process side transfer node or the substrate of the process apparatus is also unloaded, it is possible to meet the requirements of the process apparatus side, and the process apparatus has many additional processes. Since it is not necessary to provide a joint robot or the like, the configuration of the substrate transfer apparatus can be simplified and the installation area can be reduced.
[0013] また、カセット側コンペャ、プロセス側移載ハンドおよび前記基板受け渡し手段によ る基板の移動は、基板の姿勢を変える回転移動を伴わない平行移動のみでされるよ うになつているので、基板を回転 (旋回)するためのスペースが不要になり、基板搬送 装置の設置面積を小さくすることができる。  [0013] In addition, since the movement of the substrate by the cassette-side competitor, the process-side transfer hand, and the substrate delivery means is only a parallel movement that does not involve a rotational movement that changes the posture of the substrate, Space for rotating (turning) the substrate is not required, and the installation area of the substrate transfer device can be reduced.
[0014] 本発明の第 2アスペクトに基づく発明は、基板を水平にして多段に収納できるカセ ットから、前記基板の端面または端面近傍を保持し前記基板を水平方向に移動して 搬出可能な、または、前記基板の端面または端面近傍を保持し前記基板を水平方 向に移動して前記カセットへ搬入可能なカセット側移載ノヽンドと、前記基板を水平方 向に移動して前記基板に加工を施すプロセス装置へ供給可能な、または、前記基板 を水平方向に移動して前記プロセス装置から搬出可能なプロセス側移載ハンドと、 前記カセット側移載ハンドと前記プロセス側移載ハンドとの間で前記基板を受け渡す ことが可能な基板受け渡し手段とを有し、前記カセット側移載ノ、ンド、前記プロセス側 移載ハンドおよび前記基板受け渡し手段は、平行移動のみすることによって、前記 基板を移動するように構成されて ヽる基板搬送装置である。  [0014] The invention according to the second aspect of the present invention can carry out the substrate by moving the substrate in the horizontal direction while holding the end surface or the vicinity of the end surface of the substrate from a cassette that can store the substrate horizontally and in multiple stages. Alternatively, a cassette-side transfer node that holds the end face of the substrate or the vicinity of the end surface, moves the substrate in the horizontal direction and can be loaded into the cassette, and moves the substrate in the horizontal direction to the substrate. A process-side transfer hand that can be supplied to a process apparatus that performs processing, or that can move the substrate horizontally and carry it out of the process apparatus; and the cassette-side transfer hand and the process-side transfer hand. Substrate transfer means capable of transferring the substrate between them, and the cassette side transfer node, the process side transfer hand, and the substrate transfer means only perform parallel movement. It allows a Configured Ru substrate transport apparatus to move the substrate.
[0015] 第 2アスペクトに基づく発明によれば、カセット側移載ノヽンドを用いてカセットから基 板を搬出しもしくはカセットに基板を搬入するので、この搬出入の際に基板を上下方 向に移動する必要がなぐカセット側移載ノヽンドで基板の端部を保持して基板を搬出 入するので、この搬出入の際に基板を上下方向に移動する必要がなぐまた、カセッ ト側移載ノヽンドを基板の間に深く挿入する必要がない。したがって、ワイヤカセット内 に積層されている各基板間の間隔 (上下方向の間隔)を小さくすることができ、前記力 セットにおける基板の収納効率を上げることができる。 [0015] According to the invention based on the second aspect, since the substrate is carried out from the cassette or the substrate is carried into the cassette using the cassette-side transfer node, the substrate is moved upward and downward during the loading and unloading. Since the substrate side is held by the cassette side transfer node that does not need to be moved, the substrate is carried in and out, so that it is not necessary to move the substrate up and down during this loading and unloading. It is not necessary to insert the transfer side transfer node deeply between the substrates. Therefore, the distance between the substrates stacked in the wire cassette (interval in the vertical direction) can be reduced, and the efficiency of storing the substrates in the force set can be increased.
[0016] さらに、カセットから基板を搬出しまたはカセットへ基板を搬入する際、前記基板の 端部を保持して搬出入を行うので、前記基板に傷がついたり前記基板が汚染される おそれを一層回避することができる。また、プロセス側移載ノヽンドを用いてプロセス装 置に基板を搬入しもしくはプロセス装置カゝら基板を搬出するので、プロセス装置側の 要求に答えることができ、前記プロセス装置に別途多関節ロボット等を設ける必要が ないので、基板搬送装置の構成を簡素化することができると共に、設置面積を小さく することができる。  [0016] Further, when the substrate is unloaded from the cassette or loaded into the cassette, the loading and unloading is performed while holding the end portion of the substrate. Therefore, there is a possibility that the substrate may be damaged or the substrate may be contaminated. Further avoidance is possible. In addition, since the substrate is loaded into the process apparatus using the process side transfer node or the substrate is unloaded from the process apparatus, it is possible to meet the requirements of the process apparatus side. Therefore, it is possible to simplify the configuration of the substrate transport apparatus and reduce the installation area.
[0017] また、カセット側コンペャ、プロセス側移載ハンドおよび前記基板受け渡し手段によ る基板の移動は、基板の姿勢を変える回転移動を伴わない平行移動のみでされるよ うになつているので、基板を回転 (旋回)するためのスペースが不要になり、基板搬送 装置の設置面積を小さくすることができる。  [0017] In addition, the movement of the substrate by the cassette-side competitor, the process-side transfer hand and the substrate transfer means is only a parallel movement that does not involve a rotational movement that changes the posture of the substrate. Space for rotating (turning) the substrate is not required, and the installation area of the substrate transfer device can be reduced.
[0018] 本発明の第 3アスペクトに基づく発明は、第 2アスペクトに記載の基板搬送装置に おいて、前記カセット側移載ノヽンドは、前記基板の搬出入方向に長く延びたスライド ベースと、前記スライドベースに対して前記基板の搬出入方向に移動可能な移動部 材と、前記基板を保持することができると共に、前記移動部材に対して前記基板の搬 出入方向で移動可能な保持部材とを備え、前記スライドベースに対して前記保持部 材が移動位置決め自在に構成されて!、る基板搬送装置である。  [0018] The invention according to the third aspect of the present invention is the substrate transfer apparatus according to the second aspect, wherein the cassette-side transfer node includes a slide base that extends long in the loading / unloading direction of the substrate; A movable member movable in the loading / unloading direction of the substrate relative to the slide base; and a holding member capable of holding the substrate and movable in the loading / unloading direction of the substrate relative to the moving member; And the holding member is configured to be movable and positionable relative to the slide base.
[0019] 第 3アスペクトに基づく発明によれば、カセット側移載ノヽンドの保持部材力 ベース 部材に対して移動自在な移動部材に対して移動自在に設けられているので、前記 保持部材の移動ストローク (基板の搬送ストローク)を大きくしたことによる基板搬送装 置の設置面積の増大を極力回避することができる。  According to the invention based on the third aspect, the holding member force of the cassette-side transfer node is provided so as to be movable with respect to the moving member that is movable with respect to the base member. It is possible to avoid as much as possible the increase in the installation area of the substrate transfer device due to the increased stroke (substrate transfer stroke).
[0020] 本発明の第 4アスペクトに基づく発明は、第 1アスペクト〜第 3アスペクトのいずれか 1のアスペクトに記載の基板搬送装置において、前記カセット側コンペャまたは前記 カセット側移載ノ、ンドによる基板の搬出入方向と、前記プロセス側移載ハンドによる 基板の搬出入方向とは、互いに一致していると共に、前記カセット側コンペャもしくは 前記カセット側移載ノ、ンドで前記カセットから搬出された基板を、または、前記プロセ ス側移載ノヽンドでプロセス装置力も搬出された基板を、前記カセット側コンペャもしく は前記カセット側移載ノ、ンド、前記プロセス側移載ノ、ンドによる基板の搬出入方向に 対して交差する水平方向に移動位置決め自在な基板移動位置決め手段を有する基 板搬送装置である。 [0020] An invention based on the fourth aspect of the present invention is the substrate transport apparatus according to any one of the first aspect to the third aspect, wherein the cassette side comparer or the cassette side transfer node is a substrate by the end. The loading / unloading direction of the substrate and the loading / unloading direction of the substrate by the process-side transfer hand coincide with each other, and the cassette-side compressor or The substrate transferred from the cassette at the cassette side transfer node or the substrate transferred from the cassette at the process side transfer node, or the substrate transferred also from the process equipment by the process side transfer node. This is a substrate transfer device having substrate movement positioning means that can be moved and positioned in a horizontal direction intersecting with the loading / unloading direction of the substrate by the process side transfer node.
[0021] 第 4アスペクトに記載の発明によれば、前記カセット側コンペャまたは前記カセット 側移載ノヽンドによる基板の搬出入方向(X軸方向)と前記プロセス側移載ノヽンドによ る基板の搬出入方向(X軸方向)とが互いに一致して 、ると共に、基板を Y軸方向に 移動位置決め自在な基板移動位置決め手段を備えているので、基板搬送装置全体 の構成が一層簡素になって 、ると共に、カセットとプロセス装置とが Y軸方向にお ヽ てずれた位置に存在して 、ても、カセットとプロセス装置との間で基板を搬送すること ができる。  [0021] According to the invention described in the fourth aspect, the loading / unloading direction (X-axis direction) of the substrate by the cassette side conveyor or the cassette side transfer node and the substrate by the process side transfer node Since the loading / unloading direction (X-axis direction) coincides with each other, and the substrate movement positioning means that can move and position the substrate in the Y-axis direction is provided, the configuration of the entire substrate transfer device is further simplified. In addition, the substrate can be transferred between the cassette and the process apparatus even if the cassette and the process apparatus are located at positions shifted in the Y-axis direction.
[0022] また、基板搬送装置を間にして、 X軸方向の一端部側で Y軸方向に並べられた複 数のカセットと、 X軸方向の他端部側で Y軸方向に並べられた複数のプロセス装置と の間で、基板を搬送することができる。  [0022] In addition, a plurality of cassettes arranged in the Y-axis direction on one end side in the X-axis direction and a plurality of cassettes arranged in the Y-axis direction on the other end side in the X-axis direction with the substrate transport device in between. The substrate can be transferred between multiple process devices.
[0023] 本発明の第 5アスペクトに基づく発明は、第 1アスペクト〜第 4アスペクトのいずれか [0023] The invention based on the fifth aspect of the present invention is any one of the first aspect to the fourth aspect.
1のアスペクトに記載の基板搬送装置において、前記基板受け渡し手段は、前記力 セット側コンペャもしくは前記カセット側移載ノヽンドと前記プロセス側移載ノヽンドとに 対して相対的に上下方向に移動自在である受け渡し用コンペャを備えて 、ると共に2. The substrate transfer apparatus according to the aspect 1, wherein the substrate transfer means is movable in a vertical direction relatively relative to the force setting side or the cassette side transfer node and the process side transfer node. It is equipped with a delivery competition that is
、前記プロセス側移載ノ、ンドに設けられている各切り欠きまたは各貫通孔を、前記受 け渡し用コンペャにおける前記基板を載置する部位が通過することによって、前記力 セット側コンペャもしくは前記カセット側移載ノヽンドと前記プロセス側移載ノヽンドとの 間で前記基板を受け渡すことが可能なように構成されており、または、前記基板受け 渡し手段は、前記カセット側コンペャもしくは前記カセット側移載ハンドと前記プロセ ス側移載ノ、ンドとに対して相対的に上下方向に移動自在である受け渡し用エアーフ ロート手段または受け渡し用超音波フロート手段を備えていると共に、前記プロセス 側移載ノ、ンドに設けられている各切り欠きまたは各貫通孔を、前記受け渡し用エア 一フロート手段または前記受け渡し用超音波フロート手段における前記基板を載置 する部位が通過することによって、前記カセット側コンペャもしくは前記カセット側移 載ノヽンドと前記プロセス側移載ノヽンドとの間で前記基板を受け渡すことが可能なよう に構成されて!ヽる基板搬送装置である。 When the substrate mounting portion of the delivery competitor passes through each notch or each through hole provided in the process side transfer node, the force setting side compressor or the The substrate is transferred between the cassette-side transfer node and the process-side transfer node, or the substrate transfer means is the cassette-side compressor or the cassette A transfer air float means or a transfer ultrasonic float means that is movable in the vertical direction relative to the side transfer hand and the process side transfer node, and the process side transfer hand. Each notch or each through-hole provided in the mounting node is connected to the air flow means for the transfer or the ultrasonic wave for the transfer. Placing the substrate in over preparative means The substrate is configured to be able to pass the substrate between the cassette-side compressor or the cassette-side transfer node and the process-side transfer node by passing a portion to be transferred! It is a transport device.
