WO2002020857A1 - Method for producing silver having high purity - Google Patents

Method for producing silver having high purity Download PDF

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Publication number
WO2002020857A1
WO2002020857A1 PCT/JP2001/004296 JP0104296W WO0220857A1 WO 2002020857 A1 WO2002020857 A1 WO 2002020857A1 JP 0104296 W JP0104296 W JP 0104296W WO 0220857 A1 WO0220857 A1 WO 0220857A1
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silver
purity
raw material
producing high
high purity
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PCT/JP2001/004296
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French (fr)
Japanese (ja)
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Yuichiro Shindo
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Nikko Materials Company, Limited
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/20Treatment or purification of solutions, e.g. obtained by leaching
    • C22B3/44Treatment or purification of solutions, e.g. obtained by leaching by chemical processes
    • C22B3/46Treatment or purification of solutions, e.g. obtained by leaching by chemical processes by substitution, e.g. by cementation
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B11/00Obtaining noble metals
    • C22B11/04Obtaining noble metals by wet processes
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/04Extraction of metal compounds from ores or concentrates by wet processes by leaching
    • C22B3/06Extraction of metal compounds from ores or concentrates by wet processes by leaching in inorganic acid solutions, e.g. with acids generated in situ; in inorganic salt solutions other than ammonium salt solutions
    • C22B3/065Nitric acids or salts thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Abstract

A method for producing a silver having high purity from a raw material of low grade, characterized in that it comprises dissolving the raw material with a nitric acid solution, adding hydrochloric acid to the resulting mixture to give silver chloride crystals, and reducing the silver chloride crystals. The method allows the production of a high purity silver having a purity of 99.999 % or more without the use of the electrolysis purification method with a simple process and at a low cost.

Description

高純度銀の製造方法 技術分野 Manufacturing method of high purity silver
この発明は、 高純度銀の製造方法に関し、 特に低品位の銀含有原料から 9 9 . 9 9 9 %以上の純度をもつ高純度銀を安明価に製造できる方法に関する。  The present invention relates to a method for producing high-purity silver, and more particularly, to a method for producing high-purity silver having a purity of 99.999% or more from low-grade silver-containing raw materials at a low light value.
 Rice field
背景技術 Background art
一般に、 高純度銀は粗銀原料を電解精製法により製造されている。 例えば、 鉛電 解のアノードスライム等を出発原料とし、 これに含有される銀を濃縮して得た品位 の低い粗銀板を陽極とし、 硝酸を含有する硝酸銀溶液を電解液として電解し、 陰極 板に銀を析出させて製造している。  Generally, high-purity silver is produced from a crude silver raw material by an electrolytic refining method. For example, a lead electrolytic anode slime is used as a starting material, a low-grade coarse silver plate obtained by concentrating silver contained in the anode slime is used as an anode, a silver nitrate solution containing nitric acid is used as an electrolytic solution, and the cathode is electrolyzed. It is manufactured by depositing silver on a plate.
この粗銀板は 9 8〜 9 9 %程度の銀と、 その他金、 白金、 パラジウム及ぴビスマ ス、 銅、 鉄、 テルル等の微量不純物を含有している。  This coarse silver plate contains about 98 to 99% of silver and other trace impurities such as gold, platinum, palladium, bismuth, copper, iron, and tellurium.
電解精製においては、 粗銀板から銀が溶解するにともなって、 上記不純物として 含まれるパラジウム、 ビスマス、 銅、 鉄、 テルル等の微量不純物も電解液中に溶け 出し、 電解液中のこれらの不純物濃度が増加する。  In electrolytic refining, as silver is dissolved from the coarse silver plate, trace impurities such as palladium, bismuth, copper, iron, and tellurium contained as the above impurities are also dissolved in the electrolyte, and these impurities in the electrolyte are removed. The concentration increases.
