WO2004093120A2 - Secondary electron detector unit for a scanning electron microscope - Google Patents
Secondary electron detector unit for a scanning electron microscope Download PDFInfo
- Publication number
- WO2004093120A2 WO2004093120A2 PCT/PL2004/000026 PL2004000026W WO2004093120A2 WO 2004093120 A2 WO2004093120 A2 WO 2004093120A2 PL 2004000026 W PL2004000026 W PL 2004000026W WO 2004093120 A2 WO2004093120 A2 WO 2004093120A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- scanning electron
- plate
- detector unit
- micro
- head body
- Prior art date
Links
- 238000010894 electron beam technology Methods 0.000 claims abstract description 9
- 230000003287 optical effect Effects 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000012634 fragment Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2443—Scintillation detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2602—Details
- H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
Definitions
- the subject of the invention is the secondary electron detector unit for a scanning electron microscope, destined particularly for working at pressures of order of 100 Pa in the sample chamber.
- the secondary electron detector unit known from the patent application: No P 329339, entitled “High pressure scanning electron microscope”, is composed of the secondary electron scintillator detector placed behind die microporous plate that is built into the vacuum wall separating the intermediate chamber and the electron optical column part.
- the detector scintillator and the microporous plate are located coaxially with the electron optical column, along which the electron beam goes.
- a more functional solution of the secondary electron detector unit for a scanning electron microscope is known from the paper: Sl ⁇ wko W.: Electron signal acquisition in HPSEM, Vacuum 2003, vol. 70, p. 157.
- the scintillator is placed aside from the electron optical axis, in the both solutions, the stream of secondary electrons is led into the intermediate chamber through the hole in the lower throttling aperture and impinges symmetrically the input surface of the microporous plate, which is placed at the electron optical axis.
- the electrons passing across the microporous plate are multiplied, and at the output side they are attracted by the scintillator biased with a high voltage, and detected finally.
- the active input surface of the microporous plate is ring-shaped and coaxial with the electron beam. In the central part it is limited by the hole made on the axis of the microporous plate to let through the electron beam while its maximum diameter is limited by the opening in the frame plate, which also fixes the microporous plate in the frame body of the detector.
- the substance of the invention consists in the fact, that the active input area of the microporous plate is placed asymmetrically with regard to the axis of the scanning electron beam.
- the advantages of the secondary electron detector unit for a scanning electron microscope according to the invention are that the gas flow to the high vacuum part can be reduced and the detector lifetime can be prolonged while the sensitivity of the detector is preserved.
- the subject of the invention is shown in the Figure, which displays the secondary electron detector unit for a scanning electron microscope in the cross- section.
- the secondary electron detector unit for a scanning electron microscope is mounted in the head body 1, made of teflon.
- the lower tiarottling aperture 2 of the form of the metal plate with a small hole at the axis of the electron beam WE is placed in the lower part of the head body 1.
- the micro-porous plate 3 is located above the lower throttling aperture 2, the micro-porous plate 3 is located.
- the micro-porous plate 3 has a hole at the axis of the electron beam WE, in which the screen pipe 4 is fastened by means of the teflon sealing.
- the micro-porous plate 3 is sealed in the head body 1 by means of the gasket 5, and fastened with use of the frame plate 6 which has the opening that uncovers the active input area 7.
- the deflecting electrode 8 is placed.
- the screen plate 9 is located. The screen plate 9 is bended properly to uncover the active output area 10 of the microporous plate 3 located at the scintillator 11 and the light pipe 12 side, because they are fixed at the side of the head body 1.
- the secondary electron detector unit for a scanning electron microscope arranged in the described way works as follow.
- Secondary electrons ew generated from the sample 13 are attracted by the lower throttling aperture 2 biased positively, and pass through the hole in the electrode.
- the stream of the secondary electrons ew is deflected toward the active input area 7 by the deflecting electrode 8.
- the deflecting electrode 8 and the frame plate 6 the stream of secondary electrons ew can be focused on the active input area 7.
- Secondary electrons ew pass through microscopic channels of the micro-porous plate 3 biased with voltage of order of IkV, and are multiplied due to secondary emission from its walls.
