WO2002040272A1 - Verfahren zur herstellung von rasternäpfchen in einer tiefdruckform und in dem verfahren verwendbarer grundkörper - Google Patents
Verfahren zur herstellung von rasternäpfchen in einer tiefdruckform und in dem verfahren verwendbarer grundkörper Download PDFInfo
- Publication number
- WO2002040272A1 WO2002040272A1 PCT/CH2001/000668 CH0100668W WO0240272A1 WO 2002040272 A1 WO2002040272 A1 WO 2002040272A1 CH 0100668 W CH0100668 W CH 0100668W WO 0240272 A1 WO0240272 A1 WO 0240272A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- support layer
- copper
- laser radiation
- base body
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41B—MACHINES OR ACCESSORIES FOR MAKING, SETTING, OR DISTRIBUTING TYPE; TYPE; PHOTOGRAPHIC OR PHOTOELECTRIC COMPOSING DEVICES
- B41B17/00—Photographic composing machines having fixed or movable character carriers and without means for composing lines prior to photography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/02—Engraving; Heads therefor
- B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
- B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
Definitions
- the invention relates to a method according to the preamble of patent claim 1 and a base body of a gravure printing plate according to the preamble of patent claim 8.
- DE-A 30 35 714 discloses a further method for producing pressure cups for an intaglio printing plate.
- the still "raw" gravure form was coated with an etchant-resistant varnish.
- the varnish was then removed with an electronic engraving device at the points where grid pits should later be available.
- a stylus, a laser beam or an electron beam was used as the electronic engraving device.
- an etching process was carried out to produce the grid cells.
- the manufacturing process described here was complicated and time consuming. A method analogous to this is described in DE-A 2 344 233.
- EP-B 0473 973 proposes to produce the cells no longer in copper but in zinc.
- the method described in EP-B 0 473 973 can be used, it is disadvantageous in the case of the gravure printing forms produced thereby that the entire gravure Printing technology is now geared towards copper as the material in which the grid cells are located.
- the object of the invention is to present a method and to create a base body in which or on the screen cup of a gravure printing form directly by means of laser radiation, preferably in copper, but also in other materials without an ejection crater rim, i.e. burr-free grid cups can be produced.
- the object is achieved in that a, preferably only a single ablation support layer is applied to the base body over the upper layer areas provided for the information embossing, through which scanning pits with the laser radiation by material ablation (evaporation and / or ejection of molten material) into the jacket areas are introduced and then this support layer is removed, whereupon burr-free rest cases are obtained.
- the laser radiation is radiation that is modulated in terms of its intensity over time. As a rule, pulsed radiation will be used, but this is not mandatory. Laser spikes, Q-switches, mode-locking etc. are also possible. When the support layer is removed, there is no change in the grid cells in the upper layer areas.
- the quality of the grid cells produced in this way without burr is so good that a hard layer, in particular a chrome layer, can be applied without aftertreatment.
- the chromium layer in gravure forms of this type is preferably applied with a layer thickness between 4 ⁇ m and 30 ⁇ m, in particular between 8 ⁇ m and 10 ⁇ m.
- the burr-free grid cells preferably in copper, can be achieved in particular by selecting the support layer in such a way that it enables good energy coupling for the laser radiation with good initiation of material ablation (ablation) to the underlying material with minimized directed radiation backscattering.
- Minimized radiation backscatter is important so that no radiation gets back into the laser resonator. This would be intensified there and could cause damage to the optical components.
- a good energy coupling of the laser radiation is important, since then only a small portion of the radiation remains, which is still necessary for a back reflection could come into question. On the other hand, a good energy coupling causes a strong heating of the material of the support layer.
- the support layer has changed to the liquid state, there is practically no longer any need to worry about radiation absorption. If one now selects this material of the support layer in such a way that the melting point of its essential material portion is low, the high radiation absorption also occurs quickly. However, the melting point should in any case be lower than that of the underlying upper layer material, in which the grid cells are then located. If the grid cells are to be in copper, the melting point should be below 1083 ° C.