このような重金属の不純物濃度が増加すると、 析出する銀の純度が低下したり、 又は析出した銀と不純物が置換して銀の純度が低下するという問題を生じた。 したがって、 このような重金属による不純物濃度増加を防止するために、 電解尾 液の清浄化処理が必要であった。  When the impurity concentration of such heavy metals increases, there arises a problem that the purity of the precipitated silver is reduced, or the purity of the silver is reduced by replacing the precipitated silver with the impurities. Therefore, in order to prevent such an increase in the impurity concentration due to heavy metals, a cleaning treatment of the electrolytic tail solution was required.
この電解尾液の清浄ィ匕処理は、 液に酸化銀を添加して p Hを上げ、 適当な p Hに 経験的に調製し、 電解尾液中の不純物 (重金属) を水酸ィヒ物として沈殿除去してい た。 し力、し、 このような経験に基づく作業の場合に、 必ずしも適切な p H調製が行 われているとは言えない。 このようなことから、 従来の上記方法では 9 9 . 9 9 %以上の高純度銀を安定し て得ることはできず、 また銀の収率も低くなるという問題があった。 In the cleaning treatment of this electrolytic tail solution, silver oxide is added to the solution to raise the pH, and the pH is adjusted empirically to an appropriate value. As a precipitate. In the case of work based on such experience, it cannot always be said that an appropriate pH adjustment has been performed. For this reason, there has been a problem that high purity silver of 99.9% or more cannot be stably obtained by the above-mentioned conventional method, and that the yield of silver is low.
上記の問題は p H調製が厳密に行われていないことが原因であると考えられ、 特 別に工夫した p H計を用いて酸化銀添加による 2段階の p H調製を行い、 厳重な液 管理を行って高純度銀を製造する方法が提案された (特開 2 0 0 0— 3 8 6 9 2 ) 。 し力、し、 上記の方法は、 コスト高となる電解精製法を用いるということ以外に、 さらに液の清浄ィヒ工程が必要であり、 またさらに純度を上げようとすれば、 p H計 を用いる等の手段により厳密な液管理が必要であるという工程の複雑さの問題があ り、 それだけよりコスト高になるという欠点を有していた。 発明の開示  It is considered that the above problem is due to the pH not being strictly adjusted.Using a specially designed pH meter, two-step pH adjustment was performed by adding silver oxide, and strict liquid management was performed. For producing high-purity silver (Japanese Unexamined Patent Publication No. 2000-38692). In addition to using the costly electrolytic refining method, the above method requires a further cleaning step of the liquid, and if the purity is to be further increased, the pH meter must be used. There was a problem of the complexity of the process that strict liquid management was required depending on the means such as use, and there was a drawback that the cost became higher accordingly. Disclosure of the invention
本発明は、 上記の問題を解決するために、 上記のような電解精製方法を用いずに、 9 9 . 9 9 9。/。以上の高純度銀を簡単な工程でかつ低コストで製造できる方法を提 供することにある。  The present invention provides a method for solving the above-mentioned problems without using the electrolytic purification method described above. /. An object of the present invention is to provide a method capable of producing the high-purity silver in a simple process and at low cost.
本発明は、 2回の酸処理により銀の高純度化が達成できるとの知見を得、 次の方 法を提供する。  The present invention has found that high purity of silver can be achieved by two acid treatments, and provides the following method.
1 . 低品位の銀含有原料から高純度の銀を製造する方法であって、 原料を硝酸で溶 解し、 次に塩酸を添加して塩ィ匕鉱桔晶を得、 さらにこの塩化銀結晶を還元すること を特徴とする高純度銀の製造方法  1. A method for producing high-purity silver from a low-grade silver-containing raw material, in which the raw material is dissolved with nitric acid, and then hydrochloric acid is added to obtain a salt crystal. For producing high-purity silver, characterized by reducing
2 . 塩化銀結晶を水素還元することを特徴とする上記 1記載の高純度銀の製造方 法  2. The method for producing high-purity silver according to 1 above, wherein the silver chloride crystals are reduced with hydrogen.
3 . 2 0 0 ° C以上で還元することを特徴とする上記 1又は 2記載の高純度銀の製 造方法  3. The method for producing high-purity silver as described in 1 or 2 above, wherein the reduction is performed at a temperature of 200 ° C. or more.
