WO2005090638A2 - Remote chamber methods for removing surface deposits - Google Patents
Remote chamber methods for removing surface deposits Download PDFInfo
- Publication number
- WO2005090638A2 WO2005090638A2 PCT/US2005/010693 US2005010693W WO2005090638A2 WO 2005090638 A2 WO2005090638 A2 WO 2005090638A2 US 2005010693 W US2005010693 W US 2005010693W WO 2005090638 A2 WO2005090638 A2 WO 2005090638A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas mixture
- surface deposits
- fluorocarbon
- oxygen
- silicon
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
- H01J37/32862—In situ cleaning of vessels and/or internal parts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Definitions
- the present invention relates to methods for removing surface deposits by using an activated gas created by remotely activating a gas mixture comprising of oxygen, fluorocarbon and nitrogen source. More specifically, this invention relates to methods for removing surface deposits from the interior of a chemical vapor deposition chamber by using an activated gas created by remotely activating a gas mixture comprising of oxygen, perfluorocarbon compound and nitrogen source.
- Remote plasma sources for the production of atomic fluorine are widely used for chamber cleaning in the semiconductor processing industry, particularly in the cleaning of chambers used for Chemical Vapor Deposition (CVD) and Plasma Enhanced Chemical Vapor Deposition (PECVD).
- remote plasma sources avoids some of the erosion of the interior chamber materials that occurs with in situ chamber cleans in which the cleaning is performed by creating a plasma discharge within the PECVD chamber.
- capacitively and inductively coupled RF as well as microwave remote sources have been developed for these sorts of applications, the industry is rapidly moving toward transformer coupled inductively coupled sources in which the plasma has a torroidal configuration and acts as the secondary of the transformer.
- the use of lower frequency RF power allows the use of magnetic cores which enhance the inductive coupling with respect to capacitive coupling; thereby allowing the more efficient transfer of energy to the plasma without excessive ion bombardment which limits the lifetime of the remote plasma source chamber interior.
- the present invention relates to a method for removing surface deposits, said method comprising: (a) activating in a remote chamber a gas mixture comprising oxygen, fluorocarbon and a nitrogen source, wherein the molar ratio of oxygen and fluorocarbon is at least 1 :3, using sufficient power for a sufficient time such that said gas mixture reaches a neutral temperature of at least about 3,000 K to form an activated gas mixture; and thereafter (b) contacting said activated gas mixture with the surface deposits and thereby removing at least some of said surface deposits.
- the present invention also relates to a method for removing surface deposits, said surface deposits is selected from a group consists of silicon, doped silicon, tungsten, silicon dioxide, silicon carbide and various silicon oxygen compounds referred to as low K materials, said method comprising: (a) activating in a remote chamber a gas mixture comprising oxygen, fluorocarbon and a nitrogen source, wherein the molar ratio of oxygen and fluorocarbon is at least 1 :3; and thereafter (b) contacting said activated gas mixture with the surface deposits and thereby removing at least some of said surface deposits.
- the present invention further relates to a method for removing surface deposits, said method comprising: (a) activating in a remote chamber a pretreatment gas mixture comprising nitrogen source, and thereafter (b) contacting said activated pretreatment gas mixture with at least a portion of interior surface of a pathway from the remote chamber to the surface deposits; (c) activating in the remote chamber a cleaning gas mixture comprising oxygen and fluorocarbon wherein the molar ratio of oxygen and fluorocarbon is at least 1 :3; and thereafter (d) passing said activated cleaning gas mixture through said pathway; (e) contacting said activated cleaning gas mixture with the surface deposits and thereby removing at least some of said surface deposits.
- Surface deposits removed in this invention comprise those materials commonly deposited by chemical vapor deposition or plasma- enhanced chemical vapor deposition or similar processes. Such materials include silicon, doped silicon, silicon nitride, tungsten , silicon dioxide, silicon oxynitride, silicon carbide and various silicon oxygen compounds referred to as low K materials, such as FSG (fluorosil icate glass) and SiCOH or PECVD OSG including Black Diamond (Applied Materials), Coral (Novellus Systems) and Aurora (ASM International).
