DE69019198D1 - Gerät zur Erzeugung eines Strahls aus geladenen Partikeln. - Google Patents

Gerät zur Erzeugung eines Strahls aus geladenen Partikeln.

Info

Publication number
DE69019198D1
DE69019198D1 DE69019198T DE69019198T DE69019198D1 DE 69019198 D1 DE69019198 D1 DE 69019198D1 DE 69019198 T DE69019198 T DE 69019198T DE 69019198 T DE69019198 T DE 69019198T DE 69019198 D1 DE69019198 D1 DE 69019198D1
Authority
DE
Germany
Prior art keywords
generating
charged particles
charged
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69019198T
Other languages
English (en)
Other versions
DE69019198T2 (de
Inventor
Kenichi Saito
Hirofumi Morita
Nobuo Shimazu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Publication of DE69019198D1 publication Critical patent/DE69019198D1/de
Application granted granted Critical
Publication of DE69019198T2 publication Critical patent/DE69019198T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
DE69019198T 1989-02-22 1990-02-19 Gerät zur Erzeugung eines Strahls aus geladenen Partikeln. Expired - Fee Related DE69019198T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4035389 1989-02-22
JP2031609A JP2775071B2 (ja) 1989-02-22 1990-02-14 荷電粒子ビーム発生装置

Publications (2)

Publication Number Publication Date
DE69019198D1 true DE69019198D1 (de) 1995-06-14
DE69019198T2 DE69019198T2 (de) 1995-10-12

Family

ID=26370107

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69019198T Expired - Fee Related DE69019198T2 (de) 1989-02-22 1990-02-19 Gerät zur Erzeugung eines Strahls aus geladenen Partikeln.

Country Status (4)

Country Link
US (1) US5041732A (de)
EP (1) EP0384684B1 (de)
JP (1) JP2775071B2 (de)
DE (1) DE69019198T2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09180663A (ja) * 1995-12-26 1997-07-11 Nikon Corp 電子銃及び該電子銃を備えた電子線転写装置
DE69605053T2 (de) * 1996-12-24 2000-02-24 Advantest Corp., Saitama Kanonenlinse zur Partikelstrahlerzeugung
SG74599A1 (en) * 1997-09-27 2000-08-22 Inst Of Material Res & Enginee Portable high resolution scanning electron microscope column using permanent magnet electron lenses
US6392333B1 (en) * 1999-03-05 2002-05-21 Applied Materials, Inc. Electron gun having magnetic collimator
JP3900792B2 (ja) * 2000-04-26 2007-04-04 株式会社日立製作所 電子銃
US6869574B2 (en) * 2001-03-14 2005-03-22 Vacuum Products Corporation Apparatus and method of generating charged particles
US6596999B2 (en) * 2001-11-07 2003-07-22 Nikon Corporation High performance source for electron beam projection lithography
RU2208871C1 (ru) * 2002-03-26 2003-07-20 Минаков Валерий Иванович Плазменный источник электронов
JP3998556B2 (ja) * 2002-10-17 2007-10-31 株式会社東研 高分解能ｘ線顕微検査装置
JP4601923B2 (ja) * 2003-07-16 2010-12-22 株式会社東芝 電子銃とそれを用いた電子ビーム照射装置
US7218703B2 (en) * 2003-11-21 2007-05-15 Tohken Co., Ltd. X-ray microscopic inspection apparatus
GB2414856B (en) * 2004-06-03 2008-11-12 Nanobeam Ltd Charged particle gun
US7372195B2 (en) * 2005-09-10 2008-05-13 Applied Materials, Inc. Electron beam source having an extraction electrode provided with a magnetic disk element
EP1826809A1 (de) * 2006-02-22 2007-08-29 FEI Company Partikel-Optisches Gerät ausgestattet mit einer Gasionenquelle
WO2007146985A2 (en) * 2006-06-13 2007-12-21 Semequip, Inc. Magnetic analyzer apparatus and method for ion implantation
DE102007010463B4 (de) 2007-03-01 2010-08-26 Sellmair, Josef, Dr. Vorrichtung zur Feldemission von Teilchen
US7573046B1 (en) * 2007-03-26 2009-08-11 Kla-Tencor Technologies Corporation Thermal field emission electron gun with reduced arcing
WO2008120341A1 (ja) 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
WO2010022197A1 (en) * 2008-08-20 2010-02-25 Fripro Energy Corporation Atmospheric electron particle beam generator
JP4888476B2 (ja) * 2008-11-27 2012-02-29 株式会社安川電機 真空機器
JP5386229B2 (ja) 2009-05-22 2014-01-15 株式会社日立ハイテクノロジーズ 電子銃
JP5290238B2 (ja) 2010-05-21 2013-09-18 株式会社日立ハイテクノロジーズ 電子顕微鏡
US9799484B2 (en) * 2014-12-09 2017-10-24 Hermes Microvision, Inc. Charged particle source
US9941094B1 (en) 2017-02-01 2018-04-10 Fei Company Innovative source assembly for ion beam production
WO2019049261A1 (ja) * 2017-09-07 2019-03-14 株式会社日立ハイテクノロジーズ 電子銃および電子ビーム応用装置
CN108411270B (zh) * 2018-05-11 2023-03-07 湖南众源科技有限公司 一种立式硅片磁控溅射镀膜机
JP2019212766A (ja) * 2018-06-05 2019-12-12 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
WO2021001919A1 (ja) * 2019-07-02 2021-01-07 株式会社日立ハイテク 荷電粒子線装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3144627A (en) * 1960-07-05 1964-08-11 Weldex Division Of Metal Craft Welding transformer with colled core
GB1395201A (en) * 1972-09-04 1975-05-21 Nat Res Dev Magnetic lenses
JPS5184568A (ja) * 1975-01-22 1976-07-23 Nippon Electron Optics Lab Denkaihoshutsugatadenshiju
GB1594465A (en) * 1977-03-23 1981-07-30 Nat Res Dev Electron beam apparatus
FR2527383A1 (fr) * 1982-05-24 1983-11-25 Univ Reims Champagne Ardenne Canon a electrons avec cathode a emission de champ et lentille magnetique
JPS60127645A (ja) * 1983-12-14 1985-07-08 Hitachi Ltd 電界放射形電子銃
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system

Also Published As

Publication number Publication date
US5041732A (en) 1991-08-20
EP0384684B1 (de) 1995-05-10
EP0384684A2 (de) 1990-08-29
JP2775071B2 (ja) 1998-07-09
JPH02297852A (ja) 1990-12-10
EP0384684A3 (de) 1991-02-06
DE69019198T2 (de) 1995-10-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee