US3554263A - Discharge apparatus - Google Patents

Discharge apparatus Download PDF

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Publication number
US3554263A
US3554263A US719926A US3554263DA US3554263A US 3554263 A US3554263 A US 3554263A US 719926 A US719926 A US 719926A US 3554263D A US3554263D A US 3554263DA US 3554263 A US3554263 A US 3554263A
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United States
Prior art keywords
pump
blades
evaporator
rotor
wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US719926A
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English (en)
Inventor
Thomas H Bachmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPX Technologies Inc
Original Assignee
Chemetron Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application granted granted Critical
Publication of US3554263A publication Critical patent/US3554263A/en
Assigned to CHEMETRON PROCESS EQUIPMENT, INC. reassignment CHEMETRON PROCESS EQUIPMENT, INC. CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). EFFECTIVE MARCH 24, 1980. Assignors: CHEMETRON-PROCESS EQUIPMENT, INC.,
Assigned to AMCA INTERNATIONAL CORPORATION, DARTMOUTH NATIONAL BANK BLDG., HANOVER, NEW HAMPSHIRE, 03755, A CORP. reassignment AMCA INTERNATIONAL CORPORATION, DARTMOUTH NATIONAL BANK BLDG., HANOVER, NEW HAMPSHIRE, 03755, A CORP. ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: CHEMETRON PROCESS EQUIPMENT, INC. A DE CORP.
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Expired - Lifetime legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222—In rotating vessels; vessels with movable parts
    • B01D1/223—In rotating vessels; vessels with movable parts containing a rotor
    • B01D1/225—In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers

Definitions

  • This invention relates to agitated film processors and more particularly to an improved product dischargesectionifor such agitators. v g
  • Wiped thin film thermal processors or evaporators are commonly used for the continuous processing of heat sensitive and/or viscous liquids at increased efficienciesand without product degradation and under precisely controlled conditions.
  • the processes involve concentration, evaporation, distillation, disolventization, deodorization, stripping and reaction. Processing is completed rapidly in one pass with relatively small quantities of product in the processor at any given time.
  • the liquid material is introduced into a feed section of a hollow cylinder which is either heated or cooled externally.
  • frictional head may far exceed the physical head. It is pointed out that the frictional head must be subtracted from the physical head in order to obtain or provide a required net-positive-suction head for a given pump.
  • the processing of many very high viscosity products is successful only when the rheological properties permit reduced viscosity under high shear rate.
  • a centrifugal component' is applied to the material being processed.
  • Some known processors are designed with .a tangential tube leading from the discharge opening to a downstream pump.
  • friction at the walls-of the tangential tube absorbs the centrifugal force component of, the material being discharged and the tubebecomes stopped with the material. Without any material being supplied to pump, the pump becomes ineffective.
  • This invention utilizes the centrifugal component to push the treated material and/or concentrate form the from the discharge opening of the processor.
  • a positive displacement pump is closely coupled to the processor for'immediately receiving the concentrate from the rotor blade.
  • the pump intake elements or impellers are placed in contact with the' turbulentfilm of the concentrate being discharged from the rotary elements of the processor.
  • Another object of this invention is to provide an improved discharge section for thin film thermal processors.
  • An additional object of this invention is to provide a thin film thermal evaporator discharge section utilizing the outward discharge pressure created by the revolving rotor blades to propel the product into an adjacent discharge pump.
  • Yet another object of this invention is to provide a apparatus for rapidly handling low viscosity materials with a minimum retention time in an associated processor.
  • Still another object of this invention is to provide a processor discharge section which reduces power consumption and vibration involved in the operation of the thermal processor itself.
  • Yet another object of this invention is to provide apparatus for effectively moving high viscosity products out of a processor after the product moves beyond the influence of the blades where the product often reverts to a static viscosity very quickly.
  • Another object of this invention is to provide a discharge section for a thin film thermal processor which is capable of readily discharging highly viscous products.
  • FIG. 1 is an isometric view of the discharge end of a thin film thermal processor incorporating the principals of this invention
  • FIG. 2 is a horizontal sectional viewv taken along line 2+2 of FIG. 1 looking in the direction indicated by the arrows;
  • FIG. 3 is a vertical view, partly in section, showing thedischarge section of said processor
  • FIG. 4. is a horizontal sectional view of the pumping portion of another embodiment of this invention.
  • FIG. 5 is a horizontal sectional view" corresponding generally to FIG. 4, but illustrating a further embodiment of this invention.
  • Material M being concentrated and/or processed is introduced into a receiving section'at the upper end of a cylindrical chamber 12 and flows down along the inner surface of the chamber wall.
  • the processed material is withdrawn from a discharge section of the processor through an outlet opening 14 in a removable end closure 16 which is connected to the lower treatment end of the processor 10.
  • the lower end of the processor terminates in an outwardly extending flange 18 which is connected to a mating flange 20 at the top of the closure 16 by connectors, such as bolts 22.
  • a heating medium such as stream or the like is supplied to an outer jacket 24 to be discharged from outlet pipe 26. As the heating medium passes through the jacket 24 it passes along the outer surface of the chamber 12 in a heat exchange relationship.
  • a cooling medium can be supplied to the jacket ifthe material requires cooling cooling during treatment. Any vapors produced during the processing of the material are discharged from the top of the processor through suitable openings (not shown).
  • a fixed blade rotor 28 is rotatably mounted inside of the cylindrical chamber 12 between an upper bearing means (not shown) and a lower stub shaft 30.
  • a bearing 32 which is secured within the end closure 16 rotatably contains the stub shaft 30 and supports the rotor 28.
  • the rotor extends through the entire length of the processing chamber 12 and carries a plurality of blades 34 extending radially outwardly from the rotor toward the wall of the chamber 12.
  • the rotor 28 is shown as a hollow member for reducing the weight or for the introduction on a heat transfer medium, however, it may be solid.
  • the blades terminate with the blade tips in contact with or close to the film of material M being processed and moved along the inner wall surface of the chamber 12. In FIG.
  • the bearing 32 is mounted in a conical support member 36 formed inside the bottom of the end closure 16.
  • the blades 34 are longitudinally continuous along and closely proximate to the wall of the chamber 12 and a cylindrical wall portion of the end closure 16 so that every part of the space between the rotor and the walls is acted upon by the blades when the rotor is rotated.
  • Each blade has a tapered surface which is connected as by welding to a conical shield member 38; said member 38 being mounted at the same angle as and surrounding the conical support member 36.
  • the shield 38 helps prevent creeping of the treated material along the conical support member whereby the operation and efficiency of the rotor would be reduced.
  • the lower portion of the blades terminate a small distance above the bottom inside surface of the closure 16.
  • the liquid material M flows along the wall of the cylindrical chamber 12 by gravity and/or by the pumping action of the blades 34.
  • the material continues to flow along the chamber 12 in a thin film until it reaches the opening 14 where it meets no restricting or blocking surface and it is continually advanced by centrifugal force outwardly of the opening 14 by the action ofthe blades 34.
  • the blades 34 extend to within a predetermined clearance distance of the thermal wall of the chamber 12 to provide scrubbing action of the film of material being processed. Blade clearance is determined by the viscosity, surface tension, thermal conducting and throughput rate of the material.
  • a rolling fillet may be formed on the leading edge of the blade with the fillet size being dependent on the physical properties of the material.
  • the turbulent action and mixing imparted to the film and the turnover of the exposed area of the fillet surface results in high heat and mass transfer.
