WO2005027218A1 - 被処理体の搬送システム及び被処理体の搬送方法 - Google Patents
被処理体の搬送システム及び被処理体の搬送方法 Download PDFInfo
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- WO2005027218A1 WO2005027218A1 PCT/JP2004/013537 JP2004013537W WO2005027218A1 WO 2005027218 A1 WO2005027218 A1 WO 2005027218A1 JP 2004013537 W JP2004013537 W JP 2004013537W WO 2005027218 A1 WO2005027218 A1 WO 2005027218A1
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- delivery
- signal
- delivery mechanism
- communication interface
- wafer
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
- G05B19/41815—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by the cooperation between machine tools, manipulators and conveyor or other workpiece supply system, workcell
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
- H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67736—Loading to or unloading from a conveyor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/31—From computer integrated manufacturing till monitoring
- G05B2219/31002—Computer controlled agv conveys workpieces between buffer and cell
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/31—From computer integrated manufacturing till monitoring
- G05B2219/31216—Handshake between machine and agv; readiness to load, unload workpiece
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/33—Director till display
- G05B2219/33198—Laser, light link, infrared
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
Definitions
- the present invention relates to a transport system for a workpiece and a transport method for a workpiece, and more particularly, to a transport system for a workpiece that can increase the transport efficiency of the workpiece on a sheet-by-sheet basis.
- the present invention relates to a method of transporting an object.
- a prober is widely used as an inspection device for a semiconductor wafer (hereinafter, simply referred to as “wafer”).
- the prober usually includes a loader chamber and a prober chamber for performing an electrical characteristic inspection of a wafer-like device.
- the loader chamber includes a carrier mounting portion for mounting a carrier containing a plurality of (for example, 25) wafers, and a carrier force of the carrier mounting portion.
- a mechanism hereinafter, referred to as an “arm mechanism” and a bri-alignment mechanism (hereinafter, referred to as a “sub chuck”) for performing pre-alignment of a wafer transferred via the arm mechanism.
- the wafers in the carrier are taken out one by one via the arm mechanism, and are transferred into the prober chamber after the briar alignment is performed.
- the prober chamber includes a mounting table (hereinafter, referred to as a "main chuck") that moves in the X, ⁇ , ⁇ , and ⁇ directions for mounting a wafer, and a wafer chuck in cooperation with the main chuck.
- An alignment mechanism for performing the alignment, a probe card arranged above the main chuck, and a test head interposed between the probe force card and the tester are provided.
- the electrical characteristics of the wafer are tested by contacting the aligned wafer with the probes of the probe card. Thereafter, the wafer is returned from the prober chamber to the original position in the carrier via the arm mechanism of the loader chamber.
- the present invention has been made to solve the above-described problems, and it is an object of the present invention to improve the transfer efficiency between an automatic transfer device and a processing facility and to reduce the TAT of a work to be transferred. It is an object of the present invention to provide a system and a method of transporting an object to be processed. Another object of the present invention is to provide a transfer system and a transfer method for an object, which can enhance the communication efficiency between the automatic transfer device and the processing equipment! Puru.
- the present invention includes a plurality of semiconductor handling devices, and an automatic transfer device for automatically transferring an object to be processed among the plurality of semiconductor handling devices one by one.
- the first delivery mechanism and the second delivery mechanism can continuously deliver the object to be processed one by one between the first delivery mechanism and the second delivery mechanism.
- the parallel IZO communication interface and the second optical coupling parallel IZO communication interface transmit and receive an optical signal as a control signal for controlling the first transfer mechanism or the second transfer mechanism between each other. I can do it This is a transport system for an object to be processed.
- the transfer efficiency between the plurality of semiconductor handling devices and the automatic transfer device can be increased, and the size of the object to be processed can be reduced.
- the semiconductor handling device is a semiconductor manufacturing device.
- the semiconductor handling device is a semiconductor inspection device.
- the semiconductor handling device is a semiconductor storage device.
- the present invention provides a semiconductor handling device having a first delivery mechanism, a first optical coupling parallel communication interface, a second delivery mechanism, and a second optical coupling parallel communication mechanism.
- An automatic transfer device having a communication interface, wherein the first transfer mechanism and the second transfer mechanism can transfer the object to be processed one by one between each other.
- the first optically-coupled parallel communication interface and the second optically-coupled parallel communication interface are connected to each other by the first transfer mechanism or the second transfer Transmitting and receiving optical signals as control signals for controlling the mechanism
- the optical communication between the first optically coupled parallel IZO communication interface and the second optically coupled parallel IZO communication interface A continuous delivery notification step in which a continuous delivery possible notification is made between the automatic transfer device and the semiconductor handling device, and an object to be processed between the first delivery mechanism and the second delivery mechanism. And a continuous delivery step in which pieces are continuously delivered one by one.
- the transfer efficiency between the semiconductor handling device and the automatic transfer device can be increased, and the size of the object to be processed can be reduced.
- the automatic communication is performed by optical communication between the first optically coupled parallel communication interface and the second optically coupled parallel communication interface.
- a transfer start notifying step in which a transfer start notification is made from the transfer device to the semiconductor handling device; and, after the transfer start notifying step, the second transfer based on the presence or absence of the object to be processed in the first transfer mechanism.
- a continuous delivery possible notification is made from the automatic transport device to the semiconductor handling apparatus, and the continuous delivery notification step and the delivery start notification step are performed. Are preferably performed substantially simultaneously at the same time. In this case, the communication efficiency between the automatic transfer device and the semiconductor handling device can be increased.
- the second transfer mechanism may be configured to reduce the force of the first transfer mechanism.
- the evacuation confirmation notifying step in which the semiconductor handling device notifies the automatic transport apparatus by communication, and, after the evacuation confirmation notifying step, the second transfer mechanism transmits the second transfer mechanism based on a result of the evacuation confirmation step.
- a retreating step of retreating from the transfer mechanism of (1), and after the retreating step, the automatic transport is performed by optical communication between the first optically coupled parallel iZo communication interface and the second optically coupled parallel communication interface.
- a delivery completion notification step for giving a delivery completion notification to the semiconductor handling device.
- a step of delivering the object to the second delivery mechanism force to the first delivery mechanism may be repeated.
- the second delivery mechanism receives the first delivery mechanism force to be processed, and the second delivery mechanism force separates the first delivery mechanism from the first delivery mechanism. And delivering the body can be performed continuously.
- FIG. 1 is a schematic view showing one embodiment of a system for transporting an object to be processed according to the present invention.
- FIG. 1 is a schematic diagram showing a configuration of an RGV.
- FIG. 2 is a plan view schematically showing a state of transferring a wafer between a prober and an RGV.
- FIG. 2 is a cross-sectional view showing a main part of FIG. 2 ⁇ .
- FIG. 3 is an explanatory diagram for explaining wafer transfer when a virtual load port is set in a prober.
- FIG. 4 is a configuration diagram showing a communication interface used for communication of the transport system shown in FIG. 1.
- FIG. 5 is a timing chart of optical communication applied to an embodiment of the method for transporting an object of the present invention.
- FIG. 6 is a timing chart of optical communication applied to another embodiment of the method for transporting an object to be processed according to the present invention.
- FIG. 7 is a timing chart of optical communication applied to still another embodiment of the method for transporting an object to be processed according to the present invention.
- FIG. 8 is a timing chart of optical communication applied to still another embodiment of the method for transporting an object to be processed according to the present invention.
- FIG. 9 is a timing chart of optical communication applied to still another embodiment of the method of transporting an object to be processed according to the present invention.
- FIG. 10 is a timing chart of optical communication applied to still another embodiment of the method for transporting an object to be processed according to the present invention.
- FIG. 11 is a timing chart of optical communication applied to still another embodiment of the method of transporting an object to be processed according to the present invention.
- FIG. 12 is a timing chart of optical communication applied to still another embodiment of the method of transporting an object to be processed according to the present invention.
- FIG. 13 is a timing chart of optical communication applied to still another embodiment of the method for transporting an object to be processed according to the present invention.
- FIG. 14 is a timing chart of optical communication applied to still another embodiment of the method for transporting an object to be processed according to the present invention.
- FIG. 15 is a timing chart of optical communication applied to still another embodiment of the method of transporting an object to be processed according to the present invention.
- an object handling system (Automated Material Handling System (AMHS)) E performs an inspection process of a wafer (not shown) as an object to be processed.
- a host computer 1 that manages the production process of the entire factory including the same, a prober 2 that is a plurality of inspection devices that perform an electrical characteristic inspection of wafers under the control of the host computer 1, and a prober 2 for each of these.
- a plurality of automatic transfer devices (hereinafter referred to as “RGV”) 3 that automatically transfer wafers one by one as required, and a transfer control device (hereinafter “RGV controller”) that controls these RGV3s. 4) and is provided.
- Probe 2 and RGV3 are optically coupled parallel IZOs based on SEMI standards E23 and E84. , "PIO". ) A communication interface is provided, and PIO communication is performed between the two to transfer wafers W one by one to each other.
- the prober 2 is configured as a single wafer type prober 2 that receives a wafer W in single wafer units and performs inspection.
- the RGV controller ⁇ 4 is connected to the host computer ⁇ 1 via a SEC (Semiconductor Equipment Community Standard) communication line, and controls the RGV3 via wireless communication under the control of the host computer 1. Wafers W are managed in lot units.
- SEC semiconductor Equipment Community Standard
- the plurality of probers 2 are connected to the host computer 1 via the group controller 5 and further via the SECS communication line.
- the host computer 1 manages a plurality of probers 2 via the group controller 5.
- the group controller 5 manages information on inspection of the prober 2 such as recipe data and log data.
- a tester 6 is connected to each prober 2 via a SECS communication line.
- each prober 2 individually performs a predetermined inspection according to a command from the corresponding tester 6.
- These testers 6 are connected to a host computer 1 via a tester host computer (hereinafter, referred to as “tester host”) 7 and further via a SECS communication line.
- tester host a tester host computer
- SECS communication line a SECS communication line
- a marking device 8 for performing a predetermined marking based on a wafer inspection result is connected to the host computer 1 via a marking instruction device 9.
- the marking instruction device 9 is configured to instruct marking to the marking device 8 based on the data of the tester host 7.
- a stocker 10 for storing a plurality of buffers B (or cassettes) corresponding to a plurality of wafer sizes is connected to the host computer 1 via a SECS communication line. This allows the stocker 10 to store (sort) the wafers before and after the inspection on a single-wafer basis and to put wafers in and out on a single-wafer basis under the control of the host computer 1.
- the prober 2 includes a loader room 21 and a prober room 22 as shown in FIG. 2A.
- the loader chamber 21 has an adapter 23, an arm mechanism 24, and a sub chuck 25.
- the components other than the adapter 23 are configured according to the conventional prober.
- the adapter 23 is configured as a first transfer mechanism that transfers wafers W one by one to the RGV3.
- the arm mechanism 24 has upper and lower arms 241. Each arm 241 holds the wafer W by vacuum suction and releases the wafer W by releasing the vacuum suction. As a result, each arm 241 can transfer the wafer to and from the adapter 23 and transfer the received Ueno and W to the prober chamber 22.
- the sub-chuck 25 performs the bri-alignment while the arm mechanism 24 conveys the wafer W.
- the prober chamber 22 has a wafer chuck 26, an alignment mechanism 27, and a probe card 28.
- the main chuck 26 is configured to move in the X and Y directions via the X and Y tables 261 and to move in the Z and ⁇ directions via a lifting mechanism and a rotating mechanism (not shown).
- the alignment mechanism 27 has an alignment bridge 271, a CCD camera 272, and the like, as is conventionally known, and performs alignment between the wafer W and the probe card 28 in cooperation with the main chuck 26.
- the probe card 28 has a plurality of probes 281.
- the wafer W is connected to the tester 6 (see FIG. 1A) via a test head (not shown) by making electrical contact between the probe 281 and the wafer on the main chuck 26.
- the adapter 23 includes a vertically movable sub chuck 231 having a vacuum suction mechanism.
- the sub chuck 231 moves up and down and sucks and releases the wafer W via a vacuum suction mechanism. More specifically, the sub chuck 231 moves up and down between the arm mechanism 24 and an arm mechanism of an RG V3 described later when transferring the wedges and Ws.
- the RGV 3 is a buffer which is disposed at one end of the apparatus main body 31 and at one end of the apparatus main body 31 and on which the buffer B for storing the wafer W is placed.
- the wafer W of the buffer B is transferred to a plurality of probers 2 one by one.
- the equipment on which the RGV3 is mounted is mechanically configured in accordance with the AGV described in JP-A-2002-217263.
- the arm mechanism 34 is a wafer transfer mechanism mounted on the RGV3.
