WO2004035423A1 - Storage container for receiving precision substrates such as wafers - Google Patents

Storage container for receiving precision substrates such as wafers Download PDF

Info

Publication number
WO2004035423A1
WO2004035423A1 PCT/JP2003/013236 JP0313236W WO2004035423A1 WO 2004035423 A1 WO2004035423 A1 WO 2004035423A1 JP 0313236 W JP0313236 W JP 0313236W WO 2004035423 A1 WO2004035423 A1 WO 2004035423A1
Authority
WO
WIPO (PCT)
Prior art keywords
container
flange
peripheral wall
wafers
shaped peripheral
Prior art date
Application number
PCT/JP2003/013236
Other languages
French (fr)
Japanese (ja)
Inventor
Shigeaki Ueda
Yasuyuki Watanabe
Original Assignee
Kabushiki Kaisha Daihachikasei
Pla-Net Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kabushiki Kaisha Daihachikasei, Pla-Net Corporation filed Critical Kabushiki Kaisha Daihachikasei
Priority to US10/531,304 priority Critical patent/US20060019411A1/en
Priority to DE10393523T priority patent/DE10393523B4/en
Publication of WO2004035423A1 publication Critical patent/WO2004035423A1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/30Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
    • B65D85/48Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for glass sheets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67386Closed carriers characterised by the construction of the closed carrier
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/30Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
    • B65D85/42Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for ampoules; for lamp bulbs; for electronic valves or tubes

