WO2004066455A3 - Systeme d'eclairage par projection equipe d'un dispositif d'eclairage - Google Patents
Systeme d'eclairage par projection equipe d'un dispositif d'eclairage Download PDFInfo
- Publication number
- WO2004066455A3 WO2004066455A3 PCT/EP2004/000330 EP2004000330W WO2004066455A3 WO 2004066455 A3 WO2004066455 A3 WO 2004066455A3 EP 2004000330 W EP2004000330 W EP 2004000330W WO 2004066455 A3 WO2004066455 A3 WO 2004066455A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- illumination
- projection
- flushing gas
- light source
- gas flow
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
Landscapes
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Toxicology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
L'invention concerne un système d'éclairage par projection (1) comportant un dispositif d'éclairage (3) pourvu d'une source lumineuse, en particulier un laser émetteur de lumière ultraviolette, un objectif de projection (7), un plan réticule dans lequel est placé un réticule (5), un plan tranche dans lequel est placée une tranche (2) ainsi qu'un système à gaz de lavage permettant de laver l'intérieur de l'objectif de projection (7) et/ou les zones extérieures, en particulier les plans réticule et tranche. Ledit système comporte au moins un dispositif (25, 32, 33) destiné à surveiller au moins un flux de gaz de lavage, lequel dispositif interrompt le rayonnement de la source lumineuse vers l'objectif de projection (7) lorsque la limite inférieure d'un débit de gaz de lavage prescrit est dépassée. Ce dispositif (25, 32, 33) destiné à surveiller le flux de gaz de lavage est relié à la source lumineuse par l'intermédiaire d'un dispositif de commande, lequel dispositif de commande (27) est équipé d'une minuterie (36).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003102665 DE10302665A1 (de) | 2003-01-24 | 2003-01-24 | Projektionsbelichtungsanlage mit einem Beleuchtungssystem |
DE10302665.7 | 2003-01-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004066455A2 WO2004066455A2 (fr) | 2004-08-05 |
WO2004066455A3 true WO2004066455A3 (fr) | 2005-04-21 |
Family
ID=32694941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2004/000330 WO2004066455A2 (fr) | 2003-01-24 | 2004-01-17 | Systeme d'eclairage par projection equipe d'un dispositif d'eclairage |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE10302665A1 (fr) |
WO (1) | WO2004066455A2 (fr) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1004937A2 (fr) * | 1998-11-27 | 2000-05-31 | Nikon Corporation | Appareil d'exposition et système optique pour celui-ci |
US6295121B1 (en) * | 1996-01-05 | 2001-09-25 | Canon Kabushiki Kaisha | Exposure apparatus |
EP1143491A1 (fr) * | 1998-11-19 | 2001-10-10 | Nikon Corporation | Dispositif optique, systeme d'exposition et source de faisceau laser, procede d'alimentation en gaz, procede d'exposition et procede de fabrication de dispositif |
WO2002054464A1 (fr) * | 2000-12-28 | 2002-07-11 | Nikon Corporation | Construction a liaison gpib et son utilisation |
-
2003
- 2003-01-24 DE DE2003102665 patent/DE10302665A1/de not_active Withdrawn
-
2004
- 2004-01-17 WO PCT/EP2004/000330 patent/WO2004066455A2/fr active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6295121B1 (en) * | 1996-01-05 | 2001-09-25 | Canon Kabushiki Kaisha | Exposure apparatus |
EP1143491A1 (fr) * | 1998-11-19 | 2001-10-10 | Nikon Corporation | Dispositif optique, systeme d'exposition et source de faisceau laser, procede d'alimentation en gaz, procede d'exposition et procede de fabrication de dispositif |
EP1004937A2 (fr) * | 1998-11-27 | 2000-05-31 | Nikon Corporation | Appareil d'exposition et système optique pour celui-ci |
WO2002054464A1 (fr) * | 2000-12-28 | 2002-07-11 | Nikon Corporation | Construction a liaison gpib et son utilisation |
US20040141164A1 (en) * | 2000-12-28 | 2004-07-22 | Nikon Corporation | Exposure method and exposure apparatus |
Also Published As
Publication number | Publication date |
---|---|
DE10302665A1 (de) | 2004-08-12 |
WO2004066455A2 (fr) | 2004-08-05 |
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