USD1042340S1 - Tubular reactor - Google Patents

Tubular reactor Download PDF

Info

Publication number
USD1042340S1
USD1042340S1 US29/830,627 US202229830627F USD1042340S US D1042340 S1 USD1042340 S1 US D1042340S1 US 202229830627 F US202229830627 F US 202229830627F US D1042340 S USD1042340 S US D1042340S
Authority
US
United States
Prior art keywords
tubular reactor
view
elevational view
design
tubular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/830,627
Other languages
English (en)
Inventor
Yusaku OKAJIMA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: OKAJIMA, YUSAKU
Application granted granted Critical
Publication of USD1042340S1 publication Critical patent/USD1042340S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

US29/830,627 2021-09-15 2022-03-14 Tubular reactor Active USD1042340S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021019931F JP1713189S (cs) 2021-09-15 2021-09-15
JP2021019931D 2021-09-15

Publications (1)

Publication Number Publication Date
USD1042340S1 true USD1042340S1 (en) 2024-09-17

Family

ID=81209957

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/830,627 Active USD1042340S1 (en) 2021-09-15 2022-03-14 Tubular reactor

Country Status (2)

Country Link
US (1) USD1042340S1 (cs)
JP (1) JP1713189S (cs)

Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5618349A (en) * 1993-07-24 1997-04-08 Yamaha Corporation Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
US20030221779A1 (en) * 2002-03-28 2003-12-04 Kazuyuki Okuda Substrate processing apparatus
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090250005A1 (en) * 2008-04-03 2009-10-08 Tokyo Electron Limited Reaction tube and heat processing apparatus for a semiconductor process
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
TWD175510S (zh) 2015-09-18 2016-05-11 亞智科技股份有限公司 吸附元件
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
US20160368031A1 (en) * 2015-06-17 2016-12-22 Vistec Electron Beam Gmbh Particle beam apparatus and method for operating a particle beam apparatus
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
TWD230585S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管
TWD230584S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管
TWD230586S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管

Patent Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5618349A (en) * 1993-07-24 1997-04-08 Yamaha Corporation Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
US20030221779A1 (en) * 2002-03-28 2003-12-04 Kazuyuki Okuda Substrate processing apparatus
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090250005A1 (en) * 2008-04-03 2009-10-08 Tokyo Electron Limited Reaction tube and heat processing apparatus for a semiconductor process
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
US20160368031A1 (en) * 2015-06-17 2016-12-22 Vistec Electron Beam Gmbh Particle beam apparatus and method for operating a particle beam apparatus
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
TWD175510S (zh) 2015-09-18 2016-05-11 亞智科技股份有限公司 吸附元件
TWD230585S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管
TWD230584S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管
TWD230586S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Notification of Review Opinions dated May 2, 2023 in corresponding TW Application 111300907.

Also Published As

Publication number Publication date
JP1713189S (cs) 2022-04-21

Similar Documents

Publication Publication Date Title
USD980016S1 (en) Water bottle
USD896291S1 (en) Robot
USD970312S1 (en) Bartending tool holder
USD974046S1 (en) Bath brush
USD995811S1 (en) Male masturbator
USD935211S1 (en) Chair
USD899357S1 (en) Generator
USD986383S1 (en) Faucet
USD921799S1 (en) Hoverboard
USD919425S1 (en) Container
USD921798S1 (en) Hoverboard
USD919728S1 (en) Hoverboard
USD948509S1 (en) Mouse
USD922508S1 (en) Hoverboard
USD921801S1 (en) Hoverboard
USD977017S1 (en) Scooter
USD1000443S1 (en) Mouse
USD944669S1 (en) T-shirt ruler guide
USD1096269S1 (en) Container preform
USD919727S1 (en) Hoverboard
USD921797S1 (en) Hoverboard
USD989439S1 (en) Baby footed pajamas
USD1013474S1 (en) Pipe cutter
USD973660S1 (en) Keyboard
USD1029900S1 (en) Speed reducer

Legal Events

Date Code Title Description
FEPP Fee payment procedure

Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY