WO2003107095A1 - Vorrichtung zur positionierung eines optischen elementes in einer struktur - Google Patents
Vorrichtung zur positionierung eines optischen elementes in einer struktur Download PDFInfo
- Publication number
- WO2003107095A1 WO2003107095A1 PCT/EP2003/006015 EP0306015W WO03107095A1 WO 2003107095 A1 WO2003107095 A1 WO 2003107095A1 EP 0306015 W EP0306015 W EP 0306015W WO 03107095 A1 WO03107095 A1 WO 03107095A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical element
- axis
- connecting elements
- axes
- beam splitter
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/003—Alignment of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Definitions
- the invention relates to a device for positioning an optical element in a structure in which the optical element is connected via connecting elements with the structure, and wherein the position of the optical element is adjustable by 'Versteilglieder.
- the invention relates to a projection objective for microlithography, a beam splitter cube being provided as the optical element.
- optical imaging devices e.g. a projection lens for microlithography
- manufacturing and assembly tolerances inevitably occur, which lead to aberrations in the lens.
- a positioning device for a lens is known from WO 99/66361, there being three degrees of freedom for positioning the lens.
- the object of the present invention is to provide a device for positioning an optical element in a structure, in particular an optical element in a lens housing of a projection lens, which enables very precise positioning and adjustments in the beam path.
- this object is achieved in that the connection elements are arranged in such a way and the adjustment connections are adjustable that the optical element can be tilted about three independent axes (x, y, z axis) and additionally in an axial direction (z axis) is translationally displaceable.
- the positioning device thus has a total of four degrees of freedom, with which an optical element to be positioned or adjusted can be aligned very precisely in a variety of ways.
- a beam splitter cube in a projection lens. While the beam splitter cube is from a light source, e.g. a laser, the outgoing light beam after passing through a reticel, which represents the object, is deflected by a beam splitter cube into a cantilever arm of the lens housing, the light beam then coming back from the cantilever arm is directed through the beam splitter cube in the direction of the imaging plane, namely a wafer.
- a light source e.g. a laser
- the beam splitter cube Since the beam splitter layer in the beam splitter area in the beam splitter cube now functions as a deflecting mirror for the light beam coming from the reticel, the beam splitter cube must be adjustable about two tilting axes that span the plane of the beam splitter layer in order to avoid angular errors between the optical axis in the beam path reticel to the beam splitter cube and the optical one To be able to compensate for the axis in the beam path of the boom. *
- the outer surfaces should be as perpendicular as possible to the optical axes of the beam. stand.
- a fine adjustment around a rotation or tilt axis perpendicular to the beam splitter layer plane or beam splitter surface is necessary.
- the beam splitter layer plane must lie exactly at the intersection of the optical axes of the reticle and boom beam paths.
- the beam splitter cube In order to be able to position the beam splitter layer precisely at the intersection, the beam splitter cube must also be able to be finely adjusted translationally perpendicular to the beam splitter layer plane.
- the above-mentioned positions and adjustments can be achieved with the arrangement and configuration of the connecting elements and adjusting members according to the invention.
- connection elements block the translation along an axis, and all axes of the translations blocked by the connection elements lie in a plane spanned by the tilting axes along which the optical element is not translationally displaceable, b) the axes of the translations blocked by the connecting elements are perpendicular to the axial direction in which the optical element can be displaced translationally, and c) the axes of the translations blocked by the connecting elements intersect at one point on an axis, along which the optical element is translationally displaceable.
- the axes of the cut translation elements blocked at a point on an axis, along which the optical element is translationally displaceable and which passes through the intersection of the two tilting axes, along which the optical element is not translationally displaceable.
- the plane in which the axes of the translations blocked by the connecting elements advantageously lie is the beam splitter surface of the beam splitter cube.
- the optical axis along which the translational displacement is to take place is an axis that is perpendicular to the beam splitter surface.
- the origin of the coordinate system is also on the plane of the beam splitter surface at the intersection of the optical axis of the reticle beam path with the optical axis of the cantilever beam path.
- the three tilt axes advantageously intersect at the origin of the coordinate system.
- the optical element is a mirror or a lens
- the above-mentioned plane, in which the axes of the translations blocked by the connecting elements lie advantageously contains the vertex of the surface of the mirror or the lens.
- One possible application of the solution according to the invention would be e.g. an elliptical mirror or a kidney-shaped mirror. The same applies to mirrors or lenses that are provided with a correction sphere.
- Figure 1 is a schematic diagram with how a Projection lenses for microlithography
- FIG. 2 shows an enlarged perspective view of a beam splitter cube provided with an adjusting and dividing device with a holding frame from the side;
- Figure 3 shows the beam splitter cube according to Figure 2 in a perspective view from above;
- Figure 4 is an enlarged perspective view of a connecting element
- Figure 5 is an enlarged perspective view of an adjustment connection
- Figure 6 is a perspective view with a translation shift
- FIGS. 7 to 9 show different tilting possibilities
- FIG. 10 shows an embodiment with a supporting frame
- FIG. 11 shows an enlarged illustration of a connecting element according to FIG. 10,
- FIG. 12 shows an enlarged illustration of an adjustment connection according to FIG. 10.
- FIG. 1 shows a projection exposure system with a projection objective 1 for microlithography for the production of semiconductor elements.
- It has an illumination system 2 with a laser, not shown, as the light source.
- a reticle 3 In the object level of the project tion exposure system is a reticle 3, the structure of which is to be imaged on a correspondingly reduced scale on a wafer 4 arranged under the projection lens 1 and located in the image plane.
- the projection objective 1 is provided with a first vertical objective part 1 a and a second horizontal objective part 1 b.
- the lens part 1b there are a plurality of lenses 5 and a concave mirror 6, which are arranged in a lens housing 7 of the lens part 1b.
- a beam splitter cube 21 is provided to deflect the projection beam (see arrow) from the vertical objective part la with a vertical optical axis 8 into the horizontal objective part lb with a horizontal optical axis 9.
- the ⁇ / 4 plate 13 is located in the projection lens 1 between the reticle 3 and the beam splitter cube 21 behind a lens or lens group 16.
- the ⁇ / 4 plate 14 is located in the beam path of the horizontal lens part 1b and the ⁇ / 4 plate 15 is located in the third lens part lc.
- the three ⁇ / 4 plates serve to completely rotate the polarization once, which minimizes radiation losses, among other things.
- the individual optical axes of the projection lens 1 are adjusted very precisely to one another when the lens is being built, so that they are parallel with sufficient accuracy or run perpendicular to one another, but due to tolerance inaccuracies or also due to errors still occurring during operation, alignment of the optical elements with the accuracy required for the intended applications is not always achievable, which leads to a corresponding deterioration in the imaging quality.
- the beam splitter cube 21 is suitable for this purpose, which for this purpose is provided with an adjusting and adjusting device 17, which is described in more detail below.
- FIGS. 2 to 9 show the beam splitter cube 21 provided with the adjusting and setting device 17 from FIG. 1 in an enlarged illustration with connecting elements 22 and adjusting connections 23.
- the beam splitter cube 21 should now be able to be tilted relative to the fixed holding frame 24 about three mutually independent axes and be translationally or linearly displaceable in one direction.
- the origin 25 of the coordinate system x, y, z lies on v the beam splitter surface or beam splitter plane 26.
- the x-axis 27 is parallel to the longitudinal axis of the beam splitter cube 21 in the beam splitter plane 26, the y-axis 28 perpendicular to the x-axis 27, also in the beam splitter plane 26, and the z-axis 29 perpendicular to the beam splitter plane 26.
- it In order to be able to adjust the beam splitter cube 21, it must be tiltable about the x-axis 27, the y-axis 28 and the z-axis 29 and be displaceable along the z-axis 29.
- the beam splitter cube 21 is provided with two connecting elements 22 which are located in the corner regions of a longitudinal edge of the beam splitter cube 21.
- the two Verstellanitatien 23 are located in corner regions of the longitudinal edge of the beam splitter cube 21, which is opposite to the longitudinal edge with the two 'connection elements 22nd.
- the arrangement of the connecting elements 22 and the adjusting members 23 is only to be regarded as an example. In particular, the adjusting members 23 can also be provided elsewhere.