Definitions

  • the present invention is intended to accommodate a plurality of precision substrates such as semiconductor wafers (hereinafter, sometimes referred to as “plates”) at equal intervals without contacting each other, and to perform processing such as storage, transportation, cleaning, etching, or drying.
  • the present invention relates to a precision substrate storage container suitable for handling including. Background art
  • a precision substrate storage container for storing and transporting precision substrates such as semiconductors and performing processes such as cleaning, etching, and drying includes a cassette in which a plurality of substrates are inserted and held at equal intervals, It consists of a substrate holder that holds the upper end circumferential surface of the inserted substrate, a container body that houses the force set and the substrate holder, a gasket that is attached to the periphery of the opening of the container body, and a lid. It is customary. (See Fig. 1)
  • the container such as the substrate is cleaned for each component before the substrate is stored.
  • the container body is placed on the washing table in an appropriate state such as an inverted state, or is suspended by a device in which the washing table moves in the vertical direction, and the washing liquid is jetted onto the washing table to be washed. You. Then, compressed air is blown to blow off the residual liquid and dry.
  • the container body 21 since a container such as a semiconductor wafer needs to be airtight enough to withstand various transport conditions, the container body 21 (see FIG. 6) has a large number of ribs and bent portions.
  • the container has a high-strength design, and is easy to handle.
  • a gasket mounting groove 22a is formed slightly below the opening end 22 of the container main body, and then a flange having a shape protruding outward from the container main body from near the bottom surface and folded downward. It is customary to provide the flange 23 entirely or partially (see Fig. 6).
  • the washing water is sprayed onto the container body to wash it, and then the container is dried in an inverted state.
  • the liquid in the container body drops naturally, but the inside of the above-mentioned folded flange 2 3 2 4 has a groove-like shape, in which the washing water is accumulated, and the liquid is scattered by the compressed air. The fact is that it cannot be obtained.
  • Plastic which is a material of the substrate container, is easily charged with static electricity.
  • static electricity adsorbs dust and mixes with the remaining water droplets and is dried, spot-like contamination remains in the container. For this reason, a substrate container having a structure in which water droplets are unlikely to remain is required.
  • a through hole or a slit is formed in the folded flange (for example, see Patent Document 1).
  • the first rim is integrally formed near the end of the flange (extended above the opening of the container body) and projects slightly outwardly of the peripheral wall of the container body, taking into account the lateral slide.
  • the front surface is slightly inclined so that the thickness decreases from the root to the tip, and the back surface is also slightly inclined so that the thickness decreases from the root to the tip.
  • a precision substrate container is disclosed in which a second rim is formed at a similar inclination angle on the bottom side of the main body. (See Patent Document 2)
  • Patent Document 2 Japanese Patent Publication No. 1 9 9 9 9 1 2 9 7 8 7 7 (Refer to Claim 1 and FIG. 6)
  • the back side of the folded flange portion in the conventional container shown in FIG. 6 has a groove or a reservoir shape (sump). As described above, water droplets stay on the inner side 24 of the substrate container.
  • the flange portion is formed in the substrate container disclosed in Patent Document 1, in the state where the container is inverted. There was no other choice but to wait for the dripping from the through-holes or slits provided in the machine.
  • reinforcement is provided between the orbital first rim and the second rim in order to facilitate the flow of washing water in a direction parallel to the peripheral wall of the container body.
  • the partition ribs cannot be formed, which leaves a problem in the strength in the vertical direction of the periphery of the opening of the container.
  • Substrate storage containers are often transported by air, for example, to foreign countries, in which case the substrates are stored in the container on the ground (under atmospheric pressure) and completely sealed with a lid via a gasket. And loaded into the cargo hold of the aircraft for transport. As this aircraft flies, ascending to the sky, the air pressure in the cargo compartment drops extremely, causing an imbalance between the air pressure and the internal pressure of the container, and the lid and container body are attracted in the opening direction. At the same time, the side wall bulges outward, and the opening edges of the lid and the main body are distorted. Then, when the aircraft descends to the ground, the distortion will be deformed again in the direction of restoration due to the atmospheric pressure. At this time, an obstacle has been experienced in which a gap is formed in the gasket portion, the outside air containing dust is sucked into the container, and the substrate is contaminated. Therefore, the substrate container is required to have high pressure resistance as well as cleanliness.
  • the cleaning liquid adhering to the container after the cleaning is used.
  • the shape of each part of the container has a gradient in the dropping direction of the attached cleaning liquid.
  • this is not a requirement. Rather, it is shaped so that the compressed air blown after washing reaches every corner of the container wall, that is, without a hidden angled shadow that is not exposed to the air flow, and as a result, water droplets are scattered by the compressed air. It is desirable to make the shape easy to disappear.
  • the present invention relates to the above-mentioned precision substrate storage container such as a wafer, wherein the container main body 10 has a lower portion corresponding to the height of the gasket 5 from the opening edge thereof.
  • An L-shaped peripheral wall 12 is erected on the outer peripheral wall.
  • the first flange 13 integrally projecting outward from the bottom of the L-shaped peripheral wall is provided except for a predetermined distance D at the center of the front and back sides (sometimes referred to as front and rear sides of the container) of the container.
  • the first flange has the same amount of protrusion as the first flange, and the second flange 14 is formed at the bottom with a distance of 1 cm to several cm (appropriate spacing).
  • a plurality of vertical ribs 15 are provided between the L-shaped peripheral wall 12 (first flange 13) and the second flange 14.
  • a predetermined interval D between the center of the front and back sides of the container main body is located below the L-shaped peripheral wall, at a predetermined height above the second flange 14 and is substantially the same as the L-shaped peripheral wall. ⁇
  • a horizontal rib 16 with the same amount of lateral protrusion and a locking projection 16a with the lid is attached.
  • the predetermined height corresponds to the distance between the lower end surface of the locking plate 2a hanging down on the front and rear surfaces of the lid 1 and the lower end edge of the engagement hole 2b.
  • a plurality of vertical ribs 17 are formed between the upper surface of the horizontal rib 16 and the bottom surface of the L-shaped peripheral wall.
  • the present invention provides the precision substrate storage container such as a wafer according to the above invention, wherein the lower surface of the gasket insertion groove 12a comprising the L-shaped peripheral wall and the first and second flanges are provided.
  • the lower surface is inclined 1 in a direction to rise outward from the side wall of the container body; and the upper surfaces of the first flange and the second flange are in a direction descending outward from the side wall of the container body. Inclusion of the inclination 02 facilitates the dropping of water droplets attached to the back surfaces of the first flange and the second flange when the container body is inverted after cleaning.
  • a protruding ridge 14a is protruded on the lower surface of the leading edge of the second flange, and a similar protruding ridge 16b is protruded on the lateral rib. This prevents the fingers from slipping during handling and improves the strength of the flanges and ribs.
  • the installation interval of the plurality of vertical ribs 15 may be 0.5 to 3 times the interval between the first flange and the second flange, or the interval between the L-shaped peripheral wall and the horizontal rib. Includes improving the scattering and elimination of residual cleaning liquid by spraying compressed air for drying by setting it to within 5 times.
  • the substrate container according to the present invention has an L-shaped peripheral wall (first flange), a second flange, and a lateral rib surrounding the edge of the board.
  • first flange first flange
  • second flange second flange
  • lateral rib surrounding the edge of the board.
  • the substrate accommodating container according to the present invention is provided with a plurality of vertical ribs between the first flange and the second flange, or between the L-shaped peripheral wall and the horizontal ribs, so that the container shape is laterally partitioned.
  • Many parts were formed, and at the time of washing, depending on the installation posture of the container body, washing water remained in the horizontal compartment, and there was a concern that drying might be delayed.
  • after the washing there is a step of blowing compressed air toward the container as described above, whereby the compressed air blown into the lateral compartment is restrained by the four side walls, ⁇
  • Piezoelectric air would be discharged reflected from little attenuation child _ and ⁇ Ku bottom injection rate, the first flange residual moisture of the located there, the second flange, above the edges of the longitudinal ribs such as Will be efficiently scattered.
  • a laterally open pocket constrained by such a wall has a circular or square shape that is excellent for removing water droplets, but the distance between the first and second flanges is, for example, 1.5 cm to 3.0 cm. In this case, by setting the interval between the vertical ribs to 0.5 to 3.5 times (square or rectangular to aspect ratio 3.5), a good water droplet removal effect was obtained.
  • FIG. 1 is an exploded perspective view showing the structure of a substrate storage container according to the present invention, in which the components are separated and shown.
  • FIG. 2 is a perspective view showing a main body of the substrate storage container.
  • Fig. 3 is a front view of the substrate container main body.
  • the left half from the center line is an external view, and the right half from the center line is a cross section.
  • FIG. 4 is a partial longitudinal sectional view showing a gasket insertion groove (12a), a first flange (13), and a second flange (14).
  • FIG. 5 is a half cut bottom view for explaining a horizontal rib (16) provided at a predetermined interval (D) in the center of the front and back sides of the container.
  • FIG. 6 shows a conventional example (container main body) of a container for storing substrates and the like, and FIG. 6 (a) is a perspective view thereof, and FIG. 6 (b) is a partial longitudinal sectional view of an AA section.
  • Fig. 7 shows another conventional example (container main body).
  • Fig. 7 (a) is a front view
  • Fig. 7 (b) is an enlarged side view of the circled part in (a). It is sectional drawing.
  • the opening end is an opening peripheral wall 11 that fits with the lid 2, and an L-shaped cross-sectional peripheral wall 12 is provided immediately below the outer wall surface of the opening peripheral wall 11.
  • the gasket insertion groove 12a is formed between the outer wall of the peripheral wall 11 and the gasket insertion groove 12a.
  • the first flange 13 (which is protruded in a substantially horizontal direction integrally from the bottom of the L-shaped peripheral wall 12 (therefore, the horizontal bottom of the L-shaped peripheral wall is a portion of the L-shaped peripheral wall, and (The two numbers 1 2 and 13 are given because they are also part of the first flange) around the front and back sides of the container except for a predetermined interval D at the center, and further, A second flange 14 having substantially the same shape and the same amount of protrusion as the first flange 13 is formed at a distance of 1 cm—a few cm (at an appropriate interval) below (the bottom side) the first flange 13, and A plurality of vertical ribs 15 are provided between the L-shaped peripheral wall 12 (first flange 13) and the second flange 14.
  • the interval between the plurality of vertical ribs 15 is ⁇ .5 to 3.5 times, preferably 1 to 12 times the vertical interval between the first flange 13 and the second flange 14. (Fig. 2)
  • the predetermined distance D at the center of the front and back sides of the container is a distance enough for the locking plate 2a formed in a hanging shape to pass through the lid 2 fitted to the container body (that is, (Spacing equal to the width of the stop plate 2a).
  • the L-shaped peripheral wall 12 is located on the bottom surface side of the container with respect to the bottom surface and slightly above the second flange 14, and is substantially the same as the L-shaped peripheral wall.
  • a lateral rib 16 having a laterally projecting amount and further provided with a locking projection 16a is stretched.
  • Several vertical ribs 17 are formed between the horizontal rib 16 and the bottom surface of the L-shaped peripheral wall 12.
  • the interval between the plurality of vertical ribs 17 is set to 0.5 to 3.5 times, preferably 1 to 2 times the vertical interval between the L-shaped peripheral wall 12 and the horizontal ribs 16.
  • a convex ridge 16 b having a width and a height of about 1 mm to 2 mm is formed at the lower end edge of the horizontal rib 16, and the upper surface of the engaging projection 16 a is The lower end of the vertical rib 17 forms an inclined wall that reaches the tip of the projection 16a to enhance the strength. (See Fig. 2 and Fig. 5)
  • the L-shaped peripheral wall 1 2 (first flange 13), second flange 14, vertical rib 15, horizontal rib 16, and vertical rib 17 each contact the wall of the container body 10.
  • the radius of the fillet curve which is about 1/2 or less of the wall thickness of the container body, is attached to the surface of the fillet, and further from the base end of the fillet curve radius to the tip end of the rib. It is graded so that it becomes thinner.
  • This gradient (for example, 0 1 and ⁇ 2 in Fig. 4) is a basic value required for a molded product to be easily removed from a mold in plastic injection molding, for example, 1 ° to 15 °. You.
  • a ridge 14a having a straight line or an intermittent point 14b for improving drainage is formed at the front end edge of the rear surface of the second flange 14. (See Fig. 2)
  • the column-shaped portions 1 are provided at the lower four corners of the second flange 14. Forming eight.
  • a part of the container side wall 19 on the front and rear sides between the columnar parts 18 is a partially arcuate part 19a, the lower part of which is flat and retreats inside the container, and the container side walls 20 on the left and right sides are They are flat and slightly retreated inside the container from the columnar portions 18, and both of them hang down and are connected to the bottom plate.
  • These structures contribute to the rigidity of the entire container.
  • the lid 2 that covers the container body 10 is integrally formed with a locking plate 2a protruding at two opposing surfaces of the opening edge, and is further engaged with the locking plate 2a. Opening 2b is open.
  • the substrate housing cassette 4 has an opening in the vertical direction, one of the opposing side walls has an arc shape below the middle part to narrow the gap, and the inner surface has a large number in the vertical direction.
  • the partition wall 4a is formed, and a base insertion groove for accommodating 41 base plates is formed in the partition wall 4a.
  • the substrate holder 3 has a large number of elastic substrate holding arms 3a formed at the same pitch as the above-mentioned substrate passage groove (between the partition walls 4a and 4a).
  • the container is washed with water by a washing machine. At this time, the container is hung upside down or slantingly in the washing apparatus with the opening part downward, and the washing water is sprayed. Then, the remaining air is blown off by blowing compressed air and dried.
  • the container-like horizontal section is formed by the first flange 13, the second flange 14, the vertical rib 15, and the like for reinforcing the opening. .
  • a gasket 5 is attached to the container main body 10 at the mouth end thereof, and a substrate housing cassette 4 inserts a substrate (not shown) such as a wafer between the partition walls 4 a to insert the container main body 10 into the container main body 10. Housed within.
  • the substrate holder 3 having the substrate holding arm 3a is placed on the upper end of the substrate housing cassette 4, and the cover 2 is further covered.
  • an engagement through hole 2b of a locking plate 2a integrally projecting from the lower edge of the lid 2 is engaged with an engagement projection 16b formed on the container body 10, and the container is It is sealed.
  • the main body 10 is provided with a first flange 13 of the container when the container is turned upside down at the time of washing or after washing.
  • the cleaning water adhering to the second flange 14 and the lateral ribs 16 flows outward and drops, so that reliable drying can be obtained in a short time. Therefore, no dust adheres during drying.
  • the strength of the substrate container is dramatically improved, Through The airtightness is not broken by the pressure difference in the usual air transportation.
  • the convexity 14 a having a break point is formed at the front end edge of the lower surface of the second flange 14, so that dripping of washing water is easy and hand slip during handling is eliminated.
  • the container 10 of the present invention cannot be held by only one outward flange, and the holding requires holding the side wall surface 20 of the container with both hands. As described above, since considerable attention is required for holding the container, safe handling of the container and therefore the substrate can be obtained.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Packaging Frangible Articles (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Closures For Containers (AREA)
  • Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)

Abstract

A storage container for receiving precision substrates such as wafers, having increased strength and improved drying ability when washed. The storage container has a letter L-shaped circumferential wall (12) projectingly provided on an outer wall face, the circumferential wall functioning as a gasket insertion groove (12a). A first flange (13) horizontally extending from the lower end face of the letter L-shaped circumferential wall (12) and a second flange (14) horizontally extending from a position 10-30 mm lower than the first flange are respectively formed integrally with the container. Vertical ribs (15) are formed between the lower face of the first flange (13) and the upper face of the second flange (14).