4 . 還元後に得られた銀の純度が 9 9 . 9 9 9 %以上であることを特徴とする上記 1〜 3のそれぞれに記載の高純度銀の製造方法  4. The method for producing high-purity silver according to any one of the above 1 to 3, wherein the purity of the silver obtained after the reduction is 99.999% or more.
5 . 銀含有原料の品位が 9 9 . 9 9 %以下であることを特徴とする上記 1〜 4の それぞれに記載の高純度銀の製造方法 図面の簡単な説明 5. The method for producing high-purity silver as described in any one of 1 to 4 above, wherein the quality of the silver-containing raw material is 99.9% or less. BRIEF DESCRIPTION OF THE FIGURES
図 1は、 本発明の高純度銀の精製工程説明図である。 発明の実施の形態  FIG. 1 is an explanatory view of a purification step of high purity silver of the present invention. Embodiment of the Invention
本発明は、 品位が 9 9 . 9 9 %以下である低品位の銀含有原料に 1 . 2当量以上 の硝酸を加えて、 該銀含有原料を硝酸で溶解する。 この場合、 添加する硝酸の量が 1 . 2当量未満では十分な溶解が得られないので、 1 . 2当量以上が必要である。 この際に、 銀及ぴ原料に含有される不純物の殆どが溶解する。  According to the present invention, 1.2 equivalents or more of nitric acid is added to a low-grade silver-containing raw material having a grade of 99.9% or less, and the silver-containing raw material is dissolved with nitric acid. In this case, if the amount of nitric acid to be added is less than 1.2 equivalents, sufficient dissolution cannot be obtained, so that at least 1.2 equivalents is required. At this time, most of the impurities contained in the silver and the raw materials are dissolved.
次に、 1 . 2当量以上の塩酸を添加して塩化銀結晶を得る。 この場合、 銀は選択 的に塩化銀結晶となり、 上記原料中の不純物の塩ィ匕物は水溶液に溶解し、 塩化銀の みが溶解度がなく分離が効率良くできる。  Next, 1.2 equivalents or more of hydrochloric acid is added to obtain silver chloride crystals. In this case, silver is selectively converted into silver chloride crystals, and the chloride of impurities in the raw material is dissolved in the aqueous solution, and only silver chloride has no solubility and can be separated efficiently.
塩酸の添加は 1 . 2当量以上必要である。 これ未満であると塩ィヒ銀の収率が悪く なるので好ましくない。  Addition of hydrochloric acid requires at least 1.2 equivalents. If it is less than this, the yield of silver chloride becomes poor, which is not preferred.
次に、 得られた塩化銀結晶を 2 0 0 ° C以上で水素還元し、 9 9 . 9 9 9 %以上 の純度の高純度銀を得る。 この場合、 2 0 0° C未満では還元効率が低下するので、 2 0 0 ° C以上で水素還元するのが望ましい。  Next, the obtained silver chloride crystal is reduced with hydrogen at 200 ° C. or more to obtain high-purity silver having a purity of 99.999% or more. In this case, if the temperature is lower than 200 ° C., the reduction efficiency is reduced. Therefore, it is desirable to reduce hydrogen at 200 ° C. or higher.
上記硝酸による溶解及び塩化銀結晶を得る工程で分離された不純物は貴金属が 微量存在するが、 その量は極めて少ないので通常は廃棄する。 しかし、 これを濃 縮して回収することもできる。 還元工程により生成する塩酸は上記塩酸による塩 化銀の工程において再使用できる。  The impurities separated in the steps of dissolving with nitric acid and obtaining silver chloride crystals contain trace amounts of noble metals, but they are usually discarded because their amounts are extremely small. However, it can be concentrated and collected. The hydrochloric acid generated by the reduction step can be reused in the above-mentioned step of silver chloride using hydrochloric acid.
上記に示すとおり、 硝酸による原料の溶解工程及び塩酸による塩化銀の生成ェ 程という 2回の酸処理により銀の高純度化を達成することが可能であり、 簡単な 工程で 9 9 . 9 9 9 %以上の純度の高純度銀を得ることができる。 実施例  As shown above, it is possible to achieve high purity of silver by two acid treatments: a process of dissolving the raw material with nitric acid and a process of generating silver chloride with hydrochloric acid. High purity silver with a purity of 9% or more can be obtained. Example
次に、 実施例について説明する。 なお、 本実施例は発明の一例を示すためのもの であり、 本発明はこれらの実施例に制限されるものではない。 すなわち、 本発明の 技術思想に含まれる他の態様及び変形を含むものである。 Next, examples will be described. It should be noted that the present embodiment is merely an example of the present invention, and the present invention is not limited to these embodiments. That is, the present invention It includes other aspects and modifications included in the technical idea.
表 1に示す不純物含有量の低品位 ( 3 Nレベル) の銀含有原料 100 gに 61 % 硝酸 2倍当量 14 OmLを添加し、 温度 60° Cで溶解した。 原料に含有される不 純物は、 パラジウム 2. O p pm、 セレン 1. 3 p pm、 アンチモン 0. 3 p p m、 銅 1. O p pm、 鉄 1. O p pm、 チタン 1· 0 p p m、 白金 0. 1 ρ ρ m、 ロジ ゥム 0. l p pm、 :^¾l. O p pmであった。 硝酸溶解の際には、 これらの不純 物はほぼ全量溶解した。  To 100 g of a low-grade (3 N level) silver-containing raw material having the impurity content shown in Table 1, 2 equivalents of 61% nitric acid (14 OmL) was added and dissolved at a temperature of 60 ° C. The impurities contained in the raw materials are palladium 2.Oppm, selenium 1.3ppm, antimony 0.3ppm, copper 1.Oppm, iron 1.Oppm, titanium 1.0ppm, Platinum 0.1 ρ ρm, Rd. 0.1 lp pm,: ^ ¾l. Op pm. Almost all of these impurities were dissolved during nitric acid dissolution.
次に、 この溶液に 36 %塩酸を 2倍当量 160 mL添加して塩ィ匕銀結晶 130 g を得た。 この時、 前記不純物の塩ィヒ物は殆ど水溶液に溶解するが、 銀の塩化物のみ は殆ど溶解度がなく固体として析出した。  Next, to this solution was added 36% hydrochloric acid (2 times equivalent, 160 mL) to obtain 130 g of salted silver crystals. At this time, the impurity salt was almost dissolved in the aqueous solution, but only silver chloride was hardly soluble and precipitated as a solid.
得られた塩化銀結晶を 400 ° Cで水素還元した。 収率は 97. 8 %であつた。 表 1に示す不純物含有量の高純度銀 (精製後) が得られた。 なお、 水素還元の際、 200° C未満では還元効率が低下するので好ましくないことが分かった。 還元ェ 程により生成する塩酸は上記塩酸による塩ィ匕銀の工程において再利用した。  The obtained silver chloride crystals were hydrogen reduced at 400 ° C. The yield was 97.8%. High purity silver (after purification) with the impurity content shown in Table 1 was obtained. In addition, it was found that if the temperature is lower than 200 ° C. during the hydrogen reduction, the reduction efficiency decreases, which is not preferable. The hydrochloric acid generated by the reduction step was reused in the above-mentioned step of salting silver with hydrochloric acid.
上記硝酸による溶解及び塩化銀結晶を得る工程で分離された不純物中の貴金属 は、 ごく微量のため通常廃棄するが、 これを濃縮して、 例えば塩化アンモ-ゥム 反応により塩化白金酸アンモニゥムにしたり、 グラフアイトに吸着させて回収す ることができる。  The noble metal in the impurities separated in the steps of dissolving with nitric acid and obtaining silver chloride crystals is usually discarded because it is a very small amount.However, it is concentrated and converted to ammonium chloroplatinate by, for example, an ammonium chloride reaction. It can be recovered by adsorption to graphite.
