WO2000026592A1 - Pfc type gas recovery method and device - Google Patents
Pfc type gas recovery method and device Download PDFInfo
- Publication number
- WO2000026592A1 WO2000026592A1 PCT/JP1999/005937 JP9905937W WO0026592A1 WO 2000026592 A1 WO2000026592 A1 WO 2000026592A1 JP 9905937 W JP9905937 W JP 9905937W WO 0026592 A1 WO0026592 A1 WO 0026592A1
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- Prior art keywords
- pfc
- based gas
- gas
- cooling trap
- concentration
- Prior art date
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- 238000011084 recovery Methods 0.000 title claims abstract description 62
- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000001816 cooling Methods 0.000 claims abstract description 154
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- 238000009834 vaporization Methods 0.000 claims description 13
- 238000009792 diffusion process Methods 0.000 claims description 7
- 238000007710 freezing Methods 0.000 claims description 6
- 230000008014 freezing Effects 0.000 claims description 6
- 238000007865 diluting Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 abstract description 328
- 238000005530 etching Methods 0.000 abstract description 14
- 238000000926 separation method Methods 0.000 abstract description 14
- 238000001704 evaporation Methods 0.000 abstract 1
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- 230000008929 regeneration Effects 0.000 description 28
- 238000011069 regeneration method Methods 0.000 description 28
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
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- FGRBYDKOBBBPOI-UHFFFAOYSA-N 10,10-dioxo-2-[4-(N-phenylanilino)phenyl]thioxanthen-9-one Chemical compound O=C1c2ccccc2S(=O)(=O)c2ccc(cc12)-c1ccc(cc1)N(c1ccccc1)c1ccccc1 FGRBYDKOBBBPOI-UHFFFAOYSA-N 0.000 description 3
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a PFC-based gas recovery method and apparatus for recovering a PFC-based gas used in a semiconductor manufacturing process, for example, an etching process.
- Recycling methods for collecting the PFC-based gas include membrane separation, adsorption separation, and cryogenic separation.
- Membrane separation is a method in which separation is performed by utilizing the difference in permeation speed when a gas molecule membrane permeates.
- a device for recovery and concentration of PFC-based gas is installed, and the recovery and concentration are performed simultaneously.
- the adsorption separation method is a method of separating by utilizing the difference in adsorption performance due to the pressure at which a gas is adsorbed by an adsorbent.
- the cryogenic separation method utilizes the fact that the vaporization curve differs for each gas, that is, utilizes the difference in the boiling points of each gas, and is slightly higher than the boiling point of the PFC-based gas to be recovered.
- This is a method of selectively separating the target PFC-based gas by collecting the PFC-based gas with a low-temperature trap and raising the top-up temperature to a temperature slightly higher than the boiling point of the PFC-based gas to be recovered.
- the membrane separation method has the following problems.
- the cryogenic separation method also has the following problems.
- a multi-stage fractionator cannot be placed in the space in the middle of the vacuum pipe, and is operated under the atmospheric pressure on the output side of the vacuum pump. Therefore, a powerful refrigerator and a large fractionator are required.
- the present invention has been made in view of the above points, and adopts a cryogenic separation method, and can achieve extremely low temperature of a cooling trap with a small-sized refrigeration apparatus without using a multi-stage fractionation apparatus.
- Another object of the present invention is to provide a PFC-based gas recovery method and apparatus capable of recovering high-purity PFC-based gas.
- the invention according to claim 1 is to stop the operation of the cooling trap after a predetermined amount of the mixed gas including the PFC-based gas discharged from the vacuum processing chamber is frozen and collected by the cooling trap. Then, the regenerated mixed gas generated by vaporization of the frozen collector is passed through a non-PFC-based gas removing device to remove gases other than PFC-based gas from the regenerated mixed gas to obtain a high-concentration PFC-based gas.
- a PFC-based gas recovery method characterized by recovering a concentration PFC-based gas.
- the cooling temperature of the cooling trap can be adjusted to the target PFC-based gas.
- 100% coagulation can be achieved by setting the temperature at or below the trapping temperature.
- the membrane separation method the PFC-based gas to be concentrated in the concentration process escapes, and the PFC-based gas cannot be recovered with high efficiency.
- the invention according to claim 2 is a PFC-based gas recovery apparatus for recovering a PFC-based gas from a mixed gas containing a PFC-based gas discharged from a vacuum processing chamber, wherein the exhaust system of the vacuum processing chamber is provided with a PFC-based gas recovery apparatus.
- a cooling trap that is connected and freeze-collects the mixed gas discharged from the vacuum processing chamber; and a regeneration mixed gas other than the PFC system from the regenerated mixed gas that is generated by vaporization of the frozen trap after stopping operation of the cooling trap.
- a non-PFC gas removing device for removing gas is provided, and a collecting means for collecting high-concentration PFC gas obtained by removing non-PFC gas with the non-PFC gas removing device is provided. .
- the cooling trap By connecting the cooling trap to the exhaust system of the vacuum processing chamber as described above, that is, by arranging the cooling trap on the vacuum side, the capacity of the refrigerator can be reduced, and it is easy to reduce the size and the cryogenic temperature of the refrigerator. Becomes In addition, after the operation of the cooling trap is stopped, the mixed gas generated by the vaporization of the frozen trap is converted to a gas other than the PFC-based gas (SiF 4 , C ⁇ 2 , HF, F 2, etc .; These are called non-PFC-based gases), and high-concentration PFC-based gases can be obtained.
- the PFC-based gas SiF 4 , C ⁇ 2 , HF, F 2, etc .
- the invention according to claim 3 is configured such that in the PFC-based gas recovery device according to claim 2, the high-concentration PFC-based gas discharged from the non-PFC-based gas removal device is supplied to the recovery means. And a first circulating system for returning a part of the high-concentration PFC-based gas to the cooling trap is provided, and a part of the high-concentration PFC-based gas is supplied to the cooling trap through the first circulating system. .
- the high-concentration PFC system gas discharged from the non-PFC system gas removal device is sent to the cooling trap through the first circulation system at the same time as being supplied to the recovery means.
- the high-concentration PFC-based gas allows the regenerated mixed gas in the cooling trap to be quickly sent to the non-PFC-based gas removal device.
- the invention according to claim 4 provides the PFC-based gas recovery device according to claim 3, wherein a part of the high-concentration PFC-based gas discharged from the non-PFC-based gas removal device is converted into a non-PFC-based gas.
- a second circulation system for returning to the suction side of the gas removal device is provided, and high-concentration PFC-based gas is always sent to the non-PFC-based gas removal device through the second circulation system.
- the binding operation can be prevented by providing the second circulation system and constantly sending high-concentration PFC-based gas to the non-PFC-based gas removal device through the second circulation system.
- a vacuum pump is provided on a suction side of the non-PFC gas removal device.
- the cooling trap can be regenerated under reduced pressure.
- the regeneration temperature of the cooling trap can be lowered, preventing problems such as the incorporation of water vapor into the regeneration gas, and reducing the energy required to return the cooling trap to the cooling trap temperature after regeneration is completed. be able to.
- the invention according to claim 6 is the apparatus according to claim 5, wherein a part of the high-concentration PFC-based gas discharged from the non-PFC-based gas removing device is used to prevent and dilute oil diffusion of a vacuum pump. It is characterized by providing a circulating system for supplying gas for use. Further, the invention according to claim 7 is configured such that in the device according to claim 5 or 6, the high-concentration PFC-based gas discharged from the non-PFC-based gas removing device is supplied to the recovery means. Both are characterized in that a first circulation system for returning a part of the gas to the cooling trap is provided, and a part of the high-concentration PFC system gas is supplied to the cooling trap through the first circulation system.
- the invention according to claim 8 provides the PFC-based gas recovery device according to any one of claims 2 to 7, wherein two cooling traps are provided, and the PFC discharged from the vacuum processing chamber by one of the cooling traps. While freezing and collecting the mixed gas containing the system gas, the operation of the other cooling trap was stopped, and the PFC-based gas was recovered from the regenerated mixed gas generated by the vaporization of the frozen sample. It is characterized by the following.
