AU2003209606A8 - Cathode for vacuum arc evaporators - Google Patents

Cathode for vacuum arc evaporators

Info

Publication number
AU2003209606A8
AU2003209606A8 AU2003209606A AU2003209606A AU2003209606A8 AU 2003209606 A8 AU2003209606 A8 AU 2003209606A8 AU 2003209606 A AU2003209606 A AU 2003209606A AU 2003209606 A AU2003209606 A AU 2003209606A AU 2003209606 A8 AU2003209606 A8 AU 2003209606A8
Authority
AU
Australia
Prior art keywords
cathode
vacuum arc
arc evaporators
evaporators
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003209606A
Other versions
AU2003209606A1 (en
Inventor
Efim Bender
Aleksander Arenshtam
Nitzan Eliyahu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varco Ltd
Original Assignee
Varco Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IL14762702A external-priority patent/IL147627A0/en
Priority claimed from IL15085402A external-priority patent/IL150854A0/en
Application filed by Varco Ltd filed Critical Varco Ltd
Publication of AU2003209606A1 publication Critical patent/AU2003209606A1/en
Publication of AU2003209606A8 publication Critical patent/AU2003209606A8/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055Arc discharge
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
AU2003209606A 2002-01-14 2003-01-14 Cathode for vacuum arc evaporators Abandoned AU2003209606A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
IL147627 2002-01-14
IL14762702A IL147627A0 (en) 2002-01-14 2002-01-14 Cathode for vacuum arc evaporators
IL15085402A IL150854A0 (en) 2002-07-22 2002-07-22 Cathode for vacuum arc evaporators
IL150854 2002-07-22
PCT/IL2003/000033 WO2003057939A2 (en) 2002-01-14 2003-01-14 Cathode for vacuum arc evaporators

Publications (2)

Publication Number Publication Date
AU2003209606A1 AU2003209606A1 (en) 2003-07-24
AU2003209606A8 true AU2003209606A8 (en) 2003-07-24

Family

ID=26324059

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003209606A Abandoned AU2003209606A1 (en) 2002-01-14 2003-01-14 Cathode for vacuum arc evaporators

Country Status (2)

Country Link
AU (1) AU2003209606A1 (en)
WO (1) WO2003057939A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9997338B2 (en) 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
DE102015004856A1 (en) 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolar arc coating process

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4505947A (en) * 1982-07-14 1985-03-19 The Standard Oil Company (Ohio) Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma
EP0298157B1 (en) * 1987-06-29 1992-09-02 Hauzer Holding B.V. Method and device for coating cavities of objects
US5013578A (en) * 1989-12-11 1991-05-07 University Of California Apparatus for coating a surface with a metal utilizing a plasma source
US5269898A (en) * 1991-03-20 1993-12-14 Vapor Technologies, Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
US5744017A (en) * 1993-12-17 1998-04-28 Kabushiki Kaisha Kobe Seiko Sho Vacuum arc deposition apparatus

Also Published As

Publication number Publication date
WO2003057939A3 (en) 2005-05-19
AU2003209606A1 (en) 2003-07-24
WO2003057939A2 (en) 2003-07-17

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase