WO1998034092A3 - Systeme et procede de controle et/ou de modification d'objets - Google Patents
Systeme et procede de controle et/ou de modification d'objets Download PDFInfo
- Publication number
- WO1998034092A3 WO1998034092A3 PCT/US1998/001528 US9801528W WO9834092A3 WO 1998034092 A3 WO1998034092 A3 WO 1998034092A3 US 9801528 W US9801528 W US 9801528W WO 9834092 A3 WO9834092 A3 WO 9834092A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- modifications
- spm probe
- spm
- positioning
- lithography
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/16—Probe manufacture
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/08—Means for establishing or regulating a desired environmental condition within a sample chamber
- G01Q30/16—Vacuum environment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q40/00—Calibration, e.g. of probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q40/00—Calibration, e.g. of probes
- G01Q40/02—Calibration standards and methods of fabrication thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/02—Multiple-type SPM, i.e. involving more than one SPM techniques
- G01Q60/06—SNOM [Scanning Near-field Optical Microscopy] combined with AFM [Atomic Force Microscopy]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/02—Probe holders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/06—Probe tip arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2049—Exposure; Apparatus therefor using a cantilever
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q80/00—Applications, other than SPM, of scanning-probe techniques
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/23—Gap features
- G11B5/232—Manufacture of gap
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Priority Applications (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/355,072 US6337479B1 (en) | 1994-07-28 | 1998-01-21 | Object inspection and/or modification system and method |
EP98904705A EP1012584A4 (fr) | 1997-01-21 | 1998-01-21 | Systeme et procede de controle et/ou de modification d'objets |
AU62508/98A AU6250898A (en) | 1997-01-21 | 1998-01-21 | Object inspection and/or modification system and method |
US10/616,453 US7045780B2 (en) | 1994-07-28 | 2003-07-08 | Scanning probe microscopy inspection and modification system |
US11/411,985 US7485856B2 (en) | 1994-07-28 | 2006-04-25 | Scanning probe microscopy inspection and modification system |
US11/841,698 US8499621B2 (en) | 1994-07-28 | 2007-08-20 | Scanning probe microscopy inspection and modification system |
US11/894,592 US20080202221A1 (en) | 1994-07-28 | 2007-08-20 | Methods and apparatus for nanolapping |
US12/214,573 US20080315092A1 (en) | 1994-07-28 | 2008-06-19 | Scanning probe microscopy inspection and modification system |
US12/779,879 US20110126328A1 (en) | 1994-07-28 | 2010-05-13 | Methods and Apparatus for Nanolapping |
US13/912,169 US20140051333A1 (en) | 1998-01-21 | 2013-06-06 | Methods and apparatus for nanolapping |
US14/446,365 US20150168445A1 (en) | 1994-07-28 | 2014-07-30 | Scanning probe microscopy inspection and modification system |
US14/918,307 US10610995B2 (en) | 1998-01-21 | 2015-10-20 | Method and apparatus for nanolapping |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78662397A | 1997-01-21 | 1997-01-21 | |
US08/786,623 | 1997-01-21 | ||
US82795397A | 1997-04-06 | 1997-04-06 | |
US08/827,953 | 1997-04-06 |
Related Parent Applications (10)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/506,516 Continuation-In-Part US5751683A (en) | 1994-07-28 | 1995-07-24 | Nanometer scale data storage device and associated positioning system |
US08776361 Continuation-In-Part | 1995-07-28 | ||
US08/776,361 Continuation-In-Part US6339217B1 (en) | 1994-07-28 | 1995-07-28 | Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements |
PCT/US1995/009553 Continuation-In-Part WO1996003641A1 (fr) | 1994-07-28 | 1995-07-28 | Ensemble microscope a sonde de balayage |
US08/613,982 Continuation-In-Part US5756997A (en) | 1994-07-28 | 1996-03-04 | Scanning probe/optical microscope with modular objective/probe and drive/detector units |
PCT/US1996/012255 Continuation-In-Part WO1997004449A1 (fr) | 1994-07-28 | 1996-07-24 | Dispositif de stockage de donnees a l'echelle nanometrique et systeme de positionnement associe |
US08/906,602 Continuation-In-Part US6265711B1 (en) | 1994-07-28 | 1996-12-10 | Scanning probe microscope assembly and method for making spectrophotometric near-field optical and scanning measurements |
US78662397A Continuation-In-Part | 1994-07-28 | 1997-01-21 | |
US82795397A Continuation-In-Part | 1994-07-28 | 1997-04-06 | |
US08/885,014 Continuation-In-Part US6144028A (en) | 1994-07-28 | 1997-07-01 | Scanning probe microscope assembly and method for making confocal, spectrophotometric, Near-Field, and Scanning probe measurements and associated images |
Related Child Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09355072 A-371-Of-International | 1998-01-21 | ||
US09/355,072 A-371-Of-International US6337479B1 (en) | 1994-07-28 | 1998-01-21 | Object inspection and/or modification system and method |
US09/441,033 Continuation US6353219B1 (en) | 1994-07-28 | 1999-11-16 | Object inspection and/or modification system and method |
US09/919,780 Continuation US6861648B2 (en) | 1994-07-28 | 2001-07-31 | Scanning probe microscopy inspection and modification system |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1998034092A2 WO1998034092A2 (fr) | 1998-08-06 |
WO1998034092A3 true WO1998034092A3 (fr) | 1998-11-05 |
Family
ID=27120558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1998/001528 WO1998034092A2 (fr) | 1994-07-28 | 1998-01-21 | Systeme et procede de controle et/ou de modification d'objets |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1012584A4 (fr) |
AU (1) | AU6250898A (fr) |
WO (1) | WO1998034092A2 (fr) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6337479B1 (en) | 1994-07-28 | 2002-01-08 | Victor B. Kley | Object inspection and/or modification system and method |
US20080202221A1 (en) * | 1994-07-28 | 2008-08-28 | General Nanotechnology Llc | Methods and apparatus for nanolapping |
US6752008B1 (en) | 2001-03-08 | 2004-06-22 | General Nanotechnology Llc | Method and apparatus for scanning in scanning probe microscopy and presenting results |
US6787768B1 (en) | 2001-03-08 | 2004-09-07 | General Nanotechnology Llc | Method and apparatus for tool and tip design for nanomachining and measurement |
US6802646B1 (en) | 2001-04-30 | 2004-10-12 | General Nanotechnology Llc | Low-friction moving interfaces in micromachines and nanomachines |
US7196328B1 (en) | 2001-03-08 | 2007-03-27 | General Nanotechnology Llc | Nanomachining method and apparatus |
US7170842B2 (en) | 2001-02-15 | 2007-01-30 | Hewlett-Packard Development Company, L.P. | Methods for conducting current between a scanned-probe and storage medium |
JP2005538855A (ja) * | 2002-09-09 | 2005-12-22 | ジェネラル ナノテクノロジー エルエルシー | 走査型プローブ顕微鏡の流体送達 |
DE60325629D1 (de) | 2002-10-21 | 2009-02-12 | Nanoink Inc | Verfahren zur herstellung von strukturen im nanometerbereich zur anwendung im bereich der maskenreparatur |
US7198961B2 (en) | 2004-03-30 | 2007-04-03 | Matsushita Electric Industrial Co., Ltd. | Method for modifying existing micro-and nano-structures using a near-field scanning optical microscope |
WO2009117674A2 (fr) * | 2008-03-20 | 2009-09-24 | University Of Utah Research Foundation | Appareil, système et procédés d'analyse de dispositifs sensibles à la pression |
RU2617542C1 (ru) * | 2016-02-20 | 2017-04-25 | Общество с ограниченной ответственностью "СНОТРА" | Сканирующее устройство локального воздействия |
CN109187595B (zh) * | 2018-09-27 | 2021-05-11 | 南京宁智高新材料研究院有限公司 | 一种测量透射电镜中微气体束引起的局部等效压强的装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4907195A (en) * | 1984-09-14 | 1990-03-06 | Xerox Corporation | Method of and system for atomic scale recording of information |
US5414690A (en) * | 1991-01-29 | 1995-05-09 | Canon Kabushiki Kaisha | Moving apparatus, a moving method and an information detection and/or input apparatus using the same |
US5472881A (en) * | 1992-11-12 | 1995-12-05 | University Of Utah Research Foundation | Thiol labeling of DNA for attachment to gold surfaces |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02173278A (ja) * | 1988-12-26 | 1990-07-04 | Hitachi Ltd | 微細加工方法及びその装置 |
US5144148A (en) * | 1989-11-07 | 1992-09-01 | International Business Machines Corporation | Process for repositioning atoms on a surface using a scanning tunneling microscope |
EP0522168A1 (fr) * | 1991-01-11 | 1993-01-13 | Hitachi, Ltd. | Appareil et procede d'usinage d'atomes de surface |
JPH04355914A (ja) * | 1991-02-06 | 1992-12-09 | Olympus Optical Co Ltd | リソグラフィー装置 |
JP3054900B2 (ja) * | 1993-03-10 | 2000-06-19 | セイコーインスツルメンツ株式会社 | 微細加工装置 |
TW285721B (fr) * | 1994-12-27 | 1996-09-11 | Siemens Ag |
-
1998
- 1998-01-21 WO PCT/US1998/001528 patent/WO1998034092A2/fr active Application Filing
- 1998-01-21 EP EP98904705A patent/EP1012584A4/fr not_active Withdrawn
- 1998-01-21 AU AU62508/98A patent/AU6250898A/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4907195A (en) * | 1984-09-14 | 1990-03-06 | Xerox Corporation | Method of and system for atomic scale recording of information |
US5414690A (en) * | 1991-01-29 | 1995-05-09 | Canon Kabushiki Kaisha | Moving apparatus, a moving method and an information detection and/or input apparatus using the same |
US5472881A (en) * | 1992-11-12 | 1995-12-05 | University Of Utah Research Foundation | Thiol labeling of DNA for attachment to gold surfaces |
Non-Patent Citations (1)
Title |
---|
See also references of EP1012584A4 * |
Also Published As
Publication number | Publication date |
---|---|
EP1012584A4 (fr) | 2006-10-04 |
AU6250898A (en) | 1998-08-25 |
WO1998034092A2 (fr) | 1998-08-06 |
EP1012584A2 (fr) | 2000-06-28 |
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