WO2002102547A1 - Ponceuse a fenetre - Google Patents

Ponceuse a fenetre Download PDF

Info

Publication number
WO2002102547A1
WO2002102547A1 PCT/US2002/015405 US0215405W WO02102547A1 WO 2002102547 A1 WO2002102547 A1 WO 2002102547A1 US 0215405 W US0215405 W US 0215405W WO 02102547 A1 WO02102547 A1 WO 02102547A1
Authority
WO
WIPO (PCT)
Prior art keywords
polishing pad
underlay
polishing
window
opening
Prior art date
Application number
PCT/US2002/015405
Other languages
English (en)
Inventor
Stephen P. Carter
Arthur Richard Baker, Iii
Jon D. Jacobs, Jr.
George F. Feeley
Original Assignee
Rodel Holdings, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rodel Holdings, Inc. filed Critical Rodel Holdings, Inc.
Publication of WO2002102547A1 publication Critical patent/WO2002102547A1/fr

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/205Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

L'invention porte sur une ponceuse dont le tampon à polir (2) comporte une fenêtre (6) de transmission optique cadrée dans une ouverture (5) traversant le tampon (2) et une sous-couche (8) dont le périmètre (8a) s'étend substantiellement au delà du périmètre (6b) de la fenêtre (6) et constituant une couche imperméable au fluide de polissage isolant la surface arrière (6a) de la fenêtre pour en empêcher l'obstruction par ledit fluide.
PCT/US2002/015405 2001-06-15 2002-05-16 Ponceuse a fenetre WO2002102547A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29859901P 2001-06-15 2001-06-15
US60/298,599 2001-06-15

Publications (1)

Publication Number Publication Date
WO2002102547A1 true WO2002102547A1 (fr) 2002-12-27

Family

ID=23151211

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/015405 WO2002102547A1 (fr) 2001-06-15 2002-05-16 Ponceuse a fenetre

Country Status (2)

Country Link
US (1) US20020193058A1 (fr)
WO (1) WO2002102547A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8485862B2 (en) * 2000-05-19 2013-07-16 Applied Materials, Inc. Polishing pad for endpoint detection and related methods
US8083570B2 (en) * 2008-10-17 2011-12-27 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad having sealed window
US20110281510A1 (en) * 2010-05-12 2011-11-17 Applied Materials, Inc. Pad Window Insert
DE102013203116A1 (de) * 2013-02-26 2014-08-28 Robert Bosch Gmbh Schleifmittelvorrichtung

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5605760A (en) * 1995-08-21 1997-02-25 Rodel, Inc. Polishing pads
US5893796A (en) * 1995-03-28 1999-04-13 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US6123609A (en) * 1997-08-22 2000-09-26 Nec Corporation Polishing machine with improved polishing pad structure
US6171181B1 (en) * 1999-08-17 2001-01-09 Rodel Holdings, Inc. Molded polishing pad having integral window
US6213845B1 (en) * 1999-04-26 2001-04-10 Micron Technology, Inc. Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6146248A (en) * 1997-05-28 2000-11-14 Lam Research Corporation Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher
US6108091A (en) * 1997-05-28 2000-08-22 Lam Research Corporation Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing
US6068539A (en) * 1998-03-10 2000-05-30 Lam Research Corporation Wafer polishing device with movable window
US6464576B1 (en) * 1999-08-31 2002-10-15 Rodel Holdings Inc. Stacked polishing pad having sealed edge
US6524164B1 (en) * 1999-09-14 2003-02-25 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
US6454630B1 (en) * 1999-09-14 2002-09-24 Applied Materials, Inc. Rotatable platen having a transparent window for a chemical mechanical polishing apparatus and method of making the same
WO2001023141A1 (fr) * 1999-09-29 2001-04-05 Rodel Holdings, Inc. Tampon de polissage

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5893796A (en) * 1995-03-28 1999-04-13 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US5605760A (en) * 1995-08-21 1997-02-25 Rodel, Inc. Polishing pads
US6123609A (en) * 1997-08-22 2000-09-26 Nec Corporation Polishing machine with improved polishing pad structure
US6213845B1 (en) * 1999-04-26 2001-04-10 Micron Technology, Inc. Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same
US6171181B1 (en) * 1999-08-17 2001-01-09 Rodel Holdings, Inc. Molded polishing pad having integral window

Also Published As

Publication number Publication date
US20020193058A1 (en) 2002-12-19

Similar Documents

Publication Publication Date Title
EP1224060B1 (fr) Tampon de polissage
JP5339680B2 (ja) 表面の研磨
EP1395394B1 (fr) Appareil de polissage et tampon de polissage
CN101490702B (zh) 制造包括至少一个电子模块的卡的方法、在该方法中包含的组件以及中间产品
EP1512168B1 (fr) Sous-tampon dote de rebords scelles robustes
US6824447B2 (en) Perforated-transparent polishing pad
US20110256818A1 (en) Molding Windows in Thin Pads
US11826875B2 (en) Window in thin polishing pad
US20030171070A1 (en) Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
US8287330B1 (en) Reducing polishing pad deformation
WO2001098028A1 (fr) Tampon a polir
KR20170088444A (ko) 패드 윈도우 삽입
US20020193058A1 (en) Polishing apparatus that provides a window
JP2002537642A (ja) 研磨パッドおよびその製造方法
JP4620331B2 (ja) 研磨パッド及び研磨パッドの製造方法
CN108701600B (zh) 在薄型抛光垫中的窗
JP2005178218A (ja) 積層パネルの成形装置及びその成形方法
JP3847941B2 (ja) 配送伝票及びその製造方法
KR102664256B1 (ko) 얇은 연마 패드 내의 윈도우
JP2003165373A (ja) フロアマット及びその製造方法
JPH11129747A (ja) 枠体付ガラス板
JPH03255646A (ja) 半導体素子の分離用テープ
JPH08156097A (ja) 加飾体の木目込み固着方法及び装置

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): JP KR SG

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR

121 Ep: the epo has been informed by wipo that ep was designated in this application
122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP