WO1990013000A1 - Projection/exposure device and projection/exposure method - Google Patents
Projection/exposure device and projection/exposure method Download PDFInfo
- Publication number
- WO1990013000A1 WO1990013000A1 PCT/JP1990/000520 JP9000520W WO9013000A1 WO 1990013000 A1 WO1990013000 A1 WO 1990013000A1 JP 9000520 W JP9000520 W JP 9000520W WO 9013000 A1 WO9013000 A1 WO 9013000A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- projection
- exposed object
- exposure
- stage
- height
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02084—Processing in the Fourier or frequency domain when not imaged in the frequency domain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Mathematical Physics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019900702643A KR930011884B1 (ko) | 1989-04-21 | 1990-04-20 | 투영 노출 장치 및 투영 노출 방법 |
DE69027738T DE69027738T2 (de) | 1989-04-21 | 1990-04-20 | Projektions- und wiedergabeschaltung sowie projektions- und wiedergabeverfahren |
EP90906337A EP0426866B1 (en) | 1989-04-21 | 1990-04-20 | Projection/exposure device and projection/exposure method |
Applications Claiming Priority (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1/100025 | 1989-04-21 | ||
JP10002589 | 1989-04-21 | ||
JP1/100026 | 1989-04-21 | ||
JP1100026A JP2796347B2 (ja) | 1989-04-21 | 1989-04-21 | 投影露光方法及びその装置 |
JP1/249123 | 1989-09-27 | ||
JP1249123A JP2786270B2 (ja) | 1989-09-27 | 1989-09-27 | 干渉式傾きもしくは高さ検出装置並びに縮小投影式露光装置及びその方法 |
JP1/257033 | 1989-10-03 | ||
JP1257033A JP2895874B2 (ja) | 1989-10-03 | 1989-10-03 | 干渉縞信号の周期と位相の検出方法及び装置並びに面の傾きと高さの測定装置 |
JP2/45387 | 1990-02-28 | ||
JP2045387A JP2892747B2 (ja) | 1990-02-28 | 1990-02-28 | 傾き若しくは高さ検出方法及びその装置並びに投影露光方法及びその装置 |
JP2064155A JPH0828319B2 (ja) | 1989-04-21 | 1990-03-16 | 投影露光装置 |
JP2/64155 | 1990-03-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1990013000A1 true WO1990013000A1 (en) | 1990-11-01 |
Family
ID=27550187
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1990/000520 WO1990013000A1 (en) | 1989-04-21 | 1990-04-20 | Projection/exposure device and projection/exposure method |
Country Status (4)
Country | Link |
---|---|
US (1) | US5227862A (ja) |
EP (1) | EP0426866B1 (ja) |
DE (1) | DE69027738T2 (ja) |
WO (1) | WO1990013000A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103529650A (zh) * | 2012-07-02 | 2014-01-22 | 上海微电子装备有限公司 | 一种高度测量装置及其测量方法 |
CN107148550A (zh) * | 2014-08-29 | 2017-09-08 | 株式会社尼康 | 表面形状测定装置 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5392115A (en) * | 1989-04-21 | 1995-02-21 | Hitachi, Ltd. | Method of detecting inclination of a specimen and a projection exposure device as well as method of detecting period of periodically varying signal |
JP2830492B2 (ja) | 1991-03-06 | 1998-12-02 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
JPH05312549A (ja) * | 1992-02-06 | 1993-11-22 | Hitachi Ltd | パターン検出方法及びその装置 |
JP2913984B2 (ja) * | 1992-03-11 | 1999-06-28 | 株式会社ニコン | 傾斜角測定装置 |
FR2697351B1 (fr) * | 1992-10-28 | 1996-09-13 | Us Energy | Dispositif de determination de plan pupillaire a division de champ. |
JPH06189194A (ja) * | 1992-12-17 | 1994-07-08 | Pioneer Electron Corp | 映像合成装置 |
US5455679A (en) * | 1993-02-22 | 1995-10-03 | Canon Kabushiki Kaisha | Position detecting system |
JP3060357B2 (ja) * | 1994-06-22 | 2000-07-10 | キヤノン株式会社 | 走査型露光装置及び該走査型露光装置を用いてデバイスを製造する方法 |
US6197117B1 (en) | 1997-07-23 | 2001-03-06 | Applied Materials, Inc. | Wafer out-of-pocket detector and susceptor leveling tool |
US6099596A (en) | 1997-07-23 | 2000-08-08 | Applied Materials, Inc. | Wafer out-of-pocket detection tool |
JP2001284210A (ja) * | 2000-03-30 | 2001-10-12 | Canon Inc | 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法 |
JP3406577B2 (ja) * | 2000-07-19 | 2003-05-12 | 技研トラステム株式会社 | 物体認識方法 |
US7322250B1 (en) * | 2002-04-09 | 2008-01-29 | Rockwell Automation Technologies, Inc. | System and method for sensing torque on a rotating shaft |
JP5224667B2 (ja) * | 2005-09-29 | 2013-07-03 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
US20080105825A1 (en) * | 2006-11-08 | 2008-05-08 | Taejoon Han | Laser scanning apparatus and method using diffractive optical elements |
GB2463967B (en) * | 2008-08-26 | 2011-12-28 | Univ Glasgow | Uses of electromagnetic interference patterns |