- the metals would be silver with 961 ° C, aluminum with 660 ° C, gold with 1063 ° C (which, however, immediately falls out of the cost), gallium and germanium with 937 ° C, indium with 927 ° C, lead at 327 ° C, tin at 232 ° C, zinc at 419 ° C, etc.
- An essential material fraction of the layer material is understood to mean a percentage which causes the property mentioned above. Depending on the material, a substantial proportion of the material should be between 80% and close to 100%.
- the material of the support layer is said to be a material removal in which the
- the local thermal energy introduced with the laser radiation should cause the material underneath to melt as quickly as possible.
- this reproducible melting is only possible if the layer thickness of the ablation support layer is the same everywhere. If this is the case, the well volume to be generated can be precisely specified via the radiated maximum pulse intensity and the pulse shape. The easiest way to determine the well volume is by experiment. Good results have resulted in copper as information-bearing layer and zinc as erosion support layer with the layer thickness of between 1 micron to 15 microns, preferably microns between 5 and 10 microns is less than 10 with a layer thickness tolerance of "3, preferably better than 5 ⁇ 10 of" 5 , A zinc layer with such accuracy is best applied galvanically.
- the material of the ablation support layer should have the highest possible vapor pressure.
- "Background material” ejected by the laser pulse from the information-carrying layer, which still falls fluidly onto the support layer, causes it to melt and evaporate and is then thrown away by the steam with a further loss of heat.
- the vapor pressure of the "background material” should be at least five times lower than that of the material lying on it. If the example above remains, zinc has a vapor pressure that is about 100 times higher than that of copper.
- the material of the ablation support layer should be able to be removed well, in particular chemically, without attacking the information-carrying jacket regions.
- the wavelength of the laser radiation used is to be adapted to the absorption of the material of the ablation support layer.
- the wavelength must also be adapted to the dimensions of the grid cells to be produced in accordance with the optical imaging laws.
- a CO 2 laser (wavelength 10.6 ⁇ m) can be used for scanning cells with a diameter larger than 10 ⁇ m.
- an Nd: YAG laser (1.06 ⁇ m) is preferred.
- Pulse shaping and an optical structure for the beam guidance of the laser will preferably be carried out as described in EP 00 810 552.0. If an Nd: YAG laser is used, zinc has also proven itself in this case as the material of the ablation support layer.
- the ablation support layer not only initiates material removal in the underlying material, it also causes a switch-on delay for the drilling process in the underlying layer.
- the laser pulse has therefore already risen to a higher intensity value than its initial pulse value, which results in an increase in the drilling intensity. This results in a good, i.e. a hemispherical shape.
- FIG. 1 shows a cross section through the base body according to the invention in an enlarged view with a pulsed laser beam generating a scanning cell
- FIG. 2 shows a cross section analogous to FIG. 1, the removal support layer being removed here
- FIG. 3 shows a cross section analogous to FIGS. 1 and 2, a hard layer being applied here.
- Metallic rotogravure forms are usually made up of several functional elements.
- a steel cylinder is usually used as the base body 1.
- a copper layer 3 with a thickness of a few millimeters is applied to the steel cylinder.
- the copper layer 3 is the information-bearing gravure form.
- the information consists of an arrangement of a multiplicity of grid cells 5 which receive the color required for printing.
- a chromium coating 7 with a typical thickness of approximately 10 ⁇ m is applied as the top layer.
- the print information is now introduced directly into the copper layer 3 in its upper layer area 8 with a beam 9 of a pulsed Nd: YAG by material removal.
- the copper surface 11 is galvanically provided with a zinc layer 13 as a removal support layer with a small thickness tolerance (less than 5 ⁇ 10 "5 ).
- a small thickness tolerance less than 5 ⁇ 10 "5 .
- the laser pulse 9 for generating a grid 5 each pierces the zinc layer 13 while melting.
- Solid zinc has an absorption for the radiation 9 of the Nd: YAG laser of approximately 50%.
