WO1988004844A1 - Laser a haute frequence a excitation par decharge - Google Patents

Laser a haute frequence a excitation par decharge Download PDF

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Publication number
WO1988004844A1
WO1988004844A1 PCT/JP1987/001012 JP8701012W WO8804844A1 WO 1988004844 A1 WO1988004844 A1 WO 1988004844A1 JP 8701012 W JP8701012 W JP 8701012W WO 8804844 A1 WO8804844 A1 WO 8804844A1
Authority
WO
WIPO (PCT)
Prior art keywords
discharge
main
electrode
discharge tube
auxiliary electrode
Prior art date
Application number
PCT/JP1987/001012
Other languages
English (en)
Japanese (ja)
Inventor
Akira Egawa
Original Assignee
Fanuc Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fanuc Ltd filed Critical Fanuc Ltd
Priority to DE8888900131T priority Critical patent/DE3781146T2/de
Publication of WO1988004844A1 publication Critical patent/WO1988004844A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor

Definitions

  • the present invention is directed to a high-frequency discharge excitation laser device.
  • the apparatus according to the present invention is used, for example, when generating laser light for fine processing of a workpiece. (Background technology)
  • a laser device for generating a laser beam for micromachining has a configuration as shown in FIG. 13 and includes a discharge tube 1, electrodes 21 and 22, a high-frequency power supply circuit 4, a total reflection mirror 71, and a half mirror. 7 2 etc. are provided. He to the discharge tube passing through the flow 1, a high-frequency discharge occurs N 2, C0 2, etc. in the gas 6, it'll Ri laser beam oscillation is performed. In this case, the characteristics of the interelectrode voltage V with respect to the interelectrode current I and the laser output W are as shown in FIG.
  • the characteristics of the laser output W as shown in the lower part of FIG. 14 are obtained.
  • This laser output W As shown in the characteristics, in the process of decreasing the current I, the laser output disappears at the point d '. In other words, in the characteristics of the laser output W, the laser output cannot be controlled by the current I in the range between the point (T and the point e '. Therefore, stable laser output control when the laser output is low is performed. However, there is a problem in that it is difficult to perform the micromachining, and it is not possible to meet the demand for fine processing.
  • An object of the present invention is to provide an improved high-frequency discharge excitation laser device in which the above-mentioned problems in the prior art have been solved.
  • a cylindrical discharge tube that generates a discharge for laser light oscillation in a gas made of a dielectric and flowing through the inside, a plurality of main electrodes provided on the outer periphery of the discharge tube, and A high-frequency discharge excitation laser device having a power supply circuit for supplying a high-frequency voltage between the main electrodes in order to generate a discharge for laser light oscillation, wherein the device is mounted on the outer periphery of the discharge tube with the main electrode.
  • a high-frequency device comprising an auxiliary electrode provided close to the main electrode, wherein an auxiliary discharge can be generated between the main electrode and the auxiliary electrode in addition to the main discharge generated at the main electrode. Discharge pumped laser equipment is launched. ⁇
  • FIG. 1 shows a high-frequency discharge pumped laser according to an embodiment of the present invention. Diagram showing the configuration of the device
  • FIG. 2 is a perspective view showing a part of the apparatus shown in FIG. 1,
  • FIG. 3) and (B) are cross-sectional views showing a cross section of the discharge tube in the apparatus of FIG.
  • FIG. 4 is a characteristic diagram showing the voltage and laser output characteristics of the high-frequency discharge in the apparatus of FIG. 1,
  • FIG. 5 is a diagram for explaining by analyzing the discharge characteristics in the apparatus of FIG. 1,
  • FIG. 6 to FIG. 12 all show the deformation of the embodiment of the present invention
  • Figs. 13 and 14 show the device configuration and discharge in the prior art.
  • FIG. 15 and FIG. 16 are diagrams for explaining the discharge characteristics of the apparatus of FIG.
  • FIG. 1 shows the configuration of a high-frequency discharge excitation laser device as one embodiment of the present invention.
  • FIG. 2 is a perspective view of a part of the apparatus of FIG. 1
  • FIGS. 3 (A) and (B) are cross-sectional views of the discharge tube in the apparatus of FIG.
  • a high frequency discharge excitation laser device dielectrics for example, glass, He flowing through the ⁇ made ceramic box or the like, New 2 ', discharge laser beam oscillated in a gas 6, such as C0 2 ,
  • a plurality of main electrodes 1 provided on the outer periphery of the discharge tube, and a discharge for laser light oscillation generated in the discharge tube ⁇ .
  • a power supply circuit 4 for supplying a high-frequency voltage between the main electrodes is provided.
  • a total reflection mirror 71 and a half mirror 72 for laser light are provided.
  • the frequency can be selected from various values. For example, a voltage of 1 KV or 3 f (V, a frequency of 1 MHz to 10 MHz is practical.
  • an auxiliary electrode 3 is provided on the outer periphery of a discharge tube 1 in proximity to a main electrode 21.
  • An auxiliary discharge can be generated between the main electrode 21 and the auxiliary electrode 3 in addition to the main discharge generated between the main electrodes 21 and 22. Occasionally, it is generated to maintain high-frequency discharge in the discharge tube.
  • the distance between the main electrode and the auxiliary electrode is preferably smaller than the distance between the main electrodes.
  • FIG. 4 shows the characteristics of the voltage V with respect to the current I and the characteristics of the laser output W with respect to the current I in the high-frequency discharge excitation laser device of FIG.
  • the current rises linearly from 0 and goes to the point a corresponding to the discharge starting voltage V s. Discharge starts at point a, the voltage drops sharply to point b, and the current increases along the curved path bc. When the current is reduced from point c, the curve moves along the curved path c-b, and after point b, there is no voltage jump, and the voltage gradually decreases and drops to point 0.
  • the change from point b to point 0 via point d indicates the maintenance of the high-frequency discharge in the discharge tube in the low power state.
  • the characteristics of the laser output W with respect to the current I are shown in the lower part of Fig. 4. Is done.
  • the laser beam starts to oscillate from the point a on the X-axis to the point b corresponding to the specified voltage value, and the laser output starts to increase along the b-c path as the current increases. I do.
  • the laser output decreases as the current decreases along the path b-c, but after passing point b, the laser output does not drop sharply to 0, and the laser output is maintained and the current decreases.
  • the laser output gradually decreases along with, and goes to zero.
  • the change from the point b to the zero value via the point d in the laser output reduction process indicates the continuation of laser emission in the low power state.
  • the device shown in Fig. 1 is considered to be a power transmission circuit from a high-frequency power supply to a discharge load via a matching circuit in terms of electric circuit.
  • the matching circuit is composed of a series circuit connected as a parallel branch between the inductance in the series branch and the ground at both ends of the inductance.
  • a circuit composed of capacitance is generally used. Discharging negative, the capacitance of the load of the impedance Z d is a release Denkan'i impedance C i, the discharge path
  • the impedance on the source side shall be represented by Zo.
  • the matching condition is that the power source impedance Z o is equal to the conjugate value of the discharge load impedance Z d .
  • auxiliary discharge load Z d As a method for reducing the I impedance of discharge load auxiliary discharge load Z d 'by the auxiliary discharge Ri by the be present in parallel with the main discharge «load Z d, performs to reduce the total Inpi one dance.
  • an auxiliary electrode is provided.
  • the discharge load generated by the auxiliary electrode is represented by a series circuit of the discharge tube capacitance C 2 and the auxiliary discharge path resistance R d2 .
  • the auxiliary discharge load impedance Z d ' is expressed by the + R d2.
  • z dP be the parallel combined impedance of z d and z d ′.
  • Z d ′ must be an appropriately large value that does not affect the value of Z d , that is,
  • Z dm in is the minimum value of the main discharge impedance at which the main discharge and the power supply can be matched
  • Z d ma x are main discharge and the maximum value of the power supply can be inconsistent main discharge I impedance.
  • FIGS. 5 and 16 The change of the discharge impedance with respect to the discharge input as described above is shown in FIGS. 5 and 16.
  • the horizontal axis is discharge
  • the s input and the vertical axis represent the impedance ⁇ ⁇ value I zi.
  • the thickness may be larger than the wall thickness of the discharge tube 1 at the portion where the main electrodes 21 and 22 are provided.
  • Fig. 6 shows that the increase in thickness was achieved by enlarging the tube wall
  • Fig. 7 shows that the dielectric material was stacked on the tube wall.
  • the dielectric constant of the discharge tube dielectric in the portion where the auxiliary electrode is provided is smaller than the dielectric constant of the discharge tube dielectric in the portion where the main electrode is provided. It is possible to select.
  • the discharge tube 1 in the portion where the auxiliary electrode 3 is provided is provided.
  • the thickness of the tube wall of the discharge tube 1 can be made larger than the thickness of the tube wall of the discharge tube 1 where the main electrodes 21 and 22 are provided.
  • Fig. 6 shows that the thickness was increased by enlarging the tube wall
  • Fig. 7 was realized by stacking the dielectric material on the tube wall.
  • the material was selected such that the dielectric constant of the discharge tube dielectric in the portion where the auxiliary electrode was provided was smaller than the dielectric constant of the discharge tube dielectric in the portion where the main electrode was provided. It is possible to
  • a barrier can be provided between the auxiliary electrode and the main electrode as shown in FIG.
  • circuit connection to the main electrode and the auxiliary electrode can be replaced by the circuit connection shown in FIG. 10, FIG. 11, or FIG. 12, instead of the one shown in FIG. is there.
  • FIG. 10 power supply circuits 41 and 42 are provided.
  • the auxiliary electrode is provided not on the entire outer periphery of the discharge tube but on a part thereof.
  • an auxiliary discharge is easily generated between the main electrode and the auxiliary electrode, and the high-frequency discharge is maintained even in a low power state, and the laser light oscillation is maintained.
  • the range of laser light output is widened, and in particular, when performing fine processing using laser light output, high-precision processing can be performed stably, and as a high-frequency discharge excitation laser device used for processing. And very useful things are realized.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

Laser à haute fréquence à excitation par décharge, dans lequel des électrodes auxilaires (3) sont montées à proximité des électrodes principales (21), (22) à la périphérie externe d'un tube de décharge (1), de sorte qu'une décharge auxiliaire se produit entre les électrodes principales et les électrodes auxiliaires, en plus de la décharge principale se produisant entre les électrodes principales. Par conséquent, même dans des conditions de faible alimentation électrique, une décharge à haute fréquence est maintenue pour entretenir l'oscillation du faisceau laser. La plage de sortie du faisceau laser est ainsi élargie, ce qui permet d'exécuter un finissage de grande précision.
PCT/JP1987/001012 1986-12-23 1987-12-22 Laser a haute frequence a excitation par decharge WO1988004844A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE8888900131T DE3781146T2 (de) 1986-12-23 1987-12-22 Hf-entladungsangeregter laser.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61305533A JPH0787255B2 (ja) 1986-12-23 1986-12-23 高周波放電励起レ−ザ装置
JP61/305533 1986-12-23

Publications (1)

Publication Number Publication Date
WO1988004844A1 true WO1988004844A1 (fr) 1988-06-30

Family

ID=17946298

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1987/001012 WO1988004844A1 (fr) 1986-12-23 1987-12-22 Laser a haute frequence a excitation par decharge

Country Status (5)

Country Link
US (1) US4885754A (fr)
EP (1) EP0294492B1 (fr)
JP (1) JPH0787255B2 (fr)
DE (1) DE3781146T2 (fr)
WO (1) WO1988004844A1 (fr)