[0024] 第 5アスペクトに記載の発明によれば、前記基板受け渡し手段が、上下方向に移動 自在である受け渡し用コンペャを備えていると共に、前記プロセス側移載ノヽンドに設 けられている各切り欠きまたは各貫通孔を、前記受け渡し用コンペャにおける基板を 載置する部位が通過することによって、前記カセット側コンペャと前記プロセス側移 載ノヽンドとの間で前記基板を受け渡すことが可能なように構成されているので、簡素 な構成でしかも上下方向に移動するだけで基板を受け渡すことができ、基板に傷が つくおそれを回避することができる。  [0024] According to the invention described in the fifth aspect, each of the substrate transfer means includes a transfer competitor that is movable in the vertical direction, and is provided in each process-side transfer node. The substrate can be delivered between the cassette-side competitor and the process-side loading node by passing the notch or each through hole through the portion of the delivery competitor where the substrate is placed. Thus, the substrate can be delivered with a simple configuration and only by moving in the vertical direction, and the possibility of scratching the substrate can be avoided.
[0025] また、第 5アスペクトに記載の発明によれば、前記受け渡し手段が、受け渡し用エア 一フロート手段や受け渡し用超音波フロート手段で構成されて ヽるので、簡素な構成 でしかも上下方向に移動するだけで基板を受け渡すことができると共に、基板を移送 する際、前記基板に傷がついたり前記基板が汚染されるおそれを一層回避すること ができる。  [0025] Further, according to the invention described in the fifth aspect, since the delivery means is composed of delivery air float means and delivery ultrasonic float means, the construction is simple and vertically. The substrate can be delivered only by moving, and the substrate can be further prevented from being damaged or contaminated when the substrate is transferred.
[0026] 本発明の第 6アスペクトに基づく発明は、第 1アスペクト〜第 5アスペクトのいずれか 1のアスペクトに記載の基板搬送装置にぉ 、て、前記プロセス側移載ノヽンドの基端部 側には、前記カセット側コンペャもしくは前記カセット側移載ノヽンドと前記プロセス側 移載ノヽンドとの間を水平方向に移動する前記基板の重量を支持するための中間コン べャ、または、前記カセット側コンペャもしくは前記カセット側移載ハンドと前記プロセ ス側移載ノヽンドとの間を水平方向に移動する基板の重量を支持するための中間エア 一フロート手段もしくは中間超音波フロート手段が設けられている基板搬送装置であ る。  [0026] An invention based on a sixth aspect of the present invention provides a substrate transfer apparatus according to any one of the first aspect to the fifth aspect, and a base end side of the process side transfer node. Include an intermediate converter for supporting the weight of the substrate moving in a horizontal direction between the cassette-side conveyor or the cassette-side transfer node and the process-side transfer node, or the cassette An intermediate air float means or an intermediate ultrasonic float means is provided for supporting the weight of the substrate moving horizontally between the side conveyor or the cassette side transfer hand and the process side transfer node. It is a substrate transfer device.
[0027] 第 6アスペクトに記載の発明によれば、中間コンペャが設けられているので、この中 間コンペャを用いて基板を支持しつつ、前記カセット側コンペャと前記受け渡し用コ ンべャとの間で前記基板を受け渡すことが可能になっており、確実に基板の受け渡 しをすることがでさる。  [0027] According to the invention described in the sixth aspect, since the intermediate compressor is provided, the cassette-side compressor and the transfer-use conveyor are supported while the substrate is supported using the intermediate competitor. It is possible to deliver the substrate between the two, and it is possible to reliably deliver the substrate.
[0028] また、第 6アスペクトに記載の発明によれば、中間エアーフロート手段または中間超 音波フロート手段が設けられて 、るので、同様にして確実に基板の受け渡しをするこ とができ、さらに、基板を移送する際、前記基板に傷がついたり前記基板が汚染され るおそれを一層回避することができる。 [0028] According to the invention described in the sixth aspect, the intermediate air float means or the intermediate super Since the sonic float means is provided, it is possible to reliably deliver the substrate in the same manner. Further, when the substrate is transferred, there is a further possibility that the substrate is damaged or the substrate is contaminated. It can be avoided.
[0029] 本発明の第 7アスペクトに基づく発明は、第 1アスペクト〜第 6アスペクトのいずれか [0029] The invention based on the seventh aspect of the present invention is any one of the first aspect to the sixth aspect.
1のアスペクトに記載の基板搬送装置にぉ 、て、前記プロセス側移載ノヽンドが上下方 向に並んで複数設けられて ヽる基板搬送装置である。 1. The substrate transfer apparatus according to aspect 1, wherein a plurality of the process side transfer nodes are provided side by side in an upward and downward direction.
[0030] 第 7アスペクトに記載の発明によれば、前記プロセス側移載ノヽンドが上下方向に並 んで複数設けられているので、プロセス装置からの基板の搬出、プロセス装置への基 板の搬入を短時間で行うことができる。 [0030] According to the seventh aspect of the invention, since a plurality of the process side transfer nodes are provided in parallel in the vertical direction, the substrate is unloaded from the process apparatus and the substrate is loaded into the process apparatus. Can be performed in a short time.
図面の簡単な説明  Brief Description of Drawings
[0031] [図 1]図 1は、本発明の第 1の実施形態に係る基板搬送装置の概略構成を示す平面 図である。  FIG. 1 is a plan view showing a schematic configuration of a substrate transfer apparatus according to a first embodiment of the present invention.
[図 2]図 2は、基板搬送装置の概略構成を示す側面図である。  FIG. 2 is a side view showing a schematic configuration of the substrate transfer apparatus.
[図 3]図 3は、基板搬送装置の動作を示す側面図である。  FIG. 3 is a side view showing the operation of the substrate transfer apparatus.
[図 4]図 4は、基板搬送装置の動作を示す側面図である。  FIG. 4 is a side view showing the operation of the substrate transfer apparatus.
[図 5]図 5は、基板搬送装置の動作を示す側面図である。  FIG. 5 is a side view showing the operation of the substrate transfer apparatus.
[図 6]図 6は、基板搬送装置の動作を示す側面図である。  FIG. 6 is a side view showing the operation of the substrate transfer apparatus.
[図 7]図 7は、基板搬送装置の動作を示す側面図である。  FIG. 7 is a side view showing the operation of the substrate transfer apparatus.
[図 8]図 8は、基板搬送ハンドを複数設けた状態を示す図である。  FIG. 8 is a view showing a state in which a plurality of substrate transport hands are provided.
[図 9]図 9は、基板搬送装置の変形例を示す平面図である。  FIG. 9 is a plan view showing a modified example of the substrate transfer apparatus.
[図 10]図 10は、本発明の第 2の実施形態に係る基板搬送装置の概略構成を示す斜 視図である。  FIG. 10 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
[図 11]図 11は、図 13における XI矢視を示す図である。  FIG. 11 is a diagram showing an XI arrow in FIG.
[図 12]図 12は、図 10における ΧΠ矢視を示す図である。  [FIG. 12] FIG. 12 is a view showing the arrow in FIG.
[図 13]図 13は、本発明の第 2の実施形態に係る基板搬送装置の概略構成を示す斜 視図である。  FIG. 13 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
[図 14]図 14は、本発明の第 2の実施形態に係る基板搬送装置の概略構成を示す斜 視図である。 [図 15]図 15は、本発明の第 2の実施形態に係る基板搬送装置の概略構成を示す斜 視図である。 FIG. 14 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention. FIG. 15 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
[図 16]図 16は、本発明の第 2の実施形態に係る基板搬送装置の概略構成を示す斜 視図である。  FIG. 16 is a perspective view showing a schematic configuration of a substrate transfer apparatus according to a second embodiment of the present invention.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0032] [第 1の実施形態]  [First Embodiment]
図 1は、本発明の第 1の実施形態に係る基板搬送装置 1の概略構成を示す平面図 であり、図 2は、基板搬送装置 1の概略構成を示す側面図である。  FIG. 1 is a plan view showing a schematic configuration of the substrate transfer apparatus 1 according to the first embodiment of the present invention, and FIG. 2 is a side view showing the schematic configuration of the substrate transfer apparatus 1.
[0033] なお、見やすいようにするために、図 2では、一方の側(図 1の下側)の側方部材 35 、移載ハンド支持部材 39、中間部材 41の表示を省略してある。また、本明細書では 、説明の便宜のために、水平方向の一方向を X軸方向とし、水平方向の他の一方向 であって前記 X軸方向に直角な方向を Y軸方向とし、鉛直方向を Z軸方向とする。  In FIG. 2, the side member 35 on one side (the lower side in FIG. 1), the transfer hand support member 39, and the intermediate member 41 are not shown in FIG. Further, in this specification, for convenience of explanation, one horizontal direction is defined as an X-axis direction, and another horizontal direction that is perpendicular to the X-axis direction is defined as a Y-axis direction. The direction is the Z-axis direction.
[0034] 基板搬送装置 1は、ガラス基板 (たとえば、プラズマディスプレイパネルや液晶ディ スプレイパネル等に使用される矩形で板状のガラス基板) Wを収納自在なカセット CS と、前記ガラス基板 (以下単に「基板」という場合がある。)Wに処理 (加工)を施すプロ セス装置(図 1、図 2においては図示せず)との間で前記基板 Wを搬送する装置であ り、カセット側コンペャ 3とプロセス側移載ノヽンド 5とを備えて 、る。  [0034] The substrate transfer apparatus 1 includes a cassette CS that can store a glass substrate (for example, a rectangular and plate-like glass substrate used for a plasma display panel, a liquid crystal display panel, etc.) W, and the glass substrate (hereinafter simply referred to as a glass substrate) Sometimes referred to as “substrate”.) A device that transports the substrate W to and from a process device (not shown in FIGS. 1 and 2) for processing (processing) W. 3 and process transfer node 5 are provided.
[0035] 前記カセット CSは、水平になっている基板 W同士を互いに僅かに離して上下方向 に積層することで、前記基板 Wを多段に収納できるようになって ヽる。  The cassette CS can store the substrates W in multiple stages by stacking the substrates W in the vertical direction slightly apart from each other.
[0036] 前記カセット側コンペャ 3は、カセット CS内に収納されている基板 Wを、最下方に 存在して!/、るもの力 順に水平方向に (X軸方向にのみ)直線的に移動して、 1枚ず つ搬出することができるようになつている。また、前記カセット側コンペャ 3は、前記基 板 Wを水平方向に (X軸方向にのみ)直線的に移動して、前記基板 Wを 1枚ずつ前 記カセット CSへ搬入することができるようになつている。なお、前記カセット CS内では 、先に搬入されたものから順に前記基板 Wが上から下へ並ぶことになる。  [0036] The cassette-side compressor 3 moves linearly in the horizontal direction (only in the X-axis direction) with the substrate W stored in the cassette CS in the lowermost position! And can be taken out one by one. Further, the cassette-side compressor 3 moves the substrate W linearly (only in the X-axis direction) in a straight line so that the substrates W can be loaded one by one into the cassette CS. It is summer. In the cassette CS, the substrates W are arranged from top to bottom in order from the first loaded.
[0037] 前記プロセス側移載ハンド 5は、前記基板 Wを 1枚ずつ水平方向に (X軸方向にの み)直線的に移動して前記プロセス装置へ供給できると共に、前記基板 Wを 1枚ずつ 水平方向に (X軸方向にのみ)直線的に移動して前記プロセス装置から搬出すること ができるようになつている。なお、すでに理解されるように、前記カセット側コンペャ 3 による基板 Wの搬送方向と前記プロセス側移載ノヽンド 5による基板 Wの搬送方向とは 互いに一致している。 [0037] The process-side transfer hand 5 can move the substrate W one by one in the horizontal direction (only in the X-axis direction) linearly and supply it to the process apparatus. Move horizontally (only in the X-axis direction) and move it out of the process equipment Has become possible. As already understood, the transport direction of the substrate W by the cassette-side conveyor 3 and the transport direction of the substrate W by the process-side transfer node 5 coincide with each other.
[0038] また、前記基板搬送装置 1には、前記カセット側コンペャ 3と前記プロセス側移載ハ ンド 5との間で前記基板 Wを Z軸方向にのみ移動することにより前記基板 Wを受け渡 すことが可能な基板受け渡し手段 7が設けられている。  [0038] Further, the substrate W is transferred to the substrate transfer device 1 by moving the substrate W only in the Z-axis direction between the cassette side conveyor 3 and the process side transfer hand 5. A substrate transfer means 7 is provided.
[0039] 前記カセット側コンペャ 3、前記プロセス側移載ハンド 5、前記基板受け渡し手段 7 は、前記基板 Wを平行移動のみすることによって、換言すれば、前記基板 Wの姿勢 を変えることなぐ前記基板 Wを平行にのみ移動することによって、前記基板 Wを移 動するように構成されている。  [0039] The cassette-side competitor 3, the process-side transfer hand 5, and the substrate transfer means 7 only translate the substrate W, in other words, the substrate without changing the posture of the substrate W. By moving W only in parallel, the substrate W is moved.
[0040] 前記カセット側コンペャ 3は、詳細は後述する力 前記基板 Wを搬出しまたは搬入 する際、前記基板 Wを (前記カセット CSや基板受け渡し手段 7の邪魔にならない位 置で、上下方向から挟み込んで移動するように構成されている。  [0040] The cassette-side compressor 3 has a force described later in detail. When the substrate W is unloaded or loaded, the cassette W is moved from the vertical direction at a position that does not interfere with the cassette CS and the substrate transfer means 7. It is comprised so that it may pinch and move.