- FSG fluorosil icate glass
- PECVD OSG including Black Diamond (Applied Materials), Coral (Novellus Systems) and Aurora (ASM International).
- One embodiment of this invention is removing surface deposits from the interior of a process chamber that is used in fabricating electronic devices.
- Such process chamber could be a Chemical Vapor Deposition (CVD) chamber or a Plasma Enhanced Chemical Vapor Deposition (PECVD) chamber.
- the process of the present invention invol /es an activating step using sufficient power to form an activated gas mixture. Activation may be accomplished by any means allowing for the achievement of dissociation of a large fraction of the feed gas, such as: RF energ-y, DC energy, laser illumination and microwave energy.
- the neutral temperature of the resulting plasma depends on the power and the residence time of the gas mixture in the remote chamber. In this invention, it is found that addition of nitrogen gas helps absorption of RF power. Under certain power input and conditions, neutral temperature will be higher with longer residence time. Here, preferred neutral temperature is over about 3,000 K.
- the activated gas is formed in a remote chamber that is outside of the process chamber, but in close proximity to the process chamber.
- the remote chamber is connected to the process chamber by any means allowing for transfer of the activated gas from the remote chamber to the process chamber.
- the remote chamber and means for connecting the remote chamber with the process chamber are constructed of materials known in this field to be capable of containing activated gas mixtures. For instance, aluminum and stainless steel are commonly used for the chamber components.
- AI 2 O 3 is coated on the interior surface to reduce the surface recombination.
- the gas mixture that is activated to form the activated gas comprises oxygen, nitrogen source and fluorocarbon.
- a fluorocarbon of the invention is herein referred to as a compound comprising of C and F.
- Preferred fluorocarbon in this invention is perfluorocarbon compound.
- a perfluorocarbon compound in this invention is herein referred to as a compound consisting of C, F and optionally oxygen.
- Such perfluorocarbon compounds include, but are not limited to tetrafluoromethane, hexafluoroethane, octafluoropropane, hexafluorocyclopropane decafluorobutane, octafluorocyclobutane, carbonyl fluoride and octafluorotetrahydrofuran.
- a preferred gas mixture has oxygen to fluorocarbon molar ratio of at least 1 :3.
- a more preferred gas mixture has oxygen to fluorocarbon molar ratio of at least from abo ut 2:1 to about 20:1
- a "nitrogen source" of the invention is herein referred to as a gas which can generate atomic nitrogen under the discharge conditions in this invention.
- Examples of a nitrogen source here include, but are not limited to N 2 , NF 3 and all kinds of nitrogen oxides such as NO, N 2 O, NO 2 et al.
- the gas mixture that is activated to form the activated gas may further comprise carrier gases such as argon and helium.
- a preferred embodiment of the present invention is a method for removing surface deposits from the interior of a process chamber that is used in fabricating electronic devices, said method comprising: (a) activating in a remote chamber a gas mixture comprising oxygen, perfluorocarbon compound and a nitrogen source, wherein the molar ratio of oxygen and perfluorocarbon compound is at least 1 : 3, using sufficient power for a sufficient time such that said gas mixture reaches a neutral temperature of at least about 3,000 K to form an activated gas mixture; and thereafter (b) contacting said activated gas mixture with the interior of said deposition chamber and thereby removing at least some of said surface deposits. It was found in this invention that nitrogen gas can dramatically increase the etching rate.
- the perfluorocarbon compound is octafluorocyclobutane (Zyron® 8020) manufactured by DuPont.
- Zyron® 8020 octafluorocyclobutane manufactured by DuPont.
- Zyron® 8020 generated low etching rate and high COF 2 emission.
- the etching rate starts to improve with a small amount of nitrogen and saturates when nitrogen addition exceeds certain amount, (see Figure 2 and 3)
- the nitrogen addition also increases the power consumption and decreases the COF 2 emission, (see Figure 2 and
- the etching rate started at a high level.
