US3733200A - Printing plate - Google Patents
Printing plate Download PDFInfo
- Publication number
- US3733200A US3733200A US00114887A US3733200DA US3733200A US 3733200 A US3733200 A US 3733200A US 00114887 A US00114887 A US 00114887A US 3733200D A US3733200D A US 3733200DA US 3733200 A US3733200 A US 3733200A
- Authority
- US
- United States
- Prior art keywords
- methacrylate
- printing
- acrylate
- hydrophilic
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007639 printing Methods 0.000 title abstract description 59
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 33
- 229920000642 polymer Polymers 0.000 abstract description 23
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 abstract description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 7
- 229920005989 resin Polymers 0.000 description 31
- 239000011347 resin Substances 0.000 description 31
- -1 polyethylene terephthalate Polymers 0.000 description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 239000004411 aluminium Substances 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 229910052782 aluminium Inorganic materials 0.000 description 12
- 239000000178 monomer Substances 0.000 description 10
- 239000004925 Acrylic resin Substances 0.000 description 8
- 229920000178 Acrylic resin Polymers 0.000 description 8
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 8
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 238000007645 offset printing Methods 0.000 description 7
- 229940044192 2-hydroxyethyl methacrylate Drugs 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 6
- 239000003431 cross linking reagent Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 229960000834 vinyl ether Drugs 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- 239000006188 syrup Substances 0.000 description 5
- 235000020357 syrup Nutrition 0.000 description 5
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 4
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- 125000005250 alkyl acrylate group Chemical group 0.000 description 4
- 238000005266 casting Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 4
- 229920001477 hydrophilic polymer Polymers 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 239000011147 inorganic material Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
- BEWCNXNIQCLWHP-UHFFFAOYSA-N 2-(tert-butylamino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC(C)(C)C BEWCNXNIQCLWHP-UHFFFAOYSA-N 0.000 description 3
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 3
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 3
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 102000009027 Albumins Human genes 0.000 description 3
- 108010088751 Albumins Proteins 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229930006000 Sucrose Natural products 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 150000008049 diazo compounds Chemical class 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- IPZIVCLZBFDXTA-UHFFFAOYSA-N ethyl n-prop-2-enoylcarbamate Chemical compound CCOC(=O)NC(=O)C=C IPZIVCLZBFDXTA-UHFFFAOYSA-N 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 239000012254 powdered material Substances 0.000 description 3
- 239000005720 sucrose Substances 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- NMGPHUOPSWFUEB-UHFFFAOYSA-N 2-(butylamino)ethyl 2-methylprop-2-enoate Chemical compound CCCCNCCOC(=O)C(C)=C NMGPHUOPSWFUEB-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229940091179 aconitate Drugs 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 229940018560 citraconate Drugs 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229940093476 ethylene glycol Drugs 0.000 description 2
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 239000008103 glucose Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 239000002987 primer (paints) Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 229920003176 water-insoluble polymer Polymers 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WRXCBRHBHGNNQA-UHFFFAOYSA-N (2,4-dichlorobenzoyl) 2,4-dichlorobenzenecarboperoxoate Chemical compound ClC1=CC(Cl)=CC=C1C(=O)OOC(=O)C1=CC=C(Cl)C=C1Cl WRXCBRHBHGNNQA-UHFFFAOYSA-N 0.000 description 1
- 239000001124 (E)-prop-1-ene-1,2,3-tricarboxylic acid Substances 0.000 description 1
- ZKXXLNRGNAUYHP-NSCUHMNNSA-N (e)-4-(2-hydroxypropoxy)-4-oxobut-2-enoic acid Chemical compound CC(O)COC(=O)\C=C\C(O)=O ZKXXLNRGNAUYHP-NSCUHMNNSA-N 0.000 description 1
- MAIIXYUYRNFKPL-UPHRSURJSA-N (z)-4-(2-hydroxyethoxy)-4-oxobut-2-enoic acid Chemical compound OCCOC(=O)\C=C/C(O)=O MAIIXYUYRNFKPL-UPHRSURJSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- VDYWHVQKENANGY-UHFFFAOYSA-N 1,3-Butyleneglycol dimethacrylate Chemical compound CC(=C)C(=O)OC(C)CCOC(=O)C(C)=C VDYWHVQKENANGY-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- RMFVFBUXAXXIQM-UHFFFAOYSA-N 1-ethenoxypropan-2-amine Chemical compound CC(N)COC=C RMFVFBUXAXXIQM-UHFFFAOYSA-N 0.000 description 1
- QRIMLDXJAPZHJE-UHFFFAOYSA-N 2,3-dihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)CO QRIMLDXJAPZHJE-UHFFFAOYSA-N 0.000 description 1
- OWPUOLBODXJOKH-UHFFFAOYSA-N 2,3-dihydroxypropyl prop-2-enoate Chemical compound OCC(O)COC(=O)C=C OWPUOLBODXJOKH-UHFFFAOYSA-N 0.000 description 1
- OLQFXOWPTQTLDP-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCO OLQFXOWPTQTLDP-UHFFFAOYSA-N 0.000 description 1
- RWXMAAYKJDQVTF-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl prop-2-enoate Chemical compound OCCOCCOC(=O)C=C RWXMAAYKJDQVTF-UHFFFAOYSA-N 0.000 description 1