表 1に示す通り、 本実施例により得られた高純度銀中に含有される不純物は、 パラジウム 0. 02 p pm、 セレン 0. 01 p pm、 アンチモン 0. 03 p p mヽ 銅 0. 01 p pm、 鉄 0. 05 p pm、 チタンく 0. 01 p p m、 白金く 0. 0 l p pm、 ロジウムく 0. 01 !11、 硫黄0. 03 p pmとなった。  As shown in Table 1, the impurities contained in the high-purity silver obtained in this example were palladium 0.02 ppm, selenium 0.01 ppm, antimony 0.03 ppm ヽ copper 0.01 ppm , Iron 0.05 ppm, Titanium 0.01 ppm, Platinum 0.0 lp pm, Rhodium 0.01! 11. The sulfur content was 0.03 ppm.
上記のように、 硝酸による原料の溶解工程及び塩酸による塩化銀の生成工程と いう 2回の酸処理により銀の高純度化を達成することが可能であり、 簡単な工程 で 99. 999 %以上の純度の高純度銀を得ることができた。 P d S e S b C u F e T i P t Rh S 原 料 2.0 1.3 0.3 1.0 1.0 1.0 0.1 0.1 1.0 精製後 0.02 0.01 0.03 0.01 0.05 く 0.01 く 0.01 <0.01 <0.03 As described above, it is possible to achieve high purity of silver by two acid treatments: a process of dissolving raw materials with nitric acid and a process of generating silver chloride with hydrochloric acid. Was obtained. P d S e S b C u Fe T i P t Rh S Raw material 2.0 1.3 0.3 1.0 1.0 1.0 0.1 0.1 1.0 After purification 0.02 0.01 0.03 0.01 0.05 <0.01 <0.01 <0.01 <0.03
(p P m) 発明の効果  (p P m) Effect of the invention
本発明は、 電解精製方法を用いずに、 99. 999%以上の高純度銀を 2回の酸 処理工程で精製することができ、 安定かつ低コストで製造できるという優れた効果 を有する。  INDUSTRIAL APPLICABILITY The present invention has an excellent effect that high-purity silver of 99.999% or more can be purified in two acid treatment steps without using an electrolytic refining method, and can be manufactured stably and at low cost.

Claims

請 求 の 範 囲 The scope of the claims
1 . 低品位の銀含有原料から高純度の銀を製造する方法であって、 原料を硝酸で 溶解し、 次に塩酸を添加して塩化鉱結晶を得、 さらにこの塩化銀結晶を還元するこ とを特徴とする高純度銀の製造方法。 1. A method for producing high-purity silver from a low-grade silver-containing raw material, in which the raw material is dissolved with nitric acid, and then hydrochloric acid is added to obtain chloride crystals, and the silver chloride crystals are further reduced. And a method for producing high-purity silver.
2 . 塩化銀結晶を水素還元することを特徴とする請求の範囲第 1項記載の高純 度銀の製造方法。  2. The method for producing high-purity silver according to claim 1, wherein silver chloride crystals are reduced with hydrogen.
3 . 2 0 0 ° C以上で還元することを特徴とする請求の範囲第 1項又は第 2項記 載の高鈍度銀の製造方法。  3. The method for producing high dullness silver according to claim 1 or 2, wherein the reduction is carried out at not less than 3.2 ° C.
4 . 還元後に得られた銀の純度が 9 9 . 9 9 9 %以上であることを特徴とする請 求の範囲第 1項〜第 3項のそれぞれに記載の高純度銀の製造方法。  4. The method for producing high-purity silver according to any one of claims 1 to 3, wherein the purity of the silver obtained after the reduction is 99.999% or more.
5 . 銀含有原料の品位が 9 9 . 9 9 %以下であることを特徴とする請求の範囲 第 1項〜第 4項のそれぞれに記載の高純度銀の製造方法。  5. The method for producing high-purity silver according to any one of claims 1 to 4, wherein the quality of the silver-containing raw material is 99.9% or less.
PCT/JP2001/004296 2000-09-07 2001-05-23 Method for producing silver having high purity WO2002020857A1 (en)

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