WO2001086257A3 - Ellipsometer - Google Patents
Ellipsometer Download PDFInfo
- Publication number
- WO2001086257A3 WO2001086257A3 PCT/DE2001/001807 DE0101807W WO0186257A3 WO 2001086257 A3 WO2001086257 A3 WO 2001086257A3 DE 0101807 W DE0101807 W DE 0101807W WO 0186257 A3 WO0186257 A3 WO 0186257A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sample
- ellipsometer
- measuring spot
- provision
- emission side
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/276,353 US6897955B2 (en) | 2000-05-10 | 2001-05-10 | Ellipsometer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10023477A DE10023477C2 (de) | 2000-05-10 | 2000-05-10 | Ellipsometer |
DE10023477.1 | 2000-05-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001086257A2 WO2001086257A2 (de) | 2001-11-15 |
WO2001086257A3 true WO2001086257A3 (de) | 2002-08-08 |
Family
ID=7641917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2001/001807 WO2001086257A2 (de) | 2000-05-10 | 2001-05-10 | Ellipsometer |
Country Status (3)
Country | Link |
---|---|
US (1) | US6897955B2 (de) |
DE (1) | DE10023477C2 (de) |
WO (1) | WO2001086257A2 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7304737B1 (en) | 1995-09-20 | 2007-12-04 | J.A. Woollam Co., Inc | Rotating or rotatable compensator system providing aberation corrected electromagnetic raadiation to a spot on a sample at multiple angles of a incidence |
US7567345B1 (en) | 2007-01-05 | 2009-07-28 | J.A. Woollam Co., Inc. | Ellipsometer meeting scheimpflug condition with provision of an essentially circular electromagnetic radiation spot on a sample |
US7330277B2 (en) * | 2003-08-20 | 2008-02-12 | Xyratex Technology Limited | Resonant ellipsometer and method for determining ellipsometric parameters of a surface |
JP3977303B2 (ja) * | 2003-08-21 | 2007-09-19 | シャープ株式会社 | 位置検出システム、位置検出システムにおける発信装置および受信装置 |
KR100574776B1 (ko) * | 2004-01-15 | 2006-04-28 | 한국표준과학연구원 | 분광결상을 이용한 타원계측 장치 및 타원계측 방법 |
DE102004012134B4 (de) * | 2004-03-12 | 2006-06-29 | Nanofilm Technologie Gmbh | Ellipsometer mit Blendenanordnung |
US20070024851A1 (en) * | 2005-07-28 | 2007-02-01 | Zaghloul Mervat A | Method and smart device to determine the substrate optical constant and the film thickness of absorbing-film-absorbing-substrate systems in an absorbing medium using a closed-form formula and reflection ellipsometry |
US8345241B1 (en) | 2006-12-19 | 2013-01-01 | J. A. Woollam Co., Inc. | Application of digital light processor in imaging ellipsometer and the like systems |
US8749782B1 (en) | 2006-12-19 | 2014-06-10 | J.A. Woollam Co., Inc. | DLP base small spot investigation system |
NL1036772A1 (nl) * | 2008-04-15 | 2009-10-19 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
US9217717B2 (en) * | 2012-12-17 | 2015-12-22 | Kla-Tencor Corporation | Two dimensional optical detector with multiple shift registers |
US10152998B2 (en) | 2014-04-07 | 2018-12-11 | Seagate Technology Llc | Features maps of articles with polarized light |
KR20180076592A (ko) | 2016-12-28 | 2018-07-06 | 삼성전자주식회사 | 반도체 장치의 계측 방법 |
CN109520621A (zh) * | 2017-09-19 | 2019-03-26 | 睿励科学仪器(上海)有限公司 | 三维空间光源系统及相关的光测量设备 |
FR3079028B1 (fr) * | 2018-03-15 | 2020-05-15 | Horiba France Sas | Ellipsometre ou scatterometre spectroscopique instantane et procede de mesure associe |
US10746530B2 (en) * | 2018-12-07 | 2020-08-18 | Onto Innovation Inc. | Optical metrology device for measuring samples having thin or thick films |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4671660A (en) * | 1984-09-25 | 1987-06-09 | Richard Distl | Dual-beam-real-time polarimeter |
