JPH05135724A - Sample holder for electron microscope - Google Patents

Sample holder for electron microscope

Info

Publication number
JPH05135724A
JPH05135724A JP30043891A JP30043891A JPH05135724A JP H05135724 A JPH05135724 A JP H05135724A JP 30043891 A JP30043891 A JP 30043891A JP 30043891 A JP30043891 A JP 30043891A JP H05135724 A JPH05135724 A JP H05135724A
Authority
JP
Japan
Prior art keywords
wafer
electron microscope
sample holder
sample
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30043891A
Other languages
Japanese (ja)
Inventor
Kazuo Iwai
計夫 岩井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP30043891A priority Critical patent/JPH05135724A/en
Publication of JPH05135724A publication Critical patent/JPH05135724A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a sample holder for an electron microscope not requiring to cut a sample or deposit a conducting film such as gold in the electron microwave observation of a wafer or a photo-mask having a structure easy to charge up. CONSTITUTION:A wafer 6 mounted on a holder main body 7 is fixed with a wafer presser 11 and a fixing pin 9. The wafer presser 11 is firmly pressed to the surface of the wafer 6 by a spring 10' to assure the contact between them.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体装置またはフォ
トマスクの観察や分析等に用いる電子顕微鏡に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron microscope used for observing and analyzing semiconductor devices or photomasks.

【0002】[0002]

【従来の技術】従来技術の電子顕微鏡用試料ホルダーを
図2(a)図2(b)に示す。
2. Description of the Related Art A conventional sample holder for an electron microscope is shown in FIGS. 2 (a) and 2 (b).

【0003】図2(b)は、従来技術の電子顕微鏡用試
料ホルダーの断面図である。
FIG. 2B is a sectional view of a conventional sample holder for an electron microscope.

【0004】半導体装置の基板であるウエハー6は、電
子顕微鏡のホルダー本体7の上に水平におかれ、固定ピ
ン9とウエハー押さえ8の間に挟み込まれる。ウエハー
押さえ8は、バネ10によりウエハー6を固定ピン9に
しっかり押し付け、固定することができる。
A wafer 6, which is a substrate of a semiconductor device, is placed horizontally on a holder body 7 of an electron microscope and sandwiched between a fixing pin 9 and a wafer retainer 8. The wafer retainer 8 can firmly fix the wafer 6 by pressing the wafer 6 against the fixing pin 9 by the spring 10.

【0005】電子顕微鏡は、細く絞った電子ビームを試
料のある一定の範囲に走査させながら照射して、電子が
当たることによって試料から出る二次電子を検出するこ
とにより、二次電子の強度に応じて検出した信号を画像
化するものである。
An electron microscope irradiates a finely focused electron beam while scanning it over a certain range of a sample, and detects secondary electrons emitted from the sample when the electron hits them, thereby increasing the intensity of the secondary electrons. The signal thus detected is imaged.

【0006】電子ビームを照射したとき、試料が絶縁さ
れていると、電子ビームが照射されている部分に電荷が
たまり、その電荷がバックグランドのノイズ成分として
検出器により検出され、画像が黒くなり非常に見にくい
ものとなる。これがチャージアップと呼ばれるものであ
る。
When the sample is insulated when irradiated with the electron beam, charges accumulate in the part irradiated with the electron beam, the charge is detected as a background noise component by the detector, and the image turns black. It will be very difficult to see. This is called charge-up.

【0007】そのため、ウエハー6は、ウエハー6の底
面からホルダー本体7、電子顕微鏡のステージ等を経由
してアース5され電荷を逃がすことにより、きれいな画
像が得られるようにしている。
Therefore, the wafer 6 is grounded from the bottom surface of the wafer 6 via the holder main body 7, the stage of the electron microscope, etc., and the charges are released to obtain a clean image.

【0008】しかし、図2(a)の従来技術の電子顕微
鏡用試料ホルダーの原理図に示すように、ウエハーの原
料であるシリコン1がシリコン酸化膜等の絶縁膜2にお
おわれていると、絶縁膜2の上のアルミニウム等の導電
膜3は電気的に浮いた状態になり、チャージアップし、
レジストパターン4の観察が非常に困難なものとなっ
た。
However, as shown in the principle of the prior art sample holder for an electron microscope of FIG. 2A, when silicon 1 which is a raw material of a wafer is covered with an insulating film 2 such as a silicon oxide film, it is insulated. The conductive film 3 made of aluminum or the like on the film 2 becomes electrically floating and is charged up,
Observation of the resist pattern 4 became very difficult.

【0009】[0009]

【発明が解決しようとする課題】しかし、従来技術の電
子顕微鏡用試料ホルダーでは、半導体装置の基板または
フォトマスクを切断せずに観察する際の電気的な接地が
充分にできず、きれいな像観察ができないという課題を
有していた。
However, in the electron microscope sample holder of the prior art, electrical grounding cannot be sufficiently performed when observing without cutting the substrate or the photomask of the semiconductor device, and thus a clear image observation is possible. It had a problem that it could not be done.