- each connecting element 22 has two translational mobilities 30a and 30b and three rotational mobilities 31a, 31b and 31c. Due to the design of the connecting element 22 with a longitudinal rod 32 and a ball joint 33a and 33b attached to the rod end, the third linear displacement or translation possibility 30c, which runs in the direction of the longitudinal axis of the longitudinal rod 32, is recorded.
- the two ball joints 33a and 33b result in an articulated connection or suspension of the beam splitter cube 21.
- the connections with the ball joints 33a and 33b are only to be seen as examples. If necessary, solid joints such as e.g. Provide leaf spring-like devices with appropriate elasticity.
- connection elements 22 are arranged such that the direction of the recorded translation option 30c is oriented perpendicular to the z-axis 29 (see Figure 2).
- the fixed translation possibilities 30c of all connecting elements 22 must lie in the plane spanned by the x-tilting axis 27 and the y-tilting axis 28. Since the plane spanned by the x-axis 27 and the y-axis 28 is identical to the beam splitter plane 26 in the present exemplary embodiment, the fixed translation options 30c of the connecting elements 22 are also in the beam splitter plane 26.
- the adjustment connections 23 have a translational mobility 34a and three rotational mobilities 35a, 35b, 35c, while the translational options 34b and 34c have adjusting elements to be discussed (in FIG 5, for example, by the set screws 40a, 40b, 40c, 40d) are held in the adjustment connections 23 in the idle state.
- the adjustment connections 23 can be adjusted in the translation directions 34b and 34c, whereby the beam splitter cube 21 can be moved and tilted in the desired manner.
- FIG. 5 also shows such an example Adjustment connection 23 shown. It has a ball joint 36 which connects the beam splitter cube 21 to a triangular plate 37. At the base of the triangular plate 37 there is a hinge 38 with an attached sliding block 39 which is guided in the holding frame 24 in one direction.
- the sliding block 39 can be displaced linearly or translationally with adjusting members in the form of adjusting screws 40a, 40b, 40c, 40d relative to the holding frame 24 in the mutually perpendicular translational mobility 34c and 34b.
- each adjustment connection 23 with two adjustment members can alternatively be used, in which case each adjustment connection must then have two translational mobility and three rotational mobility and the third translational mobility can be adjusted by an adjustment member (not shown).
- the beam splitting cubes 21 can move in two degrees of freedom with respect to the holding frame 24 without actuation of the adjusting members in the adjusting connections 23.
- the adjustment connections 23 must be arranged in such a way that these two degrees of freedom are not associated with the tilting around the x-axis 27, the y-axis 28 and the z-axis 29 and the translational displacement along the z-axis 29 or with a combination of these Movements coincide so that forces and moments that act in these directions of movement can be supported.
- Adjustment connections 23 with the adjustment members namely the Adjusting screws 40a and 40c can be moved in the same direction in direction 34b.
- the adjusting screws 40a and 40c must be adjusted accordingly.
- the beam splitter cube 21 tilts about the y-axis 28, as can be seen from FIG.
- the beam splitter cube 21 is tilted about the x-axis 27 when both adjustment connections 23 are shifted in the same direction in the direction 34c.
- the adjusting elements namely the adjusting screws 40b and 40d, are actuated accordingly.
- the two adjustment connections 23 In order to tilt the beam splitter cube 21 about the z-axis 29, the two adjustment connections 23 have to be displaced in opposite directions in the direction 34c, as is shown by the arrows in FIG.
- the adjustment connections 23 or the adjustment elements can be adjusted manually, by motor, pneumatically, hydraulically, electromagnetically, piezoelectrically or agnetostrictively
- Figure 10 shows an embodiment of the device with a support frame 41 and connecting elements 22 and adjustment connections 23, in which the joints are designed as solid or spring joints.
- the beam splitter cube 21 is contained in the support frame 41, which is carried by the connection elements 22 and the adjustment connections 23 in the holding frame 24.
- the beam splitter layer 26 can be recognized as a line on the beam splitter cube 21.
- FIG. 11 shows a connection element 22 according to FIG. 10 in an enlarged representation. It connects the support frame 41, in which the beam splitter cube 21 is held, to the holding frame 24.