  • the liquid film on the wall continues downwardly in a spiraling manner subject to the turbulent action of the rotor blades.
  • a drive unit (not shown) provides the required torque and speed for the rotor. Processed material reaching the opening 14 is mechanically propelled into opening 14 by centrifugal force and blade pressure simulating a pumping action.
  • a positive displacement pump 40 is mounted by bolts 42 on a boss flange 44 which is welded to the side of the end closure 16. While the pump shown in the FIGS. is of the gear-withina-gear" type such as a modified Viking Model FH Pump sold by the Viking Pump Co. of Cedar Falls, Iowa, any positive displacement pump may be used. It will be appreciated that there are numerous ways by which the pump and/or its pumping elements can be mounted to the processor.
  • the pump 40 is attached to the end closure 16 so that the intake port or opening 46 of the pump is aligned with the opening 14 and the pump intake elements 48 are positioned closely adjacent to or in close contact with the turbulent film of the concentrate being expelled by the blades 34 through the opening 14.
  • the pump intake elements 48 and the tips of the blades 34 are positioned so that their paths of travel are less than 0.5 inches apart as the elements and blades rotate. In this way the concentrate is moved directly into the vacant openings or spaces of pump elements without depreciable loss in tangential forces and the concentrate is moved through the pump and is forced out through a discharge port 50.
  • the pump casing includes a flange having a face for snuggle seating against a seal 45 and the flange 44 to prevent the escape of any of the concentrate.
  • the pump intake elements include an idler gear 52 and a rotor gear 54. Positive displace ment of the concentrate is provided by the concentrate being filled or entering into the spaces between the teeth ofthe rotor and idler gears.
  • the idler gear 52 and the rotor gear 54 are driven in the directions indicated by the arrow pointed arcuate lines in FIG. 2 by drive means (not shown) through a drive shaft 56.
  • the rotor 28 is driven in the direction indicated by the arrow 35, however during treatment of some materials, the direction of rotation of the rotor 28 is reversed.
  • the idler gear 52 is rotatably mounted on a shaft 58 which is attached to the housing of the pump 40.
  • a crescent-shaped portion of the housing 60 is positioned between the idler gear and the rotor gear for a portion of their travel and splits the flow of concentrate as it is moved toward the discharge port 50.
  • the idler gear 52 carries a portion of the concentrate between its teeth and the inside surface of the crescent 60.
  • the rotor gear 54 which carries a portion of the concentrate between its teeth, travels between the pump housing and the outside surface of the crescent and is drivingly connected to the drive shaft 56.
  • the concentrate As the concentrate is received by the pump intake elements through the pump intake port 46, the concentrate is immediately pumped toward the discharge port 50 by rotation of the elements 48.
  • the crescent-shaped portion 60 divides the concentrate from and acts as a seal between the intake port and the discharge port.
  • the concentrate When the openings between the teeth receive concentrate from the blade tips, the concentrate is conveyed to the discharge port.
  • the rotor and idler teeth mesh and form a seal which is approximately equidistant between the discharge and the intake port and the concentrate is forced out of the pump intake elements.
  • the pump intake elements With the pump intake elements being closely coupled with the turbulent film, the film is continually moved from the processor. There is reduced holding time and volume retention because the film is quickly removed while it is still being impelled by the blades 34.
  • This system eliminates frictional losses and delays inherent in other systems wherein the pump intake elements are spaced an appreciable distance downstream of the mixing blades. With the pump intake elements being positioned closely adjacent the film, more complete penetration of the elements is possible and the material handling ability of the pump is improved.
  • FIG. 4 a single-piece, pump casing 40' and end closure is shown.
  • the pump intake port 46' is formed in the unitary structure and provides means for communication between the blades 34' and the pump impellers 48'.
  • FIG. 5 illustrates an integral pump casing and end closure arrangement wherein the intake port 46",and the discharge port50" are located over the crescent 'portion 60"' so that concentrate with discrete solids is not introduced into the roots of the idler gear 52" where packing sometimes takes place.
  • An opening 62 is formed in the crescent section 60" and is. connected to a suitable source of compressed gas (not shown). The compressed gas is exhausted through the opening 62 toassist in discharging concentrate from the teeth of the rotor gear 54".- The dischargeport '50? is open tothe atmosphere and only partially covered by the crescent portion 60; I
  • this invention provides a novel discharge arrangement for wiped thin film thermal processors which provide pump'elements adjacent the discharge end for swift removal of the treated materials from theprocessor. l'his insures against clogging for even highly viscous liquids. While a vertically mounted cylindrical processor is shown and described, this invention can be incorporated into apparatus used in horizontal or angular mounting arrangements. It may also be used with other forms of agitated thermal processors which use conical or tapered cylinders, alone or in combination, in order to add another force component to the blade centrifugal force for promoting improved flow of high viscosity materials or for impeding flow of low viscosity materials and thereby increasing retention time, such as when the flow is against the taper. Y
  • Wiped thin film rotary evaporator for thermally processing a supply of liqueform material and comprising: means defining a thermal treatment chamber for receiving and treating the material, said means having a cylindrical inner wall and a discharge outlet in the wall adjacent a closed end of the chamber; rotary means mounted within the treatment chamber for spreading the material being treated in a film on the inner wall and for applying a centrifugal component of force to the film of material at the outlet to impell the film of material through the outlet said means comprising a rotor carrying at least one blade extending in film-spreading relationship to the inner wall and in almost abutting relationship to the closed end of the chamber; and a positive displacernent pump mounted outside the treatment chamber closely adjacent the outlet in close juxtaposition to the cylindrical wall, said pump having rotary intake elements positioned to intercept the centrifuged material being impelled through the outlet whereby the treated material is removed directly from the treatment chamber.
  • Evaporator as claimed in claim 1 wherein the inner wall of the treatment chamber is generally vertically oriented and the discharge outlet is located in the lowermost portion of the wall.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mixers Of The Rotary Stirring Type (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Rotary Pumps (AREA)
US719926A 1968-04-09 1968-04-09 Discharge apparatus Expired - Lifetime US3554263A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US71992668A 1968-04-09 1968-04-09

