WO2004100629A1

WO2004100629A1 - Flux transferring device and method of transferring flux

Info

Publication number: WO2004100629A1
Application number: PCT/JP2004/006356
Authority: WO
Inventors: Takeyoshi Isogai; Noriaki Iwaki; Tsuyoshi Hamane
Original assignee: Fuji Machine Mfg. Co., Ltd.
Priority date: 2003-05-09
Filing date: 2004-04-30
Publication date: 2004-11-18
Also published as: JP4412915B2; JP2004330261A

Abstract

A flux transferring device for forming a high-quality flat flux film without irregularities by squeegeeing. The device comprises a scrape squeegee (15) for scraping the used flux in a film-forming recessed portion (12) of a transfer table (11) when the squeegee is relatively moved from one end to the other end of the film-forming recessed portion (12) and a film-forming squeegee (14) for forming a flux film by uniformly spreading a flux supplied to the film-forming recessed portion (12) from one end to the other end of the film-forming recessed portion (12). Both squeegees are moved in contact with the bottom of the film-forming recessed portion (12). When the flux film is formed, the film-forming squeegee (14) is operated with the scrape squeegee (15) raised upward. When the flux is scraped, the scrape squeegee (15) is operated with the film forming squeegee (14) raised upward.

Description

Description Flux transfer device and flux transfer method

According to the present invention, a flux film is formed by uniformly spreading a flux, a conductive paste, a conductive adhesive, etc. (hereinafter, these are referred to as “flux”) with a squeegee on a transfer table, and transferring the flux film to the flux film. The present invention relates to a flux transfer device and a flux transfer method for transferring a flux to a transfer target by immersing (dipping) the target. Background art

As shown in Japanese Patent Publication No. H08-2396915 and Japanese Patent Publication No. 2000-228585, this type of flux transfer device is mounted on the upper surface of a transfer table. Flux is supplied to the formed film-forming concave portion, and the squeegee or the transfer table is moved while maintaining a constant gap between the bottom surface of the film-forming concave portion and the squeegee. A flux film is formed by performing smoothing by uniformly pushing and spreading the flux in the concave portion for film formation with a squeegee. Since the transfer of the flux to the transfer target is performed by dipping the transfer target such as a bump on the flux film, the flux reduced by the transfer is replenished after the transfer and smoothing is performed. Is repeated. In the above-mentioned conventional flux transfer device, it is possible to replenish the flux reduced by the transfer, but the flux remaining on the transfer table will not be replaced even if the scanning operation is repeatedly performed.

Generally, due to the nature of the flux, if it is left in contact with the atmosphere, the property changes such as hardening as the time becomes longer. In the conventional flux transfer device described above, the flux remaining on the transfer table does not change even if the squeezing operation is performed repeatedly, so that the flux remaining on the transfer table gradually hardens, and as a result, the ski Fluxing film There is a drawback that the surface is not flat and irregularities are formed, resulting in an excessive or insufficient flux transfer state to a transfer target such as a bump. In addition, since only the upper layer of the flux film is exposed during the scanning operation, in addition to the problem of flux hardening, there is also a problem of flux oxidization, deterioration, and deterioration of flux quality due to mixing of micro air. Disclosure of the invention

Therefore, an object of the present invention is to replace the flux in the film-forming concave portion of the transfer table, and to form a flat high-quality flux film without unevenness by a squeezing operation. It is an object of the present invention to provide a flux transfer device and a flux transfer method capable of improving the quality of flux transfer to a transfer target.

In order to achieve the above object, the present invention provides a method for forming a flux, a conductor base, a conductive adhesive or the like (hereinafter referred to as “flux”) on a concave portion for film formation formed on the upper surface of a transfer table. Is supplied, and the squeegee arranged on the transfer table or the transfer table is moved, so that the flux in the concave portion for film formation is uniformly spread by the squeegee to form a flux film. Then, the transfer target is lowered from above the transfer table by an elevating device, and the transfer target is immersed in the flux film, so that the flux transfer device transfers the flux to the transfer target. While being in contact with the bottom surface of the concave portion for film formation, the flux is moved relatively from one side to the other side of the concave portion for film formation to extract the used flux in the concave portion for film formation. A squeegee for ejection, and a squeegee for film formation that uniformly spreads the flux supplied into the concave portion for film formation from one side to the other side of the concave portion for film formation to form a flux film. A squeegee switching device for retracting the ejection squeegee upward when forming the flux film and retracting the film formation squeegee upward when ejecting the flux is provided.

