WO1997034171A3 - Microlens scanner for microlithography and wide-field confocal microscopy - Google Patents

Microlens scanner for microlithography and wide-field confocal microscopy Download PDF

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Publication number
WO1997034171A3
WO1997034171A3 PCT/US1997/002949 US9702949W WO9734171A3 WO 1997034171 A3 WO1997034171 A3 WO 1997034171A3 US 9702949 W US9702949 W US 9702949W WO 9734171 A3 WO9734171 A3 WO 9734171A3
Authority
WO
WIPO (PCT)
Prior art keywords
field
image
small
array
microlens
Prior art date
Application number
PCT/US1997/002949
Other languages
French (fr)
Other versions
WO1997034171A2 (en
Inventor
Kenneth C Johnson
Original Assignee
Kenneth C Johnson
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kenneth C Johnson filed Critical Kenneth C Johnson
Priority to EP97907857A priority Critical patent/EP0991959B1/en
Priority to AU19751/97A priority patent/AU1975197A/en
Priority to JP09532621A priority patent/JP2001500628A/en
Priority to DE69729659T priority patent/DE69729659T2/en
Publication of WO1997034171A2 publication Critical patent/WO1997034171A2/en
Publication of WO1997034171A3 publication Critical patent/WO1997034171A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0036—Scanning details, e.g. scanning stages
    • G02B21/0044—Scanning details, e.g. scanning stages moving apertures, e.g. Nipkow disks, rotating lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0028—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders specially adapted for specific applications, e.g. for endoscopes, ophthalmoscopes, attachments to conventional microscopes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Radiology & Medical Imaging (AREA)
  • Surgery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

A microscopy or lithography system using a low-resolution image projection system, having a very small numerical aperture and large image field, in conjunction with a microlens array (2), each element of which has a large numerical aperture but very small field. The projection system contains a small aperture stop (7) which is imaged by the microlenses (2) onto an array of diffraction-limited microspots on the microscope sample (6) or printing surface (12) at the microlens focal point positions, and the surface is scanned to build up a complete raster image from the focal point array. The system design thus circumvents the tradeoff between image resolution and field size which is the cause of much of the complexity and expense of traditional wide-field, high-NA microscopy and microlithography systems. The system makes possible flat field, distortion-free imaging, with accurate overlay, focus, and warp compensation, over image field larger than the practical limitations of conventional imaging systems. A digital micromirror device may be used as the image source, eliminating the need for photomasks in semiconductor manufacture.
PCT/US1997/002949 1996-02-28 1997-02-20 Microlens scanner for microlithography and wide-field confocal microscopy WO1997034171A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP97907857A EP0991959B1 (en) 1996-02-28 1997-02-20 Microlens scanner for microlithography and wide-field confocal microscopy
AU19751/97A AU1975197A (en) 1996-02-28 1997-02-20 Microlens scanner for microlithography and wide-field confocal microscopy
JP09532621A JP2001500628A (en) 1996-02-28 1997-02-20 Microlens scanner for microlithography and wide field confocal microscope
DE69729659T DE69729659T2 (en) 1996-02-28 1997-02-20 MIKROLINSEN RASTER DEVICE FOR MICROLITHOGRAPHY AND FOR CONFOCUS MICROSCOPY WITH LARGE RECORDING FIELD

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1243496P 1996-02-28 1996-02-28
US60/012,434 1996-02-28

Publications (2)

Publication Number Publication Date
WO1997034171A2 WO1997034171A2 (en) 1997-09-18
WO1997034171A3 true WO1997034171A3 (en) 1998-02-26

Family

ID=21754960

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1997/002949 WO1997034171A2 (en) 1996-02-28 1997-02-20 Microlens scanner for microlithography and wide-field confocal microscopy

Country Status (6)

Country Link
US (1) US6133986A (en)
EP (1) EP0991959B1 (en)
JP (1) JP2001500628A (en)
AU (1) AU1975197A (en)
DE (1) DE69729659T2 (en)
WO (1) WO1997034171A2 (en)

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US8921098B2 (en) 1998-05-16 2014-12-30 Applied Biosystems, Llc Instrument for monitoring DNA replication
US9268983B2 (en) 2003-01-22 2016-02-23 Illumina, Inc. Optical system and method for reading encoded microbeads
US9354502B2 (en) 2012-01-12 2016-05-31 Asml Netherlands B.V. Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
US9494869B2 (en) 2011-12-27 2016-11-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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