WO2004093120A2 - Secondary electron detector unit for a scanning electron microscope - Google Patents

Secondary electron detector unit for a scanning electron microscope Download PDF

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Publication number
WO2004093120A2
WO2004093120A2 PCT/PL2004/000026 PL2004000026W WO2004093120A2 WO 2004093120 A2 WO2004093120 A2 WO 2004093120A2 PL 2004000026 W PL2004000026 W PL 2004000026W WO 2004093120 A2 WO2004093120 A2 WO 2004093120A2
Authority
WO
WIPO (PCT)
Prior art keywords
scanning electron
plate
detector unit
micro
head body
Prior art date
Application number
PCT/PL2004/000026
Other languages
English (en)
French (fr)
Other versions
WO2004093120A3 (en
Inventor
Witold Slowko
Original Assignee
Politechnika Wroclawska
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Politechnika Wroclawska filed Critical Politechnika Wroclawska
Priority to DE602004017153T priority Critical patent/DE602004017153D1/de
Priority to EP04726840A priority patent/EP1614137B1/de
Publication of WO2004093120A2 publication Critical patent/WO2004093120A2/en
Publication of WO2004093120A3 publication Critical patent/WO2004093120A3/en
Priority to US11/248,431 priority patent/US7425708B2/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2443Scintillation detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/2602Details
    • H01J2237/2605Details operating at elevated pressures, e.g. atmosphere

Definitions

  • the subject of the invention is the secondary electron detector unit for a scanning electron microscope, destined particularly for working at pressures of order of 100 Pa in the sample chamber.
  • the secondary electron detector unit known from the patent application: No P 329339, entitled “High pressure scanning electron microscope”, is composed of the secondary electron scintillator detector placed behind die microporous plate that is built into the vacuum wall separating the intermediate chamber and the electron optical column part.
  • the detector scintillator and the microporous plate are located coaxially with the electron optical column, along which the electron beam goes.
  • a more functional solution of the secondary electron detector unit for a scanning electron microscope is known from the paper: Sl ⁇ wko W.: Electron signal acquisition in HPSEM, Vacuum 2003, vol. 70, p. 157.
  • the scintillator is placed aside from the electron optical axis, in the both solutions, the stream of secondary electrons is led into the intermediate chamber through the hole in the lower throttling aperture and impinges symmetrically the input surface of the microporous plate, which is placed at the electron optical axis.
  • the electrons passing across the microporous plate are multiplied, and at the output side they are attracted by the scintillator biased with a high voltage, and detected finally.
  • the active input surface of the microporous plate is ring-shaped and coaxial with the electron beam. In the central part it is limited by the hole made on the axis of the microporous plate to let through the electron beam while its maximum diameter is limited by the opening in the frame plate, which also fixes the microporous plate in the frame body of the detector.
  • the substance of the invention consists in the fact, that the active input area of the microporous plate is placed asymmetrically with regard to the axis of the scanning electron beam.
  • the advantages of the secondary electron detector unit for a scanning electron microscope according to the invention are that the gas flow to the high vacuum part can be reduced and the detector lifetime can be prolonged while the sensitivity of the detector is preserved.
  • the subject of the invention is shown in the Figure, which displays the secondary electron detector unit for a scanning electron microscope in the cross- section.
  • the secondary electron detector unit for a scanning electron microscope is mounted in the head body 1, made of teflon.
  • the lower tiarottling aperture 2 of the form of the metal plate with a small hole at the axis of the electron beam WE is placed in the lower part of the head body 1.
  • the micro-porous plate 3 is located above the lower throttling aperture 2, the micro-porous plate 3 is located.
  • the micro-porous plate 3 has a hole at the axis of the electron beam WE, in which the screen pipe 4 is fastened by means of the teflon sealing.
  • the micro-porous plate 3 is sealed in the head body 1 by means of the gasket 5, and fastened with use of the frame plate 6 which has the opening that uncovers the active input area 7.
  • the deflecting electrode 8 is placed.
  • the screen plate 9 is located. The screen plate 9 is bended properly to uncover the active output area 10 of the microporous plate 3 located at the scintillator 11 and the light pipe 12 side, because they are fixed at the side of the head body 1.
  • the secondary electron detector unit for a scanning electron microscope arranged in the described way works as follow.
  • Secondary electrons ew generated from the sample 13 are attracted by the lower throttling aperture 2 biased positively, and pass through the hole in the electrode.
  • the stream of the secondary electrons ew is deflected toward the active input area 7 by the deflecting electrode 8.
  • the deflecting electrode 8 and the frame plate 6 the stream of secondary electrons ew can be focused on the active input area 7.
  • Secondary electrons ew pass through microscopic channels of the micro-porous plate 3 biased with voltage of order of IkV, and are multiplied due to secondary emission from its walls.
  • the multiplied stream of secondary electrons ew escape the micro-porous plate 3 in the active output area 10 that is not blanked off by the screen plate 9. Then, secondary electrons ew are attracted by the scintillator 11 biased positively about 12kV, and they generate a light signal transmitted further by the light pipe 12
  • the active input area 7 may be reduced to a small fraction of the micro-porous plate 3 input surface. In this case, the harmful flow of gas through the micro-pQrous plate 3 can be reduced proportionally. Besides, the active input area 7 may occupy only a sector of the micro-porous plate 3, so the plate need not be exchanged when the sector is contaminated. It would be enough to turn it of certain angle around the electron beam axis WE and an uncontaminated fragment of the micro-porous plate 3 can be seen in the opening of the frame plate (6) that defines the active input area 7. Such operation may be repeated several times depending on the size of the active input area 7 and the total area of the micro-porous plate 3.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)
  • Electron Sources, Ion Sources (AREA)
PCT/PL2004/000026 2003-04-17 2004-04-09 Secondary electron detector unit for a scanning electron microscope WO2004093120A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE602004017153T DE602004017153D1 (de) 2003-04-17 2004-04-09 Sekundärelektronendetektor für ein rasterelektronenmikroskop
EP04726840A EP1614137B1 (de) 2003-04-17 2004-04-09 Sekundärelektronendetektor für ein rasterelektronenmikroskop
US11/248,431 US7425708B2 (en) 2003-04-17 2005-10-13 Secondary electron detector unit for a scanning electron microscope

