WO2005012215A1 - 新規骨格を有する金属化合物 - Google Patents
新規骨格を有する金属化合物 Download PDFInfo
- Publication number
- WO2005012215A1 WO2005012215A1 PCT/JP2004/007914 JP2004007914W WO2005012215A1 WO 2005012215 A1 WO2005012215 A1 WO 2005012215A1 JP 2004007914 W JP2004007914 W JP 2004007914W WO 2005012215 A1 WO2005012215 A1 WO 2005012215A1
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- WO
- WIPO (PCT)
- Prior art keywords
- metal
- metal compound
- atom
- alkoxides
- compound according
- Prior art date
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- 150000002736 metal compounds Chemical class 0.000 title claims abstract description 65
- 229910052751 metal Inorganic materials 0.000 claims abstract description 95
- 239000002184 metal Substances 0.000 claims abstract description 95
- 239000013078 crystal Substances 0.000 claims abstract description 36
- 150000004703 alkoxides Chemical class 0.000 claims description 59
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 40
- 125000004429 atom Chemical group 0.000 claims description 39
- 239000002131 composite material Substances 0.000 claims description 17
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 15
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 15
- 229910052719 titanium Inorganic materials 0.000 claims description 15
- 238000006460 hydrolysis reaction Methods 0.000 claims description 11
- 150000003839 salts Chemical class 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 230000007062 hydrolysis Effects 0.000 claims description 6
- 238000004132 cross linking Methods 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 abstract description 32
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 19
- 150000004706 metal oxides Chemical class 0.000 abstract description 19
- 239000000463 material Substances 0.000 abstract description 18
- 239000002253 acid Substances 0.000 abstract description 14
- 239000006185 dispersion Substances 0.000 abstract description 14
- 239000003381 stabilizer Substances 0.000 abstract description 8
- 230000029219 regulation of pH Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 39
- 239000010408 film Substances 0.000 description 32
- -1 titanium alkoxide Chemical class 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 20
- 239000002245 particle Substances 0.000 description 19
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- 239000000758 substrate Substances 0.000 description 15
- 239000002585 base Substances 0.000 description 13
- 239000010936 titanium Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000010419 fine particle Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229910052732 germanium Inorganic materials 0.000 description 4
- 239000000123 paper Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- 239000011133 lead Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- PWATWSYOIIXYMA-UHFFFAOYSA-N Pentylbenzene Chemical compound CCCCCC1=CC=CC=C1 PWATWSYOIIXYMA-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 238000001237 Raman spectrum Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- YBCVMFKXIKNREZ-UHFFFAOYSA-N acoh acetic acid Chemical compound CC(O)=O.CC(O)=O YBCVMFKXIKNREZ-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000008014 freezing Effects 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- 239000012702 metal oxide precursor Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- FQYVVSNFPLKMNU-UHFFFAOYSA-N 1,2-dipentylbenzene Chemical compound CCCCCC1=CC=CC=C1CCCCC FQYVVSNFPLKMNU-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
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- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
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- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101100102516 Clonostachys rogersoniana vern gene Proteins 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
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- 229910002651 NO3 Inorganic materials 0.000 description 1
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- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 235000011044 succinic acid Nutrition 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 238000012982 x-ray structure analysis Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
- C07C31/28—Metal alcoholates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/003—Compounds containing elements of Groups 4 or 14 of the Periodic Table without C-Metal linkages
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/77—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by unit-cell parameters, atom positions or structure diagrams
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/86—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
Definitions
- the present invention relates to a metal compound and a titanium compound having a novel crystal structure, which are useful as a material for forming a metal oxide film and a chemically adsorbed film, and as an organic-inorganic composite eight-brid material.
- Conventional technology :
- a metal oxide precursor characterized in that water is added to one or more metal alkoxides at a temperature of 120 ° C. or lower.
- Methods for producing sols are known. (Refer to Japanese Patent Application Laid-Open No. 10-29 8 769)
- a high molecular weight ladder-like polyoxane that is soluble in an organic solvent is obtained by hydrolyzing titanium tetraalkoxide at a temperature of 20 to 90 with 1.0 to 1.7 times mol of water.