- ZKLMKZINKNMVKA-UHFFFAOYSA-N 2-(2-hydroxypropoxy)propan-1-ol;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(O)COC(C)CO ZKLMKZINKNMVKA-UHFFFAOYSA-N 0.000 description 1
- YATYDCQGPUOZGZ-UHFFFAOYSA-N 2-(2-hydroxypropoxy)propan-1-ol;prop-2-enoic acid Chemical compound OC(=O)C=C.CC(O)COC(C)CO YATYDCQGPUOZGZ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- IEXIIPOUMNDEEJ-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CC)COC(=O)C(C)=C IEXIIPOUMNDEEJ-UHFFFAOYSA-N 0.000 description 1
- JJBFVQSGPLGDNX-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)COC(=O)C(C)=C JJBFVQSGPLGDNX-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- GSQIVVSEVORPJF-UHFFFAOYSA-N 2-(butylamino)ethyl prop-2-enoate Chemical compound CCCCNCCOC(=O)C=C GSQIVVSEVORPJF-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- UOZJCRSVUOQDNJ-UHFFFAOYSA-N 2-(dibutylamino)ethyl prop-2-enoate Chemical compound CCCCN(CCCC)CCOC(=O)C=C UOZJCRSVUOQDNJ-UHFFFAOYSA-N 0.000 description 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
- QHVBLSNVXDSMEB-UHFFFAOYSA-N 2-(diethylamino)ethyl prop-2-enoate Chemical compound CCN(CC)CCOC(=O)C=C QHVBLSNVXDSMEB-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 1
- OBMRSUNAEQGDLK-UHFFFAOYSA-N 2-(dipropylamino)ethyl 2-methylprop-2-enoate Chemical compound CCCN(CCC)CCOC(=O)C(C)=C OBMRSUNAEQGDLK-UHFFFAOYSA-N 0.000 description 1
- HPGIOSOCXHTQGW-UHFFFAOYSA-N 2-(dipropylamino)ethyl prop-2-enoate Chemical compound CCCN(CCC)CCOC(=O)C=C HPGIOSOCXHTQGW-UHFFFAOYSA-N 0.000 description 1
- KZUIKPMQAIEBOE-UHFFFAOYSA-N 2-(ethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCNCCOC(=O)C(C)=C KZUIKPMQAIEBOE-UHFFFAOYSA-N 0.000 description 1
- KDAKDBASXBEFFK-UHFFFAOYSA-N 2-(tert-butylamino)ethyl prop-2-enoate Chemical compound CC(C)(C)NCCOC(=O)C=C KDAKDBASXBEFFK-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- MZGMQAMKOBOIDR-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCO MZGMQAMKOBOIDR-UHFFFAOYSA-N 0.000 description 1
- VETIYACESIPJSO-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound OCCOCCOCCOC(=O)C=C VETIYACESIPJSO-UHFFFAOYSA-N 0.000 description 1
- JFZBUNLOTDDXNY-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)propoxy]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)OCC(C)OC(=O)C(C)=C JFZBUNLOTDDXNY-UHFFFAOYSA-N 0.000 description 1
- QLIBJPGWWSHWBF-UHFFFAOYSA-N 2-aminoethyl methacrylate Chemical compound CC(=C)C(=O)OCCN QLIBJPGWWSHWBF-UHFFFAOYSA-N 0.000 description 1
- PLWQJHWLGRXAMP-UHFFFAOYSA-N 2-ethenoxy-n,n-diethylethanamine Chemical compound CCN(CC)CCOC=C PLWQJHWLGRXAMP-UHFFFAOYSA-N 0.000 description 1
- JWCDUUFOAZFFMX-UHFFFAOYSA-N 2-ethenoxy-n,n-dimethylethanamine Chemical compound CN(C)CCOC=C JWCDUUFOAZFFMX-UHFFFAOYSA-N 0.000 description 1
- HDEFKPTUGHCBCD-UHFFFAOYSA-N 2-ethenoxy-n-methylethanamine Chemical compound CNCCOC=C HDEFKPTUGHCBCD-UHFFFAOYSA-N 0.000 description 1
- CEYHHQSTMVVZQP-UHFFFAOYSA-N 2-ethenoxyethanamine Chemical compound NCCOC=C CEYHHQSTMVVZQP-UHFFFAOYSA-N 0.000 description 1
- GQAOCNJRHMZKBR-UHFFFAOYSA-N 2-ethenylsulfanyl-n,n-diethylethanamine Chemical compound CCN(CC)CCSC=C GQAOCNJRHMZKBR-UHFFFAOYSA-N 0.000 description 1
- OHWBJBZVYGDDNO-UHFFFAOYSA-N 2-ethenylsulfanyl-n-methylethanamine Chemical compound CNCCSC=C OHWBJBZVYGDDNO-UHFFFAOYSA-N 0.000 description 1
- JEIWZOOQUZYRFS-UHFFFAOYSA-N 2-ethenylsulfanylethanamine Chemical compound NCCSC=C JEIWZOOQUZYRFS-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SFPNZPQIIAJXGL-UHFFFAOYSA-N 2-ethoxyethyl 2-methylprop-2-enoate Chemical compound CCOCCOC(=O)C(C)=C SFPNZPQIIAJXGL-UHFFFAOYSA-N 0.000 description 1
- FWWXYLGCHHIKNY-UHFFFAOYSA-N 2-ethoxyethyl prop-2-enoate Chemical compound CCOCCOC(=O)C=C FWWXYLGCHHIKNY-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- YQIGLEFUZMIVHU-UHFFFAOYSA-N 2-methyl-n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C(C)=C YQIGLEFUZMIVHU-UHFFFAOYSA-N 0.000 description 1
- CCIDRBFZPRURMU-UHFFFAOYSA-N 2-methyl-n-propylprop-2-enamide Chemical compound CCCNC(=O)C(C)=C CCIDRBFZPRURMU-UHFFFAOYSA-N 0.000 description 1
- YICILWNDMQTUIY-UHFFFAOYSA-N 2-methylidenepentanamide Chemical compound CCCC(=C)C(N)=O YICILWNDMQTUIY-UHFFFAOYSA-N 0.000 description 1
- MNZNJOQNLFEAKG-UHFFFAOYSA-N 2-morpholin-4-ylethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCN1CCOCC1 MNZNJOQNLFEAKG-UHFFFAOYSA-N 0.000 description 1
- HWNIMFWVBMOWHI-UHFFFAOYSA-N 2-morpholin-4-ylethyl prop-2-enoate Chemical compound C=CC(=O)OCCN1CCOCC1 HWNIMFWVBMOWHI-UHFFFAOYSA-N 0.000 description 1
- GMTJKMKNOIUGPG-UHFFFAOYSA-N 2-piperidin-1-ylethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCN1CCCCC1 GMTJKMKNOIUGPG-UHFFFAOYSA-N 0.000 description 1
- FGSBZZTYGCQZPD-UHFFFAOYSA-N 2-piperidin-1-ylethyl prop-2-enoate Chemical compound C=CC(=O)OCCN1CCCCC1 FGSBZZTYGCQZPD-UHFFFAOYSA-N 0.000 description 1
- VFZKVQVQOMDJEG-UHFFFAOYSA-N 2-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(=O)C=C VFZKVQVQOMDJEG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DBNCSQNIKKWMEA-UHFFFAOYSA-N 2-pyrrolidin-1-ylethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCN1CCCC1 DBNCSQNIKKWMEA-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- BZJXVCQMKIVIIG-UHFFFAOYSA-N 3-(2-hydroxyethoxycarbonyl)but-3-enoic acid Chemical compound OCCOC(=O)C(=C)CC(O)=O BZJXVCQMKIVIIG-UHFFFAOYSA-N 0.000 description 1
- RVVCGFFXRBUWSX-UHFFFAOYSA-N 3-(2-hydroxypropoxycarbonyl)but-3-enoic acid Chemical compound CC(O)COC(=O)C(=C)CC(O)=O RVVCGFFXRBUWSX-UHFFFAOYSA-N 0.000 description 1
- JPVNTYZOJCDQBK-UHFFFAOYSA-N 3-ethenoxypropan-1-amine Chemical compound NCCCOC=C JPVNTYZOJCDQBK-UHFFFAOYSA-N 0.000 description 1
- DPZYLEIWHTWHCU-UHFFFAOYSA-N 3-ethenylpyridine Chemical compound C=CC1=CC=CN=C1 DPZYLEIWHTWHCU-UHFFFAOYSA-N 0.000 description 1
- PMJNEQWWZRSFCE-UHFFFAOYSA-N 3-ethoxy-3-oxo-2-(thiophen-2-ylmethyl)propanoic acid Chemical compound CCOC(=O)C(C(O)=O)CC1=CC=CS1 PMJNEQWWZRSFCE-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 description 1
- NSCJJSJTGIJRRX-UHFFFAOYSA-N 4-ethenoxybutan-1-amine Chemical compound NCCCCOC=C NSCJJSJTGIJRRX-UHFFFAOYSA-N 0.000 description 1
- RTTAGBVNSDJDTE-UHFFFAOYSA-N 4-ethoxy-2-methylidene-4-oxobutanoic acid Chemical compound CCOC(=O)CC(=C)C(O)=O RTTAGBVNSDJDTE-UHFFFAOYSA-N 0.000 description 1
- OIYTYGOUZOARSH-UHFFFAOYSA-N 4-methoxy-2-methylidene-4-oxobutanoic acid Chemical compound COC(=O)CC(=C)C(O)=O OIYTYGOUZOARSH-UHFFFAOYSA-N 0.000 description 1
- SGMGVYDSPXFBMU-UHFFFAOYSA-N 5-ethenyl-2-methylaniline Chemical compound CC1=CC=C(C=C)C=C1N SGMGVYDSPXFBMU-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- IALWCWDHZPFHSY-UHFFFAOYSA-N 8-ethenoxyoctan-1-amine Chemical compound NCCCCCCCCOC=C IALWCWDHZPFHSY-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- CVCYKTXEAQWEGM-FAOVPRGRSA-N CC(=C)C(O)=O.CC(=C)C(O)=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O CVCYKTXEAQWEGM-FAOVPRGRSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229920002565 Polyethylene Glycol 400 Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 description 1
- 229940081735 acetylcellulose Drugs 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229940091181 aconitic acid Drugs 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000000278 alkyl amino alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- BFHRUCFCIXWADD-UHFFFAOYSA-N bis(ethenyl) 2,3-dihydroxybutanedioate Chemical compound C=COC(=O)C(O)C(O)C(=O)OC=C BFHRUCFCIXWADD-UHFFFAOYSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-WAYWQWQTSA-N bis(prop-2-enyl) (z)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C/C(=O)OCC=C ZPOLOEWJWXZUSP-WAYWQWQTSA-N 0.000 description 1
- VPPSHXIFIAJKMX-UHFFFAOYSA-N bis(prop-2-enyl) 2,3-dihydroxybutanedioate Chemical compound C=CCOC(=O)C(O)C(O)C(=O)OCC=C VPPSHXIFIAJKMX-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 150000001851 cinnamic acid derivatives Chemical class 0.000 description 1
- GTZCVFVGUGFEME-IWQZZHSRSA-N cis-aconitic acid Chemical compound OC(=O)C\C(C(O)=O)=C\C(O)=O GTZCVFVGUGFEME-IWQZZHSRSA-N 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- VVYDVQWJZWRVPE-UHFFFAOYSA-L dimethyltin(2+);diiodide Chemical compound C[Sn](C)(I)I VVYDVQWJZWRVPE-UHFFFAOYSA-L 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical compound C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- ONWSXQXQPJHQPU-UHFFFAOYSA-N ethane-1,2-diol;2-hydroxypropane-1,2,3-tricarboxylic acid Chemical compound OCCO.OC(=O)CC(O)(C(O)=O)CC(O)=O ONWSXQXQPJHQPU-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 239000011953 free-radical catalyst Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- WFKDPJRCBCBQNT-UHFFFAOYSA-N n,2-dimethylprop-2-enamide Chemical compound CNC(=O)C(C)=C WFKDPJRCBCBQNT-UHFFFAOYSA-N 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- WTZRKXMQMQBYDE-UHFFFAOYSA-N n-(2-ethenoxyethyl)-2,4,4-trimethylpentan-2-amine Chemical compound CC(C)(C)CC(C)(C)NCCOC=C WTZRKXMQMQBYDE-UHFFFAOYSA-N 0.000 description 1
- OOAVGGXQQIGUNC-UHFFFAOYSA-N n-(2-ethenoxyethyl)-2-methylpropan-2-amine Chemical compound CC(C)(C)NCCOC=C OOAVGGXQQIGUNC-UHFFFAOYSA-N 0.000 description 1
- JZBRIWIUZQBVQE-UHFFFAOYSA-N n-(2-ethenoxyethyl)-3,5,5-trimethylhexan-1-amine Chemical compound CC(C)(C)CC(C)CCNCCOC=C JZBRIWIUZQBVQE-UHFFFAOYSA-N 0.000 description 1
- OHVSEVQRQJMLGP-UHFFFAOYSA-N n-(2-ethenoxyethyl)cyclohexanamine Chemical compound C=COCCNC1CCCCC1 OHVSEVQRQJMLGP-UHFFFAOYSA-N 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- YRVUCYWJQFRCOB-UHFFFAOYSA-N n-butylprop-2-enamide Chemical compound CCCCNC(=O)C=C YRVUCYWJQFRCOB-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- WDFKEEALECCKTJ-UHFFFAOYSA-N n-propylprop-2-enamide Chemical compound CCCNC(=O)C=C WDFKEEALECCKTJ-UHFFFAOYSA-N 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- DBSDMAPJGHBWAL-UHFFFAOYSA-N penta-1,4-dien-3-ylbenzene Chemical compound C=CC(C=C)C1=CC=CC=C1 DBSDMAPJGHBWAL-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229940068918 polyethylene glycol 400 Drugs 0.000 description 1
- 229920002338 polyhydroxyethylmethacrylate Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- NDWDHIIYLRBODW-UHFFFAOYSA-N prop-2-enyl 2-oxopropanoate Chemical compound CC(=O)C(=O)OCC=C NDWDHIIYLRBODW-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- 239000005028 tinplate Substances 0.000 description 1
- GTZCVFVGUGFEME-UHFFFAOYSA-N trans-aconitic acid Natural products OC(=O)CC(C(O)=O)=CC(O)=O GTZCVFVGUGFEME-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- KJWHEZXBZQXVSA-UHFFFAOYSA-N tris(prop-2-enyl) phosphite Chemical compound C=CCOP(OCC=C)OCC=C KJWHEZXBZQXVSA-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/036—Chemical or electrical pretreatment characterised by the presence of a polymeric hydrophilic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/04—Intermediate layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/151—Matting or other surface reflectivity altering material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/155—Nonresinous additive to promote interlayer adhesion in element
Definitions
- a printing plate is constituted a basic plate, a layer of water insoluble hydrophilic acrylate or methacrylate polymers over the plate and a photo-sensitive layer over the layer.
