USB530873I5 - - Google Patents

Info

Publication number
USB530873I5
USB530873I5 US53087374A USB530873I5 US B530873 I5 USB530873 I5 US B530873I5 US 53087374 A US53087374 A US 53087374A US B530873 I5 USB530873 I5 US B530873I5
Authority
US
United States
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19712125910 external-priority patent/DE2125910A1/de
Application filed filed Critical
Priority to US05/530,873 priority Critical patent/US4001016A/en
Publication of USB530873I5 publication Critical patent/USB530873I5/en
Application granted granted Critical
Publication of US4001016A publication Critical patent/US4001016A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52—Amides or imides
    • C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/914—Polymers modified by chemical after-treatment derived from polycarboxylic acids and polyhydroxy compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
US05/530,873 1971-05-25 1974-12-09 Polymers which can be cross-linked by photopolymerization Expired - Lifetime US4001016A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US05/530,873 US4001016A (en) 1971-05-25 1974-12-09 Polymers which can be cross-linked by photopolymerization

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE19712125910 DE2125910A1 (de) 1971-05-25 1971-05-25 Durch Photopolymerisation vernetzbare Polymere
DT2125910 1971-05-25
US25616272A 1972-05-23 1972-05-23
US05/530,873 US4001016A (en) 1971-05-25 1974-12-09 Polymers which can be cross-linked by photopolymerization

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US25616272A Continuation-In-Part 1971-05-25 1972-05-23

Publications (2)

Publication Number Publication Date
USB530873I5 true USB530873I5 (fr) 1976-02-17
US4001016A US4001016A (en) 1977-01-04

Family

ID=27183453

Family Applications (1)

Application Number Title Priority Date Filing Date
US05/530,873 Expired - Lifetime US4001016A (en) 1971-05-25 1974-12-09 Polymers which can be cross-linked by photopolymerization

Country Status (1)

Country Link
US (1) US4001016A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4334970A (en) 1976-11-05 1982-06-15 The Richardson Company Radiation curable solvent-free compositions recovery system

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141736A (en) * 1976-11-18 1979-02-27 Minnesota Mining And Manufacturing Company Photosensitive composite sheet material containing poly-2,5-oxolane
US4286518A (en) * 1979-07-25 1981-09-01 Armstrong World Industries, Inc. Print screen stencil
US4375398A (en) * 1982-03-12 1983-03-01 Gaf Corporation Electron beam sensitive resist of an anhydride copolymer
US4448876A (en) * 1982-05-24 1984-05-15 Gaf Corporation Electron beam sensitive resist
DE3689606T2 (de) * 1985-10-22 1994-05-19 Kuraray Co Herstellungsverfahren für Phasengitter vom zusammengesetzten Muster-Refraktionstyp.
JPH0762048B2 (ja) * 1986-09-25 1995-07-05 工業技術院長 感光性樹脂
JP3771714B2 (ja) * 1998-05-12 2006-04-26 互応化学工業株式会社 感光性樹脂組成物及びプリント配線板製造用フォトソルダーレジストインク
US20030157000A1 (en) * 2002-02-15 2003-08-21 Kimberly-Clark Worldwide, Inc. Fluidized bed activated by excimer plasma and materials produced therefrom
WO2010118306A1 (fr) * 2009-04-09 2010-10-14 The Children's Hospital Of Philadelphia Fixation photoactivée de cholestérol à des surfaces de polyuréthane pour une adhésion de cellules endothéliales

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE566942A (fr) * 1954-03-26
US3043805A (en) * 1958-08-05 1962-07-10 Du Pont Polymeric amides and their preparation
US2972540A (en) * 1958-08-05 1961-02-21 Du Pont Photopolymerizable compositions and elements
DE1248946B (fr) * 1959-01-26
DE1447592A1 (de) * 1964-12-24 1969-02-13 Agfa Gevaert Ag Lichtvernetzbare Schichten
GB1090142A (en) * 1965-02-26 1967-11-08 Agfa Gevaert Nv Photochemical insolubilisation of polymers
DE1447928A1 (de) * 1965-08-04 1968-12-12 Basf Ag Verfahren zum Herstellen von Reliefformen fuer Druckzwecke
DE1547864A1 (de) * 1967-01-18 1969-12-04 Kalle Ag Lichtempfindliche Kopierschicht
JPS4825424B1 (fr) * 1969-08-05 1973-07-28
US3858510A (en) * 1971-03-11 1975-01-07 Asahi Chemical Ind Relief structures prepared from photosensitive compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4334970A (en) 1976-11-05 1982-06-15 The Richardson Company Radiation curable solvent-free compositions recovery system

Also Published As

Publication number Publication date
US4001016A (en) 1977-01-04

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