Description

^  ^
明 細— · ウェハ等精密基板収容容器 技術分野  · Technical field for precision substrate storage containers such as wafers
【 0 0 0 1】  [0 0 0 1]
本発明は、 半導体ウェハ等の精密基板 (以後、 ¾板と称することがある) 複数 枚を等間隔で互いに接触することなく収容し、 保管、 運搬、 洗浄、 エッチング或 いは乾燥等の処理を含む取り扱いに好適な精密基板収容容器に関する。 背景技術  The present invention is intended to accommodate a plurality of precision substrates such as semiconductor wafers (hereinafter, sometimes referred to as “plates”) at equal intervals without contacting each other, and to perform processing such as storage, transportation, cleaning, etching, or drying. The present invention relates to a precision substrate storage container suitable for handling including. Background art
【 0 0 0 2】  [0 0 0 2]
半導体等の精密基板を保管し、 運搬し、 洗浄、 エッチング或いは乾燥等の処理 を行うための精密基板収容容器は、 複数枚の基板が等間隔に挿入されてこれを保 持するカセッ トと、 その挿入された基板の上端円周面を抑える基板抑え、 その力 セッ トと基板押えが収容される容器本体、 その容器本体の開口周縁に装着される ガスケッ トおよび蓋体で構成されるのが通例である。 (第 1図参照)  A precision substrate storage container for storing and transporting precision substrates such as semiconductors and performing processes such as cleaning, etching, and drying includes a cassette in which a plurality of substrates are inserted and held at equal intervals, It consists of a substrate holder that holds the upper end circumferential surface of the inserted substrate, a container body that houses the force set and the substrate holder, a gasket that is attached to the periphery of the opening of the container body, and a lid. It is customary. (See Fig. 1)
【 0 0 0 3】  [0 0 0 3]
半導体等の基板には、 たとえ微細な埃であってもそれが付着していることによ つてその後の製品の品質を著しく損なうことから、 この基板収容容器には高レべ ルのクリーン度が要求される。 このために、 基板を収容するに先だって基板等の 収容容器は部品毎に洗浄される。 この場合、 該容器本体は洗浄台上に倒立状態な ど適宜な態様において載置されるか、 或いは、 洗浄台が上下方向に移動する装置 に掛け吊され、 これに洗浄液を噴射して洗浄される。 次いで圧空気が吹き付けら れて残留液を吹き飛ばし乾燥するものである。  Even if fine dust adheres to substrates such as semiconductors, the quality of subsequent products is significantly impaired by the fact that they adhere to them. Required. For this reason, the container such as the substrate is cleaned for each component before the substrate is stored. In this case, the container body is placed on the washing table in an appropriate state such as an inverted state, or is suspended by a device in which the washing table moves in the vertical direction, and the washing liquid is jetted onto the washing table to be washed. You. Then, compressed air is blown to blow off the residual liquid and dry.
【 0 0 0 4】  [0 0 0 4]
従来技術では、 この半導体ウェハなどの容器には、 各種の輸送条件に耐える気 密性が必要とされることから、 該容器本体 2 1 (第 6図参照) には多数のリブや 屈曲状部を設けた高強度設計がなされており、 また、 該容器のハンドリングを容 易にするために、 容器本体の開口端 2 2のやや下方にガスケッ ト装着溝 2 2 aを 形成し、 次いで、 該底面近辺より容器本体の外方へ出て、 下方に折返す形状のフ ランジ 2 3を、 全周ないし部分的に設ける (第 6図参照) のが通例である。 これ らの形状、 特に折返しフランジ 2 3は人手によるハンドリングにおいて指が掛か りやすいこと、 および容器本体、 特に開口部の強度を飛躍的に向上させているこ とを意図している。 しかし、 その折返しフランジ部が後記のように洗浄、 乾燥に 障害となる問題があった。 According to the prior art, since a container such as a semiconductor wafer needs to be airtight enough to withstand various transport conditions, the container body 21 (see FIG. 6) has a large number of ribs and bent portions. The container has a high-strength design, and is easy to handle. For ease of use, a gasket mounting groove 22a is formed slightly below the opening end 22 of the container main body, and then a flange having a shape protruding outward from the container main body from near the bottom surface and folded downward. It is customary to provide the flange 23 entirely or partially (see Fig. 6). These shapes, especially the folded flanges 23, are intended to make it easier for fingers to be hooked during manual handling, and to significantly improve the strength of the container body, especially the opening. However, there was a problem that the folded flange portion hindered washing and drying as described below.
【 0 0 0 5】  [0 0 0 5]
すなわち、 容器本体に洗浄水を噴射し洗浄した後、 該容器を倒立状態で乾燥さ せるのであるが、 この場合、 容器本体内の液体は自然に滴下するが前記の折返し フランジ 2 3の内側 2 4は溝状となって洗浄水が溜まり、 圧空気で該液体を'飛散 させるにも前記折返しフランジ 2 3の折返し部が障壁となって十分に噴射空気が 行き届かず、 良好な除液効果が得られないのが実状である。  That is, the washing water is sprayed onto the container body to wash it, and then the container is dried in an inverted state. In this case, the liquid in the container body drops naturally, but the inside of the above-mentioned folded flange 2 3 2 4 has a groove-like shape, in which the washing water is accumulated, and the liquid is scattered by the compressed air. The fact is that it cannot be obtained.
【 0 0 0 6】  [0 0 0 6]
この基板収容容器の素材であるプラスチックは静電気を帯びやすい。 その静電 気が埃を吸着して前記の残存する水滴と混り、 乾燥されると該容器には斑点状の 汚染が残ることになる。 このようなことから、 水滴が残留しにくい構造の基板収 容容器が必要とされる。  Plastic, which is a material of the substrate container, is easily charged with static electricity. When the static electricity adsorbs dust and mixes with the remaining water droplets and is dried, spot-like contamination remains in the container. For this reason, a substrate container having a structure in which water droplets are unlikely to remain is required.
【 0 0 0 7】  [0 0 0 7]
このような洗浄水の残留を防止するために、 基板収容容器に付設すべき種々の 機構が先行技術に開示されている。 例えば前記の折返しフランジに貫通孔または スリ ッ トを形成したものがある (例えば、 特許文献 1参照)。 また、 「第 1のリ ムは (容器本体の開口部上方に伸長した) フランジの末端付近に一体形成されて 容器本体の周壁外方向に僅かながら先細りに突出し、横方向のスライ ドを考慮し、 表面が根本から先端に向かって厚さが減るように僅かに傾斜するとともに、 裏面 も根本から先端に向かって厚さが減るように僅かに傾斜して」 おり、 この第 1の リムより容器本体の底面側に位置して第 2のリムを同様の傾斜角度をもつて形成 した精密基板収容容器を開示.している。 (特許文献 2参照)  Various mechanisms to be attached to the substrate container to prevent such residual cleaning water are disclosed in the prior art. For example, there is one in which a through hole or a slit is formed in the folded flange (for example, see Patent Document 1). "The first rim is integrally formed near the end of the flange (extended above the opening of the container body) and projects slightly outwardly of the peripheral wall of the container body, taking into account the lateral slide. The front surface is slightly inclined so that the thickness decreases from the root to the tip, and the back surface is also slightly inclined so that the thickness decreases from the root to the tip. " A precision substrate container is disclosed in which a second rim is formed at a similar inclination angle on the bottom side of the main body. (See Patent Document 2)
【 0 0 0 8】 【特許文献 1】 _ _ [0 0 0 8] [Patent Document 1] _ _
特鬨 1 9 9 9一 2 9 7 8 0 7号公報 (請求項 1、 図 6参照) 【特許文献 2】  Japanese Patent Publication No. 1 9 9 9 1 2 9 7 8 7 7 (Refer to Claim 1 and FIG. 6) [Patent Document 2]
特鬨 2 0 0 2— 1 1 0 7 7 5号公報 (第 3ページ) 発明の開示  Tokiwaki 2 0 0 2— 1 1 0 7 7 5 Publication (Page 3) Disclosure of the Invention
【 0 0 0 9】  [0 0 0 9]
上記の半導体等の収容容器、 特に容器本体を水洗した後、 開口部を下向きにし て乾燥された場合、 従来例に係る図 6の容器では折返しフランジ部の裏面側が溝 ないし溜め容器状(sump )となって、 その内側 2 4に水滴が滞留することは前記の 通りで、 これを解決するために特許文献 1が開示している基板容器においては、 容器を倒立させた状態で、 前記フランジ部に設けた貫通孔またはスリッ トから自 然に滴下を待つ他はなかった。 また、 特許文献 2に鬨示の基板収容容器において は、 容器本体の周壁と平行方向にも洗浄水が流れ易くするために周回状の第 1 リ ムと第 2 リムとの間には補強用仕切リブが形成できない構成であり、 それによつ て、 容器の開口部周縁の上下方向の強度に問題を残すものとなっている。  When the above-mentioned container for semiconductors and the like, particularly the container body is washed with water and dried with the opening facing downward, the back side of the folded flange portion in the conventional container shown in FIG. 6 has a groove or a reservoir shape (sump). As described above, water droplets stay on the inner side 24 of the substrate container. In order to solve this problem, in the substrate container disclosed in Patent Document 1, in the state where the container is inverted, the flange portion is formed. There was no other choice but to wait for the dripping from the through-holes or slits provided in the machine. In addition, in the substrate container described in Patent Document 2, reinforcement is provided between the orbital first rim and the second rim in order to facilitate the flow of washing water in a direction parallel to the peripheral wall of the container body. The partition ribs cannot be formed, which leaves a problem in the strength in the vertical direction of the periphery of the opening of the container.
【 0 0 1 0】  [0 0 1 0]
基板収容容器は、 航空便で、 例えば外国へ輸送されることがしばしばあり、 そ の場合、 地上 (大気圧下) で、 基板を容器に収容し、 ガスケッ トを介して蓋体で 完全に密封され、 輸送のために航空機の貨物室に積載される。 この航空機が飛行 のため、 上空へ上昇すると貨物室の気圧は極端に低下し、 該気圧と容器の内圧と の間で不均衡を生じ、 蓋体と容器本体との間は開蓋方向に引き合い、 同時に側壁 は外方に膨れ、 蓋体および本体の開口端縁は歪曲することになる。 次いで航空機 が地上に降下した時は、大気圧により、その歪曲は復元する方向に再度変形する。 この時、 ガスケッ ト部に間隙を生じ容器内に塵埃を含んだ外気が吸入され、 基板 を汚染するという障害が経験されている。 したがって、 基板収容容器は清潔性と 同時に高度の耐圧性が求められる。  Substrate storage containers are often transported by air, for example, to foreign countries, in which case the substrates are stored in the container on the ground (under atmospheric pressure) and completely sealed with a lid via a gasket. And loaded into the cargo hold of the aircraft for transport. As this aircraft flies, ascending to the sky, the air pressure in the cargo compartment drops extremely, causing an imbalance between the air pressure and the internal pressure of the container, and the lid and container body are attracted in the opening direction. At the same time, the side wall bulges outward, and the opening edges of the lid and the main body are distorted. Then, when the aircraft descends to the ground, the distortion will be deformed again in the direction of restoration due to the atmospheric pressure. At this time, an obstacle has been experienced in which a gap is formed in the gasket portion, the outside air containing dust is sucked into the container, and the substrate is contaminated. Therefore, the substrate container is required to have high pressure resistance as well as cleanliness.
【 0 0 1 1】  [0 0 1 1]
また、 基板収容容器の洗浄作業においては、 洗浄後に該容器に付着する洗浄液 を圧空気で飛散させる工程があり、 し^こ つて、 該容器の各部分の形状は付着洗 浄液の滴下方向に勾配を形成することが望ましい。 しかし、 これが必須の条件と はならない。 むしろ、 洗浄後に吹き付けられる圧空気が容器の壁面の隅々まで届 くような、 即ち空気流に露呈(expose )されない隠れ障壁 dead angled shadowのない 形状とし、 その結果、 該圧空気によって水滴が飛散消失し易い形状とすることが 望まれるのである。 In the cleaning operation of the substrate storage container, the cleaning liquid adhering to the container after the cleaning is used. There is a step of dispersing the cleaning liquid with compressed air. Thus, it is desirable that the shape of each part of the container has a gradient in the dropping direction of the attached cleaning liquid. However, this is not a requirement. Rather, it is shaped so that the compressed air blown after washing reaches every corner of the container wall, that is, without a hidden angled shadow that is not exposed to the air flow, and as a result, water droplets are scattered by the compressed air. It is desirable to make the shape easy to disappear.
【 0 0 1 2】  [0 0 1 2]
本発明は、 基板収容容器において十分な強度と残留洗浄水の圧空気による飛散 性のよい構造を課題とするものである。  It is an object of the present invention to provide a substrate storage container having a structure having sufficient strength and good scattering properties due to compressed air of residual cleaning water.
【 0 0 1 3】  [0 0 1 3]
上記の課題を解決するために本発明は、 前述のウェハ等精密基板収容容器にお いて、 該容器本体 1 0には、 その開口端縁よりガスケッ ト 5の高さに相当する長 さ下方の外周壁に L字型周壁 1 2を立設する。 そして、 該 L字型周壁の底部から 外側へ一体的に突出する第 1 フランジ 1 3を、 該容器の正面及び裏面 (容器の前 後という場合がある) 側の中央部所定間隔 Dを除いて周設し、 さらに、 この第 1 フランジと側方への突出量をほぼ同じく し、 かつ、 底部側に 1 c m—数 c m (適 宜の間隔)を隔てた位置に第 2フランジ 1 4を形成して、 この L字型周壁 1 2 (第 1フランジ 1 3 ) と第 2フランジ 1 4の間に複数本の縦リブ 1 5を設ける。 そし て、 前記容器本体の正面及び裏面側中央部所定間隔部分 Dには、 前記 L字型周壁 より下方で、 第 2フランジ 1 4より所定高さ上方位置にあり且つ前記 L字型周壁 とほぽ同程度の側方突出量をもち、 更に蓋体との係止突起 1 6 aを付設した横リ ブ 1 6を張設する。 前記所定高さとは、 後記蓋体 1の前後面に垂下する係止板 2 aの下端面と係合通孔 2 bの下端縁との距離に相当するものである。 そして、 該 横リブ 1 6の上面と L字型周壁の底面との間に複数本の縦リブ 1 7を形成する。 これによつて、 該容器の開口部の強度補強と圧空気による残留洗浄液の飛散性を 良好にしたことを包含する。  In order to solve the above-mentioned problem, the present invention relates to the above-mentioned precision substrate storage container such as a wafer, wherein the container main body 10 has a lower portion corresponding to the height of the gasket 5 from the opening edge thereof. An L-shaped peripheral wall 12 is erected on the outer peripheral wall. Then, the first flange 13 integrally projecting outward from the bottom of the L-shaped peripheral wall is provided except for a predetermined distance D at the center of the front and back sides (sometimes referred to as front and rear sides of the container) of the container. The first flange has the same amount of protrusion as the first flange, and the second flange 14 is formed at the bottom with a distance of 1 cm to several cm (appropriate spacing). Then, a plurality of vertical ribs 15 are provided between the L-shaped peripheral wall 12 (first flange 13) and the second flange 14. A predetermined interval D between the center of the front and back sides of the container main body is located below the L-shaped peripheral wall, at a predetermined height above the second flange 14 and is substantially the same as the L-shaped peripheral wall.横 A horizontal rib 16 with the same amount of lateral protrusion and a locking projection 16a with the lid is attached. The predetermined height corresponds to the distance between the lower end surface of the locking plate 2a hanging down on the front and rear surfaces of the lid 1 and the lower end edge of the engagement hole 2b. Then, a plurality of vertical ribs 17 are formed between the upper surface of the horizontal rib 16 and the bottom surface of the L-shaped peripheral wall. As a result, the strength of the opening of the container is strengthened and the scattering of the residual cleaning liquid by the compressed air is improved.
【 0 0 1 4】  [0 0 1 4]
本発明は、 上記発明のウェハ等精密基板収容容器において、 前記 L字型周壁か らなるガスケヅ ト揷入溝 1 2 aの下面および第 1フランジおよび第 2フランジの ^ The present invention provides the precision substrate storage container such as a wafer according to the above invention, wherein the lower surface of the gasket insertion groove 12a comprising the L-shaped peripheral wall and the first and second flanges are provided. ^
下面は該容器本体の側壁から外方に向 ;て上昇する方向に傾斜 1 し、 該第 1フ ランジおよび第 2フランジの上面は該容器本体の側壁から外方に向かって下降す る方向に傾斜 0 2させることによって、 洗浄後に容器本体を倒立させたとき該第 1フランジおよび第 2フランジの裏面に付着する水滴を滴下し易く したことを包 含する。 The lower surface is inclined 1 in a direction to rise outward from the side wall of the container body; and the upper surfaces of the first flange and the second flange are in a direction descending outward from the side wall of the container body. Inclusion of the inclination 02 facilitates the dropping of water droplets attached to the back surfaces of the first flange and the second flange when the container body is inverted after cleaning.
【 0 0 1 5】  [0 0 1 5]
更に、 本発明は、 前記記載のウェハ等精密基板収容容器において、 前記第 2 フ ランジの先端縁下面に凸条 1 4 aを、 前記横リブにも同様な凸条 1 6 bを突設す ることによってハンドリング時の手指の滑りを阻止するとともに該フランジ、 該 リブの強度を向上させたことを包含する。  Further, in the present invention, in the precision substrate storage container such as the wafer described above, a protruding ridge 14a is protruded on the lower surface of the leading edge of the second flange, and a similar protruding ridge 16b is protruded on the lateral rib. This prevents the fingers from slipping during handling and improves the strength of the flanges and ribs.
【 0 0 1 6】  [0 0 1 6]
更に、 本発明は、 前記記載の容器発明において、 複数の縦リブ 1 5の設置間隔 を第 1フランジと第 2フランジの間隔、 又は L字型周壁と横リブの間隔の 0 . 5 倍ないし 3 . 5倍以内とすることによって乾燥用圧空気の噴射による残留洗浄液 の飛散消失性を向上させたことを包含する。  Further, in the container invention according to the above-described invention, the installation interval of the plurality of vertical ribs 15 may be 0.5 to 3 times the interval between the first flange and the second flange, or the interval between the L-shaped peripheral wall and the horizontal rib. Includes improving the scattering and elimination of residual cleaning liquid by spraying compressed air for drying by setting it to within 5 times.
【 0 0 1 7】  [0 0 1 7]
本発明を従来技術と比較すると、 本発明に係る基板収容容器は、 その鬨ロ端縁 辺を L字型周壁 (第 1 フランジ)、 第 2フランジおよぴ横リブが取り巻き、 さら に、 第 1フランジと第 2フランジ間、 L字型周壁と横リブ間に、 それそれ複数の 縦リブを形成したことにより、 該開口縁部に大きな剛性が得られ、 前記運輸中の 気圧差に対して抵抗性があり、 従来例のように、 多くのフランジを設置する必要 がない。  Comparing the present invention with the prior art, the substrate container according to the present invention has an L-shaped peripheral wall (first flange), a second flange, and a lateral rib surrounding the edge of the board. By forming a plurality of vertical ribs between the first flange and the second flange, and between the L-shaped peripheral wall and the horizontal rib, a great rigidity is obtained at the opening edge, and the pressure difference during the transportation is reduced. Resistant, eliminating the need to install many flanges as in the conventional example.
【 0 0 1 8】  [0 0 1 8]
しかし、 本発明に係る基板収容容器は、 第 1 フランジ、 第 2フランジ間、 ある いは、 L字型周壁と横リブ間に複数の縦リブを設けることによって、 横向きに区 画された容器状部分が多数形成されることになり、 洗浄時、 容器本体の設置姿勢 によっては該横向き区画中に洗浄水の残留が生じ、 乾燥の遅延が懸念された。 し かし、洗浄後には前記のように圧空気を該容器に向かって吹き付ける工程があり、 これにより横向き区画内に吹き込まれる圧空気はその四方の側壁に拘束されて、 ^ However, the substrate accommodating container according to the present invention is provided with a plurality of vertical ribs between the first flange and the second flange, or between the L-shaped peripheral wall and the horizontal ribs, so that the container shape is laterally partitioned. Many parts were formed, and at the time of washing, depending on the installation posture of the container body, washing water remained in the horizontal compartment, and there was a concern that drying might be delayed. However, after the washing, there is a step of blowing compressed air toward the container as described above, whereby the compressed air blown into the lateral compartment is restrained by the four side walls, ^
該圧空気は噴射速度を殆ど減衰するこ _と^く底面より反射して排出されることに なり、 そこにある残留水分は前記の第 1フランジ、 第 2フランジ、 縦リブ等の先 端縁から効率よく飛散することになる。 なお、 このような壁面により拘束される 横向き区画(laterally open pocket)は円形または正方形が水滴除去に優れてい るが、 第 1フランジと第 2フランジの間隔を例えば 1. 5 c m— 3. 0 c m程度 とする場合、 縦リブの設置間隔をその 0. 5倍— 3.5倍 (正方形ないし縦横比 3. 5までの長方形) とすることによって良好な水滴除去効果が得られた。 それ 以上に縦リブの設置間隔を長く した場合、 および他の平坦な部分において容器表 面に圧空気を吹付けると残留水分は該容器の表面上に分散して依然として小水滴 として残留し、 容易に飛散しなかった。 図面の簡単な説明 Piezoelectric air would be discharged reflected from little attenuation child _ and ^ Ku bottom injection rate, the first flange residual moisture of the located there, the second flange, above the edges of the longitudinal ribs such as Will be efficiently scattered. A laterally open pocket constrained by such a wall has a circular or square shape that is excellent for removing water droplets, but the distance between the first and second flanges is, for example, 1.5 cm to 3.0 cm. In this case, by setting the interval between the vertical ribs to 0.5 to 3.5 times (square or rectangular to aspect ratio 3.5), a good water droplet removal effect was obtained. If the intervals between the vertical ribs are set longer than that, and if the pressurized air is blown on the surface of the container in other flat parts, the residual moisture is dispersed on the surface of the container and still remains as small water droplets. Did not scatter. BRIEF DESCRIPTION OF THE FIGURES
【 0 0 1 9】  [0 0 1 9]
第 1図は、 本発明に係る基板収容容器の構成を示す為、 その構成部品を分離し て示した exploded斜視図である。  FIG. 1 is an exploded perspective view showing the structure of a substrate storage container according to the present invention, in which the components are separated and shown.
第 2図は、 基板収容容器の本体を示した斜視図である。 FIG. 2 is a perspective view showing a main body of the substrate storage container.
第 3図は、 基板収容容器本体の正面図で、 中心線より左半分は外面図であり、 中 心線より右半分は断面で表示したもの。 Fig. 3 is a front view of the substrate container main body. The left half from the center line is an external view, and the right half from the center line is a cross section.
第 4図は、 ガスケヅ ト挿入溝 ( 1 2 a) および第 1フランジ ( 1 3)、 第 2フラ ンジ ( 1 4) 部分を示す部分縦断面図である。 FIG. 4 is a partial longitudinal sectional view showing a gasket insertion groove (12a), a first flange (13), and a second flange (14).
第 5図は、 容器正面及び裏面側の中央部所定間隔 (D) 部分に設けられた横リ ブ ( 1 6 ) 等を説明する為の、 半裁底面図である。  FIG. 5 is a half cut bottom view for explaining a horizontal rib (16) provided at a predetermined interval (D) in the center of the front and back sides of the container.
第 6図は、 基板等収容容器の従来例 (容器本体) を示したもので、 第 6図 (a) はその斜視図、 同 (b) は A— A部の縦断面部分図である。  FIG. 6 shows a conventional example (container main body) of a container for storing substrates and the like, and FIG. 6 (a) is a perspective view thereof, and FIG. 6 (b) is a partial longitudinal sectional view of an AA section.
第 7図は、 今一つの従来例 (容器本体) を示したもので、 第 7図 (a) はその 正面図、 同 (b) は (a) 図中の円形に囲った部分を拡大した側面断面図である。 発明実施の形態  Fig. 7 shows another conventional example (container main body). Fig. 7 (a) is a front view, and Fig. 7 (b) is an enlarged side view of the circled part in (a). It is sectional drawing. Embodiment of the Invention
【 0020】 本発明に係る半導体等の基板収容容器 i 実施形態について詳細に説明する。[0020] An embodiment of a substrate accommodating container i such as a semiconductor according to the present invention will be described in detail.
【 0 0 2 1】 [0 0 2 1]