- the present invention relates to a printing plate. More particularly, it relates to a printing plate having a photosensitive layer on the surface of water insoluble hydro philic acrylic resins layer.
- the most conventional printing plates are aluminium plates having sanded or chemically treated surface on which e.g. gelatin, polyvinyl alcohol or albumins are applied together with one of photosensitive materials such as chromates and diazo compounds and finally those plates are dried, and exposed through a negative photo-film over the plate, developed and treated again.
- the photo-sensitively cured parts of lines and pictures absorb ink well due to the lipophilic property.
- the surface of the aluminium plate exposed by developing absorbs water and repels ink.
- the exposed surface of the aluminium plate gradually wears thin by eternal friction together with cured parts and lines. In some cases, worn out lines and pictures are fixed and reinforced by lacquerlike materials.
- the surface of the aluminium plate especially its sanded surface tends to wear out sometimes more easily than the photo-sensitive cured layer.
- the defaced plate results in indistinct pictures with less hydrophilic function, and finally it becomes impossible to print.
- water supply to the sanded aluminium surface has to be appropriate in order to obtain clear pictures and skilled work is required to the adjustment of water supply.
- An object of the present invention is to provide a novel printing plate.
- Another object of the present invention is to provide a printing plate having an extremely great printing durability.
- a further object of the present invention is to provide an improved starting printing plate bringing about a simplification of the make-up operation.
- the printing plate according to the present invention comprises a basic plate, a layer of water insoluble hydro philic acrylate or methacrylate polymers (hydrophilic acrylic resins) over the plate and a photo-sensitive layer over the layer.
- metallic plates such as steel plate, tin plate, zinc plate, stainless steel plate, etc.
- plastic sheets such as polyethylene terephthalate sheet, polystyrene sheet, acetyl cellulose sheet, hydrophilic acrylic resin sheets, etc. and papers.
- hydrophilic acrylic resins which form hydrophilic layers are water insoluble.
- hydrophilic acrylic resins should be capable of absorbing at least 20% of its weight of water and preferably do not absorb more than about of its weight of water.
- the hydrophilic monomer employed in the hydrophilic acrylic resins is a hydroxy lower alkyl acrylate or methacrylate or hydroxy lower alkoxy lower alkyl acrylate or methacrylate, e.g. 2-hydroxyethyl acrylate, 2- hydroxyethyl methacrylate, diethylene glycol monoacrylate, diethylene glycol monomethacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, dipropylene glycol monomethacrylate and dipropylene glycol monoacrylate.
- the most preferred monomers are the hydroxyalkyl acrylates and methacrylates, particularly Z-hydroxyethyl methacrylate.
- polymers of acrylamide, methacrylamide, N-alkyl substituted acrylamide and methacrylamide such as N-propylacrylamide, N -isopropyl acrylamide, N-isopropyl methacrylamide, N-propyl methacrylamide, N-butyl acrylamide, N-methyl acrylamide and N-methyl methacrylamide, diacetone acrylamide, N-(2-hydroxyethyl) acrylamide and N- (Z-hydroxyethyl) methacrylamide.
- copolymers of these monomers with each other or with other copolymerizable monomers.
- the hydrophilic monomer gives a product which is water soluble, e.g. polyacrylamide
- the copolymerizable monomer can be used in an amount of 0.05 to 50%.
- comonomers include methyl acrylate, ethyl acrylate, isopropyl acrylate, propyl acrylate, butyl acrylate, sec.
- butyl acrylate pentyl acrylate, 2-ethylhexyl acrylate, methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, butyl methacrylate, sec. butyl methacrylate, pentyl methacrylate, lower alkoxyethyl acrylates and methacrylates, e.g.
- methoxyethyl acrylate methoxyethyl methacrylate, ethoxyethyl acrylate and ethoxyethyl methacrylate, triethylene glycol acrylate, triethylene glycol methacrylate, glycerol monoacrylate and glycerol monomethacrylate.
- unsaturated amines p-aminostyrene, oaminostyrene, 2-amino 4 vinyltoluene, alkylamino alkyl acrylates and methacrylates, e.g.
- the cross-linking agent is present in an amount of 0.1 to 2.5%, most preferably not over 2.0%, although from 0.05 to 15% or even 20%, of crosslinking agents can be used.
- cross-linking agents include ethylene glycol diacrylate, ethylene glycol dimethacrylate, 1,2- butylene glycol dimethacrylate, 1,3-butylene glycol dimethacrylate, 1,4-butylene glycol dimethacrylate, propyl ene glycol diacrylate, propylene glycol dimethacrylate, diethylene glycol dimethacrylate, di-propylene glycol dimethacrylate, diethylene glycol diacrylate, dipropylene glycol diacrylate, divinyl benzene, divinyl toluene, diallyl tartarate, allyl pyruvate, allyl maleate, divinyl tartrate, triallyl melamine, N,N' methylene bis acrylamide, .glycerine trimethacrylate, diallyl maleate, divinyl ether, diallyl monoethylene glycol citrate, ethylene glycol vinyl allyl citrate, allyl vinyl maleate, diallyl itacon
- polyallyl sucrose e.g. pentaallyl sucrose, sucrose diacrylate, glucose dimethacrylate, pentaerythritol tetraacrylate, sorbitol dimethacrylate, diallyl aconitate, divinyl citraconate, diallyl fumarate.
- ethylenically unsaturated acids or salts thereof such as acrylic acid, cinnamic acid, crotonic acid, methacrylic acid, itaconic acid, aconitic acid, maleic acid, fumaric acid, mesaconic acid and citraconic acid.
- partial esters such as mono 2-hydroxypropyl itaconate, mono 2-hydroxyethyl itaconate, mono Z-hydroxyethyl citraconate, mono 2-hydroxypropyl aconitate, mono 2-hydroxyethyl maleate, mono 2-hydroxypropyl fumarate, monomethyl itaconate, monoethyl itaconate, mono methyl Cellosolve ester of itaconic acid (methyl Cellosolve is the monomethyl ether of diethylene glycol), mono methyl Cellosolve ester of maleic acid.
- partial esters such as mono 2-hydroxypropyl itaconate, mono 2-hydroxyethyl itaconate, mono Z-hydroxyethyl citraconate, mono 2-hydroxypropyl aconitate, mono 2-hydroxyethyl maleate, mono 2-hydroxypropyl fumarate, monomethyl itaconate, monoethyl itaconate, mono methyl Cellosolve ester of itaconic acid (methyl Cellosolve is the monomethyl ether
- the polymers can be prepared as casting syrups, as aqueous dispersions, by aqueous suspension polymerization or as solutions in organic solvents such as ethyl alcohol, methyl alcohol, propyl alcohol, isopropyl alcohol, formamide, dimethyl sulfoxide or other appropriate solvent.
- organic solvents such as ethyl alcohol, methyl alcohol, propyl alcohol, isopropyl alcohol, formamide, dimethyl sulfoxide or other appropriate solvent.
- Polymerization can be carried out at 20 to 150 C., frequently 35 to 90 C. and can be completed after applying.
- the polymerization can be carried out employing a free radical catalyst in the range of 0.05 to 1% of the polymerizable monomers.
- Typical catalyst include tbutyl peroctoate, benozyl peroxide, isopropyl percarbonate, 2,4-dichlorobenzoyl peroxide, methyl ethyl ketone peroxide, cumene hydroperoxide and dicumyl peroxide.
- Irradiation e.g. by ultraviolet light or gamma rays, also can be employed to catalyze the polymerization.
- the hydrophilic polymer is used as a solution, as a casting syrup or as a sheet, coated on the surface of basic plate by means of painting, casting, adhering and the like with or without using adhesives, and forms a water insoluble hydrophilic resin layer.
- the thickness of the hydrophilic resin layer is generally 5 to 300 microns, preferably 10 to 50 microns.
- hydrophilic resin there can be incorporated with the hydrophilic resin to provide a layer having increased mechanical strength as well as adherence to the basic plate by oxidizing type curing agents such as sodium, potassium or ammonium chromate or dichromate, aminoplast resins such as melamine resin, benzoguanamine resin or acetoguanamine resin, acid anhydrides such as maleic anhydride, citraconic anhydride, succinic anhydride, phthalic anhydride, trimellitic anhydride, pyromellitic anhydride and the like, polyamines such as ethylene diamine, propylene diamine, diethylene triamine, tetraethylene pentamine, piperazine, m-xylylene diamine, p-xylylene diamine, m-phenylene diamine, p-phenylene diamine, benzidine, diaminodiphenyl methane, diaminodiphenyl sulfone, 3,3-dichloro-4,4-diphenyl
- powdered materials there are fine divided powdered inorganic materials such as, e.g., silica, alumina, magnesia, zirconia, barium sulfate, acid actinated clay, talc and diatomaceous earth.
- powdered materials there are fine divided powdered inorganic materials such as, e.g., silica, alumina, magnesia, zirconia, barium sulfate, acid actinated clay, talc and diatomaceous earth.
- Preferable materials are silica and alumina.
- the amount of the powdered materials to the hydrophilic resin is less than 5% by weight, preferably 0.5 to 2% by weight.
- photocurable compositions composed of vinyl monomers, photosensitizers and resins such as unsaturated polyester resin, alkyd resin, acrylurethane resin, silicone modified acrylic resin, polybutadiene and cellulose; light-sensitive polymers modified by compounds such as diazo compounds, azide compounds, organo sulfur compounds and cinnamic acid compounds; and compositions composed of dichromates and gelatin, polyvinyl alcohol or albumin. Considering the printing capacity and resolving power, acrylurethane resin is especially superior to the others.
- the above mentioned polymeric materials are dissolved in organic solvents having the property of swelling or partially dissolving the hydrophilic layer, e.g., alcohols, ketones and esters, and are applied to the surface of the hydrophilic resin layer by coating and drying.
- organic solvents having the property of swelling or partially dissolving the hydrophilic layer e.g., alcohols, ketones and esters
- the surface of the hydrophilic resin layer swells or partially dissolves and mixes with photo-sensitive compounds, and both layers are adhered together.
- printing plate is exposed using a negative film over it, developed, washed by water and dried, and if necessary absorbed in water. Then it is equipped to the otfset printing machine and used in the offset printing. It gives us excellent results.
- water supply by fountain roller may be extremely little.
- the printing palte having a photosensitive layer on the hydrophilic resin layer has very excellent advantages in comparison with a conventional printing plate having a photo-sensitive layer on the aluminium plate directly, and is very useful in respect to increasing printing durability and printing precision, and bringing about simple printing operation.
- FIG. 1 shows a partial sectional view of the printing plate according to the invention.
- FIG. 2 shows a partial sectional view of the printing plate after exposing and developing.
- the starting printing plate is constituted of a basic plate 1, a layer 2 of water insoluble hydrophilic acrylic resins over the plate 1 and a photo-sensitive layer 3 over the layer 2.
- the thickness of the layers 2 and 3 are greatly exaggerated for illustrative purposes.
- EXAMPLE 1 400 parts of polyethyleneglycol-400 was added to 360 parts of tolylene diisocyanates, reacted by heating at a temperature of 140 C. for 30 minutes and cooled, then there were added 260 parts of 2-hydroxyethyl methacrylate and 0.21 part of p-benzoquinone to the reactant and reacted at a temperature of 40 C. for 24 hours to obtain the unsaturated acrylurethane resin (I).
- the resin (I) was a very viscous liquid at room temperature.
- the photosensitive resin composition was obtained by mixing 50 parts of resin (I) with 50 parts of commercial cellulose phthalate, 1 part of benzoin ethylether and 100 parts of acetone.
- EXAMPLE 2 The solution consisting of 2-hydroxyethyl methacrylate 79.6%, ethyleneglycol dimethacrylate 0.3%, glycerol 20% and diethyl percarbonate 0.1% was poured into the space between two glass plates adjusted by spacer in order to maintain 0.15 mm. of space carefully so as to not form bubbles.
- the composition was polymerized maintaining a temperature of 65 C. for 20 minutes, then the transparent sheet obtained by removing the plates was washed by distilled water and the glycerol extracted out, and further dried at a room of 40% of relative humidity at a temperature of 25 C. for 24 hours to obtain a hydrophilic resin sheet.
- the sheet was adhered to the aluminium plate having 0.15 mm. of thickness using epoxy resin polyamide resin mixed adhesive.
- the other side of the resin sheet was coated uniformly with photo-sensitive resin composition obtained in Example 1 so that the thickness of drying film was about 2 microns, and dried to obtain the printing plate.
- the plate was set in the vacuum printing frame and exposed by a high pressure mercury lamp at a distance of 35 cm. for one minute, then it was developed by 1% ethanolamine aqueous solution, washed by water and dried to obtain the lithography for printing. Otfset printing was carried out by using the lithography, and very excellent printing effects having good distinction and measure accuracy were obtained. Also it was able to print more than 100,000 sheets of paper per plate, and the control of water supply was easier than that with the conventional method.
- Example 3 Hydrophilic monomer solution of Example 2 was coated on the aluminium plate having 0.15 mm. of thickness which was previously coated with epoxy resin-polyamide resin mixed primer so as to be 10 microns thickness, so that the thickness of the hydrophilic resin was about 0.2 mm, and polymerized under nitrogen atmosphere by similar condition as Example 2. Then the photography for printing was prepared and offset printing was carried out, similar good results as Example 2 were obtained.
- EXAMPLE 4 A hydrophilic resin sheet obtained by Example 2 was adhered on the surface of polyethylene terephthalate sheet having 0.2 mm. of thickness by means of epoxy adhesive and the other surface of the resin sheet was coated with diazo compound Fuji Super-Resist: trademark of (Fuji Chemicals Co., Ltd.) as thin as 3 microns, exposed through negative fihn and treated as prescribed to obtain a printing plate. Offset printing with four colors was carried out using the printing plate, and the good results of Example 2 were obtained. Also registering of each plate was carried out easily and rapidly, because of its transparency.
- EXAMPLE 5 1,000 grams of xylene, grams of 2-hydroxyethyl methacrylate and 0.33 gram of isopropyl percarbonate were charged to a flask equipped with an agitator and heating mantle. The flask was rapidly agitated at 100 C. under a nitrogen atmosphere. After 15 minutes the slurry was filtered hot to isolate the polymer. The polymer powder was reslurried in 300 ml. of xylene, filtered and dried. A 98% yield of 2 to 5 micron particle size alcohol soluble powder was obtained. 100 grams of the polymer powder was dissolved in 200 ml. of methanol, then added 0.2 gram of epoxy resin and 1.5 grams of fine divided silica powder and dispersed homogeneously.
- the thus obtained solution was coated on epoxy resin-polyamide resin mixed primer coating which was previously coated on a steel plate having a 0.15 mm. thickness so as to be 10 microns thick so that the dried thickness of layer was 20 microns and dried. Then the lithography for printing was prepared and offset printing was carried out, similar good results to those in Example 2 were obtained. Mechanical strength of the hydrophilic resin layer was good.
- EXAMPLE 6 A casting syrup was made from 100 grams of 2-hydroxyethyl methacrylate, 0.2 gram of ethyleneglycol dimethacrylate and 0.4 gram of t-butyl peroctoate. 0.2 gram of potassium dichromate and 2 grams of fine divided silica powder were added into the syrup and dispersed homogeneously. The syrup was coated on an aluminium plate so that the dried thickness was 25 microns. Then the lithography for printing was prepared and offset printing was carried out, similar good results to those of Example 2 were obtained. Mechanical strength of the hydrophilic resin layer was very good.
- EXAMPLE 8 7.5 liters of ethanol, 100 grams of t-butylaminoethyl methacrylate, 150 grams of N-isopropyl acrylamide and 2.25 kilo-grams of 2-hydroxyethyl methacrylate (containing 0.3% of ethyleneglycol dimethacrylate) together with 10 grams of t-butyl peroctoate were charged into a vessel and the solution heated at 85 C. for 7 hours to effect polymerization to a 90% conversion level. 0.25 gram of maleic anhydride and 1 gram of fine divided silica powder were added into the polymer solution thus obtained, and dispersed homogeneously. The solution was coated on an aluminium plate so that the dried thickness was 35 microns. Then the lithography for printing was prepared and offset printing was carried out, similar good results to those in Example 2 were obtained. Mechanical strength of the hydrophilic resin layer was very good.
- a printing plate comprising a basic plate, a layer of water insoluble hydrophilic acrylate or methacrylate polymer selected from the group consisting of a polymer of a hydrophilic hydroxy lower alkyl acrylate, hydroxy lower alkyl methacrylate, hydroxy lower alkoxy lower alkyl acrylate and hydroxy lower alkoxy lower alkyl methacrylate over said plate and a photosensitive layer over said hydrophilic polymer layer.
- the Water insoluble polymer comprises a polymer selected from the group consisting of a polymer of hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate and hydroxypropyl methacrylate.
- the Water insoluble polymer comprises a polymer selected from the group consisting of a polymer of hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate and hydroxypropyl methacrylate.
- a printing plate according to claim 8 wherein the polymer is a copolymer of said acrylate or methacrylate with a minor amount up to 15 of a cross-linking agent.
- a printing plate according to claim 7 wherein the fine divided powdered inorganic material is powdered silica.
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP45013759A JPS492286B1 (enrdf_load_stackoverflow) | 1970-02-19 | 1970-02-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3733200A true US3733200A (en) | 1973-05-15 |
Family
ID=11842162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00114887A Expired - Lifetime US3733200A (en) | 1970-02-19 | 1971-02-12 | Printing plate |
Country Status (7)
Country | Link |
---|---|
US (1) | US3733200A (enrdf_load_stackoverflow) |
JP (1) | JPS492286B1 (enrdf_load_stackoverflow) |
BR (1) | BR7101158D0 (enrdf_load_stackoverflow) |
CA (1) | CA989230A (enrdf_load_stackoverflow) |
FR (1) | FR2080616A1 (enrdf_load_stackoverflow) |
GB (1) | GB1354303A (enrdf_load_stackoverflow) |
SE (1) | SE370800B (enrdf_load_stackoverflow) |
Cited By (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3861921A (en) * | 1973-01-12 | 1975-01-21 | Horst Hoffmann | Subbing layers comprising polyamide and phenolic resin for metal bases of photopolymerizable elements |
US4097647A (en) * | 1975-11-24 | 1978-06-27 | Allied Paper Incorporated | Lithographic printing plate |
US4097283A (en) * | 1974-12-28 | 1978-06-27 | Fuji Chemicals Industrial Company Limited | Water-soluble composition admixture of copolymer having ethylenic unsaturation in side chain and anthraquinone photosensitizer |
US4139386A (en) * | 1976-12-08 | 1979-02-13 | Swiss Aluminium Ltd. | Method for obtaining engravers template |
US4143021A (en) * | 1976-07-23 | 1979-03-06 | The Dow Chemical Company | Composition suitable for use as desensitizing gumming solution for lithographic printing plates |
US4168165A (en) * | 1976-05-15 | 1979-09-18 | Mita Industrial Company Limited | Electrophotographic photosensitive material suitable for offset printing and lithography and process for production thereof |
US4186250A (en) * | 1975-04-07 | 1980-01-29 | The Dow Chemical Company | Method of desensitizing image-bearing lithographic plates |
US4198470A (en) * | 1975-06-09 | 1980-04-15 | Western Litho Plate & Supply Co. | Base plate and lithographic plate prepared by sensitization thereof |
US4200688A (en) * | 1975-04-07 | 1980-04-29 | The Dow Chemical Company | Method of treating image-bearing lithographic plates |
US4232105A (en) * | 1978-09-14 | 1980-11-04 | Oji Paper Co., Ltd. | Photosensitive lithographic printing plate with hydrophilic sublayer |
US4266481A (en) * | 1975-04-07 | 1981-05-12 | The Dow Chemical Company | Image-bearing lithographic plates with desensitizing coating |
US4272605A (en) * | 1975-06-09 | 1981-06-09 | Western Litho Plate & Supply Co. | Base plate and lithographic plate prepared by sensitization thereof |
US4272604A (en) * | 1975-06-09 | 1981-06-09 | Western Litho Plate & Supply Co. | Base plate and lithographic plate prepared by sensitization thereof |
US4275138A (en) * | 1973-07-23 | 1981-06-23 | Fuji Photo Film Co., Ltd. | Photosensitive diazonium compound containing composition and article with β-hydroxyalkyl acrylate or methacrylate |
US4282301A (en) * | 1977-12-21 | 1981-08-04 | Okamoto Chemical Industry Corporation | Photosensitive diazo coating compositions and plates |
US4288520A (en) * | 1978-08-03 | 1981-09-08 | Hoechst Aktiengesellschaft | Process of manufacturing light-sensitive copying material based on diazonium salt condensation products |
US4374190A (en) * | 1978-09-28 | 1983-02-15 | Am International, Inc. | Erasable intermediate diazo-type paper |
US4407862A (en) * | 1978-03-31 | 1983-10-04 | W. R. Grace & Co. | Method of making letterpress printing plates |
US4416967A (en) * | 1981-04-30 | 1983-11-22 | Ricoh Co., Ltd. | Diazo copying element |
US4427765A (en) | 1981-07-06 | 1984-01-24 | Hoechst Aktiengesellschaft | Hydrophilic coating of salt-type phosphorus or sulfur polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon |
US4427766A (en) | 1981-07-06 | 1984-01-24 | Hoechst Aktiengesellschaft | Hydrophilic coating of salt type nitrogen polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon |
US4522910A (en) * | 1975-06-19 | 1985-06-11 | Napp Systems (Usa), Inc. | Photosensitive graphic arts article |
US4614701A (en) * | 1984-09-28 | 1986-09-30 | Sekisui Fine Chemical Co., Ltd. | Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units |
EP0250377A1 (en) * | 1986-05-15 | 1987-12-23 | AB Wilh. Becker | Composition for negative photoresists and use of the composition |
US4970133A (en) * | 1987-10-27 | 1990-11-13 | Agfa-Gevaert, N.V. | Presensitized imaging element suitable for use as a lithographic printing plate with single hydrophilic layer which includes a light-sensitive diazonium salt and tetraalkyl orthosilicate cross-linking agent |
US4983500A (en) * | 1987-10-30 | 1991-01-08 | Hitachi, Ltd. | Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer |
US4985344A (en) * | 1986-07-04 | 1991-01-15 | Hitachi, Ltd. | Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer |
US5178961A (en) * | 1990-07-21 | 1993-01-12 | Hoechst Aktiengesellschaft | Thermally crosslinkable hydrophilic copolymers and their use in reprography |
US5178963A (en) * | 1990-07-21 | 1993-01-12 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
US5219664A (en) * | 1990-07-21 | 1993-06-15 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
US5262244A (en) * | 1990-07-21 | 1993-11-16 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
US5302460A (en) * | 1990-07-21 | 1994-04-12 | Hoechst Aktiengesellschaft | Support material for offset-printing plates in the form of a sheet, a foil or a web process for its production and offset-printing plate comprising said material |
US5493971A (en) * | 1994-04-13 | 1996-02-27 | Presstek, Inc. | Laser-imageable printing members and methods for wet lithographic printing |
US5688629A (en) * | 1993-10-22 | 1997-11-18 | Agfa-Gevaert Ag | Process for the production of lithographic printing plates utilizing peel development |
US6497178B1 (en) * | 1998-01-23 | 2002-12-24 | Presstek, Inc. | Lithographic printing members having secondary non-ablative layers for use with laser imaging apparatus |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2527083A1 (de) * | 1974-07-03 | 1976-01-22 | Xerox Corp | Neue druckmatrizen, verfahren zu ihrer herstellung und ihre verwendung zum drucken |
EP0653686B1 (en) * | 1993-11-16 | 2000-01-05 | Agfa-Gevaert N.V. | Imaging element comprising a photopolymerizable composition and methods for producing lithographic plates therewith |
DE69422478T2 (de) * | 1993-11-16 | 2000-07-13 | Agfa-Gevaert N.V., Mortsel | Bildaufzeichnungselement, eine photopolymerisierbare Zusammensetzung enthaltend und Verfahren zur Herstellung von Flachdruckformen |
-
1970
- 1970-02-19 JP JP45013759A patent/JPS492286B1/ja active Pending
-
1971
- 1971-02-12 US US00114887A patent/US3733200A/en not_active Expired - Lifetime
- 1971-02-18 FR FR7105470A patent/FR2080616A1/fr not_active Withdrawn
- 1971-02-18 SE SE7102100A patent/SE370800B/xx unknown
- 1971-02-18 CA CA105,742A patent/CA989230A/en not_active Expired
- 1971-02-19 BR BR1158/71A patent/BR7101158D0/pt unknown
- 1971-04-19 GB GB2347171*#A patent/GB1354303A/en not_active Expired
Cited By (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3861921A (en) * | 1973-01-12 | 1975-01-21 | Horst Hoffmann | Subbing layers comprising polyamide and phenolic resin for metal bases of photopolymerizable elements |
US4275138A (en) * | 1973-07-23 | 1981-06-23 | Fuji Photo Film Co., Ltd. | Photosensitive diazonium compound containing composition and article with β-hydroxyalkyl acrylate or methacrylate |
US4097283A (en) * | 1974-12-28 | 1978-06-27 | Fuji Chemicals Industrial Company Limited | Water-soluble composition admixture of copolymer having ethylenic unsaturation in side chain and anthraquinone photosensitizer |
US4186250A (en) * | 1975-04-07 | 1980-01-29 | The Dow Chemical Company | Method of desensitizing image-bearing lithographic plates |
US4266481A (en) * | 1975-04-07 | 1981-05-12 | The Dow Chemical Company | Image-bearing lithographic plates with desensitizing coating |
US4200688A (en) * | 1975-04-07 | 1980-04-29 | The Dow Chemical Company | Method of treating image-bearing lithographic plates |
US4272604A (en) * | 1975-06-09 | 1981-06-09 | Western Litho Plate & Supply Co. | Base plate and lithographic plate prepared by sensitization thereof |
US4198470A (en) * | 1975-06-09 | 1980-04-15 | Western Litho Plate & Supply Co. | Base plate and lithographic plate prepared by sensitization thereof |
US4272605A (en) * | 1975-06-09 | 1981-06-09 | Western Litho Plate & Supply Co. | Base plate and lithographic plate prepared by sensitization thereof |
US4522910A (en) * | 1975-06-19 | 1985-06-11 | Napp Systems (Usa), Inc. | Photosensitive graphic arts article |
US4097647A (en) * | 1975-11-24 | 1978-06-27 | Allied Paper Incorporated | Lithographic printing plate |
US4168165A (en) * | 1976-05-15 | 1979-09-18 | Mita Industrial Company Limited | Electrophotographic photosensitive material suitable for offset printing and lithography and process for production thereof |
US4143021A (en) * | 1976-07-23 | 1979-03-06 | The Dow Chemical Company | Composition suitable for use as desensitizing gumming solution for lithographic printing plates |
US4139386A (en) * | 1976-12-08 | 1979-02-13 | Swiss Aluminium Ltd. | Method for obtaining engravers template |
US4282301A (en) * | 1977-12-21 | 1981-08-04 | Okamoto Chemical Industry Corporation | Photosensitive diazo coating compositions and plates |
US4407862A (en) * | 1978-03-31 | 1983-10-04 | W. R. Grace & Co. | Method of making letterpress printing plates |
US4288520A (en) * | 1978-08-03 | 1981-09-08 | Hoechst Aktiengesellschaft | Process of manufacturing light-sensitive copying material based on diazonium salt condensation products |
US4232105A (en) * | 1978-09-14 | 1980-11-04 | Oji Paper Co., Ltd. | Photosensitive lithographic printing plate with hydrophilic sublayer |
US4374190A (en) * | 1978-09-28 | 1983-02-15 | Am International, Inc. | Erasable intermediate diazo-type paper |
US4416967A (en) * | 1981-04-30 | 1983-11-22 | Ricoh Co., Ltd. | Diazo copying element |
US4427766A (en) | 1981-07-06 | 1984-01-24 | Hoechst Aktiengesellschaft | Hydrophilic coating of salt type nitrogen polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon |
US4427765A (en) | 1981-07-06 | 1984-01-24 | Hoechst Aktiengesellschaft | Hydrophilic coating of salt-type phosphorus or sulfur polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon |
US4614701A (en) * | 1984-09-28 | 1986-09-30 | Sekisui Fine Chemical Co., Ltd. | Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units |
EP0250377A1 (en) * | 1986-05-15 | 1987-12-23 | AB Wilh. Becker | Composition for negative photoresists and use of the composition |
US4985344A (en) * | 1986-07-04 | 1991-01-15 | Hitachi, Ltd. | Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer |
US4970133A (en) * | 1987-10-27 | 1990-11-13 | Agfa-Gevaert, N.V. | Presensitized imaging element suitable for use as a lithographic printing plate with single hydrophilic layer which includes a light-sensitive diazonium salt and tetraalkyl orthosilicate cross-linking agent |
US4983500A (en) * | 1987-10-30 | 1991-01-08 | Hitachi, Ltd. | Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer |
US5178963A (en) * | 1990-07-21 | 1993-01-12 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
US5178961A (en) * | 1990-07-21 | 1993-01-12 | Hoechst Aktiengesellschaft | Thermally crosslinkable hydrophilic copolymers and their use in reprography |
US5219664A (en) * | 1990-07-21 | 1993-06-15 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
US5262244A (en) * | 1990-07-21 | 1993-11-16 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
US5302460A (en) * | 1990-07-21 | 1994-04-12 | Hoechst Aktiengesellschaft | Support material for offset-printing plates in the form of a sheet, a foil or a web process for its production and offset-printing plate comprising said material |
US5688629A (en) * | 1993-10-22 | 1997-11-18 | Agfa-Gevaert Ag | Process for the production of lithographic printing plates utilizing peel development |
US5691106A (en) * | 1993-10-22 | 1997-11-25 | Agfa-Gevaert Ag | Photosensitive material for the production of lithographic printing plates utilizing peel development |
US5493971A (en) * | 1994-04-13 | 1996-02-27 | Presstek, Inc. | Laser-imageable printing members and methods for wet lithographic printing |
US6497178B1 (en) * | 1998-01-23 | 2002-12-24 | Presstek, Inc. | Lithographic printing members having secondary non-ablative layers for use with laser imaging apparatus |
Also Published As
Publication number | Publication date |
---|---|
FR2080616A1 (enrdf_load_stackoverflow) | 1971-11-19 |
DE2107901B2 (de) | 1976-01-22 |
BR7101158D0 (pt) | 1973-04-05 |
GB1354303A (en) | 1974-06-05 |
SE370800B (enrdf_load_stackoverflow) | 1974-10-28 |
CA989230A (en) | 1976-05-18 |
JPS492286B1 (enrdf_load_stackoverflow) | 1974-01-19 |
DE2107901A1 (de) | 1971-09-02 |
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