US4054479A - Additive process for producing printed circuit elements using a self-supported photosensitive sheet - Google Patents
Additive process for producing printed circuit elements using a self-supported photosensitive sheet Download PDFInfo
- Publication number
- US4054479A US4054479A US05/753,459 US75345976A US4054479A US 4054479 A US4054479 A US 4054479A US 75345976 A US75345976 A US 75345976A US 4054479 A US4054479 A US 4054479A
- Authority
- US
- United States
- Prior art keywords
- sheet
- holes
- self
- photohardenable
- supported
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- 239000000654 additive Substances 0.000 title description 2
- 230000000996 additive effect Effects 0.000 title description 2
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- 238000007772 electroless plating Methods 0.000 claims abstract description 28
- 230000001464 adherent effect Effects 0.000 claims abstract description 24
- 230000003197 catalytic effect Effects 0.000 claims abstract description 24
- 239000003054 catalyst Substances 0.000 claims abstract description 14
- 239000013039 cover film Substances 0.000 claims description 31
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- 229920001634 Copolyester Polymers 0.000 description 2
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- MJVAVZPDRWSRRC-UHFFFAOYSA-N Menadione Chemical compound C1=CC=C2C(=O)C(C)=CC(=O)C2=C1 MJVAVZPDRWSRRC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
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- KYPYTERUKNKOLP-UHFFFAOYSA-N Tetrachlorobisphenol A Chemical compound C=1C(Cl)=C(O)C(Cl)=CC=1C(C)(C)C1=CC(Cl)=C(O)C(Cl)=C1 KYPYTERUKNKOLP-UHFFFAOYSA-N 0.000 description 2
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- 239000006096 absorbing agent Substances 0.000 description 2
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- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
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- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
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- GFLJTEHFZZNCTR-UHFFFAOYSA-N 3-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OCCCOC(=O)C=C GFLJTEHFZZNCTR-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical class CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
- QUTBKTUHIQFLPI-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 QUTBKTUHIQFLPI-UHFFFAOYSA-N 0.000 description 1
- IKZMAWGJPJMWJG-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IKZMAWGJPJMWJG-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- YMRDPCUYKKPMFC-UHFFFAOYSA-N 4-hydroxy-2,2,5,5-tetramethylhexan-3-one Chemical compound CC(C)(C)C(O)C(=O)C(C)(C)C YMRDPCUYKKPMFC-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- XAMCLRBWHRRBCN-UHFFFAOYSA-N 5-prop-2-enoyloxypentyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCOC(=O)C=C XAMCLRBWHRRBCN-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- RKCRIUIBDUVZSP-UHFFFAOYSA-N 7,8,9,10-tetrahydrotetracene-1,2-dione Chemical compound C1CCCC2=C1C=C1C=C3C=CC(=O)C(=O)C3=CC1=C2 RKCRIUIBDUVZSP-UHFFFAOYSA-N 0.000 description 1
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 description 1
- 229940076442 9,10-anthraquinone Drugs 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- VKOUCJUTMGHNOR-UHFFFAOYSA-N Diphenolic acid Chemical compound C=1C=C(O)C=CC=1C(CCC(O)=O)(C)C1=CC=C(O)C=C1 VKOUCJUTMGHNOR-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000004705 High-molecular-weight polyethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- TVGGFVNRRGKACD-UHFFFAOYSA-N [2,2,4-trimethyl-3-(2-methylprop-2-enoyloxy)pentyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C(C)C)C(C)(C)COC(=O)C(C)=C TVGGFVNRRGKACD-UHFFFAOYSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- UOGPKCHLHAWNIY-UHFFFAOYSA-N [2-hydroxy-3-(2-hydroxy-3-prop-2-enoyloxypropoxy)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(O)COCC(O)COC(=O)C=C UOGPKCHLHAWNIY-UHFFFAOYSA-N 0.000 description 1
- MDMKOESKPAVFJF-UHFFFAOYSA-N [4-(2-methylprop-2-enoyloxy)phenyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(OC(=O)C(C)=C)C=C1 MDMKOESKPAVFJF-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- IYKJEILNJZQJPU-UHFFFAOYSA-N acetic acid;butanedioic acid Chemical compound CC(O)=O.OC(=O)CCC(O)=O IYKJEILNJZQJPU-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001279 adipic acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical group 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- LHMRXAIRPKSGDE-UHFFFAOYSA-N benzo[a]anthracene-7,12-dione Chemical compound C1=CC2=CC=CC=C2C2=C1C(=O)C1=CC=CC=C1C2=O LHMRXAIRPKSGDE-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 235000010944 ethyl methyl cellulose Nutrition 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229960004337 hydroquinone Drugs 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 229920003087 methylethyl cellulose Polymers 0.000 description 1
- 150000005002 naphthylamines Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001483 poly(ethyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000003254 radicals Chemical group 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920006132 styrene block copolymer Polymers 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000004758 synthetic textile Substances 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
Definitions
- the foraminous material generally may be any electrically non-conductive, porous, sheet or web such as woven or non-woven fabrics, papers or other mesh of monofilament or yarn-like fibers.
- Foraminous or mesh materials useful as reinforcement within the photohardenable layer include cotton and other fabrics made from naturally occurring fibers, synthetic fabrics such as nylon, polyarylamids, polyesters, e.g., polyethylene terephthalate, polypropylene and the like, and woven fiber glass, papers, e.g., filter paper or other such non-woven materials made from the aforementioned fibers.
- the reinforced, adherent, photohardenable sheet may be manufactured by any conventional or convenient way.
- Suitable monomers which can be used as the sole monomer or in combination with others include the following: t-butyl acrylate, 1,5 -pentanediol diacrylate, N,N-diethylaminoethyl acrylate, ethylene glycol diacrylate, 1,4-butanediol diacrylate, diethylene glycol diacrylate, hexamethylene glycol diacrylate, 1,3-propanediol diacrylate, decamethylene glycol diacrylate, decamethylene glycol dimethacrylate, 1,4-cyclohexanediol diacrylate, 2,2-dimethylol propane diacrylate, glycerol diacrylate, tripropylene glycol diacrylate, glycerol triacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, 2,2-di(p-hydroxyphenyl)-propane diacrylate, pentaerythritol tetra
- the removable support is removed from each side of the imaged reinforced photopolymer sheet and copper powder is dusted onto the surfaces and into the through-holes. After removing excess copper powder, each surface is uniformly exposed for 3 minutes to the exposure source described in Example 1.
- the reinforced sheet with catalyzed patterns and holes is immersed in an electroless plating solution described in Example 1. Within one hour, a conductive pattern is obtained on both sides of the sheet and in the through-holes so that circuit patterns are conductive from one side of the sheet to the other side through plated through-holes.
- the two-sided printed circuit board is baked for 1 hour at 160° C.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Chemically Coating (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/753,459 US4054479A (en) | 1976-12-22 | 1976-12-22 | Additive process for producing printed circuit elements using a self-supported photosensitive sheet |
DE2756694A DE2756694C3 (de) | 1976-12-22 | 1977-12-20 | Verfahren zur Herstellung von gedruckten Schaltungen |
FR7738604A FR2375796A1 (fr) | 1976-12-22 | 1977-12-21 | Procede pour la production d'elements a circuits imprimes en utilisant une feuille photosensible auto-supportee |
GB53229/77A GB1596769A (en) | 1976-12-22 | 1977-12-21 | Process for preparing printed circuit boards |
BE183693A BE862131A (fr) | 1976-12-22 | 1977-12-21 | Procede pour la production d'elements a circuits imprimes en utilisant une feuille photosensible auto-supportee |
JP15544777A JPS5388956A (en) | 1976-12-22 | 1977-12-22 | Method of producing printed circuit element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/753,459 US4054479A (en) | 1976-12-22 | 1976-12-22 | Additive process for producing printed circuit elements using a self-supported photosensitive sheet |
Publications (1)
Publication Number | Publication Date |
---|---|
US4054479A true US4054479A (en) | 1977-10-18 |
Family
ID=25030721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US05/753,459 Expired - Lifetime US4054479A (en) | 1976-12-22 | 1976-12-22 | Additive process for producing printed circuit elements using a self-supported photosensitive sheet |
Country Status (6)
Country | Link |
---|---|
US (1) | US4054479A (enrdf_load_html_response) |
JP (1) | JPS5388956A (enrdf_load_html_response) |
BE (1) | BE862131A (enrdf_load_html_response) |
DE (1) | DE2756694C3 (enrdf_load_html_response) |
FR (1) | FR2375796A1 (enrdf_load_html_response) |
GB (1) | GB1596769A (enrdf_load_html_response) |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4157407A (en) * | 1978-02-13 | 1979-06-05 | E. I. Du Pont De Nemours And Company | Toning and solvent washout process for making conductive interconnections |
US4234626A (en) * | 1978-02-01 | 1980-11-18 | E. I. Du Pont De Nemours And Company | Producing printed circuits by conjoining metal powder images |
US4239813A (en) * | 1978-04-25 | 1980-12-16 | Hitachi, Ltd. | Process for forming printed wiring by electroless deposition |