US5166752A (en) * | 1990-01-11 | 1992-11-24 | Rudolph Research Corporation | Simultaneous multiple angle/multiple wavelength ellipsometer and method |
US5793480A (en) * | 1995-09-01 | 1998-08-11 | Phase Metrics, Inc. | Combined interferometer/ellipsometer for measuring small spacings |
US5910841A (en) * | 1991-11-19 | 1999-06-08 | Masao; Katsuya | Ellipsometer using an expanded beam |
US5910842A (en) * | 1995-01-19 | 1999-06-08 | Kla-Tencor Corporation | Focused beam spectroscopic ellipsometry method and system |
JPH11173994A (ja) * | 1997-09-22 | 1999-07-02 | Hdi Instrumentation | 光学的測定システム |
US5955139A (en) * | 1995-05-03 | 1999-09-21 | Sony Corporation | Automatic film deposition control |
US6060237A (en) * | 1985-02-26 | 2000-05-09 | Biostar, Inc. | Devices and methods for optical detection of nucleic acid hybridization |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3880524A (en) * | 1973-06-25 | 1975-04-29 | Ibm | Automatic ellipsometer |
DE19622212C1 (de) * | 1996-06-03 | 1997-12-04 | Fraunhofer Ges Forschung | Ellipsometrisches Meßverfahren |
DE19708036C2 (de) * | 1997-02-27 | 2000-06-29 | Gunther Elender | Ellipsometrisches Mikroskop |
US5859424A (en) * | 1997-04-08 | 1999-01-12 | Kla-Tencor Corporation | Apodizing filter system useful for reducing spot size in optical measurements and other applications |
US6278519B1 (en) * | 1998-01-29 | 2001-08-21 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
US5917594A (en) * | 1998-04-08 | 1999-06-29 | Kla-Tencor Corporation | Spectroscopic measurement system using an off-axis spherical mirror and refractive elements |
DE19842364C1 (de) * | 1998-09-16 | 2000-04-06 | Nanophotonics Ag | Mikropolarimeter und Ellipsometer |
-
2000
- 2000-05-10 DE DE10023477A patent/DE10023477C2/de not_active Expired - Fee Related
-
2001
- 2001-05-10 US US10/276,353 patent/US6897955B2/en not_active Expired - Fee Related
- 2001-05-10 WO PCT/DE2001/001807 patent/WO2001086257A2/de active Application Filing
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4671660A (en) * | 1984-09-25 | 1987-06-09 | Richard Distl | Dual-beam-real-time polarimeter |
US6060237A (en) * | 1985-02-26 | 2000-05-09 | Biostar, Inc. | Devices and methods for optical detection of nucleic acid hybridization |
US5166752A (en) * | 1990-01-11 | 1992-11-24 | Rudolph Research Corporation | Simultaneous multiple angle/multiple wavelength ellipsometer and method |
US5910841A (en) * | 1991-11-19 | 1999-06-08 | Masao; Katsuya | Ellipsometer using an expanded beam |
US5910842A (en) * | 1995-01-19 | 1999-06-08 | Kla-Tencor Corporation | Focused beam spectroscopic ellipsometry method and system |
US5955139A (en) * | 1995-05-03 | 1999-09-21 | Sony Corporation | Automatic film deposition control |
US5793480A (en) * | 1995-09-01 | 1998-08-11 | Phase Metrics, Inc. | Combined interferometer/ellipsometer for measuring small spacings |
JPH11173994A (ja) * | 1997-09-22 | 1999-07-02 | Hdi Instrumentation | 光学的測定システム |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 12 29 October 1999 (1999-10-29) * |
Also Published As
Publication number | Publication date |
---|---|
US6897955B2 (en) | 2005-05-24 |
US20040090626A1 (en) | 2004-05-13 |
DE10023477A1 (de) | 2001-11-29 |
WO2001086257A2 (de) | 2001-11-15 |
DE10023477C2 (de) | 2002-09-19 |
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