When this flux transfer device is used, a step of supplying a flux into the concave portion for film formation and uniformly spreading the flux with a film forming squeegee to form a flux film; By immersing in the flux film, A step of transferring the flux to the transfer target; and a step of using the projecting squeegee with the projecting squeegee in contact with the bottom surface of the film forming concave section to use the used flux in the film forming concave section. And the step of extracting

In this way, no matter how many times the transfer process is repeated, the used flux remaining in the film-forming concave portion of the transfer table is removed from the film-forming concave portion by the extraction squeegee every time the transfer process is completed. And then replace it with a new flux, and then perform the squeezing operation of the film-forming squeegee to always use a new flux to form a flat, high-quality flux film with no irregularities. The flux can be uniformly transferred to a transfer target such as a bump. This not only solves the problems of conventional flux hardening, but also the problems of flux oxidation, deterioration, and flux quality degradation due to the mixing of micro air. Transfer quality can be improved.

In this case, the width of the film-forming squeegee is set to be larger than the width of the film-forming concave portion, and the depth of the film-forming concave portion is set to be the same as the thickness of the flux film. By moving the film forming squeegee or the transfer table in a state where both end portions of the film forming squeegee are projected on both sides of the film forming concave surface portion and abut on the upper surface of the transfer table, the film forming concave surface is formed. It is advisable to uniformly spread out the flux in the part to form a flux film. In this way, the gap between the squeegee for film formation and the bottom surface of the concave portion for film formation (thickness of the flux film) is fixed by the depth of the concave portion for film formation during squeezing for forming the flux film. The dimensions can be accurately regulated, and a flux film having a uniform thickness and excellent flatness can be efficiently formed with a simple configuration.

Further, the squeegee switching device attaches the ejection squeegee and the film-forming squeegee to a rotating member in a C-shape, and rotates the rotating member to lower the squeegee located on the rotating direction side. Then, it is preferable to raise the squeegee on the opposite side. With this configuration, it is possible to easily switch between the descending squeegee and the film-forming squeegee Z elevation simply by switching the rotating direction of the rotating member, thereby simplifying the configuration of the squeegee switching device. it can.

On the other hand, if no squeegee for ejection is provided, the width of the squeegee should be Set the width of the concave portion for film formation larger than the width of the concave portion for film formation, and set the depth of the concave portion for film formation to be the same as the thickness of the flux film. Flux that is configured to protrude to both sides and perform squeegeeing while being in contact with the upper surface of the transfer table, and to discharge flux near the center of the squeegee and near the center of the concave surface for film formation. It is preferable to adopt a configuration in which a discharge nozzle is attached. In this way, at the time of squeegeeing, a new flux is discharged from the flux discharge nozzle to the vicinity of the center of the film forming concave portion, so that the used flux in the film forming concave portion is pushed outward by the new flux. be able to. As a result, the used flux remaining in the concave portion for film formation after the transfer process can be replaced with a new flux, and a flat flux film without unevenness can be formed by the squeezing operation, and bumps and the like can be formed. Flux can be uniformly transferred to the transfer target.

In this case, on both sides of the transfer table, walls are provided which extend in parallel with the squeegee in the vicinity of both ends of the squeegee, and a flux which tends to flow out from both ends of the squeegee during the squeegee is applied to the wall. A notch portion for discharging the flux swept out by a squeegee is provided at a portion of the wall portion located on the squeezing direction side of the film-forming concave portion, It is preferable that a flux collecting unit for collecting the flux discharged from the notch be provided below the notch. With this configuration, the flux that tends to flow out from both ends of the squeegee during squeegeeing can be blocked by the wall, so that newly supplied flux can be prevented from flowing out from both ends of the squeegee during squeegeeing. The flux in the concave part for film formation can be replaced with a new flux with the minimum necessary amount of supplied flux. Moreover, since the used flux swept out by the squeegee can be discharged from the cutout portion at the end of the squeegee and recovered by the flux collection section, there is an advantage that the used flux can be recycled and reused. BRIEF DESCRIPTION OF THE FIGURES

FIGS. 1A to 1C are diagrams illustrating a process of forming a flux film in Example 1. FIG.

2A to 2C are process diagrams for explaining the flux transfer process in the first embodiment.

FIG. 3A to FIG. 3C are diagrams illustrating a flux extracting step in the first embodiment.

FIG. 4 is a process flowchart showing the flow of each process.

FIG. 5 is a plan view of the transfer table according to the second embodiment.

FIG. 6 is a longitudinal sectional view of the flux transfer device of the second embodiment.

FIG. 7 is a perspective view of a transfer table according to the second embodiment. BEST MODE FOR CARRYING OUT THE INVENTION

[Example 1]

Hereinafter, a first embodiment of the present invention will be described with reference to FIGS.

First, the configuration of the flux transfer device will be described with reference to FIGS. On the upper surface of the transfer table 11, a rectangular concave portion 12 for film formation is formed. The concave portion 12 for film formation has a flat bottom surface, and the depth dimension of the concave portion 12 for film formation is the same as that of the flux film 13 formed in the concave portion 12 for film formation. It is set the same as the thickness dimension.

Above the transfer table 11, a film forming squeegee 14 and an output squeegee 15 are arranged. The film forming squeegee 14 and the output squeegee 15 are mounted in a U-shape on a rotating member 16 which is a squeegee switching device, and a motor capable of rotating the rotating member 16 forward and backward. By rotating the squeegee located on the side of the rotating direction, the squeegee on the opposite side is raised by rotating the squeegee on the opposite side (not shown). The rotating member 16 is supported at right angles to the squeegee direction, and the lower edges of both squeegees 14 and 15 are at right angles to the squeegee direction.

The width of the film-forming squeegee 14 is set to be larger than the width of the film-forming concave portion 12. As a result, as shown in FIG. 1C, in the process of forming the flux film 13, both ends of the film formation squeegee 14 are projected and transferred to both sides of the film formation concave portion 12. By moving the transfer table 11 (or the film forming squeegee 14) in a state of being in contact with the upper surface of the table 11, a ski that uniformly pushes and spreads the flux in the film forming concave portion 12. The flux film 13 is formed by performing zing.

On the other hand, the width of the ejection squeegee 15 is set smaller than the width of the film-forming concave portion 12 by a predetermined clearance. As a result, as shown in FIG. 3, in the process of extracting the used flux in the concave portion 12 for film formation, the squeegee 15 for extraction is brought into contact with the bottom surface of the concave portion 12 for film formation. In this state, the used flux in the film-forming concave surface portion 12 is extracted by relatively moving the film-forming concave surface portion 12 from one side to the other side. ing.

In addition, near the center of the rotating member 16, a flux discharge nozzle 17 for discharging the flux into the concave portion 12 for film formation is attached to the squeegee side of the squeegee 14 for film formation. . In the first embodiment, a driving device (not shown) for moving the transfer table 11 forward and backward is provided. By moving the transfer table 11 forward and backward, the film forming squeegee 14 and the ejection squeegee are provided. It is configured to squeeze without moving 15. However, the transfer table 11 may be fixed, and the film-forming squeegee 14 and the ejection squeegee 15 may be moved in parallel along the upper surface of the transfer table 11 for squeegeeing. Needless to say.

Next, a procedure for transferring the flux to a transfer target such as the bump 20 using the flux transfer device having the above configuration will be described. In the first embodiment, the flux transfer to the transfer target is repeated as follows by repeating the four operations shown in FIG. Now, the used flux in the concave portion 12 for film formation of the transfer table 11 is ejected by the extracting squeegee 15 described later, and the inside of the concave portion 12 for film formation is almost empty. It is assumed that

Thereafter, as shown in FIG. 1A, the rotating member 16 is rotated in a counterclockwise direction to retract the ejection squeegee 15 above the transfer table 11 and to form a film-forming squeegee. 14 is lowered so that the lower edge of the film-forming squeegee 14 is brought into contact with the position on the upper surface of the transfer table 11 opposite to the squeezing direction with respect to the film-forming concave portion 12. In this state, the flux is discharged from the flux discharge nozzle 17 into the concave portion 12 for film formation. Thereafter, the transfer table 11 is moved in the forward direction so that both ends of the film forming squeegee 14 protrude from both sides of the film forming concave portion 12 as shown in FIGS. 1B and 1C. In a state in which the flux is in contact with the upper surface of the transfer table 11, squeezing for uniformly pushing and spreading the flux in the concave portion 12 for film formation is performed to form the flux film 13. This squeezing operation is performed until the lower edge of the film-forming squeegee 14 reaches a position on the side in the scanning direction from the film-forming concave portion 12. The thickness dimension of the flux film 13 formed in this manner is the same as the depth dimension of the concave portion 12 for film formation.

After the formation of the flux film 13, as shown in FIG. 2, the electronic component 19 is sucked by the suction nozzle 18 of the lifting device, and the electronic component 19 is lowered from above the transfer table 11. The bumps 20 (transfer target) on the lower surface of the electronic component 19 are immersed (dipped) in the flux film 13 to transfer the flux to the bumps 20, and then the electronic component 19 is transferred to the transfer surface. Move the bull 1 1 up.

Thereafter, as shown in FIG. 3A, the rotating member 16 is rotated clockwise to retreat the film-forming squeegee 14 above the transfer table 11, and the ejecting squeegee 1 5 is lowered to bring the lower edge of the ejection squeegee 15 into contact with the end of the bottom surface of the film-forming concave portion 12 of the transfer table 11. Thereafter, by moving the transfer table 11 in the backward direction, as shown in FIGS. 3B and 3C, the ejection squeegee 15 is moved along the bottom surface of the film forming concave portion 12. Slide to expose the used flux in the concave part 12 for film formation. As a result, the inside of the film-forming concave portion 12 becomes almost empty. After that, returning to the state of FIG. 1A, as described above, the flux is discharged into the concave portion 12 for film formation, the flux film 13 is formed by the squeegee 14 for film formation, and the bump 2 is formed. Transfer of the flux to 0 (see Fig. 2) and extraction of the flux with the squeegee for extraction 15 (see Fig. 3) are repeated many times in this order.

According to the first embodiment described above, in a state where the transfer table 11 is in contact with the bottom surface of the film-forming concave portion 12, the film-forming concave portion 12 is positioned from one side to the other side. The extraction squeegee 15 which is relatively moved to extract the used flux in the film-forming concave portion 12, and the flux supplied into the film-forming concave portion 12 are A film-forming squeegee 14 for forming a flux film 13 by uniformly spreading from one side to the other side of the film-forming concave portion 12 is provided. 1 The squeezing operation is performed by the film forming squeegee 14 with the film squeegee 14 retracted upward while the film squeegee 14 is retracted upward. Squeezing operation is performed, so that, regardless of how many times the transfer process is repeated, the used flux remaining in the concave portion 12 for film formation is removed every time the transfer process is completed. After extruding from the concave portion 12 for film formation by 5 and replacing it with a new flux, the squeegee operation of the squeegee 14 for film formation is performed, so that irregularities are always used using a new flux. It is possible to form a flat, high-quality flux film 13 with no flux, and to uniformly transfer the flux to a transfer target such as a bump 20. As a result, not only the conventional problem of flux hardening but also the problem of flux oxidization, deterioration, and flux quality degradation due to the mixing of micro air can be solved at once. The transfer quality of the flux can be improved.

Moreover, in the first embodiment, the width of the film-forming squeegee 14 is set to be larger than the width of the film-forming concave portion 12, and the depth of the film-forming concave portion 12 is set to the flux. The thickness of the film 13 is set to be the same as that of the film 13. The flux film 13 is formed by performing a squeezing operation. Therefore, the gap between the squeegee 14 for film formation and the bottom surface of the concave portion 12 for film formation (thickness of the flux film 13) ) Can be precisely regulated to a certain size by the depth of the concave portion 12 for film formation, and the flux film 13 with uniform thickness and excellent flatness can be efficiently formed with a simple configuration. There is also an advantage that can be.

If the width of the film-forming squeegee 14 is smaller than the width of the film-forming concave surface 12, the gap between the film-forming squeegee 14 and the film-forming concave surface 12 is kept constant. A squeezing operation may be performed in a state where the gap is held constant by the gap holding mechanism.

In the first embodiment, the extraction squeegee 15 and the film formation squeegee 14 are attached to the rotating member 16 in an eight-letter shape, and the rotating member 16 is rotated. Since the squeegee located on the side of the rotating direction is lowered and the squeegee on the opposite side is lifted, the switching direction of the rotating member 16 can be changed by simply changing the rotating direction of the rotating member 16. It is possible to easily switch between lowering and raising of the film forming squeegee 14 and to simplify the configuration of the squeegee switching device.

However, the present invention may be configured such that the film-forming squeegee 14 and the output squeegee 15 are moved up and down separately by a vertical actuator such as a cylinder.

Also, in the examples of FIGS. 1 to 3, only one concave portion 12 for film formation is formed on the transfer table 11, but the transfer table is formed linearly long, and a plurality of transfer surfaces having different depth dimensions are formed. The thickness dimension of the flux film may be switched by forming the film-forming concave portion and switching the film-forming concave portion to be used.

Also, the transfer table is not limited to a linear type that reciprocates linearly, and one or a plurality of concave portions for film formation are formed on a cylindrical transfer table that can be rotated forward and reverse. You may do it.

In the first embodiment, after the transfer process, the used flux remaining in the concave portion 12 for film formation is extracted by the extraction squeegee 15 and replaced with a new flux every time after the completion of the transfer process. However, every time the transfer step is performed a plurality of times, the flux squeegee 15 may be used to perform the flux extraction once. Even in this case, the used flux in the concave portion 12 for film formation can be replaced with a new flux before hardening, oxidation, deterioration, etc. occur, and the intended object of the present invention can be achieved. it can.

[Example 2]

Next, a second embodiment of the present invention will be described with reference to FIGS. The second embodiment has a configuration in which no squeegee for projection is provided and only one squeegee 21 for film formation is provided. Then, the width of the squeegee 21 is set to be larger than the width of the concave portion 23 for film formation of the transfer table 22, and the depth of the concave portion 23 for film formation is set to the width of the flux film 24. It is set the same as the thickness dimension. At the time of the squeegeeing operation, both ends of the squeegee 21 are projected on both sides of the film-forming concave portion 23 so as to make contact with the upper surface of the transfer table 22 for squeezing. Further, near the center of the squeegee 21, a flux discharge nozzle 25 for discharging a flux is mounted near the center of the concave portion 23 for film formation.

Also, on both sides of the transfer table 22, close the skis at both ends of the squeegee 21. By providing a wall 26 extending parallel to the jigging direction and setting the gap between the wall 26 and the end of the squeegee 21 to the minimum necessary for the sliding clearance, Flux that is about to flow out from both ends of the squeegee 21 is blocked by the wall 26. At the time of squeegee, one of the transfer table 22 and the squeegee 21 may be moved.

A notch portion 27 for discharging the flux swept out by the squeegee 21 is provided in a portion of the wall portion 26 located on the squeezing direction side with respect to the film-forming concave portion 23, and the transfer table ₂ is provided. A flux collecting part 28 for collecting the flux discharged from the notch 27 is provided in a gutter shape below the notch 2.

In the second embodiment configured as described above, when a new flux is discharged from the flux discharge nozzle 25 near the center of the film forming concave portion 23 during the squeezing operation, the film forming concave portion 2 3 The used flux inside will be pushed outward by the new flux. As a result, the used flux remaining in the concave portion 23 for film formation after the transfer process can be replaced with a new flux, and a flat high-quality flux film 24 without unevenness is formed by the scanning operation. Thus, the flux can be uniformly transferred to a transfer target such as a bump.

In addition, the flux that flows out from both ends of the squeegee 21 during squeegeeing can be blocked by the wall 26, preventing the newly supplied flux from flowing out from both ends of the squeegee 21 during scanning. The flux in the concave portion 23 for film formation can be replaced with a new flux with a minimum necessary amount of supplied flux. In addition, the used flux that has been swept out by the squeegee 21 can be discharged from the notch 27 at the end of squeezing and recovered by the flux recovery unit 28, so that the used flux can be recycled. There is also an advantage that it can be reused.

In the examples of FIGS. 5 to 7, only one concave portion 12 for film formation is formed on the transfer table 11. However, the transfer table 22 is formed to be linearly long, and a plurality of transfer surfaces having different depth dimensions are formed. The thickness dimension of the flux film may be switched by forming a plurality of concave portions for film formation and switching the concave portions for film formation to be used.

Also, the transfer table is not limited to a linear motion type that reciprocates linearly. One or more concave portions for film formation may be formed on a rotatable cylindrical transfer table. Industrial applicability

The scope of use of the present invention is not limited to a flux transfer device, but can be used as a transfer device for conductive paste, antibody paste, conductive adhesive, and the like.