- the contact of the connecting element 22 with the support frame 41 has translational mobility along the axis 30a and rotational mobility about the axis 31b.
- a leaf spring hinge 43 of the contact By bending a leaf spring hinge 43 of the contact has the 'connection element 22 a translatory movement along the axis 30b, and a rotation movement along the axis 31a.
- the torsion of the leaf spring joints 42 and 43 results in a rotational mobility about the axis 31c for the contact of the connecting element 22 with the support frame 41, so that the connecting element with the leaf spring joints 42 and 43 has the same mobility as that from the longitudinal rod 32 and the two ball joints 33a and 33b (see Figure 4) has composite connecting element.
- the connecting element 22 is translationally rigid only along the axis 30c.
- FIG. 12 an adjustment connection 23 according to FIG. 10 with solid-state joints is shown in an enlarged representation.
- a leaf spring 44 By bending a leaf spring 44, the contact of the adjustment link 23 with the support frame 41 is given translational mobility along the axis 34a and rotational mobility about the axis 35c.
- the triangular plate 37 and the hinge 38 formed adjustment connection (see FIG. 5), a block 45 adjoining the leaf spring 44 (the analog component to the sliding block 39 of the already described embodiment) via leaf springs 46a and 46b on actuating levers 47a and 47b mounted, so that when the adjusting levers 47a and 47b are held in the intersection of the extensions of the leaf springs 46a and 46b, there is a momentary rotation pole with the axis of rotation 35a.
- An adjusting lever 47a is supported by a leaf spring 48a in the part of the adjustment connection 23 which is firmly connected to the holding frame 24.
- the adjusting lever 47a can be adjusted with the adjusting screws 40a and 40b, the leaf spring 46a transmitting the adjustment to the block 45 and thereby triggering a movement of the support frame 41 or of the beam splitter cube 21.
- an adjusting lever 47b is mounted via a leaf spring 48b in the part of the adjustment connection 23 which is firmly connected to the holding frame 24.
- the adjusting lever 47b can be adjusted with the adjusting screws 40c and 40d (adjusting screw 40d is not visible because it is covered. It presses the adjusting lever 47b with respect to the adjusting screw 40c.), The leaf spring 46b transmitting the adjustment to the block 45 and thereby one Movement of the support frame 41 or the beam splitter cube 21 is triggered.
- both actuating levers 47a and 47b together with the leaf spring joints 46a, 46b, 48a, 48b are rotated by 45 ° with respect to the displacement directions 34b and 34c, both actuating levers must be actuated at the same time in order to achieve a pure displacement along the direction of 34b or get 34c.
- the adjusting levers 47a and 47b To move the block 45, the adjusting levers 47a and 47b must be moved inwards or outwards at the same time.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003242653A AU2003242653A1 (en) | 2002-06-14 | 2003-06-07 | Device for positioning an optical element in a structure |
EP03759921A EP1514158A1 (de) | 2002-06-14 | 2003-06-07 | Vorrichtung zur positionierung eines optischen elementes in einer struktur |
JP2004513848A JP4484698B2 (ja) | 2002-06-14 | 2003-06-07 | 構造体に光学部品を配置するための装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10226655A DE10226655A1 (de) | 2002-06-14 | 2002-06-14 | Vorrichtung zur Positionierung eines optischen Elements in einer Struktur |
DE10226655.7 | 2002-06-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003107095A1 true WO2003107095A1 (de) | 2003-12-24 |
Family
ID=29719089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/006015 WO2003107095A1 (de) | 2002-06-14 | 2003-06-07 | Vorrichtung zur positionierung eines optischen elementes in einer struktur |
Country Status (6)
Country | Link |
---|---|
US (2) | US6967792B2 (de) |
EP (1) | EP1514158A1 (de) |
JP (1) | JP4484698B2 (de) |
AU (1) | AU2003242653A1 (de) |
DE (1) | DE10226655A1 (de) |
WO (1) | WO2003107095A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008504579A (ja) * | 2004-06-29 | 2008-02-14 | カール・ツァイス・エスエムティー・アーゲー | 光学素子のための位置決めユニット及び調節デバイス |
US9047440B2 (en) | 2000-10-06 | 2015-06-02 | Pact Xpp Technologies Ag | Logical cell array and bus system |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004025832A1 (de) * | 2004-05-24 | 2005-12-22 | Carl Zeiss Smt Ag | Optikmodul für ein Objektiv |
US7760327B2 (en) | 2003-10-02 | 2010-07-20 | Carl Zeiss Smt Ag | Reflecting optical element with eccentric optical passageway |
JP2008525833A (ja) | 2004-12-28 | 2008-07-17 | カール ツアイス エスエムティー アーゲー | 2つ以上の光学部品を取り付けるための装置及び光学部品の表面処理法 |
DE102005057860A1 (de) * | 2005-12-03 | 2007-06-06 | Carl Zeiss Smt Ag | Objektiv, insbesondere Projektionsobjektiv für die Halbleiterlithographie |
US20080013908A1 (en) * | 2006-01-03 | 2008-01-17 | 3M Innovative Properties Company | Total internal reflection prism mount |
EP1870751A1 (de) | 2006-06-23 | 2007-12-26 | Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO | Halterung zur Platzierung eines optischen Elementes |
US7817890B2 (en) * | 2008-10-29 | 2010-10-19 | Sie-Poon Chang | Nanomover for optical elements alignment without driving electrically |
DE102009025309B4 (de) * | 2009-06-15 | 2016-12-22 | Toptica Photonics Ag | Kinematischer Halter |
DE102012102566B4 (de) * | 2012-03-26 | 2019-02-21 | Trumpf Werkzeugmaschinen Gmbh + Co. Kg | Übertragungselement für eine Stellbewegung eines optischen Elementes, Positioniereinrichtung sowie Bearbeitungskopf für eine Laserbearbeitungsmaschine |
DE102017207433A1 (de) * | 2017-05-03 | 2018-04-19 | Carl Zeiss Smt Gmbh | Abstützung eines optischen Elements |
DE102018216934A1 (de) * | 2018-10-02 | 2019-09-05 | Carl Zeiss Smt Gmbh | Baugruppe, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage |
DE102020205306A1 (de) | 2020-04-27 | 2021-10-28 | Carl Zeiss Smt Gmbh | Baugruppe, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD210766A1 (de) * | 1982-10-01 | 1984-06-20 | Zeiss Jena Veb Carl | Vorrichtung zur justierung von linsen |
US5004205A (en) * | 1990-06-04 | 1991-04-02 | Rockwell International Corporation | High-range and resolution determinate mount and positioner |
DE4041870A1 (de) * | 1990-12-27 | 1992-07-02 | Wild Heerbrugg Ag | Justiervorrichtung |
US5253834A (en) * | 1992-02-19 | 1993-10-19 | Grumman Aerospace Corporation | Alignment fixture for unobstructed pivot point |
WO1999066361A1 (en) * | 1998-06-17 | 1999-12-23 | The Regents Of The University Of California | Precision actuator |
DE19901295A1 (de) * | 1999-01-15 | 2000-07-20 | Zeiss Carl Fa | Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element |
WO2002016993A1 (fr) * | 2000-08-18 | 2002-02-28 | Nikon Corporation | Dispositif de maintien d'element optique |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5909324A (en) * | 1998-02-04 | 1999-06-01 | Eastman Kodak Company | Mount for adjusting an optical component |
US6163417A (en) * | 1999-05-24 | 2000-12-19 | Newport Corporation | Pegs for joining modular translation stages and other optical test bench hardware |
DE10039712A1 (de) * | 2000-08-14 | 2002-02-28 | Zeiss Carl | Vorrichtung zum Verstellen der Lage zweier Bauelemente zueinander |
US6571041B2 (en) * | 2001-08-02 | 2003-05-27 | Corning Incorporated | Method and apparatus for positioning optical elements |
US6754013B2 (en) * | 2001-08-17 | 2004-06-22 | Bae Systems Information And Electronic Systems Integration Inc. | Adjustable mount for optical components |
-
2002
- 2002-06-14 DE DE10226655A patent/DE10226655A1/de not_active Withdrawn
-
2003
- 2003-06-07 EP EP03759921A patent/EP1514158A1/de not_active Withdrawn
- 2003-06-07 AU AU2003242653A patent/AU2003242653A1/en not_active Abandoned
- 2003-06-07 WO PCT/EP2003/006015 patent/WO2003107095A1/de active Application Filing
- 2003-06-07 JP JP2004513848A patent/JP4484698B2/ja not_active Expired - Fee Related
- 2003-06-11 US US10/458,968 patent/US6967792B2/en not_active Expired - Fee Related
-
2005
- 2005-10-28 US US11/262,360 patent/US7251086B2/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD210766A1 (de) * | 1982-10-01 | 1984-06-20 | Zeiss Jena Veb Carl | Vorrichtung zur justierung von linsen |
US5004205A (en) * | 1990-06-04 | 1991-04-02 | Rockwell International Corporation | High-range and resolution determinate mount and positioner |
DE4041870A1 (de) * | 1990-12-27 | 1992-07-02 | Wild Heerbrugg Ag | Justiervorrichtung |
US5253834A (en) * | 1992-02-19 | 1993-10-19 | Grumman Aerospace Corporation | Alignment fixture for unobstructed pivot point |
WO1999066361A1 (en) * | 1998-06-17 | 1999-12-23 | The Regents Of The University Of California | Precision actuator |
DE19901295A1 (de) * | 1999-01-15 | 2000-07-20 | Zeiss Carl Fa | Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element |
WO2002016993A1 (fr) * | 2000-08-18 | 2002-02-28 | Nikon Corporation | Dispositif de maintien d'element optique |
EP1312965A1 (de) * | 2000-08-18 | 2003-05-21 | Nikon Corporation | Haltevorrichtung für optisches Element |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9047440B2 (en) | 2000-10-06 | 2015-06-02 | Pact Xpp Technologies Ag | Logical cell array and bus system |
JP2008504579A (ja) * | 2004-06-29 | 2008-02-14 | カール・ツァイス・エスエムティー・アーゲー | 光学素子のための位置決めユニット及び調節デバイス |
US7738193B2 (en) | 2004-06-29 | 2010-06-15 | Carl Zeiss Smt Ag | Positioning unit and alignment device for an optical element |
JP2010183097A (ja) * | 2004-06-29 | 2010-08-19 | Carl Zeiss Smt Ag | 光学素子の位置決めユニット |
US8035903B2 (en) | 2004-06-29 | 2011-10-11 | Carl Zeiss Smt Gmbh | Positioning unit and alignment device for an optical element |
US8416515B2 (en) | 2004-06-29 | 2013-04-09 | Carl Zeiss Smt Gmbh | Positioning unit and alignment device for an optical element |
US8493674B2 (en) | 2004-06-29 | 2013-07-23 | Carl Zeiss Smt Gmbh | Positioning unit and alignment device for an optical element |
US8760777B2 (en) | 2004-06-29 | 2014-06-24 | Carl Zeiss Smt Gmbh | Positioning unit and apparatus for adjustment of an optical element |
US9075174B2 (en) | 2004-06-29 | 2015-07-07 | Carl Zeiss Smt Gmbh | Positioning unit and apparatus for adjustment of an optical element |
US9664873B2 (en) | 2004-06-29 | 2017-05-30 | Carl Zeiss Smt Gmbh | Positioning unit and apparatus for adjustment of an optical element |
US10133021B2 (en) | 2004-06-29 | 2018-11-20 | Carl Zeiss Smt Gmbh | Positioning unit and apparatus for adjustment of an optical element |
Also Published As
Publication number | Publication date |
---|---|
EP1514158A1 (de) | 2005-03-16 |
US20030231412A1 (en) | 2003-12-18 |
DE10226655A1 (de) | 2004-01-08 |
US7251086B2 (en) | 2007-07-31 |
JP2005530339A (ja) | 2005-10-06 |
US6967792B2 (en) | 2005-11-22 |
US20060072217A1 (en) | 2006-04-06 |
JP4484698B2 (ja) | 2010-06-16 |
AU2003242653A1 (en) | 2003-12-31 |
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