WO1990013793A1 - Schaltung und verfahren zum messen einer die kapazitats-spannungs-charakteristik eines kapazitiven elementes beeinflussenden grosse - Google Patents

Schaltung und verfahren zum messen einer die kapazitats-spannungs-charakteristik eines kapazitiven elementes beeinflussenden grosse Download PDF

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Publication number
WO1990013793A1
WO1990013793A1 PCT/EP1990/000612 EP9000612W WO9013793A1 WO 1990013793 A1 WO1990013793 A1 WO 1990013793A1 EP 9000612 W EP9000612 W EP 9000612W WO 9013793 A1 WO9013793 A1 WO 9013793A1
Authority
WO
WIPO (PCT)
Prior art keywords
voltage
capacitance
capacitive element
capacitive
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP1990/000612
Other languages
German (de)
English (en)
French (fr)
Inventor
Uwe SCHÖNEBERG
Bedrich Hosticka
Jordan Maclay
Günther Zimmer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority to JP2505963A priority Critical patent/JPH0740057B2/ja
Priority to KR1019900702097A priority patent/KR930011421B1/ko
Publication of WO1990013793A1 publication Critical patent/WO1990013793A1/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01DMEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/12Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
    • G01D5/14Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
    • G01D5/24Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage by varying capacitance
    • G01D5/2403Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage by varying capacitance by moving plates, not forming part of the capacitor itself, e.g. shields
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01DMEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/12Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
    • G01D5/14Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
    • G01D5/24Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage by varying capacitance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/22Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
    • G01N27/227Sensors changing capacitance upon adsorption or absorption of fluid components, e.g. electrolyte-insulator-semiconductor sensors, MOS capacitors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/22Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
    • G01N27/228Circuits therefor

Definitions

  • the present invention relates to a circuit for measuring a variable influencing the capacitance-voltage characteristic of a capacitive element according to the preamble of patent claim 1 and a method for measuring a variable influencing the capacitance-voltage characteristic of a capacitive element according to the preamble of patent claim 9.
  • Capacitive MOS structures have a voltage-dependent capacitance value.
  • the course of the capacitance-voltage curve is influenced, for example in the case of capacitive MOS structures, by further variables if the metallic layer consists of catalytic metals or at least partially comprises catalytic metals. This influence of certain sizes on the voltage-dependent capacitance curve of such capacitive structures is used to form sensors with which the relevant variable can be detected which influences the voltage-dependent capacitance curve.
  • A are, for example, gas sensors that respond to certain gases, such as hydrogen sensors.
  • gases such as hydrogen sensors.
  • a constant bias voltage is applied to the capacitive MOS element, to which a high-frequency voltage signal of a predetermined amplitude is superimposed.
  • the capacitance changes in the operating point determined by the preload. This change in capacitance can be recorded in a measuring bridge.
  • the capacitive MOS element is acted upon with a bias voltage in a feedback control circuit such that it has a constant capacitance value.
  • the readjusted pretension or the shift in the voltage operating point can be used to determine the variable influencing the capacitance-voltage characteristic.
  • both of the techniques described a comparatively complex circuit is required to detect the variable influencing the capacitance-voltage characteristic.
  • Both techniques is the detection of a comparatively small signal change in the operating point, therefore both techniques lack an adequate signal / noise ratio for the ascertained variable, that is to say the moisture or the gas concentration.
  • the object of the present invention is to develop a circuit or a method for measuring a variable of the type mentioned at the outset which influences the capacitance-voltage characteristic of a capacitive element such that the accuracy in the determination the influencing size is further improved.
  • Area under the curve of the voltage-capacitance characteristic is used in a predetermined range.
  • measurement can be simply implemented by applying a periodic voltage signal of a predetermined amplitude to the capacitive element, an integration circuit integrating the output current of the capacitive element over a certain period of time.
  • the resulting integration value has a predeterminable dependency on the influencing variable, so that it is possible, for example, to use the integer read out a table whose output value is the influencing variable.
  • the resulting measuring circuit according to the invention for carrying out this measuring method essentially consists of a voltage source and an integration circuit with a capacitive element in the feedback branch that can be discharged via an electronic switch, so that the circuit has a very simple structure.
  • the dynamic measurement is carried out with an AC voltage component which moves around an operating point.
  • the influencing variable is determined on the basis of the integral over the shifted capacitance-voltage curve and not only on the basis of the detection of the change in the curve at a single voltage or capacitance point. This results in a signal / interference voltage ratio, which is considerably improved compared to the prior art, of the determined variable causing the shift in the capacitance voltage characteristic.
  • FIG. 2 shows a circuit diagram of the circuit according to the invention for measuring the capacitance-voltage cha- size influencing characteristic
  • Fig. 3 waveforms of voltage signals, as they occur in the circuit of FIG. 2;
  • the voltage-dependent capacitance profile of a capacitive MOS structure, the metal layer of which contains a catalytic metal shifts depending on an influencing variable, for example the H 2 concentration or the concentration of a be ⁇ can be certain gas in the ambient atmosphere.
  • an influencing variable for example the H 2 concentration or the concentration of a be ⁇ can be certain gas in the ambient atmosphere.
  • This shift in the capacitance-voltage characteristic was, as explained at the outset, recorded in the prior art with constant bias by measuring the change in capacitance Ac or when the capacitance value was kept constant by measuring the change in bias ⁇ v .
  • the invention provides, as can be seen from the detailed explanations below.
  • the capacitive element C s in the preferred embodiment is a capacitive MOS element whose metal layer consists of palladium, which is also referred to as a MOS palladium gate sensor.
  • the capacitive element C s is supplied by a first voltage source VS with a square wave voltage, the amplitude of which corresponds to +/- 1.5 V in a preferred embodiment with a duty cycle of 50%.
  • the capacitive element C s is connected to the inverting input of an operational amplifier OPV.
  • a second voltage source VR generates a second square-wave signal which corresponds to the first square-wave signal but is inverted with respect to it.
  • This second square-wave voltage signal is applied to a reference capacitor C r , the output of which is also connected to the inverting input of the operational amplifier OPV.
  • the capacitance of the reference capacitor C r is selected such that an offset voltage appearing at the output of the operational amplifier is compensated for with the capacitance-voltage characteristic of the capacitive element C s unaffected by the variable to be measured.
  • the operational amplifier OPV In the feedback branch of the operational amplifier OPV, ie between its output and its inverting input, there is an integration capacitor Cf, to which an electronic switch S is connected in parallel.
  • the electronic switch S ⁇ is actuated in a specific, fixed phase dependence on the phase of the first square-wave signal by means of a reset signal (cf. FIG. 3), as a result of which the integration is ended ⁇ and a voltage value at the output ⁇ A is reset.
  • the output value of the operational amplifier OPV ⁇ VA before the reset is taken over in a sample and hold circuit 1.
  • the influencing variable which is the H 2 concentration in the example, can be derived from this initial value.
  • the H 2 concentration is expediently assigned to the output voltage £ V via a table, which is determined by a D / A converter and a ROM 2 can be implemented in which the dependency of the quantities mentioned, which is shown in FIG. 4, is stored.
  • the curve shown in FIG. 4 is the result of a measurement with a palladium sensor, the catalytic metal layer of which is a 21.1 ran thick palladium layer which is arranged on a 34 ran thick silicon dioxide layer.
  • a capacitive MOS structure with a 104.5 n thick gold gate on a 34 nm thick silicon dioxide insulator layer was chosen as the reference capacitor.
  • the capacitance of the integration capacitor C is 1 nF.
  • the influencing variable is detected in the circuit according to the invention by integrating the capacitance-voltage curve of the capacitive element to determine the area under this curve, which can be expressed by the following equation:
  • the current through the capacitive sensor element C s is given by:
  • the capacitance value Cf must be chosen so that the operational amplifier OPV is not overdriven at the maximum measured variable.
  • FIG. 5 shows the two voltage-dependent capacitance curves of the reference element C r and the sensor element C s .
  • the non-optimal adaptation of the two curves leads to an offset voltage of approximately 2 V.
  • this offset voltage was taken into account.
  • the method according to the invention for measuring the variable influencing the capacitance-voltage characteristic enables compensation of disturbance variables, which affect both the actual sensor element or capacitive element C s and the reference capacitor C. influence r in the same way in their capacitance-voltage characteristics.
  • the capacitive (sensor) element C s has both a dependence of the capacitance-voltage characteristic on a variable A and on a disturbance variable B
  • this undesirable sensitivity to the disturbance variable B can be compensated for be that a capacitive MOS element is used as a reference capacitor, which is only sensitive to the disturbance variable B.
  • a large number of reference elements can be used to compensate for a corresponding number of undesirable cross-sensitivities.
  • the frequency of the square-wave signals is preferably in the kHz range.
  • the period of the rectangular voltage signals is longer than the minority carrier reaction time, so that the minority carrier accumulation is in a state of equilibrium, while the period of the rectangular voltage signals is shorter than the minority carrier generation recombination time, so that the MOS structure does not get into the equilibrium inversion range. This leads to an amplification of the signal, since the voltage-dependent capacitance curve runs downward into the area of low charge carrier depletion.
  • the behavior of the MOS capacitor in the region of low charge carrier depletion must be taken into account. After applying a jump voltage the MOS capacitor only remains in the region of deep charge carrier depletion for a certain time T and then changes into the HF inversion curve.
  • N B the doping and nn ⁇ ddiiee iinnttrriinnssiisscchhee Kconcentration for the relevant MOS capacitor.
  • the clock rate can now either be chosen so high that there is still no movement influencing the accuracy in the direction of the HF inversion curve, or it can be chosen so that the HF inversion curve is reliably reached.
  • FIG. 6 in which
  • a capacitive MOS structure with a palladium gate is used as the moisture sensor.
  • the method according to the invention can also be used for gas sensors with a MOS structure for evaluating the gas concentration as well as for measuring other variables influencing the capacitance-voltage characteristic of a capacitive element.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Power Engineering (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
PCT/EP1990/000612 1989-05-12 1990-04-17 Schaltung und verfahren zum messen einer die kapazitats-spannungs-charakteristik eines kapazitiven elementes beeinflussenden grosse Ceased WO1990013793A1 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2505963A JPH0740057B2 (ja) 1989-05-12 1990-04-17 容量素子の容量―電圧特性への影響量を測定する回路及び方法
KR1019900702097A KR930011421B1 (ko) 1989-05-12 1990-04-17 용량소자의 용량-전압특성에 영향을주는 양을 측정하는회로 및 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3915563A DE3915563C1 (enExample) 1989-05-12 1989-05-12
DEP3915563.3 1989-05-12