US4247623A (en) * | 1979-06-18 | 1981-01-27 | Eastman Kodak Company | Blank beam leads for IC chip bonding |
US4283243A (en) * | 1978-10-24 | 1981-08-11 | E. I. Du Pont De Nemours And Company | Use of photosensitive stratum to create through-hole connections in circuit boards |
US4411980A (en) * | 1981-09-21 | 1983-10-25 | E. I. Du Pont De Nemours And Company | Process for the preparation of flexible circuits |
US4460427A (en) * | 1981-09-21 | 1984-07-17 | E. I. Dupont De Nemours And Company | Process for the preparation of flexible circuits |
US4495917A (en) * | 1982-03-26 | 1985-01-29 | The Regents Of The University Of California | Surgically implantable disconnect device |
US4511757A (en) * | 1983-07-13 | 1985-04-16 | At&T Technologies, Inc. | Circuit board fabrication leading to increased capacity |
US4628022A (en) * | 1983-07-13 | 1986-12-09 | At&T Technologies, Inc. | Multilayer circuit board fabrication process and polymer insulator used therein |
US4695527A (en) * | 1984-04-06 | 1987-09-22 | Hoechst Aktiengesellschaft | Radiation-polymerizable composition and process for the application of markings to a printed circuit board |
US4737446A (en) * | 1986-12-30 | 1988-04-12 | E. I. Du Pont De Nemours And Company | Method for making multilayer circuits using embedded catalyst receptors |
US4795693A (en) * | 1983-07-13 | 1989-01-03 | American Telephone And Telegraph Company, At&T Technologies, Inc. | Multilayer circuit board fabrication process |
US4859571A (en) * | 1986-12-30 | 1989-08-22 | E. I. Du Pont De Nemours And Company | Embedded catalyst receptors for metallization of dielectrics |
USRE33170E (en) * | 1982-03-26 | 1990-02-27 | The Regents Of The University Of California | Surgically implantable disconnect device |
US4915983A (en) * | 1985-06-10 | 1990-04-10 | The Foxboro Company | Multilayer circuit board fabrication process |
US6509546B1 (en) | 2000-03-15 | 2003-01-21 | International Business Machines Corporation | Laser excision of laminate chip carriers |
US20050266214A1 (en) * | 2004-05-28 | 2005-12-01 | Ryosuke Usui | Wiring substrate and method of fabricating the same |
US20100243311A1 (en) * | 2009-03-31 | 2010-09-30 | Ibiden Co., Ltd. | Substrate with metal film and method for manufacturing the same |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5912434A (ja) * | 1982-07-13 | 1984-01-23 | Tokyo Ohka Kogyo Co Ltd | プリント配線板の製造方法 |
KR102024113B1 (ko) | 2017-12-20 | 2019-09-23 | 한국기술교육대학교 산학협력단 | 운전 조건에 따라 고유진동수가 변화하는 제어 대상의 동작을 제어하기 위한 방법 및 장치 |
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US3615471A (en) * | 1967-08-16 | 1971-10-26 | Ibm | Method for making optical masks |
US3646572A (en) * | 1970-02-09 | 1972-02-29 | Photocircuits Corp | Electric wiring assemblies |
US3778900A (en) * | 1970-09-04 | 1973-12-18 | Ibm | Method for forming interconnections between circuit layers of a multi-layer package |
US3934335A (en) * | 1974-10-16 | 1976-01-27 | Texas Instruments Incorporated | Multilayer printed circuit board |
US3956041A (en) * | 1972-07-11 | 1976-05-11 | Kollmorgen Corporation | Transfer coating process for manufacture of printing circuits |
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FR1420044A (fr) * | 1963-12-26 | 1965-12-03 | Matsushita Electric Ind Co Ltd | Procédé de fabrication des circuits imprimés |
DE2309712A1 (de) * | 1973-02-27 | 1974-08-29 | Nitto Electric Ind Co | Verfahren zur herstellung von abbildungen |
JPS5286160A (en) * | 1976-01-13 | 1977-07-18 | Hitachi Ltd | Method of producing printed circuit board |
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1976
- 1976-12-22 US US05/753,459 patent/US4054479A/en not_active Expired - Lifetime
-
1977
- 1977-12-20 DE DE2756694A patent/DE2756694C3/de not_active Expired
- 1977-12-21 FR FR7738604A patent/FR2375796A1/fr active Granted
- 1977-12-21 GB GB53229/77A patent/GB1596769A/en not_active Expired
- 1977-12-21 BE BE183693A patent/BE862131A/xx not_active IP Right Cessation
- 1977-12-22 JP JP15544777A patent/JPS5388956A/ja active Granted
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US3436468A (en) * | 1965-05-28 | 1969-04-01 | Texas Instruments Inc | Plastic bodies having regions of altered chemical structure and method of making same |
US3615471A (en) * | 1967-08-16 | 1971-10-26 | Ibm | Method for making optical masks |
US3646572A (en) * | 1970-02-09 | 1972-02-29 | Photocircuits Corp | Electric wiring assemblies |
US3778900A (en) * | 1970-09-04 | 1973-12-18 | Ibm | Method for forming interconnections between circuit layers of a multi-layer package |
US3956041A (en) * | 1972-07-11 | 1976-05-11 | Kollmorgen Corporation | Transfer coating process for manufacture of printing circuits |
US3934335A (en) * | 1974-10-16 | 1976-01-27 | Texas Instruments Incorporated | Multilayer printed circuit board |
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4234626A (en) * | 1978-02-01 | 1980-11-18 | E. I. Du Pont De Nemours And Company | Producing printed circuits by conjoining metal powder images |
US4157407A (en) * | 1978-02-13 | 1979-06-05 | E. I. Du Pont De Nemours And Company | Toning and solvent washout process for making conductive interconnections |
EP0003605A3 (en) * | 1978-02-13 | 1979-09-05 | E.I. Du Pont De Nemours And Company | Toning and solvent washout process for making conductive interconnections |
US4239813A (en) * | 1978-04-25 | 1980-12-16 | Hitachi, Ltd. | Process for forming printed wiring by electroless deposition |
US4283243A (en) * | 1978-10-24 | 1981-08-11 | E. I. Du Pont De Nemours And Company | Use of photosensitive stratum to create through-hole connections in circuit boards |
US4247623A (en) * | 1979-06-18 | 1981-01-27 | Eastman Kodak Company | Blank beam leads for IC chip bonding |
US4411980A (en) * | 1981-09-21 | 1983-10-25 | E. I. Du Pont De Nemours And Company | Process for the preparation of flexible circuits |
US4460427A (en) * | 1981-09-21 | 1984-07-17 | E. I. Dupont De Nemours And Company | Process for the preparation of flexible circuits |
USRE33170E (en) * | 1982-03-26 | 1990-02-27 | The Regents Of The University Of California | Surgically implantable disconnect device |
US4495917A (en) * | 1982-03-26 | 1985-01-29 | The Regents Of The University Of California | Surgically implantable disconnect device |
US4628022A (en) * | 1983-07-13 | 1986-12-09 | At&T Technologies, Inc. | Multilayer circuit board fabrication process and polymer insulator used therein |
US4511757A (en) * | 1983-07-13 | 1985-04-16 | At&T Technologies, Inc. | Circuit board fabrication leading to increased capacity |
US4795693A (en) * | 1983-07-13 | 1989-01-03 | American Telephone And Telegraph Company, At&T Technologies, Inc. | Multilayer circuit board fabrication process |
US4695527A (en) * | 1984-04-06 | 1987-09-22 | Hoechst Aktiengesellschaft | Radiation-polymerizable composition and process for the application of markings to a printed circuit board |
US4915983A (en) * | 1985-06-10 | 1990-04-10 | The Foxboro Company | Multilayer circuit board fabrication process |
US4737446A (en) * | 1986-12-30 | 1988-04-12 | E. I. Du Pont De Nemours And Company | Method for making multilayer circuits using embedded catalyst receptors |
US4859571A (en) * | 1986-12-30 | 1989-08-22 | E. I. Du Pont De Nemours And Company | Embedded catalyst receptors for metallization of dielectrics |
US5112726A (en) * | 1986-12-30 | 1992-05-12 | E. I. Du Pont De Nemours And Company | Embedded catalyst receptors for metallization of dielectrics |
US6509546B1 (en) | 2000-03-15 | 2003-01-21 | International Business Machines Corporation | Laser excision of laminate chip carriers |
US20050266214A1 (en) * | 2004-05-28 | 2005-12-01 | Ryosuke Usui | Wiring substrate and method of fabricating the same |
US7491895B2 (en) * | 2004-05-28 | 2009-02-17 | Sanyo Electric Co., Ltd. | Wiring substrate and method of fabricating the same |
US20100243311A1 (en) * | 2009-03-31 | 2010-09-30 | Ibiden Co., Ltd. | Substrate with metal film and method for manufacturing the same |
US8563873B2 (en) * | 2009-03-31 | 2013-10-22 | Ibiden Co., Ltd. | Substrate with metal film and method for manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
GB1596769A (en) | 1981-08-26 |
BE862131A (fr) | 1978-06-21 |
FR2375796B1 (enrdf_load_html_response) | 1984-05-04 |
JPS5748878B2 (enrdf_load_html_response) | 1982-10-19 |
DE2756694A1 (de) | 1978-06-29 |
DE2756694C3 (de) | 1980-06-26 |
DE2756694B2 (de) | 1979-09-20 |
JPS5388956A (en) | 1978-08-04 |
FR2375796A1 (fr) | 1978-07-21 |
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