- the purpose of this method is to provide a high molecular weight ladder-like polytitanoxane which dissolves in an organic solvent even in a high molecular weight substance and forms a fine thin film. (See Japanese Patent Application Laid-Open No. 11-199032) Further, 0.1 to 2.0 mol of the metal salt partially hydrolyzed by adding water and heating is added.
- the present invention is useful as a material for forming a metal oxide film or a chemically adsorbed film, for example, capable of adjusting pH with an acid or a base or coagulating in an organic solvent without adding a dispersion stabilizer. It is an object of the present invention to provide a metal compound having a novel crystal structure without the above.
- the present inventors dropped a predetermined amount of water at a low temperature of 120 ° C. or lower into an organic solvent solution of titanium tetraisoproxide, allowed the temperature to rise naturally, and then refluxed the reaction solution. Fine particles were obtained.
- the fine particles were formed of titanium having a novel crystal structure including two spatially arranged two metal atoms located at the apexes of a pentagonal pyramid. It was found that it was a compound.
- the metal compound having such a crystal structure is (i) ultra-fine particles having a particle size of about several nanometers and having a monodisperse particle size distribution, and (ii) a uniform dispersion in an organic solvent. (Iii) stable existence in an organic solvent, and (iv) useful as a material for forming a metal oxide film and a chemisorption film, and as an organic-inorganic composite hybrid material. And completed the present invention.
- a metal compound characterized by having a crystal structure including two arrangements in which six metal atoms are located at the apexes of a five-sided pyramid in one molecule. Is done.
- the metal compound of the present invention is preferably one in which two pentagons face each other with one surface of the pentagon being oriented, and more preferably one in which one surface of the pentagon is a base pentagon. It is more preferable that the faces of the pentagonal pyramid face each other at a certain angle.
- the metal compound of the present invention is preferably one in which each metal atom constituting the crystal structure is cross-linked by a cross-linking oxygen atom, and more preferably contains a ⁇ 3- type cross-linking oxygen atom.
- the metal compound of the present invention preferably contains a metal atom to which an alkoxy group is bonded.
- the metal atom is preferably a titanium atom.
- the metal compound of the present invention is represented by the following formula (1): M (OR) n (where M represents a metal atom, R represents an alkyl group, and n represents the valence of the metal atom).
- Metal alkoxide a composite alkoxide obtained by reacting two or more metal alkoxides, a reaction of one or more metal alkoxides with one or two or more metal salts. The resulting composite alkoxide, or these It is preferably a hydrolysis product of a combination of two or more.
- a dispersoid obtained by treating the metal compound with water in an amount of less than 0.25 mole of the metal compound.
- the dispersoid of the present invention is preferably obtained in an organic solvent in the absence of an acid, a base, and a dispersion stabilizer, using water in an amount of less than 0.25 times the molar amount of the metal compound. More preferably, it is a dispersoid having a metal-oxygen bond.
- a metal compound having a novel crystal structure which does not adjust pH with an acid or a base and does not aggregate in an organic solvent even without adding a dispersion stabilizer.
- the metal compound of the present invention is useful as a material for forming a metal oxide film or a chemically adsorbed film, an organic-inorganic composite hybrid material, and the like.
- the first aspect of the present invention is a metal compound having a crystal structure including two arrangements in which six metal atoms are located at the apex of a pentagonal pyramid in one molecule.
- the metal constituting the metal compound of the present invention is not particularly limited, and examples thereof include alkali metals, alkaline earth metals, elements of Group VIII of the Periodic Table, elements of Group IVB of the Periodic Table, and elements of the Periodic Table.
- titanium, zirconium, aluminum, silicon, germanium, germanium, indium, tin, tantalum, and the like from the viewpoint of their usefulness as materials for forming metal oxide films and chemisorption films, and as composite hybrid materials. Tungsten, zinc and lead are preferred, and titanium is particularly preferred.
- the metal compound of the present invention has a crystal structure including two arrangements in each molecule in which six metal atoms are located at the apexes of a pentagonal pyramid, and one surface of the pentagonal pyramid faces each other. It is preferable that the pentagonal pyramids face each other at a certain angle.
- each metal atom constituting the crystal structure is cross-linked by a bridge-type oxygen atom.
- the crosslinked oxygen atoms only two metal atoms and bonded to H 2 type bridging oxygen atom binds to three metal atoms ⁇
- the metal compound of the present invention preferably has at least a type 3 bridging oxygen atom.
- the metal compound of the present invention contains a metal atom in which a metal atom is cross-linked by a cross-linkable oxygen atom and further has an alkoxy group bonded thereto.
- the alkoxy group is not particularly limited, but from the viewpoint of availability of raw materials, production efficiency, etc., alkoxy having 1 to 4 carbon atoms such as methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, etc. Groups are preferred.
- the number of alkoxy groups to be bonded is not particularly limited, and depends on the type and valence of the metal atom, the number of metal atoms contained in one molecule, and the like. When there are a plurality of alkoxy groups, all of the bonding alkoxy groups may be the same or different.
- FIG. 1 shows the basic skeleton of the metal compound of the present invention.
- 1a represents a metal atom on the front side of the paper
- 1b represents a metal atom on the back side of the paper.
- the basic skeleton shown in FIG. 1 has a structure in which six metal atoms face each other with one face of the pentagonal pyramid including two arrangements located at the apexes of the pentagonal pyramid. And one surface of this pentagon is the pentagon of the bases, and the surface of the pentagon keeps a constant angle. This angle is determined by the size of the metal atom and the like. For example, when the metal atom is a titanium atom, it is about 36 °. Further, in FIG. 1, metal atoms are connected to each other for simplicity, but each metal atom may actually be connected via a bridged oxygen atom.
- the metal compound of the present invention has a basic skeleton shown in FIG. 1 as long as it has a crystal structure including two arrangements in which six metal atoms are located at the apexes of a pyramid in one molecule. It is not limited to. For example, it has a crystal structure in which one molecule has two spatially arranged two metal atoms located at the apex of a pentagonal pyramid, but the bond distances between metal atoms and metal atoms are not all the same. However, there is a crystal structure that includes two arrangements in which six metal atoms are located at the apex of a pentagonal pyramid in one molecule, but the pentagon located at the bottom of the pentagon is not a regular pentagon. Included in the invention.
- the metal compound of the present invention is a metal alkoxide represented by the formula (1): M (OR) n (Hereinafter referred to as “metal alkoxide”), a composite alkoxide obtained by reacting two or more metal alkoxides, one or more metal alkoxides and one or more metal salts.
- metal alkoxide a composite alkoxide obtained by the reaction of above, a combination of two or more of the above-mentioned metal alkoxides, a combination of two or more of the above-mentioned composite alkoxides, a combination of the above-mentioned metal alkoxide and a composite alkoxide (hereinafter, referred to as “metal alkoxides”). Is partially hydrolyzed with a predetermined amount of water in an organic solvent.
- M represents a metal atom.
- the metal atom include one or more selected from the group consisting of titanium, zirconium, aluminum, silicon, germanium, indium, tin, tantalum, zinc, tungsten and lead, with titanium being particularly preferred.
- R represents an alkyl group. The number of carbon atoms of the alkyl group is not particularly limited, but is usually 1 to 10, preferably 1 to 4, because it is easily available and excellent in handleability.
- N represents the valence of a metal atom.
- the metal alkoxide represented by the formula (1) include T i (OCH 3 ) 4 , T i (OC 2 H 5 ) 4 , T i ( ⁇ C 3 H 7 -i) 4 , T i ( OC 4 H 9) 4 and the like of the titanium alkoxide; Z r (OCH3) 4, Z r (OC 2 H 5) 4, Z r (OC 3 H 7) 4, Z r (OC 4 H 9) 4 and the like of zirconium Alkoxide; A 1 (O CH 3 ) 3 , A 1
- Aluminum alkoxides such as (OC 2 H 5 ) 3 , A 1 ( ⁇ C 3 H 7 — i) 3 and A 1 (OC 4 H 9 ) 3 ; S i (OCH 3) 4 , S i (OC 2 H 5 ) 4 , silicon alkoxides such as S i ( ⁇ C 3 H 7 — i) 4 , S i ( ⁇ C 4 H 9 — t) 4 ; germanium alkoxides such as G e ( ⁇ C 2 H 5 ) 4 ; I n (OCH3) 3, I n ( ⁇ _C 2 H 5) 3, I n (OC 3 H 7 - i) 3, I n (OC 4 H 9) 3 and the like of an indium alkoxide; S n (OCH3) 3, I n ( ⁇ _C 2 H 5) 3, I n (OC 3 H 7 - i) 3, I n (OC 4 H 9) 3 and the like of an indium alkoxide; S n (OCH
- Tin alkoxides such as (O CH 3 ) 4 , Sn ( ⁇ C 2 H 5 ) 4 , Sn (OC 3 H 7 -i) 4 , Sn (OC 4 H 9 ) 4 ; Ta (OCH 3) 5 , Ta (OC 2 H 5 ) 5 , T a ( ⁇ C 3 H 7 -i) 5 , T a ( ⁇ C 4 H 9 ) 5, etc .; tantalum alkoxides; W (OCH 3 ) 6 , W ( ⁇ C Tandene alkoxides such as 2 H 5 ) 6 , W ( ⁇ C 3 H 7 — i) 6 , W (OC 4 H 9 ) 6 ; zinc alkoxides such as Zn (OC 2 H 5 ) 2 ; P b (OC 4 H9) Lead alkoxides such as 4 and the like.