[0041] 前記基板受け渡し手段 7は、前記カセット側コンペャ 3と前記プロセス側移載ハンド 5とに対して相対的に上下方向に移動自在である受け渡し用コンペャ 9を備えて 、る と共に、前記プロセス側移載ハンド 5に設けられている各切り欠き 11を、前記受け渡 し用コンペャ 9における基板を載置する部位 13が通過することによって、前記カセッ ト側コンペャ 3と前記プロセス側移載ノヽンド 5との間で前記基板 Wを Z軸方向にのみ 直線的に移動して受け渡すことが可能なように構成されている。なお、前記切り欠き 1 1の代わりに、貫通孔が設けられていてもよい。  [0041] The substrate transfer means 7 includes a transfer comparator 9 that is movable in the vertical direction relative to the cassette-side competitor 3 and the process-side transfer hand 5, and the process. When the portion 13 on which the substrate is placed in the transfer competitor 9 passes through the notches 11 provided in the side transfer hand 5, the cassette side compressor 3 and the process side transfer node The substrate W is configured to be able to move in a linear manner only in the Z-axis direction between the substrate 5 and the substrate 5. A through hole may be provided instead of the notch 11.
[0042] 前記プロセス側移載ハンド 5の基端部側 (カセット CS側;プロセス装置とは反対側) には、前記カセット側コンペャ 3と前記プロセス側移載ハンド 5との間を水平方向に移 動する前記基板 Wの重量を、前記基板 Wの下側力 支持するための中間コンペャ 1 9が設けられている。  [0042] On the base end side of the process side transfer hand 5 (cassette CS side; the side opposite to the process apparatus), the space between the cassette side conveyor 3 and the process side transfer hand 5 is set horizontally. An intermediate compressor 19 is provided for supporting the weight of the moving substrate W and the lower force of the substrate W.
[0043] また、前記基板受け渡し手段 7は、前記カセット側コンペャ 3と前記受け渡し用コン べャ 9との間で前記プロセス側移載ノヽンド 5 (より詳しくは、後述する移載ハンド支持 部材 39)に設けられて 、ると共に前記基板 Wを載置する部位 15が前記プロセス側移 載ノヽンド 5の基板載置部位 17 (パスライン;前記プロセス側移載ハンド 5で前記基板 wを搬送するときの前記基板 wの下面)よりも高いところに設けられている中間コンペ ャ 19を用いて、前記カセット側コンペャ 3と前記受け渡し用コンペャ 9との間で前記 基板 Wを受け渡すことが可能なように構成されて 、る。 [0043] The substrate transfer means 7 is provided between the cassette-side conveyor 3 and the transfer-use conveyor 9 in the process-side transfer node 5 (more specifically, a transfer hand support member 39 to be described later). And a portion 15 on which the substrate W is placed is a substrate placement portion 17 of the process side transfer node 5 (pass line; the substrate on the process side transfer hand 5). The substrate W is transferred between the cassette side compressor 3 and the transfer competitor 9 by using an intermediate compressor 19 provided higher than the lower surface of the substrate w when transporting w. It is configured to be possible.
[0044] すなわち、前記受け渡し用コンペャ 9の基板載置部位 (前記受け渡し用コンペャ 9 で前記基板 Wを載置しているときの前記基板 Wの下面;前記受け渡し用コンペャ 9の ノ スライン) 13が、少なくとも、前記カセット側コンペャ 3のパスライン (前記カセット側 コンペャ 3で前記基板 Wを載置しているときの前記基板 Wの下面) 21と同じ高さの位 置と、前記プロセス側移載ノヽンド 5のパスライン 17よりも下側の位置との間で、上下方 向に移動できるようになって 、る。  [0044] That is, the substrate placement portion of the delivery competitor 9 (the lower surface of the substrate W when the substrate W is placed on the delivery competitor 9; the nose line of the delivery competitor 9) 13 At least the pass line of the cassette side competitor 3 (the lower surface of the substrate W when the substrate W is placed on the cassette side competitor 3) 21 and the process side transfer It is possible to move up and down between the position below the pass line 17 of the node 5.
[0045] たとえば、ローラコンペャで構成されている前記受け渡し用コンペャ 9の各ローラ 23 力 前記切り欠き 11を通って前記範囲を上下方向に移動できるようになって!/、る。  [0045] For example, each roller 23 force of the delivery competitor 9 constituted by a roller competitor can move up and down the range through the notch 11! /.
[0046] そして、前記カセット側コンペャ 3が基板 Wを載置しており前記プロセス側移載ハン ド 5のパスライン 17が前記カセット側コンペャ 3のパスライン 21よりも低い位置に存在 し、かつ、前記中間コンペャ 19のワーク載置部位 (前記中間コンペャ 19で前記基板 Wを載置しているときの前記基板 Wの下面;前記中間コンペャ 19のパスライン) 15が 前記カセット側コンペャ 3のパスライン 21と同じ高さになっているときに、前記受け渡 し用コンペャ 9の基板載置部位 13を前記カセット側コンペャ 3のパスライン 21と同じ 高さになるようにしておいて、前記中間コンペャ 19で中 «して前記カセット側コンペ ャ 3から前記受け渡し用コンペャ 9へ基板 Wを移送し、この移送後、前記受け渡し用 コンペャ 9のパスライン 13を前記プロセス側移載ハンド 5のパスライン 17よりも低い位 置まで下げることによって、前記カセット側コンペャ 3から前記プロセス側移載ノヽンド 5 へ前記基板 Wを受け渡すことができるようになって 、る。  [0046] The cassette-side competitor 3 has the substrate W placed thereon, the pass line 17 of the process-side transfer hand 5 is present at a position lower than the pass line 21 of the cassette-side competitor 3, and The workpiece placement part of the intermediate competitor 19 (the lower surface of the substrate W when the substrate W is placed on the intermediate competitor 19; the pass line of the intermediate competitor 19) 15 is a path of the cassette-side competitor 3 When the height is the same as the line 21, the substrate mounting portion 13 of the transfer competitor 9 is set to the same height as the pass line 21 of the cassette-side competitor 3, and the intermediate Then, the substrate W is transferred from the cassette side conveyor 3 to the delivery competitor 9, and after this transfer, the pass line 13 of the delivery competitor 9 is moved to the pass of the process side transfer hand 5. By reducing to a lower position than the line 17, the consist cassette side Konpeya 3 to be able to pass the substrate W to the process side transfer Nono command 5, Ru.
[0047] 一方、前記プロセス側移載ノヽンド 5が基板 Wを載置しており前記プロセス側移載ノヽ ンド 5のパスライン 17が前記カセット側コンペャ 3のパスライン 21よりも低い位置に存 在し、かつ、前記中間コンペャ 19のパスライン 15が前記カセット側コンペャ 3のパス ライン 21と同じ高さになっているときに、前記プロセス側移載ノヽンド 5のパスライン 17 よりも低い位置に存在している前記受け渡し用コンペャ 9を、前記カセット側コンペャ 3のパスライン 21と同じ高さになるまで上昇させ、前記プロセス側移載ノヽンド 5が載置 していた基板 Wを前記受け渡し用コンペャ 9で載置し、この受け渡し用コンペャ 9が 載置した基板 Wを、前記中間コンペャ 19で中継し前記カセット側コンべャ 3へ移送 することによって、前記プロセス側移載ノヽンド 5から前記カセット側コンペャ 3へ前記 基板 Wを受け渡すことができるようになって 、る。 On the other hand, the process side transfer node 5 has the substrate W placed thereon, and the pass line 17 of the process side transfer node 5 is located at a position lower than the pass line 21 of the cassette side conveyor 3. And when the pass line 15 of the intermediate competitor 19 is at the same height as the pass line 21 of the cassette side compressor 3, the position is lower than the pass line 17 of the process side transfer node 5 The transfer conveyor 9 existing in the cassette side is raised until it reaches the same height as the pass line 21 of the cassette side competitor 3, and the process side transfer node 5 is placed thereon. The substrate W that has been placed is placed on the delivery conveyor 9, and the substrate W on which the delivery competitor 9 is placed is relayed by the intermediate competitor 19 and transferred to the cassette-side conveyor 3. The substrate W can be transferred from the process side transfer node 5 to the cassette side competitor 3.
[0048] ここで、前記基板搬送装置 1についてより詳しく説明する。 Here, the substrate transfer apparatus 1 will be described in more detail.
[0049] 前記カセット CSは、概観が直方体状に構成されており、 Y軸方向の両端部に側部 材 CS1を備えている。前記各側部材 CS1の間には、複数の基板 Wを前記カセット C S内で載置し収納するため線状の部材 (たとえばワイヤ;図示せず)が張設されている  [0049] The cassette CS is configured in a rectangular parallelepiped shape, and includes side members CS1 at both ends in the Y-axis direction. Between each side member CS1, a linear member (for example, a wire; not shown) is stretched to place and store a plurality of substrates W in the cassette CS.
[0050] Z軸方向において同じ位置で(同じ高さで) X軸方向で所定の間隔をあけて Y軸方 向に延伸して前記ワイヤが複数設けられて 、ることによって、 1枚の基板 Wを支持 (載 置)することができる 1つのワイヤ群を形成している。 [0050] A plurality of the wires are provided at the same position (at the same height) in the Z-axis direction, extending in the Y-axis direction with a predetermined interval in the X-axis direction, thereby providing one substrate One wire group that can support (place) W is formed.
[0051] 前記ワイヤ群力 ¾軸方向で所定の小さい間隔をあけて複数設けられていることによ つて、前記カセット CSは、基板 Wを水平にして多段に収納することができる。このよう に構成されたカセット CSをワイヤカセットという場合がある。 [0051] By providing a plurality of the wire group forces at predetermined small intervals in the ¾ axis direction, the cassette CS can be stored in multiple stages with the substrates W horizontal. The cassette CS thus configured may be referred to as a wire cassette.
[0052] また、前記カセット CSの X軸方向の一側面 (前記プロセス側移載ハンド 5が設けら れている側の面)には、前記基板 Wが出入り自在なような開口部が設けられている。 [0052] Further, an opening is provided on one side surface of the cassette CS in the X-axis direction (the surface on the side where the process side transfer hand 5 is provided) so that the substrate W can freely enter and exit. ing.
[0053] なお、前記ワイヤカセット CSに代えて通常のカセット (Y軸方向の両端部に設けら れた支持部材で前記基板 Wを支持する構成のカセット)を採用してもよい。 [0053] Instead of the wire cassette CS, a normal cassette (a cassette configured to support the substrate W with support members provided at both ends in the Y-axis direction) may be employed.
[0054] 前記ワイヤカセット CSは、図示しないスタツカクレーンや天井クレーンを用いて図示 しな 、カセット載置装置に載置され、 Z軸方向で移動位置決めされるようになって 、る [0054] The wire cassette CS is placed on a cassette placing device (not shown) using a stagger crane or overhead crane (not shown), and is moved and positioned in the Z-axis direction.
[0055] 前記カセット側コンペャ 3は、たとえばローラコンペャで構成されており、床面上に 設けられたベース部材 24に立設された複数のローラ支持部材 25の上端部に回転自 在に設けられた複数のローラ 27を備えている。 [0055] The cassette-side compressor 3 is constituted by, for example, a roller competitor, and is provided at the upper end of a plurality of roller support members 25 provided on a base member 24 provided on the floor so as to rotate freely. A plurality of rollers 27 are provided.
[0056] 前記各ローラ支持部材 25は、 X軸方向で所定の間隔をあけて立設されている。そ して、前記ワイヤカセット CSを前記カセット載置装置に載置し、前記ワイヤカセット CS を上下に移動すると、基板 Wが収納されていない状態では、前記ワイヤカセット CSの 各ワイヤの間に前記各ローラ 27と前記各ローラ支持部材 25とが入り込めるようになつ ている。すなわち、前記各ローラ 27と前記各ローラ支持部材 25とが、前記ワイヤカセ ット CSや前記カセット移載装置と干渉することなぐ前記ワイヤカセット CS内に入り込 むようになっている。 Each roller support member 25 is erected with a predetermined interval in the X-axis direction. Then, when the wire cassette CS is placed on the cassette placing device and the wire cassette CS is moved up and down, the substrate of the wire cassette CS is stored in a state where the substrate W is not stored. The rollers 27 and the roller support members 25 can be inserted between the wires. In other words, the rollers 27 and the roller support members 25 enter the wire cassette CS without interfering with the wire cassette CS or the cassette transfer device.
[0057] 前記カセット側コンペャ 3の各ローラ 27は、 Y軸方向に延びた中心軸を回転中心に して、ベルトやチェーン等の動力伝達部材を介してモータ等のァクチユエータで回転 し基板 Wを搬送するようになって 、る。前記各ローラ 27の上端部が前記カセット側コ ンべャ 3のパスライン 21を形成していることになる。  [0057] Each roller 27 of the cassette side compressor 3 is rotated by an actuator such as a motor via a power transmission member such as a belt or a chain with a central axis extending in the Y-axis direction as a rotation center, and the substrate W is rotated. It comes to carry. The upper end portion of each roller 27 forms the pass line 21 of the cassette side conveyor 3.
[0058] なお、前記各ローラ 27のうちで最も一側部側(中間コンペャ 19側)に位置している ローラ 27Aは、前記カセット CS内には、入り込まない位置に設けられている。また、 前ローラ記 27Aの上方には、ローラ 26が設けられている。このローラ 26は、図示しな V、モータ等のァクチユエータで回転可能になって 、ると共に、図示しな 、流体圧シリ ンダ等のァクチユエータにより、ローラ 27Aに対して接近'離反する方向(Z軸方向) に移動自在になっている。  It should be noted that the roller 27A, which is located on the most side (on the intermediate compressor 19 side) among the rollers 27, is provided at a position where it does not enter the cassette CS. A roller 26 is provided above the front roller 27A. The roller 26 can be rotated by an actuator such as a V, a motor (not shown), and is also moved toward and away from the roller 27A (Z axis) by an actuator such as a fluid pressure cylinder (not shown). Direction).
[0059] そして、前記基板 Wを搬出しまたは搬入する際、前記基板 Wを、ローラ 27Aとロー ラ 26とで上下方向力も挟み込んで移動することできるようになつている。なお、ローラ 26を回転駆動するためのァクチユエータを削除し、ローラ 26が自由に回転するように 構成してちょい。  [0059] When the substrate W is unloaded or loaded, the substrate W can be moved with the vertical force sandwiched between the roller 27A and the roller 26. Remove the actuator for rotating the roller 26, and configure the roller 26 to rotate freely.
[0060] 前記カセット側コンペャ 3の X軸方向の一側部には、プロセス側移載ノヽンド 5が設け られている。このプロセス側移載ノヽンド 5は、概観が長方形状で薄い板状に形成され ていると共に、厚さ方向が Z軸方向になるように設けられている。また、前記プロセス 側移載ハンド 5の X軸方向の先端部 (カセット側コンペャ 3が設けられて 、る側とは反 対側の端部)から X軸方向の基端部側にかけては、 Y軸方向で所定の間隔をあけて 複数の矩形状の切り欠き 11が形成されて 、る。このように切り欠き 11が形成されて ヽ ることにより、前記プロセス側移載ノヽンド 5は櫛歯状に形成されているとも言える。  [0060] A process-side transfer node 5 is provided on one side of the cassette-side compressor 3 in the X-axis direction. This process-side transfer node 5 is formed in a thin plate shape with a rectangular appearance, and the thickness direction is provided in the Z-axis direction. Further, from the tip end portion of the process side transfer hand 5 in the X-axis direction (the end portion opposite to the side where the cassette-side compressor 3 is provided) to the base end side in the X-axis direction, Y A plurality of rectangular cutouts 11 are formed at predetermined intervals in the axial direction. By forming the notches 11 in this way, it can be said that the process-side transfer node 5 is formed in a comb-teeth shape.
[0061] また、基板搬送装置 1には、前記カセット側コンペャ 3で前記カセット CSから搬出さ れた基板 Wを、または、前記プロセス側移載ノヽンド 5でプロセス装置力も搬出された 基板 Wを、前記カセット側コンペャ 3、前記プロセス側移載ノヽンド 5による基板の搬出 入方向(X軸方向)に対して交差する水平方向(たとえば直交する Y軸方向)に移動 位置決め自在な基板移動位置決め手段 30が設けられて 、る。 In addition, the substrate transport apparatus 1 receives the substrate W unloaded from the cassette CS by the cassette-side comparer 3 or the substrate W unloaded by the process-side transfer node 5 by the process apparatus force. Substrate unloading by the cassette-side compressor 3 and the process-side transfer node 5 Substrate movement positioning means 30 that can move and position in a horizontal direction (for example, the orthogonal Y-axis direction) intersecting the input direction (X-axis direction) is provided.
[0062] より詳しく説明すると、前記ベース部材 24の隣 (X軸方向の一側部側)の床面には ベース部材 29が設けられており、このベース部材 29に設けられたガイドレール 31を 介して、基台 33が Y軸方向に移動自在になっている。前記基台 33は、図示しないボ 一ルネジ等の動力伝達手段を介して図示しないモータ等のァクチユエータで γ軸方 向に位置決め自在になっている。 More specifically, a base member 29 is provided on the floor surface adjacent to the base member 24 (on one side in the X-axis direction), and the guide rail 31 provided on the base member 29 is provided with a base rail 29. Thus, the base 33 is movable in the Y-axis direction. The base 33 is freely positionable in the γ-axis direction by an actuator such as a motor (not shown) through a power transmission means such as a ball screw (not shown).
[0063] 前記基台 33上の Y軸方向の両端部には、各側方部材 35がー体的に立設されてい る。前記各側方部材 35の内側には、前記各側方部材 35に一体的に設けられたガイ ドレール 37を介して、移載ノヽンド支持部材 39が Z軸方向に移動自在に設けられてい る。前記移載ノ、ンド支持部材 39は、図示しないボールネジ等の動力伝達手段を介し て図示しな 、モータ等のァクチユエータで Z軸方向に位置決め自在になって!/、る。  [0063] Each side member 35 is erected on both ends of the base 33 in the Y-axis direction. Inside each side member 35, a transfer node support member 39 is provided so as to be movable in the Z-axis direction via a guide rail 37 provided integrally with each side member 35. . The transfer node support member 39 can be positioned in the Z-axis direction by an actuator such as a motor (not shown) via a power transmission means such as a ball screw (not shown).
[0064] 前記移載ノ、ンド支持部材 39の内側には、中間部材 41が X軸方向に移動自在に設 けられている。さらに、前記中間部材 41の内側には、前記プロセス側移載ハンド 5が X軸方向に移動自在に設けられている。さらに、前記プロセス側移載ハンド 5は、図 示しな 、ボールネジ等の動力伝達手段を介して図示しな 、モータ等のァクチユエ一 タで X軸方向(前記カセット側コンペャ 3とは反対側の方向)へ、前記移載ハンド支持 部材 39から、図 1や図 2に二点鎖線で示す位置まで突出するようにして移動位置決 め自在になっている。  [0064] An intermediate member 41 is provided on the inner side of the transfer support member 39 so as to be movable in the X-axis direction. Further, the process-side transfer hand 5 is provided inside the intermediate member 41 so as to be movable in the X-axis direction. Further, the process-side transfer hand 5 is not shown via a power transmission means such as a ball screw, but is not shown in the figure, with an actuator such as a motor in the X-axis direction (the direction opposite to the cassette-side compressor 3). The movement position can be freely determined by projecting from the transfer hand support member 39 to the position indicated by the two-dot chain line in FIGS.
[0065] また、前記カセット側コンペャ 3の X軸方向の一側部側には、受け渡し用コンペャ 9 が設けられている。この受け渡し用コンペャ 9は、前述したようにたとえばローラコンペ ャで構成されており、このローラコンペャのパスライン 13は、 Z軸方向で移動位置決 め自在になっている。  Further, a delivery competitor 9 is provided on one side of the cassette-side competitor 3 in the X-axis direction. As described above, the delivery competitor 9 is constituted by, for example, a roller competitor, and the pass line 13 of the roller competitor can freely move in the Z-axis direction.
[0066] さらに詳しく説明すると、前記移載ハンド支持部材 39、前記中間部材 41、前記プロ セス側移載ハンド 5の下側には、前記各側方部材 35に一体的に設けられたガイドレ ール 37を介して、受け渡し用コンペャベース部材 43が Z軸方向に移動自在に設けら れている。前記受け渡し用コンペャベース部材 43は、図示しないボールネジ等の動 力伝達手段を介して図示しな 、モータ等のァクチユエータ(前記移載ハンド支持部 材 39を駆動するァクチユエ一タとは異なるァクチユエータ)で Z軸方向に位置決め自 在になっている。 More specifically, guide rails provided integrally with the respective side members 35 are provided below the transfer hand support member 39, the intermediate member 41, and the process side transfer hand 5. A transfer competitor base member 43 is provided via a rod 37 so as to be movable in the Z-axis direction. The delivery competitor base member 43 is not shown through a force transmission means such as a ball screw (not shown), and is an actuator such as a motor (the transfer hand support portion). The actuator that is different from the actuator that drives the material 39) is self-positioning in the Z-axis direction.
[0067] 前記受け渡し用コンペャベース部材 43の上には、 Y軸方向で所定の間隔をあけて 複数のローラ支持部材 45が設けられており、このローラ支持部材 45の上端部には、 複数のローラ 23が回転自在に設けられて 、る。  A plurality of roller support members 45 are provided on the delivery competitor base member 43 at predetermined intervals in the Y-axis direction, and a plurality of rollers are provided at the upper end of the roller support member 45. 23 is rotatably provided.
[0068] そして、前記移載ノ、ンド支持部材 39に対して、前記受け渡し用コンペャベース部 材 43を相対的に上下方向に移動すると、前記ローラ支持部材 45や前記受け渡し用 コンペャ 9のローラ 23が、前記プロセス側移載ハンド 5の切り欠き 11を通過して移動 するようになっている。  [0068] When the transfer-compartment base member 43 is moved in the vertical direction relative to the transfer support member 39, the roller support member 45 and the roller 23 of the transfer-comparator 9 are moved. The process side transfer hand 5 moves through the notch 11 of the process side transfer hand 5.
[0069] すなわち、前記受け渡し用コンペャ 9のパスライン 13が、少なくとも、前記プロセス 側移載ノヽンド 5から下方に離反した所定の位置と前記カセット側コンペャ 3のパスライ ン 21との間で移動するようになっている。  That is, the pass line 13 of the delivery competitor 9 moves at least between a predetermined position separated downward from the process side transfer node 5 and the pass line 21 of the cassette side competitor 3. It is like that.
[0070] なお、前記受け渡し用コンペャ 9の各ローラ 23は、 Y軸方向に延びた中心軸を回 転中心にして、ベルトやチェーン等の動力伝達部材を介してモータ等のァクチユエ ータで回転し基板 Wを搬送するようになって 、る。 [0070] Each roller 23 of the delivery competitor 9 is rotated by an actuator such as a motor via a power transmission member such as a belt or a chain with the central axis extending in the Y-axis direction as the rotation center. Then, the substrate W is transported.
[0071] 前記プロセス側移載ハンド 5の他端部側(基端部側;前記カセット側コンペャ 3と前 記各切り欠き 11との間)には、前述した中間コンペャ (たとえばローラコンペャ) 19が 設けられている。 [0071] On the other end side of the process side transfer hand 5 (base end side; between the cassette side conveyor 3 and the notches 11), the above-described intermediate compressor (for example, roller compressor) 19 is provided. Is provided.
[0072] 前記中間コンペャ 19の各ローラ 47は、厚さ方向が上下方向になるように設置され た矩形な板状のローラ支持部材 48に対して回転自在になっており、前記ローラ支持 部材 48は、前記移載ノヽンド支持部材 39に一体的に設けられている。したがって、前 記中間コンペャ 19の各ローラ 47は、前記移載ノ、ンド支持部材 39に対して回転自在 になっている。  Each roller 47 of the intermediate compressor 19 is rotatable with respect to a rectangular plate-like roller support member 48 installed so that the thickness direction is in the vertical direction, and the roller support member 48 Is provided integrally with the transfer node support member 39. Accordingly, the rollers 47 of the intermediate compressor 19 are rotatable with respect to the transfer support and the support member 39.
[0073] 前記中間コンペャ 19の各ローラ 47は、 Y軸方向に延びた中心軸を回転中心にし て、ベルトやチェーン等の動力伝達部材を介してモータ等のァクチユエータで回転し 基板 Wを搬送するようになっている。なお、前記中間コンペャ 19の各ローラ 47を回 転駆動するための装置 (前記ベルトゃァクチユエータ等)が削除されていてもよい。  [0073] Each roller 47 of the intermediate compressor 19 is rotated by an actuator such as a motor via a power transmission member such as a belt or a chain with the central axis extending in the Y-axis direction as a rotation center, and conveys the substrate W. It is like that. It should be noted that a device for rotating the rollers 47 of the intermediate compressor 19 (such as the belt actuator) may be omitted.
[0074] 前記プロセス側移載ノ、ンド 5は、前記ローラ支持部材 48の下側で前記ローラ支持 部材 48から離れて設けられている。また、前記プロセス側移載ノヽンド 5の切り欠き 11 が形成されて 、な ヽ部位が、前記プロセス側移載ノヽンド 5がプロセス装置側に延伸し て 、な 、状態(図 2に示す状態)では、前記ローラ支持部材 48の下側に位置して 、 る。 The process side transfer node 5 is supported by the roller below the roller support member 48. It is provided away from member 48. Further, a notch 11 of the process side transfer node 5 is formed, and the state (the state shown in FIG. 2) is such that the process side transfer node 5 extends to the process apparatus side. ) Is located below the roller support member 48.
[0075] 上述したように中間コンペャ 19が設けられていることにより、カセット側コンペャ 3と プロセス側移載ノ、ンド 5 (受け渡し用コンペャ 9)との間で移動する Wの重量を支持す ることができるようになって!/、る。  [0075] As described above, the intermediate compressor 19 is provided to support the weight of the W that moves between the cassette-side competitor 3 and the process-side transfer node 5 (the delivery competitor 9). Now that I can do it!
[0076] 次に、基板搬送装置 1の動作について説明する。  [0076] Next, the operation of the substrate transfer apparatus 1 will be described.
[0077] 図 3〜図 7は、基板搬送装置 1の動作を示す側面図である。なお、図 6は図 7に示 す状態下における平面図である。  3 to 7 are side views showing the operation of the substrate transport apparatus 1. FIG. FIG. 6 is a plan view under the state shown in FIG.
[0078] 基板 Wをカセット CSからプロセス装置 (処理装置)に搬送する場合にっ 、て説明す る。 A case where the substrate W is transferred from the cassette CS to the process apparatus (processing apparatus) will be described.
[0079] まず、図 2に示すように、基板 Wを収納しているカセット CSがカセット側コンペャ 3の 上方に位置し、カセット側コンペャ 3のパスライン 21と中間コンペャ 19のパスライン 1 5とが同じ高さに位置し、受け渡し用コンペャ 9のパスライン 13が、プロセス側移載ノヽ ンド 5のパスライン 17よりも下方に位置しているものとする。  First, as shown in FIG. 2, the cassette CS containing the substrate W is positioned above the cassette-side competitor 3, and the pass line 21 of the cassette-side competitor 3 and the pass line 15 of the intermediate competitor 19 are Are located at the same height, and the pass line 13 of the delivery competitor 9 is located below the pass line 17 of the process-side transfer node 5.
[0080] この状態で、前記カセット CSが載置している基板 Wのうちの最も下側に存在してい る基板 Wが、前記カセット側コンペャ 3のローラ 27に接触するまで、前記カセット CS が下方向に移動すると共に、前記中間コンペャ 19のノ スライン 15と前記受け渡し用 コンペャ 9のパスライン 13とが互いに一致するまで、前記受け渡し用コンペャベース 部材 43が上昇する(図 3参照)。  [0080] In this state, the cassette CS is placed until the lowermost substrate W of the substrates W on which the cassette CS is placed contacts the roller 27 of the cassette-side compressor 3. While moving downward, the delivery competitor base member 43 ascends until the nose line 15 of the intermediate competitor 19 and the pass line 13 of the delivery competitor 9 coincide with each other (see FIG. 3).
[0081] 続いて、前記最下方に存在している基板 Wが、前記受け渡し用コンペャ 9に載置さ れるまで、前記各コンペャ 3、 19、 9を駆動し基板 Wを移動する(図 4参照)。このよう に基板 Wを移動するに際し、前記ローラ 27Aと前記ローラ 26とで基板 Wを挟み込む  [0081] Subsequently, the respective substrates 3, 19, 9 are driven to move the substrate W until the lowermost substrate W is placed on the delivery competitor 9 (see FIG. 4). ). When the substrate W is moved in this way, the substrate W is sandwiched between the roller 27A and the roller 26.
[0082] 続いて、受け渡し用コンペャベース部材 43を下降し、前記受け渡し用コンペャ 9が 載置して!/、た基板 Wをプロセス側移載ノヽンド 5で載置する(図 5参照)。 Subsequently, the delivery competitor base member 43 is lowered, and the delivery conveyor 9 is placed! /, And the substrate W is placed on the process side transfer node 5 (see FIG. 5).
[0083] 続いて、前記プロセス側移載ノヽンド 5や前記中間部材 41を延出して、基板 Wをプロ セス装置に搬入する(図 6、図 7参照)。 [0083] Subsequently, the process-side transfer node 5 and the intermediate member 41 are extended to process the substrate W. Bring it into the process equipment (see Figures 6 and 7).
[0084] なお、前記プロセス側移載ノ、ンド 5や前記中間部材 41が延出しても、回転自在な 前記中間コンペャ 19は、移動しないようになっている力 前記中間コンペャ 19を前 記プロセス側移載ノヽンド 5に設けて前記プロセス側移載ノヽンド 5や前記中間部材 41 が延出したときに、前記中間コンペャ 19も同時に移動するようにしてもよ!、。  [0084] It should be noted that even if the process side transfer node 5, the intermediate member 5 and the intermediate member 41 extend, the rotatable intermediate compressor 19 does not move. The intermediate transfer unit 19 may be moved at the same time when the process side transfer node 5 and the intermediate member 41 are provided on the side transfer node 5 and extend.
[0085] 前記搬入後、前記プロセス側移載ノ、ンド 5や前記中間部材 41を引っ込めると共に 、前記カセット側コンペャ 3のローラ 27が前記カセット CSに載置されている次の基板 (前記カセット CSが載置している基板 Wのうち最も下側に存在している基板) Wに接 触するまで、前記カセット CSを下降し、前記次の基板 Wの搬出を行う。  [0085] After the loading, the process-side transfer node 5, the intermediate member 41 and the intermediate member 41 are retracted, and the next substrate on which the roller 27 of the cassette-side compressor 3 is mounted on the cassette CS (the cassette CS The cassette CS is lowered and the next substrate W is unloaded until it comes into contact with the substrate W which is present on the lowermost side of the substrates W placed on the substrate.
[0086] 前記プロセス装置から前記カセット CSに基板 Wを搬送する場合には、前記動作と ほぼ逆の動作で基板 Wの搬送が行われる。  [0086] When the substrate W is transferred from the process apparatus to the cassette CS, the substrate W is transferred by an operation substantially opposite to the above operation.
[0087] 基板搬送装置 1によれば、カセット側コンペャ 3を用いてカセット CSから基板 Wを搬 出しもしくはカセット CSに基板 Wを搬入するので、この搬出入の際に基板 Wを上下 方向に移動する必要がなぐまた、移載ノ、ンドを基板の間に挿入する必要がなぐし たがって、ワイヤカセット CS内に積層されて 、る各基板 W間の間隔(上下方向の間 隔)を小さくすることができ、前記カセット CSにおける基板の収納効率を上げることが できる。  [0087] According to the substrate transfer device 1, the substrate W is unloaded from the cassette CS or loaded into the cassette CS using the cassette-side comparer 3, so that the substrate W is moved up and down during loading / unloading. In addition, it is not necessary to insert a transfer node between the substrates, so that the interval between the substrates W stacked in the wire cassette CS (interval in the vertical direction) is reduced. Thus, the efficiency of storing the substrate in the cassette CS can be increased.
[0088] また、プロセス側移載ノヽンド 5を用いてプロセス装置に基板 Wを搬入しもしくはプロ セス装置力も基板 Wを搬出するので、プロセス装置側の要求に答えることができ、前 記プロセス装置に別途多関節ロボット等を設ける必要がないので、基板搬送装置 1の 構成を簡素化することができると共に、設置面積を小さくすることができる。  [0088] Further, since the substrate W is carried into the process apparatus using the process side transfer node 5 or the substrate W is also carried out by the process apparatus force, the process apparatus side request can be answered. In addition, it is not necessary to separately provide an articulated robot or the like, so that the configuration of the substrate transfer apparatus 1 can be simplified and the installation area can be reduced.
[0089] さらに、カセット側コンペャ 3、プロセス側移載ノヽンド 5および基板受け渡し手段 7に よる基板 Wの移動 (搬送)が、基板 Wの姿勢を変える回転移動を伴わない平行移動 のみでされるようになって!/、るので、基板 Wを回転 (旋回)するためのスペースが不要 になり、基板搬送装置 1の設置面積を小さくすることができる。  [0089] Further, the movement (conveyance) of the substrate W by the cassette-side competitor 3, the process-side transfer node 5 and the substrate transfer means 7 can be performed only by a parallel movement that does not involve a rotational movement that changes the posture of the substrate W. As a result, a space for rotating (turning) the substrate W becomes unnecessary, and the installation area of the substrate transfer apparatus 1 can be reduced.
[0090] より詳しく説明すれば、矩形状の基板 Wをこの中心(中心を通り Z軸方向に延伸した 軸)を旋回中心にして旋回させると、この旋回に要するスペースは、少なくとも基板 W の対角線を直径とする円の分だけ必要になる。さらに、旋回中心を基板 Wの中心か らずらせば、旋回に要するスペースは一層大きくなると共に、旋回により生じる角加速 度 (接線加速度)や向心加速度 (法線加速度)により、基板 Wの位置がずれるおそれ が生じる。 More specifically, when the rectangular substrate W is swung around the center (the axis extending through the center and extending in the Z-axis direction) as a swivel center, the space required for the swirling is at least the diagonal line of the substrate W. Is required for the circle whose diameter is. Furthermore, whether the turning center is the center of the substrate W If shifted, the space required for turning becomes even larger, and the position of the substrate W may shift due to angular acceleration (tangential acceleration) and centripetal acceleration (normal acceleration) generated by turning.
[0091] これに対して平行移動のみで基板 Wを移動するようにすれば、基板 Wを旋回する 際に要するようなスペースは不要になり、したがって基板搬送装置 1の設置面積を小 さくすることができる。さらに、旋回によって基板 Wが位置ずれするおそれを回避する ことができる。  On the other hand, if the substrate W is moved only by parallel movement, the space required for turning the substrate W becomes unnecessary, and therefore the installation area of the substrate transfer apparatus 1 can be reduced. Can do. Further, it is possible to avoid the possibility that the substrate W is displaced due to the turning.
[0092] 前述したように、基板搬送装置 1の設置面積を小さくすることができれば、基板搬送 装置 1をクリーンルーム内で使用する際、高価な設備であるクリーンルームそのもの の大きさを小さくすることができる。また、基板 Wを旋回する必要がないので、前述し たように基板 Wを旋回するための機構が不要になる。  [0092] As described above, if the installation area of the substrate transfer apparatus 1 can be reduced, the size of the clean room itself, which is an expensive facility, can be reduced when the substrate transfer apparatus 1 is used in a clean room. . Further, since there is no need to turn the substrate W, a mechanism for turning the substrate W as described above becomes unnecessary.
[0093] ところで、大きな基板 Wを旋回させる機構は、一般的には、ギヤ等で構成された減 速機を介してモータ等のァクチユエータで基板を載置している載置台を旋回させるよ うに構成されている。この構成ではギヤのノ ックラッシュが存在するので、前記載置台 を正確にインデックス位置決めするために位置決めピン等を用いた位置決め機構が 必要になり、基板搬送装置の構成が煩雑になる。さらに、基板 Wの旋回による基板 W の位置ずれや前記位置決めピンでの載置台の位置決め時に発生するショックによる 基板 Wの位置ずれを防止するために、前記載置台や前記位置決めピンをゆっくりと 作動させる必要が生じ、基板 Wの搬送効率が低下する。  [0093] By the way, the mechanism for rotating the large substrate W generally rotates the mounting table on which the substrate is mounted by means of an actuator such as a motor via a speed reducer composed of a gear or the like. It is configured. In this configuration, there is a gear knock, so that a positioning mechanism using positioning pins or the like is required for accurately positioning the mounting table as described above, and the configuration of the substrate transfer apparatus becomes complicated. Further, in order to prevent the displacement of the substrate W due to the rotation of the substrate W and the displacement of the substrate W due to the shock generated when the mounting table is positioned by the positioning pin, the mounting table and the positioning pin are operated slowly. This necessitates a reduction in substrate W transfer efficiency.
[0094] 本発明に係る基板搬送装置 1は、基板 Wの旋回機構が不要であるので構成が簡 素になり、また、基板 Wを旋回させていないので、基板旋回時における基板 Wのず れが無くなり、基板 Wの搬送速度を速くすることができ基板 Wの搬送効率をあげるこ とがでさる。  [0094] The substrate transfer apparatus 1 according to the present invention does not require a turning mechanism for the substrate W, so that the configuration is simple. Further, since the substrate W is not turned, the displacement of the substrate W during the turning of the substrate is reduced. Therefore, the transfer speed of the substrate W can be increased and the transfer efficiency of the substrate W can be improved.
[0095] また、基板搬送装置 1によれば、基板 Wを搬出しまたは搬入する際、ローラ 26と口 ーラ 27Aとで基板 Wを上下方向から挟み込んで移動するように構成されているので 、基板 Wに大きな力を加えて搬送しても(基板 Wに加えられる加速度 (負の加速度を 含む)が大きくても)基板 Wとカセット側コンペャ 3との間にすべりが発生する恐れを抑 制することができ、基板 Wを速く搬送することができる。 [0096] また、基板搬送装置 1によれば、基板受け渡し手段 7が、上下方向に移動自在であ る受け渡し用コンペャ 9を備えていると共に、前記プロセス側移載ノヽンド 5に設けられ ている各切り欠き 11を、前記受け渡し用コンペャ 9における基板 Wを載置する部位が 通過することによって、前記カセット側コンペャ 3と前記プロセス側移載ノヽンド 5との間 で基板 Wを受け渡すことが可能なように構成されているので、簡素な構成でし力も上 下方向に移動するだけで基板 Wを受け渡すことができ、基板 Wに傷がつくおそれを 回避することができる。 [0095] Further, according to the substrate transfer apparatus 1, when the substrate W is carried out or carried in, the substrate W is sandwiched and moved by the roller 26 and the mouth roller 27A. Suppresses the possibility of slippage between the substrate W and the cassette side compressor 3 even if a large force is applied to the substrate W to carry it (even if the acceleration (including negative acceleration) applied to the substrate W is large). The substrate W can be transported quickly. Further, according to the substrate transfer apparatus 1, the substrate transfer means 7 includes the transfer competitor 9 that is movable in the vertical direction, and is provided in the process-side transfer node 5. The substrate W can be transferred between the cassette-side competitor 3 and the process-side transfer node 5 by passing through each notch 11 by a portion on the transfer-use competitor 9 where the substrate W is placed. Since it is configured to be possible, the substrate W can be delivered simply by moving the force upward and downward with a simple configuration, and the possibility of the substrate W being damaged can be avoided.
[0097] また、基板搬送装置 1によれば、中間コンペャ 19が設けられているので、この中間 コンペャ 19を用いて基板 Wを支持しつつ、前記カセット側コンペャ 3と前記受け渡し 用コンペャ 9との間で基板 Wを受け渡すことが可能になっており、確実に基板 Wの受 け渡しをすることができる。  [0097] Further, according to the substrate transport apparatus 1, since the intermediate competitor 19 is provided, the cassette-side competitor 3 and the delivery competitor 9 are supported while the substrate W is supported using the intermediate competitor 19. The substrate W can be delivered between the two, so that the substrate W can be reliably delivered.
[0098] なお、すでに理解されるように、プロセス側移載ノ、ンド 5における切り欠き 11が設け られて 、な 、切り欠き非形成部位は、互いに間隔をあけて設けられて 、る各載置部 位 (切り欠き 11が設けられている部位)を一体的につなげるために必要不可欠である  [0098] It should be noted that, as already understood, notches 11 in the process side transfer node 5 are provided, and the not-not-formed portions are provided at intervals from each other. It is indispensable to connect the place (the part where the notch 11 is provided) together
[0099] 一方、プロセス側移載ハンド 5における前記切り欠き非形成部位では、受け渡し手 段 7を構成して 、る各ローラ 47が通過することができな 、ので、前記切り欠き非形成 部位には、受け渡し手段 7が設けられて 、な 、ことになる。 [0099] On the other hand, since the notch non-formation part in the process side transfer hand 5 constitutes the delivery means 7 and each roller 47 cannot pass therethrough, This means that delivery means 7 is provided.
[0100] したがって、もしも、中間コンペャ 19が設けられていないとすれば、カセット CSとプ 口セス側移載ノ、ンド 5の載置部位との間に存在ししている前記切り欠き非形成部位に は、カセット CSと前記プロセス側移載ノヽンド 5との間を移動する基板 Wを下方力 支 持する手段が設けられていないことになり、搬送される基板 Wが重力で橈む等、基板 がスムーズに搬送されな 、おそれがある。  [0100] Therefore, if the intermediate compressor 19 is not provided, the notch that is present between the cassette CS and the loading part of the process side transfer node 5 is not formed. There is no means for supporting the downward force of the substrate W moving between the cassette CS and the process-side transfer node 5 at the site, and the substrate W to be transported is grabbed by gravity, etc. The substrate may not be transported smoothly.
[0101] しかし、基板搬送装置 1では、中間コンペャ 19が設けられているので、前記切り欠 き非形成部位においても、基板 wを下方力も支持することができ、基板搬送時にお ける重力による基板 Wの橈みを回避することができ、基板 Wをスムーズに搬送するこ とがでさる。  [0101] However, in the substrate transfer apparatus 1, since the intermediate competitor 19 is provided, the substrate w can be supported by the downward force even in the not-cut portion, and the substrate due to gravity during substrate transfer is supported. W stagnation can be avoided and the substrate W can be transported smoothly.
[0102] また、基板搬送装置 1によれば、カセット側コンペャ 3による基板 Wの搬出入方向( X軸方向)と前記プロセス側移載ノヽンド 5による基板 Wの搬出入方向(X軸方向)とが 互いに一致していると共に、基板 Wを Y軸方向に移動位置決め自在な基板移動位 置決め手段 30を備えているので、基板搬送装置 1全体の構成が一層簡素になって いると共に、カセット CSとプロセス装置とが Y軸方向においてずれた位置に存在して いても、カセット CSとプロセス装置との間で基板を搬送することができる。 [0102] Also, according to the substrate transport apparatus 1, the loading / unloading direction of the substrate W by the cassette side compressor 3 ( The X-axis direction) and the loading / unloading direction (X-axis direction) of the substrate W by the process-side transfer node 5 coincide with each other, and the substrate W can be moved and positioned in the Y-axis direction. Since the means 30 is provided, the overall structure of the substrate transfer apparatus 1 is further simplified, and even if the cassette CS and the process apparatus are located at positions shifted in the Y-axis direction, the cassette CS and the process apparatus The substrate can be transferred between the two.
[0103] また、基板搬送装置 1を間にして、 X軸方向の一端部側で Y軸方向に並べられた複 数のカセット CSと、 X軸方向の他端部側で Y軸方向に並べられた複数のプロセス装 置との間で、基板 Wを搬送することができる。  [0103] Further, a plurality of cassettes CS arranged in the Y-axis direction on one end side in the X-axis direction and the cassette transport apparatus 1 in the Y-axis direction on the other end side in the X-axis direction. The substrate W can be transferred between a plurality of process apparatuses.
[0104] ところで、図 8 (プロセス側移載ノ、ンド 5を複数設けた状態を示す図)に示すように、 前記プロセス側移載ノ、ンド 5を、上下方向に並んで複数 (たとえば 2つ)設けてあって ちょい。  By the way, as shown in FIG. 8 (a diagram showing a state in which a plurality of process-side transfer nodes 5 are provided), a plurality of process-side transfer nodes 5 are arranged in the vertical direction (for example, 2 Tsu) It ’s set up.
[0105] このように構成された基板搬送装置によれば、プロセス装置力 の基板 Wの搬出、 プロセス装置への基板 Wの搬入を短時間で行うことができる。  [0105] According to the substrate transport apparatus configured as described above, it is possible to carry out the substrate W with the process apparatus power and the substrate W into the process apparatus in a short time.
[0106] たとえば、下方に存在しているプロセス側移載ノヽンド 5Bに、未処理の基板 Wを載 置した状態で、前記各プロセス側移載ノ、ンド 5A、 5Bをプロセス装置まで移動し、前 記プロセス装置で処理済みの基板 Wを上方に存在しているプロセス側移載ノヽンド 5 Aに載置した後、前記プロセス側移載ノヽンド 5Bが載置して 、る基板を前記プロセス 装置に搬入し、この搬入後、前記各プロセス側移載ノヽンド 5A、 5Bを前記プロセス装 置力 離すようにすれば、プロセス装置からの基板 Wの搬出、プロセス装置への基板 Wの搬入を短時間で行うことができるものである。  [0106] For example, with the unprocessed substrate W placed on the process side transfer node 5B existing below, the process side transfer nodes 5A and 5B are moved to the process equipment. After the substrate W processed by the process apparatus is placed on the process side transfer node 5A existing above, the substrate on which the process side transfer node 5B is placed is placed on the substrate. If the process side transfer nodes 5A and 5B are separated from the process equipment force after carrying in the process equipment, the substrate W is unloaded from the process equipment and the substrate W is carried into the process equipment. Can be performed in a short time.
[0107] なお、前記第 1の実施形態において、図 9 (基板搬送装置の変形例を示す平面図) に示すように、前記各コンペャ 3、 9、 19による前記基板 Wの搬送方向(X軸方向)に 対して、前記プロセス側移載ノ、ンド 5による前記基板 Wの搬送方向(Y軸方向)を変 えてもよい。  In the first embodiment, as shown in FIG. 9 (plan view showing a modified example of the substrate transport apparatus), the transport direction (X-axis) of the substrate W by each of the competitors 3, 9, 19 is shown. The transfer direction (Y-axis direction) of the substrate W by the process side transfer node 5 may be changed.
[0108] [第 2の実施形態]  [Second Embodiment]
図 10、図 11〜図 16は、本発明の第 2の実施形態に係る基板搬送装置 101の概略 構成を示す斜視図であり、図 11は、図 13における XI矢視を示す図であり、図 12は、 図 10における ΧΠ矢視を示す図である。 [0109] 第 2の実施形態に係る基板搬送装置 101は、コンペャの代わりに移載ノヽンドを用い て、カセットから基板を搬出しまたはカセットへ基板を搬入し、また、受け渡し用コンペ ャ、中間コンペャがエアーフロートで構成されている点を除いては、前記第 1の実施 形態に係る基板搬送装置 1とほぼ同様に構成されほぼ同様の効果を奏すると共に、 基板がコンペャに触れないので、基板のクリーン度等を一層高めることができるもの である。 FIGS. 10 and 11 to 16 are perspective views showing a schematic configuration of the substrate transfer apparatus 101 according to the second embodiment of the present invention, and FIG. 11 is a view showing an arrow XI in FIG. FIG. 12 is a diagram showing the arrow in FIG. [0109] The substrate transfer apparatus 101 according to the second embodiment uses a transfer node instead of a competitor to carry out a substrate from a cassette or carry a substrate into a cassette. Except for the point that the competitor is composed of an air float, it is configured in substantially the same manner as the substrate transfer apparatus 1 according to the first embodiment and has substantially the same effect, and the substrate does not touch the competitor. The degree of cleanliness can be further increased.
[0110] 詳しく説明すると、基板搬送装置 101は、カセット側移載ノヽンド 102を備えている。  More specifically, the substrate transfer apparatus 101 includes a cassette side transfer node 102.
このカセット側移載ノヽンド 102は、基板 Wを水平にして多段に収納できるカセットから 、前記基板 Wの端面または端面近傍を保持して、前記基板 Wを (図 14に示す位置; 第 1の所定の位置 PS 1)まで搬出可能なように構成されて ヽる。  The cassette-side transfer node 102 holds the substrate W from the cassette that can accommodate the substrates W in a multilevel manner and holds the substrate W (position shown in FIG. 14; first position). It is configured so that it can be carried out to a predetermined position PS 1).
[0111] また、前記カセット側移載ノ、ンド 102は、前記基板 Wの端面または端面近傍を保持 して図 14に示す位置 PS1に存在している前記基板 Wを前記カセットへ搬入可能なよ うに構成されている。  [0111] Further, the cassette-side transfer node 102 can carry the substrate W present at the position PS1 shown in FIG. 14 while holding the end face or the vicinity of the end face of the substrate W into the cassette. It is configured as follows.
[0112] 前記カセット側移載ノヽンド 102は、 L字状の移動部材 106を備えている。この移動 部材 106は、基板 Wの搬出入方向(X軸方向)に長く延びていると共に、スライドベー ス (ベース部材) 107に対して基板 Wの搬出入方向に移動位置決め自在になってい る。このスライドベース 107は、基板 Wの搬出入方向(X軸方向)に長く延びていると 共に、ベース部材 104に一体的に設けられている。  [0112] The cassette-side transfer node 102 includes an L-shaped moving member 106. The moving member 106 extends in the loading / unloading direction (X-axis direction) of the substrate W, and is movable and positioned in the loading / unloading direction of the substrate W with respect to the slide base (base member) 107. The slide base 107 extends long in the loading / unloading direction (X-axis direction) of the substrate W and is provided integrally with the base member 104.
[0113] なお、前記ベース部材 104は、前記受け渡し用コンペャベース部材 43と同様に、 X 軸方向、 Y軸方向に移動位置決め自在になっている。  Note that the base member 104 is movable and positionable in the X-axis direction and the Y-axis direction, like the delivery competitor base member 43.
[0114] 前記移動部材 106には、前記基板 Wを保持するための保持部材 108が設けられて いる。この保持部材 108は、前記移動部材 106に対して X軸方向に移動位置決め自 在になっている。  The moving member 106 is provided with a holding member 108 for holding the substrate W. The holding member 108 is movable and positioned in the X-axis direction with respect to the moving member 106.
[0115] このように構成されていることにより、保持部材 108のベース部材 104に対する移動 ストロークを大きくしても、基板搬送装置 101の X軸方向の長さを短くすることができ、 設置面積の増大を極力回避することができる。  [0115] With this configuration, even if the movement stroke of the holding member 108 relative to the base member 104 is increased, the length of the substrate transfer apparatus 101 in the X-axis direction can be reduced, and the installation area can be reduced. Increase can be avoided as much as possible.
[0116] 前記保持部材 108は、たとえば、吸盤 110を備えており、図 11に示すように、基板 Wの端面近傍の下面を吸着することによって、前記基板 Wを保持することができるよ うになつている。前記吸盤 110に代えて、前記基板 Wの端面近傍を挟み込んで前記 基板 wを保持するようにしてもょ 、。 [0116] The holding member 108 includes, for example, a suction cup 110, and can hold the substrate W by adsorbing the lower surface near the end face of the substrate W as shown in FIG. It ’s a sea urchin. Instead of the suction cup 110, the vicinity of the end face of the substrate W may be sandwiched to hold the substrate w.
[0117] なお、基板 Wを安定して搬送 (移送)するために、前記移動部材 106、前記保持部 材 108等は、 Y軸方向で離れて、複数 (たとえば 2つ)設けられている。 [0117] In order to stably transport (transfer) the substrate W, a plurality (for example, two) of the moving member 106, the holding member 108, and the like are provided apart from each other in the Y-axis direction.
