WO2002102547A1 - Ponceuse a fenetre - Google Patents
Ponceuse a fenetre Download PDFInfo
- Publication number
- WO2002102547A1 WO2002102547A1 PCT/US2002/015405 US0215405W WO02102547A1 WO 2002102547 A1 WO2002102547 A1 WO 2002102547A1 US 0215405 W US0215405 W US 0215405W WO 02102547 A1 WO02102547 A1 WO 02102547A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polishing pad
- underlay
- polishing
- window
- opening
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
L'invention porte sur une ponceuse dont le tampon à polir (2) comporte une fenêtre (6) de transmission optique cadrée dans une ouverture (5) traversant le tampon (2) et une sous-couche (8) dont le périmètre (8a) s'étend substantiellement au delà du périmètre (6b) de la fenêtre (6) et constituant une couche imperméable au fluide de polissage isolant la surface arrière (6a) de la fenêtre pour en empêcher l'obstruction par ledit fluide.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29859901P | 2001-06-15 | 2001-06-15 | |
US60/298,599 | 2001-06-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002102547A1 true WO2002102547A1 (fr) | 2002-12-27 |
Family
ID=23151211
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/015405 WO2002102547A1 (fr) | 2001-06-15 | 2002-05-16 | Ponceuse a fenetre |
Country Status (2)
Country | Link |
---|---|
US (1) | US20020193058A1 (fr) |
WO (1) | WO2002102547A1 (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8485862B2 (en) * | 2000-05-19 | 2013-07-16 | Applied Materials, Inc. | Polishing pad for endpoint detection and related methods |
US8083570B2 (en) * | 2008-10-17 | 2011-12-27 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad having sealed window |
US20110281510A1 (en) * | 2010-05-12 | 2011-11-17 | Applied Materials, Inc. | Pad Window Insert |
DE102013203116A1 (de) * | 2013-02-26 | 2014-08-28 | Robert Bosch Gmbh | Schleifmittelvorrichtung |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5605760A (en) * | 1995-08-21 | 1997-02-25 | Rodel, Inc. | Polishing pads |
US5893796A (en) * | 1995-03-28 | 1999-04-13 | Applied Materials, Inc. | Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
US6123609A (en) * | 1997-08-22 | 2000-09-26 | Nec Corporation | Polishing machine with improved polishing pad structure |
US6171181B1 (en) * | 1999-08-17 | 2001-01-09 | Rodel Holdings, Inc. | Molded polishing pad having integral window |
US6213845B1 (en) * | 1999-04-26 | 2001-04-10 | Micron Technology, Inc. | Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6146248A (en) * | 1997-05-28 | 2000-11-14 | Lam Research Corporation | Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher |
US6108091A (en) * | 1997-05-28 | 2000-08-22 | Lam Research Corporation | Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing |
US6068539A (en) * | 1998-03-10 | 2000-05-30 | Lam Research Corporation | Wafer polishing device with movable window |
US6464576B1 (en) * | 1999-08-31 | 2002-10-15 | Rodel Holdings Inc. | Stacked polishing pad having sealed edge |
US6524164B1 (en) * | 1999-09-14 | 2003-02-25 | Applied Materials, Inc. | Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus |
US6454630B1 (en) * | 1999-09-14 | 2002-09-24 | Applied Materials, Inc. | Rotatable platen having a transparent window for a chemical mechanical polishing apparatus and method of making the same |
WO2001023141A1 (fr) * | 1999-09-29 | 2001-04-05 | Rodel Holdings, Inc. | Tampon de polissage |
-
2002
- 2002-05-16 WO PCT/US2002/015405 patent/WO2002102547A1/fr not_active Application Discontinuation
- 2002-05-16 US US10/150,666 patent/US20020193058A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5893796A (en) * | 1995-03-28 | 1999-04-13 | Applied Materials, Inc. | Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
US5605760A (en) * | 1995-08-21 | 1997-02-25 | Rodel, Inc. | Polishing pads |
US6123609A (en) * | 1997-08-22 | 2000-09-26 | Nec Corporation | Polishing machine with improved polishing pad structure |
US6213845B1 (en) * | 1999-04-26 | 2001-04-10 | Micron Technology, Inc. | Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same |
US6171181B1 (en) * | 1999-08-17 | 2001-01-09 | Rodel Holdings, Inc. | Molded polishing pad having integral window |
Also Published As
Publication number | Publication date |
---|---|
US20020193058A1 (en) | 2002-12-19 |
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