- the arm mechanism 34 is configured to rotate and move up and down when the wafer W is transferred. That is, as shown in FIGS. 2A and 2B, the arm mechanism 34 includes upper and lower two-stage arms 341 (341A and 341B) for vacuum-sucking the ueno and W, and a front support for supporting these arms 341 so as to be able to move back and forth. It includes a base 342 that can rotate in the reverse direction, and a drive mechanism (not shown) housed in the base 342. When the wafer W is transferred, the upper and lower arms 341 individually move back and forth on the base 342 via the driving mechanism as described later, and the base 342 is transferred in the direction in which the wafer W is transferred. Rotates forward and backward.
- the arm mechanism 34 When the RGV 3 reaches the transfer position of the wafer W to the prober 2, the arm mechanism 34 is driven in the RGV 3 and the wafers W in the buffer B are taken out one by one while being centered. When the arm mechanism 34 takes out one wafer W with the buffer B force, it rotates 90 ° as shown in FIG. 3 and delivers the wafer W to the adapter 23 of the prober 2.
- the RGV3 is also required to transfer the wafer W directly to the main chuck 26 in the prober chamber 22 again. There is no need for alignment. In other words, the centering of the wafer W in the RGV3 plays a role of positioning when the wafer W is directly transferred from the RGV3 to the main chuck 26 in the prober chamber 22.
- the arm mechanism 34 of the RGV3 exchanges the wafer W with the adapter 23 of the prober 2
- the optically coupled PIO communication is performed between the prober 2 and the RGV3 as described above.
- RGV3 and prober 2 are equipped with PIO communication interfaces 11A and 11B (see Fig. 1A and Fig. 4), respectively, and transfer one wafer W using PIO communication with each other. It is designed to do it accurately.
- the RGV3 has a signal line for controlling the vacuum suction mechanism (not shown) of the arm mechanism 34 and a signal line for controlling the upper and lower arms 341 in response to the communication line defined by the conventional SEMI standard. are doing.
- the prober 2 includes one adapter (hereinafter, referred to as “actual load port” as necessary) 23 as a load port for transferring the wafer W.
- at least one virtual load port 23V is set in the prober 2 separately from the actual load port 23 on the software.
- it functions as a virtual port port 23V on the unload arm 241 or unload table (not shown) 1S software.
- the PIO communication using the optical signal L is used, By switching the load port numbers of the PIO communication interfaces 11 A and 1 IB shown in Fig. 4 on the software and specifying the virtual load port 23V, even if the wafer W exists in the prober 2, a new wafer W can be inserted.
- the inspected wafer W is held at the virtual load port 23V, and the adapter 23 can wait for the next wafer W.
- the virtual load port 23V in this way, the unloading arm 241 and unload table (not shown) can be fully utilized, the throughput can be improved, and the extra actual load can be achieved. It is possible to prevent an increase in footprint and equipment costs that do not require a port.
- the transfer system E of the present embodiment has a unique PIO communication interface for accurately transferring the wafer W between the arm mechanism 34 of the RGV 3 and the adapter 23 of the prober 2. It has 11A and 1 IB.
- Each of the PIO communication interfaces 11A and 11B is configured as a 14-bit interface having 14 ports as shown in FIG. 4, and the first to tenth bit ports are configured as shown in FIG. In other words, some of the bit ports are assigned optical signals (such as the AENB signal, AENB2 signal, PENB signal, and PENB2 signal described later) that control the sub chuck 231 of the adapter 23 and the arm mechanism 34 of the RGV3.
- a method of transferring the wafer W between the RGV3 and the prober 2 using the PIO communication via the PIO communication interfaces 11A and 11B will be described with reference to timing charts shown in Figs. .
- FIG. 5 shows a timing chart of a transfer method for continuously loading the wafer W between the RGV and the prober
- FIG. 6 shows the unloading and loading of the wafer W between the RGV and the prober
- FIG. 7 shows a timing chart of a transfer method in which unloading and loading of the wafer W are simultaneously performed between the RGV and the prober
- FIGS. 8 and 12 show RGVs.
- Fig. 13—Fig. 15 shows a timing chart of the transfer method for transferring the wafer W by skipping the sequence control signal between the RGV and the prober. The following shows a timing chart of the continuous transfer method.
- the RGV 3 moves to the front of the prober 2 (the wafer transfer position) under the control of the RGV controller 4. .
- the mapping sensor 33 advances to the buffer B side and the arm mechanism 34 moves up and down. While the arm mechanism 34 moves up and down, the mapping of the wafer W in the buffer B is performed via the mapping sensor 33.
- the upper arm 341A of the arm mechanism 34 moves forward and enters the buffer B from slightly below the predetermined wafer W.
- the centering of the wafer W is performed by the upper arm 341A and the buffer B. After that, the wafer W is taken out. By this centering process, the position of the wafer W with respect to the main chuck 26 is automatically performed. Therefore, the wafer W can be directly delivered from the RGV 3 to the main chuck 26.
- the pre-alignment of the wafer W is performed via the pre-alignment sensor 36 while the sub chuck 35 rotates. . Thereafter, the sub chuck 35 stops rotating and descends, and the wafer W is returned to the upper arm 341A.
- the OCR37 Read the code to identify the Ueno, W lot. After that, the arm mechanism 34 is rotated by 90 ° so that the arm mechanism 34 faces the adapter 23 of the prober 2.
- the ID code of the wafer W identified by the OCR 37 is notified from the RGV 3 to the host computer 1 via the RGV controller 4, and further notified from the host computer 1 to the prober 2.
- the RGV3 transmits a high-state CS-0 signal and a low-state CS-1 signal to the prober 2, and then transmits a high-state VALID signal.
- the CS-0 signal is a signal for instructing the loading of the wafer W in the high state
- the CS-1 signal is a signal for instructing the unloading of the wafer W in the high state.
- the CS-1 signal remains low. If the CS-0 signal is in the high state as described above, the VALID signal is maintained in the high state, and it is confirmed whether or not the adapter 23 of the prober 2 is in a state capable of receiving the wafer W.
- the prober 2 When the prober 2 receives the VALID signal, as shown in FIG. 5, the prober 2 sets the L_REQ signal to the high state and transmits the signal to the RGV 3 to notify that the load is possible.
- a signal enclosed by ⁇ > is a signal to the stocker 10 and has no relation to the transfer of the wafer W to and from the prober 2.
- the RGV 3 upon receiving the L-REQ signal, sets the TR-REQ signal to the high state to start loading the wafer W, transmits the signal to the prober 2, and sends the signal to the prober 2. Notifies that wafer W can be transferred.
