Classifications

• • C—CHEMISTRY; METALLURGY
  • C30—CRYSTAL GROWTH
  • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
  • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
  • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
  • C30B31/10—Reaction chambers; Selection of materials therefor
  • C30B31/103—Mechanisms for moving either the charge or heater
• • C—CHEMISTRY; METALLURGY
  • C30—CRYSTAL GROWTH
  • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
  • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
  • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
  • C30B31/14—Substrate holders or susceptors

Definitions

• the invention relates to a device on an oxidation or diffusion furnace system for the semi-conductor part of feeding and closing the furnace tube of the system.
• Oxidation and diffusion furnace systems are used to coat or dope the surfaces of semiconductor wafers for integrated circuits, also referred to as wafers.
• furnace systems are generally assigned a plurality of treatment tubes, referred to as furnace tubes, which are charged with a number of semiconductor wafers for the duration of the treatment.
• the FR-OS 2 561 04 l and the EP-OS 0 258 570 as well as the FR-OS 2 553 071 and the US-PS 4,557,657 are devices for loading and closing the furnace tube of the system with the semiconductor wafers held in trays of a motor-driven paddle which can be moved in operation in the horizontal X-axis and vertical Z-axis and whose slide guide can be adjusted to the X-axis of the stovepipe.
• Feet which can be grasped directly by the paddle, b) one for interchangeable attachment of the tubular
• Adjustment-serving adjustment positions can be fixed, c) on the slide guide which can be moved in the X-axis, a guide slide which is movable in the Z-axis and which is connected to the paddle holder, d) a horizontal support plate attached to the guide slide of the Z-axis, with on this mounted paddle holder, between which a vertical B-axis in a track bearing swiveling turntable is inserted, which is provided in the horizontal and transverse to the B-axis with a roller bearing in the C-axis around which the paddle holder is tiltable.
• a laser beam holder which can be inserted into the tubular paddle shaft, is advantageously used for adjustment in conjunction with two adjusting disks which can be inserted axially centered in the stovepipe and which are provided with a fine, centrally arranged hole. These holes are sighted by means of the laser beam and the adjustment of the paddle sliding guide is adjusted until the central holes are exactly in the laser beam. The adjustment position of the paddle holder is then fixed by means of screw connections by tensioning.
• the device can also be used to exercise what is known as the “cantilever system” when an axially guided and longitudinally displaceable gate closure disc is placed on the tubular paddle shaft.
• the door lock disc for the canti lever system, as well as for the softlanding system, is resiliently mounted in the two axes lying in the vertical plane.
• This storage consists of at least three circumferentially distributed, elastically resilient holding arms which are fastened to the gate lock carrier.
• the gate lock carrier is attached to a swivel arm which can be driven or adjusted pneumatically or by motor, while it is designed for the canti lever system as a sliding bush which can be placed on the tubular paddle shaft.
• Fig. 1 is a perspective view of the device
• Fig. 2 shows the representation acc. I with the laser adjustment device
• Fig. 3 shows the representation. 1 with device set up for "canti lever” operation
• Fig. 5 shows a detail at "A” acc. 2 and 4
• Fig. 6 is an end view in the direction "R" acc. Fig. 1
• the mounting frame of the device with 1 and the guide bracket for the horizontal slide guide 15/24 of the paddle 13 is designated 2.
• the axial movement in the x-axis of the longitudinal slide 24/25 for the paddle 13 is driven by the slide guide motor 3, to the output of which the toothed belt pinion 4 is connected; the toothed belt 6 runs along the guide carrier 2 to the pulley 5th
• a vertical longitudinal slide frame 25 and on this a vertical guide slide device 23 is arranged, by means of which the vertical slide plate 26 and the horizontal support plate attached thereto can be displaced in the vertical axis Z. To drive this vertical movement is.
• a guide slide motor 7 is provided which works via a gear and a pinion 8 on a rack 9, as can be seen from Fig. 4.
• the horizontal support plate 18 can be lowered and raised operationally with the paddle 13, which is necessary for depositing the trays in the stovepipe 12 in "softlanding" system operation.
• the paddle holder 16/17 can be pivoted and tilted about the B and C axes and can therefore be precisely adjusted.
• the paddle holder consists of a lower part 17, onto which the upper part 16 is screwed under pretension.
• the tubular paddle shaft 14, which is replaceable, is clamped between the lower and upper part 16/17.
• a turntable 19 is embedded in the horizontal support plate 18 with roller bearings by means of a track bearing 20, the rotary axis of which rotates vertically in the Z axis denoted by B.
• a horizontal V-groove 22 is arranged, in which a row of rolling elements 21 is received, the abutment finds its abutment in a counter-V-groove in the lower part of the paddle shark.
• a laser emitter 32 is used, which can be inserted into the tubular paddle shaft 14 by means of a collar 31. Furthermore, an adjustment disk 33 is provided at both ends for adjustment in the oven roller 12, which is provided with a fine central bore 34, to which the laser beam is aligned. This is done by adjusting the adjustment options described here.
• the paddle holder lower part 17 is now clamped against the horizontal support plate 18 by means of screw connections, not shown, so that the paddle guide is precisely aligned with the center of the stovepipe. 3, 4 and 6, this is
• the supply pipe side edge 41 of the stove pipe is closed by the gate closure disk 42.
• the gate closure disc 42 is pivotally mounted about the pivot pin 54 by means of the adjustable pivot arm 46.
• the swivel arm 46 is connected in a rotationally fixed manner to the swivel lever 51, which is articulated on the piston rod 52 of the pneumatic piston engine 53 accommodated in the frame arm 55.
• the gate closure disc 42 is fastened with four rod-shaped holding arms 48 to a gate closure carrier 44 which is connected to the adjustable swivel arm 46.
• the rod-shaped holding arms 48 are provided with cross-cuts 45 which are alternately attached on both sides, so that these holding arms 48 are elastically deformable and have a rucksack in their relaxed normal position.
• the door lock washer 42 sealingly press against the stovepipe opening channels 41, even if the latter does not run exactly flat with the longitudinal axis X of the stovepipe.
• FIG. 3 shows the device as it is set up for "cantilever" operation.
• the paddle 13 with the trays 10 resting on it remains in the furnace tube 12 during the process.
• the device is made such that the sliding sleeve for the gate lock 47 is placed on the paddle shaft 14. This is easily possible because the paddle shaft 14 can be removed from the paddle holder 16, 17.
• the gate locking disc 42 With the sliding sleeve 47 by means of the gate lock carrier 50 and the rod-shaped holding arms 48, the gate locking disc 42 is flexibly connected, and the sliding bushing with the gate locking disc can now be pushed by hand - or if necessary also by means of a drive - onto the stovepipe opening edge 41 and thereby seal it become.

Landscapes

• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Crystallography & Structural Chemistry (AREA)
• Materials Engineering (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• Drying Of Solid Materials (AREA)
• Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Applications Claiming Priority (2)

Publications (1)

Family

ID=6836681

Family Applications (1)

Country Status (3)

Cited By (2)

Citations (5)

Family Cites Families (8)

• 1989
  • 1989-03-04 DE DE8902607U patent/DE8902607U1/de not_active Expired
• 1990
  • 1990-03-05 EP EP19900904235 patent/EP0480931A1/de not_active Withdrawn
  • 1990-03-05 WO PCT/DE1990/000156 patent/WO1990010305A1/de not_active Application Discontinuation

Patent Citations (5)

Non-Patent Citations (1)

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