- the multiplied stream of secondary electrons ew escape the micro-porous plate 3 in the active output area 10 that is not blanked off by the screen plate 9. Then, secondary electrons ew are attracted by the scintillator 11 biased positively about 12kV, and they generate a light signal transmitted further by the light pipe 12
- the active input area 7 may be reduced to a small fraction of the micro-porous plate 3 input surface. In this case, the harmful flow of gas through the micro-pQrous plate 3 can be reduced proportionally. Besides, the active input area 7 may occupy only a sector of the micro-porous plate 3, so the plate need not be exchanged when the sector is contaminated. It would be enough to turn it of certain angle around the electron beam axis WE and an uncontaminated fragment of the micro-porous plate 3 can be seen in the opening of the frame plate (6) that defines the active input area 7. Such operation may be repeated several times depending on the size of the active input area 7 and the total area of the micro-porous plate 3.
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Measurement Of Radiation (AREA)
- Electron Tubes For Measurement (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE602004017153T DE602004017153D1 (de) | 2003-04-17 | 2004-04-09 | Sekundärelektronendetektor für ein rasterelektronenmikroskop |
EP04726840A EP1614137B1 (de) | 2003-04-17 | 2004-04-09 | Sekundärelektronendetektor für ein rasterelektronenmikroskop |
US11/248,431 US7425708B2 (en) | 2003-04-17 | 2005-10-13 | Secondary electron detector unit for a scanning electron microscope |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL359748 | 2003-04-17 | ||
PL359748A PL207199B1 (pl) | 2003-04-17 | 2003-04-17 | Układ detekcyjny elektronów wtórnych do skaningowego mikroskopu elektronowego |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004093120A2 true WO2004093120A2 (en) | 2004-10-28 |
WO2004093120A3 WO2004093120A3 (en) | 2004-12-09 |
Family
ID=33297595
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/PL2004/000026 WO2004093120A2 (en) | 2003-04-17 | 2004-04-09 | Secondary electron detector unit for a scanning electron microscope |
Country Status (5)
Country | Link |
---|---|
US (1) | US7425708B2 (de) |
EP (1) | EP1614137B1 (de) |
DE (1) | DE602004017153D1 (de) |
PL (1) | PL207199B1 (de) |
WO (1) | WO2004093120A2 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL207238B1 (pl) * | 2003-10-14 | 2010-11-30 | Politechnika Wroclawska | Układ detekcyjny elektronów wtórnych i wstecznie rozproszonych do skaningowego mikroskopu elektronowego |
US7531812B2 (en) * | 2003-10-27 | 2009-05-12 | Politechnika Wroclawska | Method and system for the directional detection of electrons in a scanning electron microscope |
US7952073B2 (en) * | 2008-08-01 | 2011-05-31 | Direct Electron, Lp | Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy |
US10439964B2 (en) * | 2010-04-22 | 2019-10-08 | Nokia Technologies Oy | Method and apparatus for providing a messaging interface |
US9659260B2 (en) | 2011-03-15 | 2017-05-23 | Dan Caligor | Calendar based task and time management systems and methods |
WO2014022429A1 (en) | 2012-07-30 | 2014-02-06 | Fei Company | Environmental sem gas injection system |
US9418819B2 (en) | 2013-09-06 | 2016-08-16 | Kla-Tencor Corporation | Asymmetrical detector design and methodology |
US9478390B2 (en) * | 2014-06-30 | 2016-10-25 | Fei Company | Integrated light optics and gas delivery in a charged particle lens |
US20160196248A1 (en) * | 2015-01-05 | 2016-07-07 | Musaed Ruzeg N. ALRAHAILI | System, apparatus, method and computer program product to set up a request for, generate, receive and send official communications |
DK201670595A1 (en) * | 2016-06-11 | 2018-01-22 | Apple Inc | Configuring context-specific user interfaces |
US11239048B2 (en) * | 2020-03-09 | 2022-02-01 | Kla Corporation | Arrayed column detector |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5990483A (en) * | 1997-10-06 | 1999-11-23 | El-Mul Technologies Ltd. | Particle detection and particle detector devices |
EP0986092A1 (de) * | 1996-11-06 | 2000-03-15 | Hamamatsu Photonics K.K. | Elektronenvervielfacher |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62184752A (ja) * | 1986-02-07 | 1987-08-13 | Jeol Ltd | 荷電粒子ビ−ム測長機 |
JP3081393B2 (ja) * | 1992-10-15 | 2000-08-28 | 株式会社日立製作所 | 走査電子顕微鏡 |
US5408098A (en) * | 1993-09-10 | 1995-04-18 | International Business Machines Corporation | Method and apparatus for detecting low loss electrons in a scanning electron microscope |
PL189008B1 (pl) | 1998-10-21 | 2005-05-31 | Politechnika Wroclawska | Wysokociśnieniowy skaningowy mikroskop elektronowy |
US6646262B1 (en) * | 2000-03-31 | 2003-11-11 | Hitachi, Ltd. | Scanning electron microscope |
-
2003
- 2003-04-17 PL PL359748A patent/PL207199B1/pl unknown
-
2004
- 2004-04-09 EP EP04726840A patent/EP1614137B1/de not_active Expired - Fee Related
- 2004-04-09 DE DE602004017153T patent/DE602004017153D1/de not_active Expired - Lifetime
- 2004-04-09 WO PCT/PL2004/000026 patent/WO2004093120A2/en active Application Filing
-
2005
- 2005-10-13 US US11/248,431 patent/US7425708B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0986092A1 (de) * | 1996-11-06 | 2000-03-15 | Hamamatsu Photonics K.K. | Elektronenvervielfacher |
US5990483A (en) * | 1997-10-06 | 1999-11-23 | El-Mul Technologies Ltd. | Particle detection and particle detector devices |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 0120, no. 26 (E-577), 26 January 1988 (1988-01-26) -& JP 62 184752 A (JEOL LTD), 13 August 1987 (1987-08-13) * |
SLOWKO W: "Electron signal acquisition in HPSEM" VACUUM ELSEVIER UK, vol. 70, no. 2-3, 10 March 2003 (2003-03-10), pages 157-162, XP002301026 ISSN: 0042-207X cited in the application * |
Also Published As
Publication number | Publication date |
---|---|
WO2004093120A3 (en) | 2004-12-09 |
PL207199B1 (pl) | 2010-11-30 |
US20060027748A1 (en) | 2006-02-09 |
EP1614137A2 (de) | 2006-01-11 |
DE602004017153D1 (de) | 2008-11-27 |
EP1614137B1 (de) | 2008-10-15 |
US7425708B2 (en) | 2008-09-16 |
PL359748A1 (en) | 2004-10-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7425708B2 (en) | Secondary electron detector unit for a scanning electron microscope | |
EP0462554B1 (de) | Ladungsträgerstrahlgerät | |
US9153416B2 (en) | Detection method for use in charged-particle microscopy | |
JP5571355B2 (ja) | ガス増幅を使用した走査透過電子顕微鏡 | |
US6236053B1 (en) | Charged particle detector | |
EP2002459B1 (de) | Verbesserter detektor für instrumente mit geladenem teilchenstrahl | |
EP0786145B1 (de) | Unter etwas erhöhtem druck arbeitendes feldemissionsrasterelektronenmikroskop | |
EP1537595B1 (de) | Sekundärelektronendetektor insbesondere in einem rasterelektronenmikroskop | |
US7470915B2 (en) | Detector system of secondary and backscattered electrons for a scanning electron microscope | |
CN108352284B (zh) | 宽场大气压扫描电子显微镜 | |
US20120091337A1 (en) | Charged particle beam devices | |
KR20020026468A (ko) | 하전 입자 장치 | |
US10037862B2 (en) | Charged particle detecting device and charged particle beam system with same | |
EP1533828B1 (de) | Iondetektor | |
WO2010008307A2 (en) | Electron detection unit and a scanning electron microscope | |
JP2006221876A (ja) | イオン検出器、イオン検出器を備える質量分析計、イオン検出器を操作する方法 | |
JP5993356B2 (ja) | 走査型電子顕微鏡 | |
Toth et al. | Secondary electron imaging at gas pressures in excess of 15 torr | |
US7446327B2 (en) | Apparatus for amplifying a stream of charged particles | |
JP2006278208A (ja) | 真空シール構造及び真空シール構造を備える荷電粒子線装置 | |
EP1678734A1 (de) | Elektronendetektionssystem für ein rasterelektronenmikroskop | |
JP2001291485A (ja) | 走査電子顕微鏡 | |
JPH11260304A (ja) | 荷電粒子ビーム装置用2次電子検出器 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2004726840 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 2004726840 Country of ref document: EP |