[0118] また、前記カセット側移載ノ、ンド 102で搬出または搬入される前記基板 Wの重量を 前記カセットの下部側で支持するためのカセット側エアーフロート手段(図示せず)が 設けられている。 [0118] Further, there is provided cassette side air float means (not shown) for supporting the weight of the substrate W carried out or carried in the cassette side transfer node 102 on the lower side of the cassette. Yes.
[0119] 前記カセット側エアーフロート手段は、たとえば、通気性を備えたセラミックスで形成 された支持部材を備えており、圧縮空気供給手段によって供給された圧縮空気が、 前記支持部材から噴出して、前記基板 Wとは非接触の状態で前記基板 Wの重量を 支えることができるようになって!/、る。  [0119] The cassette-side air float means includes, for example, a support member made of ceramic having air permeability, and the compressed air supplied by the compressed air supply means is ejected from the support member, The weight of the substrate W can be supported in a non-contact state with the substrate W! /.
[0120] なお、通気性のセラミックスに代えて、通気性の焼結金属等で前記支持部材を構成 してもよい。また、通気性を備えておらず材質で充填されている金属等の部材を用い 、この金属等の部材に複数の穴を設け、これらの穴から圧縮空気を噴出させて前記 基板 Wを支持するようにしてもょ ヽ。  [0120] Note that the support member may be made of a breathable sintered metal or the like instead of the breathable ceramics. Further, using a member such as a metal that is not air permeable and filled with a material, a plurality of holes are provided in the member such as a metal, and compressed air is ejected from these holes to support the substrate W. Even so, よ う.
[0121] また、基板搬送装置 101は、前記第 1の所定の位置の下に位置している第 2の所 定の位置(図 15に示す位置 PS3)に存在している前記基板 Wを、前記基板 Wに加工 を施すプロセス装置へ供給可能な、または、前記プロセス装置から前記基板 Wを前 記第 2の所定の位置へ搬出可能なプロセス側移載ハンド 112 (前記プロセス側移載 ハンド 5と同様に構成されて 、る移載ハンド)を備えて 、る。  [0121] Further, the substrate transfer apparatus 101 transfers the substrate W present at the second predetermined position (position PS3 shown in FIG. 15) located below the first predetermined position. A process-side transfer hand 112 that can be supplied to a process device that processes the substrate W, or can carry the substrate W out of the process device to the second predetermined position (the process-side transfer hand 5). It is constructed in the same manner as the above, and is equipped with a transfer hand).
[0122] 前記プロセス側移載ノ、ンド 112は、前記プロセス側移載ノ、ンド 5と同様に、中間部 材 115 (図 16参照)を介して移載ハンド支持部材 114 (前記移載ハンド支持部材 39 と同様に、 Y軸、 Z軸方向に移動位置決め自在な移載ハンド支持部材)に設けられて おり、前記プロセス側移載ノヽンド 112は、前記移載ノヽンド支持部材 114対し X軸方向 に突出して移動できるようになつている。  [0122] The process-side transfer node, 112, is similar to the process-side transfer node, 5, and the transfer hand support member 114 (the transfer hand) via the intermediate member 115 (see FIG. 16). Similarly to the support member 39, the process-side transfer node 112 is provided for the transfer node support member 114 with respect to the transfer node support member 114. It can be moved by protruding in the axial direction.
[0123] さらに、基板搬送装置 101は、前記第 1の所定の位置と前記第 2の所定の位置と間 で前記基板 Wを受け渡すことが可能な基板受け渡し手段 116を備えて 、る。  [0123] Further, the substrate transfer apparatus 101 includes a substrate transfer means 116 capable of transferring the substrate W between the first predetermined position and the second predetermined position.
[0124] 前記受け渡し手段 116は、前記カセット側移載ノ、ンド 102と前記プロセス側移載ノ、 ンド 112とに対して相対的に上下方向に移動自在である受け渡し用エアーフロート 手段 118を備えており、前記プロセス側移載ノ、ンド 112に設けられている各切り欠き を、前記受け渡し用エアーフロート手段 118の前記基板 Wを載置する部位が通過す ることによって、前記第 1の所定の位置と前記第 2の所定の位置との間で前記基板 W を受け渡すことが可能なようになって 、る。 [0124] The delivery means 116 includes the cassette side transfer node 102, the process side transfer node 102, and the process side transfer node. A transfer air float means 118 that is movable in the vertical direction relative to the terminal 112, and each notch provided on the process side transfer node 112 is connected to the transfer air. By passing the portion on which the substrate W of the float means 118 is placed, the substrate W can be delivered between the first predetermined position and the second predetermined position. Become.
[0125] より詳しく説明すると、前記受け渡し用エアーフロート手段 118は、支持部材 120を 備えており、この支持部材 120が、前記ベース部材 104の上方で X軸方向に延び Y 軸方向で間隔をあけて前記ベース部材 104に一体的に複数設けられている。  In more detail, the delivery air float means 118 includes a support member 120, which extends in the X-axis direction above the base member 104 and is spaced in the Y-axis direction. A plurality of the base members 104 are integrally provided.
[0126] 前記支持部材 120は、前記カセット側エアーフロート手段の支持部材と同様に構成 されており、エアーを噴出して基板 Wを支持することができるようになつている。  [0126] The support member 120 is configured in the same manner as the support member of the cassette-side air float means, and can support the substrate W by ejecting air.
[0127] また、前記第 1の所定の位置と前記カセットとの間には、前記カセット側移載ノ、ンド 1 02によって搬送されている基板 Wを支持するための中間エアーフロート手段 122が 設けられている。  In addition, intermediate air float means 122 for supporting the substrate W transported by the cassette-side transfer node 102 is provided between the first predetermined position and the cassette. It has been.
[0128] 前記中間エアーフロート手段 122は、支持部材 124を備えており、この支持部材 1 24は、前記カセット側であって前記移載ハンド支持部材 114の内側に、 Y軸方向で 間隔をあけて前記ベース部材 104に一体的に複数設けられている。  [0128] The intermediate air float means 122 includes a support member 124. The support member 124 is spaced from the cassette side and inside the transfer hand support member 114 in the Y-axis direction. A plurality of the base members 104 are integrally provided.
[0129] なお、前記プロセス側移載ノ、ンド 112や前記支持部材 124との干渉を避けるため、 前記移動部材 106は、 Y軸方向において、前記プロセス側移載ハンド 112や前記支 持部材 124の間に設けられている。  [0129] In order to avoid interference with the process side transfer node 112 and the support member 124, the moving member 106 has the process side transfer hand 112 and the support member 124 in the Y-axis direction. It is provided between.
[0130] ここで、基板搬送装置 101の動作について説明する。  [0130] Here, the operation of the substrate transfer apparatus 101 will be described.
[0131] 図 10は、初期状態を示している。この初期状態では、前記カセットの最下方に位置 している基板 Wの下面と、前記吸盤 110の上端と、前記支持部材 124の上面と、前 記支持部材 120の上面とがほぼ同じ高さになっており、また、前記プロセス側移載ハ ンド 112の上面は、前記各支持部材 120、 124の上面よりも下方に位置している。さ らに、前記移動部材 106は、カセット側には突出しておらず、平面視において前記べ 一ス部材 104の内側に収まっている。  FIG. 10 shows an initial state. In this initial state, the lower surface of the substrate W located at the lowest position of the cassette, the upper end of the suction cup 110, the upper surface of the support member 124, and the upper surface of the support member 120 are substantially the same height. In addition, the upper surface of the process-side transfer hand 112 is positioned below the upper surfaces of the support members 120 and 124. Further, the moving member 106 does not protrude toward the cassette side, but is accommodated inside the base member 104 in a plan view.
[0132] 前記初期状態において、前記移動部材 106がカセット側に延出すると共に、前記 保持部材 108もカセット側に移動し、前記吸盤 110で、前記最下方の基板 Wの端面 近傍の下部を吸着し、前記基板 Wを保持する(図 11、図 13参照) [0132] In the initial state, the moving member 106 extends toward the cassette side, and the holding member 108 also moves toward the cassette side, and the end surface of the lowermost substrate W is moved by the suction cup 110. Adsorb the lower part in the vicinity and hold the substrate W (see Fig. 11 and Fig. 13)
続いて、前記各支持部材 120、 124でのエアーフロートをオンすると共に、前記移 動部材 106や前記保持部材 108を前記カセットから離れる方向に移動することにより 、前記各支持部材 120、 124でエアー浮上して前記基板 Wの重量を支持しながら、 前記基板 Wを第 1の所定の位置 PS1まで搬送する(図 14参照)。  Subsequently, the air float in each of the support members 120 and 124 is turned on, and the air is moved in the support members 120 and 124 by moving the moving member 106 and the holding member 108 away from the cassette. The substrate W is transported to the first predetermined position PS1 while floating and supporting the weight of the substrate W (see FIG. 14).
[0133] 次に、前記ベース部材 104を下方向に移動すると、この移動に伴って、前記支持 部材 120で支持している基板 Wも下方に移動し、この移動の途中で前記基板 Wは、 前記プロセス側移載ノ、ンド 112に載置され、この載置された位置が前記第 2の所定 の位置 PS 3になる(図 15参照)。  [0133] Next, when the base member 104 is moved downward, the substrate W supported by the support member 120 is also moved downward along with the movement. It is placed on the process side transfer node 112, and this placed position becomes the second predetermined position PS3 (see FIG. 15).
[0134] 前記基板 Wが PS3の位置に存在した状態で、各支持部材 120、 124のエアーフロ ートがオフされる。  [0134] With the substrate W present at the position PS3, the airflow of the support members 120 and 124 is turned off.
[0135] 続、て、前記プロセス側移載ノヽンド 112をプロセス装置側に延ばして、基板 Wを前 記プロセス装置に搬入し(図 16参照)、この搬入後、前記プロセス側移載ハンド 112 を引っ込め、前記ベース部材 104、前記移載ハンド支持部材 114の高さ等を適宜調 節し、前記初期状態に戻る。  Subsequently, the process side transfer node 112 is extended to the process apparatus side, and the substrate W is loaded into the process apparatus (see FIG. 16). After the loading, the process side transfer hand 112 is loaded. The height of the base member 104 and the transfer hand support member 114 is adjusted as appropriate, and the initial state is restored.
[0136] 前記各動作を繰り返し、基板 Wが 1枚ずつ前記カセットから前記プロセス装置に搬 入される。  [0136] The above operations are repeated, and the substrates W are carried one by one from the cassette into the process apparatus.
[0137] なお、前記プロセス装置力も前記カセットに基板を移送する場合には、前記動作と 逆の動作を行なうことになる。  Note that, when the substrate is transferred to the cassette, the process apparatus force also performs an operation opposite to the operation described above.
[0138] また、すでに理解されるように、前記第 1の実施形態と同様に、前記各移載ハンド 1 02、 112による前記基板 Wの搬送方向は、互いに一致している。  Further, as already understood, the transfer directions of the substrates W by the respective transfer hands 102 and 112 coincide with each other as in the first embodiment.
[0139] 基板搬送装置 101によれば、カセット側移載ノヽンド 102を用いてカセットから基板 Wを搬出しもしくはカセットに基板 Wを搬入するので、この搬出入の際に基板 Wを上 下方向に移動する必要がなぐカセット側移載ノヽンド 102で基板 Wの端部を保持して 基板を搬出入するので、この搬出入の際に基板 Wを上下方向に移動する必要がなく 、また、カセット側移載ノ、ンド 102を基板 Wの間に深く挿入する必要がない。したがつ て、カセット内に積層されて 、る各基板 W間の間隔(上下方向の間隔)を小さくするこ とができ、前記カセットにおける基板の収納効率を上げることができる。 [0140] さらに、カセットから基板 Wを搬出しまたはカセットへ基板 Wを搬入する際、前記基 板 Wの端部を保持して搬出入を行うので、前記基板 Wの中央部に傷がついたり前記 基板 Wが汚染されるおそれを一層回避することができる。また、プロセス側移載ノ、ン ド 112を用 、てプロセス装置に基板 Wを搬入しもしくはプロセス装置力も基板 Wを搬 出するので、プロセス装置側の要求に答えることができ、前記プロセス装置に別途多 関節ロボット等を設ける必要がないので、基板搬送装置 101の構成を簡素化すること ができると共に、設置面積を小さくすることができる。 [0139] According to the substrate transfer device 101, the substrate W is unloaded from the cassette using the cassette side transfer node 102, or the substrate W is loaded into the cassette. It is not necessary to move the substrate W up and down at the time of loading / unloading, since the end of the substrate W is held by the cassette-side transfer node 102 which does not need to move to / from the substrate. There is no need to insert the cassette side transfer node 102 between the substrates W deeply. Therefore, the interval between the substrates W stacked in the cassette (interval in the vertical direction) can be reduced, and the storage efficiency of the substrates in the cassette can be increased. [0140] Furthermore, when the substrate W is unloaded from the cassette or loaded into the cassette, the end portion of the substrate W is held and loaded and unloaded, so that the central portion of the substrate W may be damaged. The possibility that the substrate W is contaminated can be further avoided. In addition, since the process side transfer node No. 112 is used to carry the substrate W into the process apparatus or the process apparatus force also unloads the substrate W, it is possible to answer the request from the process apparatus side, Since it is not necessary to provide a separate articulated robot or the like, the configuration of the substrate transfer apparatus 101 can be simplified and the installation area can be reduced.