- solid zinc shows almost no directional reflection. Does the zinc go due to its relatively low melting and its low thermal conductivity compared to copper into the liquid state, there is almost 100 percent radiation absorption. There is a strong local heating of the zinc, which continues to pass it on to the underlying copper in the absorbing state, whereupon this also changes into the liquid state. Copper is now of an almost 100 percent reflection for the radiation 9 of the Nd: YAG laser (although the reflection does not come into effect because the copper is still covered by zinc) in the solid state, now liquid in an approximately 100 percent absorption passed.
- the copper material ejection or that of the zinc 15 lie on the zinc layer 13 and can be easily removed by chemically detaching it in a subsequent cleaning process.
- the exposed engraving (small cup 5) in copper 3 is burr-free and can be chrome-plated without any problems.
- Zinc in particular prevents the melts from sticking, reduces the initial reflection for the laser radiation 9 and therefore allows an efficient drilling process in copper 3.
- the method just described is of course not limited to zinc 13 as a copper coating. As stated at the beginning, a number of other materials are possible.
- the removal support layer to be applied to copper 3 does not necessarily have to be a metal layer either. Non-metals are also suitable, provided they have the required properties with regard to absorption, directed reflection and melting point.
- the base body 1 of a gravure printing plate does not necessarily have to be cylindrical; it can also be semi-cylindrical, flat or shaped differently.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002542618A JP2004512997A (ja) | 2000-11-15 | 2001-11-15 | グラビア版にスクリーン凹所を形成する方法及びこの方法に使用可能な母体 |
US10/416,706 US20040029048A1 (en) | 2000-11-15 | 2001-11-15 | Method for the production of screen cavities in a rotogravure form and base body applicable in said method |
EP01980111A EP1333976B1 (de) | 2000-11-15 | 2001-11-15 | Verfahren zur herstellung von rasternäpfchen in einer tiefdruckform und in dem verfahren verwendbarer grundkörper |
DE50110828T DE50110828D1 (de) | 2000-11-15 | 2001-11-15 | Verfahren zur herstellung von rasternäpfchen in einer tiefdruckform und in dem verfahren verwendbarer grundkörper |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH22192000 | 2000-11-15 | ||
CH2219/00 | 2000-11-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002040272A1 true WO2002040272A1 (de) | 2002-05-23 |
Family
ID=4568057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CH2001/000668 WO2002040272A1 (de) | 2000-11-15 | 2001-11-15 | Verfahren zur herstellung von rasternäpfchen in einer tiefdruckform und in dem verfahren verwendbarer grundkörper |
Country Status (5)
Country | Link |
---|---|
US (1) | US20040029048A1 (de) |
EP (1) | EP1333976B1 (de) |
JP (1) | JP2004512997A (de) |
DE (1) | DE50110828D1 (de) |
WO (1) | WO2002040272A1 (de) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1410923A1 (de) * | 2002-10-17 | 2004-04-21 | Hell Gravure Systems GmbH | Verfahren zur Herstellung einer Druckform für den Tiefdruck |
WO2005002869A1 (de) * | 2003-07-03 | 2005-01-13 | Oesterreichische Banknoten- Und Sicherheitsdruck Gmbh | Verfahren zur herstellung einer druckplatte für den intaglio-tiefdruck und druckplatte für den intaglio-tiefdruck |
