US5965881A - Scanning probe microscope and processing apparatus - Google Patents

Scanning probe microscope and processing apparatus Download PDF

Info

Publication number
US5965881A
US5965881A US08/969,562 US96956297A US5965881A US 5965881 A US5965881 A US 5965881A US 96956297 A US96956297 A US 96956297A US 5965881 A US5965881 A US 5965881A
Authority
US
United States
Prior art keywords
sample
probe
signal
cantilever
deviation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
US08/969,562
Other languages
English (en)
Inventor
Takafumi Morimoto
Ken Murayama
Sumio Hosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Construction Machinery Co Ltd
Original Assignee
Hitachi Construction Machinery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Construction Machinery Co Ltd filed Critical Hitachi Construction Machinery Co Ltd
Assigned to HITACHI CONSTRUCTION MACHINERY CO., LTD. reassignment HITACHI CONSTRUCTION MACHINERY CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HOSAKA, SUMIO, MORIMOTO, TAKAFUMI, MURAYAMA, KEN
Application granted granted Critical
Publication of US5965881A publication Critical patent/US5965881A/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q10/00Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
    • G01Q10/04Fine scanning or positioning
    • G01Q10/06Circuits or algorithms therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00Methods or apparatus for measurement or analysis of nanostructures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q20/00Monitoring the movement or position of the probe
    • G01Q20/02Monitoring the movement or position of the probe by optical means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/04Display or data processing devices
    • G01Q30/06Display or data processing devices for error compensation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G01Q60/38Probes, their manufacture, or their related instrumentation, e.g. holders
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/849Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/85Scanning probe control process
    • Y10S977/851Particular movement or positioning of scanning tip
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/849Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/852Manufacture, treatment, or detection of nanostructure with scanning probe for detection of specific nanostructure sample or nanostructure-related property

Definitions

  • the present invention relates to a scanning probe microscope suited for obtaining surface information of samples based on a broad scanning speed range from a low speed to a high speed, and a processing apparatus utilizing the scanning probe microscope.
  • a scanning probe microscope (hereinafter referred to as "SPM") is an instrument used for measuring uneven shapes and the like on a surface of a sample on a level of atom size.
  • SPM scanning probe microscope
  • its probe with a pointed tip is brought close to the sample for distances on the order of nanometers (nm), and physical interactions such as an atomic force between the probe and the sample is detected.
  • a force microscope included in a group of the SPMs which is typically represented by a scanning atomic force microscope (hereinafter referred to as "AFM"), is an instrument used for measuring the uneven shapes (concave and convex shapes) on the surface of the sample by using a beam with a very low spring constant called “a cantilever” and detecting a displacement of the cantilever caused by its flexural deformation.
  • This flexural deformation is produced by an atomic force between the probe disposed at a tip of the cantilever and the sample.
  • a typical configuration of main mechanical members and a control system for a conventional AFM will be described with reference to FIG. 13.
  • the AFM is a general type of a contact mode. When measuring the shapes of the surface in the sample, the AFM operates as described below:
  • a displacement generated in a cantilever 82 having a probe 81 at a tip thereof is measured by means of an optical displacement detector called an optical lever mechanism which includes a laser source 83 and a photodetector (a position detector) 84.
  • the optical lever mechanism has been known generally and widely as a mechanism for detecting the displacement of the cantilever in the AFM.
  • a tripod 85 is equipped with three piezoelectric elements 88a and 88b (a Y axis piezoelectric element is not shown) in directions along three axes (X, Y and Z axes: They are perpendicular to one another) which support a sample table 87 for mounting a sample 86.
  • the tripod 85 operates as a three-dimensional actuator for scanning the sample by the probe in the X and Y directions and controlling a distance between the probe and the sample (or between the cantilever and the sample ) in the Z axis direction.
  • the cantilever 82 equipped with the probe 81 is brought into a specified place by an approaching/separating mechanism (not shown), where an atomic force can act between the sample 86 and the probe 81.
  • the probe 81 is subjected to the atomic force from the surface of the sample 86 and the cantilever 82 is flexuously deformed, or bent.
  • an operation of the tripod 85 in the direction along the Z axis is controlled by a control circuit 89 so as to cause a deviation signal ⁇ s to be zero.
  • the deviation signal ⁇ s is defined as a difference between a displacement signal s1 and a set value s0 set in advance.
  • the displacement signal s1 which can be detected by the optical lever mechanism, represents the displacement of the cantilever 82 (the displacement of the probe 81) caused by the flexural deformation thereof.
  • the displacement of the probe 81 caused by the flexural deformation of the cantilever 82 is controlled so as to be always equal to the set value s0, whereby the probe 81 is maintained in a condition where it is pressed toward the sample 86 with a constant force.
  • a control signal s3 in relation to the Z axis direction changes in correspondence to the uneven shape of the surface of the sample.
  • the change of the control signal s3 represents the information about the uneven shape on the surface of the sample.
  • a scanning tunnel microscope disclosed by Japanese Patent Application Laid-Open No. 1-206202 may be cited as a related art.
  • a scanning tunnel microscope is generally an instrument which detects the uneven shape of a surface of a sample by measuring a distance between a probe and the sample while utilizing a tunnel current flowing between the probe and the sample, and by controlling the tunnel current so that it is kept constant while the surface of the sample is scanned with the probe.
  • the scanning tunnel microscope described in the above-mentioned literature has a feature of obtaining surface shape information by adding a correcting signal ⁇ Z 2 to a basic signal ⁇ Z 1 originally used for obtaining the surface shape information.
  • the conventional AFM described above has a problem that an operation control in the direction along the Z axis of the tripod 85 cannot follow the uneven shape of the surface, in particular, when a speed for scanning the sample 86 is increased in order to perform a high speed measurement. If the operation control in the Z axis direction cannot follow the uneven shape, it is difficult to obtain accurate information as to the uneven shape. Moreover, in accordance with circumstances about the scanning speed and surface shapes, there are some possibilities that the measurements cannot be performed at all.
  • the AFM described above is the general type of contact mode, the similar problems are posed by AFMs of other modes such as a tapping mode, or the SPMs of other type.
  • the configuration for obtaining the information about the surface of the sample is almost the same as that of the above-mentioned AFM, except for particular configurations as the instruments and signals used for the detection and control.
  • the SPMs of other type are also configured to detect a mutual action between the probe and the sample, which vary dependently on the distance between them, and to obtain the information about the surface of the sample based on the control signals obtained by scanning the probe or the sample while controlling operations in the Z axis direction so as to keep the mutual action constant. Accordingly, these SPMs also cannot obtain the surface information when the scanning is performed at high speeds where the operation control in the Z axis direction cannot follow the uneven shape of the surface of the sample.
  • the scanning tunnel microscope disclosed by the literature mentioned above is not equipped with a member such as a cantilever which is deformed dependently on a force, and has a configuration entirely different from that of the instrument for detecting a force such as the above atomic force.
  • the signal ⁇ Z 2 to be added to the signal ⁇ Z 1 is used as a correction signal which serves for enabling to obtain the information on the surface of the sample at a high scanning speed.
  • the scanning tunnel microscope can correct a servo error by using the correction signal only when the servo error is included within a specific range. When the servo error exceeds the specific range, however, the scanning tunnel microscope cannot correct the servo error and causes the probe to be broken.
  • a primary object of the present invention is to solve the problems described above, or to provide a SPM which is equipped with a force detecting device, and is capable of obtaining surface information of samples by utilizing the force detecting device and a signal take-out circuit when a control by a control circuit cannot follow a change on the surface of the samples. Accordingly, the SPM according to the present invention is capable of obtaining accurate information on the surface of the samples not only at a low scanning speed but also even at a high scanning speed at which the operation control in the direction along Z axis cannot follow, or within a broad range of scanning speed from a low level to a high level.
  • Another object of the present invention is to provide a processing apparatus utilizing the SPM described above.
  • the SPMs of the present inventions are configured as described below:
  • a SPM according to the present invention comprises, as fundamental members, a probe which is supported by a deformable member to be opposed to a sample, a mechanism which changes a relative positional relationship between the sample and the probe, and a detector which detects a force acting on the probe due to a physical variable produced between the probe and the sample.
  • the SPM according to the present invention is characterized in that it comprises a control section which maintains a state variable related to the force acting on the probe at a set value, and an adding section which adds a signal obtained from the control section and a signal generated on the basis of a deviation between the state variable of the probe and the set value, thereby obtaining information on a sample surface from a signal outputted from the adder.
  • An atomic force is a preferable example of the force acting on the probe due to the physical variable mentioned above, but it is not limited to the atomic force.
  • Deformation of the deformable member is utilized as means for detecting the force which acts on the probe.
  • a cantilever is preferable as the deformable member, but it is not limited to the cantilever.
  • the probe is disposed at a tip of the cantilever and opposed to the sample surface in a condition where it is supported by the cantilever.
  • the cantilever is deformed dependently on a magnitude of the force and the state variable of the probe can be obtained by detecting displacement caused by the flexural deformation of the cantilever.
  • the probe is placed so that it receives the force produced due to the physical variable from the sample surface and its position relative to the sample surface is varied in correspondence to the magnitude of the force, and the set value is given so that relative positional relationship between the probe and the samples is maintained in a predetermined condition (condition of setting the force pressing the probe at a predetermined value) by the control section which controls the relative positional relationship.
  • the adding section adds the signal obtained from the control section to the signal generated by the deviation between the state variable of the probe and the set value.
  • the SPM according to the present invention is configured to obtain surface information of the sample from the signal outputted from the adding section at a stage to display an image of the sample surface on a display section of the SPM.
  • the probe is supported by the deformable member which is flexuously deformed in correspondence to the force acting on the probe and the deformable member is therefore deformed within a deformable range thereof when a force acts on the probe.
  • the SPM according to the present invention is capable of taking out the information on the sample surface even when the operation control of the control section cannot follow the uneven shapes of the sample surface.
  • the configuration described above can preferably comprise a switching section which sets the control function of the control section in an on condition or an off condition.
  • the SPM is configured to obtain the information on a sample surface only from the signal based on the deviation.
  • the configuration described above can more preferably comprise a switching section which sets the function to add the signal based on the deviation to the control signal in an on condition or an off condition.
  • the SPM is configured to obtain the information on a sample surface only from the control signal.
  • the configuration described above can preferably comprise a switching section which sets the control function of the control section in an on condition or an off condition and another switching section which sets the function to add the signal based on the deviation to the control signal in an on condition or an off condition.
  • the configuration described above can more preferably comprise a displacement meter so that the SPM uses a signal outputted from the displacement meter in place of the control signal.
  • the control section controls a distance between the cantilever (the probe) and the sample so that displacement of the cantilever is coincident with the set value set in advance.
  • the SPM is configured to obtain the uneven information on the uneven surface of the sample from a sum signal which is obtained by adding the control signal outputted from the control section and the signal based on the deviation between the cantilever displacement signal and the set value.
  • the SPM can obtain the uneven information on the sample surface on the basis of the control signal associated with the operation control in the direction along the Z axis.
  • the operation control in the direction along the Z axis cannot follow the uneven shape of the sample surface sufficiently.
  • the uneven surface which cannot be followed by the operation control is detected as the deviation signal between the cantilever displacement signal and the set value. Therefore, the SPM according to the present invention, which uses the sum signal obtained by adding the signal based on the control signal from the control section and the signal based on the deviation between the cantilever displacement signal and the set value, can obtain the accurate uneven information on the sample surface.
  • the SPM can obtain the uneven information on the sample surface on the basis of the deviation signal contained in the sum signal since the probe itself moves up and down along the uneven shape of the sample surface, and the displacement due to the flexural deformation of the cantilever can be detected as a positional changes of a light beam reflected by the cantilever.
  • the SPM so as to obtain the uneven information on sample surfaces from the sum signal described above, it is possible to obtain accurate uneven information on sample surfaces throughout a scanning speed range from a slow speed where the operation control can follow the uneven shapes to a fast speed where the operation control cannot follow the uneven shapes.
  • the SPM having the configuration described above permits obtaining fine uneven shapes or compositions and other physical variables on sample surfaces. Further, the SPMs are usable not only in the ordinary atmospheric environments but also in vacuum and liquid such as water.
  • the SPMs described above can be used independently or composed as composite instruments in combination with other instruments.
  • the SPMs can be combined, for example, with optical microscopes and instruments utilizing electron beams (concretely, electron microscopes or electron beam processing apparatus). Though the SPMs are instruments which are used originally for observation or measurements, these instruments are of course usable as processing apparatus for machining or processing the surfaces of the samples.
  • relationship between the probes and the sample surfaces may be set in a contact mode (always kept in contact condition), a tapping mode (brought periodically into contact) or a non-contact mode (kept in contactless condition).
  • FIG. 1 is a block diagram showing a configuration of a first embodiment of a SPM according to the present invention
  • FIG. 2 is a diagram showing a moving condition of a cantilever at a low scanning speed where an operation control follows an uneven surface of a sample
  • FIG. 3 is a diagram showing another moving condition of the cantilever at a high scanning speed where the operation control can not follow the uneven surface of the sample;
  • FIG. 4 is a characteristic curve diagram showing relationship between displacement of a probe and a detection signal
  • FIG. 5 is a block diagram showing a configuration of a second embodiment of the SPM according to the present invention.
  • FIG. 6 is a block diagram showing a configuration of a third embodiment of the SPM according to the present invention.
  • FIG. 7 is a block diagram showing a configuration of a fourth embodiment of the SPM according to the present invention.
  • FIG. 8 is a diagram showing a moving condition of the cantilever at a low scanning speed where the operation control follows the uneven surface of the sample
  • FIG. 9 is a diagram showing a moving condition of the cantilever at a high scanning speed where the operation control can not follow the uneven surface of the sample;
  • FIG. 10 is a characteristic curve diagram showing a relationship between a vertical position and an amplitude of a cantilever
  • FIG. 11 is a block diagram showing a configuration of a processing apparatus
  • FIG. 12 is a perspective view showing an appearance of a processing condition.
  • FIG. 13 is a block diagram showing a configuration of a conventional SPM.
  • FIG. 1 shows a first embodiment of the SPM according to the present invention.
  • the SPM of the first embodiment is, for example, of a force detection type with a cantilever, and in particular it is an example of an AFM of a contact mode. Displacement caused by flexural deformation (bend) of the cantilever is generally detected by an optical lever mechanism.
  • the cantilever operates as an optical lever of the optical lever mechanism.
  • a sample 11 is mounted on a sample table 13 supported by a tripod 12.
  • the tripod 12 is a three-dimensional actuator equipped with three piezoelectric elements in directions along three axis for moving the sample table 13.
  • the piezoelectric elements includes an X axis piezoelectric element 14a, a Y axis piezoelectric element (not shown) and a Z axis piezoelectric element 14b.
  • the tripod 12 is used for controlling a scanning operation in X and Y directions and a distance between a probe and the sample (or between the cantilever and the sample).
  • Disposed above the sample 11 is the cantilever 16 which is equipped at its tip with a probe 15 opposite to the sample 11.
  • the cantilever 16 makes the optical lever mechanism (an optical displacement detection device) together with a laser source 17 and a photodetector 18.
  • a laser beam 17a emitted from the laser source 17 is reflected on a rear surface of the cantilever 16 and is incident on the photodetector 18.
  • An atomic force acts between a surface of the sample 11 and the probe 15, and the displacement (a shift amount) caused by the flexural deformation of the cantilever 16 in correspondence to the atomic force is measured or detected by the optical lever mechanism.
  • the probe 15 in order to measure a shape of the surface of the sample 11, the probe 15 is brought near the surface of the sample 11 by a well-known approaching/separating mechanism (not shown) until the atomic force acts between the probe 15 and the sample 11. In this state, the probe 15 is subjected to the atomic force from the surface of the sample and the cantilever 16 is flexuously deformed.
  • the displacement of the cantilever 16 (or the shift amount of the probe 15) can be detected by the optical lever mechanism and is indicated as a displacement signal s1 outputted from the photodetector 18.
  • a subtracter 19 calculates a difference between a set value s0 set in advance and the displacement signal s1, which is a deviation signal ⁇ s, and this deviation signal ⁇ s is supplied to a control circuit 20.
  • the control circuit 20 controls an operation of the tripod 12 in a direction along the Z axis, i.e., the Z axis piezoelectric element 14b.
  • the control circuit 20 outputs a control signal s3 so as to cause the deviation signal ⁇ s from the subtracter 19 to become zero.
  • the displacement of the cantilever 16 caused by the flexural deformation thereof is controlled so that the displacement signal s1 is coincident with the set value s0 and the probe 15 is kept to be pressed toward the surface of the sample 11 with a constant force.
  • the control signal s3 in the Z axis direction varies in correspondence to uneven shapes on the surface of the sample 11.
  • a signal obtained by amplifying the control signal s3 through an amplifier 22 with an adequate gain and a signal obtained by amplifying the deviation signal ⁇ s through an amplifier 23 with an adequate gain are added by an adder 24.
  • the adder 24 outputs a sum signal s4 which is inputted into a signal processor 25.
  • the signal processor 25 generates a video signal based on both the sum signal s4 and an output signal s5 given by the XY scanning circuit 21, and displays concavity and convexity (uneven) information about the surface of the sample 11 on a display unit 26 with the video signal.
  • the amplifiers 22 and 23 are used for matching the control signal s3 with the deviation signal ⁇ s.
  • both the control signal s3 and the deviation signal ⁇ s represent the uneven information about the surface of the sample, it is impossible to obtain accurate the uneven information only by simply adding the two signals since coefficients for converting these signals into practical heights of the uneven shape are different from each other. Therefore, these signals are amplified with the adequate gains so that they are added after the coefficients for the conversion to the heights are matched with each other.
  • the displacement of the cantilever 16 caused by its flexural deformation is maintained in a constant condition and the sample 11 is moved along the Z axis direction so that the cantilever 16 accurately follows the uneven surface of the sample 11 when the sample 11 is scanned at a relatively slow speed by the operation of the XY scanning circuit 21 in the directions along X and Y axes and the operation control in direction along the Z axis sufficiently follows the uneven shape of the sample surface.
  • the control signal s3 accurately represents the uneven information about the surface of the sample 11.
  • the deviation signal ⁇ s is kept nearly at 0 at this time, whereby the SPM can perform a measurement similarly to the conventional type instrument and can obtain the uneven information on the surface of the sample.
  • FIG. 2 shows an operating condition of the cantilever in a case where the cantilever 16 is moved for the scanning in the X-Y direction at a slow speed and the operation control in the Z axis direction follows the uneven shape sufficiently.
  • FIG. 2 shows an example where the cantilever 16 is moved in the X and Y directions and a vertical position (a position in the Z axis direction) thereof is controlled.
  • the example shown in FIG. 2 is different from the configuration where the XY scanning and the operation control in the Z axis direction are performed on a side of the sample 11 as shown in FIG. 1, the example is almost the same as the configuration in a respect that a relativ e positional relationship between the probe 15 or the cantilever 16 and the sample 11 is changeable.
  • a light beam 28 reflected in the optical lever mechanism for detecting the displacement caused by the flexural deformation of the cantilever 16 is also controlled so as to be at a definite position on the photodetector 18. Accordingly, the deviation signal obtained as the difference between the displacement signal of the cantilever 16 and the set value is maintained to be zero.
  • the degrees of the following due to the operation control are mutually different dependence on the various scanning speeds.
  • the degrees of the following due to the operation control vary also dependently on the uneven shape of the surface (for example, concavities and convexities at short periods).
  • the control signal s3 does not represent accurately the uneven shape on the surface of the sample 11, whereby the deviation signal ⁇ s cannot be zero and signal components thereof appear.
  • the conventional SPM also can obtain a measured image corresponding to the uneven shape on the sample surface, it is incapable of accurately measuring the actual uneven shape of the sample surface in the conventional SPM since the operation control in the Z axis direction cannot follow the uneven shape completely.
  • the SPM of the first embodiment is configured to obtain the measured image by the sum signal s4 substantially composed of the control signal s3 and the deviation signal ⁇ s, and the tip of the probe 15 is moved relative to the sample 11 while following the uneven shape on the surface of the sample 11. Therefore, the SPM of the first embodiment can obtain the measured image accurately representing the uneven shape on the sample surface. A detailed reason for that is described below.
  • FIG. 3 shows an example which is similar to that shown in FIG. 2 wherein the cantilever 16 is moved in the X-Y direction and a position of the cantilever 16 in the vertical direction (in the Z axis direction) is controlled.
  • the example is different from the configuration wherein the scanning in the X-Y direction and the operation control in the Z axis direction are performed on the side of the sample 11 as shown in FIG. 1, there is no difference in the respect of varying positions of the probe 15 and the cantilever 16 relative to the sample 11.
  • FIG. 3 shows a movement of the cantilever 16 in a condition where the operation control of the cantilever 16 in the direction along the Z axis cannot follow at all the uneven shape on the surface 11a at a high scanning speed.
  • the cantilever 16 traces a straight locus 27 as shown in FIG. 3 regardless of the uneven shape on the surface 11a.
  • the operation control in the vertical direction cannot follow the uneven shape at all, it is impossible to maintain the displacement of the cantilever 16 caused by its flexural deformation at a constant level.
  • the cantilever 16 moves while being flexuously deformed in correspondence to the uneven shape on the sample surface 11a. Accordingly, the prove itself still has a characteristic that it moves up and down while following the uneven shape on the sample surface 11a though it is impossible to control the vertical position of the cantilever 16 so as to follow the uneven shape.
  • the displacement of the cantilever 16 caused by the flexural deformation thereof can be detected on the basis of the positional variations of the reflected light beam 28 from the optical lever mechanism as shown in FIG. 3.
  • the deviation signal ⁇ s obtained as the difference between the displacement signal s1 of the cantilever 16 and the set value s0 can be utilized as the signal representing the uneven information on the sample surface 11a.
  • the first embodiment is configured to obtain the uneven information on the sample surface 11a from the sum signal s4 made by adding a signal based on the deviation signal ⁇ s to a signal based on the control signal s3 from the control circuit 20, the uneven information can be obtained from the signal based on the deviation signal ⁇ s to be added, even when the control of the cantilever 16 cannot follow the uneven shape on the sample surface 11a at a high scanning speed and the uneven information cannot be obtained from only the signal based on the control signal, as shown in FIG. 3.
  • the deviation signal ⁇ s comes to be zero and therefore in the first embodiment the usual measurement in a manner quite the same as that of the conventional apparatus can be carried out.
  • the deviation signal ⁇ s does not give any interference to the usual measurement.
  • the conventional SPM is incapable of obtaining any uneven information on the sample surface when the scanning operation is performed at a fast scanning speed in the X-Y direction, and the operation control in the Z axis direction cannot follow the uneven shape on the sample surface and therefore the control signal s3 does not vary at all (in a condition where gain is remarkably lowered and signal variations are almost equal to zero in the aspect of a control theory).
  • the SPM of the first embodiment can obtain the measured image accurately representing the uneven shape on the sample surface.
  • the deviation signal ⁇ s representing the uneven shape on the sample surface is produced by utilizing the movement of the cantilever 16 relative to the sample 11 and the flexural deformation thereof following the uneven shape, and the sum signal s4 which is composed of the deviation signal ⁇ s and the control signal s3 and is used for generating the measured image is outputted from the adder 24.
  • the operation control in the direction along the Z axis may follow the uneven surface of the sample insufficiently when the scanning speeds of the cantilever 16 is within an intermediate range between the slow and fast scanning speeds.
  • the information about the uneven surface which the control cannot follow can be detected by the deviation signal ⁇ s as the difference between the displacement signal of the cantilever 16 and the set value.
  • the SPM in accordance with the first embodiment which utilizes the sum signal s4 obtained by adding the signal derived from the control signal s3 to the signal derived from the deviation signal ⁇ s, can obtain the accurate information about the uneven surface of the sample.
  • whether or not the operation control in the Z axis direction can follow the uneven surface of the sample is dependent on differences among the uneven shapes of the uneven surfaces. When the uneven shapes have remarkably short periods, for example, the operation control cannot follow them with high possibilities even if in a relatively slow scanning speed.
  • the SPM in accordance with the first embodiment is effective in such cases.
  • a response frequency band for the operation control in the direction along the Z axis is limited by natural frequencies of mechanical elements such as the tripod 12, frequency characteristics of the piezoelectric elements and the driving circuit, and a frequency characteristic of the control system and so on.
  • mechanical elements such as the tripod 12, frequency characteristics of the piezoelectric elements and the driving circuit, and a frequency characteristic of the control system and so on.
  • the control system must therefore be designed so as to have a low gain at a resonance point thereof for preventing its oscillation at the natural frequencies of the mechanical elements. ⁇ s a result, the response frequency band for the operation control is lower than the natural frequencies of the mechanical elements and limited on the order of 1 kHz. In case of the present embodiment, however, even in a frequency range where the operation control cannot follow the uneven surface of the sample 11, if the cantilever 16 is flexuously deformed and the tip of the probe 15 can follow the uneven shapes of the surface, the uneven shapes can be measured.
  • Cantilevers which are generally used under the present circumstances have mechanical natural frequencies on the order of tens of kilohertz to hundreds of kilohertz which are one to two units higher than the natural frequencies of the mechanical elements used in the control system described above. This means that the SPM of the first embodiment can easily perform measurements at scanning speeds one to two units higher than those of the conventional type.
  • FIG. 4 shows variations of a signal detected by the optical lever mechanism when the cantilever 16 is flexuously deformed.
  • a two-division type photodiode (PD) is used as the photodetector 18 for detecting positions of the light beam reflected from the cantilever 16 (optical lever).
  • (1) is a region wherein a signal detected by the optical lever mechanism varies linearly in proportion to displacement of the probe 15 and the region (1) corresponds to a case that the reflected light beam is incident onto a vicinity of the center of the two-division type PD.
  • (2) is a region wherein the light beam reflected by the cantilever deviates remarkably from the center of the two-division type PD and non-linearity appears in variations of the detection signal relative to the displacement of the probe.
  • (3) is a region wherein the detection signal does not vary regardless of variations of flexure of the cantilever 16 due to limitation in the output voltage of the signal detecting circuit.
  • the deviation signal (signal as to control deviation) explained in the first embodiment varies as shown in FIG. 4 in accordance with the control deviation of the displacement caused by the flexural deformation of the cantilever 16. Accordingly, it is possible to obtain a detection signal having the linear characteristic relative to the displacement of the probe by performing a measurement within the region (1).
  • the region (1) it is easy to realize the probe displacement of approximately 1 ⁇ m though its numerical value cannot be discussed generally since it is different dependently on various factors such as an element area of the two-division PD and magnification ratio of the optical lever mechanism.
  • a position sensor diode PSD
  • a SPM provided with a computer system for an image processing section, wherein the computer system is used for calculating three-dimensional images, analyzing processing measured data, and displaying or storing the data, is also contained in the scope of the present invention.
  • FIG. 5 shows a second embodiment of the SPM according to the present invention.
  • elements which are the substantially the same as those shown in FIG. 1 are represented by the same references numerals and will not be described in details.
  • the second embodiment is characterized in that it comprises an element for switching the control function of the control circuit 20 into an on or off condition and an element for switching the function of adding the signal derived from the deviation signal ⁇ s to the signal derived from the control signal s3 into to an on or off condition.
  • the second embodiment remains unchanged from the first embodiment in other configurational respects.
  • a switch 31 is the element for switching the control function of the control circuit 20, and in the second embodiment the switch 31 actually transfers or cuts off the signal s3 outputted from the control circuit 20.
  • the switch 31 is connected between the control circuit 20 and each of the tripod 12 and the amplifier 22 (or the adder 24). Further, it is possible to obtain a function similar to the action of the switch 31 by utilizing a digital control system for making a function means which invalidates the operation of the control circuit 20 so as to cause the control signal s3 to be zero, or by maintaining the control signal s3 at a constant value without using the detected displacement signal s1.
  • a switch 32 is the element for switching the function of adding the signal derived from the deviation signal ⁇ s to the signal derived from the control signal s3. In the second embodiment, the switch 32 actually transfers or cuts off the amplified deviation signal ⁇ s.
  • the configuration of the second embodiment is the same as that of the first embodiment, thereby operating and functioning the same as the first embodiment.
  • a measurement for obtaining the result shown in FIG. 4 can be carried out by moving up and down the sample 11 by the tripod 12 and recording variations of the signal from the optical lever mechanism while keeping the probe 15 in contact with the surface of the sample 11. This technique is generally called a focus curve measurement and widely utilized for AFMs.
  • the characteristic of the piezoelectric elements is a nonlinearity of the piezoelectric elements relative to a voltage and known well to those skilled in the art.
  • the second embodiment is quite the same as the conventional AFM.
  • the deviation signal ⁇ s becomes 0 and therefore the function for adding the deviation signal to the control signal is apparently inoperative when a scanning speed is slow enough to allow the operation control in the Z axis direction to sufficiently follow the uneven surface.
  • the second embodiment is however effective for measurements in cases where the configuration as to the adding function of the deviation signal comes to be adverse factor or the adding function is desired to be ineffective for evaluating the measurement, in other different instruments and circuits.
  • FIG. 5 shows an example comprising both the switches 31 and 32, it is possible to configure the SPM so as to comprise either of the switches 31 and 32.
  • FIG. 6 shows a third embodiment of the SPM according to the present invention. Elements which are substantially the same as those shown in FIG. 1 are represented by the same reference numerals In FIG. 6 and will not be described in details.
  • the third embodiment is characterized in that it comprises a displacement meter 33 which measures displacement of the Z axis piezoelectric element 14b of the tripod 12, or the displacement of the sample table.
  • a detection signal s6 outputted from the displacement meter 33 is utilized in place of the control signal s3 described with reference to the first embodiment.
  • the third embodiment remains unchanged from the first embodiment.
  • the third embodiment can carry out measurements with an accuracy of the displacement meter 33 and with no influence due to nonlinearity and hysteresis in the piezoelectric elements.
  • the SPM is equipped with the displacement meter 33 which measures the displacement of the Z axis piezoelectric element 14b, and has a local closed control loop by which the Z axis piezoelectric element 14b displaces accurately relative to the control signal s3.
  • the third embodiment is expected to have a technical effect which is similar to that of the first embodiment and included within the scope of the present invention.
  • FIG. 7 shows a fourth embodiment of the present invention. Elements which are the substantially the same as those shown in FIG. 1 are represented by the same reference numerals and will not be described in details.
  • the fourth embodiment is characterized in that it uses a cantilever 16 of the tapping mode in place of the contact mode in the fundamental configuration adopted for the first embodiment.
  • the cantilever 16 is attached to a tip oscillator 34 which oscillates the cantilever. Accordingly, the cantilever 16 is in an oscillated condition.
  • a displacement signal s1 outputted from the photodetector 18 is converted into an oscillation amplitude signal by an effective value circuit 35.
  • the amplitude signal is input into the adder 19.
  • the fourth embodiment remains unchanged from the first embodiment in other configurational respects. Accordingly, the operation control in the direction along the Z axis of the tripod 12 is performed so as to obtain an amplitude determined by the set value s0.
  • FIG. 8 shows a moving state of the cantilever 16 when the operation control can follow the uneven surface at a slow scanning speed.
  • the cantilever 16 has a constant amplitude 36 and a locus 37 of the oscillated cantilever 16 is controlled so as to be coincident with the uneven shapes of the sample surface 11a.
  • the uneven shapes of the surface 11a of the sample 11 can be known from the locus 37 representing the moving state of the oscillated cantilever 16.
  • FIG. 9 shows a moving state of the cantilever 16 at a fast scanning speed where the operation control cannot follow the uneven surface.
  • the amplitude 36 of the cantilever 16 varies according to the uneven shapes of the sample surface 11a, whereas the locus 37 of the oscillated cantilever 16 is constant regardless of the uneven shapes of the sample surface 11a. Since a vertical position and an amplitude of the cantilever is set in relationship shown in FIG. 10, it is possible to know the uneven shape of the sample surface 11a by utilizing a linear variation region (a slope section 38 of the graph shown in FIG. 10).
  • the fourth embodiment is also capable of performing measurements, like the embodiments already described above, mainly on the basis of the control signal s3 in the sum signal s4 at a slow scanning speed, mainly on the basis of the deviation signal ⁇ s in the sum signal s4 at a fast scanning speed, and on the basis of the sum signal s4 at an intermediate scanning speed.
  • the optical lever mechanism is used as a mechanism for detecting the flexural deformation of the cantilever in each of the embodiments described above, these embodiments may be modified to use a laser interference method.
  • the tripod for moving the sample is used as a sample scanner in the embodiments, but they may be modified to use, for example, a tube type scanner, or a scanning mechanism for moving the cantilever. Even when the modified embodiments have different scanning mechanisms, they can be expected to have the similar technical effects.
  • the various embodiments described above are the AFMs of the contact mode in which the probe is always kept in contact with the sample surface, or of the tapping mode in which the probe is periodically brought into contact with the sample surface, they may be set in the non-contact mode in which the probe and the sample surface are maintained in contactless conditions.
  • the characteristic configuration according to the present invention is not limited to the AFMs but is applicable to SPMs of other types, for example electric force microscopes and magnetic force microscopes. Since physical variables utilized for detecting information on the sample surfaces are different among the different types of SPMs, each of the SPM uses a unique mechanism for measuring the sample surface, which is different from the probe and the cantilever of the AFM. However, in order to obtain accurate the surface information of the sample in accordance with a scanning speed having a broad range from a slow speed to a fast speed, the SPM is configured so as to be equipped with means which is substantially equivalent to the control system and the signal take-out system described with reference to the embodiments.
  • the configuration which uses the cantilever as deformable member for supporting the probe is described in the embodiments, it is not always necessary to use the cantilever.
  • a cylinder, a diaphragm or a link mechanism may be used as the deformable member which is flexuously deformed in correspondence to a force.
  • the SPM is ordinarily used in atmospheric environments. Further, the SPM can be used in a vacuum environment by disposing it within a vacuum chamber in a semiconductor manufacturing equipment. Furthermore, the SPM can be used even in a liquid such as water as occasion demands.
  • the SPM according to the present invention which is configured to obtain surface information of a sample on the basis of the sum signal obtained by adding the signal based on the deviation between displacement of the probe and the set value to the control signal outputted from the controller, is capable of obtaining accurate information of the uneven shape of the sample surfaces at each of the slow scanning speed, the fast scanning speed where the control for the position of the probe cannot follow the uneven shape, and the intermediate scanning speed.
  • the SPM of the present invention can increase a scanning speed one or more than two units higher in comparison with the conventional SPMs.
  • the configuration according to the present invention can have a technical effects not only for obtaining the information on uneven shapes but also detecting other physical variables, for example, magnetism distributions on the sample surfaces with the magnetic force microscopes and electric field distributions on the sample surfaces with the electric force microscopes.
  • the SPM of the present invention can be used independently or combined with another instrument to form a composite apparatus.
  • An optical microscope or an instrument utilizing an electron beam can be mentioned as the instrument to be combined with the above-mentioned SPM.
  • the instrument utilizing an electron beam is, for example, the electron microscope or an electron beam processing apparatus.
  • the SPM is originally an instrument for observation or measurement, it is usable also as an apparatus which performs machining and processing on the sample surfaces. Such machining and processing is performed, for example, on wafers formed by integrating semiconductor elements.
  • FIG. 11 shows one example of a processing apparatus.
  • This processing apparatus is configured by utilizing the SPM shown in FIG. 1. Elements shown in FIG. 11, which are the substantially the same as those shown in FIG. 1 are represented by the same reference numerals.
  • This processing apparatus forms indentations on a sample surface by pressing the probe 15 to the sample surface. Besides, there is another configuration that electric pulses are supplied to the probe so that the probe electrically forms the indentations on the sample surface.
  • a processing actuator 41 is added to the SPM shown in FIG. 1 and an operation of the processing actuator 41 is controlled by the control circuit 20 as indicated by an arrow 42.
  • the processing actuator 41 moves the cantilever 16 vertically at a fast speed.
  • a piezoelectric element composed of a single thin plate is generally used as the processing actuator 41.
  • the processing apparatus having the above-mentioned configuration performs a processing operation as illustrated in FIG. 12.
  • the probe 15 forms indentations 43 on the surface of the sample 11.
  • the processing apparatus described above can not only perform control in the conventional mode but also permits directly measuring operations of the cantilever 16 and worked surfaces on real time.

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
US08/969,562 1996-11-14 1997-11-13 Scanning probe microscope and processing apparatus Expired - Fee Related US5965881A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8-318637 1996-11-14
JP8318637A JPH10142240A (ja) 1996-11-14 1996-11-14 走査型プローブ顕微鏡とこの走査型プローブ顕微鏡を備えた加工装置

Publications (1)

Publication Number Publication Date
US5965881A true US5965881A (en) 1999-10-12

Family

ID=18101369

Family Applications (1)

Application Number Title Priority Date Filing Date
US08/969,562 Expired - Fee Related US5965881A (en) 1996-11-14 1997-11-13 Scanning probe microscope and processing apparatus

Country Status (4)

Country Link
US (1) US5965881A (fr)
EP (1) EP0843175B1 (fr)
JP (1) JPH10142240A (fr)
DE (1) DE69730670T2 (fr)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000058759A2 (fr) * 1999-03-29 2000-10-05 Nanodevices, Inc. Sonde active pour microscope a forces atomiques et son procede d'utilisation
WO2001094878A1 (fr) * 2000-06-09 2001-12-13 Universite De Haute Alsace (Etablissement Public A Caractere Scientifique, Culturel Et Professionnel) Procede et dispositif d'evaluation de l'etat de surface d'un materiau
US20020093349A1 (en) * 2001-01-17 2002-07-18 Su Quanmin C. Method and Apparatus for Reducing the Parachuting of a Probe
US6596992B2 (en) * 2000-12-15 2003-07-22 Seiko Instruments Inc. Method of operating scanning probe microscope
US6672144B2 (en) 1999-03-29 2004-01-06 Veeco Instruments Inc. Dynamic activation for an atomic force microscope and method of use thereof
US20040065819A1 (en) * 2000-03-14 2004-04-08 Olympus Optical Co., Ltd. Scanning unit and scanning microscope having the same
US20050029450A1 (en) * 1998-04-03 2005-02-10 Hough Paul V.C. Sensing mode atomic force microscope
US6881954B1 (en) * 1999-07-27 2005-04-19 Hitachi Construction Machinery Co., Ltd. Scanning probe microscope and method of measurement
US20050092907A1 (en) * 2003-11-04 2005-05-05 West Paul E. Oscillating scanning probe microscope
US20060113469A1 (en) * 2003-01-30 2006-06-01 Shuichi Baba Scanning probe microscope and sample observing method using this and semiconductor device production method
US20080142708A1 (en) * 2006-10-31 2008-06-19 Workman Richard K System for scanning probe microscope input device
CN112567252A (zh) * 2018-08-09 2021-03-26 株式会社岛津制作所 扫描探针显微镜以及使用扫描探针显微镜的物理性质测定方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19824107A1 (de) * 1998-05-29 1999-12-23 Werth Messtechnik Gmbh Tastschnittverfahren sowie Anordnung zur Messgrößenbestimmung einer Oberfläche eines Prüflings nach dem Tastschnittverfahren
JP4497664B2 (ja) * 2000-06-30 2010-07-07 キヤノン株式会社 走査型プローブ顕微鏡及び加工装置
JP2003202284A (ja) 2002-01-09 2003-07-18 Hitachi Ltd 走査プローブ顕微鏡およびこれを用いた試料観察方法およびデバイス製造方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01206202A (ja) * 1988-02-15 1989-08-18 Hitachi Ltd 走査型プローブ顕微鏡
US5001409A (en) * 1987-10-09 1991-03-19 Hitachi, Ltd. Surface metrological apparatus
US5260572A (en) * 1992-08-13 1993-11-09 Wyko Corporation Scanning probe microscope including height plus deflection method and apparatus to achieve both high resolution and high speed scanning
US5329808A (en) * 1989-12-08 1994-07-19 Digital Instruments, Inc. Atomic force microscope
US5388452A (en) * 1993-10-15 1995-02-14 Quesant Instrument Corporation Detection system for atomic force microscopes
US5448399A (en) * 1992-03-13 1995-09-05 Park Scientific Instruments Optical system for scanning microscope
US5714831A (en) * 1995-11-13 1998-02-03 Wisconsin Alumni Research Foundation Method and apparatus for improved control of piezoelectric positioners
US5741614A (en) * 1995-10-16 1998-04-21 Nikon Corporation Atomic force microscope measurement process for dense photoresist patterns
US5801381A (en) * 1997-05-21 1998-09-01 International Business Machines Corporation Method for protecting a probe tip using active lateral scanning control
US5805448A (en) * 1995-03-10 1998-09-08 Molecular Imaging Corporation Hybrid control system for scanning probe microscopes

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308974B1 (en) * 1992-11-30 1998-01-06 Digital Instr Inc Scanning probe microscope using stored data for vertical probe positioning
JPH07174767A (ja) * 1993-12-20 1995-07-14 Olympus Optical Co Ltd 走査型プローブ顕微鏡
JPH07244056A (ja) * 1994-03-09 1995-09-19 Hitachi Ltd 表面観察装置
JP3300545B2 (ja) * 1994-09-16 2002-07-08 株式会社東芝 半導体材料の電気特性評価方法
JP3599440B2 (ja) * 1994-12-05 2004-12-08 キヤノン株式会社 情報処理装置の探針位置制御機構および探針位置制御方法、情報処理装置
JPH08285519A (ja) * 1995-04-11 1996-11-01 Ykk Kk 試料表面観察方法及びそれに用いる探針

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5001409A (en) * 1987-10-09 1991-03-19 Hitachi, Ltd. Surface metrological apparatus
JPH01206202A (ja) * 1988-02-15 1989-08-18 Hitachi Ltd 走査型プローブ顕微鏡
US5329808A (en) * 1989-12-08 1994-07-19 Digital Instruments, Inc. Atomic force microscope
US5448399A (en) * 1992-03-13 1995-09-05 Park Scientific Instruments Optical system for scanning microscope
US5260572A (en) * 1992-08-13 1993-11-09 Wyko Corporation Scanning probe microscope including height plus deflection method and apparatus to achieve both high resolution and high speed scanning
US5388452A (en) * 1993-10-15 1995-02-14 Quesant Instrument Corporation Detection system for atomic force microscopes
US5805448A (en) * 1995-03-10 1998-09-08 Molecular Imaging Corporation Hybrid control system for scanning probe microscopes
US5741614A (en) * 1995-10-16 1998-04-21 Nikon Corporation Atomic force microscope measurement process for dense photoresist patterns
US5714831A (en) * 1995-11-13 1998-02-03 Wisconsin Alumni Research Foundation Method and apparatus for improved control of piezoelectric positioners
US5801381A (en) * 1997-05-21 1998-09-01 International Business Machines Corporation Method for protecting a probe tip using active lateral scanning control

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050029450A1 (en) * 1998-04-03 2005-02-10 Hough Paul V.C. Sensing mode atomic force microscope
US7095020B2 (en) * 1998-04-03 2006-08-22 Brookhaven Science Associates Sensing mode atomic force microscope
US20060191329A1 (en) * 1999-03-29 2006-08-31 Adderton Dennis M Dynamic activation for an atomic force microscope and method of use thereof
US6672144B2 (en) 1999-03-29 2004-01-06 Veeco Instruments Inc. Dynamic activation for an atomic force microscope and method of use thereof
US20050066714A1 (en) * 1999-03-29 2005-03-31 Adderton Dennis M. Active probe for an atomic force microscope and method for use thereof
WO2000058759A3 (fr) * 1999-03-29 2001-07-12 Nanodevices Inc Sonde active pour microscope a forces atomiques et son procede d'utilisation
US6530266B1 (en) 1999-03-29 2003-03-11 Nanodevices, Inc. Active probe for an atomic force microscope and method of use thereof
US20030094036A1 (en) * 1999-03-29 2003-05-22 Adderton Dennis M. Active probe for an atomic force microscope and method of use thereof
US7204131B2 (en) 1999-03-29 2007-04-17 Veeco Instruments Inc. Dynamic activation for an atomic force microscope and method of use thereof
US7017398B2 (en) * 1999-03-29 2006-03-28 Veeco Instruments Inc. Active probe for an atomic force microscope and method for use thereof
WO2000058759A2 (fr) * 1999-03-29 2000-10-05 Nanodevices, Inc. Sonde active pour microscope a forces atomiques et son procede d'utilisation
US6189374B1 (en) * 1999-03-29 2001-02-20 Nanodevices, Inc. Active probe for an atomic force microscope and method of use thereof
US7036357B2 (en) 1999-03-29 2006-05-02 Veeco Instruments Inc. Dynamic activation for an atomic force microscope and method of use thereof
US6810720B2 (en) 1999-03-29 2004-11-02 Veeco Instruments Inc. Active probe for an atomic force microscope and method of use thereof
US20040255651A1 (en) * 1999-03-29 2004-12-23 Adderton Dennis M. Dynamic activation for an atomic force microscope and method of use thereof
US6881954B1 (en) * 1999-07-27 2005-04-19 Hitachi Construction Machinery Co., Ltd. Scanning probe microscope and method of measurement
US20040065819A1 (en) * 2000-03-14 2004-04-08 Olympus Optical Co., Ltd. Scanning unit and scanning microscope having the same
US6809306B2 (en) * 2000-03-14 2004-10-26 Olympus Optical Co., Ltd. Scanning unit and scanning microscope having the same
WO2001094878A1 (fr) * 2000-06-09 2001-12-13 Universite De Haute Alsace (Etablissement Public A Caractere Scientifique, Culturel Et Professionnel) Procede et dispositif d'evaluation de l'etat de surface d'un materiau
FR2810111A1 (fr) * 2000-06-09 2001-12-14 Univ Haute Alsace Dispositif pour evaluer l'etat de surface d'un materiau et procede de mise en oeuvre dudit dispositif
US6810744B2 (en) 2000-06-09 2004-11-02 Universite De Haute Alsace Method and device for assessing the surface condition of a material
US6596992B2 (en) * 2000-12-15 2003-07-22 Seiko Instruments Inc. Method of operating scanning probe microscope
US6838889B2 (en) 2001-01-17 2005-01-04 Veeco Instruments Inc. Method and apparatus for reducing the parachuting of a probe
US20020093349A1 (en) * 2001-01-17 2002-07-18 Su Quanmin C. Method and Apparatus for Reducing the Parachuting of a Probe
US20060113469A1 (en) * 2003-01-30 2006-06-01 Shuichi Baba Scanning probe microscope and sample observing method using this and semiconductor device production method
US20080047334A1 (en) * 2003-01-30 2008-02-28 Shuichi Baba Scanning Microscope With Shape Correction Means
US7562564B2 (en) * 2003-01-30 2009-07-21 Hitachi, Ltd. Scanning probe microscope and sample observing method using this and semiconductor device production method
US20050092907A1 (en) * 2003-11-04 2005-05-05 West Paul E. Oscillating scanning probe microscope
US20080142708A1 (en) * 2006-10-31 2008-06-19 Workman Richard K System for scanning probe microscope input device
US7659509B2 (en) * 2006-10-31 2010-02-09 Agilent Technologies, Inc. System for scanning probe microscope input device
CN112567252B (zh) * 2018-08-09 2024-03-08 株式会社岛津制作所 扫描探针显微镜以及使用扫描探针显微镜的物理性质测定方法
CN112567252A (zh) * 2018-08-09 2021-03-26 株式会社岛津制作所 扫描探针显微镜以及使用扫描探针显微镜的物理性质测定方法

Also Published As

Publication number Publication date
DE69730670D1 (de) 2004-10-21
EP0843175B1 (fr) 2004-09-15
EP0843175A1 (fr) 1998-05-20
DE69730670T2 (de) 2005-09-22
JPH10142240A (ja) 1998-05-29

Similar Documents

Publication Publication Date Title
US5965881A (en) Scanning probe microscope and processing apparatus
US6196061B1 (en) AFM with referenced or differential height measurement
US5298975A (en) Combined scanning force microscope and optical metrology tool
US7478552B2 (en) Optical detection alignment/tracking method and apparatus
US7631546B2 (en) Method and apparatus for monitoring of a SPM actuator
US8050802B2 (en) Method and apparatus of compensating for position shift
US5641897A (en) Scanning apparatus linearization and calibration system
KR20210042358A (ko) 넓은 면적의 고속 원자력 프로파일
US6745617B2 (en) Scanning probe microscope
WO2005098869A1 (fr) Microscope a sonde de balayage et etalonnage integre
JPH07325090A (ja) 光てこ方式の走査型プローブ顕微鏡及び原子間力顕微鏡
US11604210B2 (en) AFM imaging with real time drift correction
JP2967965B2 (ja) 走査型プローブ顕微鏡用スキャナ及びそれを備える走査型プローブ顕微鏡
JP3167495B2 (ja) スキャナーシステム、及びそれを具備した走査型プローブ顕微鏡
JPH10246728A (ja) 走査型プローブ顕微鏡における部分測定方法
JPH08254540A (ja) 走査型プローブ顕微鏡
JP2024520387A (ja) クリープ補正を備えるafmイメージング
JP2004069445A (ja) 走査型プローブ顕微鏡
JP2694783B2 (ja) 原子間力顕微鏡
Hofmann et al. Measurements with an atomic force microscope using a long travel nanopositioning and nanomeasuring machine
CN116125102A (zh) 原子力显微镜及其探针校准方法
JPH10111300A (ja) 走査型プローブ顕微鏡
JPH11326347A (ja) 走査型プローブ顕微鏡
JP2624008B2 (ja) 走査型トンネル顕微鏡
JPH08285865A (ja) 走査型プローブ顕微鏡

Legal Events

Date Code Title Description
AS Assignment

Owner name: HITACHI CONSTRUCTION MACHINERY CO., LTD., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MORIMOTO, TAKAFUMI;MURAYAMA, KEN;HOSAKA, SUMIO;REEL/FRAME:009024/0118

Effective date: 19971016

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

FPAY Fee payment

Year of fee payment: 4

FPAY Fee payment

Year of fee payment: 8

REMI Maintenance fee reminder mailed
LAPS Lapse for failure to pay maintenance fees
LAPS Lapse for failure to pay maintenance fees

Free format text: PATENT EXPIRED FOR FAILURE TO PAY MAINTENANCE FEES (ORIGINAL EVENT CODE: EXP.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

STCH Information on status: patent discontinuation

Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362

FP Lapsed due to failure to pay maintenance fee

Effective date: 20111012