JP2010080712A (ja) * | 2008-09-26 | 2010-04-08 | Canon Inc | 情報処理装置、露光装置、デバイス製造方法、情報処理方法およびプログラム |
JP2010192470A (ja) * | 2009-02-13 | 2010-09-02 | Canon Inc | 計測装置、露光装置及びデバイスの製造方法 |
CN102109769B (zh) * | 2009-12-29 | 2012-10-03 | 上海微电子装备有限公司 | 工件台干涉仪和掩模台干涉仪的联调装置及联调方法 |
US20120008150A1 (en) * | 2010-04-23 | 2012-01-12 | Nikon Corporation | Autofocus system and method |
DE102010041556A1 (de) | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Mikrolithographie und Verfahren zur mikrolithographischen Abbildung |
DE102010041558A1 (de) * | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zur mikrolithographischen Belichtung |
JP6632128B2 (ja) * | 2016-01-18 | 2020-01-15 | 株式会社トプコン | 液面反射式傾斜センサにおける容器の設計方法、該容器を有する傾斜センサ、及び該容器を有する傾斜センサの生産方法 |
CN108121179A (zh) * | 2016-11-30 | 2018-06-05 | 上海微电子装备(集团)股份有限公司 | 一种调焦调平装置 |
WO2019229826A1 (ja) * | 2018-05-29 | 2019-12-05 | 株式会社 日立ハイテクノロジーズ | 高さ測定装置 |
CN109059777B (zh) * | 2018-08-08 | 2019-10-29 | 中国十七冶集团有限公司 | 一种全自动激光干涉观测的方法 |
CN110967943B (zh) * | 2019-11-28 | 2022-02-08 | 中国科学院微电子研究所 | 用于光刻机调焦调平系统的光电探测器及其使用方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56118609A (en) * | 1980-02-25 | 1981-09-17 | Matsushita Electric Ind Co Ltd | Measuring method for azimuth angle of magnetic head |
JPS62115310A (ja) * | 1985-11-14 | 1987-05-27 | Mitsubishi Electric Corp | パタ−ン認識装置 |
JPS62135708A (ja) * | 1985-12-10 | 1987-06-18 | Yokogawa Electric Corp | 3次元形状測定装置 |
JPH06263802A (ja) * | 1993-03-16 | 1994-09-20 | Mitsubishi Kasei Corp | 分枝環状イヌロオリゴ糖及びその製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2911880A (en) * | 1955-08-27 | 1959-11-10 | Zeiss Carl | Interferometer |
US3601490A (en) * | 1966-12-30 | 1971-08-24 | Keuffel & Esser Co | Laser interferometer |
US4013366A (en) * | 1973-05-23 | 1977-03-22 | Office National D'etudes Et De Recherches Aerospatiales (O.N.E.R.A.) | Method and apparatus for investigation of small displacements of a solid body by means of coherent light |
FR2445512A1 (en) * | 1978-12-27 | 1980-07-25 | Thomson Csf | Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error |
NL186353C (nl) * | 1979-06-12 | 1990-11-01 | Philips Nv | Inrichting voor het afbeelden van een maskerpatroon op een substraat voorzien van een opto-elektronisch detektiestelsel voor het bepalen van een afwijking tussen het beeldvlak van een projektielenzenstelsel en het substraatvlak. |
US4626103A (en) * | 1984-03-29 | 1986-12-02 | At&T Bell Laboratories | Focus tracking system |
US4744659A (en) * | 1985-03-20 | 1988-05-17 | Ricoh Company, Ltd. | Method of and apparatus for measuring the shape of a wavefront |
US4704033A (en) * | 1986-03-06 | 1987-11-03 | Micronix Corporation | Multiple wavelength linear zone plate alignment apparatus and method |
JPH07105327B2 (ja) * | 1986-06-27 | 1995-11-13 | キヤノン株式会社 | 面位置検知装置 |
SU1413547A1 (ru) * | 1986-09-25 | 1988-07-30 | Воронежский Политехнический Институт | Цифровой панорамный измеритель частоты |
-
1990
- 1990-04-20 US US07/623,438 patent/US5227862A/en not_active Expired - Lifetime
- 1990-04-20 EP EP90906337A patent/EP0426866B1/en not_active Expired - Lifetime
- 1990-04-20 DE DE69027738T patent/DE69027738T2/de not_active Expired - Lifetime
- 1990-04-20 WO PCT/JP1990/000520 patent/WO1990013000A1/ja active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56118609A (en) * | 1980-02-25 | 1981-09-17 | Matsushita Electric Ind Co Ltd | Measuring method for azimuth angle of magnetic head |
JPS62115310A (ja) * | 1985-11-14 | 1987-05-27 | Mitsubishi Electric Corp | パタ−ン認識装置 |
JPS62135708A (ja) * | 1985-12-10 | 1987-06-18 | Yokogawa Electric Corp | 3次元形状測定装置 |
JPH06263802A (ja) * | 1993-03-16 | 1994-09-20 | Mitsubishi Kasei Corp | 分枝環状イヌロオリゴ糖及びその製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP0426866A4 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103529650A (zh) * | 2012-07-02 | 2014-01-22 | 上海微电子装备有限公司 | 一种高度测量装置及其测量方法 |
CN107148550A (zh) * | 2014-08-29 | 2017-09-08 | 株式会社尼康 | 表面形状测定装置 |
Also Published As
Publication number | Publication date |
---|---|
EP0426866B1 (en) | 1996-07-10 |
EP0426866A4 (en) | 1992-12-30 |
DE69027738D1 (de) | 1996-08-14 |
EP0426866A1 (en) | 1991-05-15 |
DE69027738T2 (de) | 1996-11-28 |
US5227862A (en) | 1993-07-13 |
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