EP1985459A3 (de) * | 2007-04-23 | 2009-07-29 | Mdc Max Daetwyler AG | Herstellung von Tiefdruckformen |
EP2139682A1 (de) * | 2007-04-23 | 2010-01-06 | Anders Bjurstedt | Tiefdruckvorrichtung |
EP2151324A2 (de) | 2008-07-28 | 2010-02-10 | Prinovis Dresden GmbH & Co. KG | Verfahren zur Herstellung einer rotativen Druckform zum Einsatz in einem Rollenrotationsdruckverfahren |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090168111A9 (en) * | 1999-09-01 | 2009-07-02 | Hell Gravure Systems Gmbh | Printing form processing with fine and coarse engraving tool processing tracks |
FR2898903B1 (fr) | 2006-03-24 | 2012-08-31 | Oreal | Composition de teinture comprenant un colorant disulfure fluorescent, procede d'eclaircissement des matieres keratiniques a partir de ce colorant |
DE102009058845B4 (de) * | 2009-12-18 | 2012-12-06 | Christof Tielemann | Verfahren zur Herstellung einer Druckwalze mit einer Laser-gravierten Oberfläche |
DE102012205702B3 (de) * | 2012-04-05 | 2013-05-23 | Schaeffler Technologies AG & Co. KG | Verfahren zum Markieren von Bauteilen |
JP6389695B2 (ja) * | 2014-08-18 | 2018-09-12 | 理想科学工業株式会社 | 感熱製版装置 |
Citations (8)
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DE2218393A1 (de) | 1972-04-15 | 1973-10-25 | Steigerwald Strahltech | Mittels energiestrahls gravierbares werkstueck, insbesondere tiefdruckform oder dergleichen |
DE2344233A1 (de) | 1972-09-09 | 1974-03-21 | Newton Horwood Ltd | Druckplatte und verfahren zu ihrer herstellung |
DE3035714A1 (de) | 1979-09-26 | 1981-04-16 | Dai Nippon Insatsu K.K., Tokyo | Verfahren zur herstellung einer tiefdruckplatte |
EP0473973A1 (de) | 1990-09-04 | 1992-03-11 | MDC Max Dätwyler Bleienbach AG | Verfahren zum Bearbeiten von Tiefdruckformen |
DE4212582A1 (de) * | 1992-04-15 | 1993-10-21 | Hell Ag Linotype | Verfahren zur Gravur von Druckformen sowie Druckform zur Durchführung des Verfahrens |
WO1996034718A1 (de) * | 1995-05-03 | 1996-11-07 | Mdc Max Dätwyler Bleienbach Ag | Verfahren und vorrichtung zur herstellung von rasternäpfchen in der oberfläche eines tiefdruckzylinders |
EP0810552A2 (de) | 1996-05-28 | 1997-12-03 | Sharp Kabushiki Kaisha | Bildanzeigevorrichtung |
EP1172227A1 (de) * | 2000-07-11 | 2002-01-16 | Tampoprint GmbH | Druckklischee und Verfahren zur Herstellung |
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DE728837C (de) * | 1935-05-30 | 1942-12-04 | Josef Horn | Verfahren zum Herstellen von Flachdruckplatten |
US2100258A (en) * | 1936-02-15 | 1937-11-23 | Reynolds Metals Co | Composite body of copper and aluminum or copper and magnesium, and method of making same |
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US4328390A (en) * | 1979-09-17 | 1982-05-04 | The University Of Delaware | Thin film photovoltaic cell |
DE3047999A1 (de) * | 1980-12-19 | 1982-07-15 | Basf Ag, 6700 Ludwigshafen | Verfahren zur verringerung der abrasion von pigmenten und druckfarben und im abrasionsverhalten verbesserte pigmente und druckfarben |
DK159251C (da) * | 1983-03-12 | 1991-02-18 | Basf Ag | Fremgangsmaade til lukning af spalten mellem en paa et dybtrykapparats trykformcylinder opspaendt dybtrykplades ender, samt indretning ved dybtryksapparatet, til udoevelse af fremgangsmaaden |
US5807658A (en) * | 1996-08-20 | 1998-09-15 | Presstek, Inc. | Self-cleaning, abrasion-resistant, laser-imageable lithographic printing contructions |
DE19840926B4 (de) * | 1998-09-08 | 2013-07-11 | Hell Gravure Systems Gmbh & Co. Kg | Anordnung zur Materialbearbeitung mittels Laserstrahlen und deren Verwendung |
EP1072350A1 (de) * | 1999-07-12 | 2001-01-31 | MDC Max Dätwyler AG Bleienbach | Verfahren zur Erzeugung einer Intensitätsverteilung über einen Arbeitslaserstrahl sowie Vorrichtung hierzu |
-
2001
- 2001-11-15 JP JP2002542618A patent/JP2004512997A/ja active Pending
- 2001-11-15 US US10/416,706 patent/US20040029048A1/en not_active Abandoned
- 2001-11-15 EP EP01980111A patent/EP1333976B1/de not_active Expired - Lifetime
- 2001-11-15 DE DE50110828T patent/DE50110828D1/de not_active Expired - Fee Related
- 2001-11-15 WO PCT/CH2001/000668 patent/WO2002040272A1/de active IP Right Grant
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
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DE2218393A1 (de) | 1972-04-15 | 1973-10-25 | Steigerwald Strahltech | Mittels energiestrahls gravierbares werkstueck, insbesondere tiefdruckform oder dergleichen |
DE2344233A1 (de) | 1972-09-09 | 1974-03-21 | Newton Horwood Ltd | Druckplatte und verfahren zu ihrer herstellung |
DE3035714A1 (de) | 1979-09-26 | 1981-04-16 | Dai Nippon Insatsu K.K., Tokyo | Verfahren zur herstellung einer tiefdruckplatte |
EP0473973A1 (de) | 1990-09-04 | 1992-03-11 | MDC Max Dätwyler Bleienbach AG | Verfahren zum Bearbeiten von Tiefdruckformen |
DE4212582A1 (de) * | 1992-04-15 | 1993-10-21 | Hell Ag Linotype | Verfahren zur Gravur von Druckformen sowie Druckform zur Durchführung des Verfahrens |
WO1996034718A1 (de) * | 1995-05-03 | 1996-11-07 | Mdc Max Dätwyler Bleienbach Ag | Verfahren und vorrichtung zur herstellung von rasternäpfchen in der oberfläche eines tiefdruckzylinders |
EP0810552A2 (de) | 1996-05-28 | 1997-12-03 | Sharp Kabushiki Kaisha | Bildanzeigevorrichtung |
EP1172227A1 (de) * | 2000-07-11 | 2002-01-16 | Tampoprint GmbH | Druckklischee und Verfahren zur Herstellung |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1410923A1 (de) * | 2002-10-17 | 2004-04-21 | Hell Gravure Systems GmbH | Verfahren zur Herstellung einer Druckform für den Tiefdruck |
WO2005002869A1 (de) * | 2003-07-03 | 2005-01-13 | Oesterreichische Banknoten- Und Sicherheitsdruck Gmbh | Verfahren zur herstellung einer druckplatte für den intaglio-tiefdruck und druckplatte für den intaglio-tiefdruck |
EP1985459A3 (de) * | 2007-04-23 | 2009-07-29 | Mdc Max Daetwyler AG | Herstellung von Tiefdruckformen |
EP2139682A1 (de) * | 2007-04-23 | 2010-01-06 | Anders Bjurstedt | Tiefdruckvorrichtung |
EP2139682A4 (de) * | 2007-04-23 | 2010-09-08 | Anders Bjurstedt | Tiefdruckvorrichtung |
EP2151324A2 (de) | 2008-07-28 | 2010-02-10 | Prinovis Dresden GmbH & Co. KG | Verfahren zur Herstellung einer rotativen Druckform zum Einsatz in einem Rollenrotationsdruckverfahren |
DE102008035203A1 (de) | 2008-07-28 | 2010-02-11 | Leibniz-Institut für Oberflächenmodifizierung e.V. | Verfahren zur Herstellung einer rotativen Druckform zum Einsatz in einem Rollenrotationsdruckverfahren |
Also Published As
Publication number | Publication date |
---|---|
DE50110828D1 (de) | 2006-10-05 |
JP2004512997A (ja) | 2004-04-30 |
EP1333976B1 (de) | 2006-08-23 |
US20040029048A1 (en) | 2004-02-12 |
EP1333976A1 (de) | 2003-08-13 |
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