US3788968A - Layered electrode - Google Patents
Layered electrode Download PDFInfo
- Publication number
- US3788968A US3788968A US00213847A US3788968DA US3788968A US 3788968 A US3788968 A US 3788968A US 00213847 A US00213847 A US 00213847A US 3788968D A US3788968D A US 3788968DA US 3788968 A US3788968 A US 3788968A
- Authority
- US
- United States
- Prior art keywords
- metal
- titanium
- electrode
- graphite
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 27
- 229910002804 graphite Inorganic materials 0.000 abstract description 27
- 239000010439 graphite Substances 0.000 abstract description 27
- 239000000919 ceramic Substances 0.000 abstract description 17
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 abstract description 14
- 238000000576 coating method Methods 0.000 abstract description 14
- 239000011248 coating agent Substances 0.000 abstract description 12
- 238000005868 electrolysis reaction Methods 0.000 abstract description 10
- 229910001514 alkali metal chloride Inorganic materials 0.000 abstract description 5
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 abstract description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 28
- 229910052751 metal Inorganic materials 0.000 description 25
- 239000002184 metal Substances 0.000 description 25
- 229910044991 metal oxide Inorganic materials 0.000 description 15
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 13
- 150000004706 metal oxides Chemical class 0.000 description 13
- 229910052719 titanium Inorganic materials 0.000 description 13
- 239000010936 titanium Substances 0.000 description 13
- 229910052697 platinum Inorganic materials 0.000 description 10
- -1 platinum metals Chemical class 0.000 description 8
- 229910052715 tantalum Inorganic materials 0.000 description 8
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 5
- 238000007750 plasma spraying Methods 0.000 description 5
- 229910052726 zirconium Inorganic materials 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 229910052741 iridium Inorganic materials 0.000 description 4
- 239000010955 niobium Substances 0.000 description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 229910052707 ruthenium Inorganic materials 0.000 description 4
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 239000010953 base metal Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000007792 gaseous phase Substances 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 235000019198 oils Nutrition 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical group 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910000743 fusible alloy Inorganic materials 0.000 description 1
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- YUWFEBAXEOLKSG-UHFFFAOYSA-N hexamethylbenzene Chemical compound CC1=C(C)C(C)=C(C)C(C)=C1C YUWFEBAXEOLKSG-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000007420 reactivation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003304 ruthenium compounds Chemical class 0.000 description 1
- YAYGSLOSTXKUBW-UHFFFAOYSA-N ruthenium(2+) Chemical compound [Ru+2] YAYGSLOSTXKUBW-UHFFFAOYSA-N 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/065—Carbon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/043—Carbon, e.g. diamond or graphene
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Definitions
- An electrode especially useful as an anode in the electrolysis of alkali metal chlorides, includes a graphite body, a first surface covering of a hard ceramic such as titanium carbide or titanium nitride and at least one metal and/or metal oxide of the platinum group and a second oxide coating which is electrically porous and resistant to the electrolysis conditions.
- This invention relates to an electrode having a graphite body and to a process of manufacturing same. More particularly, this invention relates to an electrode and especially an anode useful for the electrolysis of alkali metal chlorides.
- a two-layer electrodes consisting mainly of titanium.
- Such layers consist of a noble metal and a protective porous coating of the base metal (French Pat. 1,502,587), of noble metal and titanium dioxide (Dutch Pat. 99,396), or of noble metal and silicon dioxide (opened Dutch application 6612095), or of layers which are applied from the electrolyte, to which water-glass, zirconium oxychloride, aluminum chloride, gallium chloride, and boric acid may be added for this purpose (opened Dutch application 6612096; printed German application 1,567,925), or of platinum or iron, which is subsequently oxidized (U.S. Pat. 3,103,484).
- the printed German application 1,421,047 discloses an anode 'which is made from a titanium alloy and which has been coated with a thin layer of titanium nitride by being heated in a nitrogen or ammonia atmosphere so that the anode will resist aggressive fluids and its conductivity is improved.
- the electrode of the invention comprises a graphite body having a first surface covering comprising a hard ceramic and of at least one metal and/ or metal oxide of the platinum metals and a second oxide coating which is electrically porous and resists the chemical conditions of the electrolysis.
- the first surface covering on the graphite body may consist of a mixture of a hard ceramic and at least one metal and/or metal oxide of the platinum metals, or the first covering may consist of two layers, namely, a lower layer of a hard ceramic and an upper layer of a metal and/or metal oxide of the platinum metals.
- the hard ceramic is preferably titanium carbide and more particularly titanium nitride.
- a metal from the platinum group and/or any of the oxides thereof can be used in the first covering with the ceramic material.
- the platinum metals include Ru, Rh, Pd, Os, Ir and Pt.
- An oxide of a platinum metal is a particularly suitable constituent of the first covering.