プラスチックの成形品になる容器本体 1 0において、 その開口端部は蓋体 2と 嵌合する開口周壁 1 1であり、 該開口周壁 1 1の外壁面直下に断面 L字型の周壁 1 2が周回立設され、 前記鬨ロ周壁 1 1の外面との間にガスケヅ ト挿入溝 1 2 a を形成している。 そして、 該 L字型周壁 1 2の底部から一体的に、 ほぼ水平方向 に突出する第 1のフランジ 1 3 (従って、 L字型周壁の水平底部は L字型周壁の —部であり、 且つ第 1 フランジの一部でもあるから、 2つの符番 1 2 , 1 3を付 与される)を、該容器の正面及び裏面側の中央部所定間隔部分 Dを除いて周設し、 さらに、 該第 1フランジ 1 3の下方 (底部側) 1 c m—数 c m (適宜な間隔を) 隔てて該第 1フランジ 1 3とほぼ同形状、同突出量の第 2フランジ 1 4を形成し、 且つ、 この L字型周壁 1 2 (第 1フランジ 1 3 ) および第 2フランジ 1 4との間 には複数本の縦リブ 1 5を設けている。 この複数の縦リブ 1 5の間隔は第 1フラ ンジ 1 3と第 2フランジ 1 4との上下間隔の◦ . 5倍ないし 3 . 5倍、 望ましく は 1倍一 2倍とする。 (第 2図)  In the container body 10 which is a plastic molded product, the opening end is an opening peripheral wall 11 that fits with the lid 2, and an L-shaped cross-sectional peripheral wall 12 is provided immediately below the outer wall surface of the opening peripheral wall 11. The gasket insertion groove 12a is formed between the outer wall of the peripheral wall 11 and the gasket insertion groove 12a. The first flange 13 (which is protruded in a substantially horizontal direction integrally from the bottom of the L-shaped peripheral wall 12 (therefore, the horizontal bottom of the L-shaped peripheral wall is a portion of the L-shaped peripheral wall, and (The two numbers 1 2 and 13 are given because they are also part of the first flange) around the front and back sides of the container except for a predetermined interval D at the center, and further, A second flange 14 having substantially the same shape and the same amount of protrusion as the first flange 13 is formed at a distance of 1 cm—a few cm (at an appropriate interval) below (the bottom side) the first flange 13, and A plurality of vertical ribs 15 are provided between the L-shaped peripheral wall 12 (first flange 13) and the second flange 14. The interval between the plurality of vertical ribs 15 is ◦ .5 to 3.5 times, preferably 1 to 12 times the vertical interval between the first flange 13 and the second flange 14. (Fig. 2)
【 0 0 2 2】  [0 0 2 2]
前記の容器正面及び裏面側の中央部所定間隔 Dとは、 容器本体に嵌合される蓋 体 2に垂下状に形成された係止板 2 aが揷通するに十分な距離 (即ち、 係止板 2 aの横幅と同じ間隔) を意味する。 この間隔 D部分では、 前記 L字型周壁 1 2の 底面より容器の底面側であって、 且つ、 前記第 2フランジ 1 4よりも僅かに上方 位置にあり、 L字型周壁とほぼ同程度の側方突出量をもち、 更に係止突起 1 6 a を付設した横リブ 1 6が張設される。 そして、 この横リブ 1 6と L字型周壁 1 2 の底面との間に数本の縦リブ 1 7を形成している。 この複数の縦リブ 1 7の間隔 は L字型周壁 1 2 と横リブ 1 6との上下間隔の 0 . 5倍ないし 3 . 5倍、 望まし くは 1— 2倍とする。 なお、 この横リブ 1 6の下面先端縁部に、 幅および高さが 1 m m— 2 m m程度の凸条 1 6 bを形成し、 ·また、 前記係合突起 1 6 aの上面に は前記の縦リブ 1 7の下端が突起 1 6 aの先端に達する傾斜壁を形成して強度補 強としている。 (第 2図、 第 5図参照)  The predetermined distance D at the center of the front and back sides of the container is a distance enough for the locking plate 2a formed in a hanging shape to pass through the lid 2 fitted to the container body (that is, (Spacing equal to the width of the stop plate 2a). In the space D, the L-shaped peripheral wall 12 is located on the bottom surface side of the container with respect to the bottom surface and slightly above the second flange 14, and is substantially the same as the L-shaped peripheral wall. A lateral rib 16 having a laterally projecting amount and further provided with a locking projection 16a is stretched. Several vertical ribs 17 are formed between the horizontal rib 16 and the bottom surface of the L-shaped peripheral wall 12. The interval between the plurality of vertical ribs 17 is set to 0.5 to 3.5 times, preferably 1 to 2 times the vertical interval between the L-shaped peripheral wall 12 and the horizontal ribs 16. In addition, a convex ridge 16 b having a width and a height of about 1 mm to 2 mm is formed at the lower end edge of the horizontal rib 16, and the upper surface of the engaging projection 16 a is The lower end of the vertical rib 17 forms an inclined wall that reaches the tip of the projection 16a to enhance the strength. (See Fig. 2 and Fig. 5)
【 0 0 2 3】 上記の L字型周壁 1 2 (第 1 フランジ 1 3 )、 第 2フランジ 1 4および縦リブ 1 5、 横リブ 1 6、 縦リブ 1 7、 のそれぞれは、 その容器本体 1 0の壁面と接す る表面部分に容器本体の壁厚のおよそ 1 / 2以下になる隅肉曲線の半径 radius o f a f i l l et curveを付し、 さらに、 その隅肉曲線半径の基端からリブの先端側に すすむにしたがって先薄になるように勾配がつけられている。 この勾配 (例えば 図 4における 0 1、 Θ 2 ) は、 プラスチックの射出成形において成形品が金型か ら容易に取り出せるために必要とされる原則的な数値、 例えば 1 ° 一 5 ° が採用 される。 特に L字型周壁 1 2 (第 1フランジ 1 3 )、 第 2フランジ 1 4および横 リブ 1 6についてはその下面側の勾配 S 1を若干大きくすることが残留洗浄液の 自然滴下により望ましい。 (第 4図参照) [0 0 2 3] The L-shaped peripheral wall 1 2 (first flange 13), second flange 14, vertical rib 15, horizontal rib 16, and vertical rib 17 each contact the wall of the container body 10. The radius of the fillet curve, which is about 1/2 or less of the wall thickness of the container body, is attached to the surface of the fillet, and further from the base end of the fillet curve radius to the tip end of the rib. It is graded so that it becomes thinner. This gradient (for example, 0 1 and Θ 2 in Fig. 4) is a basic value required for a molded product to be easily removed from a mold in plastic injection molding, for example, 1 ° to 15 °. You. In particular, for the L-shaped peripheral wall 12 (the first flange 13), the second flange 14, and the lateral rib 16, it is desirable to slightly increase the slope S 1 on the lower surface side by natural dripping of the residual cleaning liquid. (See Fig. 4)
【 0 0 2 4】  [0 0 2 4]
しかし、 このように第 2フランジ 1 4の裏面に上向きの勾配が形成されること によって該容器のハンドリング時、 ここに掛けた手指が滑りやすいという弊害が ある。 その解決策として第 2フランジ 1 4の裏面先端縁部に一直線状または水は けを良くするための断続点 1 4 bを有する凸条 1 4 aを形成している。 (第 2図 参照)  However, since the upward slope is formed on the back surface of the second flange 14 in this manner, there is a disadvantage that the fingers put on the container are liable to slip when handling the container. As a solution to this, a ridge 14a having a straight line or an intermittent point 14b for improving drainage is formed at the front end edge of the rear surface of the second flange 14. (See Fig. 2)
【 0 0 2 5】  [0 0 2 5]
以上、 本基板収容容器の要点を説明したが、 その他の構造上の特徴を簡単に説 明すると、 該容器本体 1 0において、 前記の第 2フランジ 1 4の下方四隅に'は支 柱状部 1 8を形成している。 そして、 該支柱状部 1 8間の前後側の容器側壁 1 9 は一部円弧状部 1 9 aで、 その下部は平板状で容器の内側に後退し、 また左右側 の容器側壁 2 0は平板状で、 前記支柱状部 1 8より若干容器の内側に後退した位 置で、 共に垂下し、 底面板に接続している。 これらの構造は容器全体の剛性に寄 与する。 尚、 この容器本体 1 0に覆い被せる蓋体 2はその開口端縁の対向面 2箇 所に係止板 2 aを一体に突設形成し、 さらに、 その係止板 2 aには係合通孔 2 b が開設されている。  The main points of the substrate storage container have been described above. However, other structural features will be briefly described. In the container main body 10, the column-shaped portions 1 are provided at the lower four corners of the second flange 14. Forming eight. A part of the container side wall 19 on the front and rear sides between the columnar parts 18 is a partially arcuate part 19a, the lower part of which is flat and retreats inside the container, and the container side walls 20 on the left and right sides are They are flat and slightly retreated inside the container from the columnar portions 18, and both of them hang down and are connected to the bottom plate. These structures contribute to the rigidity of the entire container. The lid 2 that covers the container body 10 is integrally formed with a locking plate 2a protruding at two opposing surfaces of the opening edge, and is further engaged with the locking plate 2a. Opening 2b is open.
【 0 0 2 6】  [0 0 2 6]