Publications (1)

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WO1990013793A1 true WO1990013793A1 (de) 1990-11-15

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PCT/EP1990/000612 Ceased WO1990013793A1 (de) 1989-05-12 1990-04-17 Schaltung und verfahren zum messen einer die kapazitats-spannungs-charakteristik eines kapazitiven elementes beeinflussenden grosse

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US (1) US5235267A (enExample)
EP (1) EP0471684B1 (enExample)
JP (1) JPH0740057B2 (enExample)
KR (1) KR930011421B1 (enExample)
DE (2) DE3915563C1 (enExample)
WO (1) WO1990013793A1 (enExample)

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DE4211907A1 (de) * 1991-04-19 1992-11-05 Rene Baltus Vorrichtung zum messen oder sammeln der menge eines in einer fluessigkeit enthaltenen gasanteils oder feststoffes
DK167823B1 (da) * 1991-06-18 1993-12-20 Asger Gramkow Apparat til registrering af et koelemiddels fugtigheds- og syreindhold
US5514337A (en) * 1994-01-11 1996-05-07 American Research Corporation Of Virginia Chemical sensor using eddy current or resonant electromagnetic circuit detection
JP2561040B2 (ja) * 1994-11-28 1996-12-04 日本電気株式会社 容量型センサの容量変化検出回路およびその検出方法
US5792938A (en) * 1996-12-13 1998-08-11 Panametrics, Inc. Humidity sensor with differential thermal detection and method of sensing
DE10134680A1 (de) * 2001-07-20 2003-02-06 Endress & Hauser Gmbh & Co Kg Schaltungsanrdnung für einen kapazitiven Sensor
DE10330742A1 (de) * 2003-07-07 2005-01-27 Daimlerchrysler Ag Abgassensor zur Detektion einer Gaskomponente im Abgas einer Brennkraftmaschine und Verfahren zum Betreiben eines Abgassensors
DE112005000250B4 (de) * 2004-01-27 2015-12-24 H2Scan Corp. Gassensor mit einer integrierten Referenzeinrichtung
WO2006002301A1 (en) * 2004-06-21 2006-01-05 Kele, Inc. Measuring the capacitance of a capacitive sensor with a microprocessor
JP4770530B2 (ja) * 2006-03-13 2011-09-14 株式会社デンソー 容量式湿度センサ
CN101738422B (zh) * 2009-12-23 2012-09-05 北京宝力马传感技术有限公司 一种湿度测量装置及方法
US9605307B2 (en) 2010-02-08 2017-03-28 Genia Technologies, Inc. Systems and methods for forming a nanopore in a lipid bilayer
US9678055B2 (en) 2010-02-08 2017-06-13 Genia Technologies, Inc. Methods for forming a nanopore in a lipid bilayer
US9581563B2 (en) 2011-01-24 2017-02-28 Genia Technologies, Inc. System for communicating information from an array of sensors
US8986629B2 (en) * 2012-02-27 2015-03-24 Genia Technologies, Inc. Sensor circuit for controlling, detecting, and measuring a molecular complex
US9759711B2 (en) 2013-02-05 2017-09-12 Genia Technologies, Inc. Nanopore arrays
US9551697B2 (en) 2013-10-17 2017-01-24 Genia Technologies, Inc. Non-faradaic, capacitively coupled measurement in a nanopore cell array
KR102237710B1 (ko) * 2014-06-18 2021-04-09 주식회사 해치텍 커패시터형 습도센서
US9465001B2 (en) 2014-09-15 2016-10-11 Bourns, Inc. Conductive liquid property measurement using variable phase mixing

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Also Published As

Publication number Publication date
JPH0740057B2 (ja) 1995-05-01
KR930011421B1 (ko) 1993-12-06
US5235267A (en) 1993-08-10
EP0471684B1 (de) 1993-12-15
JPH04503112A (ja) 1992-06-04
KR920700405A (ko) 1992-02-19
DE59003905D1 (de) 1994-01-27
DE3915563C1 (enExample) 1990-10-25
EP0471684A1 (de) 1992-02-26

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