WO2002036850A3 - Procede et dispositif de revetement de corps creux - Google Patents
Procede et dispositif de revetement de corps creux Download PDFInfo
- Publication number
- WO2002036850A3 WO2002036850A3 PCT/EP2001/012689 EP0112689W WO0236850A3 WO 2002036850 A3 WO2002036850 A3 WO 2002036850A3 EP 0112689 W EP0112689 W EP 0112689W WO 0236850 A3 WO0236850 A3 WO 0236850A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- hollow body
- plasma
- hollow bodies
- vacuum chamber
- coating hollow
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Vapour Deposition (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2002216000A AU2002216000A1 (en) | 2000-11-03 | 2001-11-02 | Method and device for coating hollow bodies |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2000154653 DE10054653A1 (de) | 2000-11-03 | 2000-11-03 | Verfahren und Vorrichtung zum Beschichten von Hohlkörper |
DE10054653.6 | 2000-11-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002036850A2 WO2002036850A2 (fr) | 2002-05-10 |
WO2002036850A3 true WO2002036850A3 (fr) | 2002-07-18 |
Family
ID=7662108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2001/012689 WO2002036850A2 (fr) | 2000-11-03 | 2001-11-02 | Procede et dispositif de revetement de corps creux |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2002216000A1 (fr) |
DE (1) | DE10054653A1 (fr) |
WO (1) | WO2002036850A2 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100469943C (zh) * | 2002-05-24 | 2009-03-18 | 肖特股份公司 | 用于工件处理的装置和方法 |
DE10224546A1 (de) * | 2002-05-24 | 2003-12-04 | Sig Technology Ltd | Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken |
DE10253513B4 (de) * | 2002-11-16 | 2005-12-15 | Schott Ag | Mehrplatz-Beschichtungsvorrichtung und Verfahren zur Plasmabeschichtung |
DE102004045046B4 (de) * | 2004-09-15 | 2007-01-04 | Schott Ag | Verfahren und Vorrichtung zum Aufbringen einer elektrisch leitfähigen transparenten Beschichtung auf ein Substrat |
DE102005040266A1 (de) | 2005-08-24 | 2007-03-01 | Schott Ag | Verfahren und Vorrichtung zur innenseitigen Plasmabehandlung von Hohlkörpern |
DE102011104730A1 (de) | 2011-06-16 | 2012-12-20 | Khs Corpoplast Gmbh | Verfahren zur Plasmabehandlung von Werkstücken sowie Werkstück mit Gasbarriereschicht |
DE102012201955A1 (de) * | 2012-02-09 | 2013-08-14 | Krones Ag | Powerlanze und plasmaunterstützte Beschichtung mit Hochfrequenzeinkopplung |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63241177A (ja) * | 1987-03-27 | 1988-10-06 | Canon Inc | マイクロ波プラズマcvd装置 |
US5223308A (en) * | 1991-10-18 | 1993-06-29 | Energy Conversion Devices, Inc. | Low temperature plasma enhanced CVD process within tubular members |
US5308649A (en) * | 1992-06-26 | 1994-05-03 | Polar Materials, Inc. | Methods for externally treating a container with application of internal bias gas |
US5368888A (en) * | 1991-11-04 | 1994-11-29 | General Electric Company | Apparatus and method for gas phase coating of hollow articles |
EP0773167A1 (fr) * | 1994-08-11 | 1997-05-14 | Kirin Beer Kabushiki Kaisha | Recipients de plastique a revetement mince de carbone, leur appareil de fabrication et procede associe |
WO1997044503A1 (fr) * | 1996-05-22 | 1997-11-27 | Tetra Laval Holdings & Finance S.A. | Procede et appareil de traitement des surfaces interieures de recipients |
FR2783667A1 (fr) * | 1998-03-27 | 2000-03-24 | Sidel Sa | Appareil pour la fabrication d'un recipient en matiere a effet barriere |
WO2001031680A1 (fr) * | 1999-10-25 | 2001-05-03 | Sidel Actis Services | Circuit de vide pour un dispositif de traitement d'un recipient a l'aide d'un plasma a basse pression |
-
2000
- 2000-11-03 DE DE2000154653 patent/DE10054653A1/de not_active Withdrawn
-
2001
- 2001-11-02 WO PCT/EP2001/012689 patent/WO2002036850A2/fr not_active Application Discontinuation
- 2001-11-02 AU AU2002216000A patent/AU2002216000A1/en not_active Abandoned
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63241177A (ja) * | 1987-03-27 | 1988-10-06 | Canon Inc | マイクロ波プラズマcvd装置 |
US5223308A (en) * | 1991-10-18 | 1993-06-29 | Energy Conversion Devices, Inc. | Low temperature plasma enhanced CVD process within tubular members |
US5368888A (en) * | 1991-11-04 | 1994-11-29 | General Electric Company | Apparatus and method for gas phase coating of hollow articles |
US5308649A (en) * | 1992-06-26 | 1994-05-03 | Polar Materials, Inc. | Methods for externally treating a container with application of internal bias gas |
EP0773167A1 (fr) * | 1994-08-11 | 1997-05-14 | Kirin Beer Kabushiki Kaisha | Recipients de plastique a revetement mince de carbone, leur appareil de fabrication et procede associe |
WO1997044503A1 (fr) * | 1996-05-22 | 1997-11-27 | Tetra Laval Holdings & Finance S.A. | Procede et appareil de traitement des surfaces interieures de recipients |
FR2783667A1 (fr) * | 1998-03-27 | 2000-03-24 | Sidel Sa | Appareil pour la fabrication d'un recipient en matiere a effet barriere |
WO2001031680A1 (fr) * | 1999-10-25 | 2001-05-03 | Sidel Actis Services | Circuit de vide pour un dispositif de traitement d'un recipient a l'aide d'un plasma a basse pression |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 013, no. 042 (C - 564) 30 January 1989 (1989-01-30) * |
Also Published As
Publication number | Publication date |
---|---|
AU2002216000A1 (en) | 2002-05-15 |
DE10054653A1 (de) | 2002-05-08 |
WO2002036850A2 (fr) | 2002-05-10 |
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