WO1999053518A1 - Detecting registration marks with a low energy electron beam - Google Patents
Detecting registration marks with a low energy electron beam Download PDFInfo
- Publication number
- WO1999053518A1 WO1999053518A1 PCT/US1999/007586 US9907586W WO9953518A1 WO 1999053518 A1 WO1999053518 A1 WO 1999053518A1 US 9907586 W US9907586 W US 9907586W WO 9953518 A1 WO9953518 A1 WO 9953518A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- mark
- registration mark
- electron beam
- electrical charge
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30433—System calibration
- H01J2237/30438—Registration
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
- Y10S438/949—Energy beam treating radiation resist on semiconductor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/975—Substrate or mask aligning feature
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55177899A JP2002505809A (en) | 1998-04-14 | 1999-04-05 | Detection of register mark by low energy electron beam |
CA002292645A CA2292645A1 (en) | 1998-04-14 | 1999-04-05 | Detecting registration marks with a low energy electron beam |
IL13332199A IL133321A0 (en) | 1998-04-14 | 1999-04-05 | Detecting registration marks with a low energy electron beam |
AU34759/99A AU3475999A (en) | 1998-04-14 | 1999-04-05 | Detecting registration marks with a low energy electron beam |
EP99916441A EP0990252A1 (en) | 1998-04-14 | 1999-04-05 | Detecting registration marks with a low energy electron beam |
KR1019997011514A KR20010013507A (en) | 1998-04-14 | 1999-04-05 | Detecting registration marks with a low energy electron beam |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/060,496 US6008060A (en) | 1998-04-14 | 1998-04-14 | Detecting registration marks with a low energy electron beam |
US09/060,496 | 1998-04-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1999053518A1 true WO1999053518A1 (en) | 1999-10-21 |
Family
ID=22029863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1999/007586 WO1999053518A1 (en) | 1998-04-14 | 1999-04-05 | Detecting registration marks with a low energy electron beam |
Country Status (8)
Country | Link |
---|---|
US (2) | US6008060A (en) |
EP (1) | EP0990252A1 (en) |
JP (1) | JP2002505809A (en) |
KR (1) | KR20010013507A (en) |
AU (1) | AU3475999A (en) |
CA (1) | CA2292645A1 (en) |
IL (1) | IL133321A0 (en) |
WO (1) | WO1999053518A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000079566A1 (en) * | 1999-06-22 | 2000-12-28 | Etec Systems, Inc. | Alignment of low-energy electron beams using magnetic fields |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6215129B1 (en) * | 1997-12-01 | 2001-04-10 | Vsli Technology, Inc. | Via alignment, etch completion, and critical dimension measurement method and structure |
US6495442B1 (en) * | 2000-10-18 | 2002-12-17 | Magic Corporation | Post passivation interconnection schemes on top of the IC chips |
DE19904571C1 (en) * | 1999-02-04 | 2000-04-20 | Siemens Ag | Three-dimensional IC, e.g. a DRAM cell array, is produced by electron beam passage through a substrate to locate an alignment structure in a bonded second substrate for mask alignment |
US7364276B2 (en) * | 2005-09-16 | 2008-04-29 | Eastman Kodak Company | Continuous ink jet apparatus with integrated drop action devices and control circuitry |
JP5744601B2 (en) * | 2010-04-20 | 2015-07-08 | キヤノン株式会社 | Electron beam drawing apparatus and device manufacturing method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0342316A2 (en) * | 1988-05-20 | 1989-11-23 | International Business Machines Corporation | Method of electron beam lithography alignment |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4109029A (en) * | 1977-01-24 | 1978-08-22 | Hughes Aircraft Company | High resolution electron beam microfabrication process for fabricating small geometry semiconductor devices |
US4321747A (en) * | 1978-05-30 | 1982-03-30 | Tokyo Shibaura Denki Kabushiki Kaisha | Method of manufacturing a solid-state image sensing device |
US4356223A (en) * | 1980-02-28 | 1982-10-26 | Nippon Electric Co., Ltd. | Semiconductor device having a registration mark for use in an exposure technique for micro-fine working |
JPS5968928A (en) * | 1982-10-13 | 1984-04-19 | Pioneer Electronic Corp | Manufacture of semiconductor device |
US4632724A (en) * | 1985-08-19 | 1986-12-30 | International Business Machines Corporation | Visibility enhancement of first order alignment marks |
JPH01220442A (en) * | 1988-02-29 | 1989-09-04 | Fujitsu Ltd | Method and apparatus for photoelectric transfer and exposure |
US4923301A (en) * | 1988-05-26 | 1990-05-08 | American Telephone And Telegraph Company | Alignment of lithographic system |
US5020006A (en) * | 1989-05-03 | 1991-05-28 | Hewlett-Packard Company | Method for finding a reference point |
US4992394A (en) * | 1989-07-31 | 1991-02-12 | At&T Bell Laboratories | Self aligned registration marks for integrated circuit fabrication |
JPH03194916A (en) * | 1989-12-22 | 1991-08-26 | Nippon Seiko Kk | Method and apparatus for detecting alignment mark position |
JPH0831583B2 (en) * | 1990-09-25 | 1996-03-27 | 凸版印刷株式会社 | Method for forming color layers of multiple colors for solid-state imaging device |
JPH0590145A (en) * | 1991-09-25 | 1993-04-09 | Nippon Seiko Kk | Alignment equipment of multi charged beam aligner |
JP2565121B2 (en) * | 1993-12-14 | 1996-12-18 | 日本電気株式会社 | Direct electron beam drawing method |
US5552611A (en) * | 1995-06-06 | 1996-09-03 | International Business Machines | Pseudo-random registration masks for projection lithography tool |
JPH10284364A (en) * | 1997-04-01 | 1998-10-23 | Mitsubishi Electric Corp | Alignment mark for electron beam exposure, electron beam exposing method and electron beam exposing equipment |
US5933743A (en) * | 1997-07-03 | 1999-08-03 | Micron Technology, Inc. | Method of improving alignment signal strength by reducing refraction index at interface of materials in semiconductors |
-
1998
- 1998-04-14 US US09/060,496 patent/US6008060A/en not_active Expired - Lifetime
-
1999
- 1999-04-05 IL IL13332199A patent/IL133321A0/en unknown
- 1999-04-05 WO PCT/US1999/007586 patent/WO1999053518A1/en not_active Application Discontinuation
- 1999-04-05 KR KR1019997011514A patent/KR20010013507A/en not_active Application Discontinuation
- 1999-04-05 AU AU34759/99A patent/AU3475999A/en not_active Abandoned
- 1999-04-05 CA CA002292645A patent/CA2292645A1/en not_active Abandoned
- 1999-04-05 EP EP99916441A patent/EP0990252A1/en not_active Withdrawn
- 1999-04-05 JP JP55177899A patent/JP2002505809A/en not_active Ceased
- 1999-10-21 US US09/422,921 patent/US6127738A/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0342316A2 (en) * | 1988-05-20 | 1989-11-23 | International Business Machines Corporation | Method of electron beam lithography alignment |
Non-Patent Citations (2)
Title |
---|
"NOISE-REDUCED REGISTRATION IN CORPUSCULAR BEAM LITHOGRAPHY", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 33, no. 2, 1 July 1990 (1990-07-01), pages 373, XP000123653, ISSN: 0018-8689 * |
"REGISTRATION OF ELECTRON BEAM DURING ELECTRON BEAM PATTERN EXPOSURE", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 32, no. 6A, 1 November 1989 (1989-11-01), pages 445/446, XP000043275, ISSN: 0018-8689 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000079566A1 (en) * | 1999-06-22 | 2000-12-28 | Etec Systems, Inc. | Alignment of low-energy electron beams using magnetic fields |
Also Published As
Publication number | Publication date |
---|---|
JP2002505809A (en) | 2002-02-19 |
KR20010013507A (en) | 2001-02-26 |
CA2292645A1 (en) | 1999-10-21 |
US6127738A (en) | 2000-10-03 |
EP0990252A1 (en) | 2000-04-05 |
IL133321A0 (en) | 2001-04-30 |
AU3475999A (en) | 1999-11-01 |
US6008060A (en) | 1999-12-28 |
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