US7361963B2 - Optical film - Google Patents

Optical film Download PDF

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Publication number
US7361963B2
US7361963B2 US11/301,873 US30187305A US7361963B2 US 7361963 B2 US7361963 B2 US 7361963B2 US 30187305 A US30187305 A US 30187305A US 7361963 B2 US7361963 B2 US 7361963B2
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island structures
metal film
optical film
major surface
film
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US20060127604A1 (en
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Masahiro Ikadai
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Nippon Sheet Glass Co Ltd
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Nippon Sheet Glass Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0289—Diffusing elements; Afocal elements characterized by the use used as a transflector
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
    • G02B5/0858—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/06—Substrate layer characterised by chemical composition
    • C09K2323/061—Inorganic, e.g. ceramic, metallic or glass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12007—Component of composite having metal continuous phase interengaged with nonmetal continuous phase
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12528—Semiconductor component

Definitions

  • the present invention relates to an optical film, and more particularly, to an optical film suitable for use in a light-reflecting substrate having a thin metal film coated on a surface thereof and used for a reflection type liquid crystal display apparatus or a joint reflection/transmission type liquid crystal display apparatus.
  • liquid crystal display apparatuses have been widely used, in particular, for displays of small-to medium-sized apparatuses, this being due to characteristic features such as it being possible to make the apparatus thinner and more compact than with a conventional CRT display, it being possible to operate the display at a low voltage, and it being possible to reduce electrical power consumption and thus save energy.
  • liquid crystal display apparatuses in particular reflection type liquid crystal display apparatuses, which use incident light from outside as a display light source, are constructed, for example, from a liquid crystal layer, and a light-reflecting substrate having an optical film coated with a thin film of a metal such as a silver alloy.
  • a conventionally required backlight is not required, and hence such reflection type liquid crystal display apparatuses can be made light and thin, and are thus widely used as liquid crystal display apparatuses.
  • another optical film is constructed from a heat-reflecting metal film made of a silver-based metal formed on a transparent substrate, and a transparent nitride film made of a nitride of at least one metal selected from the group consisting of silicon, boron and aluminum formed on the heat-reflecting metal film, whereby oxidation of the heat-reflecting metal film is suppressed by the transparent nitride film (see, for example, Japanese Laid-open Patent Publication (Kokai) No. H06-345491).
  • another optical film is constructed from a transparent high refractive index layer made of indium tin oxide (hereinafter referred to as “ITO”) formed on a major surface of a transparent substrate, a thin metal film formed on the transparent high refractive index layer, and another transparent high refractive index layer made of ITO formed on the thin metal film, whereby the environmental durability of the thin metal film is increased by the adjacent transparent high refractive index layers made of ITO (see, for example, Japanese Laid-open Patent Publication (Kokai) No. H09-272172).
  • ITO indium tin oxide
  • optical films in particular for the optical film having thin metal films that are stabilized through their crystallinity, there is a problem that in an oxidizing atmosphere, the effect of the redox potential on material values is large, and hence the durability of the thin metal films drops.
  • the optical films having a transparent nitride film made of a metal nitride or transparent high refractive index layers made of ITO it is difficult to obtain desired optical properties due to the overall thickness of the optical film becoming high, and moreover there is a problem that the thin metal film is exposed to the atmosphere due to minute pinholes present in the transparent nitride film or the transparent high refractive index layers made of ITO, and hence the durability of the thin metal film drops.
  • an optical film formed on a major surface of a substrate comprising a metal film formed on the major surface of the substrate and at least one set of a plurality of first island structures formed scattered as islands on a major surface of the metal film and a plurality of second island structures formed scattered as islands on the major surface of the substrate, wherein the at least one set of the plurality of first island structures and the plurality of second island structures are made of at least one selected from the group consisting of metals and metal oxides having a different standard electrode potential to a metal of the metal film.
  • a mean pitch of the at least one set of the plurality of first island structures and the plurality of second island structures is not less than 400 nm.
  • the mean pitch is in a range of 400 nm to 900 nm.
  • a percentage ratio of an equivalent circle mean diameter to the mean pitch for the at least one set of the plurality of first island structures and the plurality of second island structures is in a range of 10% to 90%.
  • the metal film is made of at least one selected from the group consisting of metals having a positive standard electrode potential
  • the at least one set of the plurality of first island structures and the plurality of second island structures are made of at least one selected from the group consisting of metals and metal oxides having a negative standard electrode potential.
  • the metal film is made of at least one selected from the group consisting of silver, chromium, and aluminum.
  • the at least one set of the plurality of first island structures and the plurality of second island structures comprise indium tin oxide.
  • the substrate is made of glass.
  • an optical film is used in a light-reflecting substrate for an apparatus selected from a reflection type liquid crystal display apparatus and a joint reflection/transmission type liquid crystal display apparatus.
  • the present invention there are at least one set of a plurality of first island structures formed scattered as islands on the major surface of the metal film and/or a plurality of second island structures formed scattered as islands on the major surface of the substrate, wherein the first and/or second island structures are made of at least one selected from the group consisting of metals and metal oxides having a different standard electrode potential to the metal of the metal film.
  • the optical film can be made thin, whereby the degree of freedom for the film design and the optical properties can be improved, and hence desired optical properties can be obtained easily.
  • plasma oscillations of free electrons having different phases arise between the first and/or second island structures and the metal film, and a redox potential change for an oxidation reaction of the first and/or second island structures and a redox potential change for an oxidation reaction of the metal film stop substantially in an equilibrium state, whereby corrosion of the metal film can be prevented, and hence the durability of the optical film can be improved.
  • FIG. 1 is a sectional view schematically showing the structure of a reflection type liquid crystal display apparatus having an optical film according to an embodiment of the present invention
  • FIGS. 2A and 2B are views showing a reflection type liquid crystal substrate appearing in FIG. 1 ; specifically:
  • FIG. 2A is a partially cut away perspective view
  • FIG. 2B is a sectional view
  • FIG. 3 is a view useful in explaining equivalent circles for island structures formed on a major surface of a glass substrate or a metal film;
  • FIG. 4 is a flow diagram showing a method of manufacturing the reflection type liquid crystal substrate shown in FIGS. 2A and 2B ;
  • FIGS. 5A to 5D are views useful in explaining steps in the method of manufacturing the reflection type liquid crystal substrate in FIGS. 2A and 2B .
  • the present inventors carried out assiduous research to attain the above object, and as a result discovered that, in the case of an optical film formed on a major surface of a substrate, if the optical film is comprised of a metal film formed on the major surface of the substrate, and a plurality of first island structures formed scattered as islands on a major surface of the metal film and/or a plurality of second island structures formed scattered as islands on the major surface of the substrate, wherein the first and/or second island structures are made of at least one selected from the group consisting of metals and metal oxides having a different standard electrode potential to a metal of the metal film, then the optical film can be made thin, whereby the degree of freedom for the film design and the optical properties can be improved, and hence desired optical properties can be obtained easily.
  • plasma oscillations of free electrons having different phases arise between the first and/or second island structures and the metal film, and a redox potential change for an oxidation reaction of the first and/or second island structures and a redox potential change for an oxidation reaction of the metal film stop substantially in an equilibrium state, whereby corrosion of the metal film can be prevented, and hence the durability of the optical film can be improved.
  • a mean pitch of the first and/or second island structures is not less than 400 nm, preferably in a range of 400 nm to 900 nm, then this mean pitch is approximately equal to or greater than the wavelength of the plasma oscillations of free electrons in the island structures (400 nm), whereby corrosion of the metal film can be yet better prevented.
  • the present inventors also discovered that if the metal film is made of at least one selected from the group consisting of metals having a positive standard electrode potential, and the first and/or second island structures are made of at least one selected from the group consisting of metals and metal oxides having a negative standard electrode potential, then the plasma oscillations of free electrons arising when the island structures are oxidized and the plasma oscillations of free electrons arising when the metal film is oxidized cancel one another out, whereby redox potential changes for the island structures and a redox potential change for the metal film are stopped respectively, and hence the durability of the metal film can be further improved.
  • the present invention was accomplished based on the above research results.
  • FIG. 1 is a sectional view schematically showing the structure of a reflection type liquid crystal display apparatus having an optical film according to an embodiment of the present invention.
  • the reflection type liquid crystal display apparatus 10 is comprised of a pair of glass substrates 11 and 12 that transmit light, an optical film 30 that is formed on an inner major surface of the glass substrate 12 and scatters incident light 13 and reflects this light as reflected light 14 , and a liquid crystal layer 17 that is filled between the optical film 30 and the glass substrate 11 and controls the transmission of light.
  • the glass substrate 12 and the optical film 30 together constitute a reflection type liquid crystal substrate 20 , shown in FIG. 1 .
  • the refection type liquid crystal substrate 20 and the optical film 30 will now be described in detail using FIGS. 2A and 2B .
