WO2006066016A3 - Systems and methods for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby - Google Patents

Systems and methods for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby Download PDF

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Publication number
WO2006066016A3
WO2006066016A3 PCT/US2005/045458 US2005045458W WO2006066016A3 WO 2006066016 A3 WO2006066016 A3 WO 2006066016A3 US 2005045458 W US2005045458 W US 2005045458W WO 2006066016 A3 WO2006066016 A3 WO 2006066016A3
Authority
WO
WIPO (PCT)
Prior art keywords
nanodisks
systems
methods
forming
nanodisk
Prior art date
Application number
PCT/US2005/045458
Other languages
French (fr)
Other versions
WO2006066016A2 (en
Inventor
Harry Sewell
Original Assignee
Asml Holding Nv
Harry Sewell
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/012,598 external-priority patent/US7331283B2/en
Priority claimed from US11/012,474 external-priority patent/US7409759B2/en
Priority claimed from US11/012,489 external-priority patent/US7410591B2/en
Priority claimed from US11/224,316 external-priority patent/US7363854B2/en
Priority claimed from US11/288,135 external-priority patent/US7399422B2/en
Application filed by Asml Holding Nv, Harry Sewell filed Critical Asml Holding Nv
Priority to JP2007546900A priority Critical patent/JP4679585B2/en
Publication of WO2006066016A2 publication Critical patent/WO2006066016A2/en
Publication of WO2006066016A3 publication Critical patent/WO2006066016A3/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Semiconductor Memories (AREA)

Abstract

Provided are methods and systems for forming nanodisks used in imprint lithography and memory disks formed by the nanodisks.
PCT/US2005/045458 2004-12-16 2005-12-15 Systems and methods for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby WO2006066016A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007546900A JP4679585B2 (en) 2004-12-16 2005-12-15 Method for forming nanodisks used in imprint lithography

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
US11/012,598 2004-12-16
US11/012,474 2004-12-16
US11/012,598 US7331283B2 (en) 2004-12-16 2004-12-16 Method and apparatus for imprint pattern replication
US11/012,489 2004-12-16
US11/012,474 US7409759B2 (en) 2004-12-16 2004-12-16 Method for making a computer hard drive platen using a nano-plate
US11/012,489 US7410591B2 (en) 2004-12-16 2004-12-16 Method and system for making a nano-plate for imprint lithography
US11/224,316 2005-09-13
US11/224,316 US7363854B2 (en) 2004-12-16 2005-09-13 System and method for patterning both sides of a substrate utilizing imprint lithography
US11/288,135 US7399422B2 (en) 2005-11-29 2005-11-29 System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby
US11/288,135 2005-11-29

Publications (2)

Publication Number Publication Date
WO2006066016A2 WO2006066016A2 (en) 2006-06-22
WO2006066016A3 true WO2006066016A3 (en) 2007-11-01

Family

ID=36588563

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/045458 WO2006066016A2 (en) 2004-12-16 2005-12-15 Systems and methods for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby

Country Status (2)

