US3564475A - Variable resistance element with multiple patterns for measuring instruments - Google Patents

Variable resistance element with multiple patterns for measuring instruments Download PDF

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Publication number
US3564475A
US3564475A US767606A US3564475DA US3564475A US 3564475 A US3564475 A US 3564475A US 767606 A US767606 A US 767606A US 3564475D A US3564475D A US 3564475DA US 3564475 A US3564475 A US 3564475A
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United States
Prior art keywords
film
resistance
section
resistance element
area
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Expired - Lifetime
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US767606A
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English (en)
Inventor
Tatsuo Fujii
Yutaka Watano
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Nikon Corp
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Nippon Kogaku KK
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C10/00Adjustable resistors
    • H01C10/04Adjustable resistors with specified mathematical relationship between movement of resistor actuating means and value of resistance, other than direct proportional relationship
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C10/00Adjustable resistors
    • H01C10/22Adjustable resistors resistive element dimensions changing gradually in one direction, e.g. tapered resistive element
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C10/00Adjustable resistors
    • H01C10/24Adjustable resistors the contact moving along turns of a helical resistive element, or vica versa
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C10/00Adjustable resistors
    • H01C10/30Adjustable resistors the contact sliding along resistive element
    • H01C10/308Adjustable resistors the contact sliding along resistive element consisting of a thin film

Definitions

  • a variable resistance element in which a film of material of known resistivity is deposited on a suitable plate in varying widths, a portion of the film being in a general serpentine pattern.
  • a slidable contact of suitable width and height engages the resistance film and is movable relative thereto in a given path for varying the resistance value in a small step-wise manner.
  • a resistance element of extended range may be provided by the addition of resistance film areas between incomplete loops of the serpentine pattern or added to complete the loops, the material of the second film having a higher resistivity than the first film.
  • the slide preferably, engages only those portions of the first resistance film in the predetermined path.
  • This invention relates to a variable resistance element particularly useful in measuring instruments, in which a thin film of resistance material is deposited on a suitable base and a sliding contact engages the resistance film and is movable relative thereto to vary the ohmic value of the element.
  • variable resistance elements provided for measuring instruments
  • a film of resistance material is applied to an insulating base plate by any one of the known processes such as, printing, vacuum deposition, sputtering, etching, etc.
  • a slidable contact is provided for the film and movable along a guide or track.
  • Such conventional elements have relied upon a changing thickness of the resistance film, or films of different resistivity interconnected end to end. As will hereinafter appear such conventional variable resistance elements have certain deficiencies which the present invention overcomes.
  • FIG. 1 is a plan view of a conventional device
  • FIG. 2 is a plan view of an embodiment of this invention.
  • FIG. 3 is a diagram showing the resistivity of the embodiment of FIG. 2.
  • a conventional resistance element in which a base plate 1 has deposited thereon a terminal 2 and resistance film areas 3, 4, 5 and 6. It will be noted that the areas 3, 4, 5 and 6 are generally triangular in shape, the apex of one area overlapping and being connected electrically to the base of the adjacent area.
  • a sliding contact 7 is provided for moving relative to the various resistance film areas in a path defined by the lines 8.
  • the desired functional change of the ohmic value of the resistance element is obtained by varying the width W of the film area.
  • the thickness of the film coating may also be varied.
  • the resistance element is divided into sections P, Q, S and T, each section including one of the varying width resistance area 3, 4, 5 and 6 respectively.
  • the resistivity of the material used for area 4 is higher than that used for area 3; and for area 5 the resistivity of the material is higher than the resistivity of the material for area 4, and the material for area 6 is of a higher resistive value than that of area 5.
  • the possible resistance range when x is equal to P can be determined by the width of y at the position x.
  • a resistance element made of different materials and/or thicknesses of film do not provide a smooth and continuous change in the resistance value, particularly in those area where the resistance films of different thicknesses and different materials are serially joined.
  • the changes which do occur when the sliding contact moves from one resistance area to the other makes such a resistance element unsuitable for small measuring instruments particularly when such an element is used in exposure meter circuit.
  • the object of this invention is to provide a variable resistance element for measuring instruments in which Wide range of resistance values is obtainable in a continuous small step-wise fashion throughout its entire range.
  • a resistance element in which the width of the resistance film area is reduced or tapered, the range of the element being extended through the use of a saw-tooth pattern and a serpentine pattern of loops with increasing width of the resistance film.
  • the range of the element is further extended by transverse spaced strips of film, the spaces between the ends of the strips being filled in or interconnected by film strips of a material having a higher resistivity than the first film; the sliding contact being confined to a guide so that the sliding contact engages the resistance film made of the first material in all positions.
  • the resistance element according to the invention is divided into sections A, B, C, D and E.
  • the same resistance material that is deposited to form the area 3 is used to deposit the square tooth pattern in section B, the serpentine pattern in section C and the transversely disposed, spaced film elements 11 and 12 in sections D and E, respectively.
  • the sliding contact 7 has vertical width g and horizontal length h, the horizontal width being such that as the sliding contact is moved in its path 8, the contact will engage the next tooth, loop or transverse element as it is moved along before leaving the resistance film element it is passing over. It will be noted from FIG.
  • the resistance film 9 is illustrated as completing serpentine loops with the short transverse elements 12 extending across the path 8 of the sliding contact 7.
  • the material for those areas designated 9 and 10 in the drawings is the same and is formed from material having a higher resistivity than that used in forming the elements 3 and 12.
  • the region in which resistance films can be provided is restricted to the length l and the width W.
  • the form of the resistance area 3 is very similar to the form of the resistance area 3 in FIG. 1.
  • the change in the vertical width of the film provides a functional or logarithmic resistance value.
  • the change in resistance is brought about by the square tooth form of the deposited film, the deposited layer being for the most part in engagement with the sliding contact 7 as it moves along its path.
  • the resistance film 3 may be deposited either partially or wholly over the surfaces of the film areas 9 and 10, or the two film areas could be connected by abutting one against the other.
  • the resistance films provided in areas A through E may be deposited at one and the same time, while the resistance film elements 9 and 10 may be deposited by a second process.
  • the change in resistance of the section P of FIG. 1 is compared with the change in resistance of sections A, B and C of FIG. 2, such changes are quite extensive although the resistance film in sections A, B and C of FIG. 2 is made of the same material as that in section P of FIG. 1.
  • the extended range by adding sections D and E of FIG. 2 is quite extensive when compared with the extended ranges added by section Q of FIG. 1.
  • Sections P and Q of FIG. 1 and sections A through E of FIG. 2 are made of two materials having different resistive values as herein before explained. Thus through the use of only two resistive materials the range of resistive values of an element is materially extended.
  • the width of the film pattern 0u05 mm.
  • the pitch separation of the film pattern 0.1 mm.
  • resistivity per unit area of resistance film 3 a 4.59/[:]
  • variable resistance from 1209 to 20K9 through 7209 two kinds of resistance films must be employed in accordance with the conventional system (FIG. 1), but in accordance with this invention it can be obtained by using only one kind of resistance film.
  • variable resistance from 129 to 720K9, through 43K9 in FIG. 1 three kinds of resistance films are required, while in the FIG. 2, two kinds of resistance-films are required.
  • 129 to 36M9 through 2.6MSZ in FIG. 1 four different film materials are required, and in FIG. 2 only two film materials are required.
  • the resistance film is formed by vacuum evaporation, it is diflicult to prepare a thin film beyond IOKQ/lj.
  • the resistance up to 1.6Mt'l can be obtained at best, but in accordance with this invention it is possible to obtain a resistance ranging as high as 40MQ.
  • FIG. 3 shows the relative resistance value relative to the contact displacement distance x as related to the sections in sections C through E of FIG. 2.
  • the small stepwise changes in the resistance value as provided by this invention permits practical use of the invention in small measuring instruments.
  • the portions of the resistance film within the path 8 of the sliding contact are of the same material, so that a uniform thickness of deposit may be maintained. The thickness of the film may thus be selected for durability to withstand the frictional wear generated by the sliding contact.
  • the resistance film 9 and 10 may be of less durable quality since the sliding contact does not engage these areas. With a durable material forming the film 9, and the resistance engaged by the sliding contact, any change due to Wear would only be between two of the transverse elements 11 representing but one step in the resistance values obtainable. The same would be true if the film 10 were engaged by the sliding contact in section E.
  • the first resistance film is deposited as spaced strips beginning in section D, with the second resistance film deposited between such strips, the areas of the second film decreasing in width in the same manner as the first resistance film in section A.
  • the second resistance film is further used to complete the serpentine loops in section E, the width or amplitude of the loops gradually increasing.
  • a variable resistance element comprising a base plate of insulating material
  • a variable resistance element comprising a base plate of insulating material
  • the pattern of the resistance film being triangular in the first section and saw-toothed in a second section of the base plate, the saw-toothed pattern being integral at one end with the apex of the triangular film pattern, the film pattern in a third section being serpentine and integral at one end with the other end of the saw-toothed film pattern, and
  • a sliding contact movable relative to the resistance film and engaging the film, in a predetermined path, the width of the contact being approximately equal to the width of the saw-toothed pattern and the length of the contact being slightly greater than the distance between the loops of the serpentine pattern transverse of the predetermined path.
  • variable resistance element according to claim 2, wherein the first resistance film is deposited in a fourth section of the base plate in spaced strips transverse to the predetermined path of the contact and engageable thereby, and
  • a second film of resistance material having a different resistivity per unit area than the first film and deposited on the base plate between the spaced resistance strips and integral therewith.
  • variable resistance element wherein the first resistance film is deposited in a fifth section of the base plate in spaced strips transverse to the predetermined path of the contact and engageable thereby, the spaced strips being slightly longer than the width of the predetermined path, the second film of resistance material being deposited to join the ends of the transverse spaced strips of the first film to form therewith a serpentine configuration.
  • variable resistance element according to claim 3, wherein the spaced strips of the first resistance film in the fourth section are of unequal lengths, the second resistance film between the spaced strips being between both outer ends of the strips adjacent the third section and between the outer ends of the strips on one side of the predetermined path of the contact adjacent the fifth section.
  • variable resistance element according to claim 2, wherein the loops of the serpentine pattern of the first resistance film in the third section are of increasing amplitude.
  • variable resistance element wherein the loops of the serpentine pattern of the first resistance film are of increasing amplitude, and the second resistance film between the spaced resistance strips in the fourth section is of decreasing width.
  • variable resistance element wherein the loops of the serpentine pattern of the first resistance film in the third section are of increasing amplitude, the second resistance film between the spaced resistance strips in the fourth section is of decreasing width and the second resistance film completing the serpentine configuration in the fifth section forms loops of increasing amplitude.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
US767606A 1967-10-24 1968-10-15 Variable resistance element with multiple patterns for measuring instruments Expired - Lifetime US3564475A (en)