- the system can be used to alter surfaces placed in the remote chamber by contact with the fluorine atoms and other constituents coming from the source. The following Examples are meant to illustrate the invention and are not meant to be limiting.
- Fig. 1 shows a schematic diagram of the remote plasma source and apparatus used to measure the etching rates, plasma neutral temperatures, and exhaust emissions.
- the remote plasma source is a commercial toroidal-type MKS ASTRON®ex reactive gas generator unit made by MKS Instruments, Andover, MA, USA.
- the feed gases e.g. oxygen, fluorocarbon, nitrogen source, Argon
- the oxygen is manufactured by Airgas with 99.999% purity.
- the fluorocarbon is Zyron® 8020 manufactured by DuPont with minimum 99.9 vol % of octafluorocyclobutane.
- Nitrogen source in the examples is nitrogen gas manufactured by Airgas with grade of 4.8 and Argon is manufactured by Airgas with grade of 5.0.
- the activated gas then passed through an aluminum water-cooled heat exchanger to reduce the thermal loading of the aluminum process chamber.
- the surface deposits covered wafer was placed on a temperature controlled mounting in the process chamber.
- the neutral temperature is measured by Optical Emission Spectroscopy (OES), in which rovibrational transition bands of diatomic species like C 2 and N 2 are theoretically fitted to yield neutral temperature. See also B. Bai and H. Sawin, Journal of Vacuum Science & Technology A 22 (5), 2014 (2004), herein incorporated as a reference.
- the etching rate of the surface deposits by the activated gas is measured by interferometry equipment in the process chamber.
- N 2 gas is added at the entrance of the pump both to dilute the products to a proper concentration for FTIR measurement and to reduce the hang-up of products in the pump.
- FTIR was used to measure the concentration of species in
- Example 1 The feeding gas composed of O 2 , Zyron® 8020 (C 4 F 8 ), Ar, N 2 , wherein O 2 flow rate is 1542 seem, Ar flow rate is 2333 seem, C Fs flow rate is 125 seem, N 2 flow rate is 0, 200, 400, 600 seem respectively. Chamber pressure is 2 torr.
- the feeding gas was activated by 400 KHz RF power to a neutral temperature of more than 5000 K. The activated gas then entered the process chamber and etched the SiO 2 surface deposits on the mounting with the temperature controlled at 200° C. The results are showed in Figure 2.
- Example 2 The feeding gas composed of O 2 , Zyron® 8020 (C F 8 ), Ar, N 2 , wherein 0 2 flow rate is 1750 seem, Ar flow rate is 2000 seem, C 4 F 8 flow rate is 250 seem, N 2 flow rate is 0, 100, 200, 300, 400, 500, 600 seem respectively. Chamber pressure is 2 torr.
- the feeding gas was activated by 400 KHz RF power to a neutral temperature of 5500 K.
- the activated gas then entered the process chamber and etched the SiO 2 surface deposits on the mounting with the temperature controlled at 200° C. The results are showed in Figure 3.
- the COF 2 concentration in the pump exhaust was monitored by FTIR and shown in Figure 4.
- Example 3 The initial feeding gas composed of O 2 , Zyron® 8020 (C F 8 ), Ar, wherein O 2 flow rate is 1750 seem, Ar flow rate is 2000 seem, C 4 F 8 flow rate is 250 seem.
- the process chamber pressure is 2 torr.
- the mounting with SiO 2 surface deposits on it was controlled at 100° C.
- the emission gases of C 4 F 8 , CO, CO 2 , C 2 F 6 , C 3 F 8 , CF 4 , COF 2 , N 2 O, NF 3 and SiF 4 were monitored by FTIR and shown in Figure 5.
- the plasma was ignited at the time of 250 seconds by 400 KHz RF power and the neutral temperature rose to about 5500 K.
- Example 4 The pretreatment gas mixture was composed of 100 seem of
- N 2 and 2000 seem of Ar. It was activated by 400 KHz RF power and the neutral temperature was about 2000 K. Starting at the 100 seconds and continuing for 3 seconds, the activated gas passed through from the remote chamber to the process chamber with the SiO 2 surface deposits on the mounting with the temperature controlled at 100° C. Then the gas mixture composing of 1750 seem O 2 and 250 seem Zyron® 8020 (C 4 F 8 ) were added in. The cleaning gas mixture was activated by 400 KHz RF power and the neutral temperature was about 5500 K. The process chamber pressure was 2 torr. The mounting with Si ⁇ 2 surface deposits on it was controlled at 100° C.
- the emission gases of C 4 F 8 , CO, CO 2 , C 2 F 6 , C 3 F 8 , CF 4 , COF 2 , N 2 O, NF 3 and SiF 4 were monitored by FTIR and shown in Figure 7a.
- the etching rate started at a high level, as shown in Figure 7b, and the COF 2 emission was low.
- cleaning gas mixture containing N 2 With cleaning gas mixture containing N 2 , the system was kept in a high etching rate state. At the time of about 500 seconds, N 2 was removed from the cleaning gas mixture, causing the etching rate to drop slowly and the COF 2 emission to increase slowly. At the time of 1850 seconds, 100 seem N 2 was added back to the cleaning gas mixture. As a result, etching rate jumped up, COF 2 emission dropped and the CO 2 emission increased immediately. The power was turned off at the 3160 seconds.
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- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Plasma & Fusion (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Power Engineering (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
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Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05760434A EP1737998A2 (en) | 2004-03-24 | 2005-03-24 | Remote chamber methods for removing surface deposits |
BRPI0508214-5A BRPI0508214A (en) | 2004-03-24 | 2005-03-24 | surface deposit removal methods |
JP2007505283A JP2007531289A (en) | 2004-03-24 | 2005-03-24 | Remote chamber method for removing surface deposits |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US55622704P | 2004-03-24 | 2004-03-24 | |
US60/556,227 | 2004-03-24 | ||
US64044404P | 2004-12-30 | 2004-12-30 | |
US64083304P | 2004-12-30 | 2004-12-30 | |
US60/640,833 | 2004-12-30 | ||
US60/640,444 | 2004-12-30 |
Publications (4)
Publication Number | Publication Date |
---|---|
WO2005090638A2 true WO2005090638A2 (en) | 2005-09-29 |
WO2005090638A9 WO2005090638A9 (en) | 2006-01-26 |
WO2005090638A3 WO2005090638A3 (en) | 2006-04-13 |
WO2005090638A8 WO2005090638A8 (en) | 2006-11-16 |
Family
ID=34965582
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/010692 WO2005098086A2 (en) | 2004-03-24 | 2005-03-24 | Remote chamber methods for removing surface deposits |
PCT/US2005/010691 WO2005095670A2 (en) | 2004-03-24 | 2005-03-24 | Remote chamber methods for removing surface deposits |
PCT/US2005/010693 WO2005090638A2 (en) | 2004-03-24 | 2005-03-24 | Remote chamber methods for removing surface deposits |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/010692 WO2005098086A2 (en) | 2004-03-24 | 2005-03-24 | Remote chamber methods for removing surface deposits |
PCT/US2005/010691 WO2005095670A2 (en) | 2004-03-24 | 2005-03-24 | Remote chamber methods for removing surface deposits |
Country Status (6)
Country | Link |
---|---|
EP (3) | EP1733072A2 (en) |
JP (3) | JP2007530792A (en) |
KR (3) | KR20070037434A (en) |
BR (3) | BRPI0508205A (en) |
TW (3) | TWI284929B (en) |
WO (3) | WO2005098086A2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007070116A2 (en) * | 2005-08-02 | 2007-06-21 | Massachusetts Institute Of Technology | Remote chamber method using sulfur fluoride for removing surface deposits from the interior of a cvd /pecvd- plasma chamber |
WO2015103003A1 (en) * | 2013-12-30 | 2015-07-09 | E. I. Du Pont De Nemours And Company | Chamber cleaning and semiconductor etching gases |
US20220059327A1 (en) * | 2018-12-25 | 2022-02-24 | Showa Denko K.K. | Adhesion removal method and film-forming method |
CN116145106A (en) * | 2023-02-21 | 2023-05-23 | 苏州鼎芯光电科技有限公司 | Cleaning method for semiconductor coating process chamber |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0697467A1 (en) * | 1994-07-21 | 1996-02-21 | Applied Materials, Inc. | Method and apparatus for cleaning a deposition chamber |
US7581549B2 (en) | 2004-07-23 | 2009-09-01 | Air Products And Chemicals, Inc. | Method for removing carbon-containing residues from a substrate |
US9034199B2 (en) | 2012-02-21 | 2015-05-19 | Applied Materials, Inc. | Ceramic article with reduced surface defect density and process for producing a ceramic article |
US9212099B2 (en) * | 2012-02-22 | 2015-12-15 | Applied Materials, Inc. | Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics |
US10240230B2 (en) * | 2012-12-18 | 2019-03-26 | Seastar Chemicals Inc. | Process and method for in-situ dry cleaning of thin film deposition reactors and thin film layers |
JP6202423B2 (en) * | 2013-03-05 | 2017-09-27 | パナソニックIpマネジメント株式会社 | Plasma cleaning method and plasma cleaning apparatus |
US9850568B2 (en) | 2013-06-20 | 2017-12-26 | Applied Materials, Inc. | Plasma erosion resistant rare-earth oxide based thin film coatings |
US11854773B2 (en) | 2020-03-31 | 2023-12-26 | Applied Materials, Inc. | Remote plasma cleaning of chambers for electronics manufacturing systems |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1304731A1 (en) * | 2001-03-22 | 2003-04-23 | Research Institute of Innovative Technology for the Earth | Method of cleaning cvd device and cleaning device therefor |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5158644A (en) * | 1986-12-19 | 1992-10-27 | Applied Materials, Inc. | Reactor chamber self-cleaning process |
-
2005
- 2005-03-24 EP EP05760380A patent/EP1733072A2/en not_active Withdrawn
- 2005-03-24 KR KR1020067021947A patent/KR20070037434A/en not_active Application Discontinuation
- 2005-03-24 KR KR1020067021948A patent/KR20070043697A/en not_active Application Discontinuation
- 2005-03-24 JP JP2007505281A patent/JP2007530792A/en not_active Withdrawn
- 2005-03-24 EP EP05734780A patent/EP1733071A2/en not_active Withdrawn
- 2005-03-24 JP JP2007505282A patent/JP2007531288A/en active Pending
- 2005-03-24 BR BRPI0508205-6A patent/BRPI0508205A/en not_active Application Discontinuation
- 2005-03-24 WO PCT/US2005/010692 patent/WO2005098086A2/en active Application Filing
- 2005-03-24 WO PCT/US2005/010691 patent/WO2005095670A2/en active Application Filing
- 2005-03-24 BR BRPI0508214-5A patent/BRPI0508214A/en not_active IP Right Cessation
- 2005-03-24 EP EP05760434A patent/EP1737998A2/en not_active Withdrawn
- 2005-03-24 KR KR1020067021949A patent/KR20070040748A/en not_active Application Discontinuation
- 2005-03-24 BR BRPI0508204-8A patent/BRPI0508204A/en not_active IP Right Cessation
- 2005-03-24 JP JP2007505283A patent/JP2007531289A/en not_active Withdrawn
- 2005-03-24 WO PCT/US2005/010693 patent/WO2005090638A2/en active Application Filing
- 2005-06-28 TW TW094121537A patent/TWI284929B/en not_active IP Right Cessation
- 2005-06-28 TW TW094121538A patent/TWI281714B/en not_active IP Right Cessation
- 2005-06-28 TW TW094121536A patent/TWI281715B/en not_active IP Right Cessation
Patent Citations (1)
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EP1304731A1 (en) * | 2001-03-22 | 2003-04-23 | Research Institute of Innovative Technology for the Earth | Method of cleaning cvd device and cleaning device therefor |
Non-Patent Citations (3)
Title |
---|
ALLGOOD C ET AL: "Evaluation of octafluorocyclobutane as a chamber clean gas in a plasma-enhanced silicon dioxide chemical vapor deposition reactor" JOURNAL OF THE ELECTROCHEMICAL SOCIETY, ELECTROCHEMICAL SOCIETY. MANCHESTER, NEW HAMPSHIRE, US, vol. 150, no. 2, 2003, pages G122-G126, XP002280013 ISSN: 0013-4651 * |
CRUDEN BRETT A ET AL: "Neutral gas temperature estimate in CF4/O2/Ar inductively coupled plasmas" APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 81, no. 6, 5 August 2002 (2002-08-05), pages 990-992, XP012033207 ISSN: 0003-6951 * |
OH C H ET AL: "Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistry" SURFACE & COATINGS TECHNOLOGY ELSEVIER SWITZERLAND, vol. 171, no. 1-3, 1 July 2003 (2003-07-01), pages 267-272, XP002362634 ISSN: 0257-8972 cited in the application * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007070116A2 (en) * | 2005-08-02 | 2007-06-21 | Massachusetts Institute Of Technology | Remote chamber method using sulfur fluoride for removing surface deposits from the interior of a cvd /pecvd- plasma chamber |
WO2007070116A3 (en) * | 2005-08-02 | 2007-09-07 | Massachusetts Inst Technology | Remote chamber method using sulfur fluoride for removing surface deposits from the interior of a cvd /pecvd- plasma chamber |
WO2015103003A1 (en) * | 2013-12-30 | 2015-07-09 | E. I. Du Pont De Nemours And Company | Chamber cleaning and semiconductor etching gases |
US10109496B2 (en) | 2013-12-30 | 2018-10-23 | The Chemours Company Fc, Llc | Chamber cleaning and semiconductor etching gases |
US20220059327A1 (en) * | 2018-12-25 | 2022-02-24 | Showa Denko K.K. | Adhesion removal method and film-forming method |
CN116145106A (en) * | 2023-02-21 | 2023-05-23 | 苏州鼎芯光电科技有限公司 | Cleaning method for semiconductor coating process chamber |
Also Published As
Publication number | Publication date |
---|---|
WO2005095670A3 (en) | 2006-05-04 |
WO2005090638A3 (en) | 2006-04-13 |
WO2005095670A2 (en) | 2005-10-13 |
BRPI0508204A (en) | 2007-07-17 |
WO2005098086A3 (en) | 2006-05-04 |
KR20070043697A (en) | 2007-04-25 |
JP2007531289A (en) | 2007-11-01 |
WO2005090638A8 (en) | 2006-11-16 |
WO2005098086A2 (en) | 2005-10-20 |
JP2007531288A (en) | 2007-11-01 |
TW200623281A (en) | 2006-07-01 |
TW200623251A (en) | 2006-07-01 |
TWI281715B (en) | 2007-05-21 |
EP1733071A2 (en) | 2006-12-20 |
TWI281714B (en) | 2007-05-21 |
BRPI0508214A (en) | 2007-07-17 |
TWI284929B (en) | 2007-08-01 |
TW200623240A (en) | 2006-07-01 |
JP2007530792A (en) | 2007-11-01 |
BRPI0508205A (en) | 2007-07-17 |
EP1737998A2 (en) | 2007-01-03 |
EP1733072A2 (en) | 2006-12-20 |
KR20070040748A (en) | 2007-04-17 |
KR20070037434A (en) | 2007-04-04 |
WO2005090638A9 (en) | 2006-01-26 |
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