基板収容用カセッ ト 4は、 上下方向が開口しており、 一方の対向側壁がその中 間部より下方を円弧状として間隔を狭め、 その内面には上下方向に向かって多数 の隔壁 4 aを形成して、 それそれに基 ί反 41枚が揷通収納される基盤挿通用溝を 形成している。 また、 基板保持具 3は弾性を有する多数の基板抑え腕 3 aを前記 の基板揷通用溝 (隔壁 4 a , 4 a間) と同ピッチに形成したものである。 The substrate housing cassette 4 has an opening in the vertical direction, one of the opposing side walls has an arc shape below the middle part to narrow the gap, and the inner surface has a large number in the vertical direction. The partition wall 4a is formed, and a base insertion groove for accommodating 41 base plates is formed in the partition wall 4a. Further, the substrate holder 3 has a large number of elastic substrate holding arms 3a formed at the same pitch as the above-mentioned substrate passage groove (between the partition walls 4a and 4a).
【 0 0 2 7】  [0 0 2 7]
通常、 本基板収容容器の使用に先立って、 該容器は洗浄機により水洗される。 その際、 該容器は倒立または開口部を下方にして傾斜状に洗浄装置内に掛け吊る され、 洗浄水が噴射される。 次いで、 圧空気を噴射して残留水滴を吹き飛ばし乾 燥される。 本発明の基板収容容器の場合、 前記のようにその開口部の補強のため の第 1フランジ 1 3 , 第 2フランジ 1 4と縦リブ 1 5等により容器状横向き区画 を形成されることになる。その横向き区画内に洗浄液が残留する可能性はあるが、 圧空気の噴射により残留洗浄液は容易に飛散される構成になっていることは前記 の通りである。  Normally, prior to using the substrate container, the container is washed with water by a washing machine. At this time, the container is hung upside down or slantingly in the washing apparatus with the opening part downward, and the washing water is sprayed. Then, the remaining air is blown off by blowing compressed air and dried. In the case of the substrate storage container of the present invention, as described above, the container-like horizontal section is formed by the first flange 13, the second flange 14, the vertical rib 15, and the like for reinforcing the opening. . Although there is a possibility that the cleaning liquid remains in the lateral compartment, the residual cleaning liquid is easily scattered by the injection of the compressed air as described above.
【 0 0 2 8】  [0 0 2 8]
次に、本発明の基板収容容器 1の使用方法を第 1図を参照して説明する。先ず、 容器本体 1 0にはその口端部にガスケヅ ト 5が装着され、 基板収容用カセヅ ト 4 がウェハなどの図示していない基板をその隔壁 4 a間に挿入して該容器本体 1 0 内に収容される。 次いで、 基板抑え腕 3 aを有する基板保持具 3が該基板収容用 カセッ ト 4の上端に載置され、 さらに蓋体 2が覆い被せられる。 そして、 蓋体 2 の下端縁辺に一体に突設された係止板 2 aの係合通孔 2 bが容器本体 1 0に形成 された係合突起 1 6 bに係合され、 該容器は密封されるのである。  Next, a method of using the substrate container 1 of the present invention will be described with reference to FIG. First, a gasket 5 is attached to the container main body 10 at the mouth end thereof, and a substrate housing cassette 4 inserts a substrate (not shown) such as a wafer between the partition walls 4 a to insert the container main body 10 into the container main body 10. Housed within. Next, the substrate holder 3 having the substrate holding arm 3a is placed on the upper end of the substrate housing cassette 4, and the cover 2 is further covered. Then, an engagement through hole 2b of a locking plate 2a integrally projecting from the lower edge of the lid 2 is engaged with an engagement projection 16b formed on the container body 10, and the container is It is sealed.
【 0 0 2 9】  [0 0 2 9]
以上の構成になる本発明基板収容容器の効果を述べると、 本発明において、 本 体 1 0は、 洗浄時または洗浄後に容器が倒立状態にされたとき、 該容器の第 1フ ランジ 1 3、 第 2フランジ 1 4および横リブ 1 6上に付着する洗浄水が外方に流 れて滴下することになり、 短時間で確実な乾燥が得られる。 従って、 乾燥中の麈 埃付着がなくなる。  The effect of the substrate storage container of the present invention having the above-described structure is as follows.In the present invention, the main body 10 is provided with a first flange 13 of the container when the container is turned upside down at the time of washing or after washing. The cleaning water adhering to the second flange 14 and the lateral ribs 16 flows outward and drops, so that reliable drying can be obtained in a short time. Therefore, no dust adheres during drying.
【 0 0 3 0】  [0 0 3 0]
前記の L字型周壁 1 2、 第 1フランジ 1 3 , 第 2フランジ 1 4、 横リブ 1 6と 複数本の縦リブ 1 5, 1 7によって、 基板収容容器の強度は飛躍的に向上し、 通 常の航空便輸送における気圧差によって気密が破れることが無くなる。 By the L-shaped peripheral wall 12, the first flange 13, the second flange 14, the horizontal rib 16 and the plurality of vertical ribs 15, 17, the strength of the substrate container is dramatically improved, Through The airtightness is not broken by the pressure difference in the usual air transportation.
【 0 0 3 1】  [0 0 3 1]
容器本体 1 ◦において、 第 2 フランジ 1 4の下面先端縁に断点を有する凸状 1 4 aを形成したので洗浄水の滴下が容易であり、 且つ、 ハンドリング時の手滑り が解消される。  In the container body 1 ◦, the convexity 14 a having a break point is formed at the front end edge of the lower surface of the second flange 14, so that dripping of washing water is easy and hand slip during handling is eliminated.
【 0 0 3 2】  [0 0 3 2]
従来タィプの基板収容容器においては、 対称二面 front and back surfacesの折返し フランジ 2 3の表面に手の平を、 フランジ 2 3の内側 2 4に指先を差し込み該容 器を持ちあげるのが通常であるが、 ここには手が容易に掛かりやすいことから安 易に該容器を片手で保持することがしばしばであり、 これによつて容器が大きく 傾斜し、 収容された基板を損傷させることがあった。 これに対して、 本発明容器 1 0は一方の外向きフランジのみによって保持することは不可能で、 その保持に は該容器の側壁面 2 0を両手で挟み付けることが必要である。 このように、 該容 器の保持のためには相当の注意を必要とすることから、 却って、 該容器、 したが つて基板の安全なハンドリングが得られることになる。  In the conventional type of substrate storage container, it is usual to fold two sides of the front and back surfaces, insert the palm into the surface of the flange 23, insert the fingertip into the inside 24 of the flange 23, and lift the container. Here, the container is often easily held by one hand because it is easy to handle, which may cause the container to be greatly inclined and damage the housed substrate. On the other hand, the container 10 of the present invention cannot be held by only one outward flange, and the holding requires holding the side wall surface 20 of the container with both hands. As described above, since considerable attention is required for holding the container, safe handling of the container and therefore the substrate can be obtained.
【 0 0 3 3】 [0 0 3 3]
符号の説明 Explanation of reference numerals
1 基板収容容器  1 Substrate container
2 蓋体、 係止板 2 a、 係合通孔 2 b  2 Lid, locking plate 2a, engaging hole 2b
3 基板保持具、 弾性保持具 3 a、 基板抑え腕 3 a  3 Board holder, elastic holder 3a, board holding arm 3a
4 カセッ ト、 隔壁、 基板挿通溝 4 a、  4 cassette, partition, board insertion groove 4a,
5 ガスケッ ト  5 Gasket
1 0 容器本体  1 0 Container body
1 1 開口周壁  1 1 Opening wall
1 2 L字型周壁、 ガスケッ ト挿入溝 1 2 a、  1 2 L-shaped peripheral wall, gasket insertion groove 1 2a,
1 3 第 1 フランジ  1 3 1st flange
1 4 第 2フランジ、 凸条 1 4 a、 断続点 1 4 b  1 4 2nd flange, ridge 14 a, intermittent point 1 4 b
1 5 (第 1フランジと第 2フランジの間の) 縦リブ u 1 5 Vertical rib (between first and second flanges) u
6 横リブ、 係合突起 1 6 a、 凸_条 1_ 6 b、 断続点 1 6 c7 ( L字周壁と横リブとの間の) 縦リブ 6 Lateral rib, engaging projection 16a, convex_strip 1_6b, intermittent point 16c7 (between L-shaped peripheral wall and lateral rib) Vertical rib
8 支柱状部 8 Column
9 容器の前後側壁、 一部円弧状部 1 9 a 9 Front and rear side walls of container, partially arcuate part 1 9 a
0 容器の左右側壁 0 Left and right side walls of container
D : 中央部所定間隔部分 (容器本体の左右側壁上端に設ける) D: Predetermined spacing at the center (provided at the top of the left and right side walls of the container body)
Θ 1 , Θ 2 : 勾配 (図 4参照) Θ 1, Θ 2: Slope (See Fig. 4)