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JPH01258482A (ja) * 1988-04-08 1989-10-16 Fanuc Ltd ガスレーザ装置用放電管
US5040184A (en) * 1990-06-04 1991-08-13 Raytheon Company Starter circuit for an RF laser
DE4232843A1 (de) * 1992-09-30 1994-03-31 Siemens Ag Diffusionsgekühlter CO¶2¶-Bandleiterlaser mit reduzierter Zündspannung
US5313488A (en) * 1993-02-04 1994-05-17 Honeywell Inc. Ring laser discharge starting concept
DE4416900C2 (de) * 1994-05-13 2001-02-01 Deutsch Zentr Luft & Raumfahrt Gasentladungsstruktur
US5682400A (en) * 1995-09-27 1997-10-28 Krasnov; Alexander V. Supersonic and subsonic laser with high frequency discharge excitation
US6198762B1 (en) 1996-09-26 2001-03-06 Yuri Krasnov Supersonic and subsonic laser with RF discharge excitation
US6636545B2 (en) 1996-09-26 2003-10-21 Alexander V. Krasnov Supersonic and subsonic laser with radio frequency excitation
US6963596B2 (en) * 2004-01-28 2005-11-08 Coherent, Inc. Pre-ionizer for RF-energized gas laser
US7263116B2 (en) * 2004-08-05 2007-08-28 Coherent, Inc. Dielectric coupled CO2 slab laser
DE502005006162D1 (de) * 2005-11-12 2009-01-15 Huettinger Elektronik Gmbh Verfahren zum Betrieb einer Vakuumplasmaprozessanlage
JP4598852B2 (ja) * 2008-11-07 2010-12-15 ファナック株式会社 ガスレーザ発振器で補助放電の消滅を判別する方法およびガスレーザ発振器
JP5513571B2 (ja) * 2012-09-06 2014-06-04 ファナック株式会社 放電開始を判定する機能を有するガスレーザ発振器
CN103872557B (zh) * 2012-12-11 2016-09-28 中国科学院大连化学物理研究所 一种非均匀电极单重态氧发生装置
US10333268B2 (en) * 2016-05-05 2019-06-25 Access Laser Dielectric electrode assembly and method of manufacture thereof
US10593776B2 (en) 2016-05-05 2020-03-17 Auroma Technologies, Co., Llc. Dielectric electrode assembly and method of manufacture thereof
US11095088B1 (en) 2018-02-21 2021-08-17 Zoyka Llc Multi-pass coaxial molecular gas laser

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JPS61159780A (ja) * 1985-01-07 1986-07-19 Mitsubishi Electric Corp 無声放電式ガスレ−ザ装置
JPH06174381A (ja) * 1992-12-01 1994-06-24 Ngk Insulators Ltd 炉の雰囲気制御装置
JPH06218781A (ja) * 1993-01-26 1994-08-09 Ube Ind Ltd 射出成形用スクリュ

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US3614653A (en) * 1963-05-02 1971-10-19 Bell Telephone Labor Inc Optical maser
US4593397A (en) * 1979-03-15 1986-06-03 Gte Laboratories Incorporated Electrodeless short pulse laser
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JPS6037189A (ja) * 1983-08-09 1985-02-26 Mitsubishi Electric Corp 無声放電励起同軸型レ−ザ発振器
JPS6052070A (ja) * 1983-09-01 1985-03-23 Mitsubishi Electric Corp 同軸型レ−ザ発振器
US4596018A (en) * 1983-10-07 1986-06-17 Minnesota Laser Corp. External electrode transverse high frequency gas discharge laser
JPS60244086A (ja) * 1984-05-18 1985-12-03 Mitsubishi Electric Corp 同軸型レ−ザ発振器

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JPS61159780A (ja) * 1985-01-07 1986-07-19 Mitsubishi Electric Corp 無声放電式ガスレ−ザ装置
JPH06174381A (ja) * 1992-12-01 1994-06-24 Ngk Insulators Ltd 炉の雰囲気制御装置
JPH06218781A (ja) * 1993-01-26 1994-08-09 Ube Ind Ltd 射出成形用スクリュ

Non-Patent Citations (1)

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Title
See also references of EP0294492A4 *

Also Published As

Publication number Publication date
EP0294492B1 (fr) 1992-08-12
JPS63158885A (ja) 1988-07-01
US4885754A (en) 1989-12-05
DE3781146T2 (de) 1993-03-18
JPH0787255B2 (ja) 1995-09-20
DE3781146D1 (de) 1992-09-17
EP0294492A1 (fr) 1988-12-14
EP0294492A4 (fr) 1989-02-21

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