Publications (1)

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US3554263A true US3554263A (en) 1971-01-12

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US719926A Expired - Lifetime US3554263A (en) 1968-04-09 1968-04-09 Discharge apparatus

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US (1) US3554263A (pm)
BE (1) BE731254A (pm)
CH (1) CH525706A (pm)
DE (1) DE1917705C3 (pm)
GB (1) GB1224132A (pm)
NL (1) NL159590B (pm)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3695327A (en) * 1969-03-21 1972-10-03 Luwa Ag Wiped thin film evaporation and treatment apparatus
US4032391A (en) * 1975-09-03 1977-06-28 Union Carbide Corporation Low energy recovery compounding and fabricating systems for plastic materials
US5092740A (en) * 1988-04-30 1992-03-03 Nippon Ferrofluidics Corporation Composite vacuum pump
US5534113A (en) * 1992-09-17 1996-07-09 Courtaulds Fibres (Holdings) Limited & Buss Ag Forming solutions
US20030163204A1 (en) * 2000-05-26 2003-08-28 Rix Gerald Henner Stent
US6672140B2 (en) * 2000-05-09 2004-01-06 Cbc Materials Co., Ltd. Method for measuring viscosity of liquid, and method and apparatus for measuring visco-elasticity of liquid
US20070275137A1 (en) * 2006-05-25 2007-11-29 Spx Corporation Food-processing component and method of coating thereof
US10065130B2 (en) * 2013-05-28 2018-09-04 Empire Technology Development Llc Thin film systems and methods for using same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07242836A (ja) * 1993-11-19 1995-09-19 Toyo Ink Mfg Co Ltd ６，１３−ジヒドロキナクリドン類の製造方法およびこれを中間体とするキナクリドン類の製造方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2336479A (en) * 1939-05-08 1943-12-14 Tokheim Oil Tank & Pump Co Pump construction
CA492611A (en) * 1953-05-05 Eastman Kodak Company Gear pump for vacuum use
US2774415A (en) * 1951-10-25 1956-12-18 Rodney Hunt Machine Co Evaporator
US2868279A (en) * 1951-03-17 1959-01-13 Rodney Hunt Machine Co Evaporator
US3067812A (en) * 1959-03-23 1962-12-11 Monsanto Chemcial Company Apparatus for devolatizing viscous fluids
US3217783A (en) * 1961-12-22 1965-11-16 Bayer Ag Apparatus for removing volatile constituents contained in liquid synthetic plastic melts
US3233656A (en) * 1962-04-18 1966-02-08 Bayer Ag Falling film evaporator of the rotating drum type
US3252502A (en) * 1962-01-19 1966-05-24 Allied Chem Centrifugal wiped film evaporation process for viscous materials
US3357478A (en) * 1966-12-05 1967-12-12 Artisan Ind Thin film processing apparatus
US3443622A (en) * 1968-04-02 1969-05-13 Artisan Ind Multi-zone processing apparatus