[0141] また、カセット側コンペャ、プロセス側移載ハンドおよび前記基板受け渡し手段によ る基板 Wの移動は、基板 Wの姿勢を変える回転移動を伴わな 、平行移動のみでさ れるようになっているので、基板 Wを回転 (旋回)するためのスペースが不要になり、 基板搬送装置 101の設置面積を小さくすることができる。  [0141] Further, the movement of the substrate W by the cassette-side competitor, the process-side transfer hand, and the substrate transfer means can be performed only by parallel movement without accompanying rotational movement that changes the posture of the substrate W. Therefore, a space for rotating (turning) the substrate W becomes unnecessary, and the installation area of the substrate transfer apparatus 101 can be reduced.
[0142] ところで、前記第 1の実施形態と同様に、前記プロセス側移載ハンド 112を上下方 向に並べて複数設けてもよ!、。  [0142] By the way, as in the first embodiment, a plurality of the process-side transfer hands 112 may be arranged in an upward and downward direction!
[0143] さらに、前記各エアーフロート手段に代えて、超音波を用いて基板 Wを浮上させる 超音波フロート手段を採用してもよい。  [0143] Further, instead of the air float means, an ultrasonic float means that floats the substrate W using ultrasonic waves may be employed.
[0144] 前記超音波フロート手段は、基板支持部材を超音波振動子で振動させることにより 、基板 Wと前記基板支持部材との間に形成される薄い空気膜によって、基板 Wの重 量を支持するようになって!/、る。  [0144] The ultrasonic float means supports the weight of the substrate W by a thin air film formed between the substrate W and the substrate support member by vibrating the substrate support member with an ultrasonic vibrator. Come on! /
[0145] 例を掲げて詳しく説明すると、前記超音波フロート手段は、超音波発生素子 (たとえ ばピエゾ素子)を備えて 、る。  [0145] The ultrasonic float means includes an ultrasonic wave generation element (for example, a piezo element).
[0146] 前記超音波発生素子の上側には、この超音波発生素子が発生する振動を増幅す るためのホーンが設けられている。前記基板支持部材が、連結部材を介して、前記 ホーンの上部に設けられて!/、る。  [0146] A horn for amplifying the vibration generated by the ultrasonic wave generating element is provided above the ultrasonic wave generating element. The substrate support member is provided on the upper portion of the horn via a connecting member.
[0147] そして、前記超音波発生素子が発生した振動が前記基板支持部材まで伝達され、 この基板支持部材が前記基板 Wの厚さ方向で主に振動することにより、基板 Wと前 記基板支持部材との間に、空気を媒体とした放射圧 (空気の粗密波による放射圧)が 発生し、この放射圧によって、前記基板 Wと前記基板支持部材との間に薄い空気膜 が生成され、前記基板支持部材で前記基板 Wの重量を支持することができるように なっている。 [0147] Then, the vibration generated by the ultrasonic wave generating element is transmitted to the substrate support member, and the substrate support member vibrates mainly in the thickness direction of the substrate W, whereby the substrate W and the substrate support described above are supported. A radiation pressure using air as a medium (radiation pressure due to air density waves) is generated between the members, and a thin air film is generated between the substrate W and the substrate support member by the radiation pressure, The weight of the substrate W can be supported by the substrate support member. It has become.
[0148] なお、日本国特許出願第 2005— 162225号(2005年 6月 2日出願)の全内容力 参照により、本願明細書に組み込まれている。  [0148] The entire content of Japanese Patent Application No. 2005-162225 (filed on June 2, 2005) is incorporated herein by reference.
[0149] また、本発明は前述の発明の実施の形態に限定されることなぐ適宜な変更を行う ことにより、その他の態様で実施し得るものである。 [0149] Further, the present invention can be implemented in other modes by making appropriate modifications without being limited to the above-described embodiments.

Claims

請求の範囲 The scope of the claims
[1] 基板を水平にして多段に収納できるカセットから前記基板を水平方向に移動して搬 出可能な、または、前記基板を水平方向に移動して前記カセットへ搬入可能なカセ ット側コンペャと;  [1] A cassette-side compressor capable of moving the substrate horizontally and carrying it out of a cassette that can be stored in multiple stages with the substrates placed horizontally, or moving the substrate horizontally and loaded into the cassette When;
前記基板を水平方向に移動して、前記基板に加工を施すプロセス装置へ供給可 能な、または、前記基板を水平方向に移動して前記プロセス装置から搬出可能なプ 口セス側移載ハンドと;  A process-side transfer hand capable of moving the substrate in the horizontal direction and supplying it to a process apparatus for processing the substrate, or moving the substrate in the horizontal direction and carrying it out of the process apparatus; ;
前記基板を前記カセット側コンペャと前記プロセス側移載ハンドとの間で受け渡す ことが可能な基板受け渡し手段と;  Substrate transfer means capable of transferring the substrate between the cassette side conveyor and the process side transfer hand;
を有し、前記カセット側コンペャ、前記プロセス側移載ハンドおよび前記基板受け 渡し手段は、平行移動のみすることによって、前記基板を移動するように構成されて And the cassette side conveyor, the process side transfer hand, and the substrate transfer means are configured to move the substrate only by parallel movement.
Vヽることを特徴とする基板搬送装置。 Substrate transfer device characterized by V.
[2] 基板を水平にして多段に収納できるカセットから、前記基板の端面または端面近傍 を保持し前記基板を水平方向に移動して搬出可能な、または、前記基板の端面また は端面近傍を保持し前記基板を水平方向に移動して前記カセットへ搬入可能なカセ ット側移載ハンドと; [2] From a cassette that can store substrates in multiple stages horizontally, the substrate can be carried out by moving the substrate in the horizontal direction while holding the substrate near the end surface or near the end surface, or holding the substrate end surface or near the end surface A cassette-side transfer hand capable of moving the substrate horizontally and carrying it into the cassette;
前記基板を水平方向に移動して前記基板に加工を施すプロセス装置へ供給可能 な、または、前記基板を水平方向に移動して前記プロセス装置から搬出可能なプロ セス側移載ハンドと;  A process-side transfer hand capable of moving the substrate in a horizontal direction and supplying it to a process apparatus for processing the substrate, or moving the substrate in a horizontal direction and carrying it out of the process apparatus;
前記カセット側移載ノヽンドと前記プロセス側移載ノヽンドとの間で前記基板を受け渡 すことが可能な基板受け渡し手段と;  Substrate transfer means capable of transferring the substrate between the cassette side transfer node and the process side transfer node;
を有し、前記カセット側移載ノヽンド、前記プロセス側移載ハンドおよび前記基板受 け渡し手段は、平行移動のみすることによって、前記基板を移動するように構成され て!、ることを特徴とする基板搬送装置。  The cassette side transfer node, the process side transfer hand, and the substrate transfer means are configured to move the substrate only by parallel movement !. A substrate transfer device.
[3] 請求項 2に記載の基板搬送装置において、 [3] In the substrate transfer apparatus according to claim 2,
前記カセット側移載ノヽンドは、  The cassette side transfer node is:
前記基板の搬出入方向に長く延びたスライドベースと;  A slide base extending long in the loading / unloading direction of the substrate;
前記スライドベースに対して前記基板の搬出入方向に移動可能な移動部材と; 前記基板を保持することができると共に、前記移動部材に対して前記基板の搬出 入方向で移動可能な保持部材と; A moving member movable in the loading / unloading direction of the substrate with respect to the slide base; A holding member capable of holding the substrate and movable in the loading / unloading direction of the substrate with respect to the moving member;
を備え、前記スライドベースに対して前記保持部材が移動位置決め自在に構成さ れて!ヽることを特徴とする基板搬送装置。  And the holding member is configured to be movable and positionable with respect to the slide base.
[4] 請求項 1〜請求項 3のいずれか 1項に記載の基板搬送装置において、 [4] In the substrate transfer apparatus according to any one of claims 1 to 3,
前記カセット側コンペャまたは前記カセット側移載ノヽンドによる基板の搬出入方向と 、前記プロセス側移載ノヽンドによる基板の搬出入方向とは、互いに一致していると共 に、  The loading / unloading direction of the substrate by the cassette-side conveyor or the cassette-side transfer node and the loading / unloading direction of the substrate by the process-side transfer node coincide with each other,
前記カセット側コンペャもしくは前記カセット側移載ノ、ンドで前記カセットから搬出さ れた基板を、または、前記プロセス側移載ノヽンドでプロセス装置カゝら搬出された基板 を、前記カセット側コンペャもしくは前記カセット側移載ノ、ンド、前記プロセス側移載 ハンドによる基板の搬出入方向に対して交差する水平方向に移動位置決め自在な 基板移動位置決め手段を有することを特徴とする基板搬送装置。  A substrate unloaded from the cassette by the cassette side transferer or the cassette side transfer node, or a substrate unloaded from the process apparatus card by the process side transfer node, or the cassette side transferor A substrate transfer apparatus comprising substrate transfer positioning means capable of moving and positioning in a horizontal direction intersecting with a loading / unloading direction of a substrate by the cassette side transfer node and the process side transfer hand.
[5] 請求項 1〜請求項 4のいずれか 1項に記載の基板搬送装置において、 [5] In the substrate transfer apparatus according to any one of claims 1 to 4,
前記基板受け渡し手段は、前記カセット側コンペャもしくは前記カセット側移載ノヽン ドと前記プロセス側移載ノ、ンドとに対して相対的に上下方向に移動自在である受け 渡し用コンペャを備えていると共に、前記プロセス側移載ノヽンドに設けられている各 切り欠きまたは各貫通孔を、前記受け渡し用コンペャにおける前記基板を載置する 部位が通過することによって、前記カセット側コンペャもしくは前記カセット側移載ノヽ ンドと前記プロセス側移載ノ、ンドとの間で前記基板を受け渡すことが可能なように構 成されており、  The substrate delivery means includes a delivery competitor that is movable in the vertical direction relative to the cassette side conveyor or the cassette side transfer node and the process side transfer node. At the same time, the cassette-side conveyor or the cassette-side transfer is made by passing the notch or each through-hole provided in the process-side transfer node through the portion of the transfer competitor where the substrate is placed. The substrate is transferred between the loading node and the process-side transfer node.
または、前記基板受け渡し手段は、前記カセット側コンペャもしくは前記カセット側 移載ノヽンドと前記プロセス側移載ノヽンドとに対して相対的に上下方向に移動自在で ある受け渡し用エアーフロート手段または受け渡し用超音波フロート手段を備えてい ると共に、前記プロセス側移載ハンドに設けられている各切り欠きまたは各貫通孔を 、前記受け渡し用エアーフロート手段または前記受け渡し用超音波フロート手段にお ける前記基板を載置する部位が通過することによって、前記カセット側コンペャもしく は前記カセット側移載ノヽンドと前記プロセス側移載ノヽンドとの間で前記基板を受け渡 すことが可能なように構成されて 、ることを特徴とする基板搬送装置。 Alternatively, the substrate transfer means is a transfer air float means or transfer means that is movable in the vertical direction relative to the cassette side conveyor or the cassette side transfer node and the process side transfer node. Ultrasonic float means is provided, and each notch or each through-hole provided in the process side transfer hand is passed through the air float means for delivery or the substrate in the ultrasonic float means for delivery. By passing the part to be placed, the substrate is transferred between the cassette side conveyor or the cassette side transfer node and the process side transfer node. A substrate transfer device configured to be capable of being moved.
[6] 請求項 1〜請求項 5のいずれか 1項に記載の基板搬送装置において、  [6] The substrate transfer apparatus according to any one of claims 1 to 5,
前記プロセス側移載ノヽンドの基端部側には、前記カセット側コンペャもしくは前記力 セット側移載ハンドと前記プロセス側移載ハンドとの間を水平方向に移動する前記基 板の重量を支持するための中間コンペャ、または、前記カセット側コンペャもしくは前 記カセット側移載ハンドと前記プロセス側移載ハンドとの間を水平方向に移動する基 板の重量を支持するための中間エアーフロート手段もしくは中間超音波フロート手段 が設けられて!/ヽることを特徴とする基板搬送装置。  The base side of the process side transfer node supports the weight of the base plate that moves in the horizontal direction between the cassette side conveyor or the force setting side transfer hand and the process side transfer hand. Or an intermediate air float means for supporting the weight of the cassette moving in the horizontal direction between the cassette side conveyor or the cassette side transfer hand and the process side transfer hand, or An intermediate ultrasonic float means is provided!
[7] 請求項 1〜請求項 6のいずれか 1項に記載の基板搬送装置において、  [7] In the substrate transfer apparatus according to any one of claims 1 to 6,
前記プロセス側移載ノヽンドが上下方向に並んで複数設けられて ヽることを特徴とす る基板搬送装置。  A substrate transfer apparatus, wherein a plurality of the process side transfer nodes are provided side by side in the vertical direction.
PCT/JP2005/019021 2005-06-02 2005-10-17 Substrate carrying device WO2006129385A1 (en)

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TW200642933A (en) 2006-12-16

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