WO2003057939A3 - Cathode pour evaporateurs a arc electrique sous vide - Google Patents

Cathode pour evaporateurs a arc electrique sous vide Download PDF

Info

Publication number
WO2003057939A3
WO2003057939A3 PCT/IL2003/000033 IL0300033W WO03057939A3 WO 2003057939 A3 WO2003057939 A3 WO 2003057939A3 IL 0300033 W IL0300033 W IL 0300033W WO 03057939 A3 WO03057939 A3 WO 03057939A3
Authority
WO
WIPO (PCT)
Prior art keywords
cathode
vacuum arc
metals
metal
arc evaporators
Prior art date
Application number
PCT/IL2003/000033
Other languages
English (en)
Other versions
WO2003057939A2 (fr
Inventor
Aleksander Arenshtam
Efim Bender
Nitzan Eliyahu
Original Assignee
Varco Ltd
Aleksander Arenshtam
Efim Bender
Nitzan Eliyahu
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IL14762702A external-priority patent/IL147627A0/xx
Priority claimed from IL15085402A external-priority patent/IL150854A0/xx
Application filed by Varco Ltd, Aleksander Arenshtam, Efim Bender, Nitzan Eliyahu filed Critical Varco Ltd
Priority to AU2003209606A priority Critical patent/AU2003209606A1/en
Publication of WO2003057939A2 publication Critical patent/WO2003057939A2/fr
Publication of WO2003057939A3 publication Critical patent/WO2003057939A3/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

Cette invention a trait à une cathode utilisable dans des évaporateurs à arc électrique sous vide à impulsions que l'on peut employer pour l'évaporation et le dépôt de métaux et de semi-conducteurs, pour fabriquer des composants électroniques, tremper des surfaces métalliques, empêcher la corrosion de métaux et produire des films du type à dépôt CDA. Ces évaporateurs sont en mesure de résister à un très grand nombre d'impulsions d'allumage, d'orienter ou de commander le déplacement de la tâche cathodique grâce à un élément médian en forme de vis, de sorte que l'évaporateur produit des enduits uniformes. Ces évaporateurs ont un extincteur d'arc métallique à longue durée.
PCT/IL2003/000033 2002-01-14 2003-01-14 Cathode pour evaporateurs a arc electrique sous vide WO2003057939A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003209606A AU2003209606A1 (en) 2002-01-14 2003-01-14 Cathode for vacuum arc evaporators

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
IL14762702A IL147627A0 (en) 2002-01-14 2002-01-14 Cathode for vacuum arc evaporators
IL147627 2002-01-14
IL15085402A IL150854A0 (en) 2002-07-22 2002-07-22 Cathode for vacuum arc evaporators
IL150854 2002-07-22

Publications (2)

Publication Number Publication Date
WO2003057939A2 WO2003057939A2 (fr) 2003-07-17
WO2003057939A3 true WO2003057939A3 (fr) 2005-05-19

Family

ID=26324059

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2003/000033 WO2003057939A2 (fr) 2002-01-14 2003-01-14 Cathode pour evaporateurs a arc electrique sous vide

Country Status (2)

Country Link
AU (1) AU2003209606A1 (fr)
WO (1) WO2003057939A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9997338B2 (en) 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
DE102015004856A1 (de) 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolares Arc-Beschichtungsverfahren

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4505947A (en) * 1982-07-14 1985-03-19 The Standard Oil Company (Ohio) Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma
US5013578A (en) * 1989-12-11 1991-05-07 University Of California Apparatus for coating a surface with a metal utilizing a plasma source
US5026466A (en) * 1987-06-29 1991-06-25 Hauzer Holding B.V. Method and device for coating cavities of objects
US5269898A (en) * 1991-03-20 1993-12-14 Vapor Technologies, Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
US5744017A (en) * 1993-12-17 1998-04-28 Kabushiki Kaisha Kobe Seiko Sho Vacuum arc deposition apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4505947A (en) * 1982-07-14 1985-03-19 The Standard Oil Company (Ohio) Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma
US5026466A (en) * 1987-06-29 1991-06-25 Hauzer Holding B.V. Method and device for coating cavities of objects
US5013578A (en) * 1989-12-11 1991-05-07 University Of California Apparatus for coating a surface with a metal utilizing a plasma source
US5269898A (en) * 1991-03-20 1993-12-14 Vapor Technologies, Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
US5744017A (en) * 1993-12-17 1998-04-28 Kabushiki Kaisha Kobe Seiko Sho Vacuum arc deposition apparatus

Also Published As

Publication number Publication date
AU2003209606A1 (en) 2003-07-24
AU2003209606A8 (en) 2003-07-24
WO2003057939A2 (fr) 2003-07-17

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