WO1999004271A1 - Appareil de lavage de busettes - Google Patents

Appareil de lavage de busettes Download PDF

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Publication number
WO1999004271A1
WO1999004271A1 PCT/JP1998/003165 JP9803165W WO9904271A1 WO 1999004271 A1 WO1999004271 A1 WO 1999004271A1 JP 9803165 W JP9803165 W JP 9803165W WO 9904271 A1 WO9904271 A1 WO 9904271A1
Authority
WO
WIPO (PCT)
Prior art keywords
nozzle
cleaning
cleaning liquid
liquid
reaction
Prior art date
Application number
PCT/JP1998/003165
Other languages
English (en)
Japanese (ja)
Inventor
Toshimi Kawamura
Yuzaburo Nanba
Syuji Takahashi
Eiji Ishiwata
Original Assignee
Sanko Junyaku Co., Ltd.
Eisai Co., Ltd.
Kanda Tsushin Kogyo Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanko Junyaku Co., Ltd., Eisai Co., Ltd., Kanda Tsushin Kogyo Co., Ltd. filed Critical Sanko Junyaku Co., Ltd.
Publication of WO1999004271A1 publication Critical patent/WO1999004271A1/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G01N35/1004—Cleaning sample transfer devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G01N35/1065—Multiple transfer devices

Definitions

  • the present invention relates to an injection nozzle for injecting various liquids (reaction solution and washing liquid) into a reaction vessel (also referred to as a reaction tube) used in an automatic analyzer such as an automatic immunoassay apparatus, and an inlet for the liquid.
  • a reaction vessel also referred to as a reaction tube
  • an automatic analyzer such as an automatic immunoassay apparatus
  • an inlet for the liquid TECHNICAL FIELD
  • the present invention relates to a nozzle cleaning device capable of efficiently cleaning a suction nozzle that sucks a liquid from a reaction tube.
  • a method for measuring the amount of antigen contained in a sample such as blood collected from a patient by a one-step non-competitive sandwich method will be described.
  • an antibody (solid phase antibody) bound to an insoluble simple substance (solid phase) such as a synthetic resin container inner wall or particles (particles) and an antibody (labeled) bound to a labeling substance such as a radioactive substance, a fluorescent substance, or an enzyme Antibody) is added to the reaction tube to which the sample to be measured is added in advance.
  • the antigen contained in the sample undergoes an antigen-antibody reaction (immune reaction) with the solid-phase antibody to form an antigen-antibody complex, and at the same time, the antigen-antibody complex is labeled with the labeled antibody.
  • the complex also forms a complex in which the three components, solid-phase antibody and antigen-labeled antibody, are sandwiched. In this way, the label of the labeled antibody is bound to the solid phase using the antigen in the sample as an intermediate.
  • An automatic analyzer such as an automatic immunoassay is known as an apparatus for automatically performing the measurement in such an immunoassay.
  • this automatic analyzer it is necessary to wash the inside of the reaction tube, especially in the B / F separation process, and a suction nozzle that sucks the reaction solution and the washing solution from the reaction vessel and an injection that injects the washing solution into the reaction vessel.
  • Many nozzles are used. These nozzles must be cleaned each time they are used to prevent contamination of other solutions (contamination). Therefore, a nozzle cleaning device for cleaning the nozzle has been conventionally used.
  • the conventional nozzle cleaning apparatus 110 performs cleaning of the nozzles using a cleaning case 112 having an independent installation position and structure separately from a nozzle group (not shown).
  • the cleaning case 112 has a cleaning case body 116 having a recess 114 opened upward.
  • a cleaning liquid outlet 118 is provided, which penetrates the bottom wall 120 downward and opens.
  • Nozzle washing holes 1 2 2 and 1 2 2 are provided on the outside of the periphery of the outlet 1 1 8.
  • the nozzle washing holes 1 2 2 and 1 2 2 are provided in the washing case main body 1 1 6.
  • the cleaning liquid supply ports 124, 124 open through the bottom wall 120 of the cleaning liquid sideways.
  • the nozzles Nl and N2 are moved to the installation position and the washing position of the reaction tube T by a nozzle moving means (not shown) which moves in the X direction and the Z direction, respectively.
  • a nozzle moving means (not shown) which moves in the X direction and the Z direction, respectively.
  • required operations such as suction of the reaction solution and the cleaning solution and injection of the cleaning solution are performed, and at the cleaning position, the tips of the nozzles N1 and N2 are washed as described above.
  • the position where the reaction solution is sucked and the access for injecting and sucking the cleaning solution and the position of the cleaning case 112 are different. It was at a different position, and it was essential to move the nozzles Nl and N2 in two directions. Therefore, the volume of the conventional nozzle cleaning device 110 becomes large, and the cost increases accordingly.
  • the nozzles N 1 and N 2 are taken out of the nozzle washing holes 1 2 2 to suck and inject the reaction solution and the cleaning solution. It is repeated to be reinserted into 2 and washed. Therefore, if the opening area of the nozzle cleaning holes 122 is made small enough to allow the nozzles N1 and N2 to pass through, the nozzles N1 and N2 will be cleaned when the nozzles Nl and N2 are inserted. There was an inconvenience that it was broken along the edge of the hole 122. Further, in the conventional nozzle cleaning device 110, the amount of cleaning liquid used is large, which is uneconomical.
  • the cleaning liquid contains a special component, for example, a surfactant, a phenomenon occurs in which the crystals adhere to the cleaning case 112 during drying, and the crystals cause the cleaning case 112 to lose power. s There was a problem that the cleaning ability was deteriorated with time due to the contamination.
  • a surfactant for example, a surfactant
  • the present invention has been made in view of the above-described problems of the related art, and it is an object of the present invention to minimize the opening area of a nozzle cleaning hole, reduce the volume of an apparatus, and minimize the amount of a cleaning liquid to be used. It is another object of the present invention to provide a nozzle cleaning apparatus which enables the cleaning liquid and eliminates the adhesion of crystals to the nozzle and the nozzle cleaning case caused by the cleaning liquid. Disclosure of the invention
  • a nozzle cleaning device of the present invention is a device for cleaning a nozzle for sucking a liquid in a reaction container and a nozzle for injecting a liquid into the reaction container, and is provided above a position where the reaction container is installed. And a nozzle is advanced into the reaction vessel.
  • the nozzle cleaning mechanism may be configured to include a unit that jets a cleaning liquid into the nozzle passage and a unit that suctions the jetted cleaning liquid.
  • the nozzle cleaning mechanism opens a cleaning liquid jet port and a cleaning liquid suction port so as to face the nozzle path, and jets a cleaning liquid from the cleaning liquid jet port into the nozzle path to clean the nozzle. It is preferable that the cleaning liquid is sucked and discharged from the cleaning liquid suction port.
  • the flow of the cleaning liquid is piled up from the bottom by gravity and flows. As long as the effect is large and the cleaning liquid is sucked from the cleaning liquid suction port by a suction pump or the like, there is no accident that the cleaning liquid drops from the lower opening.
