USD911985S1 - Gas introduction plate for plasma etching apparatus for etching semiconductor wafer - Google Patents
Gas introduction plate for plasma etching apparatus for etching semiconductor wafer Download PDFInfo
- Publication number
- USD911985S1 USD911985S1 US29/671,716 US201829671716F USD911985S US D911985 S1 USD911985 S1 US D911985S1 US 201829671716 F US201829671716 F US 201829671716F US D911985 S USD911985 S US D911985S
- Authority
- US
- United States
- Prior art keywords
- semiconductor wafer
- gas introduction
- introduction plate
- plasma etching
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The broken lines shown in the drawings represent portions of the gas introduction plate for plasma etching apparatus for etching semiconductor wafer that form no part of the claimed design. The dot-dash broken lines of FIGS. 2-5 define the bounds of the enlarged portion views of FIGS. 3 and 5 and form no part of the claimed design. All sides not shown form no part of the claimed design.
Claims (1)
- The ornamental design for a gas introduction plate for plasma etching apparatus for etching semiconductor wafer, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2018-12651F JP1624668S (en) | 2018-06-08 | 2018-06-08 | |
JP2018-012651 | 2018-06-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD911985S1 true USD911985S1 (en) | 2021-03-02 |
Family
ID=65358714
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/671,716 Active USD911985S1 (en) | 2018-06-08 | 2018-11-29 | Gas introduction plate for plasma etching apparatus for etching semiconductor wafer |
Country Status (2)
Country | Link |
---|---|
US (1) | USD911985S1 (en) |
JP (1) | JP1624668S (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1005974S1 (en) * | 2022-05-19 | 2023-11-28 | Asm Ip Holding B.V. | Gas distributor for semiconductor manufacturing apparatus |
USD1037778S1 (en) * | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
Citations (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD363464S (en) * | 1992-08-27 | 1995-10-24 | Tokyo Electron Yamanashi Limited | Electrode for a semiconductor processing apparatus |
USD411516S (en) * | 1996-03-15 | 1999-06-29 | Tokyo Electron Limited | Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
US6379466B1 (en) * | 1992-01-17 | 2002-04-30 | Applied Materials, Inc. | Temperature controlled gas distribution plate |
US20050056218A1 (en) * | 2002-02-14 | 2005-03-17 | Applied Materials, Inc. | Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate |
US20050252447A1 (en) * | 2004-05-11 | 2005-11-17 | Applied Materials, Inc. | Gas blocker plate for improved deposition |
US20070131168A1 (en) * | 2005-10-31 | 2007-06-14 | Hisashi Gomi | Gas Supplying unit and substrate processing apparatus |
US20090159002A1 (en) * | 2007-12-19 | 2009-06-25 | Kallol Bera | Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution |
USD654882S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Gas-separating plate for reactor for manufacturing semiconductor |
USD655261S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Gas-separating plate for reactor for manufacturing semiconductor |
USD655260S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Gas-separating plate for reactor for manufacturing semiconductor |
US8206506B2 (en) * | 2008-07-07 | 2012-06-26 | Lam Research Corporation | Showerhead electrode |
US8402918B2 (en) * | 2009-04-07 | 2013-03-26 | Lam Research Corporation | Showerhead electrode with centering feature |
US8419959B2 (en) * | 2009-09-18 | 2013-04-16 | Lam Research Corporation | Clamped monolithic showerhead electrode |
US8573152B2 (en) * | 2010-09-03 | 2013-11-05 | Lam Research Corporation | Showerhead electrode |
USD694790S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD697038S1 (en) * | 2011-09-20 | 2014-01-07 | Tokyo Electron Limited | Baffle plate |
USD733257S1 (en) * | 2014-02-14 | 2015-06-30 | Hansgrohe Se | Overhead shower |
USD736348S1 (en) * | 2014-07-07 | 2015-08-11 | Jiangmen Triumph Rain Showers Co., LTD | Spray head for a shower |
USD745641S1 (en) * | 2011-06-20 | 2015-12-15 | Neoperl Gmbh | Stream straightener for faucet |
USD751176S1 (en) * | 2014-08-07 | 2016-03-08 | Hansgrohe Se | Overhead shower |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
USD796458S1 (en) * | 2016-01-08 | 2017-09-05 | Asm Ip Holding B.V. | Gas flow control plate for semiconductor manufacturing apparatus |
USD880437S1 (en) * | 2018-02-01 | 2020-04-07 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
-
2018
- 2018-06-08 JP JPD2018-12651F patent/JP1624668S/ja active Active
- 2018-11-29 US US29/671,716 patent/USD911985S1/en active Active
Patent Citations (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6379466B1 (en) * | 1992-01-17 | 2002-04-30 | Applied Materials, Inc. | Temperature controlled gas distribution plate |
USD363464S (en) * | 1992-08-27 | 1995-10-24 | Tokyo Electron Yamanashi Limited | Electrode for a semiconductor processing apparatus |
USD411516S (en) * | 1996-03-15 | 1999-06-29 | Tokyo Electron Limited | Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
US20050056218A1 (en) * | 2002-02-14 | 2005-03-17 | Applied Materials, Inc. | Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate |
US20050252447A1 (en) * | 2004-05-11 | 2005-11-17 | Applied Materials, Inc. | Gas blocker plate for improved deposition |
US20070131168A1 (en) * | 2005-10-31 | 2007-06-14 | Hisashi Gomi | Gas Supplying unit and substrate processing apparatus |
US20090159002A1 (en) * | 2007-12-19 | 2009-06-25 | Kallol Bera | Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution |
US8206506B2 (en) * | 2008-07-07 | 2012-06-26 | Lam Research Corporation | Showerhead electrode |
US8402918B2 (en) * | 2009-04-07 | 2013-03-26 | Lam Research Corporation | Showerhead electrode with centering feature |
US8419959B2 (en) * | 2009-09-18 | 2013-04-16 | Lam Research Corporation | Clamped monolithic showerhead electrode |
US8573152B2 (en) * | 2010-09-03 | 2013-11-05 | Lam Research Corporation | Showerhead electrode |
USD655260S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Gas-separating plate for reactor for manufacturing semiconductor |
USD654882S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Gas-separating plate for reactor for manufacturing semiconductor |
USD655261S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Gas-separating plate for reactor for manufacturing semiconductor |
USD745641S1 (en) * | 2011-06-20 | 2015-12-15 | Neoperl Gmbh | Stream straightener for faucet |
USD694790S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD697038S1 (en) * | 2011-09-20 | 2014-01-07 | Tokyo Electron Limited | Baffle plate |
USD733257S1 (en) * | 2014-02-14 | 2015-06-30 | Hansgrohe Se | Overhead shower |
USD736348S1 (en) * | 2014-07-07 | 2015-08-11 | Jiangmen Triumph Rain Showers Co., LTD | Spray head for a shower |
USD751176S1 (en) * | 2014-08-07 | 2016-03-08 | Hansgrohe Se | Overhead shower |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
USD796458S1 (en) * | 2016-01-08 | 2017-09-05 | Asm Ip Holding B.V. | Gas flow control plate for semiconductor manufacturing apparatus |
USD880437S1 (en) * | 2018-02-01 | 2020-04-07 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1005974S1 (en) * | 2022-05-19 | 2023-11-28 | Asm Ip Holding B.V. | Gas distributor for semiconductor manufacturing apparatus |
USD1037778S1 (en) * | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
Also Published As
Publication number | Publication date |
---|---|
JP1624668S (en) | 2019-02-18 |
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