WO2003057939A3 - Cathode pour evaporateurs a arc electrique sous vide - Google Patents
Cathode pour evaporateurs a arc electrique sous vide Download PDFInfo
- Publication number
- WO2003057939A3 WO2003057939A3 PCT/IL2003/000033 IL0300033W WO03057939A3 WO 2003057939 A3 WO2003057939 A3 WO 2003057939A3 IL 0300033 W IL0300033 W IL 0300033W WO 03057939 A3 WO03057939 A3 WO 03057939A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- cathode
- vacuum arc
- metals
- metal
- arc evaporators
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003209606A AU2003209606A1 (en) | 2002-01-14 | 2003-01-14 | Cathode for vacuum arc evaporators |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL14762702A IL147627A0 (en) | 2002-01-14 | 2002-01-14 | Cathode for vacuum arc evaporators |
IL147627 | 2002-01-14 | ||
IL15085402A IL150854A0 (en) | 2002-07-22 | 2002-07-22 | Cathode for vacuum arc evaporators |
IL150854 | 2002-07-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003057939A2 WO2003057939A2 (fr) | 2003-07-17 |
WO2003057939A3 true WO2003057939A3 (fr) | 2005-05-19 |
Family
ID=26324059
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IL2003/000033 WO2003057939A2 (fr) | 2002-01-14 | 2003-01-14 | Cathode pour evaporateurs a arc electrique sous vide |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2003209606A1 (fr) |
WO (1) | WO2003057939A2 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9997338B2 (en) | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
DE102015004856A1 (de) | 2015-04-15 | 2016-10-20 | Oerlikon Metaplas Gmbh | Bipolares Arc-Beschichtungsverfahren |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4505947A (en) * | 1982-07-14 | 1985-03-19 | The Standard Oil Company (Ohio) | Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma |
US5013578A (en) * | 1989-12-11 | 1991-05-07 | University Of California | Apparatus for coating a surface with a metal utilizing a plasma source |
US5026466A (en) * | 1987-06-29 | 1991-06-25 | Hauzer Holding B.V. | Method and device for coating cavities of objects |
US5269898A (en) * | 1991-03-20 | 1993-12-14 | Vapor Technologies, Inc. | Apparatus and method for coating a substrate using vacuum arc evaporation |
US5744017A (en) * | 1993-12-17 | 1998-04-28 | Kabushiki Kaisha Kobe Seiko Sho | Vacuum arc deposition apparatus |
-
2003
- 2003-01-14 WO PCT/IL2003/000033 patent/WO2003057939A2/fr not_active Application Discontinuation
- 2003-01-14 AU AU2003209606A patent/AU2003209606A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4505947A (en) * | 1982-07-14 | 1985-03-19 | The Standard Oil Company (Ohio) | Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma |
US5026466A (en) * | 1987-06-29 | 1991-06-25 | Hauzer Holding B.V. | Method and device for coating cavities of objects |
US5013578A (en) * | 1989-12-11 | 1991-05-07 | University Of California | Apparatus for coating a surface with a metal utilizing a plasma source |
US5269898A (en) * | 1991-03-20 | 1993-12-14 | Vapor Technologies, Inc. | Apparatus and method for coating a substrate using vacuum arc evaporation |
US5744017A (en) * | 1993-12-17 | 1998-04-28 | Kabushiki Kaisha Kobe Seiko Sho | Vacuum arc deposition apparatus |
Also Published As
Publication number | Publication date |
---|---|
AU2003209606A1 (en) | 2003-07-24 |
AU2003209606A8 (en) | 2003-07-24 |
WO2003057939A2 (fr) | 2003-07-17 |
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