- two cooling traps are provided, and while one of the cooling traps on the cooling side freeze-collects the mixed gas containing PFC-based gas discharged from the vacuum processing chamber, By stopping the cooling operation and recovering the PFC-based gas from the regenerated mixed gas generated by the vaporization of the frozen trap, the trapping capacity of the cooling trap on one cooling side is reduced, When regenerating the vacuum, the mixed gas discharged from the vacuum processing chamber is frozen and collected using another cooling trap as the cooling side, so the processing is continued without interrupting the processing in the vacuum processing chamber. be able to.
- FIG. 1 is a diagram showing vaporization curves of various gases.
- FIG. 2 is a diagram illustrating a configuration example of a PFC-based gas recovery device according to one embodiment of the present invention.
- FIG. 3 is a diagram showing the measurement results and the trap efficiency of the exhaust gas amount at points A, B, and C of the PFC-based gas recovery device in FIG.
- FIG. 4 is a diagram showing the results of measuring the gas flow rates at points D and E of the PFC-based gas recovery device in FIG.
- FIG. 5 is a diagram showing a configuration example of a PFC-based gas recovery device according to another embodiment of the present invention.
- FIG. 6 is a diagram showing a configuration example of a PFC-based gas recovery device according to another embodiment of the present invention. You.
- FIG. 7 is a diagram showing a configuration example of a PFC-based gas recovery device according to another embodiment of the present invention.
- FIG. 8 is a diagram showing a configuration example of a PFC-based gas recovery device according to another embodiment of the present invention.
- FIG. 9 is a diagram showing a configuration example of a PFC-based gas recovery device according to another embodiment of the present invention.
- FIG. 10 is a diagram showing a configuration example of a non-PFC-based gas removal device that can be used in the present invention.
- FIG. 2 is a diagram illustrating a configuration example of a PFC-based gas recovery device according to one embodiment of the present invention.
- reference numeral 1 denotes an etching chamber 1
- an exhaust system in which a dry pump 2 and a harmful gas removing device 3 are connected by a pipe 4 is provided in the etching chamber 1.
- Two cooling traps 5 and cooling traps 6 are connected in parallel between the etching chamber 1 and the dry pump 2 via on-off valves 7, 8 and on-off valves 9, 10 to connect the cooling traps 15 and 15.
- the cooling trap 6 is connected by an on-off valve 11.
- 1 2 is a pressure sensor that detects the pressure at the outlet of the etching chamber 1
- 13 is a pressure sensor that detects the internal pressure of the cooling trap 5
- 14 is a pressure sensor that detects the internal pressure of the cooling trap 6
- Reference numeral 5 denotes a halogen detector provided on the pipe 4 on the suction port side of the dry pump 2
- 16 denotes a pressure sensor
- 17 denotes a halogen detector provided on the pipe 4 on the discharge port side of the dry pump 2.
- Reference numeral 18 denotes an on-off valve
- 19 denotes a non-FCC-based gas removal device
- 20 denotes an on-off valve
- 21 denotes a pressure sensor.
- one of the two cooling traps 5 and 6 is used as the cooling side, and the cooling operation is performed to freeze the mixed gas containing the PFC gas discharged from the etching chamber 11.
- the other cooling trap stops operating as a regeneration side, and the frozen trap of the mixed gas collected by the cooling trap is vaporized to generate a gas other than the PFC-based gas from the regenerated mixed gas generated.
- Non-PFC-based gas Non-PFC-based gas
- recover PFC-based gas is performed with the cooling trap 5 as the cooling side to perform freezing and collection of the mixed gas, and the operation is stopped with the cooling trap 6 as the regeneration side. The case where PFC-based gas is recovered by using the method will be described.
- the cooling trap 5 on the cooling side is cooled in advance and is maintained at a predetermined low temperature, and the on-off valves 7 and 8 are opened, and the on-off valves 9, 10 and 11 are closed.
- the refrigerator (not shown) of the cooling trap 6 on the regeneration side is stopped, and the temperature of the cooling trap 6 is increased.
- the on-off valve 18 is connected to the cooling trap 6 on the regeneration side whose operation is stopped.
- the on-off valve 18 ′ connected to the cooling trap 5 during the cooling operation is closed.
- the mixed gas containing the PFC-based gas discharged from the etching chamber 11 passes through the on-off valve 7 and reaches the cooling trap 5 on the cooling side, where it is collected and frozen.
- the exhaust gas that has passed through the cooling trap 5 passes through the dry pump 2 and is sent to the harmful gas removal device 3 where it is discharged.
- the exhaust gas By passing the exhaust gas through the dry pump 2, the exhaust gas is diluted by introducing nitrogen (N 2 ) gas for the purpose of preventing the diffusion of the lubricating oil of the dry pump 2 and diluting the reactive gas.
- nitrogen (N 2 ) gas for the purpose of preventing the diffusion of the lubricating oil of the dry pump 2 and diluting the reactive gas.
- dangerous reactive gas is removed by the harmful gas removing device 3.
- the limits of trapping the mixed gas in the cooling trap 5 are the halogen detectors 15 and 17, the output of the temperature sensor (not shown), the pressure sensor 12 and the pressure sensor 16 attached to the cooling trap 5.
- the cooling trap limit is such that when the PFC gas cannot be collected, the output of the halogen detector 15 or 17 changes, the temperature of the cooling trap 5 rises, the pressure on the inlet and outlet sides of the cooling trap 5 increases, Judge based on the pressure difference.
- the temperature of the cooling trap 6 starts to rise.
- the opening / closing valve 18 as a boundary, the pressure is different between the cooling trap 6 side and the non-PFC gas removing device 19 side, and the cooling trap 6 side has a negative pressure.
- Non-PFC gas remover 19 The pressure on the cooling trap 6 side must be increased to prevent backflow of gas from the 19 side. So first raise the temperature of the cooling trap 6 You. As the temperature of the cooling trap 6 rises, the frozen trapping body of the mixed gas collected in the cooling trap 6 evaporates, and the pressure on the cooling trap 6 side gradually increases.
- the on-off valve 18 is opened.
- the pressure condition is determined by the pressure sensor 14 and the pressure sensor 21.
- the cooling means such as the refrigerator are completely stopped, the power without temperature control, and the cooling means such as the heater attached to the cooling trap 6 and the refrigerator, etc. Either method can be used while performing temperature control such as keeping the temperature at an appropriate temperature.
- the regenerated mixed gas containing the PFC-based gas generated by the vaporization of the frozen trap of the mixed gas in the cooling trap 6 enters the non-PFC-based gas remover 19, where gases other than the PFC-based gas are removed, and high-purity PFC is removed. It is discharged as system gas.
- the state of regeneration of the mixed gas by the vaporization of the frozen collector is monitored from the outputs of the pressure sensors 14 and 21 and the output of the temperature sensor (not shown) of the cooling trap 6.
- the cooling trap 6 is prepared for cooling.
- this cooling there are two methods, that is, cooling after lowering the pressure in the cooling trap 6, and cooling immediately without lowering the pressure, and both methods can be performed.
- the on-off valve 11 is used, but in the latter case, the on-off valve 11 is not used.
- the on-off valve 11 is used.
- the on-off valve 11 When the on-off valve 11 is opened to reduce the pressure of the cooling trap 6 to a negative pressure, the gas of the cooling trap 6 flows through the on-off valve 11 to the cooling trap 5, where it is re-frozen and collected. Is done.
- the on-off valve 11 simply opens and closes, the case where a fixed or variable orifice is provided before and after the on-off valve 11 according to the system, the trap temperature and pressure sensor 13 on the cooling trap 5 side, a halogen detector In some cases, an orifice with variable opening and an on / off valve with variable opening linked to 15 and 17 are provided.
- an on-off valve 11 that simply opens and closes is used. The timing of closing the on-off valve 11 is determined by checking the internal pressure of the cooling trap 6 with the pressure sensor 14.
- the on-off valve 18 ′ is opened in the same procedure as that described above for the on-off valve 18,
- the cooling trap 5 is connected to the non-PFC gas removing device 19.
- the amount of gas exhausted at points A and B in Fig. 2 was investigated to determine the amount of gas discharged from the etching chamber 11 and frozen and collected by the cooling trap 5 on the cooling side. Measure the amount.
- Figure 3 shows the measurement results.