- Complex alkoxides obtained by the reaction between two or more metal alkoxides include complex alkoxides obtained by reacting an alkoxide of an alkali metal or an alkaline earth metal with an alkoxide of a transition metal; Complex alkoxides and the like obtained in the form of complex salts by combination can be exemplified.
- the composite alkoxide obtained by reacting one or more metal alkoxides with one or more metal salts a compound obtained by reacting a metal salt with a metal alkoxide can be exemplified.
- the metal salt chloride, nitrate, sulfate, acetate, formate, oxalate and the like can be used. Further, as the metal alkoxide, the same metal alkoxide as described above can be used.
- Metal alkoxides are used by dissolving or dispersing them in a suitable organic solvent.
- concentration of the metal alkoxide in the organic solvent is not particularly limited as long as rapid heat generation is suppressed and the fluidity allows stirring, but it is usually 5 to 30% by weight.
- the organic solvent used is not particularly limited as long as it is inert to the hydrolysis reaction of metal alkoxides.
- a low temperature those having a low freezing point, preferably a freezing point of below, more preferably 150 ° C. or less are suitable.
- Specific examples include ether solvents and aromatic hydrocarbon solvents.
- ether solvents examples include getyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dihexyl ether, diethylene glycol dimethyl ether, diethylene glycol getyl ether, diethylene glycol dibutyl ether, tetrahydrofuran, dioxane, and the like. .
- aromatic hydrocarbon solvents examples include benzene, toluene, xylene, ethylbenzene, benzene, dichlorobenzene, chlorotoluene, bromobenzene, cumene, tetralin, butylbenzene, cymene, getylbenzene, pentylbenzene, dipentylbenzene, Benzyl acetate and the like can be mentioned. These solvents can be used alone or in combination of two or more. Among these, toluene and tetrahydrofuran are preferably used because the metal compound of the present invention can be obtained in good yield.
- the metal alkoxide is not uniformly mixed with the organic solvent, for example, 1,2-bis- (2-ethylhexyloxyl-propionyl) -1-sodium ethanesulfonate, polyoxyethylene (6) nonylphate
- a surfactant such as enyl ether, or to perform a stirring treatment or an ultrasonic treatment to make the solution uniform.
- the amount of the organic solvent to be used is generally 100 to 5,000 parts by weight, preferably 100 to 3,000 parts by weight, per 100 parts by weight of the metal alkoxide. If the amount is less than 100 parts by weight, the generated fine particles may grow in a bonded state, and it may be difficult to control the particle size. On the other hand, if the amount exceeds 50,000 parts by weight, the solution is too dilute to produce fine particles. This can be difficult.
- Water used for hydrolysis of metal alkoxides is not particularly limited as long as it is neutral, but from the viewpoint of suppressing side reactions, pure water, distilled water or ion-exchanged water having a low impurity content is preferable.
- the amount of water involved in the reaction is not particularly limited, but is specifically 0.5 to 1.5 times, preferably 0.5 to 1/25 times the mole of the metal alkoxide. be able to.
- any of a method of continuously adding the entire amount of water used and a method of adding the water in a plurality of times may be used.
- the temperature at which the water is added may be changed.
- the first addition of water can be performed at a temperature of from 125 ° C to ⁇ 20 ° C
- the second addition can be performed at a temperature of from 180 ° C to ⁇ 70 ° C.
- Water can also be used after diluting it in a suitable organic solvent. Diluted in organic solvent By using the water, it is possible to prevent local heat generation at the time of dropping of water and to carry out homogeneous hydrolysis of the metal alkoxide.
- a solvent compatible with water is preferable. For example, methanol, ethanol, isopropyl alcohol, n-propyl alcohol, n-butyl alcohol and the like can be mentioned.
- an acid, a base or a dispersion stabilizer may be added.
- Acids and bases are used as deflocculants to re-disperse precipitates formed by coagulation, and to produce dispersoids such as colloidal particles by hydrolyzing, dehydrating and condensing metal alkoxides and formed polymer alkoxides.
- the catalyst is not particularly limited as long as it functions as a catalyst and as a dispersant for the generated dispersoid.
- Examples of the acid include mineral acids such as hydrochloric acid, nitric acid, boric acid, and borofluoric acid; organic acids such as acetic acid, formic acid, oxalic acid, carbonic acid, trifluoroacetic acid, p-toluenesulfonic acid, and methanesulfonic acid; Photoacid generators that generate an acid upon irradiation with light, such as rhododium hexafluorophosphate and triphenylphosphonium hexafluorophosphate; and the like.
- Examples of the base include triethanolamine, triethylamine, 1,8-diazabicyclo [5.4.0] -7-indene, ammonia, dimethylformamide, phosphine and the like.
- the dispersion stabilizer is an agent having an effect of stably dispersing a dispersoid in a dispersion medium, such as a deflocculant, a protective colloid, and an anticoagulant such as a surfactant.
- a dispersion medium such as a deflocculant, a protective colloid, and an anticoagulant such as a surfactant.
- Specific examples include polycarboxylic acids such as glycolic acid, dalconic acid, lactic acid, tartaric acid, citric acid, malic acid, and succinic acid; hydroxycarboxylic acids; phosphoric acids such as pyrophosphoric acid and tripolyphosphoric acid; acetylacetone; Methyl, acetate acetate, acetate acetate n-propyl, acetate acetate, isopropyl acetate acetate acetate n-butyl, acetate acetate sec-butyl, acetate acetate
- a metal ⁇ examples include a method of adding water to a solution of lucoxides in an organic solvent, and a method of adding metal alkoxides to a mixed solvent of (b) water and an organic solvent, and the like.
- the method (a) is preferred because it can be obtained.
- a solution prepared by dissolving or dispersing metal alkoxides in an organic solvent slowly add 0.6 to 1.25 moles of water to the metal alkoxides at a temperature of -20 ° C or lower.
- the method of adding, allowing the temperature of the reaction solution to rise naturally (first step), and then refluxing (second step) is particularly preferable.
- the low-temperature hydrolysis reaction of metal alkoxides mainly proceeds.
- a dispersion of fine particles having a loose crystal-like cage type (chain) structure is obtained by the first step.
- the obtained fine particles have a particle size of 0.5 to 0.5 nm, preferably 1 to 5 nm.
- the dropping temperature of water depends on the stability of the metal alkoxide used. Usually, there is no problem if the temperature is below ⁇ 20 ° C., but depending on the type of the metal alkoxide, it may be more preferable to perform the reaction in a temperature range of ⁇ 50 ° C. to 110 ° C. . By dropping water at such a low temperature, a fine particle dispersion of the metal compound of the present invention can be obtained.
- the time for dropping water depends on the reaction scale and the like, but is usually 10 minutes to 3 hours, preferably 15 minutes to 1 hour. After completion of the dropwise addition, it is preferable to raise the temperature of the reaction solution to room temperature and continue stirring for 1 to 24 hours for aging.
- the compound of the present invention is obtained by refluxing the reaction solution obtained in the first step at the reflux temperature of the organic solvent.
- the dropped water is completely used for hydrolysis, and the compound of the present invention is produced by a polycondensation reaction (dehydration and dealcoholation reaction).
- the reflux time is not particularly limited, but is usually 30 minutes to 5 hours, preferably 1 to 3 hours.
- the solution containing the metal compound of the present invention obtained in the second step is a monodisperse dispersoid having an average particle size of 1 to 10 nm and a particle size distribution of 0.1 to 50 nm, and has a storage stability. Is excellent.
- the solution When the solution is allowed to stand at a temperature of room temperature or lower, crystals are precipitated and can be isolated as the metal compound of the present invention.
- the isolated metal compound crystals of the present invention can be treated with less than 0.25 moles of water relative to the metal compound to obtain a new dispersoid.
- the dispersoid obtained here is a monodisperse equivalent to the solution containing the metal compound obtained in the second step and forms a dispersoid having excellent storage stability.
- the dispersoid becomes a dispersoid having a metal monooxygen bond adjusted in the absence of an acid, a base, and Z or a dispersion stabilizer in an organic solvent.
- the metal compound of the present invention is stable and has excellent dispersibility in various organic solvents. As described below, the metal compound of the present invention can be dispersed in an organic solvent after isolation, or by using the reaction solution obtained by the above-described production method as it is, as described below. It is useful as a material for forming a film and as a material for an organic-inorganic composite eight hybrid.
- a metal oxide film can be formed on the substrate.
- a solution obtained by dispersing the metal compound of the present invention in an organic solvent is applied or sprayed on a substrate, a metal oxide film can be formed on the substrate.
- it can be produced by applying or spraying this solution on a substrate, heating and drying at a temperature of 200 ° C. or lower, preferably 15 Ot or lower, to form a film.
- the heating time is not particularly limited, but is usually in the range of 1 to 120 minutes.
- the concentration of the metal compound of the present invention in the solution is not particularly limited as long as it can be applied on the substrate, and can be appropriately set depending on the application method and the set film thickness. Generally, it is in the range of 5 to 50% by weight in terms of oxide.
- the organic solvent used is not particularly limited as long as it does not affect the dispersibility of the metal compound of the present invention.
- the solvents exemplified as the solvent that can be used when producing the metal compound of the present invention are exemplified.
- the surface of the metal oxide film formed using the solution containing the metal compound of the present invention has an average roughness of 1 O nm or less, preferably 5 nm or less, and has excellent flatness, wettability, Excellent water repellency and storage stability. Further, since the film can be formed by drying at a temperature of 200 ° C. or less, the film can be formed on a plastic substrate. That is, a metal oxide film having a high-density smooth film surface with a carbon content of 10% or less in element ratio can be formed on a plastic substrate.
- any of known methods such as spin coating, dip coating, spray coating, roll coating, screen printing, and offset printing can be used.
- screen printing, offset printing, and roll coating are preferred, which can be patterned at the time of coating, and roll coating such as roll coating using a bar or roll coating using Giza can be used for mass production at low cost. The method is more preferred.
- the light source for irradiating the coating film with ultraviolet light or visible light is not particularly limited as long as it generates light having a wavelength of 150 nm to 700 nm.
- the light source for irradiating the coating film with ultraviolet light or visible light is not particularly limited as long as it generates light having a wavelength of 150 nm to 700 nm.
- they are an ultra-high pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, and a xenon lamp.
- a transparent conductive pattern can be formed.
- a laser oscillator can also be used. When a laser beam is used, a portion other than the irradiated portion does not become a metal oxide, so that a desired pattern can be formed without using screen printing or the like at the time of application.
- a metal hydroxide remains with the generation of the metal oxide.
- a device that generates light including ultraviolet light of 400 nm or less it is preferable to use a device that generates light including ultraviolet light of 400 nm or less.
- the absorption of the metal-O-metal bond is shorter than that of the metal-OH bond, but the metal-O-metal bond must be activated. Irradiation of light having a wavelength that promotes the crystallization of metal oxides.
- the irradiation time is not particularly limited, but is usually 1 minute to 120 hours.
- the material and size of the base are not particularly limited. Examples of the material of the base include metal, ceramics, glass, plastic, paper, fiber, and leather.
- the shape of the substrate may be any shape such as a sheet, a plate, a film, and a three-dimensional object. In addition, a substrate that has already been coated can also be used.
- the organic solvent dispersion of the metal compound of the present invention may be used as a material for forming a chemical adsorption film. Is also useful. For example, a predetermined amount of an organic solvent dispersion of the metal compound of the present invention is added to an organic solvent solution of a metal surfactant such as an alkyl trialkoxysilane or a fluoroalkyl trialkoxysilane to prepare a solution for forming a chemically adsorbed film. By preparing and applying this to the surface of a substrate such as a glass substrate and drying, a good and dense chemical adsorption film composed of a single molecule can be formed.
- a metal surfactant such as an alkyl trialkoxysilane or a fluoroalkyl trialkoxysilane
- the substrate used for forming the chemical adsorption film is not particularly limited, and examples thereof include those similar to those listed as the substrate that can be used for forming the metal oxide film.
- the metal compound of the present invention is also useful as an organic-organic composite hybrid material.
- FIG. 1 is a diagram showing the basic skeleton of the metal compound of the present invention.
- FIG. 2 is a chart showing the measured particle size distribution of the sol solution obtained in Example 1.
- FIG. 3 is a chart of 1 H-NMR measurement of the crystals obtained in Example 1.
- FIG. 4 is a diagram showing each molecular structure constituting a unit cell in the crystal obtained in Example 1.
- FIG. 5 is a diagram showing a molecular arrangement in the crystal obtained in Example 1.
- FIG. 6 is a chart showing the measured Raman spectrum of the reaction solution obtained in Example 2.
- FIG. 7 is a chart showing 17 O-NMR of the reaction solution obtained in Example 2.
- the organic solvent used was dried with molecular sieves (4 A. 1/16, manufactured by Wako Pure Chemical Industries).
- Titanium tetraisopropoxide (A-1 manufactured by Nippon Soda Co., Ltd .: purity: 99.9%, concentration in terms of titanium oxide: 28% by weight) 100 g (0.35mo1) of four-necked flask
- the solution was dissolved in 70 g of toluene (manufactured by Nacalai Tesque, Inc.) and replaced with nitrogen gas, and then cooled in a methanol bath containing dry ice to reach a temperature of 120 ° C.
- isopropyl alcohol Nacalai Tesque, Inc.
- Distilled water diluted with 1.7 g
- a mixed solution of (ADBANTEC GS- 2 0 0 than water sampling) 6. 3 7 g (H 2 0 / T i 1. Omo l / mo l) a, - 2 5-30 with stirring in one 20 ° C Dropped in minutes. After completion of the dropwise addition, the mixture was allowed to warm to room temperature gradually over 1.5 hours while continuing to stir the reaction solution, and further refluxed at 80 ° C for 2.5 hours to obtain a colorless and transparent titanium oxide equivalent concentration. A solution of 30% by weight sol was obtained. The transmission wavelength of light having a light transmittance of 50% of this solution was 385 nm. The particle size of the obtained sol solution was measured.
- the particle size of the obtained sol solution was measured at 25 ° C. in a toluene solvent using a dynamic light scattering method (manufactured by Ma 1 Vern, HPPS).
- Figure 2 shows the measured particle size distribution.
- the sol had a sharp monodisperse particle size distribution with an average particle size of 1.22 nm as shown in Figure 2.
- the horizontal axis indicates the particle diameter (nm)
- the vertical axis indicates the peak intensity (abundance).
- Fig. 3 shows the measured 1 H-NMR chart.
- the horizontal axis shows the chemical shift ( ⁇ 5 ppm).
- the molecular structure and the crystal structure of the obtained crystal were determined by measuring using an X-ray structure analyzer (Rigaku imaging plate single crystal automatic X-ray structure analyzer R-AXIS RAPID / LS). The final R value in the refinement of the structural analysis was 0.07.
- the crystal of the present invention has a structure in which 18 titanium isopropoxy groups are bonded to a cage structure (cage-like titania) in which 12 titanium atoms are cross-linked by oxygen atoms. It turned out that there is a unit cell composed of two types of molecules A and B that are crystallographically different.
- the cage-like titania two pentagons having a titanium atom as an apex face each other with one surface of the pentagon facing one face, and one surface of the pentagon is a base pentagon, and the pentagon is Have a structure facing each other at an angle of about 36 °.
- FIG. 4 shows the structure of each molecule constituting the unit cell.
- 1 represents a titanium atom (black circle)
- 2 represents an oxygen atom (grey circle)
- 3 represents a carbon atom (white circle).
- the molecule A (mo1ecu1eA) and the molecule B (mo1ecu1eB) have the same composition formula, and have structures similar to each other.
- the particle size of each molecule is 1.2 to 1.3 nm.