- An oxide coating of silicon dioxide, titanium dioxide, zirconium dioxide, columbium pentoxide or tantalum pentoxide is preferably used to protect the first surface covering.
- the graphite body can have any shape suitable for use as an electrode. Thus, it can be a rod, bar, sheet, block, etc.
- the graphite body can also be referred to as a skeleton, or frame, or an inner core, etc.
- body of graphite is provided with a first surface covering comprising a hard ceramic and at least one metal and/or metal oxide of the platinum metals, and the covering is subsequently protected with an oxide coating, which is electrically porous and resists the chemical conditions of the electrolysis.
- the covering on the graphite body may be formed in any of three ways:
- a hard ceramic and at least one metal and/or metal oxide of the platinum group are jointly applied in a mixture by plasma spraying.
- the hard ceramic is first applied by plasma spraying and at least one metal and/or metal oxide of the platinum group is produced from a suspension or solution by impregnation and subsequent annealing at an elevated temperature, which is suitably in the range of 300600 C.
- the hard ceramic is first applied by plasma spraying and at least one metal and/or metal oxide of the platinum group is deposited from the gaseous phase on the hard ceramic layer.
- the hard ceramic is preferably titanium carbide and particularly titanium nitride, and the metal and/r metal oxide of the platinum group is preferably an oxide of a platinum metal.
- the protective second coating is produced by a hydrolytic decomposition of the chlorides of silicon, titanium, zirconium, columbium or tantalum followed by volatilization of the solvent.
- the electrode has a high durability (wear resistance) and dimensional stability as well as desirable electrical properties. Because of the excellent conductivity of the hard ceramics and the activation by a metal and/0r metal oxide of the platinum metals, the overvoltage of the chlorine is reduced to a value which is economically desirable.
- the electrode is highly short circuit-proof. An erosion of the layer of platinum metal or platinum metal oxide is prevented by the oxide with which the electrode is coated on the outside.
- the invention enables the use of graphite, which is economically desirable, as a base or core material in making the electrode.
- EXAMPLE 1 A graphite block having dimensions of 40 x 40 x millimeters is covered on one side by plasma spraying with titanium nitride so that a layer is formed which has a thickness between 0.1 and 0.3 millimeter.
- the titanium nitride layer is washed with alcohol and subsequently dried and is then covered with a solution of 1 gram RuCl in 5 milliliters butanol and 2 grams linseed oil in such a manner that about 15 grams ruthenium per square meter are applied.
- This covering is baked for 15 minutes at 400 C. in an atmosphere of hydrogen or town gas so that a mixture of ruthenium metal and ruthenium oxide is formed.
- This layer is coated with a solution of 5 grams TiCl, in 20 milliliters butanol and the resulting coating is also baked for 15 minutes in the stated atmosphere at 400 C.
- EXAMPLE 2 A graphite block is coated with titanium nitride as described in Example 1. Thereafter, the titanium nitride layer is covered with a homogeneous layer of ruthenium metal deposited from the gaseous phase. For this purpose, the graphite block is heated under a vacuum or in a protective gas atmosphere to temperatures above 300 C. by induction heating. As a volatile ruthenium compound, the diaromatic metal complex of ruthenium (II) or (O) 'with benzene or hexamethylbenzene is used. The complex is thermally decomposed on the heated surface of the titanium nitride so that metallic ruthenium is deposited. This layer is protected by an electrically porous SiO layer, which is formed by the application of a mixture of 5 grams SiCl, in 20 milliliters butanol and subsequent baking at 400 C.
- an electrically porous SiO layer which is formed by the application of a mixture of 5 grams SiCl, in 20 milliliters
- EXAMPLE 3 A graphite block is covered with titanium nitride as in Example 1 and is covered with a palladium-iridium resinate solution and baked at 400 C. The resulting covering of 15 grams per square meter is then protected by a porous tantalum pentoxide layer, which has been formed by brushing an alcoholic tantalum pentachloride solution onto the nitride layer, followed by annealing at 400 C. within 15 minutes.
- EXAMPLE 4 A graphite block is covered with a mixture of titanium nitride and ruthenium oxide (3%) by plasma spraying. In this step, the resulting ruthenium metal-oxide mixture is concentrated at the surface of the titanium nitride layer and is subsequently protected by a porous zirconium oxide layer, which is formed by the application of an alcoholic ZrCl, solution and subsequent annealing at 400 C.
- Electrode comprising a graphite body having a first surface covering comprising a hard ceramic selected from the group of titanium carbide and titanium nitride and of at least one metal and/or metal oxide of the platinum group and a second protective oxide coating from the group of the oxides of silicon, titanium, zirconium, columbium and tantalum over said first covering which is electrically porous and resistant to electrolysis conditions.
- Electrode of claim 1 wherein said first surface covering comprises a mixture of said hard ceramic and at least one metal and/or metal oxide of the platinum metals.