Country Link
JP (1) JP4679585B2 (en)
WO (1) WO2006066016A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
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JP4595120B2 (en) * 2005-05-27 2010-12-08 独立行政法人産業技術総合研究所 Imprint method and apparatus by back surface pressurization
JP5163929B2 (en) * 2006-12-25 2013-03-13 富士電機株式会社 Imprint method and apparatus
KR101289337B1 (en) * 2007-08-29 2013-07-29 시게이트 테크놀로지 엘엘씨 Imprint lithography systm for dual side imprinting
JP5538681B2 (en) * 2008-02-29 2014-07-02 富士フイルム株式会社 Optical imprint mold, optical imprint method, magnetic recording medium, and manufacturing method thereof
US8506867B2 (en) * 2008-11-19 2013-08-13 Semprius, Inc. Printing semiconductor elements by shear-assisted elastomeric stamp transfer
WO2010143303A1 (en) * 2009-06-12 2010-12-16 パイオニア株式会社 Transfer apparatus, and transfer method
WO2010143302A1 (en) * 2009-06-12 2010-12-16 パイオニア株式会社 Transfer apparatus, and transfer method
JP5469041B2 (en) * 2010-03-08 2014-04-09 株式会社日立ハイテクノロジーズ Fine structure transfer method and apparatus
WO2011141995A1 (en) * 2010-05-11 2011-11-17 パイオニア株式会社 Transfer device and method, and computer program
WO2011141996A1 (en) * 2010-05-11 2011-11-17 パイオニア株式会社 Transfer device and method, and computer program
DE102011054789A1 (en) * 2011-10-25 2013-04-25 Universität Kassel Nano-shape structure
JP5938218B2 (en) 2012-01-16 2016-06-22 キヤノン株式会社 Imprint apparatus, article manufacturing method, and imprint method
JP6069689B2 (en) * 2012-07-26 2017-02-01 大日本印刷株式会社 Nanoimprint template
CN107077065B (en) * 2014-09-22 2020-10-30 皇家飞利浦有限公司 Delivery method and apparatus and computer program product
JP6692311B2 (en) 2017-03-14 2020-05-13 キオクシア株式会社 template
US20220390839A1 (en) * 2021-06-03 2022-12-08 Viavi Solutions Inc. Method of replicating a microstructure pattern

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6743368B2 (en) * 2002-01-31 2004-06-01 Hewlett-Packard Development Company, L.P. Nano-size imprinting stamp using spacer technique

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JPH01217739A (en) * 1988-02-24 1989-08-31 Nec Corp Stamper for optical disk
JPH09282648A (en) * 1996-04-11 1997-10-31 Sony Corp Magnetic disk and magnetic disk device
JPH1125455A (en) * 1997-06-30 1999-01-29 Matsushita Electric Ind Co Ltd Magnetic transfer device
JP3385325B2 (en) * 1998-11-09 2003-03-10 日本電気株式会社 Exposure method and exposure apparatus for lattice pattern
JP4185230B2 (en) * 1999-02-19 2008-11-26 Ｔｄｋ株式会社 Magnetic recording medium
JP2002074656A (en) * 2000-09-04 2002-03-15 Fuji Photo Film Co Ltd Magnetic transfer method
US6757116B1 (en) * 2001-08-16 2004-06-29 Seagate Technology Llc Disk biasing for manufacture of servo patterned media
DE10297731T5 (en) * 2002-05-08 2005-07-07 Agency For Science, Technology And Research Reverse embossing technology
US7378347B2 (en) * 2002-10-28 2008-05-27 Hewlett-Packard Development Company, L.P. Method of forming catalyst nanoparticles for nanowire growth and other applications
JP2004171658A (en) * 2002-11-19 2004-06-17 Fuji Electric Holdings Co Ltd Substrate for perpendicular magnetic recording medium and perpendicular magnetic recording medium and method for manufacturing the same
US7147790B2 (en) * 2002-11-27 2006-12-12 Komag, Inc. Perpendicular magnetic discrete track recording disk
JP4093574B2 (en) * 2003-09-22 2008-06-04 株式会社東芝 Method for manufacturing imprint stamper and method for manufacturing magnetic recording medium
JP4418300B2 (en) * 2004-05-25 2010-02-17 株式会社日立製作所 Recording medium manufacturing method, recording medium using the same, and information recording / reproducing apparatus
JP4197689B2 (en) * 2004-09-24 2008-12-17 Ｔｄｋ株式会社 Information recording medium, recording / reproducing apparatus, and stamper
JP2006127590A (en) * 2004-10-27 2006-05-18 Matsushita Electric Ind Co Ltd Patterning method and manufacturing method of imprint mold using the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6743368B2 (en) * 2002-01-31 2004-06-01 Hewlett-Packard Development Company, L.P. Nano-size imprinting stamp using spacer technique

Also Published As

Publication number Publication date
JP2008524854A (en) 2008-07-10
WO2006066016A2 (en) 2006-06-22
JP4679585B2 (en) 2011-04-27

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