- the difference between the gas flow rates (sc cm) at points A and B is the amount of gas collected by the cooling trap 5, and the ratio of the gas collected by freezing to the gas entering the cooling trap 5 Efficiency (%;) ".
- CF 4 is the PFC gas is frozen and collected in 95% and high trapping efficiency
- the steam pressure temperature is CF 4 Yoridakai in gases other than the PFC C0 2
- S i F 4 is frozen and collected with high trap efficiency of 85%, 90% and 98%, respectively.
- C ⁇ , F 2 and O 2 whose vapor pressure temperature is lower than CF 4 have low trapping efficiencies of 4%, 10% and 3%, respectively.
- the type of gas discharged from the cooling trap 6 on the regeneration side can be determined by measuring at point D in FIG. Fig. 4 shows the results.
- PFC-based gas CF 4 PFC other than based gas CO, C0 2, S i F_5 , F 2, HF, ⁇ 2 is discharged.
- other gases were 0. Therefore, it can be seen that about 100% of the CF 4 frozen and collected in the cooling trap 6 could be recovered.
- FIG. 5 is a diagram showing a configuration example of a PFC-based gas recovery device according to claim 3.
- the compressor 22 is disposed after the non-PFC gas removal device 19, and the first circulation system 23 connecting the discharge side of the compressor 22 and the cooling trap 6 via the on-off valve 24 is provided. ing.
- the compressor 22 is provided, and when the on-off valve 20 is opened, the high-concentration PFC-based gas exiting the non-PFC-based gas removal device 19 is pumped to the recovery side (refining side) during recovery.
- the first circulation system 23 opens the on-off valve 24 at the time of regeneration, and sends high-concentration PFC-based gas to the cooling trap 6 on the regeneration side.
- the regeneration gas in the cooling trap 6 can be promptly transferred to the non-PFC-based gas removing device 19.
- the compressor 22 is disposed after the non-PFC-based gas removing device 19, which reduces the pressure of the gas when returning the high-concentration PFC-based gas to the cooling trap 6.
- the pressure is set higher than the pressure inside the cooling trap, and it is arranged to smooth the supply of return gas.
- the cooling trap 6 may be provided by any suitable pressure adjusting means known to those skilled in the art in the return pipe 23. The flow of the gas returned to the can be made smooth. This is the same in still another embodiment of the present invention described below.
- the cooling trap 5 on the cooling operation side similarly to the device shown in FIG. 2, the cooling trap 5 on the cooling operation side also has an on-off valve.
- a regeneration line composed of a non-PFC gas removal device 19 is connected to the cooling trap 6 in the same way as the cooling trap 6, and the cooling operation of the cooling trap 5 is stopped to regenerate the collected gas.
- these on-off valves are operated to connect the cooling trap 5 to the regeneration line composed of the non-PFC-based gas removal device 19, etc.
- operations such as removal and concentration / recovery of PFC-based gas are performed, the connection between the cooling trap 5 and the regeneration line is omitted in FIGS. 5 to 9 for convenience.
- FIG. 6 is a diagram showing a configuration example of a PFC-based gas recovery device according to another embodiment of the present invention described in claim 4.
- a second circulation system 26 is provided that connects the discharge side of the compressor 22 and the suction side of the non-PFC gas removal device 19 via a constant flow valve 25.
- the second circulation system is provided for always circulating gas to prevent the binding operation of the compressor 22 because the binding operation is not preferable. This Thereby, the cooling trap 6 can be quickly evacuated.
- FIG. 7 is a diagram showing a configuration example of a PFC-based gas recovery device according to another embodiment of the present invention described in claim 5.
- a vacuum pump 27 is installed on the suction side of the non-PFC-based gas removal device 19.
- a dry pump is preferably used. If the vacuum pump is arranged on the suction side of the non-PFC gas removal device in this way, the pressure on the non-PFC gas removal device side can be reduced, and the regeneration operation of the cooling trap 6 is performed under reduced pressure The regeneration temperature of the cooling trap 6 can be kept low. For this reason, for example, when the temperature is raised to about room temperature during regeneration of the cooling trap, it is possible to avoid a problem that water vapor is mixed in the regeneration gas.
- the vacuum pump 27 can also be used for quickly reducing the pressure of the cooling trap 6 to perform the cooling operation after the regeneration of the cooling trap 6 is completed.
- FIG. 8 is a diagram showing a configuration example of a PFC-based gas recovery device according to another embodiment of the present invention described in claim 6.
- a part of the high-concentration PFC-based gas discharged from the non-PFC-based gas removal unit 19 of the PFC-based gas recovery unit shown in Fig. 7 is used as a dry pump Supply 2 7
- a compressor 22 is provided after the non-PFC gas removal device 19, and high-concentration PFC gas discharged from the compressor 22 is dried through the circulation system 26 and the constant flow valve 25.
- Pump 27 Prevents oil diffusion ⁇ Supplied as dilution gas.
- the compressor 22 is not always indispensable, and that other pressure adjusting means can be used instead of arranging a compressor, as described above.
- the regenerated PFC-based gas can be supplied to the non-PFC-based gas removal device without dilution. Can be sent.
- this configuration is not necessary if the dry pump used does not require oil diffusion prevention and dilution gas.
- the use of the recovered PFC-based gas does not cause a problem with, for example, nitrogen contamination, circulate some of the high-concentration PFC-based gas. Instead, use N 2 gas from outside to prevent oil diffusion.
- a part of the high-concentration PFC-based gas discharged from the non-PFC-based gas removal device is circulated to the cooling trap 6.
- It can be configured to be.
- Fig. 9 shows a second circulation system that supplies a part of the high-concentration PFC-based gas discharged from the non-PFC-based gas removal device to the dry pump, and circulates it through the cooling trap 6.
- 1 shows a PFC-based gas recovery system equipped with a circulation system.
- the refrigerating device used for the cooling traps 5 and 6 needs to be able to cool to a temperature at which all the PFC gas to be recovered condenses.
- CF 4 has the lowest temperature vapor pressure line on the vapor pressure diagram. Condensable temperature at 0. l the To rr order by itself gas CF 4 is - 2 0 (although about TC, when the gas such as C0 2 and A r are mixed - the temperature of about 230 ° C It is desirable to use a cooling device that can be realized.
- the above low-temperature method can be easily achieved by using a small low-temperature refrigerator that drives a GM cycle, a solve cycle, a stirring cycle, a JT valve cycle, etc. Use.
- liquid nitrogen is to collect all types of PFC-based gas, since the boiling point of liquid nitrogen is 196 ° C, which is lower than the above—200 ° C or 230 ° C. Can not do it. Also, since liquid nitrogen must be supplied at all times, large-scale production equipment requires large equipment, which is not always a simple method, at the laboratory level.
- the above-mentioned method of using a small low-temperature refrigerator such as the GM cycle, the Solvay cycle, the Stirling cycle, and the JT valve cycle uses a helium as a refrigerant, and a cryogenic refrigerator with a small, powerful compressor and a low-temperature refrigerator. Machine.
- a single-stage GM cycle refrigerator was used.
- the purpose of the non-PFC-based gas removing device 19 is to remove the non-PFC-based gas from the gas regenerated in the cooling trap 6 on the regeneration side to obtain a high-concentration PFC-based gas.
- the non-PFC-based gas to be removed depends on the requirements of the recovered gas application, and A person skilled in the art can easily understand how to configure the non-PFC-based gas removing device 19 accordingly. Here, the case of removing the following three categories of gas will be described.
- Acid gas Si F 4 , F 2 , HF, C ⁇ 2 etc.
- FIG. 8 is a diagram showing a configuration example of the non-PFC-based gas removing device 19.
- the non-PFC gas removing device 19 includes a first cylinder 19-11 and a second cylinder 19-2, as shown in FIG.
- the first cylinder 191-1 and the second cylinder 19-12 are connected via an on-off valve 19-13, and the on-off valve 19-14 is connected to the discharge port of the second cylinder 19-12.
- First cylindrical 1 9 one; metal oxidant to I alkali agent 1 9 one 1 a to neutralize the acid gases, H 2 0 adsorption to moisture absorbent 19 one 1 b, CO to C0 2 1 9- 1 c, C_ ⁇ 2 alkaline agent 19 one 1 d to neutralize is filled. Also, the second cylinder 19-2 has O
- the oxygen scavenger that removes 2 is filled with 191-2a.