Applications Claiming Priority (1)

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JP6803667 1967-10-24

Publications (1)

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US3564475A true US3564475A (en) 1971-02-16

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US (1) US3564475A (enrdf_load_stackoverflow)
DE (1) DE1804910A1 (enrdf_load_stackoverflow)
GB (1) GB1250179A (enrdf_load_stackoverflow)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3675179A (en) * 1969-12-15 1972-07-04 Nippon Kogaku Kk Variable zig-zag resistor with tabs
US3921118A (en) * 1973-10-01 1975-11-18 Gen Electric Variable resistor assembly
US4528539A (en) * 1984-06-28 1985-07-09 Eaton Corporation Reduced-size thermal overload relay
US4553125A (en) * 1981-10-14 1985-11-12 Hitachi, Ltd. High voltage resistance element
US4703154A (en) * 1985-08-06 1987-10-27 Ngk Insulators, Ltd. Infrared ray heater
US4928102A (en) * 1988-08-11 1990-05-22 Brooktree Corporation Flash analog-to-digital converter with logarithmic/linear threshold voltages
US5051719A (en) * 1990-06-11 1991-09-24 Ford Motor Company Thick-film non-step resistor with accurate resistance characteristic
US5059980A (en) * 1988-08-11 1991-10-22 Brooktree Corporation Non-linear analog to digital converter
US5177341A (en) * 1987-02-25 1993-01-05 Thorn Emi Plc Thick film electrically resistive tracks
US5712613A (en) * 1995-05-05 1998-01-27 Mcdonnell Douglas Corporation Computer-aided method for producing resistive tapers and resistive taper produced thereby
US6292091B1 (en) * 1999-07-22 2001-09-18 Rohm Co., Ltd. Resistor and method of adjusting resistance of the same
US20040129695A1 (en) * 2002-08-30 2004-07-08 He Mengtao Pete Methods and apparatus for a variable resistor configured to compensate for non-linearities in a heating element circuit
US20050025470A1 (en) * 2001-12-19 2005-02-03 Elias Russegger Method for the production of an electrically conductive resistive layer and heating and/or cooling device
US11064738B2 (en) * 2020-10-20 2021-07-20 Dr. Dabber Inc. Ceramic heating element with embedded temperature sensor and electronic vaporizer having a ceramic heating element with embedded temperature sensor
US11730205B2 (en) 2020-10-20 2023-08-22 Dr. Dabber Inc. Quick connect adapter and electronic vaporizer having a ceramic heating element having a quick connect adapter

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1211831B (de) * 1960-07-16 1966-03-03 Seitz Automatenbau Ges Selbstverkaeufer zur Ausgabe von zylinderfoermigen Gegenstaenden aus einem oder mehreren nebeneinander angeordneten Schaechten
DE1231938B (de) * 1961-08-04 1967-01-05 Franco Bettini Selbstverkaeufer fuer zylinderfoermige Wareneinheiten
US3209942A (en) * 1962-02-14 1965-10-05 Westinghouse Electric Corp Article dispensing mechanism
DE2932714C2 (de) * 1979-08-13 1982-08-12 Vdo Adolf Schindling Ag, 6000 Frankfurt Einstellbarer Drehwiderstand in Dickschichttechnik

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3675179A (en) * 1969-12-15 1972-07-04 Nippon Kogaku Kk Variable zig-zag resistor with tabs
US3921118A (en) * 1973-10-01 1975-11-18 Gen Electric Variable resistor assembly
US4553125A (en) * 1981-10-14 1985-11-12 Hitachi, Ltd. High voltage resistance element
US4528539A (en) * 1984-06-28 1985-07-09 Eaton Corporation Reduced-size thermal overload relay
US4703154A (en) * 1985-08-06 1987-10-27 Ngk Insulators, Ltd. Infrared ray heater
US5177341A (en) * 1987-02-25 1993-01-05 Thorn Emi Plc Thick film electrically resistive tracks
US4928102A (en) * 1988-08-11 1990-05-22 Brooktree Corporation Flash analog-to-digital converter with logarithmic/linear threshold voltages
US5059980A (en) * 1988-08-11 1991-10-22 Brooktree Corporation Non-linear analog to digital converter
US5051719A (en) * 1990-06-11 1991-09-24 Ford Motor Company Thick-film non-step resistor with accurate resistance characteristic
US5712613A (en) * 1995-05-05 1998-01-27 Mcdonnell Douglas Corporation Computer-aided method for producing resistive tapers and resistive taper produced thereby
US6292091B1 (en) * 1999-07-22 2001-09-18 Rohm Co., Ltd. Resistor and method of adjusting resistance of the same
US20050025470A1 (en) * 2001-12-19 2005-02-03 Elias Russegger Method for the production of an electrically conductive resistive layer and heating and/or cooling device
US7361869B2 (en) * 2001-12-19 2008-04-22 Watlow Electric Manufacturing Company Method for the production of an electrically conductive resistive layer and heating and/or cooling device
US20040129695A1 (en) * 2002-08-30 2004-07-08 He Mengtao Pete Methods and apparatus for a variable resistor configured to compensate for non-linearities in a heating element circuit
US7002114B2 (en) * 2002-08-30 2006-02-21 The Dial Corporation Methods and apparatus for a variable resistor configured to compensate for non-linearities in a heating element circuit
US11064738B2 (en) * 2020-10-20 2021-07-20 Dr. Dabber Inc. Ceramic heating element with embedded temperature sensor and electronic vaporizer having a ceramic heating element with embedded temperature sensor
US20220117304A1 (en) * 2020-10-20 2022-04-21 Dr. Dabber Inc. Ceramic Heating Element with Embedded Temperature Sensor and Electronic Vaporizer Having a Ceramic Heating Element with Embedded Temperature Sensor
US11723410B2 (en) * 2020-10-20 2023-08-15 Dr. Dabber Inc. Ceramic heating element with embedded temperature sensor and electronic vaporizer having a ceramic heating element with embedded temperature sensor
US11730205B2 (en) 2020-10-20 2023-08-22 Dr. Dabber Inc. Quick connect adapter and electronic vaporizer having a ceramic heating element having a quick connect adapter
US12022875B2 (en) 2020-10-20 2024-07-02 Dr. Dabber Inc. Quick connect adapter and electronic vaporizer having a ceramic heating element having a quick connect adapter

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GB1250179A (enrdf_load_stackoverflow) 1971-10-20
DE1804910A1 (de) 1969-09-11

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