- the prober 2 When the prober 2 receives the TR-REQ signal, it sets the READY signal to a high state and transmits it to the RG V3 to notify the RGV 3 that the adapter 23 is accessible. Further, in the prober 2, the sub chuck 231 of the adapter 23 (shown as “adapter Z-axis” in FIG. 5; the same applies to the drawings after FIG. 6) raises the wafer W and removes the wafer W. stand by.
- the RGV3 When the RGV3 receives the READY signal from the prober 2, the RGV3 sets the BUSY signal to the high state and transmits the signal to the prober 2, as shown in FIG. 5, to start the transfer of the wafer W to the prober 2. Notice. RGV3 sets the CONT signal to Hi at the same time as sending the BUSY signal. gh state and sends it to prober 2 to inform prober 2 that it is in continuous transport mode.
- the CONT signal is used to continuously transfer two wafers W to prober 2, that is, to continuously transfer untested wafers and W to prober 2, or to check prober 2 for inspected wafers. , A signal indicating that an uninspected ueno, W, should be delivered after delivery.
- the prober 2 When the prober 2 receives the BUSY signal and recognizes the start of conveyance, it sets the AENB signal to a high state and transmits it to the RGV 3 to notify that the arm mechanism 34 can be accessed.
- the AEN B signal is sent from probe 2 to RGV3 when prober 2 receives the BUSY signal in the high state from RGV3.
- the AENB signal goes high when the wafer W is loaded and the sub chuck 231 of the adapter 23 is in the raised position and can load the wafer W without holding the wafer W.
- the chuck 231 When the chuck 231 is in the raised position, the wafer W is held and the wafer W can be unloaded.
- the AENB signal goes low while the sub chuck 231 of the adapter 23 detects the wafer W and confirms the loading of the wafer W, and at the time of unloading, the sub chuck 231 detects the wafer W. When it is gone, the AENB signal goes low.
- RGV3 When RGV3 receives the AENB signal in the High state, it starts loading the wafer W from RGV3 as shown in FIG. That is, the arm mechanism 34 advances into the adapter 23 of the prober 2 and transports the wafer W to a position directly above the sub chuck 231 of the adapter 23.
- the RG V3 transmits a PENB signal to the prober 2 at the same time when the arm mechanism 34 moves into the adapter 23.
- the prober 2 activates the vacuum suction mechanism of the sub chuck 231 of the adapter 23 based on the PENB signal in the high state, changes the AENB2 signal to the high state, and transmits the signal to the RGV3.
- the PENB signal is a signal for controlling ON / OFF of the vacuum suction mechanism of the sub chuck 231 of the adapter 23, and is in a low state to turn off the vacuum suction mechanism at the time of loading.
- the state becomes high to turn on the vacuum suction mechanism.
- the arm mechanism 34 is retracted to RGV3 and the loading of the wafer W is completed, the state becomes low.
- the AENB2 signal is a signal for driving and controlling the RGV3 arm mechanism 34 and its vacuum suction mechanism. At the time of loading, the arm mechanism 34 is lowered and vacuum suction is performed. When the mounting mechanism is released and the wafer W is transferred from the arm mechanism 34 to the sub chuck 231 of the adapter 23, the state becomes low.
- RGV3 sets the PE NB2 signal to the high state when the arm mechanism 34 completes the descending operation and transfers the wafer W to the sub chuck 231 of the adapter 23 based on the high state AENB2 signal from the prober 2, and sets the prober to the high state. 2 to notify the end of delivery.
- the PENB2 signal is a signal indicating the end of the transfer of the wafer W
- the arm mechanism 34 also indicates the end of the transfer of the wafer W to the adapter 23 at the time of loading.
- the prober 2 Based on the PENB2 signal in the high state, the prober 2 checks the wafer W on the sub chuck 23 and then switches all of the AENB signal, the AENB2 signal, and the L-REQ signal to the low state, and Is transmitted to RGV3 to notify that the loading of wafer W has been completed.
- the arm mechanism 34 retreats from the adapter 23 to the RGV3.
- RGV3 switches the TR-REQ signal, BUSY signal, PENB signal, PENB2 signal, and CONT signal to the low state, and switches the COMPT signal to the high state, and sends each signal to the prober 2.
- the prober 2 sets the READY signal to a low state and transmits it to the RGV3 as shown in Fig. 5, and notifies that the transfer operation of the first wafer W has been completed, and , COMPT signal is switched to the low state, and the transfer operation of the first wafer W is completed.
- the arm mechanism 24 receives the wafer W from the sub chuck 231 of the adapter 23.
- the arm mechanism 24 stores Ueno and W in the virtual load port 23V and prepares for the next inspection.
- the electrical characteristics inspection of the wafer W is performed in the prober room 22.
- the arm mechanism 24 and the sub chuck 25 cooperate with each other to perform a wafer W alignment, as shown in FIG. 1A.
- the wafer W is delivered to the main chuck 26, and the wafer W is aligned via the alignment mechanism 27. Thereafter, the wafer W is brought into electrical contact with the probe 281 of the probe card 28 while performing the index feed of the main chuck 26.
- the electrical characteristics of the wafer w are inspected.
- the RGV3 takes out the second wafer W from the buffer B based on the CONT signal, and Start the loading process. That is, the second wafer W is transferred between the RGV 3 and the prober 2 in the same procedure as the first wafer W.
- the arm mechanism 24 Upon receiving the second wafer W in the same manner as the first wafer, the arm mechanism 24 stores the wafer W in the virtual load port 23V as necessary.
- a mode in which a plurality of wafers W are simultaneously taken out of the buffer B by a plurality of arms may be employed.
- the arm mechanism 24 advances to the main chuck 26, receives the wafer W, and stores it in the sub chuck 231 of the adapter 23 or the virtual load port 23V. Thereafter, under the control of the RGV controller 4, the RGV3 moves before the prober 2. When the RGV3 contacts the prober 2, the adapter 23 starts transferring the wafer W to the RGV3.
- the adapter 23 and the arm mechanism 34 are sequence-controlled by the optical communication via the PIO communication interfaces 11A and 11B according to the operating status of the prober 2.
- the two wafers W can be continuously loaded from the RGV3 to the prober 2.
- the transfer distance and transfer time by the RGV3 can be shortened to increase transfer efficiency, and in turn, the TAT can be shortened to increase production efficiency.
- the wafer W is unloaded, and then the wafer W is loaded.
- the RGV3 moves in front of the predetermined prober 2 based on the instruction from the RGV controller 4, and the CS in the low state with respect to the prober 2 0 signal (finger load VALID signal after transmitting the CS-1 signal (signal indicating unloading) and the CS-1 signal in the high state (signal to instruct unloading). This enables the unload mode.
- the prober 2 When the prober 2 receives the VALID signal, as shown in FIG. 6, the prober 2 sets the U-REQ signal to a high state and transmits the signal to the RGV 3 to notify that the wafer W is to be unloaded.
- the RGV3 sends the TR-REQ signal to the prober 2 in a high state based on the U-REQ signal, and transmits the wafer W to the prober 2. Notify when it is possible.
- the prober 2 sets the READY signal to a high state based on the TR-REQ signal, transmits the signal to the RGV3, and notifies the RGV3 that access is possible.
- the RGV 3 When the RGV 3 receives the READY signal, it sets the BUSY signal to the high state and the CNT signal to the high state, and transmits each signal to the prober 2. As a result, the prober 2 and the RGV3 enter a continuous transfer mode in which unloading and loading are continuously performed. Then, based on the CS-1 signal in the high state, unloading is performed prior to loading.
- the prober 2 sets the AENB signal to the high state based on the BUSY signal in the high state, transmits the signal to the RGV3, and notifies that RGV3 can be unloaded.
- RGV3 Based on this notification, in RGV3, the arm mechanism 34 advances into the adapter 23. RGV3 sets the PENB signal to the high state and transmits it to prober 2 to notify that it can be unloaded.
- the prober 2 releases the vacuum chucking mechanism of the sub chuck 231 at the ascending position based on the PENB signal, then sets the AENB2 signal to a high state, transmits the signal to the RGV3, and notifies the RGV3 that unloading is possible. I do.
- the arm mechanism 34 moves up based on the AENB2 signal in the high state, and the arm of the arm mechanism 34 vacuum-adsorbs the wafer W, and unloads the wafer W from the sub chuck 231.
- the RGV 3 sets the PENB 2 signal to a high state and transmits it to the prober 2 to notify the prober 2 that the wafer W has been unloaded.
- the PENB2 signal in the High state indicates that the unloading of the wafer W from the adapter 23 to the arm mechanism 34 has been completed at the time of unloading.
- the prober 2 receives the PENB2 signal in the High state, as shown in FIG.
- the prober 2 activates the vacuum suction mechanism of the sub chuck 231 of the adapter 23 based on the signal, and the wafer on the sub chuck 231 is actuated. Check the W. Immediately after confirming this, turn off the vacuum suction mechanism.
- the prober 2 sets the AENB signal, the AENB2 signal, and the U-REQ signal to a low state and transmits each signal to the RGV3, and the wafer W Notify RGV3 of completion of unload confirmation.
- the arm mechanism 34 retreats from the adapter 23 to the RGV3.
- the RGV3 sets the TR-REQ signal, the BUS Y signal, the PENB signal, and the PENB2 signal to! As shown in FIG. Then, these signals are transmitted to the prober 2 to notify the prober 2 of the retreat of the arm mechanism 34.
- prober 2 sets the READY signal to the low state and transmits it to RGV3.
- the RGV3 switches the CS-0 signal and the VALID signal to the low state, and ends the unloading operation of the wafer W.
- the arm mechanism 34 When the unloading of the wafer W is completed, in the RGV3, the arm mechanism 34 returns the unloaded wafer W to the original position in the buffer B, removes the uninspected wafer W from the buffer B, and Ready to load W.
- the wafer W is loaded from the RGV 3 to the adapter 23 of the prober 2 based on the same sequence control as the above-described series of load transfer operations.
- the unloading of wafer W from 2 to RGV3 and the loading of wafer W from RGV3 to prober 2 can be performed continuously.
- the transfer distance and transfer time by the RGV3 can be shortened to increase the transfer efficiency, and in turn, the TAT can be reduced to increase the production efficiency.
- the RGV 3 sets the TR-REQ signal to the high state, transmits the signal to the prono 2, and Ueno notifies that W is ready to be transported.
- the prober 2 sets the READY signal to a high state based on the TR-REQ signal, transmits the signal to the RGV3, and notifies the RGV3 that access is possible.
- the RGV 3 When the RGV 3 receives the READY signal, it sets the BUSY signal to the high state and transmits the signal to the prober 2.
- the prober 2 sets the AENB signal to the high state based on the BUSY signal in the high state, transmits the AENB signal to the RGV3, and notifies that the transfer is possible.
- the upper and lower arms 341 of the arm mechanism 34 simultaneously advance into the adapter 23, and the vacuum suction mechanism of the lower arm 341 operates, so that the lower arm 341 can unload. Become like At this time, the upper arm 341 of the arm mechanism 34 holds the wafer W for loading via the vacuum suction mechanism. Subsequently, the RGV3 sets the PENB signal to the high state and transmits it to the prober 2 to notify that it can be unloaded.
- the prober 2 releases the vacuum chucking mechanism of the sub-chuck 231 at the ascending position based on the PENB signal so that the wafer W can be unloaded, sets the AENB2 signal to the high state, and transmits the signal to the RGV3. Notify RGV3 that unloading is possible.
- the arm mechanism 34 rises based on the AENB2 signal in the high state, The arm 341 vacuum-adsorbs the wafer W and unloads the wafer W from the sub chuck 231.
- the RGV3 sets the PENB2 signal to a high state and transmits the signal to the prober 2 to notify the prober 2 that the wafer W has been unloaded.
- the prober 2 When the prober 2 receives the PENB2 signal in the high state, as shown in FIG. 7, the prober 2 activates the vacuum suction mechanism of the sub chuck 231 of the adapter 23 based on the signal, and the wafer on the sub chuck 231 is actuated. Check the W. Immediately after confirming this, turn off the vacuum suction mechanism. When the prober 2 confirms that the wafer W has been removed from the sub chuck 231 by this confirmation operation, the prober 2 sets the AENB signal, the AENB2 signal, and the U-REQ signal to the low state and transmits each signal to the RGV3, and the wafer W Notify RGV3 of the end of unloading.
- RGV3 sets the PENB signal and the PENB2 signal to the Low state, and transmits each signal to prober 2.
- Prober 2 switches the AENB signal to the high state again, and transmits this signal to RGV3.
- the RGV 3 releases the vacuum suction mechanism of the upper arm 341 of the arm mechanism 34 based on the AENB signal in the High state, and makes the loading wafer W ready for loading. After releasing the vacuum suction mechanism of the upper arm 341, the RGV 3 also switches the PENB signal to the low state and the high state, and transmits this signal to the prober 2 to notify that the access is possible.
- the prober 2 operates the vacuum chucking mechanism of the sub chuck 231 of the adapter 23 again based on the PENB signal in the high state, confirms that there is no wafer W on the sub chuck 231, and then returns the AENB 2 Switch the signal to High state and send this signal to RGV3
- the RGV3 retreats the lower arm 341 (holding the unloaded wafer W) of the arm mechanism 34 from the prober 2 to the RGV3 based on the AENB2 signal in the high state. Lower the arm mechanism 34. After the arm mechanism 34 descends and the upper arm 34 1 transfers the wafer W to the sub chuck 231, the PENB2 signal is switched from the low state to the high state, and this signal is transmitted to the prober 2. [0091] Based on the PENB2 signal in the high state, prober 2 switches the AENB signal, AENB2 signal, and L-REQ signal from the high state to the low state, and transmits these signals to RGV3. Notifies the end of loading.
- the upper arm 341 retreats from prober 2 to RGV3 based on this signal.
- the RGV3 sets the COMPT signal to the high state, transmits the signal to the prober 2, and notifies the prober 2 of the retreat of the arm.
- the prober 2 sets the READY signal to the low state and transmits the signal to the RGV3.
- RGV3 Based on the READY signal in the low state, RGV3 switches all of the CS-0 signal, CS-1 signal, VA LID signal, and COMPT signal to the low state to unload the wafer W. And the loading operation is completed.
- the arm The wafer W can be unloaded and loaded continuously without having to retract the mechanism 34 from the prober 2 at all.
- the transfer distance and the transfer time can be further reduced to increase the transfer efficiency, and in turn, the TAT can be shortened to increase the production efficiency.
- the timing chart of FIG. 8 corresponds to the case where the wafer W is loaded.
- RGV3 sets the CS-0 signal, TR-REQ signal, BUSY signal, and PENB signal to the High state at the same time, and sends it to Prober 2.
- the VALID signal is transmitted. This enables the load mode.
- RGV3 is a CS-0 signal other than PENB2 signal, TR REQ signal, BUSY signal and PE When all the NB signals are transmitted at the same time, these signals become valid in the prober 2. As a result, the RGV3 can load the wafer W without waiting for communication of a response signal to each signal from the prober 2, thereby shortening the communication time by, for example, 940 ms or more per load. .
- this causes the arm mechanism 34 to advance from the RGV 3 onto the adapter 23 of the prober 2, descend, and deliver the wafer W to the sub chuck 231 of the adapter 23.
- the RGV3 sets the PENB2 signal to the high state and transmits the signal to the prober 2.
- the prober 2 switches the AENB signal, AENB2 signal, READY signal, and L-REQ signal to the low state, and transmits these signals to RG V3. Notifies the end of loading.
- the arm mechanism 34 retreats from the adapter 23 to RGV3 based on this signal.
- the RGV3 sets the COMPT signal to the high state and transmits it to the prober 2 to notify the prober 2 of the evacuation of the arm.
- the prober 2 sets the READY signal to the low state and transmits it to the RGV3.
- the RGV 3 switches all of the CS-0 signal, the VALID signal and the COMPT signal to the low state based on the low state READY signal, and ends the wafer W loading operation.
- the wafer W is transferred from the RGV 3 to the prono 2 according to the transfer method of the object proposed by the present applicant in Japanese Patent Application Laid-Open No. 2002-217263.
- the skip mode communication when reading, the communication time between RGV3 and prober 2 can be shortened, the communication efficiency can be increased, and the TAT can be further shortened to increase the production efficiency.
- the timing chart of FIG. 9 corresponds to the case where the wafer W is unloaded.
- RGV3 when PIO communication between RGV3 and prober 2 is started, RGV3 simultaneously sets the CS-1 signal, TR-REQ signal, BUSY signal, and PENB signal to the High state, respectively. After transmitting to the prober 2 to notify that the wafer W is to be unloaded, the VALID signal is transmitted. This enables the unload mode.
- the prober 2 when the prober 2 receives the VALID signal, all of the CS-1 signal, the TR-REQ signal, the BUSY signal, and the PENB signal become valid. Then, when the prober 2 receives the VALID signal, as shown in FIG. 9, the sub chuck 231 of the adapter 23 releases the vacuum suction mechanism at the raised position to enable unloading, and thereafter, the prober 2
- the AENB signal, AENB2 signal, READY signal, and U-REQ signal are all set to the High state at the same time and transmitted to RGV3.
- this causes the arm mechanism 34 to advance from the RGV 3 onto the adapter 23 of the prober 2, move up, and draw the wafer W from the sub chuck 231 of the adapter 23.
- the RGV3 sets the PENB2 signal to the high state and transmits it to the prober 2.
- the prober 2 detects the presence or absence of the wafer W on the sub chuck 231 by operating the vacuum suction mechanism of the sub chuck 231 of the adapter 23 based on the PENB2 signal in the high state. After confirming that the AENB signal, the AENB2 signal and the U-REQ signal are all switched to the low state, these signals are transmitted to RGV3 to notify the end of unloading. In RGV3, the arm mechanism 34 retreats from the adapter 23 to RGV3 based on these signals.
- the RGV3 switches the PENB2 signal to the high state and the low state, and also switches the COMPT signal to the high state and transmits it to the prober 2 to notify the prober 2 of the retreat of the arm.
- the prober 2 sets the READY signal to the low state and transmits the signal to the RGV3.
- the RGV3 switches all of the CS-1 signal, the VALID signal, and the COMPT signal to the low state based on the low state READY signal, and ends the unloading operation of the wafer W.
- the prober 2 transfers the wafer to the RGV3 from the prober 2 to the RGV3.
- the communication time between the RGV3 and the server 2 can be shortened, the communication efficiency can be increased, and the TAT can be further shortened to increase the production efficiency.
- the skip mode can also be applied to the case where wafers W are continuously loaded as shown in FIG. In this case, it can be executed by continuously performing the transport method shown in FIG. 8 using the CONT signal.
- This skip mode is also applied to the case where the wafer W is continuously unloaded and loaded as shown in FIG. 11, and the case where the wafer and the W are simultaneously unloaded and loaded as shown in FIG. be able to.
- the sequence control of the adapter 23 and the arm mechanism 34 is performed in a shorter communication time according to the operating state of the prober 2 by the skip mode optical communication via the PIO communication interfaces 11A and 1 IB.
- two wafers W can be continuously loaded from the RGV3 to the prober 2.
- the transfer distance and transfer time of the RGV3 can be shortened to increase transfer efficiency
- the TAT can be shortened to increase production efficiency.
- the transfer method in each of the above embodiments is a transfer in other semiconductor handling equipment, for example, As shown in FIGS. 13 to 15, the present invention can be applied to the transfer between the RGV3 and the stocker 10.
- FIG. 13 shows a timing chart when wafers are continuously loaded into the stocker
- FIG. 14 shows a timing chart when wafers are continuously unloaded and loaded into the stocker
- FIG. 15 shows a timing chart in the case of continuously unloading and unloading the wafer from the stocker.
- the locker also has a PIO communication interface similar to prober 2, and the following communication is performed between this PIO communication interface and the RGV3 PIO communication interface.
- PIO communication is started between the RGV3 and the stocker via the PIO communication interface.
- the RGV3 transmits the CS-0 signal in the high state to the stocker 10, and then transmits the VALID signal in the high state. This enables the load mode.
- the stocker 10 Upon receiving the VALID signal, the stocker 10 opens the bar of the stocker 10 to enable loading, as shown in Fig. 13, then sets the L-REQ signal to the high state and transmits the signal to the RGV3 to load. Notify that it is possible.
- the RGV 3 upon receiving the L_REQ signal, sets the TR_REQ signal to the High state and transmits it to the stocker 10 to notify the stocker 10 that the wafer W can be transferred.
- the stocker 10 Upon receiving the TR-REQ signal, the stocker 10 sets the READY signal to the high state, transmits the signal to the RGV3, and notifies the RGV3 that the stocker 10 is accessible.
- the RGV3 Upon receiving the READY signal from the prober 2, the RGV3 sets the BUSY signal to the high state and transmits it to the stocker 10, as shown in Fig. 13, and notifies the stocker 10 that the transfer of the wafer W is started to the stocker 10. I do. At the same time as the transmission of the BUSY signal, the RGV3 sets the CONT signal to the high state and transmits the signal to the stocker 10 to notify the stocker 10 that the continuous transport mode is set.
- the stocker 10 When the stocker 10 receives the BUSY signal and recognizes the start of conveyance, the stocker 10 sets the AENB signal to the high state and transmits the signal to the RGV3 to notify that the arm mechanism 34 can be accessed.
- the AEN B signal is transmitted from the stocker 10 to the RGV3 when the stocker 10 receives the BUSY signal in the high state from the RGV3.
- the arm mechanism 34 advances into the carrier of the stocker 10 and the RGV3 transmits the PENB signal to the stocker 10, as shown in FIG.
- the stocker 10 changes the AENB2 signal to the high state based on the PENB signal in the high state. Then, the high state AENB2 signal is transmitted to RGV3.
- RGV3 sets the PEN B2 signal to the high state when the arm mechanism 34 completes the descending operation and transfers the wafer W into the buffer B of the stocker 10 based on the high state AENB2 signal from the stocker 10. Send to 10 to notify the end of delivery.
- the stocker 10 switches all of the AENB signal, AENB2 signal, and L-REQ signal to the low state based on the high state PENB2 signal, transmits those signals to the RGV3, and indicates that the loading of the wafer W has been completed. Notify.
- the arm mechanism 34 retreats from the stocker 10 to the RGV3 based on this notification.
- the RGV3 switches the TR-REQ signal, BUSY signal, PENB signal, PENB2 signal, and CONT signal to the low state, and switches the COMPT signal to the high state to stocker each signal. 10 to notify that the arm mechanism 34 has been evacuated.
- the stocker 10 sends the READY signal to the RGV3 in the low state as shown in Fig. 13 to notify that the transfer operation of the first wafer W has been completed, and The COMPT signal is switched to the low state, and the transfer operation of the first wafer W is completed.
- the RGV 3 takes out the second wafer W from the buffer B based on the CONT signal, and starts the next loading step. That is, communication is performed between the RGV 3 and the stocker 10 in the same sequence as when the first wafer W is loaded, and the second wafer W is loaded from the RGV 3 to the stocker 10.
- the RGV 3 by controlling the sequence of the stocker 10 and the arm mechanism 34 by optical communication between the RGV 3 and the stocker 10 via the PIO communication interface, the RGV 3 , Two wafers W can be continuously loaded into the stocker 10.
- the transfer distance and transfer time by RGV3 can be shortened to increase transfer efficiency, and in turn, TAT can be shortened to increase production efficiency.
- the RGV3 After transmitting the CS-1 signal in the high state to the stocker 10, the RGV3 transmits the VALID signal. This enables the unload mode.
- the stocker 10 Upon receiving the VALID signal, the stocker 10 opens the bus of the stocker 10 to enable unloading as shown in Fig. 14, and then transmits the RGV3 by setting the U-REQ signal to the high state. To notify that the wafer W is to be unloaded.
- the RGV3 sets the TR-REQ signal to the high state based on the U-REQ signal and transmits the signal to the stocker 10, and the wafer W can be transferred to the stocker 10. Notify.
- the stocker 10 sets the READY signal to the high state based on the TR-REQ signal, and sets the RG
- RGV3 Upon receiving the READY signal, RGV3 sets the BUSY signal to the high state and sets CO
- the NT signal is set to the high state, and each signal is transmitted to the stocker 10. This
- Stocker 10 and RGV3 are in the continuous transfer mode in which unloading and loading are continuously performed.
- the stocker 10 sets the AENB signal to the high state based on the BUSY signal in the high state, transmits the AENB signal to the RGV3, and notifies that RGV3 can be unloaded.
- the arm mechanism 34 advances into the carrier of the stocker 10.
- the RGV3 sets the PENB signal to the high state and transmits the signal to the stocker 10 to notify that the unloading is possible.
- the stocker 10 sets the AENB2 signal to the high state based on the PENB signal, transmits the signal to the RGV3, and notifies the RGV3 that unloading is possible.
- the arm mechanism 34 moves up based on the AENB2 signal in the high state, and the internal force of the carrier of the stocker 10 also unloads the wafer W.
- the RGV3 sets the PENB2 signal to a high state and transmits the signal to the stocker 10 to notify the stocker 10 that the wafer W has been unloaded.
- the stocker 10 sets the AEN based on the PENB2 signal in the high state.
- AENB2 signal and U REQ signal are all set to Low state, and each signal is To the RGV3 to notify the RGV3 of the completion of the wafer W unload confirmation.
- the arm mechanism 34 retreats from the stocker 10 to the RGV3.
- the RGV3 sets the TR-REQ signal, the BUSY signal, the PENB signal, and the PENB2 signal to! As shown in FIG. These signals are transmitted to the stocker 10 to notify the stocker 10 of the retreat of the arm mechanism 34.