  • FIGS. 2A and 2B are views showing the reflection type liquid crystal substrate 20 appearing in FIG. 1 ; specifically, FIG. 2A is a partially cut away perspective view, and FIG. 2B is a sectional view.
  • the reflection type liquid crystal substrate 20 is, for example, 0.55 mm thick, and is comprised of the glass substrate 12 , and the optical film 30 which is formed on the inner major surface of the glass substrate 12 .
  • the optical film 30 has a plurality of island structures (hereinafter referred to as “the second island structures”) 31 formed scattered as islands over the inner major surface 12 a of the glass substrate 12 , a metal film 32 formed on the second island structures 31 and the inner major surface 12 a of the glass substrate 12 , a plurality of island structures (hereinafter referred to as “the first island structure”) 33 formed scattered as islands over an major surface (hereinafter referred to as “the inner major surface) 32 a of the metal film 32 on the opposite side to a major surface 32 b contacting the glass substrate 12 .
  • the second island structures formed scattered as islands over the inner major surface 12 a of the glass substrate 12
  • the first island structure a plurality of island structures
  • the metal film 32 is made of at least one selected from the group consisting of metals having a positive standard electrode potential, and preferably made of at least one selected from the group consisting of silver, chromium, and aluminum, this being silver in the present embodiment.
  • Each set of the first island structures 33 and the second island structures 31 are made of at least one selected from the group consisting of metals and metal oxides, where each of the metals and the metal oxides has a different standard electrode potential to the metal of the metal film 32 , and preferably has a negative standard electrode potential, this being ITO in the present embodiment.
  • the mean pitch of the second island structures 31 and 33 is not less than 400 nm, preferably in a range of 400 nm to 900 nm. As a result, this mean pitch is approximately equal to or greater than the wavelength of the plasma oscillations of free electrons in the second island structures 31 and 33 (400 nm), whereby corrosion of the metal film 32 can be yet better prevented.
  • the percentage ratio of an equivalent circle mean diameter to the mean pitch for the second island structures 31 and 33 is in a range of 10% to 90%. As a result, corrosion of the metal film 32 can be prevented yet more reliably.
  • the equivalent circle of an island structure means the circle of radius equal to the maximum value of the distance across the area where the island structure contacts the inner major surface of the glass substrate 12 or the metal film 32 as shown in FIG. 3 .
  • the equivalent circle mean diameter means the mean value of the diameters of the equivalent circles for at least 10 randomly selected island structures on the glass substrate 12 or the metal film 32 .
  • the mean pitch of the island structures means the mean, over at least 10 randomly selected island structures on the glass substrate 12 or the metal film 32 , of the distance between the center of the equivalent circle for one island structure and the center of the equivalent circle for the island structure nearest to that island structure (the inter-island structure distance).
  • the metal film 32 has a thickness in a range of 10 nm to 500 nm, for example, 25 nm, the second island structures 31 have a mean height in a range of 2.0 nm to 7.0 nm, and the first island structures 33 have a mean height in a range of 2.0 nm to 7.0 nm. As a result, corrosion of the metal film 32 can be prevented yet more reliably.
  • the mean height of each of the second island structures 31 and 33 is more preferably in a range of 3.0 nm to 5.0 nm. As a result, corrosion of the metal film 32 can be prevented yet more reliably.
  • the mean height of the island structures means the mean, over at least 10 randomly selected island structures on the glass substrate 12 or the metal film 32 , of the distance from the inner major surface of the glass substrate 12 or the metal film 32 to the highest point of the island structure.
  • FIG. 4 is a flow diagram showing a method of manufacturing the reflection type liquid crystal substrate 20 shown in FIGS. 2A and 2B
  • FIGS. 5A to 5D are views useful in explaining steps in the method of manufacturing the reflection type liquid crystal substrate 20 .
  • the glass substrate 12 is prepared by cutting to predetermined dimensions plate glass of thickness 0.55 mm that has been manufactured using a float glass process (step S 1 ) ( FIG. 5A ).
  • the second island structures 31 are then formed scattered over one major surface of the glass substrate 12 using a sputtering method (step S 2 ) ( FIG. 5B ).
  • the second island structures 31 are formed such that the equivalent circle mean diameter thereof is, for example, 130 nm, and the mean height thereof is, for example, 3 nm. Moreover, the second island structures 31 are formed such that the mean pitch thereof is, for example, 520 nm, and the percentage ratio of the equivalent circle mean diameter to the mean pitch for the second island structures 31 is, for example, 25%.