Claims

The scope of the claims

1. In a flux transfer device that transfers flux, conductor paste, conductive adhesive, etc. (hereinafter, these are collectively referred to as “flux”) to a transfer target, a concave portion for film formation to which flux is supplied is provided on the upper surface. And a transfer table on which the film-forming concave portion is relatively moved from one side to the other while being in contact with the bottom surface of the film-forming concave portion, and An output squeegee that pumps out the used flux,

A film-forming squeegee for uniformly spreading a flux supplied into the film-forming concave portion from one side of the film-forming concave portion to the other side to form a flux film; An elevating device for transferring the flux to the transfer target by lowering the transfer target from above the table and immersing the transfer target in the flux film;

A squeegee switching device that retracts the ejection squeegee upward when forming a flux film, and retracts the deposition squeegee upward during flux ejection.

A flux transfer device characterized by comprising:

2. The width of the extraction squeegee is set smaller than the width of the film-forming concave portion;

The width of the film forming squeegee is set to be larger than the width of the film forming concave portion, and the depth of the film forming concave portion is set to be the same as the thickness of the flux film.

By moving the film forming squeegee or the transfer table in a state in which both end portions of the film forming squeegee are projected on both sides of the film forming concave surface portion and are in contact with the upper surface of the transfer table, 2. The flux transfer device according to claim 1, wherein the flux in the concave portion for film is uniformly spread to form a flux film.

3. The squeegee switching device is located on the rotation direction side by attaching the ejection squeegee and the film forming squeegee to a rotating member in a C-shape, and rotating the rotating member. 2. The flux transfer device according to claim 1, wherein the flux transfer device is configured to lower the squeegee and raise the squeegee on the opposite side.

4. A flux transfer method for transferring a flux, a conductive paste, a conductive adhesive, etc. (hereinafter, collectively referred to as “flux”) to a transfer target using a flux transfer device,

The flux transfer device,

A transfer table on which a film-forming concave portion to which a flux is supplied is formed on an upper surface, and a film-forming concave portion in contact with the bottom surface of the film-forming concave portion from one side to the other side of the film-forming concave portion An ejection squeegee that is relatively moved to eject the used flux in the film-forming concave portion;

A film-forming squeegee for uniformly spreading a flux supplied into the film-forming concave portion from one side of the film-forming concave portion to the other side to form a flux film; An elevating device that transfers flux to the transfer target by lowering the transfer target from the top of the table and immersing the transfer target in the flux film;

A squeegee switching device for retracting the ejection squeegee upward during flux film formation and retracting the film formation squeegee upward during flux ejection.

Supplying a flux into the film-forming concave portion and uniformly spreading the flux by the film-forming squeegee to form a flux film;

Immersing the transfer target in the flux film to transfer the flux to the transfer target;

Repeating the step of using the ejection squeegee to bring out the used flux in the film-forming concave portion with the ejection squeegee in contact with the bottom surface of the film-forming concave portion. A flux transfer method characterized by the following.

5. Flux, conductor base, conductive adhesive, etc. (hereinafter collectively referred to as “flux”) are supplied to the concave surface for film formation formed on the upper surface of the transfer table. By moving the arranged squeegee or the transfer table, the flux in the film-forming concave portion is uniformly spread by the squeegee to form a flux film (hereinafter, this operation is referred to as “squeezing”). The transfer target is lowered from above the transfer table so that the transfer target is immersed in the flux film. In the flux transfer device for transferring the flux to the transfer target, the width of the squeegee is set to be larger than the width of the concave portion for film formation, and the depth of the concave portion for film formation is set. The thickness of the flux film is set to be the same as the thickness of the flux film, and both ends of the squeegee are protruded on both sides of the concave portion for film formation, and squeezing is performed in a state of contacting the upper surface of the transfer table. And

A flux transfer device, wherein a flux discharge nozzle for discharging a flux is mounted near a central portion of the film forming concave portion near the central portion of the squeegee.

6. On both sides of the transfer table, walls are provided which extend in parallel with the squeegee in the vicinity of both ends of the squeegee, and a flux which tends to flow out from both ends of the squeegee at the time of squeegee is formed on the wall. A notch portion for discharging the flux swept out by the squeegee is provided in a portion of the wall portion located on the squeezing direction side of the film-forming concave portion in the wall portion; 6. The flux transfer device according to claim 5, wherein a flux collecting unit is provided below the notch to collect the flux discharged from the notch.