  • the installation distance between the cleaning liquid jet port and the cleaning liquid suction port is set to be longer than the length of the immersion portion of the nozzle when the nozzle enters the liquid in the reaction vessel, the nozzle is immersed in the liquid.
  • a nozzle holder having a nozzle through hole at the center is formed, and the diameter of the lower end of the nozzle insertion hole can be moved up and down in close contact with the nozzle.
  • FIG. 1 is a top view showing one embodiment of an automatic immunoassay apparatus including a nozzle cleaning apparatus according to the present invention.
  • FIG. 2 is a front view of FIG.
  • FIG. 3 is a partial cross-sectional side view of the nozzle cleaning device of the present invention, showing a state where the nozzle is housed in a cleaning case.
  • FIG. 4 is a partial cross-sectional side view similar to FIG. 3, showing a state in which the nozzle is projected to the position of the reaction vessel.
  • FIG. 5 is an enlarged sectional view of a main part of the nozzle cleaning device of the present invention.
  • FIG. 6 is a perspective view showing the cleaning case.
  • FIG. 7 is a sectional view taken along line AA of FIG.
  • FIG. 8 is an explanatory cross-sectional view showing a state where the nozzle holder is mounted on the cleaning case of FIG. 7 and the nozzle is inserted into the nozzle passage.
  • FIG. 9 is a schematic sectional explanatory view showing a conventional nozzle cleaning device.
  • reference numeral 12 denotes an automatic analyzer according to the present invention, specifically, an automatic immunoassay device, which has a reaction tube 14 which rotates intermittently at a predetermined speed.
  • a reaction tube holding portion 18 having a plurality of reaction tube holders 16 arranged in two rows, an inner circumferential row and an outer circumferential row. I have.
  • the number of the reaction tube holders 16 provided on the upper surface of the reaction tube 14 may be appropriately set according to the mode of the reaction, but in the example of FIG. The figure shows an example in which 0, a total of 60 reaction tube holders 14 are installed.
  • Reference numeral 20 denotes a reaction tube rack, which holds the reaction tubes in a large number of receiving portions 21 (the example of FIG. 1 shows a case where two reaction tube racks are installed).
  • Reference numeral 22 denotes a reaction tube transfer means, which has a reaction tube holding portion 22 a at a lower portion, and transfers the reaction tube held in the receiving portion 21 of the reaction tube rack 20 to the reaction tube holder 16. The operation of transferring and transferring the reaction tubes held in one reaction tube holder 16 to another reaction tube holder 16 by skipping the desired number of reaction tube holders 16 is performed.
  • reaction tubes held in the inner or outer rows of the reaction tube holders 16 can be transferred to the reaction tube holders 16 of the same circumference, or the reaction tubes of other circumferences can be transferred. It can also be transferred to 1-16.
  • the reaction tube transfer means 22 has a reaction tube supply operation of supplying a reaction tube to the reaction tube holding unit 18, and a reaction tube disposal operation of taking out a measured reaction tube from the reaction tube holding unit 18 and discarding it. Perform
  • Reference numeral 26 is a particle supply means for supplying particles to the reaction tube, and a particle nozzle 26a is provided below the particle supply means.
  • Reference numeral 28 denotes a reagent dispensing means for dispensing a labeled reagent into the reaction tube, and a reagent nozzle 28a is provided below the reagent dispensing means.
  • Reference numeral 30 denotes a nozzle cleaning device according to the present invention, which is used for B / F separation processing.
  • 32 is a measuring reagent dispensing means for dispensing the measuring reagent into the reaction tube.
  • Reference numeral 34 denotes a measuring means for measuring the amount of the label in the reaction solution after the reaction in the reaction tube.
  • Reference numeral 36 denotes a reagent table mechanism, which has a reagent table 37.
  • the reagent table 37 is provided with mounting holes 37a and 37a, and the reagent holders 38 and 38 are detachable via the mounting holes 37a and 37a. It is attached to.
  • a particle bin 40 and a labeling reagent bin 42 are individually mounted.
  • the nozzle cleaning device 30 has a base 50.
  • a guide rail 52 is provided in the longitudinal direction of one side of the base 50.
  • a movable support 54 is attached to the guide rail 52 so as to be vertically movable.
  • Reference numeral 56 denotes a timing belt connected to the movable column 54.
  • the evening belt 56 is suspended on a pair of pulleys 58, 58 driven by a drive source (not shown).
  • the movable support 54 is moved up and down by the rotation of the timing belt 56.
  • An arm member 60 serving as a nozzle holding means is provided at the upper end of the movable support 54 so as to extend to the side.
  • the arm member 60 holds an injection nozzle N1 for injecting a liquid into the reaction vessel T and a suction nozzle N2 for aspirating the liquid in the reaction vessel T, with the distal end thereof facing downward.
  • Reference numerals 62 and 62 denote mounting blocks embedded in the arm member 60 and into which the nozzles N1 and N2 are press-fitted.
  • the upper end of the injection nozzle N1 is connected to, for example, a cleaning liquid supply tank (not shown). Then, a required amount of liquid can be injected into the reaction tube T.
  • the upper end of the suction nozzle ⁇ 2 is connected to a liquid outlet (not shown), and the liquid such as the reaction solution or the cleaning liquid existing in the reaction vessel ⁇ is supplied to suction means such as a vacuum pump. It performs more suction and discharge from the liquid discharge port.
  • Reference numeral 64 denotes a cleaning case which is located below the arm member 60 and is provided to extend laterally from the base 50.
  • the injection nozzle passage 66a for the injection nozzle ⁇ 1 and the suction nozzle passage 66b for the suction nozzle N2 are vertically arranged corresponding to the injection and suction nozzles ⁇ 1 and ⁇ 2. Are formed.
  • a number of reaction vessels T held by the reaction tube holder 16 of the reaction tube turret 14 are intermittently rotated and positioned one after another.
  • the injection nozzle N1 only needs to enter the middle of the reaction vessel T to inject and discharge the liquid.
  • the suction nozzle N2 since the suction nozzle N2 needs to suck all the liquid in the reaction vessel T, the suction nozzle N2 enters the bottom of the reaction vessel T and performs a suction operation as shown in FIG.
  • nozzle holders 68, 68 are attached to the upper end portions of the injection nozzle passage 66a and the suction nozzle passage 66b.
  • Nozzle through holes 70, 70 are formed in the center of the nozzle holders 68, 68.
  • O-rings 72, 72 are fixed to lower ends of the nozzle insertion holes 70, 70, respectively.
  • the O-rings 7 2, 7 2 are in close contact with the respective outer peripheral surfaces of the nozzles N 1, N 2, and the nozzles N 1, N 2 are vertically movable with respect to the O-rings 7 2, 7 2 in a close state. Abuts.
  • the cleaning liquid jets 74 a and 76 a are connected to cleaning liquid supply ports 78 a and 80 a formed through the lower portion of the side wall of the cleaning case 64 via a liquid passage 82. I have.
  • the cleaning liquid suction ports 74 b and 76 b are connected to the cleaning liquid discharge ports 78 b and 8 Ob formed through the upper portion of the side wall of the cleaning case 64 via a liquid passage 82.
  • the cleaning liquid supplied from the cleaning liquid supply ports 78a and 80a is ejected from the cleaning liquid jet ports 74a and 76a into the nozzle paths 66a and 66b through the liquid passage 82, and the nozzles N1, N2 While washing, the liquid flows upward by the suction force of the cleaning liquid suction ports 74b and 76b, is sucked into the cleaning liquid suction ports 74b and 76b, and is discharged from the cleaning liquid discharge ports 78b and 80b through the liquid passage 82.
  • the reaction vessel T containing the reaction solution reaches the washing position, absorbs the reaction solution in the reaction vessel T, discards the reaction solution, and injects the washing solution. Cleaning is performed according to the procedure of aspirating and discarding the cleaning liquid. Therefore, for example, in the case where the reaction tube holders 16 are arranged in the reaction tube turret 14 in two rows of the inner circumference and the outer circumference, the suction nozzle N1 and the injection nozzle N2 are arranged as shown in FIG. Then, a washing operation of suction-injection-suction-injection-inhalation can be performed. In this case, two washes can be performed.
  • the reaction vessels T and ⁇ containing the reaction solution are suction nozzles at the far right end in FIG.
  • the suction nozzles ⁇ 2 and ⁇ 2 descend and enter the bottoms of the reaction vessels ⁇ and ⁇ (Fig. 4), and suck all the reaction solution.
  • the suction nozzles ⁇ 2 and ⁇ 2 rise and are stored in the suction nozzle passage 66b in the cleaning case 64 (FIG. 3). At this time, as shown in FIG.
  • the empty reaction vessels ⁇ and T which have sucked the reaction solution, then rotate below the second injection nozzles Nl and N1 from the right in FIG.
  • the injection nozzles N 1 and N 1 descend to enter the middle of an empty reaction vessel T, ⁇ (there is no need to enter the bottom because it is only injection), and the cleaning liquid is supplied to the reaction vessels ⁇ and ⁇ .
  • the injection nozzles Nl and N1 rise and are stored in the injection nozzle passage 66a in the cleaning case 64 (Fig. 3).
  • the injection nozzles N 1 and N 1 do not stain much because they only inject the cleaning liquid, but they also need to be cleaned in order to prevent contamination due to contamination or the like and increase measurement accuracy. Also in this case, if the lower ends of the injection nozzles Nl and N1 are located above the installation position of the cleaning liquid ejection port 74a, it is the same that good cleaning can be performed.
  • the cleaning liquid is jetted from the cleaning liquid jet port 74 a, and the jetted cleaning liquid is gravity driven by the suction force from the cleaning liquid suction port 74 b.
  • the cleaning liquid flows upward to wash the injection nozzles N1 and N1, and is sucked from the cleaning liquid suction port 74b and discharged from the cleaning liquid discharge ports 78b and 80b.
  • the reaction vessels ⁇ and T into which the cleaning liquid has been injected then turn below the third suction nozzles N2 and N2 from the right in FIG.
  • the suction nozzles N2 and N2 descend and enter the bottom of the reaction vessels T and T (Fig. 4), and suck all the cleaning liquid.
  • the suction is completed, it is stored in the suction nozzle passage 66b and washed as described above.
  • reaction vessels ⁇ and T further pivot below the fourth injection nozzles N 1 and N 1 from the right in FIG. 6, and the washing liquid is injected again as described above.
  • the injection nozzles N1 and N1 are similarly cleaned in the injection nozzle passage 66a.
  • the reaction vessels T and ⁇ into which the cleaning liquid has been injected are the fifth from the right in FIG.
  • the cleaning liquid in the reaction vessels ⁇ and ⁇ is sucked and discharged in the same manner as described above after reaching the rotation below the suction nozzles ⁇ 2 and ⁇ ⁇ 2.
  • suction nozzles ⁇ 2 and ⁇ 2 The cleaning is performed in the suction nozzle passage 66b.
  • the injection nozzle N1 and the suction nozzle N2 are washed in the injection nozzle passage 66a and the suction nozzle passage 66b immediately after performing the injection operation and the suction operation. Even if a special component, such as a surfactant, is contained, the crystals are not left for a period of time so as to dry and become crystals, so that the crystals do not adhere to the reaction tube at all.
  • a special component such as a surfactant
  • the washing in the B / F separation of the reaction vessel T is performed by suction (reaction solution), one injection (washing solution), one suction (washing solution), one injection (washing solution), and one suction ( Cleaning solution), the cleaning process was performed twice.
  • the opening area of the nozzle cleaning hole can be minimized, the volume of the device can be reduced, and the amount of the cleaning liquid to be used can be minimized.
  • the present invention has an effect that it is possible to eliminate the adhesion of the crystal to the nozzle and the nozzle cleaning case due to the cleaning liquid.

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)

Abstract

On décrit un appareil de lavage de busettes présentant un volume réduit pouvant réduire au minimum une zone d'ouverture d'un orifice de lavage de busettes ainsi que la quantité d'un liquide de lavage utilisé, et éliminer les cristallites fixées à un tuyau de réaction par l'action du liquide de lavage. On décrit plus particulièrement un appareil de lavage de busettes qui s'utilise pour aspirer un liquide apporté dans une cuve de réaction, ou injecter un liquide à l'intérieur d'une cuve de réaction. Cet appareil comprend un moyen de retenue de la busette qui surplombe l'installation de la cuve de réaction et maintient les busettes dans une position verticale dans laquelle elles peuvent être déplacées et insérées dans la cuve de réaction. L'appareil comprend en outre un tubage de lavage de busettes placé entre le moyen de retenue de la busette et l'installation de la cuve de réaction, des conduits de busettes ménagés à l'intérieur dudit tubage et à travers lesquels des busettes maintenues par ledit moyen de retenue peuvent être déplacées verticalement, et des mécanismes de lavage disposés dans les conduits de busettes.
PCT/JP1998/003165 1997-07-18 1998-07-15 Appareil de lavage de busettes WO1999004271A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19346597A JPH1138016A (ja) 1997-07-18 1997-07-18 ノズル洗浄装置
JP9/193465 1997-07-18

Publications (1)

Publication Number Publication Date
WO1999004271A1 true WO1999004271A1 (fr) 1999-01-28

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Application Number Title Priority Date Filing Date
PCT/JP1998/003165 WO1999004271A1 (fr) 1997-07-18 1998-07-15 Appareil de lavage de busettes

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JP (1) JPH1138016A (fr)
WO (1) WO1999004271A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3299823A1 (fr) * 2016-09-26 2018-03-28 Stratec Biomedical AG Collecteur d'injecteur
US11971426B2 (en) * 2018-03-16 2024-04-30 Hitachi High-Tech Corporation Automatic analysis device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5094222B2 (ja) * 2007-06-15 2012-12-12 シスメックス株式会社 試料分析装置および試料分析方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01259257A (ja) * 1988-04-08 1989-10-16 Toa Medical Electronics Co Ltd 免疫凝集測定装置
JPH06222065A (ja) * 1992-12-17 1994-08-12 Smithkline Beckman Corp 流体プローブ洗浄装置および方法
JPH07229905A (ja) * 1993-12-20 1995-08-29 Toa Medical Electronics Co Ltd ピペット洗浄装置
WO1997001750A1 (fr) * 1995-06-29 1997-01-16 Coulter International Corp. Appareil de nettoyage d'une sonde de prelevement d'echantillons liquides

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01259257A (ja) * 1988-04-08 1989-10-16 Toa Medical Electronics Co Ltd 免疫凝集測定装置
JPH06222065A (ja) * 1992-12-17 1994-08-12 Smithkline Beckman Corp 流体プローブ洗浄装置および方法
JPH07229905A (ja) * 1993-12-20 1995-08-29 Toa Medical Electronics Co Ltd ピペット洗浄装置
WO1997001750A1 (fr) * 1995-06-29 1997-01-16 Coulter International Corp. Appareil de nettoyage d'une sonde de prelevement d'echantillons liquides

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3299823A1 (fr) * 2016-09-26 2018-03-28 Stratec Biomedical AG Collecteur d'injecteur
US11971426B2 (en) * 2018-03-16 2024-04-30 Hitachi High-Tech Corporation Automatic analysis device

Also Published As

Publication number Publication date
JPH1138016A (ja) 1999-02-12

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