  • the metal film 32 is formed to a thickness of 25 nm using a sputtering method on the major surface of the glass substrate 12 on which the second island structures 31 have been formed (step S 3 ) ( FIG. 5C ), and then the first island structures 33 are formed scattered over an inner major surface of the metal film 32 using a sputtering method (step S 4 ) ( FIG. 5D ).
  • the first island structures 33 are formed such that the equivalent circle mean diameter thereof is, for example, 130 nm, and the mean height thereof is, for example, 3 nm. Moreover, the first island structures 33 are formed such that the mean pitch thereof is, for example, 520 nm, and the percentage ratio of the equivalent circle mean diameter to the mean pitch for the first island structures 33 is, for example, 25%.
  • the first island structures 33 formed scattered over the inner major surface 32 a of the metal film 32 formed on the inner major surface 12 a of the glass substrate 12 , and the second island structures 31 formed scattered over the inner major surface 12 a of the glass substrate 12 contacting the metal film 32 are each made of a metal oxide or metal having a different standard electrode potential to the metal of the metal film 32 .
  • the optical film can be made thin, whereby the degree of freedom for the film design and the optical properties can be improved, and hence desired optical properties can be obtained easily.
  • plasma oscillations of free electrons having different phases arise between the first island structures 33 and the metal film 32 and between the second island structures 31 and the metal film 32 , and a redox potential change for an oxidation reaction of the island structures 31 and 33 and a redox potential change for an oxidation reaction of the metal film 32 stop substantially in an equilibrium state, whereby corrosion of the metal film 32 can be prevented, and hence the durability of the optical film can be improved.
  • corrosion of the metal film 32 is prevented by interference of the plasma oscillations arising between the first island structures 33 and the metal film 32 and between the second island structures 31 and the metal film 32 , and hence even if the dots constituting the first island structures 33 are not formed uniformly over the metal film 32 but rather dots are partially missing, corrosion of the metal film 32 can still be prevented by the interference effect due to dots formed around the part where the dots are missing.
  • first island structures 33 formed scattered over the inner major surface of the metal film 32 formed on the inner major surface of the glass substrate 12
  • second island structures 31 formed scattered over the inner major surface of the glass substrate 12 contacting the metal film 32 .
  • first island structures 33 formed scattered over the inner major surface of the metal film 32
  • second island structures 31 formed scattered over the inner major surface of the glass substrate 12 contacting the metal film 32 .
  • the optical film 30 has only the first island structures 33 , it is predominantly corrosion at the inner major surface of the metal film 32 that can be prevented, whereas in the case that the optical film 30 has only the second island structures 31 , it is predominantly corrosion at the major surface of the metal film 32 contacting the glass substrate 12 that can be prevented.
  • the optical film can be made yet thinner, and moreover the durability of the optical film can be improved.
  • the optical film 30 is used in the reflection type liquid crystal display apparatus 10 .
  • the optical film 30 may also be used in a joint reflection/transmission type liquid crystal apparatus that uses reflected external light when the amount of external light is high, and uses light from a backlight when the amount of external light is low.
  • the first island structures 33 are formed as islands on the inner major surface of the metal film 32 .
  • first island structures 33 may be formed on a surface of another solid made of a metal oxide or metal having a different standard electrode potential to the first island structures 33 .
  • corrosion of a solid made of a metal oxide or metal used in any of various applications can be prevented, whereby the durability of the metal can easily be improved.
  • Example 1 a sample was prepared by forming a 25 nm-thick metal film 32 made of silver on one major surface of a glass substrate 12 , and then forming first island structures 33 made of ITO on the metal film 32 using a sputtering method as a coating on the metal film 32 such that the mean pitch of the first island structures 33 was 520 nm.
  • Comparative Example 1 a sample was prepared by forming a 25 nm-thick metal film 32 made of silver on one major surface of a glass substrate 12 , and then forming a 10 nm-thick ITO film on the metal film 32 using a sputtering method. Furthermore, as Comparative Example 2, a sample was prepared by forming only a 25 nm-thick metal film 32 made of silver on one major surface of a glass substrate 12 .
  • first island structures 33 formed scattered over a major surface of a silver metal film 32 formed on a major surface of a glass substrate 12 are made of ITO, which has a different standard electrode potential to the metal of the metal film 32 , then not only can the optical film be made thin so that the degree of freedom for the film design and the optical properties can be improved, but moreover the durability of the optical film can be improved.
  • Example 2 a sample was prepared by forming a 25 nm-thick metal film 32 made of silver on one major surface of a glass substrate 12 , and then forming first island structures 33 made of ITO on the metal film 32 using a sputtering method as a coating on the metal film 32 such that the mean pitch of the first island structures 33 was 900 nm.
  • Example 3 a sample was prepared by forming a 25 nm-thick metal film 32 made of silver on one major surface of a glass substrate 12 , and then forming first island structures 33 made of ITO on the metal film 32 such that the mean pitch of the first island structures 33 was 520 nm.
  • Example 4 a sample was prepared by forming a 25 nm-thick metal film 32 made of silver on one major surface of a glass substrate 12 , and then forming first island structures 33 made of ITO on the metal film 32 such that the mean pitch of the first island structures 33 was 420 nm.
  • Example 5 a sample was prepared by forming a 25 nm-thick metal film 32 made of silver on one major surface of a glass substrate 12 , and then forming first island structures 33 made of ITO on the metal film 32 such that the mean pitch of the first island structures 33 was 410 nm.
  • a sample was prepared by forming a 25 nm-thick metal film 32 made of silver on one major surface of a glass substrate 12 , and then forming first island structures 33 made of ITO on the metal film 32 using a sputtering method as a coating on the metal film 32 such that the mean pitch of the first island structures 33 was 400 nm.
  • the major surface of the metal film 32 having the first island structures 33 formed thereon was observed using a scanning electron microscope, a micrograph was taken at a magnification of 15,000 to 20,000, a diagonal line was drawn across a print of the micrograph taken of the major surface of the metal film 32 , 10 to 20 of the first island structures 33 on the diagonal line were selected to be used in measurement, and the equivalent circle mean diameter and the mean pitch were determined from the selected island structures.
  • the inter-island structure distance was first measured, and the mean pitch determined from this distance was taken as the equivalent circle mean diameter.
  • each sample having the metal film 32 and the first island structures 33 formed on one major surface of the glass substrate 12 was observed using a scanning electron microscope, 10 to 20 of the observed first island structures 33 were selected to be used in measurement, and the mean height was determined from the selected island structures.
  • the equivalent circle mean diameter for the first island structures 33 was 90 nm, and the mean height was 2.0 nm.
  • the equivalent circle mean diameter for the first island structures 33 was 130 nm, and the mean height was 3.0 nm.
  • the equivalent circle mean diameter for the first island structures 33 was 210 nm, and the mean height was 5.0 nm.
  • the equivalent circle mean diameter for the first island structures 33 was 290 nm, and the mean height was 7.0 nm.
  • the mean pitch of the first island structures 33 is not less than 400 nm, preferably in a range of 400 nm to 900 nm, then due to the mean pitch being approximately equal to or greater than the wavelength of the plasma oscillations of free electrons in the first island structures 33 (400 nm), corrosion of the metal film 32 can be better prevented.
  • the percentage ratio of the equivalent circle mean diameter to the mean pitch for the first island structures 33 is in a range of 10% to 90%, then corrosion of the metal film 32 can be prevented more reliably.
  • the mean height of the first island structures 33 is in a range of 2.0 nm to 7.0 nm, then corrosion of the metal film 32 can be prevented more reliably.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Liquid Crystal (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
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US20070072386A1 (en) * 2005-09-26 2007-03-29 Samsung Electronics Co., Ltd. Method of forming an alignment key having a capping layer and method of fabricating a semiconductor device using the same
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US7862910B2 (en) 2006-04-11 2011-01-04 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
USRE43817E1 (en) 2004-07-12 2012-11-20 Cardinal Cg Company Low-maintenance coatings
US9738967B2 (en) 2006-07-12 2017-08-22 Cardinal Cg Company Sputtering apparatus including target mounting and control
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology

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US9851827B2 (en) * 2014-05-28 2017-12-26 Corning Incorporated Touch-screen assembly with rigid interface between cover sheet and frame

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USRE43817E1 (en) 2004-07-12 2012-11-20 Cardinal Cg Company Low-maintenance coatings
USRE44155E1 (en) 2004-07-12 2013-04-16 Cardinal Cg Company Low-maintenance coatings
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US7862910B2 (en) 2006-04-11 2011-01-04 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US9738967B2 (en) 2006-07-12 2017-08-22 Cardinal Cg Company Sputtering apparatus including target mounting and control
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US7820296B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coating technology
US8506768B2 (en) 2007-09-14 2013-08-13 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US8696879B2 (en) 2007-09-14 2014-04-15 Cardinal Cg Company Low-maintenance coating technology
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
US11325859B2 (en) 2016-11-17 2022-05-10 Cardinal Cg Company Static-dissipative coating technology

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CN1804695B (zh) 2010-04-07
JP2006171344A (ja) 2006-06-29

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