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PL359748 2003-04-17
PL359748A PL207199B1 (pl) 2003-04-17 2003-04-17 Układ detekcyjny elektronów wtórnych do skaningowego mikroskopu elektronowego

Publications (2)

Publication Number Publication Date
WO2004093120A2 true WO2004093120A2 (en) 2004-10-28
WO2004093120A3 WO2004093120A3 (en) 2004-12-09

Family

ID=33297595

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/PL2004/000026 WO2004093120A2 (en) 2003-04-17 2004-04-09 Secondary electron detector unit for a scanning electron microscope

Country Status (5)

Country Link
US (1) US7425708B2 (de)
EP (1) EP1614137B1 (de)
DE (1) DE602004017153D1 (de)
PL (1) PL207199B1 (de)
WO (1) WO2004093120A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL207238B1 (pl) * 2003-10-14 2010-11-30 Politechnika Wroclawska Układ detekcyjny elektronów wtórnych i wstecznie rozproszonych do skaningowego mikroskopu elektronowego
US7531812B2 (en) * 2003-10-27 2009-05-12 Politechnika Wroclawska Method and system for the directional detection of electrons in a scanning electron microscope
US7952073B2 (en) * 2008-08-01 2011-05-31 Direct Electron, Lp Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
US10439964B2 (en) * 2010-04-22 2019-10-08 Nokia Technologies Oy Method and apparatus for providing a messaging interface
US9659260B2 (en) 2011-03-15 2017-05-23 Dan Caligor Calendar based task and time management systems and methods
WO2014022429A1 (en) 2012-07-30 2014-02-06 Fei Company Environmental sem gas injection system
US9418819B2 (en) 2013-09-06 2016-08-16 Kla-Tencor Corporation Asymmetrical detector design and methodology
US9478390B2 (en) * 2014-06-30 2016-10-25 Fei Company Integrated light optics and gas delivery in a charged particle lens
US20160196248A1 (en) * 2015-01-05 2016-07-07 Musaed Ruzeg N. ALRAHAILI System, apparatus, method and computer program product to set up a request for, generate, receive and send official communications
DK201670595A1 (en) * 2016-06-11 2018-01-22 Apple Inc Configuring context-specific user interfaces
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5990483A (en) * 1997-10-06 1999-11-23 El-Mul Technologies Ltd. Particle detection and particle detector devices
EP0986092A1 (de) * 1996-11-06 2000-03-15 Hamamatsu Photonics K.K. Elektronenvervielfacher

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62184752A (ja) * 1986-02-07 1987-08-13 Jeol Ltd 荷電粒子ビ−ム測長機
JP3081393B2 (ja) * 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡
US5408098A (en) * 1993-09-10 1995-04-18 International Business Machines Corporation Method and apparatus for detecting low loss electrons in a scanning electron microscope
PL189008B1 (pl) 1998-10-21 2005-05-31 Politechnika Wroclawska Wysokociśnieniowy skaningowy mikroskop elektronowy
US6646262B1 (en) * 2000-03-31 2003-11-11 Hitachi, Ltd. Scanning electron microscope

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0986092A1 (de) * 1996-11-06 2000-03-15 Hamamatsu Photonics K.K. Elektronenvervielfacher
US5990483A (en) * 1997-10-06 1999-11-23 El-Mul Technologies Ltd. Particle detection and particle detector devices

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 0120, no. 26 (E-577), 26 January 1988 (1988-01-26) -& JP 62 184752 A (JEOL LTD), 13 August 1987 (1987-08-13) *
SLOWKO W: "Electron signal acquisition in HPSEM" VACUUM ELSEVIER UK, vol. 70, no. 2-3, 10 March 2003 (2003-03-10), pages 157-162, XP002301026 ISSN: 0042-207X cited in the application *

Also Published As

Publication number Publication date
WO2004093120A3 (en) 2004-12-09
PL207199B1 (pl) 2010-11-30
US20060027748A1 (en) 2006-02-09
EP1614137A2 (de) 2006-01-11
DE602004017153D1 (de) 2008-11-27
EP1614137B1 (de) 2008-10-15
US7425708B2 (en) 2008-09-16
PL359748A1 (en) 2004-10-18

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