- the gas regenerated and exhausted in the cooling trap 6 on the regeneration side is CF 4 , ⁇ 2 , Si F 4 ,
- the configuration of the non-PFC-based gas removal device depends on the requirements for which non-PFC-based gas should be removed in the recovery gas application.
- the 0 2 contamination is not an issue (i.e., not a no problem even if the PFC system gas recovered 0 2 is not contaminated) applications, the The oxygen scavenger 1 9-1 2a is not required.
- the harmful gas removing device 3 used for removing reactive dangerous gas from the gas discharged from the cooling trap 5 during the cooling operation includes the non-reactive gas described above.
- the same configuration as that of the PFC-based gas removing device 19 can be adopted.
- a mixed gas that has become a frozen trap in a cooling trap is regenerated with high trap efficiency, and non-PFC-based gas removal equipment removes non-PFC-based gas from the regenerated mixed gas to obtain a high-concentration PFC. It is possible to provide a PFC-based gas recovery method that can recover highly concentrated PFC-based gas with high efficiency after obtaining the system gas.
- a cooling trap which is connected to an exhaust system of a vacuum processing chamber and freeze-collects a mixed gas discharged from the vacuum processing chamber.
- a non-PFC-based gas remover for removing non-PFC-based gas from the regenerated mixed gas generated by vaporization of the aggregate was provided, and the non-PFC-based gas remover was used to remove non-PFC-based gas. Since high-concentration PFC-based gas is recovered, a PFC-based gas recovery device that can recover high-concentration PFC-based gas with high efficiency can be provided.
- two cooling traps are provided, and while one of the cooling traps freeze-traps a mixed gas containing a PFC-based gas discharged from the vacuum processing chamber, Since the operation of the other cooling trap is stopped and the PFC-based gas is recovered from the mixed gas generated by the vaporization of the frozen collection body, the PFC system gas can be recovered without interrupting the processing in the vacuum processing chamber. It is possible to provide a PFC-based gas recovery device that can recover system gas.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Treating Waste Gases (AREA)
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Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000579935A JP4139565B2 (ja) | 1998-10-29 | 1999-10-27 | Pfc系ガス回収方法及び装置 |
US09/582,659 US6374635B1 (en) | 1998-10-29 | 1999-10-27 | PFC gas recovery process and apparatus |
EP99951093A EP1052466A4 (en) | 1998-10-29 | 1999-10-27 | METHOD AND DEVICE FOR RECOVERING PFC GAS |
KR1020007007206A KR100616583B1 (ko) | 1998-10-29 | 1999-10-27 | Pfc계 가스회수방법 및 장치 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10/309195 | 1998-10-29 | ||
JP30919598 | 1998-10-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000026592A1 true WO2000026592A1 (en) | 2000-05-11 |
Family
ID=17990080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1999/005937 WO2000026592A1 (en) | 1998-10-29 | 1999-10-27 | Pfc type gas recovery method and device |
Country Status (6)
Country | Link |
---|---|
US (1) | US6374635B1 (ja) |
EP (1) | EP1052466A4 (ja) |
JP (1) | JP4139565B2 (ja) |
KR (1) | KR100616583B1 (ja) |
TW (1) | TW439101B (ja) |
WO (1) | WO2000026592A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7588916B2 (en) | 2001-01-03 | 2009-09-15 | Senomyx, Inc. | T1R taste receptors and genes encoding same |
JP2010042990A (ja) * | 2001-11-26 | 2010-02-25 | Fluorine On Call Ltd | 製造設備内の分子フッ素の生成、分配、および使用 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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US20090001524A1 (en) * | 2001-11-26 | 2009-01-01 | Siegele Stephen H | Generation and distribution of a fluorine gas |
US20040037768A1 (en) * | 2001-11-26 | 2004-02-26 | Robert Jackson | Method and system for on-site generation and distribution of a process gas |
US7628034B2 (en) * | 2005-05-13 | 2009-12-08 | Anesthetic Gas Reclamation, Llc | Method of low flow anesthetic gas scavenging and dynamic collection apparatus therefor |
US7644594B2 (en) * | 2005-05-13 | 2010-01-12 | Anesthetic Gas Reclamation, L.L.C. | Method and apparatus for self-contained anesthetic gas reclamation |
US7596965B2 (en) * | 2005-05-13 | 2009-10-06 | Anesthetic Gas Reclamation, Llc | Anesthetic gas reclamation system and method |
CN102197859B (zh) * | 2010-03-24 | 2013-01-23 | 陈万仁 | 具有多级能量回收利用功能的冻干设备 |
US10413642B2 (en) | 2015-04-28 | 2019-09-17 | James Michael Berry | System for dynamic control of medical vacuum |
CN110548364A (zh) * | 2019-10-17 | 2019-12-10 | 清远先导材料有限公司 | 一种回收分子筛吸附的特种气体的方法和装置 |
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JPH05311403A (ja) * | 1992-05-11 | 1993-11-22 | Shin Meiwa Ind Co Ltd | 成膜装置のガス再生装置 |
JPH10252651A (ja) * | 1997-03-11 | 1998-09-22 | Ebara Corp | 真空排気システム |
JPH10266959A (ja) * | 1997-03-24 | 1998-10-06 | Ebara Corp | 真空排気システム |
JPH10266962A (ja) * | 1997-03-24 | 1998-10-06 | Ebara Corp | 真空排気システム |
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DE3518283C2 (de) * | 1985-05-22 | 1994-09-22 | Messer Griesheim Gmbh | Verfahren zur Entfernung leichter flüchtiger Verunreinigungen aus Gasen |
US5533338A (en) * | 1995-03-21 | 1996-07-09 | The Boc Group, Inc. | Cryogenic vapor recovery process and system |
US5858065A (en) * | 1995-07-17 | 1999-01-12 | American Air Liquide | Process and system for separation and recovery of perfluorocompound gases |
US5799509A (en) * | 1997-08-22 | 1998-09-01 | The Boc Group, Inc. | Multi-component recovery apparatus and method |
JP3643474B2 (ja) * | 1998-01-30 | 2005-04-27 | 株式会社東芝 | 半導体処理システム及び半導体処理システムの使用方法 |
-
1999
- 1999-10-27 EP EP99951093A patent/EP1052466A4/en not_active Withdrawn
- 1999-10-27 US US09/582,659 patent/US6374635B1/en not_active Expired - Fee Related
- 1999-10-27 WO PCT/JP1999/005937 patent/WO2000026592A1/ja active IP Right Grant
- 1999-10-27 KR KR1020007007206A patent/KR100616583B1/ko not_active IP Right Cessation
- 1999-10-27 JP JP2000579935A patent/JP4139565B2/ja not_active Expired - Fee Related
- 1999-10-28 TW TW088118660A patent/TW439101B/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH05311403A (ja) * | 1992-05-11 | 1993-11-22 | Shin Meiwa Ind Co Ltd | 成膜装置のガス再生装置 |
JPH10252651A (ja) * | 1997-03-11 | 1998-09-22 | Ebara Corp | 真空排気システム |
JPH10266959A (ja) * | 1997-03-24 | 1998-10-06 | Ebara Corp | 真空排気システム |
JPH10266962A (ja) * | 1997-03-24 | 1998-10-06 | Ebara Corp | 真空排気システム |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7588916B2 (en) | 2001-01-03 | 2009-09-15 | Senomyx, Inc. | T1R taste receptors and genes encoding same |
JP2010042990A (ja) * | 2001-11-26 | 2010-02-25 | Fluorine On Call Ltd | 製造設備内の分子フッ素の生成、分配、および使用 |
Also Published As
Publication number | Publication date |
---|---|
EP1052466A1 (en) | 2000-11-15 |
KR20010033683A (ko) | 2001-04-25 |
EP1052466A4 (en) | 2002-09-18 |
TW439101B (en) | 2001-06-07 |
US6374635B1 (en) | 2002-04-23 |
JP4139565B2 (ja) | 2008-08-27 |
KR100616583B1 (ko) | 2006-08-28 |
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