WO2003017003A3 - Blende für eine integratoreinheit - Google Patents

Blende für eine integratoreinheit Download PDF

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Publication number
WO2003017003A3
WO2003017003A3 PCT/EP2002/008180 EP0208180W WO03017003A3 WO 2003017003 A3 WO2003017003 A3 WO 2003017003A3 EP 0208180 W EP0208180 W EP 0208180W WO 03017003 A3 WO03017003 A3 WO 03017003A3
Authority
WO
WIPO (PCT)
Prior art keywords
diaphragm
integrator unit
symmetry
axis
integrator
Prior art date
Application number
PCT/EP2002/008180
Other languages
English (en)
French (fr)
Other versions
WO2003017003A2 (de
Inventor
Johannes Wangler
Markus Deguenther
Original Assignee
Zeiss Carl Semiconductor Mfg
Johannes Wangler
Markus Deguenther
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Semiconductor Mfg, Johannes Wangler, Markus Deguenther filed Critical Zeiss Carl Semiconductor Mfg
Priority to EP02754928A priority Critical patent/EP1417541A2/de
Publication of WO2003017003A2 publication Critical patent/WO2003017003A2/de
Publication of WO2003017003A3 publication Critical patent/WO2003017003A3/de
Priority to US10/777,109 priority patent/US6885434B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)

Abstract

Blende (1) für eine Integratoreinheit einer Mikrolithographie-Projektionsbelichtungsanlage. Die Blende (1) weist eine Blendenöffnung (3) auf, welche symmetrisch zu einer ersten Symmetrieachse (5) ist. Dabei sind die Breiten der Blendenöffnung (3) in Richtung der Symmetrieachse (5) vom Abstand y von der ersten Symmetrieachse (5) abhängig, wobei die Breiten grösser oder gleich der Breite bei y=0 sind. Die Blende (1) bildet zusammen mit einem Stabintegrator eine Integratoreinheit, welche in einem Beleuchtungssystem angeordnet ist.
PCT/EP2002/008180 2001-08-15 2002-07-23 Blende für eine integratoreinheit WO2003017003A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP02754928A EP1417541A2 (de) 2001-08-15 2002-07-23 Blende für eine integratoreinheit
US10/777,109 US6885434B2 (en) 2001-08-15 2004-02-13 Diaphragm for an integrator unit

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10138847.0 2001-08-15
DE10138847A DE10138847A1 (de) 2001-08-15 2001-08-15 Blende für eine Integratoreinheit

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/777,109 Continuation US6885434B2 (en) 2001-08-15 2004-02-13 Diaphragm for an integrator unit

Publications (2)

Publication Number Publication Date
WO2003017003A2 WO2003017003A2 (de) 2003-02-27
WO2003017003A3 true WO2003017003A3 (de) 2004-01-22

Family

ID=7694734

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/008180 WO2003017003A2 (de) 2001-08-15 2002-07-23 Blende für eine integratoreinheit

Country Status (5)

Country Link
US (1) US6885434B2 (de)
EP (1) EP1417541A2 (de)
DE (1) DE10138847A1 (de)
TW (1) TW565738B (de)
WO (1) WO2003017003A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009514007A (ja) * 2005-10-27 2009-04-02 オプティカ・リミテッド 画像投写表示システム
DE102008041288A1 (de) 2007-09-28 2009-04-02 Carl Zeiss Smt Ag Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Stabintegrator und Graufilter
DE102009029132A1 (de) 2009-09-02 2010-11-04 Carl Zeiss Smt Ag Beleuchtungssystem für eine Projektionsbelichtungsanlage für die Mikrolithographie mit Stabintegrator
DE102009041405B4 (de) * 2009-09-14 2020-08-20 Carl Zeiss Smt Gmbh Maskeninspektionsmikroskop mit variabler Beleuchtungseinstellung

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0633506A1 (de) * 1993-06-11 1995-01-11 Nikon Corporation Abtastbelichtungsvorrichtung
US5675401A (en) * 1994-06-17 1997-10-07 Carl-Zeiss-Stiftung Illuminating arrangement including a zoom objective incorporating two axicons
JPH11260716A (ja) * 1998-03-13 1999-09-24 Nikon Corp 露光装置及び半導体デバイスの製造方法
JP2000243681A (ja) * 1999-02-17 2000-09-08 Nikon Corp 投影露光装置及び該投影露光装置を用いた露光方法
EP1154330A2 (de) * 2000-05-11 2001-11-14 Nikon Corporation Belichtungsverfahren und Belichtungsapparat
US20020196419A1 (en) * 2001-05-22 2002-12-26 Satoru Mizouchi Illumination apparatus, exposure apparatus, and device fabricating method using the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5719704A (en) * 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
AU7921894A (en) 1993-09-30 1995-04-18 Cymer Laser Technologies Full field mask illumination enhancement methods and apparatus
US5473408A (en) 1994-07-01 1995-12-05 Anvik Corporation High-efficiency, energy-recycling exposure system
DE19548805A1 (de) 1995-12-27 1997-07-03 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
DE19653983A1 (de) 1996-12-21 1998-06-25 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
DE19855108A1 (de) 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
DE19942281A1 (de) 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
DE59913116D1 (de) 1998-11-30 2006-04-20 Zeiss Carl Smt Ag Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19855157A1 (de) 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0633506A1 (de) * 1993-06-11 1995-01-11 Nikon Corporation Abtastbelichtungsvorrichtung
US5675401A (en) * 1994-06-17 1997-10-07 Carl-Zeiss-Stiftung Illuminating arrangement including a zoom objective incorporating two axicons
JPH11260716A (ja) * 1998-03-13 1999-09-24 Nikon Corp 露光装置及び半導体デバイスの製造方法
JP2000243681A (ja) * 1999-02-17 2000-09-08 Nikon Corp 投影露光装置及び該投影露光装置を用いた露光方法
EP1154330A2 (de) * 2000-05-11 2001-11-14 Nikon Corporation Belichtungsverfahren und Belichtungsapparat
US20020196419A1 (en) * 2001-05-22 2002-12-26 Satoru Mizouchi Illumination apparatus, exposure apparatus, and device fabricating method using the same

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
"DIAPHRAGM AT QUARTZ-ROD ENTRANCE FOR I-LINE SCANNERS", RESEARCH DISCLOSURE, KENNETH MASON PUBLICATIONS, HAMPSHIRE, GB, no. 423, July 1999 (1999-07-01), pages 939, XP000888962, ISSN: 0374-4353 *
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 14 22 December 1999 (1999-12-22) *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 12 3 January 2001 (2001-01-03) *

Also Published As

Publication number Publication date
US20040160591A1 (en) 2004-08-19
EP1417541A2 (de) 2004-05-12
DE10138847A1 (de) 2003-02-27
US6885434B2 (en) 2005-04-26
WO2003017003A2 (de) 2003-02-27
TW565738B (en) 2003-12-11

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