- FIG. 4 is a view from the upper side of the paper, and does not show all 12 titanium atoms, oxygen atoms bridging between titanium atoms, and 18 isopropoxy groups.
- FIG. 5 shows the molecular arrangement of the obtained crystals.
- the obtained crystal has a structure in which molecule A and molecule B are alternately repeated, and between molecule A and molecule B, toluene solvent 4 as a solvent is taken in. ing. It is thought that the toluene molecule plays a role like putty.
- Example 2 The solution of the sol obtained in Example 1 was applied on a polyethylene terephthalate substrate (10 cm ⁇ 10 cm, thickness 5 mm) whose surface was ozone-treated, using a No. 3 barco overnight. After drying at 10 ° C. for 10 minutes, a metal oxide film was formed on the substrate. The shape of the film surface was measured using an SPM device (SPA-400 (SII), manufactured by Seiko Instruments Inc.). The surface roughness was 5 nm or less. It was found that the metal oxide film formed from the dispersion was smooth.
- SPM device SPA-400 (SII), manufactured by Seiko Instruments Inc.
- Example 1 White crystals precipitated from the reaction solution obtained in Example 1 were collected by filtration and dried in vacuo. The crystals thus obtained were dissolved again in toluene (manufactured by Nacalai Tesque), and after purging with nitrogen gas, 0.25 times water of titanium alkoxide was added to prepare a transparent sol solution.
- the particles of the resulting sol solution exhibited a sharp particle size distribution with an average particle size of 5.2 nm.
- a metal compound having a novel crystal structure which does not aggregate in an organic solvent without adjusting the pH with an acid or a base or adding a dispersion stabilizer.
- the metal compound of the present invention is useful as a material for forming a metal oxide film or a chemically adsorbed film, an organic-inorganic composite octa-brid material, and the like, and can be said to have high industrial utility value.
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JP2006069876A (ja) * | 2004-09-06 | 2006-03-16 | Nippon Soda Co Ltd | 新規骨格を有する金属化合物、その製造方法、分散液及び分散体 |
CN103917487A (zh) * | 2011-09-05 | 2014-07-09 | 东曹株式会社 | 制膜用材料、iv族金属氧化物膜和亚乙烯基二酰胺络合物 |
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JPS6452786A (en) * | 1987-05-21 | 1989-02-28 | Nippon Soda Co | Cyclic titanoxane, production thereof and surface-treating agent |
JPH01129032A (ja) * | 1987-11-12 | 1989-05-22 | Nippon Soda Co Ltd | ラダー状ポリチタノキサンおよびその製造方法 |
JPH01230406A (ja) * | 1988-03-11 | 1989-09-13 | Koroido Res:Kk | 金属アルコキシドからの粘性ゾルの製造方法 |
JP2000086769A (ja) * | 1998-09-14 | 2000-03-28 | Matsumoto Seiyaku Kogyo Kk | 可溶性固体ポリチタノキサンおよびその誘導体の製造方法 |
JP2000264893A (ja) * | 1999-01-14 | 2000-09-26 | Jsr Corp | 金属錯体、金属錯体の製造方法、金属錯体水溶液および金属酸化物 |
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Cited By (6)
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JP2006069876A (ja) * | 2004-09-06 | 2006-03-16 | Nippon Soda Co Ltd | 新規骨格を有する金属化合物、その製造方法、分散液及び分散体 |
JP4585256B2 (ja) * | 2004-09-06 | 2010-11-24 | 日本曹達株式会社 | チタン化合物の微粒子を含む分散体の製造方法 |
CN103917487A (zh) * | 2011-09-05 | 2014-07-09 | 东曹株式会社 | 制膜用材料、iv族金属氧化物膜和亚乙烯基二酰胺络合物 |
CN105001254A (zh) * | 2011-09-05 | 2015-10-28 | 东曹株式会社 | 制膜用材料、iv族金属氧化物膜的制造方法 |
US9371452B2 (en) | 2011-09-05 | 2016-06-21 | Tosoh Corporation | Film-forming material, group IV metal oxide film and vinylenediamide complex |
CN105001254B (zh) * | 2011-09-05 | 2018-09-11 | 东曹株式会社 | 制膜用材料、iv族金属氧化物膜的制造方法 |
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