|
JP3024449B2
(ja)
*
|
1993-07-24 |
2000-03-21 |
ヤマハ株式会社 |
縦型熱処理炉及び熱処理方法
|
|
USD405429S
(en)
*
|
1997-01-31 |
1999-02-09 |
Tokyo Electron Limited |
Processing tube for use in a semiconductor wafer heat processing apparatus
|
|
USD424024S
(en)
*
|
1997-01-31 |
2000-05-02 |
Tokyo Electron Limited |
Quartz process tube
|
|
USD405431S
(en)
*
|
1997-08-20 |
1999-02-09 |
Tokyo Electron Ltd. |
Tube for use in a semiconductor wafer heat processing apparatus
|
|
US5948300A
(en)
*
|
1997-09-12 |
1999-09-07 |
Kokusai Bti Corporation |
Process tube with in-situ gas preheating
|
|
JP3985899B2
(ja)
*
|
2002-03-28 |
2007-10-03 |
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|
|
TWD118408S1
(zh)
*
|
2006-02-20 |
2007-08-01 |
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|
|
USD600659S1
(en)
*
|
2006-09-12 |
2009-09-22 |
Tokyo Electron Limited |
Process tube for manufacturing semiconductor wafers
|
|
TWD127410S1
(zh)
*
|
2007-04-20 |
2009-02-11 |
東京威力科創股份有限公司 |
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|
|
TWD125601S
(zh)
*
|
2007-05-08 |
2008-10-21 |
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半導體製造用加工處理管
|
|
JP4930438B2
(ja)
*
|
2008-04-03 |
2012-05-16 |
東京エレクトロン株式会社 |
反応管及び熱処理装置
|
|
TWD133943S1
(zh)
|
2008-05-09 |
2010-03-21 |
日立國際電氣股份有限公司 |
反應管
|
|
USD742339S1
(en)
|
2014-03-12 |
2015-11-03 |
Hitachi Kokusai Electric Inc. |
Reaction tube
|
|
JP1534828S
(cs)
*
|
2015-02-23 |
2015-10-13 |
|
|
|
JP1534829S
(cs)
*
|
2015-02-23 |
2015-10-13 |
|
|
|
JP1535455S
(cs)
*
|
2015-02-25 |
2015-10-19 |
|
|
|
DE102015211090A1
(de)
*
|
2015-06-17 |
2016-12-22 |
Vistec Electron Beam Gmbh |
Korpuskularstrahlgerät und Verfahren zum Betreiben eines Korpuskularstrahlgeräts
|
|
JP1546345S
(cs)
*
|
2015-09-04 |
2016-03-22 |
|
|
|
JP1546512S
(cs)
*
|
2015-09-04 |
2016-03-22 |
|
|
|
TWD175510S
(zh)
|
2015-09-18 |
2016-05-11 |
亞智科技股份有限公司 |
吸附元件
|
|
JP1731789S
(cs)
*
|
2022-03-01 |
2022-12-09 |
|
|
|
JP1731877S
(cs)
*
|
2022-03-01 |
2022-12-09 |
|
|
|
JP1731878S
(cs)
*
|
2022-03-01 |
2022-12-09 |
|
|