Claims

請 求 の 範 囲 The scope of the claims
1 . ウェハ等の精密基板複数枚を等間隔に装填したカセットを容器本体に収容 して、 ガスケットを介して蓋体を用いて該容器本体を密封するウェハ等精密基板1. A precision substrate such as a wafer in which a plurality of precision substrates such as wafers are loaded in a container body at equal intervals and the container body is sealed using a lid via a gasket.
5収容容器において、 該容器本体 (10) には、 その鬨ロ端縁の外周壁に L字型周壁 ( 12) を立設してガスケット挿入溝 (12a) を形成するとともに、 該 L字型周壁 の底部より外側へ一体的に突出する第 1フランジ (13) を、 該容器の正面及び裏 面側の中央部所定間隔 (D ) を除いて周設し、 さらに、 該第 1フランジと側方へ の突出量を同じくし、 かつ、 容器本体の底方向に 1 c m—数 c m隔てた位置に第(5) In the container, the container body (10) has a gasket insertion groove (12a) formed by erecting an L-shaped peripheral wall (12) on an outer peripheral wall of an edge of the container. A first flange (13) integrally projecting outward from the bottom of the peripheral wall is provided around the front and rear sides of the container except for a predetermined distance (D), and further includes a first flange (13) and a side. In the same direction and at a distance of 1 cm to several cm from the bottom of the container body.
10 2フランジ (14) を形成して、 第 1フランジと第 2フランジの間に複数本の縦リ ブ (15) を設けること、 そして、 前記容器本体の正面及び裏面側中央部所定間隔 部分 (D ) には、 前記第 2フランジ (14)より上方位置にあり、 前記 L字周壁と ほぼ同程度の側方への突出量となり、 蓋体との係合突起 (16a) を突設した横リ ブ (16) を張設し、 該横リブ (16) の上面と L字型周壁 (12) の底面との間に複Forming a plurality of vertical ribs (15) between the first flange and the second flange by forming a two-flange (14); and D) is located above the second flange (14), and has a lateral protrusion amount substantially equal to that of the L-shaped peripheral wall, and has a laterally projecting projection (16a) for engaging with the lid. A rib (16) is stretched, and a plurality of ribs are provided between the upper surface of the lateral rib (16) and the bottom surface of the L-shaped peripheral wall (12).
15数本の縦リブ (17) を形成したことを特徴とするウェハ等精密基板収容容器。 A precision substrate container, such as a wafer, characterized in that 15 or more vertical ribs (17) are formed.
2 . 請求項 1記載のウェハ等精密基板収容容器において、 前記 L字型周壁から なるガスケット挿入溝 (12 a ) の下面、 および第 1フランジおよび第 2フランジ の下面は該容器本体の側壁から外方に向かって上昇する方向に傾斜 (0 1) し、 該第 1フランジおよび第 2フランジの上面は該容器本体の側壁から外方に向かつ て下降する方向に傾斜 (Θ 2) していることを特徴とするウェハ等精密基板収容 容器。  2. The container for precision substrates such as wafers according to claim 1, wherein the lower surface of the gasket insertion groove (12a) formed of the L-shaped peripheral wall and the lower surfaces of the first flange and the second flange are outside the side wall of the container body. The upper surface of the first flange and the upper surface of the second flange are inclined (Θ2) in a direction of descending outward from the side wall of the container body. A container for accommodating precision substrates such as wafers.
3 . 請求項 1記載のウェハ等精密基板収容容器において、 前記第 2フランジ (1 4) および横リブ (16) の先端縁下面に、 凸条 (14a) ( 16b) を連続的にまたは 断続 (14 b ) ( 16c) して突設したことを特徴とするウェハ等精密基板収容容器。 3. The container for precision substrates such as wafers according to claim 1, wherein the ridges (14a) and (16b) are continuously or intermittently provided on the lower surface of the leading edge of the second flange (14) and the lateral rib (16). 14 b) A container for precision substrates, such as wafers, characterized by being protruded in (16c).
25 4 . 縦リブ (15) ( 17)の設置間隔は、 第 1フランジと第 2フランジの間隔、 又 は L字型周壁と横リブの間隔の 0 . 5倍ないし 3 . 5倍以内であることを特徴と する請求項 1記載のウェハ等精密基板収容容器。 25 4. The vertical ribs (15) and (17) should be installed within 0.5 to 3.5 times the distance between the first and second flanges or the distance between the L-shaped peripheral wall and the horizontal ribs. The container for precision substrates such as wafers according to claim 1, characterized in that:
PCT/JP2003/013236 2002-10-17 2003-10-15 Storage container for receiving precision substrates such as wafers WO2004035423A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US10/531,304 US20060019411A1 (en) 2002-10-17 2003-10-15 Storage container for receiving precision substrates such as wafers
DE10393523T DE10393523B4 (en) 2002-10-17 2003-10-15 Container for storing a variety of precision requiring substrate discs

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002-302921 2002-10-17
JP2002302921A JP4174557B2 (en) 2002-10-17 2002-10-17 Precision substrate storage container such as wafer

Publications (1)

Publication Number Publication Date
WO2004035423A1 true WO2004035423A1 (en) 2004-04-29

Family

ID=32105058

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2003/013236 WO2004035423A1 (en) 2002-10-17 2003-10-15 Storage container for receiving precision substrates such as wafers

Country Status (7)

Country Link
US (1) US20060019411A1 (en)
JP (1) JP4174557B2 (en)
KR (1) KR100738122B1 (en)
CN (1) CN100341132C (en)
DE (1) DE10393523B4 (en)
TW (1) TW200415091A (en)
WO (1) WO2004035423A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4767574B2 (en) * 2005-03-31 2011-09-07 東京エレクトロン株式会社 Processing chamber and processing apparatus
WO2008096462A1 (en) 2007-02-06 2008-08-14 Shin-Etsu Polymer Co., Ltd. Damping body for packaging and package body
US8439197B2 (en) * 2006-01-23 2013-05-14 Shin-Etsu Polymer Co., Ltd. Damping body for packaging and package body
KR100711825B1 (en) * 2006-04-14 2007-05-02 주식회사 에스앤에스텍 Blankmask packing box
TWI475627B (en) * 2007-05-17 2015-03-01 Brooks Automation Inc Substrate carrier, substrate processing apparatus and system, for reducing particle contamination of substrate during processing and method of interfacing a carrier with a processing tool
JP5943519B2 (en) * 2012-09-20 2016-07-05 ヒューグルエレクトロニクス株式会社 Substrate case cleaning device
JP6543958B2 (en) * 2015-02-26 2019-07-17 セイコーエプソン株式会社 Electronic component conveying apparatus and electronic component inspection apparatus
CN105396858A (en) * 2015-11-16 2016-03-16 马玉荣 Waste gas exhausting plate
TWI756361B (en) * 2017-02-22 2022-03-01 日商東京威力科創股份有限公司 Substrate storage processing apparatus, substrate storage processing method, and recording medium

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11111835A (en) * 1997-10-01 1999-04-23 Dainippon Ink & Chem Inc Wafer container
JP2002110775A (en) * 2000-09-27 2002-04-12 Shin Etsu Polymer Co Ltd Precision board storing vessel

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4349119A (en) * 1980-07-16 1982-09-14 Letica Corporation Container construction
US4520925A (en) * 1983-08-09 1985-06-04 Empak Inc. Package
US5228568A (en) * 1991-08-30 1993-07-20 Shin-Etsu Handotai Co., Ltd. Semiconductor wafer basket
US5873468A (en) * 1995-11-16 1999-02-23 Sumitomo Sitix Corporation Thin-plate supporting container with filter means
JPH11163117A (en) * 1997-12-02 1999-06-18 Komatsu Ltd Semiconductor wafer packaging container
JP3280305B2 (en) * 1998-04-13 2002-05-13 信越半導体株式会社 Precision substrate transport container
KR20010068214A (en) * 2000-01-03 2001-07-23 변기호 Dynamic display method in the internet browser using fade in/fade out of advertizement picture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11111835A (en) * 1997-10-01 1999-04-23 Dainippon Ink & Chem Inc Wafer container
JP2002110775A (en) * 2000-09-27 2002-04-12 Shin Etsu Polymer Co Ltd Precision board storing vessel

Also Published As

Publication number Publication date
DE10393523T5 (en) 2005-09-29
KR20050057661A (en) 2005-06-16
US20060019411A1 (en) 2006-01-26
JP2004136923A (en) 2004-05-13
CN1705597A (en) 2005-12-07
DE10393523B4 (en) 2007-04-12
JP4174557B2 (en) 2008-11-05
CN100341132C (en) 2007-10-03
TW200415091A (en) 2004-08-16
KR100738122B1 (en) 2007-07-10

Similar Documents

Publication Publication Date Title
WO2004035423A1 (en) Storage container for receiving precision substrates such as wafers
JP4173000B2 (en) Substrate storage container
EP0530332B1 (en) Cushioned cover for wafer container
KR20060044862A (en) Lid unit for thin plate supporting container
JP2003133406A (en) Wafer cushion used for transporting wafer
WO2007003908A1 (en) An ink cartridge and a memory device
JPS6233436A (en) Wafer case for transport
KR20120106377A (en) Container for nasal cavity
GB2270068A (en) Box container for rigid sheet bodies
US20030213716A1 (en) Wafer shipping and storage container
CN203195611U (en) Container bottle for water absorption type cleaner
JPH024684A (en) Vessel for integrated circuit device
KR200393640Y1 (en) Airtight vessel
US3465872A (en) Receptacle cover
JP4274682B2 (en) Precision substrate storage container
JPH0460347B2 (en)
SU1622230A1 (en) Holder for interoperatio storage of laminated articles
JP2003237756A (en) Box-shaped container made of synthetic resin
CN111243989B (en) Cleaning system and method for wet workbench
JPH0612330U (en) Plastic container with rib for adhesion prevention
KR100296825B1 (en) Plastic Container for Wafer Transport and Storage
JP2004266181A (en) Semiconductor substrate storage container
JPS6233716Y2 (en)
JPH11111835A (en) Wafer container
JPH0817903A (en) Board case

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): CN DE KR US

ENP Entry into the national phase

Ref document number: 2006019411

Country of ref document: US

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 10531304

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 20038A15362

Country of ref document: CN

WWE Wipo information: entry into national phase

Ref document number: 1020057006714

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 1020057006714

Country of ref document: KR

RET De translation (de og part 6b)

Ref document number: 10393523

Country of ref document: DE

Date of ref document: 20050929

Kind code of ref document: P

WWE Wipo information: entry into national phase

Ref document number: 10393523

Country of ref document: DE

WWP Wipo information: published in national office

Ref document number: 10531304

Country of ref document: US

REG Reference to national code

Ref country code: DE

Ref legal event code: 8607