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA492611A (en) * 1953-05-05 Eastman Kodak Company Gear pump for vacuum use
US2336479A (en) * 1939-05-08 1943-12-14 Tokheim Oil Tank & Pump Co Pump construction
US2868279A (en) * 1951-03-17 1959-01-13 Rodney Hunt Machine Co Evaporator
US2774415A (en) * 1951-10-25 1956-12-18 Rodney Hunt Machine Co Evaporator
US3067812A (en) * 1959-03-23 1962-12-11 Monsanto Chemcial Company Apparatus for devolatizing viscous fluids
US3217783A (en) * 1961-12-22 1965-11-16 Bayer Ag Apparatus for removing volatile constituents contained in liquid synthetic plastic melts
US3252502A (en) * 1962-01-19 1966-05-24 Allied Chem Centrifugal wiped film evaporation process for viscous materials
US3233656A (en) * 1962-04-18 1966-02-08 Bayer Ag Falling film evaporator of the rotating drum type
US3357478A (en) * 1966-12-05 1967-12-12 Artisan Ind Thin film processing apparatus
US3443622A (en) * 1968-04-02 1969-05-13 Artisan Ind Multi-zone processing apparatus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3695327A (en) * 1969-03-21 1972-10-03 Luwa Ag Wiped thin film evaporation and treatment apparatus
US4032391A (en) * 1975-09-03 1977-06-28 Union Carbide Corporation Low energy recovery compounding and fabricating systems for plastic materials
US5092740A (en) * 1988-04-30 1992-03-03 Nippon Ferrofluidics Corporation Composite vacuum pump
US5534113A (en) * 1992-09-17 1996-07-09 Courtaulds Fibres (Holdings) Limited & Buss Ag Forming solutions
US6672140B2 (en) * 2000-05-09 2004-01-06 Cbc Materials Co., Ltd. Method for measuring viscosity of liquid, and method and apparatus for measuring visco-elasticity of liquid
US20030163204A1 (en) * 2000-05-26 2003-08-28 Rix Gerald Henner Stent
US20070275137A1 (en) * 2006-05-25 2007-11-29 Spx Corporation Food-processing component and method of coating thereof
US10065130B2 (en) * 2013-05-28 2018-09-04 Empire Technology Development Llc Thin film systems and methods for using same

Also Published As

Publication number Publication date
BE731254A (pm) 1969-09-15
NL159590B (nl) 1979-03-15
DE1917705C3 (de) 1981-01-29
GB1224132A (en) 1971-03-03
DE1917705A1 (de) 1969-11-06
CH525706A (de) 1972-07-31
NL6905381A (pm) 1969-10-13
DE1917705B2 (de) 1980-05-14

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AS Assignment

Owner name: CHEMETRON PROCESS EQUIPMENT, INC.

Free format text: CHANGE OF NAME;ASSIGNOR:CHEMETRON-PROCESS EQUIPMENT, INC.,;REEL/FRAME:003873/0520

Effective date: 19810227

AS Assignment

Owner name: AMCA INTERNATIONAL CORPORATION, DARTMOUTH NATIONAL

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:CHEMETRON PROCESS EQUIPMENT, INC. A DE CORP.;REEL/FRAME:004188/0073

Effective date: 19830104