【0010】そこで本発明はこのような課題を解決する
もので、その目的とするところは半導体装置の基板また
はフォトマスクを切断せずに観察する際においても、き
れいな像観察ができる電子顕微鏡用試料ホルダーを提供
するところにある。
Therefore, the present invention is intended to solve such a problem, and an object thereof is to provide a sample for an electron microscope capable of observing a clean image even when observing without cutting a substrate or a photomask of a semiconductor device. It is in the place of providing a holder.

【0011】[0011]

【課題を解決するための手段】かかる課題を解決するた
め、本発明の電子顕微鏡用試料ホルダーは、半導体装置
の基板またはフォトマスクを切断せずにのせる電子顕微
鏡用試料ホルダーにおいて、前記半導体装置の基板また
は前記フォトマスクのおもて面に接触する端子を設け、
前記端子を電気的に接地することを特徴とする。
In order to solve the above problems, the sample holder for an electron microscope of the present invention is an electron microscope sample holder for mounting a substrate or a photomask of a semiconductor device without cutting the semiconductor device. Provide a terminal that comes into contact with the substrate of or the front surface of the photomask,
The terminal is electrically grounded.

【0012】[0012]

【実施例】以下に、本発明の実施例を図1(a)図1
(b)にもとずいて説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention will be described below with reference to FIG.
An explanation will be given based on (b).

【0013】図1(a)は、本発明の電子顕微鏡用試料
ホルダーの原理図である。
FIG. 1A shows the principle of the sample holder for an electron microscope of the present invention.

【0014】ウエハーの原料であるシリコン1の表面
は、シリコン酸化膜等の絶縁膜2におおわれており、そ
の絶縁膜2の上にアルミニウム等の導電膜3がスパッタ
されている。さらに、その導電膜3の上に形成されたレ
ジストパターン4を電子顕微鏡にて観察しようとしてい
る。
The surface of silicon 1 which is the raw material of the wafer is covered with an insulating film 2 such as a silicon oxide film, and a conductive film 3 such as aluminum is sputtered on the insulating film 2. Furthermore, the resist pattern 4 formed on the conductive film 3 is to be observed with an electron microscope.

【0015】本発明の電子顕微鏡用試料ホルダーの原理
は、従来技術の電子顕微鏡用試料ホルダーのアース5の
他に、ウエハーのおもて面からのアース5’を導電膜3
につなぎ、絶縁膜2の上の導電膜3に溜る電荷を逃がす
ものである試料を切断して電子顕微鏡で観察する場合に
は、切断した試料の表面に金や白金等の導電膜を蒸着ま
たはスパッタすることにより、チャージアップのしやす
い構造の試料においてもきれいな像観察が可能となる
が、半導体装置の基板であるウエハーを、その製造工程
の途中段階において電子顕微鏡での観察を行なう場合
は、ウエハーを切断することができない。また、ウエハ
ーは再び製造工程に戻さなければならないため、金等の
導電膜を蒸着する事もできない。
The principle of the sample holder for an electron microscope of the present invention is that, in addition to the ground 5 of the sample holder for an electron microscope of the prior art, the ground 5'from the front surface of the wafer is the conductive film 3 '.
In the case of cutting the sample which is to release the electric charge accumulated in the conductive film 3 on the insulating film 2 and observe it with an electron microscope, a conductive film such as gold or platinum is vapor-deposited on the surface of the cut sample. By sputtering, a clean image can be observed even on a sample that is easily charged up, but when observing a wafer, which is a substrate of a semiconductor device, with an electron microscope in the middle of the manufacturing process, The wafer cannot be cut. Also, since the wafer has to be returned to the manufacturing process again, it is not possible to deposit a conductive film such as gold.

【0016】そこで、本発明の電子顕微鏡用試料ホルダ
ーを用いることにより、ウエハーを切断せず、また金等
の蒸着もせずに絶縁膜上の導電膜の観察が可能となるた
め、ウエハーを、その製造工程の途中段階において電子
顕微鏡観察することが可能となる。
Therefore, by using the sample holder for an electron microscope of the present invention, the conductive film on the insulating film can be observed without cutting the wafer and vapor deposition of gold or the like. It becomes possible to perform electron microscope observation in the middle of the manufacturing process.

【0017】図1(b)は、本発明の電子顕微鏡用試料
ホルダーの断面図である。
FIG. 1 (b) is a sectional view of the sample holder for an electron microscope of the present invention.

【0018】半導体装置の基板であるウエハー6は、電
子顕微鏡のホルダー本体7の上に水平におかれ、固定ピ
ン9とウエハー押さえ11の間に挟み込まれる。
The wafer 6, which is the substrate of the semiconductor device, is placed horizontally on the holder body 7 of the electron microscope, and is sandwiched between the fixing pin 9 and the wafer retainer 11.

【0019】ウエハー押さえ11は、バネ10によりウ
エハー6を水平方向に押し付け、固定ピン9に固定する
ことができる。また同時に、ウエハー押さえ11はウエ
ハー6のおもて面にも接触しており、バネ10’により
ウエハー押さえ11をウエハー6のおもて面にしっかり
と押し付け、両者の接触が確実になされるような構造に
なっている。
The wafer retainer 11 can press the wafer 6 in the horizontal direction by the spring 10 and fix it to the fixing pin 9. At the same time, the wafer retainer 11 is also in contact with the front surface of the wafer 6, and the spring 10 'firmly presses the wafer retainer 11 against the front surface of the wafer 6 so that the contact between the two is ensured. It has a simple structure.

【0020】これによりウエハー6は、ウエハー6の底
面とウエハー6のおもて面からホルダー本体7、電子顕
微鏡のステージ等を経由してアース5につながる。
As a result, the wafer 6 is connected to the ground 5 from the bottom surface of the wafer 6 and the front surface of the wafer 6 via the holder body 7, the stage of the electron microscope and the like.

【0021】また、本発明の実施例においては、観察す
る試料として半導体装置の基板であるウエハーを取り上
げたが、フォトマスクや液晶表示体の基板等に応用して
も同様な効果が得られる。
Further, in the embodiment of the present invention, the wafer which is the substrate of the semiconductor device is taken as the sample to be observed, but the same effect can be obtained by applying it to the substrate of the photomask or the liquid crystal display.

【0022】[0022]

【発明の効果】以上に説明したように、本発明の電子顕
微鏡用試料ホルダーは、半導体装置の基板またはフォト
マスクのおもて面に接触する端子を設け、その端子を電
気的に接地するという簡単な構造により、チャージアッ
プしやすい構造の試料においても試料を切断せずにきれ
いな観察ができるという効果を有する。
As described above, the sample holder for an electron microscope of the present invention is provided with a terminal which comes into contact with the front surface of the substrate of the semiconductor device or the photomask, and the terminal is electrically grounded. Due to the simple structure, even a sample having a structure that easily charges up can be observed clearly without cutting the sample.

【0023】またそれにともない、試料の分析等の作業
効率が上がるという効果も有する。さらに、試料へのチ
ャージアップを押さえることができるため、フォーカス
調整等に慣れていない作業者でもきれいな像観察ができ
るという効果を有する。
Along with this, there is also an effect that the work efficiency of sample analysis and the like is improved. Further, since the charge up to the sample can be suppressed, there is an effect that even a worker who is not accustomed to focus adjustment can observe a clear image.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)は本発明の電子顕微鏡用試料ホルダーの
原理図、(b)は本発明の電子顕微鏡用試料ホルダーの
断面図。
1A is a principle view of a sample holder for an electron microscope of the present invention, and FIG. 1B is a sectional view of a sample holder for an electron microscope of the present invention.

【図2】(a)は従来技術の電子顕微鏡用試料ホルダー
の原理図、(b)は従来技術の電子顕微鏡用試料ホルダ
ーの断面図。
2A is a principle view of a conventional sample holder for an electron microscope, and FIG. 2B is a sectional view of a conventional sample holder for an electron microscope.

【符号の説明】[Explanation of symbols]

1 シリコン 2 絶縁膜 3 導電膜 4 レジストパターン 5 アース 5’ ウエハーのおもて面からのアース 6 ウエハー 7 ホルダー本体 8 ウエハー押さえ 9 固定ピン 10 バネ 10’ バネ 11 ウエハー押さえ DESCRIPTION OF SYMBOLS 1 Silicon 2 Insulating film 3 Conductive film 4 Resist pattern 5 Earth 5'Earth from front side of wafer 6 Wafer 7 Holder body 8 Wafer holder 9 Fixing pin 10 Spring 10 'Spring 11 Wafer holder

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】半導体装置の基板またはフォトマスクを切
断せずにのせる電子顕微鏡用試料ホルダーにおいて、前
記半導体装置の基板または前記フォトマスクのおもて面
に接触する端子を設け、前記端子を電気的に接地するこ
とを特徴とする電子顕微鏡用試料ホルダー。
1. A sample holder for an electron microscope on which a substrate of a semiconductor device or a photomask is placed without being cut, and a terminal is provided which is in contact with the front surface of the substrate of the semiconductor device or the photomask. A sample holder for an electron microscope, which is electrically grounded.
JP30043891A 1991-11-15 1991-11-15 Sample holder for electron microscope Pending JPH05135724A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30043891A JPH05135724A (en) 1991-11-15 1991-11-15 Sample holder for electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30043891A JPH05135724A (en) 1991-11-15 1991-11-15 Sample holder for electron microscope

Publications (1)

Publication Number Publication Date
JPH05135724A true JPH05135724A (en) 1993-06-01

Family

ID=17884805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30043891A Pending JPH05135724A (en) 1991-11-15 1991-11-15 Sample holder for electron microscope

Country Status (1)

Country Link
JP (1) JPH05135724A (en)

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