- Electrode of claim 1 wherein said first surface covering comprises said hard ceramic base layer and a layer of at least one metal and/or metal oxide of the platinum group over said ceramic layer.
- Electrode of claim 1 wherein said first covering contains an oxide of a platinum metal.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19712100652 DE2100652A1 (de) | 1971-01-08 | 1971-01-08 | Elektrode für die Chloralkalielektrolyse und Verfahren zu ihrer Herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
US3788968A true US3788968A (en) | 1974-01-29 |
Family
ID=5795378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00213847A Expired - Lifetime US3788968A (en) | 1971-01-08 | 1971-12-29 | Layered electrode |
Country Status (17)
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3856650A (en) * | 1972-03-21 | 1974-12-24 | Alusuisse | Cathode for an aluminium fusion electrolysis cell and method of making the same |
US4111765A (en) * | 1976-12-23 | 1978-09-05 | Diamond Shamrock Technologies S.A. | Silicon carbide-valve metal borides-carbon electrodes |
US4279709A (en) * | 1979-05-08 | 1981-07-21 | The Dow Chemical Company | Preparation of porous electrodes |
US4362707A (en) * | 1981-04-23 | 1982-12-07 | Diamond Shamrock Corporation | Preparation of chlorine dioxide with platinum group metal oxide catalysts |
US4680438A (en) * | 1985-03-14 | 1987-07-14 | W. C. Heraeus Gmbh | Laminated material for electrical contacts and method of manufacturing same |
US4871703A (en) * | 1983-05-31 | 1989-10-03 | The Dow Chemical Company | Process for preparation of an electrocatalyst |
US4938851A (en) * | 1984-12-14 | 1990-07-03 | De Nora Permelec S.P.A. | Method for preparing an electrode and use thereof in electrochemical processes |
US4975161A (en) * | 1985-04-12 | 1990-12-04 | De Nora Permelec S.P.A. | Electrodes for use in electrochemical processes and method for preparing the same |
US5385761A (en) * | 1990-05-08 | 1995-01-31 | I.T.M. Corporation | Discharge element, method of producing the same and apparatus comprising the same |
US6527939B1 (en) | 1999-06-28 | 2003-03-04 | Eltech Systems Corporation | Method of producing copper foil with an anode having multiple coating layers |
WO2004038071A3 (en) * | 2002-10-18 | 2005-01-20 | Eltech Systems Corp | Coatings for the inhibition of undesirable oxidation in an electrochemical cell |
CN101967654A (zh) * | 2010-10-11 | 2011-02-09 | 福州大学 | 采用钛基材渗碳改性的含钌氧化物电极材料及其制备方法 |
US8580091B2 (en) | 2010-10-08 | 2013-11-12 | Water Star, Inc. | Multi-layer mixed metal oxide electrode and method for making same |
US11668017B2 (en) | 2018-07-30 | 2023-06-06 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
US12359333B2 (en) | 2022-09-02 | 2025-07-15 | Battelle Energy Alliance, Llc | Metal-coated articles comprising a transition metal region and a platinum-group metal region and related methods |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4300992A (en) * | 1975-05-12 | 1981-11-17 | Hodogaya Chemical Co., Ltd. | Activated cathode |
DE2630883C2 (de) * | 1976-07-09 | 1985-02-07 | Basf Ag, 6700 Ludwigshafen | Verwendung einer nach dem Plasma- oder Flammspritzverfahren auf einem metallischen Träger aufgebrachten porösen anorganische Oxide enthaltenden Schicht als Diaphragma in einer Elektrolysezelle |
DE2928911A1 (de) * | 1979-06-29 | 1981-01-29 | Bbc Brown Boveri & Cie | Elektrode fuer die wasserelektrolyse |
DE3106587C2 (de) * | 1981-02-21 | 1987-01-02 | Heraeus Elektroden GmbH, 6450 Hanau | Elektrode und deren Verwendung |
GB8503876D0 (en) * | 1985-02-15 | 1985-03-20 | Ontario Research Foundation | Chemical vapour deposition of titanium borides |
GB2269392A (en) * | 1992-08-06 | 1994-02-09 | Monitor Coatings & Eng | Coating of components with final impregnation with chromia or phosphate forming compound |
-
1971
- 1971-01-08 DE DE19712100652 patent/DE2100652A1/de active Pending
- 1971-11-16 AT AT990771A patent/AT313313B/de not_active IP Right Cessation
- 1971-12-08 CS CS718555A patent/CS171244B2/cs unknown
- 1971-12-17 FR FR7145390A patent/FR2120796A5/fr not_active Expired
- 1971-12-23 AU AU37272/71A patent/AU453074B2/en not_active Expired
- 1971-12-28 ES ES398386A patent/ES398386A1/es not_active Expired
- 1971-12-29 US US00213847A patent/US3788968A/en not_active Expired - Lifetime
- 1971-12-30 SE SE7116962A patent/SE377141B/xx unknown
- 1971-12-30 IT IT33128/71A patent/IT944571B/it active
-
1972
- 1972-01-04 BE BE777682A patent/BE777682A/xx unknown
- 1972-01-04 GB GB32272A patent/GB1355622A/en not_active Expired
- 1972-01-06 NL NL7200171A patent/NL7200171A/xx unknown
- 1972-01-06 CH CH18472A patent/CH564099A5/xx not_active IP Right Cessation
- 1972-01-06 RO RO69311A patent/RO61492A/ro unknown
- 1972-01-07 ZA ZA720110A patent/ZA72110B/xx unknown
- 1972-01-07 BR BR90/72A patent/BR7200090D0/pt unknown
- 1972-01-07 CA CA131,967A patent/CA974931A/en not_active Expired
- 1972-02-22 ES ES400039A patent/ES400039A1/es not_active Expired
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3856650A (en) * | 1972-03-21 | 1974-12-24 | Alusuisse | Cathode for an aluminium fusion electrolysis cell and method of making the same |
US4111765A (en) * | 1976-12-23 | 1978-09-05 | Diamond Shamrock Technologies S.A. | Silicon carbide-valve metal borides-carbon electrodes |
US4279709A (en) * | 1979-05-08 | 1981-07-21 | The Dow Chemical Company | Preparation of porous electrodes |
US4362707A (en) * | 1981-04-23 | 1982-12-07 | Diamond Shamrock Corporation | Preparation of chlorine dioxide with platinum group metal oxide catalysts |
US4871703A (en) * | 1983-05-31 | 1989-10-03 | The Dow Chemical Company | Process for preparation of an electrocatalyst |
US4938851A (en) * | 1984-12-14 | 1990-07-03 | De Nora Permelec S.P.A. | Method for preparing an electrode and use thereof in electrochemical processes |
US4680438A (en) * | 1985-03-14 | 1987-07-14 | W. C. Heraeus Gmbh | Laminated material for electrical contacts and method of manufacturing same |
US4975161A (en) * | 1985-04-12 | 1990-12-04 | De Nora Permelec S.P.A. | Electrodes for use in electrochemical processes and method for preparing the same |
US5385761A (en) * | 1990-05-08 | 1995-01-31 | I.T.M. Corporation | Discharge element, method of producing the same and apparatus comprising the same |
US6527939B1 (en) | 1999-06-28 | 2003-03-04 | Eltech Systems Corporation | Method of producing copper foil with an anode having multiple coating layers |
WO2004038071A3 (en) * | 2002-10-18 | 2005-01-20 | Eltech Systems Corp | Coatings for the inhibition of undesirable oxidation in an electrochemical cell |
US8580091B2 (en) | 2010-10-08 | 2013-11-12 | Water Star, Inc. | Multi-layer mixed metal oxide electrode and method for making same |
CN101967654A (zh) * | 2010-10-11 | 2011-02-09 | 福州大学 | 采用钛基材渗碳改性的含钌氧化物电极材料及其制备方法 |
CN101967654B (zh) * | 2010-10-11 | 2012-06-27 | 福州大学 | 采用钛基材渗碳改性的含钌氧化物电极材料及其制备方法 |
US11668017B2 (en) | 2018-07-30 | 2023-06-06 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
US12305300B2 (en) | 2018-07-30 | 2025-05-20 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
US12359333B2 (en) | 2022-09-02 | 2025-07-15 | Battelle Energy Alliance, Llc | Metal-coated articles comprising a transition metal region and a platinum-group metal region and related methods |
Also Published As
Publication number | Publication date |
---|---|
BE777682A (fr) | 1972-05-02 |
SE377141B (enrdf_load_stackoverflow) | 1975-06-23 |
AU3727271A (en) | 1973-06-28 |
ZA72110B (en) | 1972-11-29 |
CA974931A (en) | 1975-09-23 |
BR7200090D0 (pt) | 1973-06-14 |
NL7200171A (enrdf_load_stackoverflow) | 1972-07-11 |
AT313313B (de) | 1974-02-11 |
IT944571B (it) | 1973-04-20 |
CS171244B2 (en) | 1976-10-31 |
AU453074B2 (en) | 1974-09-19 |
ES400039A1 (es) | 1974-12-16 |
FR2120796A5 (enrdf_load_stackoverflow) | 1972-08-18 |
ES398386A1 (es) | 1974-10-01 |
GB1355622A (en) | 1974-06-05 |
RO61492A (enrdf_load_stackoverflow) | 1976-11-15 |
DE2100652A1 (de) | 1972-07-20 |
CH564099A5 (enrdf_load_stackoverflow) | 1975-07-15 |
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