- the stocker 10 sets the READY signal to the low state and transmits it to the RGV3.
- RGV3 switches the CS-1 signal and the VALID signal to the low state, and ends the unloading operation of wafer W.
- the unloaded wafer W is stored in the buffer B of RGV3.
- the RGV 3 takes out one wafer W from the buffer B based on the CONT signal, and starts a process of loading the wafer W into the stocker 10. In this case, the same sequence as the load shown in FIG. 13 is performed.
- the RGV 3 by controlling the sequence of the stocker 10 and the arm mechanism 34 by optical communication between the RGV 3 and the stocker 10 via the PIO communication interface, the RGV 3 The transfer of the wafer W between the wafer and the stocker 10 can be performed continuously. As a result, the transfer distance and transfer time by RGV3 can be shortened to increase transfer efficiency, and in turn, TAT can be shortened to increase production efficiency.
- the RGV 3 can unload the wafer W from the stocker 10 continuously.
- the present invention is not limited to the above embodiments, and can be appropriately designed and changed as needed.
- the prober 2 of the present embodiment can perform an inspection for each carrier in the same manner as in the related art simply by making a simple change to the loader chamber.
- the prober 2 and the stocker 10 have been described as examples of semiconductor handling equipment.
- the present invention is widely applied to semiconductor handling equipment such as a processing apparatus for performing a predetermined process on a workpiece such as a wafer. Can be applied.
- the wafer size the present invention can be applied to a case where the same size (for example, 300 mm) or a plurality of different sizes (for example, 300 mm and 200 mm) are mixed.
- Each of the transfer methods described above is actually controlled via software (program).
- software for controlling each transport method is stored in a computer-readable storage unit (storage medium: see FIG. 1A) built in or connected to any of the hardware elements.
- a mode in which software is centrally stored in any one of the hardware elements a mode in which software is distributed and stored in a plurality of hardware elements and cooperates in control may be adopted.
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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EP20040816143 EP1667222A4 (en) | 2003-09-17 | 2004-09-16 | SYSTEM FOR TRANSPORTING OBJECTS TO BE PROCESSED, AND PROCESS FOR TRANSPORTING OBJECTS TO BE PROCESSED |
US11/374,998 US7826918B2 (en) | 2003-09-17 | 2006-03-15 | Transfer system and transfer method of object to be processed |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2003-324619 | 2003-09-17 | ||
JP2003324619A JP4647197B2 (ja) | 2003-09-17 | 2003-09-17 | 被処理体の搬送方法及びコンピュータ読取可能な記憶媒体 |
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US11/374,998 Continuation US7826918B2 (en) | 2003-09-17 | 2006-03-15 | Transfer system and transfer method of object to be processed |
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WO2005027218A1 true WO2005027218A1 (ja) | 2005-03-24 |
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PCT/JP2004/013537 WO2005027218A1 (ja) | 2003-09-17 | 2004-09-16 | 被処理体の搬送システム及び被処理体の搬送方法 |
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US (1) | US7826918B2 (ja) |
EP (1) | EP1667222A4 (ja) |
JP (1) | JP4647197B2 (ja) |
KR (2) | KR100854141B1 (ja) |
CN (1) | CN100431131C (ja) |
TW (1) | TW200513427A (ja) |
WO (1) | WO2005027218A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8337133B2 (en) * | 2007-06-25 | 2012-12-25 | International Business Machines Corporation | Segregating wafer carrier types in semiconductor storage devices |
JP5384219B2 (ja) * | 2009-06-19 | 2014-01-08 | 東京エレクトロン株式会社 | 検査装置におけるプリアライメント方法及びプリアライメント用プログラム |
WO2011027392A1 (ja) * | 2009-09-02 | 2011-03-10 | 株式会社アドバンテスト | 試験装置、試験方法およびプログラム |
CN102116835B (zh) | 2009-11-06 | 2014-12-03 | 东京毅力科创株式会社 | 探测装置以及衬底运送方法 |
JP4949454B2 (ja) * | 2009-11-17 | 2012-06-06 | 東京エレクトロン株式会社 | プローブ装置 |
JP6005912B2 (ja) * | 2011-07-05 | 2016-10-12 | 株式会社Screenホールディングス | 制御装置、基板処理方法、基板処理システム、基板処理システムの運用方法、ロードポート制御装置及びそれを備えた基板処理システム |
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-
2003
- 2003-09-17 JP JP2003324619A patent/JP4647197B2/ja not_active Expired - Fee Related
-
2004
- 2004-09-16 EP EP20040816143 patent/EP1667222A4/en not_active Ceased
- 2004-09-16 WO PCT/JP2004/013537 patent/WO2005027218A1/ja active Application Filing
- 2004-09-16 CN CNB2004800194139A patent/CN100431131C/zh not_active Expired - Fee Related
- 2004-09-16 KR KR1020077021730A patent/KR100854141B1/ko not_active IP Right Cessation
- 2004-09-16 KR KR1020067005267A patent/KR100796054B1/ko not_active IP Right Cessation
- 2004-09-17 TW TW093128259A patent/TW200513427A/zh not_active IP Right Cessation
-
2006
- 2006-03-15 US US11/374,998 patent/US7826918B2/en not_active Expired - Fee Related
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JPH0778858A (ja) * | 1993-06-18 | 1995-03-20 | Tokyo Electron Ltd | 搬送方法および搬送装置 |
JPH07315565A (ja) * | 1994-05-27 | 1995-12-05 | Advantest Corp | Icテストハンドラのデバイス搬送機構 |
JP2002217263A (ja) * | 2001-01-12 | 2002-08-02 | Tokyo Electron Ltd | 被処理体の搬送システム及び被処理体の搬送方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20070104674A (ko) | 2007-10-26 |
JP4647197B2 (ja) | 2011-03-09 |
US7826918B2 (en) | 2010-11-02 |
EP1667222A4 (en) | 2009-11-11 |
CN100431131C (zh) | 2008-11-05 |
KR100796054B1 (ko) | 2008-01-21 |
EP1667222A1 (en) | 2006-06-07 |
CN1820364A (zh) | 2006-08-16 |
US20060152211A1 (en) | 2006-07-13 |
TWI344440B (ja) | 2011-07-01 |
KR100854141B1 (ko) | 2008-08-26 |
JP2005093690A (ja) | 2005-04-07 |
KR20060039030A (ko) | 2006-05-04 |
TW200513427A (en) | 2005-04-16 |
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